JPH0252329U - - Google Patents

Info

Publication number

JPH0252329U

JPH0252329U JP12959988U JP12959988U JPH0252329U JP H0252329 U JPH0252329 U JP H0252329U JP 12959988 U JP12959988 U JP 12959988U JP 12959988 U JP12959988 U JP 12959988U JP H0252329 U JPH0252329 U JP H0252329U

Authority

JP

Japan

Prior art keywords

semiconductor manufacturing

lower electrode

upper electrode

wall

reaction vessel

Prior art date

1988-10-04

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Pending

Links

• Espacenet
• Global Dossier
• Discuss

• 239000004065 semiconductor Substances 0.000 claims description 7
• 238000004519 manufacturing process Methods 0.000 claims description 6
• 238000006243 chemical reaction Methods 0.000 claims description 4
• 238000010574 gas phase reaction Methods 0.000 claims 1
• 239000003990 capacitor Substances 0.000 description 1
• 238000005530 etching Methods 0.000 description 1
• 239000012212 insulator Substances 0.000 description 1