JPH0260232U - - Google Patents
Info
- Publication number
- JPH0260232U JPH0260232U JP13970588U JP13970588U JPH0260232U JP H0260232 U JPH0260232 U JP H0260232U JP 13970588 U JP13970588 U JP 13970588U JP 13970588 U JP13970588 U JP 13970588U JP H0260232 U JPH0260232 U JP H0260232U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- dry etching
- reaction chamber
- adsorbing
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001312 dry etching Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13970588U JPH0260232U (it) | 1988-10-26 | 1988-10-26 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13970588U JPH0260232U (it) | 1988-10-26 | 1988-10-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0260232U true JPH0260232U (it) | 1990-05-02 |
Family
ID=31403213
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13970588U Pending JPH0260232U (it) | 1988-10-26 | 1988-10-26 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0260232U (it) |
-
1988
- 1988-10-26 JP JP13970588U patent/JPH0260232U/ja active Pending
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