JPH026523U - - Google Patents
Info
- Publication number
- JPH026523U JPH026523U JP8594688U JP8594688U JPH026523U JP H026523 U JPH026523 U JP H026523U JP 8594688 U JP8594688 U JP 8594688U JP 8594688 U JP8594688 U JP 8594688U JP H026523 U JPH026523 U JP H026523U
- Authority
- JP
- Japan
- Prior art keywords
- lid
- glass
- adhesive
- thick plate
- plate glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 claims description 5
- 239000005357 flat glass Substances 0.000 claims description 3
- 239000000853 adhesive Substances 0.000 claims 2
- 230000001070 adhesive effect Effects 0.000 claims 2
- 229920002050 silicone resin Polymers 0.000 claims 1
Landscapes
- Closures For Containers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8594688U JPH026523U (enExample) | 1988-06-29 | 1988-06-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8594688U JPH026523U (enExample) | 1988-06-29 | 1988-06-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH026523U true JPH026523U (enExample) | 1990-01-17 |
Family
ID=31310599
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8594688U Pending JPH026523U (enExample) | 1988-06-29 | 1988-06-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH026523U (enExample) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6035026B2 (ja) * | 1979-09-08 | 1985-08-12 | 株式会社 堀場製作所 | 超低濃度イオン測定装置の校正方法 |
-
1988
- 1988-06-29 JP JP8594688U patent/JPH026523U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6035026B2 (ja) * | 1979-09-08 | 1985-08-12 | 株式会社 堀場製作所 | 超低濃度イオン測定装置の校正方法 |