JPH0262842A - Production of phorone - Google Patents
Production of phoroneInfo
- Publication number
- JPH0262842A JPH0262842A JP63213754A JP21375488A JPH0262842A JP H0262842 A JPH0262842 A JP H0262842A JP 63213754 A JP63213754 A JP 63213754A JP 21375488 A JP21375488 A JP 21375488A JP H0262842 A JPH0262842 A JP H0262842A
- Authority
- JP
- Japan
- Prior art keywords
- acetone
- reaction
- holon
- phorone
- acid catalyst
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 22
- MTZWHHIREPJPTG-UHFFFAOYSA-N phorone Chemical compound CC(C)=CC(=O)C=C(C)C MTZWHHIREPJPTG-UHFFFAOYSA-N 0.000 title abstract description 7
- 229930193351 phorone Natural products 0.000 title abstract 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims abstract description 55
- 238000006243 chemical reaction Methods 0.000 claims abstract description 54
- 239000003377 acid catalyst Substances 0.000 claims abstract description 33
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims abstract description 30
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 22
- 239000013638 trimer Substances 0.000 claims abstract description 19
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims abstract description 15
- 239000003054 catalyst Substances 0.000 claims abstract description 10
- 238000010438 heat treatment Methods 0.000 claims abstract description 9
- 238000005882 aldol condensation reaction Methods 0.000 claims abstract description 5
- 238000006297 dehydration reaction Methods 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 5
- 239000002994 raw material Substances 0.000 abstract description 4
- 239000003905 agrochemical Substances 0.000 abstract description 2
- 239000002216 antistatic agent Substances 0.000 abstract description 2
- 150000001875 compounds Chemical class 0.000 abstract description 2
- 229920006122 polyamide resin Polymers 0.000 abstract description 2
- OZXIZRZFGJZWBF-UHFFFAOYSA-N 1,3,5-trimethyl-2-(2,4,6-trimethylphenoxy)benzene Chemical compound CC1=CC(C)=CC(C)=C1OC1=C(C)C=C(C)C=C1C OZXIZRZFGJZWBF-UHFFFAOYSA-N 0.000 abstract 2
- 239000003513 alkali Substances 0.000 abstract 2
- 239000002585 base Substances 0.000 abstract 2
- SHOJXDKTYKFBRD-UHFFFAOYSA-N mesityl oxide Natural products CC(C)=CC(C)=O SHOJXDKTYKFBRD-UHFFFAOYSA-N 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 238000004821 distillation Methods 0.000 description 12
- 239000011261 inert gas Substances 0.000 description 12
- 150000007524 organic acids Chemical class 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 7
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 238000000354 decomposition reaction Methods 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- 238000000746 purification Methods 0.000 description 5
- 238000010992 reflux Methods 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000004817 gas chromatography Methods 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 230000005587 bubbling Effects 0.000 description 3
- 239000012295 chemical reaction liquid Substances 0.000 description 3
- YZUPZGFPHUVJKC-UHFFFAOYSA-N 1-bromo-2-methoxyethane Chemical compound COCCBr YZUPZGFPHUVJKC-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000005984 hydrogenation reaction Methods 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 150000003509 tertiary alcohols Chemical class 0.000 description 2
- 239000002351 wastewater Substances 0.000 description 2
- QSAGRPNCOXYADL-UHFFFAOYSA-N 6-hydroxy-2,6-dimethylhept-2-en-4-one Chemical compound CC(C)=CC(=O)CC(C)(C)O QSAGRPNCOXYADL-UHFFFAOYSA-N 0.000 description 1
- 229910000564 Raney nickel Inorganic materials 0.000 description 1
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 238000001577 simple distillation Methods 0.000 description 1
- 238000009331 sowing Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical class [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
- C07C45/67—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton
- C07C45/68—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
- C07C45/72—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by reaction of compounds containing >C = O groups with the same or other compounds containing >C = O groups
- C07C45/74—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by reaction of compounds containing >C = O groups with the same or other compounds containing >C = O groups combined with dehydration
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/78—Separation; Purification; Stabilisation; Use of additives
- C07C45/81—Separation; Purification; Stabilisation; Use of additives by change in the physical state, e.g. crystallisation
- C07C45/82—Separation; Purification; Stabilisation; Use of additives by change in the physical state, e.g. crystallisation by distillation
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Crystallography & Structural Chemistry (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ホロンの製造方法に係り、特に、アセトンを
原料として、アルカリ性触媒によるアルドール縮合を経
由するメチルイソブチルケトン製造プラントに於ける蒸
留分離残渣油中に存在するアセトン三量体からホロンを
製造する方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for producing holon, and in particular, the present invention relates to a method for producing holon, and in particular, a method for producing holon using acetone as a raw material and distillation separation in a methyl isobutyl ketone production plant via aldol condensation using an alkaline catalyst. The present invention relates to a method for producing holon from acetone trimer present in residual oil.
ホロンはアセトンに塩化水素を飽和させるか、イソプロ
ピルアルコールを脱水硫酸亜鉛上に通して製造される。Holon is produced by saturating acetone with hydrogen chloride or by passing isopropyl alcohol over dehydrated zinc sulfate.
ホロンは農薬、船底塗料、帯電防止剤、ポリアミド樹脂
等の原料に使用され、樹脂添加剤の原料として有用であ
る。Holon is used as a raw material for agricultural chemicals, ship bottom paints, antistatic agents, polyamide resins, etc., and is useful as a raw material for resin additives.
ところで、工業プラントに於いて、アセトンからは、タ
ンチルオキシドが製造され、タンチルオキシドからはメ
チルイソブチルケトンが製造される。このタンチルオキ
シドはアセトンの二量体であるが、蒸留分離精製時に残
渣中に副生成物として、ホロン等のアセトン三量体を生
じる。これらのアセトン三量体には、ホロン(PHO)
の外に2.6−シヒドロキシー2,6−シメチルー4−
ヘプタノン(DDH)、6−ヒドロキシ−2,6−シメ
チルー2−ヘプテン−4−オン(S−PHOL 2,2
,6.6−チトラメチルテトラヒドロピランー4−オン
(TTPK)等があり、以下の平衡関係が存在している
。By the way, in industrial plants, tantyl oxide is produced from acetone, and methyl isobutyl ketone is produced from tantyl oxide. This tantyl oxide is a dimer of acetone, but acetone trimers such as holone are produced as by-products in the residue during distillation, separation and purification. These acetone trimers contain holon (PHO)
In addition to 2,6-cyhydroxy-2,6-cymethyl-4-
Heptanone (DDH), 6-hydroxy-2,6-dimethyl-2-hepten-4-one (S-PHOL 2,2
, 6,6-titramethyltetrahydropyran-4-one (TTPK), etc., and the following equilibrium relationship exists.
(A)
(DAA)
(MO)
(CH,) 2CCH,CC)(IC(CH3)!(D
DI()
(CH,) 2C=CIICCIl=C(C11,)。(A) (DAA) (MO) (CH,) 2CCH,CC)(IC(CH3)!(D
DI() (CH,) 2C=CIICCIl=C(C11,).
(TTPK) (PHO) OCH。(TTPK) (PHO) OCH.
(CH+) gc=cHccHzc=cHz(PHO−
iso)
〔発明が解決しようとする問題点〕
しかしながら、このような残渣中からホロンを蒸留精製
する場合、ホロン以外のアセトン三量体が多量に存在す
るためホロンの収率が悪く、ホロン以外のアセトン三量
体は、ホロンの精製時に破棄され、不経済である。また
、残渣油中には、沸点の低いものから順に、水、タンチ
ルオキシド、ジアセトンアルコール、ホロン異性体、2
.2゜6.6−チトラメチルテトラヒドロビランー4−
オン、ホロン、6−ヒドロキシ−2,6−シメチルー2
−ヘプテン−4−オンが混合されている。(CH+) gc=cHccHzc=cHz(PHO-
iso) [Problems to be solved by the invention] However, when purifying holon from such a residue by distillation, the yield of holon is poor due to the presence of a large amount of acetone trimer other than holon; Acetone trimer is discarded during holon purification and is uneconomical. In addition, in the residual oil, water, tantyl oxide, diacetone alcohol, holone isomer,
.. 2゜6.6-Titramethyltetrahydrobilane-4-
on, holon, 6-hydroxy-2,6-cymethyl-2
- Hepten-4-one is mixed.
この為、有効なホロン及びホロン異性体を2.26.6
−チトラメチルテトラヒドロピランー4−オンから節単
に蒸留分離できない不具合がある本発明はこのような事
情に鑑みて成されたもので、タンチルオキシド製造時に
、残渣油中からホロン以外のアセトン三量体を破棄する
ことなく、ホロンを高収率に得ることのできるホロンの
製造方法を提供することを目的としている。For this reason, the effective holons and holon isomers are defined as 2.26.6
The present invention was developed in view of the above circumstances, in which there is a problem in that simple distillation separation is not possible from titramethyltetrahydropyran-4-one. The purpose of the present invention is to provide a method for producing holons that can obtain holons in high yield without discarding the body.
本発明は前記目的を達成するために、アセトンをアルカ
リ性触媒でアルドール縮合反応させると共に、蒸留分離
して得られるタンチルオキシドの残留物としてのアセト
ン三量体が含まれる残渣油を、酸触媒中で加熱脱水する
と共に蒸留してホロンを分離精製することを特徴として
いる。In order to achieve the above object, the present invention subjects acetone to an aldol condensation reaction using an alkaline catalyst, and then distills and separates the residual oil containing acetone trimer as a residue of tantyl oxide, into an acid catalyst. It is characterized by separating and purifying holons by heating and dehydrating them and distilling them.
また、酸触媒には燐酸系の脱水触媒を使用することがこ
のましい。Further, it is preferable to use a phosphoric acid-based dehydration catalyst as the acid catalyst.
反応条件に於いては、残渣油を酸触媒中で加熱脱水する
際に生成する水を反応系外に分離することも特徴であり
、残渣油の反応液中に不活性ガスをバブリングして、生
成水の反応系外への分離を促進してもよい。また、残渣
油の反応液の上方に不活性ガスを流通させて、生成水の
反応系外への分離を促進しても良い。The reaction conditions are characterized by separating the water generated when the residual oil is heated and dehydrated in an acid catalyst out of the reaction system, and by bubbling an inert gas into the reaction liquid of the residual oil. Separation of produced water to the outside of the reaction system may be promoted. Alternatively, an inert gas may be passed above the residual oil reaction solution to promote separation of the produced water out of the reaction system.
残渣油を酸触媒で加熱脱水した後、5時間以上貯溜する
場合に、温度を30℃以下に保存することを特徴とする
。When residual oil is heated and dehydrated with an acid catalyst and then stored for 5 hours or more, the temperature is kept at 30°C or lower.
残渣油を酸触媒で加熱脱水した後、ホロンを蒸留分離す
る場合、酸触媒を分離除去すると共に、アルカリ水溶液
を加えて反応残渣油中の有機酸を分離したのち蒸留する
ことも特徴とする。When the residual oil is heated and dehydrated with an acid catalyst and then the holon is separated by distillation, the acid catalyst is separated and removed, and an aqueous alkaline solution is added to separate the organic acid in the reaction residual oil, followed by distillation.
本発明に係るホロンの製造方法によれば、酸触媒中で加
熱することにより、残渣中のホロン以外の2.6−シヒ
ドロキシー2.6−シメチルー4−ヘプタノン、2,2
,6.6−チトラメチルテトラヒドロピランー4−オン
等のアセトン三量体は、脱水反応によってホロンとなる
。特に、2゜6−シヒドロキシー2.6−シメチルー4
−ヘプタノン、6−ヒドロキシ−2,6−シメチルー2
−へブテン−4−オン等の第3級アルコールは容易にホ
ロンに成る。また、酸触媒には、硫酸、硝酸、塩酸、燐
酸が使用される。酸触媒は生成したホロンの分解作用等
の悪影響もみられるが、燐酸系触媒はこの分解作用が少
なく、本発明の使用に好適である。According to the method for producing holon according to the present invention, by heating in an acid catalyst, 2,6-cyhydroxy-2,6-dimethyl-4-heptanone, 2,2
, 6,6-titramethyltetrahydropyran-4-one and other acetone trimers become holons through dehydration reaction. In particular, 2゜6-cyhydroxy-2,6-cymethyl-4
-heptanone, 6-hydroxy-2,6-cymethyl-2
Tertiary alcohols such as -hebuten-4-one easily convert to holon. Moreover, sulfuric acid, nitric acid, hydrochloric acid, and phosphoric acid are used as acid catalysts. Although acid catalysts have adverse effects such as decomposition of the generated holons, phosphoric acid catalysts have less of this decomposition and are suitable for use in the present invention.
また、反応条件に於いて、反応系を減圧にすると、残渣
油中の反応系に生じるタンチルオキシド等の加熱還流温
度を130℃以下に下げて行うことができる。加熱還流
温度が高いと、ホロンの分解が促進され好ましくない。Furthermore, under the reaction conditions, if the pressure of the reaction system is reduced, the heating reflux temperature of tantyl oxide, etc. generated in the reaction system in the residual oil can be lowered to 130° C. or lower. If the heating reflux temperature is high, decomposition of holon will be promoted, which is not preferable.
反応条件に於いて水分を反応系外に分離すると、残渣油
の各アセトン三量体の平衡関係がくずれるため、2,2
,6.6−チトラメチルテトラヒドロビランー4−オン
等の第3級アルコール以外のものも、簡単にホロンに移
行する。If water is separated out of the reaction system under the reaction conditions, the equilibrium relationship of each acetone trimer in the residual oil will be disrupted;
, 6.6-titramethyltetrahydrobilan-4-one and other alcohols other than tertiary alcohols are also easily converted to holon.
更に、反応残渣油中で不活性ガスのバブリングを行うと
、反応液に生じる水分が効率よく除去され、反応残渣油
の上方に不活性ガスを流通させても水分の除去が促進さ
れる。Furthermore, bubbling of an inert gas in the reaction residue oil efficiently removes moisture generated in the reaction solution, and even if the inert gas is passed above the reaction residue oil, the removal of moisture is promoted.
反応残渣油中からのホロンの蒸留精製に於いて、予め酸
触媒を反応系から除くことにより、反応時の反応器の腐
食が防止され、アルカリ性溶液によって残渣油中の有機
酸不純物を容易に除去できる。 また、残渣油の反応後
に反応液を貯溜して置く場合、温度を30℃以下に保持
すると、2゜2.6.6−チトラメチルテトラヒドロピ
ランー4−オンが水和によって再び生成することが防止
される。In the distillation purification of holon from reaction residue oil, by removing the acid catalyst from the reaction system in advance, corrosion of the reactor during the reaction is prevented, and organic acid impurities in the residue oil are easily removed using an alkaline solution. can. In addition, when storing the reaction solution after the reaction of the residual oil, if the temperature is kept below 30°C, 2°2.6.6-titramethyltetrahydropyran-4-one may be regenerated by hydration. Prevented.
以下、本発明の好ましい態様を詳説する。 Hereinafter, preferred embodiments of the present invention will be explained in detail.
歿渣皿
本発明に使用される残渣油ば、公知のタンチルオキシド
の製造方法に於ける残渣であり、アセトン、ジアセトン
アルコール、及びタンチルオキシドを蒸留分離した残渣
油である。Residue Dish The residual oil used in the present invention is a residue from a known method for producing tantyl oxide, and is a residual oil obtained by distilling and separating acetone, diacetone alcohol, and tantyl oxide.
残渣油には、少量のジアセトンアルコール、タンチルオ
キシドの外に、ホロン、ホロン異性体、2.2.6.6
−チトラメチルテトラヒドロビランー4−オン、2,6
−シヒドロキシー2,6−シメチルー4−ヘプタノン、
6−ヒドロキシ−26−シメチルー2−へブテン−4−
オン等アセトン三量体が平衡関係を維持して存在してい
る。The residual oil contains a small amount of diacetone alcohol, tantyl oxide, as well as holon, holon isomer, 2.2.6.6
-Titramethyltetrahydrobilan-4-one, 2,6
-cyhydroxy-2,6-cymethyl-4-heptanone,
6-hydroxy-26-cymethyl-2-hebutene-4-
Acetone trimers exist in an equilibrium relationship.
′ンに11、 れる
本発明に使用される酸触媒には、硫酸、硝酸、塩酸、及
び燐酸等の鉱酸、アンバーリスト15(ロームアンドハ
ース社製)等の強酸性イオン交換樹脂、活性白土、シリ
カ又はシリカ・チタニアに担持した燐酸等がある。特に
、燐酸系触媒は脱水反応の促進に有効であると共に、生
成したホロンを再び分解する戊が他の酸触媒より少ない
。Acid catalysts used in the present invention include mineral acids such as sulfuric acid, nitric acid, hydrochloric acid, and phosphoric acid, strongly acidic ion exchange resins such as Amberlyst 15 (manufactured by Rohm and Haas), and activated clay. , phosphoric acid supported on silica or silica titania, etc. In particular, phosphoric acid catalysts are effective in accelerating the dehydration reaction, and there is less re-decomposition of generated holons than other acid catalysts.
酸触媒は反応系に於いて0.1乃至20重量%の範囲で
使用され、好ましくは1乃至LOf[t%である。酸触
媒が少ないと反応速度が低下し、多過ぎると生成ホロン
に影響を与える。The acid catalyst is used in the reaction system in an amount of 0.1 to 20% by weight, preferably 1 to LOf[t%. Too little acid catalyst will reduce the reaction rate, and too much will affect the holons produced.
バ直播■反庭条佳
2.2,6.6−チトラメチルテトラヒドロピランー4
−オン、2.6−シヒドロキシー2,6−シメチルー4
−ヘプタノン、及び6−ヒドロキシ−2,6−シメチル
ー2−へブテン−4−オン等のアセトン三量体は、脱水
反応によってホロンを生じるため加熱反応が行われる。Direct sowing ■ Anniwajoka 2.2,6.6-titramethyltetrahydropyran-4
-one, 2,6-cyhydroxy-2,6-cymethyl-4
Acetone trimers such as -heptanone and 6-hydroxy-2,6-dimethyl-2-hebuten-4-one are subjected to a heating reaction in order to produce holons through a dehydration reaction.
加熱温度は水及びジアセトンアルコール、タンチルオキ
シド等の2+i1体を還流させるために、少なくとも1
30℃以上に設定される。しかし、温度130℃以上で
は、生成ホロンの分解作用も激しくなるため、減圧して
還流温度を下げるのが好ましい。従って、反応系を減圧
調整することによって、反応還流温度が50乃至130
℃1より好ましくは90乃至120℃の範囲に設定され
る。The heating temperature is at least 1 to reflux water and 2+i1 bodies such as diacetone alcohol and tantyl oxide.
The temperature is set to 30°C or higher. However, at a temperature of 130° C. or higher, the decomposition of the formed holons becomes more intense, so it is preferable to lower the reflux temperature by reducing the pressure. Therefore, by adjusting the reaction system under reduced pressure, the reaction reflux temperature can be adjusted from 50 to 130°C.
It is preferably set in the range of 90 to 120°C rather than 1°C.
反応系から水分を除去するため、反応器にはディーンス
ターク分離器、油水分離器が取り付けられる。反応によ
る生成水分は、前記減圧、温度条件で還流され、これ等
の分離器で反応系外に放出除去される。これにより、ア
セトン三量体の平衡関係はホロン生成系に移行し、ホロ
ンが高収率でえられる。In order to remove water from the reaction system, the reactor is equipped with a Dean-Stark separator and an oil-water separator. The water produced by the reaction is refluxed under the reduced pressure and temperature conditions described above, and is discharged and removed from the reaction system using these separators. As a result, the equilibrium relationship of the acetone trimer shifts to a holon production system, and holons can be obtained in high yield.
尚、アセトン三量体に於いて、水酸基を有する2、6−
シヒドロキシー2,6−シメチルー4−ヘプタノン、6
−ヒドロキシ−2,6−シメチルー2−へブテン−4−
オン等は分子内脱水により容易にホロンに変換される。In addition, in the acetone trimer, 2,6-
Cyhydroxy-2,6-cymethyl-4-heptanone, 6
-Hydroxy-2,6-dimethyl-2-hebutene-4-
On etc. are easily converted to holons by intramolecular dehydration.
しかし、環状エーテル型構造を有する2、2,6.6−
チトラメチルテトラヒドロビランー4−オンは容易に変
換しないため、反応系から前記の方法に基づいて水分を
除去するのが好ましい。However, 2,2,6.6- which has a cyclic ether type structure
Since titramethyltetrahydrobilan-4-one is not easily converted, it is preferable to remove water from the reaction system based on the method described above.
更に、反応時に於いて、残渣油の反応液には不活性ガス
が流通されバブリングされ、場合によっては、反応液の
上方に不活性ガスが流通される。Furthermore, during the reaction, an inert gas is passed through and bubbled through the reaction solution of the residual oil, and in some cases, an inert gas is passed above the reaction solution.
不活性ガスは反応液中に含まれる微量の水分を反応系外
に効率良く除去するので、反応液中の水分は殆ど除去さ
れる。この為、2,2,6.6−チトラメチルテトラヒ
ドロビランー4−オンはホロンに略移行し、残渣油には
2,2,6.6−チトラメチルテトラヒドロピランー4
−オンが存在しなくなる。従って、ホロンの精製時、沸
点の近似した2、2,6.6−チトラメチルテトラヒド
ロビランー4−オンの混入が防止される。このような、
不活性ガスの流通は特に生成水が減少する反応後期に有
効である。Since the inert gas efficiently removes trace amounts of water contained in the reaction liquid out of the reaction system, most of the water in the reaction liquid is removed. Therefore, 2,2,6,6-titramethyltetrahydrobyran-4-one is almost transferred to holon, and the residual oil contains 2,2,6,6-titramethyltetrahydropyran-4-one.
-on no longer exists. Therefore, during purification of holon, contamination of 2,2,6,6-titramethyltetrahydrobilan-4-one, which has a similar boiling point, is prevented. like this,
The flow of inert gas is particularly effective in the latter stages of the reaction when produced water decreases.
脱水反応の終点は2,2,6.6−チトラメチルテトラ
ヒドロピランー4−オンがガスクロマトグラフィーで検
出されなくなる時点とされる。The end point of the dehydration reaction is defined as the point at which 2,2,6,6-titramethyltetrahydropyran-4-one is no longer detected by gas chromatography.
従って、反応時間は酸触媒の濃度、反応温度、不活性ガ
スの流通量によって変わり、通常、5乃至20時間であ
る。Therefore, the reaction time varies depending on the concentration of the acid catalyst, the reaction temperature, and the flow rate of the inert gas, and is usually 5 to 20 hours.
・′のホロンの −+1
反応生成物中のホロンは蒸留によって精製され、酸触媒
の存在下で蒸留する場合には温度130℃以上で行われ
る。このため、ホロンの分解が起こり易く、反応器を腐
食させる底がある。そこで、酸触媒を除いた後にホロン
の蒸留を行うことが好ましい。-+1 of the holon of '' The holon in the reaction product is purified by distillation, and when distilled in the presence of an acid catalyst, it is carried out at a temperature of 130°C or higher. For this reason, decomposition of holons is likely to occur, and there is a bottom that corrodes the reactor. Therefore, it is preferable to distill holon after removing the acid catalyst.
酸触媒の分離方法は特に規定しないが、通常水洗法で分
離できる。特に、゛燐酸に於いて、水洗いで得られる燐
酸排水の燐酸濃度は、20乃至50重量%程度に成るよ
うに第1回の洗浄に於いて水洗水量が設定される。第2
回の洗浄に於いては、燐酸を完全に分離するのが好まし
い。反応洗浄排水は破棄してよいが、再び脱水反応に使
用してもよい。Although the method for separating the acid catalyst is not particularly specified, it can usually be separated by a water washing method. In particular, in the case of phosphoric acid, the amount of water used in the first washing is set so that the phosphoric acid concentration of the phosphoric acid wastewater obtained by washing with water is about 20 to 50% by weight. Second
It is preferable to completely separate the phosphoric acid in the multiple washings. The reaction washing wastewater may be discarded, but may be used again for the dehydration reaction.
更に、反応残渣油には、少量の有機酸が含まれ、有機酸
は反応残渣油の蒸留によってホロンを精製する場合に混
入する。ホロンの用途によっては、この有機酸が悪影響
をあたえる。例えば、ポリオレフィンの光安定剤を合成
する際に、ホロンを出発原料として中間体にトリアセ[
・ンアルカミンを合成するが、この化合物はホロンとア
ンモニアとから合成された2、2.6.6−チトラメチ
ルテトラヒドロピペリジンー4−オンの水添反応によっ
て誘導される。この場合、水添には通常ラネーニッケル
触媒が使用されが、ホロン中に有機酸が存在すると、こ
れが触媒毒となり反応を阻害する。そこで、反応残渣油
は2.蒸留精製前に水酸化ナトリウム溶液で処理して有
機酸を除去するのが好ましい。有機酸の除去処理は0.
05乃至2重量%、より好ましくは0.1乃至0.5重
量%の範囲で水酸化ナトリウムを使用する。Furthermore, the reaction residue oil contains a small amount of organic acid, which is mixed in when the holon is purified by distillation of the reaction residue oil. Depending on the use of Holon, this organic acid can have an adverse effect. For example, when synthesizing a light stabilizer for polyolefins, holon is used as a starting material and the intermediate is triacetyl[
This compound is derived from the hydrogenation reaction of 2,2,6,6-titramethyltetrahydropiperidin-4-one synthesized from holone and ammonia. In this case, a Raney nickel catalyst is usually used for hydrogenation, but if an organic acid is present in the phoron, this acts as catalyst poison and inhibits the reaction. Therefore, the reaction residue oil is 2. Preferably, organic acids are removed by treatment with a sodium hydroxide solution before distillation purification. Organic acid removal treatment is 0.
Sodium hydroxide is used in the range of 0.05 to 2% by weight, more preferably 0.1 to 0.5% by weight.
また、本発明に係るホロンの製造において、反応残渣油
から酸触媒を分離するが、この分離を行う前に残渣油を
ストックする場合、反応残渣油中には、経時的に2.2
,6.6−チトラメチルテトラヒドロピランー4−オン
が増加し高温(約60℃)になるほど著しい。このため
、5時間以上貯溜する場合には、30℃以下に保存する
ことが好ましい。In addition, in the production of holon according to the present invention, the acid catalyst is separated from the reaction residual oil, but if the residual oil is stocked before this separation, 2.2
, 6,6-titramethyltetrahydropyran-4-one increases as the temperature increases (approximately 60°C). Therefore, when storing for 5 hours or more, it is preferable to store at 30°C or lower.
以下、本発明の実施例を示す。 Examples of the present invention will be shown below.
(実施例1)
反応器にメチルイソブチルケトン製造の残渣油95重量
%、酸触媒としての燐酸5重世%を入れる。(Example 1) A reactor is charged with 95% by weight of residual oil from the production of methyl isobutyl ketone and 5% by weight of phosphoric acid as an acid catalyst.
反応器内を減圧にして温度110℃で反応させると共に
反応残渣油中に不活性ガスとして窒素をバブリングする
。The pressure inside the reactor is reduced and the reaction is carried out at a temperature of 110° C., and nitrogen is bubbled into the reaction residue oil as an inert gas.
又、反応器に分離器を取り付けて生成水の分離を行う。Additionally, a separator is attached to the reactor to separate the produced water.
反応の終点は2,2,6.6−チトラメチルテトラヒド
ロビランー4−オンがガスクロマトグラフィーにより検
出できないまでとした。The end point of the reaction was defined as the point at which 2,2,6,6-titramethyltetrahydrobylan-4-one could not be detected by gas chromatography.
反応残渣油は、酸触媒が除かれた後、0.5重量%の水
酸化ナトリウム液95重量%が添加され、有機酸を抽出
分離後の油層が蒸留精製された。After the acid catalyst was removed from the reaction residue oil, 95% by weight of 0.5% by weight sodium hydroxide solution was added, and the oil layer after extracting and separating the organic acid was purified by distillation.
その結果、ホロンの収率は165%であった。As a result, the yield of holon was 165%.
(実施例2)
反応器にメチルイソブチルケトン製造の残渣油85重量
%、酸触媒としての燐酸15重量%を入れる。(Example 2) A reactor is charged with 85% by weight of residual oil from the production of methyl isobutyl ketone and 15% by weight of phosphoric acid as an acid catalyst.
反応器内を減圧にして温度90℃で反応させると共に反
応残渣油中に不活性ガスとして窒素をバブリングする。The pressure inside the reactor is reduced and the reaction is carried out at a temperature of 90° C., and nitrogen is bubbled as an inert gas into the reaction residue oil.
又、反応器に分離器を取り付けて生成水の分離を行う。Additionally, a separator is attached to the reactor to separate the produced water.
反応の終点は2,2,6.6−チトラメチルテトラヒド
ロビランー4−オンがガスクロマトグラフィーにより検
出できないまでとした。The end point of the reaction was defined as the point at which 2,2,6,6-titramethyltetrahydrobylan-4-one could not be detected by gas chromatography.
反応残渣油は、酸触媒が除かれた後、0.1重量%の水
酸化ナトリウム液340重度%が添加され、有機酸を抽
出分離後の油層が蒸留精製された。その結果、ホロンの
収率は154%であった。After the acid catalyst was removed from the reaction residue oil, 340% by weight of 0.1% by weight sodium hydroxide solution was added, and the oil layer after extracting and separating the organic acid was purified by distillation. As a result, the yield of holon was 154%.
(実施例3)
反応残渣油中に不活性ガスとしての窒素のバブリングを
行わなかった以外は、全て実施例1と同様に反応した。(Example 3) The reaction was carried out in the same manner as in Example 1, except that nitrogen was not bubbled as an inert gas into the reaction residue oil.
その結果、2.2.6.6−チトラメチルテトラヒドロ
ピランー4−オンは0.3重量%以下に低下しなかった
。As a result, 2.2.6.6-titramethyltetrahydropyran-4-one did not decrease below 0.3% by weight.
(実施例4)
反応器にメチルイソブチルケトン製造時の残渣油99重
量%、酸触媒としての硫酸1重量%を入れる。その他は
実施例2と同様な操作をした結果、ホロンの収率は11
0%であった。(Example 4) A reactor is charged with 99% by weight of residual oil from the production of methyl isobutyl ketone and 1% by weight of sulfuric acid as an acid catalyst. The other operations were the same as in Example 2. As a result, the yield of holon was 11
It was 0%.
(実施例5)
酸触媒としてアンバーリスト15(ロームアンドハース
社製)5重量%を用いた以外は実施例2と同様に操作し
た。その結果、ホロンの収率は105%であった。(Example 5) The same procedure as in Example 2 was carried out except that 5% by weight of Amberlyst 15 (manufactured by Rohm and Haas) was used as the acid catalyst. As a result, the yield of holon was 105%.
(実施例6)
反応器にメチルイソブチルケトン製造の残渣油98重量
%、酸触媒としてR−NH,C)I2PO3H,型樹脂
2重量%を入れる。(Example 6) A reactor was charged with 98% by weight of the residual oil from the production of methyl isobutyl ketone, and 2% by weight of R-NH, C)I2PO3H, type resin as an acid catalyst.
反応器内を減圧にして窒素をバブリングし、且つ生成水
を分離しながら10時間反応した。この結果、2,2.
6.6−チトラメチルテトラヒドロビランー4−オンの
反応率は45%であった。The reaction was carried out for 10 hours while reducing the pressure in the reactor, bubbling nitrogen, and separating produced water. As a result, 2,2.
The reaction rate of 6.6-titramethyltetrahydrobilan-4-one was 45%.
(実施例7)
実施例1と同様に操作して得られた脱水反応生成物に酸
触媒を分離することなく30℃及び60℃の温度に保っ
た。所定時間毎にサンプリングを行い、ガスクロマトグ
ラフィーで2.2,6.6−チトラメチルテトラヒドロ
ビランー4−オン(TTPK)の濃度を測定した。その
結果、表1に示すような変化が認められた。(Example 7) The dehydration reaction product obtained by the same operation as in Example 1 was maintained at temperatures of 30° C. and 60° C. without separating the acid catalyst. Sampling was performed at predetermined time intervals, and the concentration of 2.2,6.6-titramethyltetrahydrobilan-4-one (TTPK) was measured by gas chromatography. As a result, changes as shown in Table 1 were observed.
表1
(比較例1)
メチルイソブチルケトン製造の残渣油を直接蒸留精製し
た。その結果、ホロンの収率は85%であった。Table 1 (Comparative Example 1) The residual oil from the production of methyl isobutyl ketone was purified by direct distillation. As a result, the yield of holon was 85%.
以上、説明したように本発明に係るホロンの製造方法に
よれば、残渣油を酸触媒で加熱脱水したので、2,2,
6.6−チトラメチルテトラヒドロビランー4−オン等
のアセトン三量体がホロンとして生成され、タンチルオ
キシド製造時に残渣油中からホロン以外のアセトン三量
体を破棄することなく、ホロンを高収率で得ることがで
きる。As explained above, according to the method for producing holon according to the present invention, since the residual oil is heated and dehydrated with an acid catalyst, 2, 2,
6. Acetone trimers such as 6-titramethyltetrahydrobilan-4-one are produced as holons, and holons can be obtained in high yield without discarding acetone trimers other than holone from the residual oil during tantyl oxide production. You can get it at a high rate.
特許出願人 三井石油化学工業株式会社/゛7Patent applicant: Mitsui Petrochemical Industries, Ltd./゛7
Claims (1)
させると共に、蒸留分離して得られるタンチルオキシド
の残留物としてのアセトン三量体が含まれる残渣油を、
酸触媒中で加熱脱水すると共に蒸留してホロンを分離精
製することを特徴とするホロンの製造方法。(2)前記
酸触媒は燐酸系触媒であることを特徴とする請求項第1
項記載のホロンの製造方法。 (3)前記加熱脱水反応は、減圧下で温度50乃至13
0℃の範囲で行うことを特徴とする請求項第1項又は第
2項記載のホロンの製造方法。 (4)前記残渣油を酸触媒中で加熱脱水する際に生成す
る水を反応系外に分離することを特徴とする請求項第3
項記載のホロンの製造方法。[Scope of Claims] (1) A residual oil containing acetone trimer as a residue of tantyl oxide obtained by subjecting acetone to an aldol condensation reaction with an alkaline catalyst and distilling it,
A method for producing holon, which comprises separating and purifying holon by heating and dehydrating it in an acid catalyst and distilling it. (2) Claim 1, wherein the acid catalyst is a phosphoric acid catalyst.
The method for producing holons described in Section 1. (3) The heating dehydration reaction is carried out at a temperature of 50 to 13°C under reduced pressure.
3. The method for producing a holon according to claim 1 or 2, wherein the method is carried out at a temperature of 0°C. (4) Claim 3, characterized in that water generated when the residual oil is heated and dehydrated in an acid catalyst is separated outside the reaction system.
The method for producing holons described in Section 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63213754A JP2569355B2 (en) | 1988-08-30 | 1988-08-30 | Holon manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63213754A JP2569355B2 (en) | 1988-08-30 | 1988-08-30 | Holon manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0262842A true JPH0262842A (en) | 1990-03-02 |
JP2569355B2 JP2569355B2 (en) | 1997-01-08 |
Family
ID=16644472
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Application Number | Title | Priority Date | Filing Date |
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JP63213754A Expired - Fee Related JP2569355B2 (en) | 1988-08-30 | 1988-08-30 | Holon manufacturing method |
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CN113354522A (en) * | 2021-06-09 | 2021-09-07 | 西安瑞联新材料股份有限公司 | Improved synthesis method of phorone |
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- 1988-08-30 JP JP63213754A patent/JP2569355B2/en not_active Expired - Fee Related
Cited By (2)
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CN113354522A (en) * | 2021-06-09 | 2021-09-07 | 西安瑞联新材料股份有限公司 | Improved synthesis method of phorone |
CN113354522B (en) * | 2021-06-09 | 2022-08-16 | 西安瑞联新材料股份有限公司 | Improved synthesis method of phorone |
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