JPH0278183A - High frequency heating device - Google Patents
High frequency heating deviceInfo
- Publication number
- JPH0278183A JPH0278183A JP22807388A JP22807388A JPH0278183A JP H0278183 A JPH0278183 A JP H0278183A JP 22807388 A JP22807388 A JP 22807388A JP 22807388 A JP22807388 A JP 22807388A JP H0278183 A JPH0278183 A JP H0278183A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor switch
- magnetron
- high frequency
- heating device
- frequency heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 title claims description 12
- 239000004065 semiconductor Substances 0.000 claims abstract description 31
- 238000004904 shortening Methods 0.000 claims description 5
- 238000004804 winding Methods 0.000 abstract description 8
- 230000010355 oscillation Effects 0.000 abstract description 6
- 238000001514 detection method Methods 0.000 abstract description 5
- 239000003990 capacitor Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 238000002955 isolation Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 210000004243 sweat Anatomy 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は高周波加熱装置、特に起動時にマグネトロン
に発生する高圧パルスの抑制に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a high-frequency heating device, and particularly to suppression of high-voltage pulses generated in a magnetron during startup.
第3[F]は従来の高周波加熱装置の回路図であり。 3rd [F] is a circuit diagram of a conventional high frequency heating device.
(1)は商用電源、(2)はコンバータであり整汗器(
3)と平滑コンデンサ(41とで構成されている。高周
波トランス(5)は1次、2次、3次巻線イ61.(7
)、(81がらな91次巻線(6)に直列に半導体スイ
ッチ(9)を接続し、この半導体スイッチ(9)に並列
に転流ダイオードαG、及び共振コンデンサ+Il+を
接続し、1次巻線+61の一方を直流回路に接続して高
周波スイッチングパワー口跡となるインバータazを構
成している、また絶縁トランス2次巻線(7)には高圧
コンデンサα3.高圧ダイオードo4が接続され半波倍
電圧整流回路を構成している。t19け高圧ダイオード
α3を通して絶縁トランス2次巻線(7)の高圧電力を
供給しているマグネトロン、 (15a)はこのマグ
ネトロンのフィラメントで、絶縁トランス3次巻線(8
)けフイ5 J :y ) (15a)にヒータ電力を
供給するようフィラメント(15a)に接続され電子レ
ンジ加熱回路を構成している。(1) is a commercial power supply, (2) is a converter and a sweat device (
3) and a smoothing capacitor (41).The high frequency transformer (5) has primary, secondary, and tertiary windings 61.(7
), (A semiconductor switch (9) is connected in series to the 91st winding (6) of 81 wires, a commutating diode αG and a resonant capacitor +Il+ are connected in parallel to this semiconductor switch (9), and the primary winding One side of the wire +61 is connected to the DC circuit to form an inverter az that serves as a source of high frequency switching power.In addition, a high voltage capacitor α3 and a high voltage diode O4 are connected to the secondary winding of the isolation transformer (7) to generate a half wave multiplier. It constitutes a voltage rectifier circuit.The magnetron supplies high-voltage power to the secondary winding (7) of the isolation transformer through the high-voltage diode α3 of t19.(15a) is the filament of this magnetron, which connects the tertiary winding of the isolation transformer. (8
) is connected to the filament (15a) to supply heater power to (15a), forming a microwave oven heating circuit.
上=rのような従来の高周波加熱装置では、フィラメン
ト(15a)を加熱するヒータ電力とマグネトロンis
に供給する高圧電力を同一トランスから供給しているた
め、第4図に示すように半導体スイッチ(9)のベース
エミッタ間に印加する電圧fa)に対しフィラメント(
l5a)を加熱するまでの時間マグネトロンαりは約−
10KVにも及ぶ高圧パルス(blを発生するという問
題点があった。In a conventional high-frequency heating device like the one shown above, the heater power and magnetron is used to heat the filament (15a).
Since the high voltage power supplied to the semiconductor switch (9) is supplied from the same transformer, the filament (
The time it takes to heat up the magnetron is approximately -
There was a problem in that a high voltage pulse (bl) of up to 10 KV was generated.
この発明に係る高周波加熱装置は、商用1糎を直情電源
に変換するコンバータ、このコンバータに接続され半導
体スイッチを有するインバータ。The high-frequency heating device according to the present invention includes a converter for converting commercial power into direct power, and an inverter connected to the converter and having a semiconductor switch.
このインバータにより付勢されマグネトロンに高圧パル
スを供給するとともにマグネトロンのフィラメントにヒ
ータ電力を供給する高周波トランス。A high-frequency transformer is energized by this inverter and supplies high-voltage pulses to the magnetron, as well as heater power to the magnetron's filament.
および起動時にマグネトロンが発振するまでの間上記半
導体スイッチの導通時間を短くして高圧パルスを抑制す
る半導体スイッチ制御手段を備えたものである。and a semiconductor switch control means for suppressing high voltage pulses by shortening the conduction time of the semiconductor switch until the magnetron oscillates at startup.
この発明においては半導体スイッチ制御手段が。 In this invention, the semiconductor switch control means is used.
起動時にマグネトロンが発振するまでの闇半導体スイッ
チの導通時間を短くして高圧パルスを抑制する。High voltage pulses are suppressed by shortening the conduction time of the dark semiconductor switch until the magnetron oscillates at startup.
この発明の一実施例を第1図1.第2図により訣明する
。An embodiment of this invention is shown in FIG. The details are explained in Figure 2.
図中111〜(15a)は従来の高周波加熱装置と同一
のものである。(1Gはマグネトロン719と2次巻線
(7)とのザに設けられたマグネトロン発振時の電流を
検出する検出器、αηはこの検出器の検出信号を受けて
半導体スイッチ(91の導通時間を短くする半導体スイ
ッチ制御手段である。この半導体スイッチ制御手段an
は、半導体スイッチ導通時間制御回路01+と半導体ス
イッチ制御回路09とにより構成され半導体スイッチ1
9)のベースに接続されて督り、起動時にマグネトロン
a9が発振するまでの闇半導体スイッチ(9)の導通時
間を短くシ、高圧パルスの発生を抑制している。In the figure, 111 to (15a) are the same as conventional high frequency heating devices. (1G is a detector that detects the current during magnetron oscillation, which is installed between the magnetron 719 and the secondary winding (7), and αη is the conduction time of the semiconductor switch (91) that receives the detection signal from this detector. This semiconductor switch control means an
The semiconductor switch 1 is composed of a semiconductor switch conduction time control circuit 01+ and a semiconductor switch control circuit 09.
The conduction time of the dark semiconductor switch (9) until the magnetron a9 oscillates at startup is shortened, and the generation of high voltage pulses is suppressed.
王妃の様に構成された高周波加熱装置においては、第2
図に示すように、半導体スイッチ(91のベースエミッ
タ間に印加する電圧(elのton時間をマグネトロン
発振までの間短かくすることによりマグネトロン高圧パ
ルス(elを約−6KV抑制にすることが出来高圧コン
デンサα3.高圧ダイオ−10着。In a high frequency heating device configured like a queen, the second
As shown in the figure, by shortening the ton time of the voltage (el) applied between the base and emitter of the semiconductor switch (91) until the magnetron oscillates, the magnetron high voltage pulse (el) can be suppressed by approximately -6 KV. Capacitor α3. High voltage diode - 10 pieces.
マグネトロンαSを高圧パルスより保護することができ
る。The magnetron αS can be protected from high voltage pulses.
ga2図において(di (I′i検出器αGの検出電
圧であり。In figure ga2, (di (I'i is the detection voltage of detector αG).
マグネトロン発振時に電流を検出した検出器aθはその
電流をこれを電圧に変え、半導体スイッチ導通時間制御
回路ON IIC−qグネトロンaりが発振を開始した
ことを知らせる。これを受けて半導体スイッチ導通時間
制御回路+I11は半導体スイッチ制御回路(19に通
常のTON’ ”OFF時間指令を出す。−そしてマグ
ネトロン発掘後はマグネトロンt1りの電圧は一4KV
、電流も一定となるため、半導体スイッチ制御口跡【9
は半導体スイッチ(91のベース・エミッタ間に通常の
TON −TOFF時間指令を出し続ける。The detector aθ which detects the current during the magnetron oscillation converts the current into a voltage and notifies the semiconductor switch conduction time control circuit ON IIC-q that the magnetron a has started oscillation. In response to this, the semiconductor switch conduction time control circuit +I11 issues a normal TON''' OFF time command to the semiconductor switch control circuit (19).-And after the magnetron is excavated, the voltage of the magnetron t1 is -4KV.
, since the current is also constant, the semiconductor switch control port trace [9
continues to issue the normal TON-TOFF time command between the base and emitter of the semiconductor switch (91).
以上説明した通り、この発明によれば半導体スイッチ制
御手段が、起動時にマグネトロンが発振するまでの聞手
導体スイッチの導通時間を短くして高圧パルスを抑制す
るようにしたので、高圧ダ1オード、高圧コンデンサ、
マグネトロンを保護し、高周波加熱装置の寿命を伸ばす
ことが出来る。As explained above, according to the present invention, the semiconductor switch control means suppresses high-voltage pulses by shortening the conduction time of the listener conductor switch until the magnetron oscillates at startup, so that the high-voltage diode, high voltage capacitor,
It can protect the magnetron and extend the life of the high frequency heating device.
第1図はこの発明の高周波加熱装置の一実施例を示す回
路図、第2図はマグネトロン発振時の電圧波形図、第3
図は従来の高周波加熱装置の回路図、第4図はマグネト
ロ発振時の電圧波形図である。
図において、(1)は商用電J +2+はコンバータ。
(5)け高周波トランス、(91は半導体スイッチ、T
l21はインバー−j、αりはマグネトロン、 (+
5a)はフィラメント、側は検出手段、a?)は半導体
スイッチ制御手段である。
各図中、同一符号は同−又は相当部分を示す。FIG. 1 is a circuit diagram showing an embodiment of the high frequency heating device of the present invention, FIG. 2 is a voltage waveform diagram during magnetron oscillation, and FIG.
The figure is a circuit diagram of a conventional high-frequency heating device, and FIG. 4 is a voltage waveform diagram during magnetro oscillation. In the figure, (1) is a commercial electricity J and +2+ is a converter. (5) High frequency transformer (91 is a semiconductor switch, T
l21 is invar-j, α is magnetron, (+
5a) is the filament, side is the detection means, a? ) is a semiconductor switch control means. In each figure, the same reference numerals indicate the same or corresponding parts.
Claims (1)
ータに接続され半導体スイッチを有するインバータ、こ
のインバータにより付勢されマグネトロンに高圧パルス
を供給するとともにマグネトロンのフィラメントにヒー
タ電力を供給する高周波トランス、および起動時にマグ
ネトロンが発振するまでの間上記半導体スイッチの導通
時間を短くして高圧パルスを抑制する半導体スイッチ制
御手段を備えたことを特徴とする高周波加熱装置。A converter that converts commercial power to DC power; an inverter connected to this converter and having a semiconductor switch; a high-frequency transformer energized by the inverter to supply high-voltage pulses to the magnetron and heater power to the magnetron filament; A high-frequency heating device comprising semiconductor switch control means for suppressing high-voltage pulses by shortening the conduction time of the semiconductor switch until the magnetron oscillates.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22807388A JPH0278183A (en) | 1988-09-12 | 1988-09-12 | High frequency heating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22807388A JPH0278183A (en) | 1988-09-12 | 1988-09-12 | High frequency heating device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0278183A true JPH0278183A (en) | 1990-03-19 |
Family
ID=16870771
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22807388A Pending JPH0278183A (en) | 1988-09-12 | 1988-09-12 | High frequency heating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0278183A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02119090A (en) * | 1988-10-28 | 1990-05-07 | Matsushita Electric Ind Co Ltd | Magnetron electric power source supplying apparatus |
US5224027A (en) * | 1991-05-16 | 1993-06-29 | Samsung Electronics Co., Ltd. | Power supply apparatus for magnetron driving |
JP2009199975A (en) * | 2008-02-25 | 2009-09-03 | Panasonic Corp | High-frequency heating power source |
-
1988
- 1988-09-12 JP JP22807388A patent/JPH0278183A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02119090A (en) * | 1988-10-28 | 1990-05-07 | Matsushita Electric Ind Co Ltd | Magnetron electric power source supplying apparatus |
US5224027A (en) * | 1991-05-16 | 1993-06-29 | Samsung Electronics Co., Ltd. | Power supply apparatus for magnetron driving |
JP2009199975A (en) * | 2008-02-25 | 2009-09-03 | Panasonic Corp | High-frequency heating power source |
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