JPH02733U - - Google Patents
Info
- Publication number
- JPH02733U JPH02733U JP7991288U JP7991288U JPH02733U JP H02733 U JPH02733 U JP H02733U JP 7991288 U JP7991288 U JP 7991288U JP 7991288 U JP7991288 U JP 7991288U JP H02733 U JPH02733 U JP H02733U
- Authority
- JP
- Japan
- Prior art keywords
- holding table
- partition
- processed
- holding
- gas chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7991288U JPH02733U (en:Method) | 1988-06-14 | 1988-06-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7991288U JPH02733U (en:Method) | 1988-06-14 | 1988-06-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02733U true JPH02733U (en:Method) | 1990-01-05 |
Family
ID=31304758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7991288U Pending JPH02733U (en:Method) | 1988-06-14 | 1988-06-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02733U (en:Method) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011523770A (ja) * | 2008-06-04 | 2011-08-18 | ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド | プラテンの温度を変える技術 |
-
1988
- 1988-06-14 JP JP7991288U patent/JPH02733U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011523770A (ja) * | 2008-06-04 | 2011-08-18 | ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド | プラテンの温度を変える技術 |