JPH0254228U - - Google Patents

Info

Publication number

JPH0254228U

JPH0254228U JP13302488U JP13302488U JPH0254228U JP H0254228 U JPH0254228 U JP H0254228U JP 13302488 U JP13302488 U JP 13302488U JP 13302488 U JP13302488 U JP 13302488U JP H0254228 U JPH0254228 U JP H0254228U

Authority

JP

Japan

Prior art keywords

cathode electrode

substrate

plasma etching

etching device

electrode

Prior art date

1988-10-11

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Pending

Links

• Espacenet
• Global Dossier
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• 239000000758 substrate Substances 0.000 claims description 7
• 238000001020 plasma etching Methods 0.000 claims 3
• 230000002093 peripheral effect Effects 0.000 claims 1
• 238000010586 diagram Methods 0.000 description 5
• XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
• 229910052710 silicon Inorganic materials 0.000 description 4
• 239000010703 silicon Substances 0.000 description 4
• 238000005530 etching Methods 0.000 description 2