JPH0260738A - Al base electrodeposition alloy laminated material - Google Patents
Al base electrodeposition alloy laminated materialInfo
- Publication number
- JPH0260738A JPH0260738A JP21157788A JP21157788A JPH0260738A JP H0260738 A JPH0260738 A JP H0260738A JP 21157788 A JP21157788 A JP 21157788A JP 21157788 A JP21157788 A JP 21157788A JP H0260738 A JPH0260738 A JP H0260738A
- Authority
- JP
- Japan
- Prior art keywords
- alloy
- electrodeposited
- base
- weight
- plates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 41
- 239000000956 alloy Substances 0.000 title claims abstract description 41
- 239000002648 laminated material Substances 0.000 title claims abstract description 4
- 238000004070 electrodeposition Methods 0.000 title abstract description 9
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 19
- 239000000463 material Substances 0.000 claims abstract description 18
- 239000000203 mixture Substances 0.000 claims abstract description 16
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 15
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 11
- 229910052751 metal Inorganic materials 0.000 claims abstract description 10
- 239000002184 metal Substances 0.000 claims abstract description 10
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 9
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 7
- 229910052796 boron Inorganic materials 0.000 claims abstract description 6
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 6
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 5
- 150000002739 metals Chemical class 0.000 claims abstract description 4
- 238000010030 laminating Methods 0.000 claims abstract description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 18
- 239000010936 titanium Substances 0.000 claims description 17
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 11
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 8
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 8
- 239000011733 molybdenum Substances 0.000 claims description 8
- 239000010955 niobium Substances 0.000 claims description 8
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 6
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 5
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 5
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 4
- 238000000465 moulding Methods 0.000 claims description 2
- 238000009792 diffusion process Methods 0.000 abstract description 4
- 229910004349 Ti-Al Inorganic materials 0.000 abstract 1
- 229910004692 Ti—Al Inorganic materials 0.000 abstract 1
- 238000007772 electroless plating Methods 0.000 abstract 1
- 230000003068 static effect Effects 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 7
- 239000006104 solid solution Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 3
- 238000001513 hot isostatic pressing Methods 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- 241000543381 Cliftonia monophylla Species 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 229910000753 refractory alloy Inorganic materials 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910000601 superalloy Inorganic materials 0.000 description 1
- 239000003832 thermite Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、高温下における強度を要求される構造材用の
Ａ１基電看合金積層材に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to an A1-based electrically conductive alloy laminate for structural materials requiring strength at high temperatures.
従来の技術
従来、８００℃以上の高温に耐える構造材には、モリブ
デン（ＭＯ）合金、ニオブ（Ｎｂ ）合金等の耐火合金
が用いられていたが、このような合金は、材料の歩留り
が悪く、コストが著しく高い。Conventional technology Conventionally, refractory alloys such as molybdenum (MO) alloys and niobium (Nb) alloys have been used for structural materials that can withstand high temperatures of 800°C or higher, but such alloys have poor material yields. , the cost is significantly high.
また、高温耐蝕性が使用中に低下し、これを防止するた
めには表面被覆を必要とし、このため限られた使用分野
にしか適用できなかった。In addition, high-temperature corrosion resistance deteriorates during use, and a surface coating is required to prevent this, so that it can only be applied to limited fields of use.
また、たとえば航空機用ジェット・エンジンにおけるノ
ズル」−ン、ミ駐す−などの温度にさらされる構造部に
は、ニッケル基超耐熱合金が用いられているが、耐熱性
、軽ａ化１強度の要求に対して、Ｔ １−Ａ１合金の使
用が試みられるようになった。このものｔま確かに高温
下の強度に対しては実用に供されるものの、塑性加工性
が全くないものであるのみならず、製造上、合金組織の
不均一化を避ける口とができない欠点があった。In addition, nickel-based superalloys are used for structural parts exposed to temperature, such as the nozzles and parking areas of aircraft jet engines, but they have excellent heat resistance, light aluminium, and strength. In response to this demand, attempts have been made to use the T 1-A1 alloy. Although this material is certainly useful for strength under high temperatures, it not only has no plastic workability at all, but also has the disadvantage that it is impossible to avoid non-uniformity of the alloy structure during manufacturing. was there.
発明が解決しようとする問題点
本発明は、上記の欠点を解消し、圧延板の製造が可能で
あって、ある程度の加熱による曲げ加工をはかることが
でき、機械加工性が発揮され、しかし得られた積層板は
圧延微細組織をもって材質的にすぐれ、密着による酸素
の排除と、清浄な接合面とを得ることができ、靭性があ
って高温強さが大きく、コストが低く、種々の分野に使
用可能であり、材質的に従来の耐熱合金に劣らないＡｉ
基電着合金積層材を提供す
ることを技術的課題とする。Problems to be Solved by the Invention The present invention solves the above-mentioned drawbacks, makes it possible to manufacture a rolled plate, allows bending by heating to a certain extent, exhibits machinability, and provides advantages. The rolled laminate has an excellent material quality due to its rolled microstructure, can eliminate oxygen through close adhesion, and has a clean bonding surface.It has toughness, high high-temperature strength, and low cost, making it suitable for various fields. Ai can be used and is comparable in material to conventional heat-resistant alloys.
The technical problem is to provide a base electrodeposited alloy laminate.
問題点を解決するための手段
本発明のＡ１基電着合金積層材は、アルミニウム３０〜
７０重量％、チタン３０〜７０重量％、硼素０．０１〜
０．１１弓％、又は、アルミニウム４０〜８０重間％、
ジルコニウム２０〜６０重番％、硼素０．０１〜０．１
重量％の組成を有するＡ１基電着合金積層を表面に形成
したチタン。Means for Solving the Problems The A1-based electrodeposited alloy laminate of the present invention has aluminum 30 to
70% by weight, titanium 30~70% by weight, boron 0.01~
0.11% bow, or 40-80% aluminum,
Zirconium 20-60%, boron 0.01-0.1
Titanium on which a laminated layer of A1-based electrodeposited alloy having a composition of % by weight is formed.
ジルコニウム、モリブデン、バナジウム、ニオブ。Zirconium, molybdenum, vanadium, niobium.
タンタルのうちから選ばれた金属又はこれらの金属の合
金よりなる被電着板を複数枚積層成形して構成する。It is constructed by laminating and molding a plurality of electrodeposited plates made of a metal selected from tantalum or an alloy of these metals.
アルミニウムはαＴｉ、αＺｒ中に多量に固溶する性質
があり、等量組成のものも、５００’Ｃ以上において表
面活性化を図るテルミット反応によりＢｍを発して融合
する。そのためアルミニウム（ＡＩ）とチタン（Ｔｉ）
、アルミニウム（Ａｊ！ ）とジルコニウム（Ｚｒ ）
との溶解は組成が不均一となる。Aluminum has the property of forming a large amount of solid solution in αTi and αZr, and even those having the same composition emit Bm and fuse due to thermite reaction for surface activation at temperatures above 500'C. Therefore, aluminum (AI) and titanium (Ti)
, aluminum (Aj!) and zirconium (Zr)
The composition will be non-uniform when dissolved.
アルミニウムとチタンとの合金の第２相であるＴｉ３Ａ
ｊ！はアルミニウムが７重量％を越えると大ぎく出現す
るようになりアルミニウム３０〜７０重量％では大部分
が第２相とＴｉＡｆの第３相であり、これは、均一組成
であれば、７００℃で５０ ｋｏｆ／ａｍ２以上の高強
度を示す。Ti3A, the second phase of an alloy of aluminum and titanium
j! When the aluminum content exceeds 7% by weight, most of the 2nd phase and the 3rd phase of TiAf appear. Shows high strength of 50 kof/am2 or more.
そこで、１Ｍにより化学的に均一組成を保たせたＡｊ！
ｉ４合金を積層加工時に拡散によってチタン。Therefore, Aj! has a chemically uniform composition with 1M!
Titanium is produced by diffusion during lamination processing of i4 alloy.
ジルコニウム、モリブデン、バナジウム、ニオブ。Zirconium, molybdenum, vanadium, niobium.
タンタルのうちから選ばれた金属又はこれらの合金より
なる素材に接合する。上記の拡散した層には部分的不均
一組成、すなわち塊の出現はない。Bonded to a material made of a metal selected from tantalum or an alloy thereof. In the above-mentioned diffused layer there is no local heterogeneous composition, ie no appearance of lumps.
その際、高温強さを保持させるために、アルミニウムの
含有率が３０〜７０重間％（チタンを組成成分とする場
合）、４０〜８０重量％（ジルコニウムを組成成分とす
る場合）に定める。At this time, in order to maintain high-temperature strength, the aluminum content is set at 30 to 70% by weight (when titanium is a component) and 40 to 80% by weight (when zirconium is a component).
チタン（Ｔｉ）、ジルコニウム（Ｚｒ ）は高融点を有
する遷移金属であって、溶融点が６５３℃であるアルミ
ニウム（Ａｉ）基に耐高温性を与えている。Titanium (Ti) and zirconium (Zr) are transition metals having a high melting point, and provide high temperature resistance to the aluminum (Ai) base, which has a melting point of 653°C.
Ａ７７Ｍ着合金を電着させる素材としては、上記のよう
に、チタン（Ｔｉ）、ジルコニウム（Ｚｉ、モリブデン
（ＭＯ） 、バナジウム（Ｖ）、ニオブ（Ｎｂ）、タン
タル（Ｔａ ）等の遷移金属、またはこれらの合金が好
適である。As mentioned above, materials for electrodepositing the A77M alloy include transition metals such as titanium (Ti), zirconium (Zi), molybdenum (MO), vanadium (V), niobium (Nb), and tantalum (Ta), or These alloys are preferred.
そして、このような素材に、前記のようなＡ１塁電看合
金層を電着させた被電着板を、熱間静水圧プレスによっ
て多数積層した後に圧延し、圧延素形材として本発明の
Ａ１基電着合金積層材を得る。Then, a large number of electrodeposited plates having the above-mentioned A1-base electric conductor alloy layer electrodeposited on such a material are laminated by hot isostatic pressing and then rolled to obtain the rolled material of the present invention. An A1-based electrodeposited alloy laminate is obtained.
つぎに、この発明の積層板における成分組成範囲を説明
する。Next, the range of component composition in the laminate of the present invention will be explained.
（ａ） Ａｊ ＡＩの聞は溶解材ならばＴ ｉ ＡＪ 。(a) Aj For AI, if it is a melting material, it is T i AJ.
ＡＩ、Ｔｉの組成に入る配合量である。積層基板である
αＴｉ中にＴ １−ＡＩ混合組成の電着物質が拡散した
層は、耐熱性を向上させる作用をもつが、熱間静水圧プ
レス加工によってαＴｉ中にα 相（Ｔｉ３Ａ１）が大
きく出現し、このα２相とα相の濃度の平衝作用によっ
てＴ１板厚さ中心部での靭性劣化をとめる役割をおこな
わしめる。第３相であるＹ相を接合層に薄膜状に残すよ
うにして、この層の厚さを調整する。This is the amount included in the composition of AI and Ti. A layer in which an electrodeposited material with a T 1-AI mixed composition is diffused into αTi, which is a laminated substrate, has the effect of improving heat resistance. The balance between the concentrations of the α2 phase and the α phase plays a role in stopping the deterioration of toughness at the center of the thickness of the T1 plate. The thickness of this layer is adjusted so that the third phase, Y phase, remains in the bonding layer in the form of a thin film.
（ｂ）Ｔｉ又はＺｒ
Ｔ１は熱間静水圧プレス強加工時にＡＩを固溶させ本発
明の組成のとき、すなわち王１−ＡＪ混合化合物が拡散
固溶する際に活性化を著しく生じさせる元素であって、
αＴｉへの拡散侵入を著しく高める作用を持っているか
ら、αＴｉとα２相、Ｙ相のそれらの反応を促進し、所
望の高温強度の向上をはかることができる。(b) Ti or Zr T1 is an element that causes AI to form a solid solution during intense hot isostatic press processing and causes significant activation when the composition of the present invention is used, that is, when the King 1-AJ mixed compound is diffused into a solid solution. There it is,
Since it has the effect of significantly increasing the diffusion and penetration into αTi, it can promote the reaction between αTi, α2 phase, and Y phase, and can improve the desired high temperature strength.
ＺｒはαＴ１と全域固溶の性質があるから、圧延がし易
くまた拡散固溶する際、ｚｒＡ１混合物は■１−Ａ１混
合物と同じように活性化が著しく、αＴｉとＺｒβ相の
反応接合面でのＺ ｒ−ＡＪ！層が所望の高温強度の向
上をはかることができる。Since Zr has the property of being a solid solution with αT1 over the entire area, it is easy to roll, and when it is diffused into a solid solution, the zrA1 mixture is markedly activated like the 1-A1 mixture, and at the reaction interface between αTi and Zrβ phases. Z r-AJ! The layer can provide the desired high temperature strength enhancement.
（ｃ） Ｂ
Ｂは積層板の高温強度、靭性等の低下を防ぐ作用をもつ
が、その効果が０．０２％未満では所望の効果は得られ
ず、一方、０．１％を越えて含有させると、靭性および
高温強度が低下するようになる。(c) B B has the effect of preventing the high-temperature strength, toughness, etc. of the laminate from deteriorating, but if the effect is less than 0.02%, the desired effect cannot be obtained; on the other hand, if the content exceeds 0.1%, If this happens, the toughness and high temperature strength will decrease.
なお、この発明の積層板におけるＢ含有量は、電着法に
おいて無電解析出をはかるための薬剤から環元反応のお
りに入るものであり、工程中に薬剤混液を調整すること
によって所望の伯とすることができるものである。The B content in the laminate of the present invention is determined by the amount of B that enters the ring element reaction from the chemical for electroless deposition in the electrodeposition method, and can be adjusted to the desired content by adjusting the chemical mixture during the process. This is something that can be done.
実施例
図面に示すように、素材１としてのαＴｉ板にＴｉ−Ａ
ｊ！、Ｚｒ−ＡＪ！等の無電解メツレを施してΔｉ基電
着合金層２とし、１００〜２００ミクロンの厚さの被膜
を両面に形成させて被電着板３を得る。成形したαＴｉ
板をシース中に重ねて入れ、真空封入する。引続いて、
温度１．２００℃。As shown in the example drawings, Ti-A is applied to αTi plate as material 1.
j! , Zr-AJ! A Δi-based electrodeposited alloy layer 2 is obtained by electroless etching, and a coating having a thickness of 100 to 200 microns is formed on both surfaces to obtain an electrodeposited plate 3. Molded αTi
The plates are stacked in the sheath and sealed under vacuum. Subsequently,
Temperature 1.200℃.
圧力１５００気圧、５時間保持の条件で熱間静水圧プレ
スにかけることによって拡散接合し、ＡＪ！基電電着金
積層材４とする。この場合板と板の間に第３金属の箔ま
たはメツキ層を設けることにより接合し易くするととも
に所定配合の合金とする。The AJ! A base electrodeposited gold laminate material 4 is prepared. In this case, a third metal foil or plating layer is provided between the plates to facilitate joining and to form an alloy of a predetermined composition.
熱間静水圧プレスした板は、シースのまま１．２００℃
以上で圧延する。The hot isostatically pressed plate is kept in its sheath at 1.200℃.
Rolling is performed above.
表に示すように、比較のために本発明積層板１〜４およ
び比較Ｔｉ −Ａｊ！合金５〜６をそれぞれ製造した。As shown in the table, for comparison, the laminates 1 to 4 of the present invention and the comparison Ti-Aj! Alloys 5 and 6 were produced respectively.
表において、本発明積層板１．３は、熱間静水圧プレス
のままのＴｉ−ＡＪ！電’４処理のαＴｉ７ＩＪ板で、
本発明積層板２．４は、熱間静水圧プレスののち圧延し
たＴ ＋−Ａｊ２及びＺｒ−Ａｊ！電着処理のαＴ１薄
板であり、比較焼結合金は６５％Ｔｉ−３５％Ａ１組成
の原料を調整し、粉砕した原料粉を熱間静水圧プレスに
かけたものである。In the table, inventive laminate 1.3 is Ti-AJ! as hot isostatically pressed. With αTi7IJ board treated with Den'4,
The laminates 2.4 of the present invention are T+-Aj2 and Zr-Aj! rolled after hot isostatic pressing. This is an αT1 thin plate subjected to electrodeposition treatment, and the comparative sintered alloy is obtained by preparing a raw material having a composition of 65% Ti-35% A1, and applying the pulverized raw material powder to hot isostatic pressing.
また、表は、上記本発明積層板１〜４および比較焼結合
金について、温度１０００℃、１０時間保持後空冷処理
した後の室温、７００℃下の抗張力、耐力及び伸びを示
すものである。The table also shows the tensile strength, yield strength, and elongation of the laminates 1 to 4 of the present invention and the comparative sintered alloy at room temperature and 700° C. after being held at a temperature of 1000° C. for 10 hours and then air-cooled.
表に示されるように、本発明積層板１．３はやや脆弱で
あるが、２．４はいずれも高強度と靭性が改良された性
質をもつものである。これに対して、比較焼結合金は強
度、靭性共に劣化したものになっている。またＡ１１定
着層のＡＩが、発明の間開から低い方に外れた積層板は
、高温強度が著しく低い。又高い方に外れたものは、こ
れも同様に強度、靭性がきわめて低い。Ｔｉ、ｚｒは、
発明の範囲から低い方に外れたものは、接合面の状態が
悪く、又高い方に外れたものは、高温強度の低下をもた
らし、実用にならないものである。As shown in the table, laminates 1.3 of the present invention are somewhat brittle, while laminates 2.4 both have high strength and improved toughness. In contrast, the comparative sintered alloy has deteriorated both in strength and toughness. Furthermore, laminates in which the AI of the A11 fixing layer deviates from the spacing of the invention to the lower side have significantly low high temperature strength. Also, those that are on the high side also have extremely low strength and toughness. Ti, zr is
If the range is lower than the scope of the invention, the joint surface will be in poor condition, and if it is higher than the range, the high-temperature strength will be reduced, making it impractical.
発明の効果
Ａ１基電着合金積層によるため、固溶体のような部分的
不均一がなく、チタン、ジルコニウム。Effects of the Invention Since A1 base electrodeposited alloy is laminated, there is no local non-uniformity like in solid solution, and titanium and zirconium.
モリブデン、バナジウム、ニオブ、タンタルのうちから
選ばれた金属又はこれらの金属の合金が高温強さを受は
持つと共にΔｊ！基電電着が高温靭性を受は持って著し
く材質が向上する。さらに、高温使用時において、耐蝕
性を有する被電着板及びこれらに拡散成長されたＡ１基
電着合金がＡＩＭ電着合金層を保護する。A metal selected from molybdenum, vanadium, niobium, tantalum or an alloy of these metals has high temperature strength and Δj! Substrate electrodeposition provides high-temperature toughness and significantly improves material quality. Furthermore, during high-temperature use, the electrodeposited plates having corrosion resistance and the A1-base electrodeposited alloy diffused and grown on these plates protect the AIM electrodeposited alloy layer.
以上のように、この発明のＡ１基電着合金積層板はすぐ
れた耐熱性および熱間加■成形を有するほか、きわめて
高い強度、靭性の改良がなされているので、これらの特
性が要求される、例えば航空機の高温静止部材全般に亘
る広い分野での適用が可能であり、しかも介在物や、酸
素、窒素の汚染が全くなく、電着時に入るｌ素が拡散を
円滑に進める作用と、αＴｉ基板又はＺｒの作用などに
より圧延を容易に行うことができ、安いコストでの製造
が可能であるなどの工業上有用な特性を有するｂのであ
る。As described above, the A1-based electrodeposited alloy laminate of the present invention has excellent heat resistance and hot formability, and has extremely high strength and toughness improvements, so these properties are required. , for example, can be applied in a wide range of fields including high-temperature stationary parts of aircraft, and is completely free of inclusions, oxygen, and nitrogen contamination, and has the effect of smoothly promoting diffusion of the l element that enters during electrodeposition, and αTi. It has industrially useful properties such as being easily rolled due to the action of the substrate or Zr and being able to be manufactured at low cost.
図は、本発明のＡ１基電着合金積層材の横断面図を示す
ものである。
１・・・素材、２・・・Ａ、ｉ！基電着合金層、３・・
・被電着板、
４・・・Ａｉ基電着合金ｔＩｔｉ層材。The figure shows a cross-sectional view of the A1-based electrodeposited alloy laminate of the present invention. 1...Material, 2...A, i! Base electrodeposited alloy layer, 3...
- Electrodeposited plate, 4...Ai-based electrodeposited alloy tIti layer material.
Claims (1)
、硼素０．０１〜０．１重量％又は、アルミニウム４０
〜８０重量％、ジルコニウム２０〜６０重量％、硼素０
．０１〜０．１重量％の組成を有するＡｌ基電着合金積
層を表面に形成したチタン、ジルコニウム、モリブデン
、バナジウム、ニオブ、タンタルのうちから選ばれた金
属又はこれらの金属の合金よりなる被電着板を複数枚積
層成形したことを特徴とするＡｌ基電着合金積層材。30-70% by weight of aluminum, 30-70% by weight of titanium, 0.01-0.1% by weight of boron, or 40% by weight of aluminum
~80% by weight, 20-60% by weight of zirconium, 0 boron
．． An electrified material made of a metal selected from titanium, zirconium, molybdenum, vanadium, niobium, and tantalum, or an alloy of these metals, on the surface of which an Al-based electrodeposited alloy laminated layer having a composition of 0.01 to 0.1% by weight is formed. An Al-based electrodeposited alloy laminate material characterized by laminating and molding a plurality of deposited plates.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21157788A JPH0260738A (en) | 1988-08-27 | 1988-08-27 | Al base electrodeposition alloy laminated material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21157788A JPH0260738A (en) | 1988-08-27 | 1988-08-27 | Al base electrodeposition alloy laminated material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0260738A true JPH0260738A (en) | 1990-03-01 |
Family
ID=16608071
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21157788A Pending JPH0260738A (en) | 1988-08-27 | 1988-08-27 | Al base electrodeposition alloy laminated material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0260738A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5672436A (en) * | 1990-05-31 | 1997-09-30 | Grumman Aerospace Corporation | Oxidation protection method for titanium |
-
1988
- 1988-08-27 JP JP21157788A patent/JPH0260738A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5672436A (en) * | 1990-05-31 | 1997-09-30 | Grumman Aerospace Corporation | Oxidation protection method for titanium |
| US5776266A (en) * | 1990-05-31 | 1998-07-07 | Northrop Grumman Corporation | Oxidation protection method for titanium |
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