JPH0261951A - Electron microscope with vibration correcting device for filament image - Google Patents
Electron microscope with vibration correcting device for filament imageInfo
- Publication number
- JPH0261951A JPH0261951A JP21179688A JP21179688A JPH0261951A JP H0261951 A JPH0261951 A JP H0261951A JP 21179688 A JP21179688 A JP 21179688A JP 21179688 A JP21179688 A JP 21179688A JP H0261951 A JPH0261951 A JP H0261951A
- Authority
- JP
- Japan
- Prior art keywords
- filament image
- image
- filament
- displacement
- electron microscope
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 claims abstract description 20
- 238000006073 displacement reaction Methods 0.000 claims abstract description 14
- 238000001514 detection method Methods 0.000 claims description 14
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000000523 sample Substances 0.000 abstract description 15
- 238000004458 analytical method Methods 0.000 abstract description 6
- 230000003287 optical effect Effects 0.000 abstract description 3
- 238000004452 microanalysis Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000007431 microscopic evaluation Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003306 harvesting Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000009940 knitting Methods 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、電子顕微鏡に係わり、特に微小部分析を行う
に好適なフィラメント像の振動補正装置を備えた電子顕
微鏡に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an electron microscope, and more particularly to an electron microscope equipped with a filament image vibration correction device suitable for performing microscopic analysis.
〔従来の技術・発明が解決しようとする課題〕従来、電
界放射型電子銃のような小さな仮想点光源を用いた電子
顕微鏡では、第３図のように電子銃１から出た電子線２
を、コンデンサーレンズ（図示せず）と対物レンズの前
磁場（図示せず）から形成される照射レンズ系３で試料
５の」二に結ぶ。走査像を得る装置では、スキャニング
コイル４で試料５の上の電子線照射位置を走査する。１
盲記照射レンズ系３で最も集束させるとき、前記試料５
の上に結ばれる電子の強度分布は前記電子銃１のアイラ
メン）・の像である。ここでは上述の最も集束された像
とこれをぼかした像を含めてフィラメント像と呼ぶ。従
来の装置では、１０人程度の微小なプローブサイズを得
るため、照射レンズ系３での縮小をｌ／ ｌ Ｏ−１／
２０程度としている。このため試料５に入射する集束電
子線の開き角は大きくならざるを得ない。電子銃と試ｔ
１の相対的な機械的振動や浮遊磁場などにより、試料−
ヒに照射されるフィラメント像は１−１００ Ｈｚ 程
度の振動数で試料に対して相対的に振動している。[Prior art/problems to be solved by the invention] Conventionally, in an electron microscope using a small virtual point light source such as a field emission type electron gun, the electron beam 2 emitted from the electron gun 1 is
is connected to the specimen 5 by an illumination lens system 3 formed from a condenser lens (not shown) and a front magnetic field of an objective lens (not shown). In the apparatus for obtaining a scanned image, a scanning coil 4 scans an electron beam irradiation position on a sample 5. 1
When the blind irradiation lens system 3 focuses the most, the sample 5
The intensity distribution of electrons focused on is an image of the electron gun 1 (Iramen). Here, the most focused image and the blurred image described above are referred to as a filament image. In conventional equipment, in order to obtain a small probe size for about 10 people, the reduction in the irradiation lens system 3 is reduced to l/l O-1/
It is set at around 20. For this reason, the opening angle of the focused electron beam incident on the sample 5 has to become large. Electron gun and test
Due to relative mechanical vibrations of 1, stray magnetic fields, etc.
The filament image irradiated onto the specimen vibrates at a frequency of about 1-100 Hz relative to the sample.
従来の装置では、縮小によって上記の振動の振幅が軽減
されるために、微小部分析においてフィラメント像の振
動が問題になることは少なかった。In conventional apparatuses, the amplitude of the above-mentioned vibrations is reduced by reduction, so the vibrations of filament images rarely pose a problem in micro-part analysis.
しかし、縮小率を小さくし、かつ試料に入射する゛１子
線の開き角を１ ２ ｍ ｒａｄ、程度の小さい値
に抑えると、電子線そのものは集束されていても、試料
上のフィラメント像の振動が顕著になる。このために実
質的な分析領域が広がり、入オーダーの微小部分析を正
確に実施することは困難であった。However, if the reduction ratio is made small and the opening angle of the 1-satellite beam incident on the sample is kept to a small value of about 1 2 m rad, even though the electron beam itself is focused, the filament image on the sample becomes Vibration becomes noticeable. For this reason, the practical analysis area has expanded, making it difficult to accurately analyze minute parts of incoming orders.
上記従来技術は、上述のように入オーダーの微小プロー
ブで電子線の開き角を小さくしてフィラメント像の振動
を抑えることが困難であったため、このような条件では
用いられることがなかった。The above-mentioned conventional technology has not been used under such conditions because it is difficult to suppress the vibration of the filament image by reducing the opening angle of the electron beam using a custom-made microprobe as described above.
本発明の目的は、このような条件下でも電界放射型電子
銃のような小さな仮想点光源を持つ電子銃のフィラメン
ト像が、機械的、電磁気的な外乱により振動やドリフト
を起こすことを補償し、正確に目標とする部位の人オー
ダーの微小部分析を可能にすることにある。The purpose of the present invention is to compensate for vibrations and drifts caused by mechanical and electromagnetic disturbances in the filament image of an electron gun such as a field emission electron gun, which has a small virtual point light source, even under such conditions. The goal is to enable precise, human-order microscopic analysis of targeted areas.
本発明は、電子線を発生してそれを試料に照射するため
の照射装置と、該照射装置のフィラメント像の振動を補
正するための電子線偏向装置と、試料像を拡大投影する
ための拡大投影装置と、試料像の所定の位置からの該フ
ィラメント像の変位を検出するための検出装置と、該検
出装置の出力に基づいて該フィラメント像の振動補正量
を計算し、その結果を前記電子線偏向装置に与える補正
装置とを具備してなることを特徴とするものであり、フ
ィラメント像の変位に応じてその補正量を計算し、電子
線偏向装置に補正信号を送るようにしたものである。The present invention provides an irradiation device for generating an electron beam and irradiating a sample with it, an electron beam deflection device for correcting vibration of a filament image of the irradiation device, and an enlargement device for enlarging and projecting the sample image. a projection device, a detection device for detecting the displacement of the filament image from a predetermined position of the sample image, and a vibration correction amount of the filament image based on the output of the detection device, and the result is transmitted to the electron beam. It is characterized by being equipped with a correction device to be applied to the beam deflection device, and is configured to calculate the amount of correction according to the displacement of the filament image and send a correction signal to the electron beam deflection device. be.
以下、本発明によるフィラメント像の振動補正装置を備
えた電子顕微鏡の一実施例を図面を用いて説明する。第
１図において、電子銃６（照射装置）から発生した電子
線７は、集束レンズ（図示せず）と対物レンズの前磁場
（図示せず）より形成された照射レンズ系８により約１
０人の大きさに縮小され、試料１０に照射される。試料
１０を透過したフィラメント像は結像レンズ系１１（拡
大投影装置）により１００−１００万倍程度に拡大され
、フィラメント像が検出器１２（検出装置）に結像され
る。検出器１２の中心は電子顕微鏡の機械的な光軸とほ
ぼ一致しており、前記結像レンズ系１１の拡大率を適当
に選ぶことで、検出２ｔ１２」二のフィラメント像を電
気的あるいは光学的な信号として適当な大きさで検出す
る。外乱などによりフィラメント像が変位すると変位検
出回路１３（検出装置）で変位１を計算する。前記変位
検出回路１３で得られた前記変位量をもとに、変位補正
回路１４（補正装置）が補正量を計算し、その信号を偏
向器９（電子線偏向装置）に送ることで、フィラメント
像を常に所定の部位に固定する。DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of an electron microscope equipped with a filament image vibration correction device according to the present invention will be described below with reference to the drawings. In FIG. 1, an electron beam 7 generated from an electron gun 6 (irradiation device) is emitted by an irradiation lens system 8 formed by a focusing lens (not shown) and a front magnetic field (not shown) of an objective lens.
The sample 10 is reduced to the size of 0 people and irradiated. The filament image transmitted through the sample 10 is magnified approximately 1 to 1 million times by an imaging lens system 11 (enlargement projection device), and the filament image is formed on a detector 12 (detection device). The center of the detector 12 almost coincides with the mechanical optical axis of the electron microscope, and by appropriately selecting the magnification of the imaging lens system 11, the filament image of the detection 2t12'' can be detected electrically or optically. It is detected as a signal with an appropriate magnitude. When the filament image is displaced due to disturbance or the like, a displacement 1 is calculated by a displacement detection circuit 13 (detection device). Based on the amount of displacement obtained by the displacement detection circuit 13, the displacement correction circuit 14 (correction device) calculates the amount of correction, and sends the signal to the deflector 9 (electron beam deflection device). The image is always fixed in place.
偏向器９は、電子顕微鏡の通常の軸調整に用いられるコ
イルか、あるいは別途に設ける。第２図に電子線エネル
ギー損失分光器を装着する場合に適したフィラメント像
検出′ａ１２の一例を示す。１６は導体の円盤を４分割
した分割電極からなる電子の４分割電極検出器であり、
中央に０１−ＩＱｍｍ程度の穴１５を開けている。電子
線の大部分は穴１５を通過して電子線エネルギー分光器
（図示せず）に入る。振動によりフィラメント像が変位
すると１６の各分割電極に流れる電流か変化するので、
１７の電流検出回路でこれを検出する。The deflector 9 may be a coil used for normal axis adjustment of an electron microscope, or may be provided separately. FIG. 2 shows an example of filament image detection 'a12 suitable for the case where an electron beam energy loss spectrometer is installed. 16 is an electron four-division electrode detector consisting of divided electrodes obtained by dividing a conductor disk into four,
A hole 15 of about 01-IQ mm is made in the center. Most of the electron beam passes through hole 15 and enters an electron beam energy spectrometer (not shown). When the filament image is displaced due to vibration, the current flowing through each of the 16 divided electrodes changes, so
This is detected by the current detection circuit No. 17.
上述のごとく構成された電子銃のフィラメント像の振動
を補正する装置を備えた電子顕微鏡においては、電子顕
微鏡本体の振動やドリフトが生じてもこれをリアルタイ
ムで補正することができるため、従来の電子顕微鏡のよ
うに大きなビーム開き角でなくても、フィラメント像の
振動などの影響なくへオーグーの微小プローブでの分析
が可能になる。また、本装置を従来の電子顕微鏡に用い
ることで、従来得られなかった、より小さな有効集束ビ
ーム径を得ることができる。In an electron microscope equipped with a device for correcting the vibration of the filament image of the electron gun configured as described above, even if vibration or drift of the electron microscope body occurs, it can be corrected in real time, making it possible to correct it in real time. Even without the large beam aperture angle of a microscope, analysis using Heogoo's tiny probe is possible without the effects of vibrations on the filament image. Furthermore, by using this device in a conventional electron microscope, it is possible to obtain a smaller effective focused beam diameter, which has not been previously possible.
以上、説明したことから明らかなように本発明によるフ
ィラメント像の振動補正装置を備えた電子顕微鏡によれ
ば、入オーダーに集束した微小電子線による分析を行う
ために、ビームの開き角を大きくする必要がなく、また
、外乱の影響を小さくして安定した確実な微小部分析が
可能となる。As is clear from the above explanation, according to the electron microscope equipped with the filament image vibration correction device according to the present invention, in order to perform analysis using a minute electron beam focused on the input order, the beam aperture angle is increased. Moreover, it is possible to perform stable and reliable analysis of microscopic parts by reducing the influence of disturbances.
第１図は本発明による電子顕微鏡の一実施例を示す概略
構成図、第２図は本発明の電子顕微鏡に用いるフィラメ
ント像検出器の一例を示す概略構成図、第３図は従来の
電子顕微鏡の要部を示す概略構成図である。
６・・・・・・照射装置（電子銃）、９・・・・・・電
子線偏向装置（偏向器）、１０・・・・試料、１１・・
・・・・拡大投影装置（結像レンズ系）、１２・・・・
・・検出装置（アイラメン］・像検出器）、１３・・・
・・・検出装置（変位検出回路）、１４・・・・・・補
正装置（変位補正回路）。
第１図
第２図
６、照射ぜ置
９、電＋線編向緩！
）広′に投影！ヒ！
２１３躬（出穀！
第３図FIG. 1 is a schematic diagram showing an embodiment of an electron microscope according to the present invention, FIG. 2 is a schematic diagram showing an example of a filament image detector used in the electron microscope of the present invention, and FIG. 3 is a diagram of a conventional electron microscope. FIG. 6... Irradiation device (electron gun), 9... Electron beam deflection device (deflector), 10... Sample, 11...
...Enlargement projection device (imaging lens system), 12...
・Detection device (Iramen)・Image detector), 13...
. . . detection device (displacement detection circuit), 14 . . . correction device (displacement correction circuit). Figure 1 Figure 2 Figure 6, irradiation spacing 9, electric + wire knitting direction loose! ) Wide projection! Hee! 213 grains (grain harvest! Figure 3)
Claims (1)
と、該照射装置のフィラメント像の振動を補正するため
の電子線偏向装置と、試料像を拡大投影するための拡大
投影装置と、試料像の所定の位置からの該フィラメント
像の変位を検出するための検出装置と、該検出装置の出
力に基づいて該フィラメント像の振動補正量を計算し、
その結果を前記電子線偏向装置に与える補正装置とを具
備してなることを特徴とするフィラメント像の振動補正
装置を備えた電子顕微鏡。an irradiation device for generating an electron beam and irradiating the sample with it; an electron beam deflection device for correcting vibration of a filament image of the irradiation device; and an enlargement projection device for enlarging and projecting the sample image; a detection device for detecting displacement of the filament image from a predetermined position of the sample image; and calculating a vibration correction amount of the filament image based on the output of the detection device;
An electron microscope equipped with a filament image vibration correction device, comprising a correction device that applies the result to the electron beam deflection device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21179688A JPH0261951A (en) | 1988-08-26 | 1988-08-26 | Electron microscope with vibration correcting device for filament image |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21179688A JPH0261951A (en) | 1988-08-26 | 1988-08-26 | Electron microscope with vibration correcting device for filament image |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0261951A true JPH0261951A (en) | 1990-03-01 |
Family
ID=16611751
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21179688A Pending JPH0261951A (en) | 1988-08-26 | 1988-08-26 | Electron microscope with vibration correcting device for filament image |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0261951A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5814814A (en) * | 1995-02-28 | 1998-09-29 | Ebara Corporation | Electron microscope |
| US7633074B2 (en) | 2005-10-19 | 2009-12-15 | Ict, Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh | Arrangement and method for compensating emitter tip vibrations |
| US7939800B2 (en) | 2005-10-19 | 2011-05-10 | ICT, Integrated Circuit Testing, Gesellschaft fur Halbleiterpruftechnik mbH | Arrangement and method for compensating emitter tip vibrations |
-
1988
- 1988-08-26 JP JP21179688A patent/JPH0261951A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5814814A (en) * | 1995-02-28 | 1998-09-29 | Ebara Corporation | Electron microscope |
| US7633074B2 (en) | 2005-10-19 | 2009-12-15 | Ict, Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh | Arrangement and method for compensating emitter tip vibrations |
| US7939800B2 (en) | 2005-10-19 | 2011-05-10 | ICT, Integrated Circuit Testing, Gesellschaft fur Halbleiterpruftechnik mbH | Arrangement and method for compensating emitter tip vibrations |
| EP1777730B1 (en) * | 2005-10-19 | 2018-05-30 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Arrangement and method for compensating emitter tip vibrations |
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