JPH0279047A - Electrophotographic sensitive body - Google Patents
Electrophotographic sensitive bodyInfo
- Publication number
- JPH0279047A JPH0279047A JP23100288A JP23100288A JPH0279047A JP H0279047 A JPH0279047 A JP H0279047A JP 23100288 A JP23100288 A JP 23100288A JP 23100288 A JP23100288 A JP 23100288A JP H0279047 A JPH0279047 A JP H0279047A
- Authority
- JP
- Japan
- Prior art keywords
- protective layer
- surface protective
- film
- atoms
- picture image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011241 protective layer Substances 0.000 claims abstract description 23
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 10
- 239000010410 layer Substances 0.000 claims abstract description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 28
- 229910052757 nitrogen Inorganic materials 0.000 claims description 14
- 108091008695 photoreceptors Proteins 0.000 claims description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 8
- 229910003481 amorphous carbon Inorganic materials 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 5
- JMANVNJQNLATNU-UHFFFAOYSA-N oxalonitrile Chemical compound N#CC#N JMANVNJQNLATNU-UHFFFAOYSA-N 0.000 claims description 5
- 239000000470 constituent Substances 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 abstract description 6
- 125000004433 nitrogen atom Chemical group N* 0.000 abstract description 6
- 230000003287 optical effect Effects 0.000 abstract description 5
- 125000004432 carbon atom Chemical group C* 0.000 abstract description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical class N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 abstract description 3
- 125000001165 hydrophobic group Chemical group 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 2
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 23
- 239000007789 gas Substances 0.000 description 6
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910052990 silicon hydride Inorganic materials 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- VEDJZFSRVVQBIL-UHFFFAOYSA-N trisilane Chemical compound [SiH3][SiH2][SiH3] VEDJZFSRVVQBIL-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/147—Cover layers
- G03G5/14704—Cover layers comprising inorganic material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
- G03G5/08214—Silicon-based
- G03G5/08221—Silicon-based comprising one or two silicon based layers
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【発明の詳細な説明】
(イ)産業上の利用分野
本発明は普通紙複写機、LEDプリンタまたはレーザプ
リンタ等に用いられる電子写真用感光体に関する。DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application The present invention relates to an electrophotographic photoreceptor used in plain paper copying machines, LED printers, laser printers, and the like.
(ロ)従来の技術
非晶質シリコン(以下、a−5i)等の非晶質半導体を
母材とする電子写真用a−5i感光体は、高感度で長寿
命という優れた特徴を有しているが、高湿度下で画像流
れを生じるという欠点がある。この画像流れの対策とし
て、昭和62年度電子写真学会第59回研究討論会予稿
集の「アモルファス・カーボン表面層によるアモルファ
ス・カーボン感光体の高耐湿化」に示されているように
、優れた耐湿性を有する水素化非晶質炭素(a−C:H
)薄膜をa−3i感光体の表面保護層として用いている
。この購成によれば、従来の水素化非晶質炭化シリコン
(a−5iC:■)や水素化非晶質窒化シリコン(a−
8iN:H)を表面保護層として用いたa−5i悪感光
に比べて耐湿性が大きく改善されている。(B) Conventional technology The A-5I photoreceptor for electrophotography, which uses an amorphous semiconductor such as amorphous silicon (hereinafter referred to as A-5I) as a base material, has excellent characteristics of high sensitivity and long life. However, it has the disadvantage of causing image blurring under high humidity conditions. As a countermeasure against this image blurring, as shown in the Proceedings of the 59th Research Conference of the Society of Electrophotography in 1988, "Improving the Moisture Resistance of an Amorphous Carbon Photoreceptor by Using an Amorphous Carbon Surface Layer," Hydrogenated amorphous carbon (a-C:H
) thin film is used as a surface protective layer of the a-3i photoreceptor. According to this purchase, conventional hydrogenated amorphous silicon carbide (a-5iC: ■) and hydrogenated amorphous silicon nitride (a-5iC:■)
The moisture resistance is greatly improved compared to the a-5i photosensitive material using 8iN:H) as the surface protective layer.
(ハ)発明が解決しようとする課題
しかし乍ら、グロー放電法等により形成したa−C:H
膜は、光学的バンドギャップのバンド端近傍における局
在準位密度が大きい。従って、表面保護層としてa−C
:H膜を用いたa−5i悪感光では、通常の湿度下(約
70χ)での画像特性が劣ってしまう。(c) Problems to be solved by the invention However, a-C:H formed by glow discharge method etc.
The film has a large localized level density near the band edge of the optical band gap. Therefore, as a surface protective layer, a-C
In a-5i exposure using a :H film, the image characteristics are poor under normal humidity (approximately 70.chi.).
そこで、本発明の目的は、通常の湿度下での画像特性を
劣化させることなく、耐湿性を改善することにある。Therefore, an object of the present invention is to improve moisture resistance without deteriorating image characteristics under normal humidity.
(ニ)課題を解決するための手段
本発明は、非晶質半導体を母材とする光導電層と、この
光導電層の表面上に形成された表面保護層とを備えた電
子写真用感光体において、上記表面保護層は原子数比が
19:1から11:9の範囲にある炭素及び窒素を主構
成元素とする水素化非晶質窒化炭素膜からなることを特
徴とする。(d) Means for Solving the Problems The present invention provides an electrophotographic photosensitive material comprising a photoconductive layer having an amorphous semiconductor as a base material and a surface protective layer formed on the surface of the photoconductive layer. The surface protective layer is characterized in that it is made of a hydrogenated amorphous carbon nitride film whose main constituent elements are carbon and nitrogen with an atomic ratio in the range of 19:1 to 11:9.
(ホ)作用
a−C:N:t(膜において、膜中の窒素原子は、光学
的バンドギャップにおける局在準位密度を低減するよう
に、膜中の炭素原子と結合するため、a−C:H膜に比
べて、膜中の局在準位密度が低減する。(E) Effect a-C:N:t (In the film, nitrogen atoms in the film bond with carbon atoms in the film so as to reduce the localized level density in the optical band gap, so a- The localized level density in the film is reduced compared to the C:H film.
a−C:N:If模膜中窒素濃度を適宜の範囲に制御す
ることにより、a−C:tl膜と同等の耐湿性が得られ
る。By controlling the nitrogen concentration in the a-C:N:If model film within an appropriate range, moisture resistance equivalent to that of the a-C:tl film can be obtained.
(へ)実施例
第1図は本発明の一実施例を示す概略的断面図であり、
アルミニウム、アルミニウム合金等の導電性支持体(1
)の表面に、支持体(1)からの電子または正孔の注入
を防止する膜厚0.1−5μmの注入阻止層(2)と、
注入阻止層(2)の表面に、シラン(Sill、)、ジ
シラン(Sill14)、トリシラン(SiJa)等の
水素化ケイ素ガスとジボラン(B*Ha)等の不純物添
加ガスとの混合ガスを、グロー放電法により分解して形
成した膜IV、5−40μmの非晶質シリコン(a−5
i)または非晶質シリコン合金からなる光導電層(3)
と、光導電層(3)の表面に、メタン(CH4)、エタ
ン(C=H*)、アセチレン(C2)1t)等の炭化水
素ガスと窒素(\、)、アンモニア(NH,)等の窒素
原子を含むガスとの混合ガスを、グロー放電法により分
解して形成した膜厚0.1−57.z+uの水素化非晶
質窒化炭素膜(a−C:N:t()からなる表面保護層
(4)とからなる。(f) Embodiment FIG. 1 is a schematic sectional view showing an embodiment of the present invention.
Conductive support such as aluminum or aluminum alloy (1
), an injection blocking layer (2) with a thickness of 0.1-5 μm that prevents injection of electrons or holes from the support (1);
A mixed gas of a silicon hydride gas such as silane (Sill), disilane (Sill14), or trisilane (SiJa) and an impurity-added gas such as diborane (B*Ha) is applied to the surface of the injection blocking layer (2). Film IV formed by decomposition by discharge method, 5-40 μm amorphous silicon (a-5
i) or a photoconductive layer (3) made of an amorphous silicon alloy
Then, on the surface of the photoconductive layer (3), hydrocarbon gas such as methane (CH4), ethane (C=H*), acetylene (C2), etc. and nitrogen (\,), ammonia (NH,), etc. A film with a thickness of 0.1 to 57 mm was formed by decomposing a gas mixture with a gas containing nitrogen atoms using a glow discharge method. It consists of a surface protective layer (4) consisting of a hydrogenated amorphous carbon nitride film (a-C:N:t()) of z+u.
ところで、本発明の表面保護層(4)は、炭素と窒素と
の原子数比が19:lから11:9の範囲にあることで
ある。By the way, in the surface protective layer (4) of the present invention, the atomic ratio of carbon to nitrogen is in the range of 19:1 to 11:9.
第2図は表面保護層(4)中の窒素濃度とB値の逆数と
の関係を示す。ここで、B VLは、一般に次式によっ
て求められる。FIG. 2 shows the relationship between the nitrogen concentration in the surface protective layer (4) and the reciprocal of the B value. Here, BVL is generally determined by the following equation.
(αhν)l/1;B(hシーE、、、)a:吸収係数
、hν:入射光エネルギーE0.:光学的バンドギャッ
プ
このB値の増加と膜中の局在準位密度との間には相関関
係があり、B(fiが大きい程局在準位密度は少なくな
る。従って、第2図からすると、窒素濃度が5%以上、
即ち、炭素と窒素との原子数比が19:1以上である必
要がある。(αhν)l/1;B(hcE,,,)a: Absorption coefficient, hν: Incident light energy E0. : Optical bandgap There is a correlation between the increase in B value and the localized level density in the film, and the larger B(fi), the lower the localized level density. Therefore, from Figure 2, Then, the nitrogen concentration is 5% or more,
That is, the atomic ratio of carbon to nitrogen needs to be 19:1 or more.
また、膜中の窒素濃度を増加させていくと、膜中に親水
性の窒素−水素結合が増加するため、高湿度状態におい
て、画像流れを起こす。第1表は炭素と窒素との原子数
比と、高湿度状態(相対湿度90Z)における電子写真
画像の状態との関係を示している。Furthermore, as the nitrogen concentration in the film increases, hydrophilic nitrogen-hydrogen bonds increase in the film, causing image blurring in high humidity conditions. Table 1 shows the relationship between the atomic ratio of carbon and nitrogen and the state of an electrophotographic image in a high humidity state (relative humidity 90Z).
第1表
第1表より炭素と窒素との原子数比は11二9以下であ
ることが必要とされる。From Table 1, the atomic ratio of carbon to nitrogen is required to be 1129 or less.
以−にのことから、表面保護層(4)は、炭素と窒素と
の原子数比が19:1から11:9の範囲にある水素化
非晶質窒化炭素膜とされる。From the above, the surface protective layer (4) is a hydrogenated amorphous carbon nitride film in which the atomic ratio of carbon to nitrogen is in the range of 19:1 to 11:9.
こうして形成された表面保護層(4)は、膜中の光学的
バンドギャップのバンド端近傍における局在準位密度が
窒素原子により補償されて低減し、電子写真特性が向上
することとなる。また、膜中に炭素−水素結合、炭素−
炭素結合等の疎水性基を多く含むので、優れた耐水性を
有することとなる。In the surface protective layer (4) thus formed, the localized level density near the band edge of the optical band gap in the film is compensated and reduced by the nitrogen atoms, and the electrophotographic properties are improved. In addition, carbon-hydrogen bonds and carbon-hydrogen bonds are present in the film.
Since it contains many hydrophobic groups such as carbon bonds, it has excellent water resistance.
@2表は、本発明の電子写真用感光体、a−C:)l膜
を表面保護層として有する電子写真感光体(比較例1)
及びa−5iC膜を表面保護層として有する電子写真用
感光体(比較例2)の各々において、高湿度状態(相対
湿度90χ)における電子写真画像の状態と、通常の湿
度下(相対湿度7oz)における残留電位及び400n
mにおける分光感度とを表わしている。@Table 2 shows the electrophotographic photoreceptor of the present invention, an electrophotographic photoreceptor having a-C:)l film as a surface protective layer (Comparative Example 1)
and a-5iC film as a surface protective layer (Comparative Example 2). Residual potential at and 400n
It represents the spectral sensitivity at m.
第2表
第2表から明らかなように、本発明の感光体は、高湿度
状態における使用において電子写真画像の流れを防止す
ることができるとともに、通常の湿度下においても、優
れた電子写真特性を得ることができる。Table 2 As is clear from Table 2, the photoreceptor of the present invention can prevent electrophotographic images from running when used in high humidity conditions, and also has excellent electrophotographic properties even under normal humidity. can be obtained.
なお、表面保護層(4)に、8%Al、 Ga等のII
I a族元素を500ppm〜5000ppmの範囲で
ドーピングしてもよい。二の場合、表面保護層(4)は
膜中に正孔を多数キャリアとして含むため、感光体の正
帯電時における正表面電荷の表面保護層(4)内部への
注入阻1F能を大きくすることができ、感光体として帯
電能を向−ヒさせることができる。In addition, the surface protective layer (4) contains 8% Al, Ga, etc.
The Ia group element may be doped in a range of 500 ppm to 5000 ppm. In case 2, since the surface protective layer (4) contains holes as majority carriers in the film, it increases the 1F ability to inhibit injection of positive surface charges into the surface protective layer (4) when the photoreceptor is positively charged. It is possible to improve the charging ability of the photoreceptor.
(ト)発明の効果
本発明によれば、表面保護層として原子数比が19:1
から11=9の範囲にある炭素及び窒素を主構成元素と
する水素化非晶質窒化炭素膜を用いたので、高温度Fに
おける使用において電子写真画像の流れを防止すること
ができるとともに、高湿度化及び通常の湿度下において
優れた電子写真特性を得ることができる。(g) Effects of the invention According to the invention, the surface protective layer has an atomic ratio of 19:1.
Since we used a hydrogenated amorphous carbon nitride film whose main constituent elements are carbon and nitrogen in the range of Excellent electrophotographic properties can be obtained under humid conditions and normal humidity.
第1図は本発明の一実施例を示す概略的断面図、第2図
は表面保護層中の窒素濃度とB(tiの逆数との関係を
示す特性図である。
(3ン・・・先導1を層、(4)・・・表面保護層。FIG. 1 is a schematic cross-sectional view showing an embodiment of the present invention, and FIG. 2 is a characteristic diagram showing the relationship between the nitrogen concentration in the surface protective layer and the reciprocal of B (ti). Leading layer 1, (4) surface protective layer.
Claims (1)
電層の表面上に形成された表面保護層とを備えた電子写
真用感光体において、上記表面保護層は原子数比が19
:1から11:9の範囲にある炭素及び窒素を主構成元
素とする水素化非晶質窒化炭素膜からなることを特徴と
する電子写真用感光体。(1) In an electrophotographic photoreceptor comprising a photoconductive layer having an amorphous semiconductor as a base material and a surface protective layer formed on the surface of the photoconductive layer, the surface protective layer has an atomic ratio of is 19
An electrophotographic photoreceptor comprising a hydrogenated amorphous carbon nitride film containing carbon and nitrogen as main constituent elements in a ratio of 1 to 11:9.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23100288A JPH0279047A (en) | 1988-09-14 | 1988-09-14 | Electrophotographic sensitive body |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23100288A JPH0279047A (en) | 1988-09-14 | 1988-09-14 | Electrophotographic sensitive body |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0279047A true JPH0279047A (en) | 1990-03-19 |
Family
ID=16916696
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23100288A Pending JPH0279047A (en) | 1988-09-14 | 1988-09-14 | Electrophotographic sensitive body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0279047A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04330456A (en) * | 1990-09-25 | 1992-11-18 | Semiconductor Energy Lab Co Ltd | Copying device |
US7103301B2 (en) * | 2003-02-18 | 2006-09-05 | Ricoh Company, Ltd. | Image forming apparatus using a contact or a proximity type of charging system including a protection substance on a moveable body to be charged |
-
1988
- 1988-09-14 JP JP23100288A patent/JPH0279047A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04330456A (en) * | 1990-09-25 | 1992-11-18 | Semiconductor Energy Lab Co Ltd | Copying device |
US7103301B2 (en) * | 2003-02-18 | 2006-09-05 | Ricoh Company, Ltd. | Image forming apparatus using a contact or a proximity type of charging system including a protection substance on a moveable body to be charged |
US7251438B2 (en) | 2003-02-18 | 2007-07-31 | Ricoh Company, Ltd. | Image forming apparatus using a contact or a proximity type of charging system including a protection substance on a moveable body to be charged |
US7383013B2 (en) | 2003-02-18 | 2008-06-03 | Ricoh Company, Ltd. | Image forming apparatus using a contact or a proximity type of charging system including a protection substance on a moveable body to be charged |
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