JPH0257143U - - Google Patents

Info

Publication number
JPH0257143U
JPH0257143U JP6541389U JP6541389U JPH0257143U JP H0257143 U JPH0257143 U JP H0257143U JP 6541389 U JP6541389 U JP 6541389U JP 6541389 U JP6541389 U JP 6541389U JP H0257143 U JPH0257143 U JP H0257143U
Authority
JP
Japan
Prior art keywords
reaction
plasma
reaction gas
powder processing
reaction apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6541389U
Other languages
English (en)
Japanese (ja)
Other versions
JPH061233Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6541389U priority Critical patent/JPH061233Y2/ja
Publication of JPH0257143U publication Critical patent/JPH0257143U/ja
Application granted granted Critical
Publication of JPH061233Y2 publication Critical patent/JPH061233Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Powder Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Silicon Compounds (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP6541389U 1988-06-24 1989-06-06 プラズマ粉体処理装置 Expired - Lifetime JPH061233Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6541389U JPH061233Y2 (ja) 1988-06-24 1989-06-06 プラズマ粉体処理装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP8290888 1988-06-24
JP63-82908 1988-06-24
JP6541389U JPH061233Y2 (ja) 1988-06-24 1989-06-06 プラズマ粉体処理装置

Publications (2)

Publication Number Publication Date
JPH0257143U true JPH0257143U (US20030204162A1-20031030-M00001.png) 1990-04-25
JPH061233Y2 JPH061233Y2 (ja) 1994-01-12

Family

ID=31718320

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6541389U Expired - Lifetime JPH061233Y2 (ja) 1988-06-24 1989-06-06 プラズマ粉体処理装置

Country Status (1)

Country Link
JP (1) JPH061233Y2 (US20030204162A1-20031030-M00001.png)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2004112964A1 (ja) * 2003-06-20 2006-07-27 株式会社ホソカワ粉体技術研究所 粉体処理方法、粉体処理装置、及び、多孔質造粒物の製造方法
CN113122821A (zh) * 2020-01-15 2021-07-16 株洲弗拉德科技有限公司 一种搅拌式粉体真空气相沉积炉

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2004112964A1 (ja) * 2003-06-20 2006-07-27 株式会社ホソカワ粉体技術研究所 粉体処理方法、粉体処理装置、及び、多孔質造粒物の製造方法
JP4580339B2 (ja) * 2003-06-20 2010-11-10 ホソカワミクロン株式会社 粉体処理方法、及び、粉体処理装置
US7905434B2 (en) 2003-06-20 2011-03-15 Hosokawa Micron Co., Ltd. Powder processing apparatus
CN113122821A (zh) * 2020-01-15 2021-07-16 株洲弗拉德科技有限公司 一种搅拌式粉体真空气相沉积炉
CN113122821B (zh) * 2020-01-15 2023-05-30 株洲弗拉德科技有限公司 一种搅拌式粉体真空气相沉积炉

Also Published As

Publication number Publication date
JPH061233Y2 (ja) 1994-01-12

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