JPH0265220A - Device for recognizing mark of semiconductor substrate - Google Patents

Device for recognizing mark of semiconductor substrate

Info

Publication number
JPH0265220A
JPH0265220A JP63217927A JP21792788A JPH0265220A JP H0265220 A JPH0265220 A JP H0265220A JP 63217927 A JP63217927 A JP 63217927A JP 21792788 A JP21792788 A JP 21792788A JP H0265220 A JPH0265220 A JP H0265220A
Authority
JP
Japan
Prior art keywords
mark
light
semiconductor substrate
semiconductor wafer
element pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63217927A
Other languages
Japanese (ja)
Other versions
JP2752645B2 (en
Inventor
Keiichi Sugiura
杉浦 恵一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu Ltd filed Critical NEC Kyushu Ltd
Priority to JP63217927A priority Critical patent/JP2752645B2/en
Publication of JPH0265220A publication Critical patent/JPH0265220A/en
Application granted granted Critical
Publication of JP2752645B2 publication Critical patent/JP2752645B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To prevent any reflected ray on an underneath layer around a mark or an element pattern from coming within the range of an identification device thereby enabling the mark to be identified without fail by a method wherein a lighting system to selectively spot-light the mark only is provided. CONSTITUTION:An optical film 3 is used as a lighting device to identify a mark 2 on a semiconductor wafer 1; the end of the optical fiber 3 is closely arranged on the surface of the semiconductor wafer 1; and a focussing lens 4 is arranged on the end to focus the light on the mark 2 to be spot-lighted. Thus, the light emitted from a power supply and passing through the optical fiber 3 is focussed on the mark 2 by the focussing lens 4 to light the mark 2 only. Through these procedures, when the mark 2 is observed by a TV camera or an optical microscope, the mark 2 can be identified without fail not affected by any reflected ray on an underneath layer around the mark 2 or an element pattern not coming within the range of the identification device.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体基板に施された文字、記号等のマークを
認識するための認識装置に関し、特にマークを照明する
装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a recognition device for recognizing marks such as characters and symbols made on a semiconductor substrate, and particularly to a device for illuminating the marks.

〔従来の技術〕[Conventional technology]

一般に半導体装置の製造工程では、処理工程の前に半導
体基板の種類等を確認する意味で半導体基板に施した文
字、記号等のマークを光学的方法を用いて認識すること
が行われている。従来、この種の認識装置は、対象とな
る半導体基板の略全面を光学ランプ等で照明する一方、
TVカメラや光学顕微鏡等でマークを読み取る構成とな
っている。
2. Description of the Related Art Generally, in the manufacturing process of semiconductor devices, marks such as letters and symbols made on a semiconductor substrate are recognized using an optical method in order to confirm the type of the semiconductor substrate before a processing step. Conventionally, this type of recognition device illuminates almost the entire surface of the target semiconductor substrate with an optical lamp, etc.
The mark is read with a TV camera, optical microscope, etc.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上述した従来の認識装置では、マークを照明するための
装置が、対象となる半導体基板の全体、或いはマークを
含む比較的に広い領域に対して照明を行っている。この
ため、マーク周囲における半導体基板の下地層による光
の反射や、既に形成している素子パターンが読み取り視
野内に入り、これがマークと混同を起こし、マークの認
識が困難になる。特に、自動認識装置では、マークのパ
ターンと素子パターンや反射光等を明確に区別できなく
なり、認識誤りが発生し易くなる。
In the conventional recognition device described above, the device for illuminating the mark illuminates the entire target semiconductor substrate or a relatively wide area including the mark. For this reason, light is reflected by the base layer of the semiconductor substrate around the mark, and an already formed element pattern enters the reading field of view, causing confusion with the mark and making it difficult to recognize the mark. In particular, automatic recognition devices cannot clearly distinguish between mark patterns, element patterns, reflected light, etc., and recognition errors are likely to occur.

本発明は正しい認識を行うことができる半導体基板のマ
ーク認識装置を提供することを目的とする。
An object of the present invention is to provide a mark recognition device for a semiconductor substrate that can perform correct recognition.

〔課題を解決するための手段〕[Means to solve the problem]

本発明の半導体基板のマーク認識装置は、半導体基板の
表面一部に施されたマークを認識する装置に、マークの
みを選択的にスポット照明する照明光を設けている。
A mark recognition device for a semiconductor substrate according to the present invention includes an apparatus for recognizing a mark formed on a part of the surface of a semiconductor substrate, and is provided with illumination light for selectively spot illuminating only the mark.

〔作用〕[Effect]

上述した構成では、マーク周囲の下地層の反射光や素子
パターンが認識装置の視野内に入ることが防止でき、確
実なマーク認識が実現できる。
With the above-mentioned configuration, it is possible to prevent reflected light from the underlying layer around the mark and the element pattern from entering the field of view of the recognition device, thereby realizing reliable mark recognition.

〔実施例〕〔Example〕

次に、本発明を図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.

第1図は本発明の第1実施例の斜視図である。FIG. 1 is a perspective view of a first embodiment of the invention.

図において、1は半導体基板、即ち半導体ウェハであり
、その表面一部に文字からなるマーク2を施しである。
In the figure, reference numeral 1 denotes a semiconductor substrate, that is, a semiconductor wafer, and a mark 2 consisting of letters is provided on a part of its surface.

この半導体ウェハ1に対してマーク2の認識を行うため
の照明装置として、ここでは一端を図外の光源に接続し
た光ファイバ3を用い、この光ファイバ3の先端を半導
体ウェハ1の表面に近接配置し、かつその先端位置に収
束レンズ4を配設し、前記マーク2に対して光を収束さ
せてスポット照明するように構成している。
As an illumination device for recognizing the mark 2 on the semiconductor wafer 1, an optical fiber 3 with one end connected to a light source (not shown) is used, and the tip of the optical fiber 3 is brought close to the surface of the semiconductor wafer 1. A converging lens 4 is disposed at the tip of the mark 2 to converge light onto the mark 2 for spot illumination.

このため、電源からの光は光ファイバ3を通った後、収
束レンズ4によってマーク2上に収束され、マーク2の
みを照明する。これにより、図外のTVカメラや光学顕
微鏡でマーク2を認識した際には、マーク2の周囲の下
地層による反射光や素子パターンが視野内に入ることは
なく、これらの影響を無くしてマークを確実に認識する
ことが可能となる。
Therefore, after the light from the power source passes through the optical fiber 3, it is converged onto the mark 2 by the converging lens 4, and only the mark 2 is illuminated. As a result, when mark 2 is recognized with a TV camera or optical microscope (not shown), reflected light from the underlying layer around mark 2 and the element pattern will not enter the field of view, eliminating these influences and recognizing the mark. It becomes possible to reliably recognize the

第2図は本発明の第2実施例の正面図であり、1は半導
体ウェハ、2はマークである。また、5は照明用の電源
、6はTVカメラ等の認識装置、7はこのTVカメラ6
の前に置かれたハーフミラ、8はマーク2上に置かれた
遮光板である。ここで、遮光板8はマーク2に対応する
領域にのみ開口8aを設けている。
FIG. 2 is a front view of a second embodiment of the present invention, where 1 is a semiconductor wafer and 2 is a mark. In addition, 5 is a power source for lighting, 6 is a recognition device such as a TV camera, and 7 is this TV camera 6.
8 is a half mirror placed in front of the mark 2, and 8 is a light shielding plate placed on the mark 2. Here, the light shielding plate 8 has an opening 8a only in a region corresponding to the mark 2.

この構成では、光源5から出た光はハーフミラ−7によ
り反射され、半導体ウェハ1に向けて照射される。そし
て、その大部分は遮光板8で遮られるが、開口8aを通
ってマーク2の領域のみスポット的に照射する。そして
、この照射されたマーク2をTVカメラ6で撮像し、マ
ークの認識を行う。
In this configuration, the light emitted from the light source 5 is reflected by the half mirror 7 and irradiated toward the semiconductor wafer 1. Most of the light is blocked by the light shielding plate 8, but only the area of the mark 2 is irradiated in a spot through the opening 8a. The illuminated mark 2 is then imaged by a TV camera 6, and the mark is recognized.

したがって、光源5の光はマーク2のみを照射すること
になり、その周囲の下地層による反射や素子パターンに
影響されることなく、好適なマークの認識が可能となる
Therefore, the light from the light source 5 irradiates only the mark 2, making it possible to appropriately recognize the mark without being affected by the reflection from the surrounding underlying layer or the element pattern.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明は、マークのみを選択的にス
ポット照明する照明系を設けているので、マーク周囲の
下地層の反射光や素子パターンが認識装置の視野内に入
ることが防止でき、確実なマーク認識が実現できる
As explained above, since the present invention is provided with an illumination system that selectively illuminates only the mark with a spot, it is possible to prevent reflected light from the underlying layer around the mark and the element pattern from entering the field of view of the recognition device. Reliable mark recognition can be achieved

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の第1実施例の要部を示す斜視図、第2
図は本発明の第2実施例の正面図である。 1・・・半導体ウェハ、2・・・マーク、3・・・光フ
ァイバ、4・・・収束レンズ、5・・・光源、6・・・
TVカメラ、7・・・ハーフミラ−18・・・遮光板、
8a・・・開口。
Fig. 1 is a perspective view showing the main parts of the first embodiment of the present invention;
The figure is a front view of a second embodiment of the invention. DESCRIPTION OF SYMBOLS 1... Semiconductor wafer, 2... Mark, 3... Optical fiber, 4... Converging lens, 5... Light source, 6...
TV camera, 7...half mirror-18...shading plate,
8a...Opening.

Claims (1)

【特許請求の範囲】[Claims] 1、半導体基板の表面一部に施されたマークを認識する
装置において、前記マークのみを選択的にスポット照明
する照明系を有することを特徴とする半導体基板のマー
ク認識装置。
1. A mark recognition device for a semiconductor substrate, characterized in that the device recognizes a mark made on a part of the surface of a semiconductor substrate, the device comprising an illumination system that selectively spotlights only the mark.
JP63217927A 1988-08-31 1988-08-31 Mark recognition device for semiconductor substrate Expired - Fee Related JP2752645B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63217927A JP2752645B2 (en) 1988-08-31 1988-08-31 Mark recognition device for semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63217927A JP2752645B2 (en) 1988-08-31 1988-08-31 Mark recognition device for semiconductor substrate

Publications (2)

Publication Number Publication Date
JPH0265220A true JPH0265220A (en) 1990-03-05
JP2752645B2 JP2752645B2 (en) 1998-05-18

Family

ID=16711905

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63217927A Expired - Fee Related JP2752645B2 (en) 1988-08-31 1988-08-31 Mark recognition device for semiconductor substrate

Country Status (1)

Country Link
JP (1) JP2752645B2 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5835915A (en) * 1981-08-28 1983-03-02 Jeol Ltd Discrimination of substrate for semiconductor device
JPS61256647A (en) * 1985-05-09 1986-11-14 Nec Corp Inspection of semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5835915A (en) * 1981-08-28 1983-03-02 Jeol Ltd Discrimination of substrate for semiconductor device
JPS61256647A (en) * 1985-05-09 1986-11-14 Nec Corp Inspection of semiconductor device

Also Published As

Publication number Publication date
JP2752645B2 (en) 1998-05-18

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