JPH0265124U - - Google Patents
Info
- Publication number
- JPH0265124U JPH0265124U JP14367488U JP14367488U JPH0265124U JP H0265124 U JPH0265124 U JP H0265124U JP 14367488 U JP14367488 U JP 14367488U JP 14367488 U JP14367488 U JP 14367488U JP H0265124 U JPH0265124 U JP H0265124U
- Authority
- JP
- Japan
- Prior art keywords
- flow rate
- detection
- pressure
- section
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001514 detection method Methods 0.000 claims description 13
- 239000013078 crystal Substances 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Measuring Volume Flow (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14367488U JPH0265124U (cs) | 1988-11-02 | 1988-11-02 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14367488U JPH0265124U (cs) | 1988-11-02 | 1988-11-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0265124U true JPH0265124U (cs) | 1990-05-16 |
Family
ID=31410704
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14367488U Pending JPH0265124U (cs) | 1988-11-02 | 1988-11-02 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0265124U (cs) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1194603A (ja) * | 1997-06-24 | 1999-04-09 | Balzers Ag | 真空設備への実際のガスの流れを監視するための方法および真空処理装置 |
| WO2019225496A1 (en) * | 2018-05-23 | 2019-11-28 | Hitachi Metals, Ltd. | Multi-chamber rate-of-change system for gas flow verification |
-
1988
- 1988-11-02 JP JP14367488U patent/JPH0265124U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1194603A (ja) * | 1997-06-24 | 1999-04-09 | Balzers Ag | 真空設備への実際のガスの流れを監視するための方法および真空処理装置 |
| WO2019225496A1 (en) * | 2018-05-23 | 2019-11-28 | Hitachi Metals, Ltd. | Multi-chamber rate-of-change system for gas flow verification |
| JP2021526629A (ja) * | 2018-05-23 | 2021-10-07 | 日立金属株式会社 | ガス流量検証のためのマルチチャンバ変化率システム |