JPH0251492A - Single crystal pulling-up device - Google Patents

Single crystal pulling-up device

Info

Publication number
JPH0251492A
JPH0251492A JP20148288A JP20148288A JPH0251492A JP H0251492 A JPH0251492 A JP H0251492A JP 20148288 A JP20148288 A JP 20148288A JP 20148288 A JP20148288 A JP 20148288A JP H0251492 A JPH0251492 A JP H0251492A
Authority
JP
Japan
Prior art keywords
pulling
single crystal
heat
insulating
insulating plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20148288A
Other languages
Japanese (ja)
Inventor
Yoshihiro Morimatsu
森松 良博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP20148288A priority Critical patent/JPH0251492A/en
Publication of JPH0251492A publication Critical patent/JPH0251492A/en
Pending legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To improve the lessening effect of axial temp. gradient by providing such insulating plates with a distance between each other in the insulating tube covering the pulling-up area that have openings which make small annular gaps between a pulling-up shaft. CONSTITUTION:A top insulating plate 6 having the opening the diameter of which is larger by 6-10mm than that of the pulling-up shaft 12 is provided on the upper end surface of the insulating tube 5 covering the pulling-up area of single crystal, and plural intermediate partition insulating plates 7 having the openings the diameter of which are larger by 6-10mm than that of the single crystal 1 pulled up in the inside of the insulating tube 5 are axially disposed with a distance between each other, and plural annular spaces B and C of large volume are formed between the intermediate partition insulating plates each other and between the top insulating plate 6 and the next intermediate partition insulating plate. By this method, the device is free from the need of multistage heaters and an electric power source as in the case of multi-hot- zone type device, and the structure is simple and its cost is low as well as the maintenance is easy.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、液体封止式引上げ法により結晶原料溶融液
から単結晶成長を行わせる単結晶引上げ装置であって、
該装置におけるルツボ上方に引上げ領域を包囲する保温
筒を備えたものに関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention is a single crystal pulling apparatus for growing a single crystal from a crystal raw material melt by a liquid-sealed pulling method, comprising:
The present invention relates to an apparatus including a heat insulating cylinder surrounding the pulling area above the crucible.

〔従来の技術〕[Conventional technology]

この種単結晶引上げ装置におけるルツボまわりの構成例
を第2図゛に示す、結晶原料と液体封止剤とが投入され
る容器であるルツボ8は円筒状のベディスタル容器9内
に密に挿入されてこれに支持され、このベディスタル容
器9を包囲して前記結晶原料と液体封止剤とをルツボ8
内で溶融させるためのヒータ2が配され、さらにこのヒ
ータ2を包囲して円筒状のサイド熱シールド4が配され
ている。サイド熱シールド4の上端面にはヒータ2の上
端面を被って熱が直接上方へ逃げるのを抑制するリング
状の熱シールド4aが設けられ、この熱シールド4aの
上に、結晶原料溶融液10から単結晶を引き上げる際の
引上げ領域を包囲する保温筒5が載置され、この保温筒
5と保温筒5の上方を間隔をおいて被うトップ熱シール
ド3とで単結晶1の軸方向温度勾配を緩やかにして単結
晶内熱応力による歪みの発生を抑制している。
An example of the structure around the crucible in this type of single crystal pulling apparatus is shown in FIG. The crystal raw material and the liquid sealant are placed in the crucible 8 while surrounding the bedistal container 9.
A heater 2 is disposed for melting the inside, and a cylindrical side heat shield 4 is disposed surrounding the heater 2. A ring-shaped heat shield 4a is provided on the upper end surface of the side heat shield 4 to cover the upper end surface of the heater 2 and suppress heat from directly escaping upward. A heat insulating cylinder 5 is placed to surround the pulling area when pulling the single crystal from the wafer.This heat insulating cylinder 5 and a top heat shield 3 covering the upper part of the heat insulating cylinder 5 at a distance maintain the temperature in the axial direction of the single crystal 1. The gradient is made gentle to suppress the generation of distortion due to thermal stress within the single crystal.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

ルツボまわりがこのように構成された単結晶引上げ装置
における問題点は次の通りである。すなわち、第2図に
示されるような保温筒の形状では、結晶原料熔融液10
が高温であるため、雰囲気の不活性ガスが対流し、保温
筒がちょうど煙筒の働きをするため、発明者の実験によ
れば、温度勾配の緩和にはそれほど効果のないことが判
明した。−方、温度勾配緩和を効果的に行いうるちのと
して、単結晶の引上げ領域の範囲内に軸方向多段にヒー
タを配し、軸方向温度勾配を積極的に低減せしめるとと
もに、引き上った単結晶インゴットのアニールを目的と
したマルチホットゾーン方式が知られている。しかしこ
の方式では、ヒータが多段となるため構造が複雑になり
、また、それぞれのヒータに対し電源を備えなければな
らず、経済的にも高価となるのに加え、保守1点検も容
易ではないという欠点があった。
The problems with the single crystal pulling apparatus having the crucible and its surroundings configured in this way are as follows. That is, in the shape of the heat insulating cylinder as shown in FIG. 2, the crystal raw material melt 10
Because the temperature is high, the inert gas in the atmosphere causes convection, and the heat insulating tube acts just like a smoke tube. According to the inventor's experiments, it was found that it was not very effective in alleviating the temperature gradient. - On the other hand, in order to effectively alleviate the temperature gradient, heaters are arranged in multiple stages in the axial direction within the pulling region of the single crystal, to actively reduce the axial temperature gradient, and to A multi-hot zone method for annealing crystal ingots is known. However, with this method, the structure is complicated because the heaters are in multiple stages, and a power source must be provided for each heater, which is not only expensive economically, but also difficult to maintain and inspect. There was a drawback.

本発明の目的は、経済的に安価であり、保守。The purpose of the invention is to be economically inexpensive and easy to maintain.

点検も容易な、軸方向温度勾配緩和効果の大きい保温筒
を備えた単結晶引上げ装置を提供することである。
It is an object of the present invention to provide a single-crystal pulling device that is easy to inspect and equipped with a heat-insulating cylinder that has a large effect of alleviating temperature gradients in the axial direction.

〔課題を解決するための手段〕[Means to solve the problem]

上記課題を解決するために、この発明によれば、単結晶
引上げ装置におけるルツボ上方の引上げ領域を包囲する
保温筒の構成を、引上げ軸との間にリング状小ギャップ
を形成する大きさの孔を有するトップ保温板を上端に備
えるとともに、引き上げられる単結晶外周面との間にリ
ング状小ギャップを形成する大きさの孔を有する中間仕
切り保温板を保温筒内側に軸方向に間隔をおいて備えて
いる構成とするものとする。
In order to solve the above problems, according to the present invention, a heat insulating cylinder surrounding a pulling area above a crucible in a single crystal pulling apparatus is configured to have a hole having a size that forms a small ring-shaped gap between it and the pulling shaft. A top heat insulating plate is provided at the upper end, and a middle partition heat insulating plate having a hole large enough to form a small ring-shaped gap between the outer circumferential surface of the single crystal to be pulled and the middle partition heat insulating plate is spaced in the axial direction inside the heat insulating cylinder. It shall be configured as follows.

〔作用〕[Effect]

保温筒をこのように構成すると、ルツボ側から上昇する
不活性の雰囲気ガスは単結晶インゴット周面と中間仕切
り保温板との間に形成されたリング状小ギャップを通過
して中間仕切り保温板相互間に形成された大きいリング
状空間へ放出されるたびに渦流を形成し、そのつど上昇
のエネルギの一部が渦流のエネルギとして消費されて行
くため、ガスの上昇速度が著しく減殺されて対流が抑制
され、温度勾配が従来のものに比べ著しく小さくなる。
When the heat insulating tube is configured in this way, the inert atmospheric gas rising from the crucible side passes through the small ring-shaped gap formed between the circumferential surface of the single crystal ingot and the intermediate heat insulating plate, and flows between the middle partition heat insulating plates. Each time the gas is released into the large ring-shaped space formed between them, a vortex is formed, and each time a part of the rising energy is consumed as vortex energy, so the rising speed of the gas is significantly reduced and convection is reduced. temperature gradient is significantly smaller than that of the conventional method.

しかも、この構成では、従来のマルチホットゾーン方式
の場合と異なり、多段ヒータや電源を必要としないため
、構成が著しく単純となり、経済的にも安価に構成が可
能となり、保守1点検も容易に可能である。
Moreover, unlike the conventional multi-hot zone method, this configuration does not require multistage heaters or power supplies, making the configuration extremely simple, economically viable, and easy to maintain and inspect. It is possible.

〔実施例〕〔Example〕

第1回に本発明の一実施例を示す0図中、第2図と同一
の部材には同一符号を付し、説明を省略する。
In the first drawing showing an embodiment of the present invention, the same members as those in FIG.

単結晶の引上げ領域を十分カバーする長さを有する従来
の保温筒5の上端面には、引上げ軸12の直径より6〜
lotm大きい直径の孔を有するトップ保温板6が固設
され、また、保温筒5の内側には引き上げられる単結晶
lの直径より同様に6〜10鶴大きい直径の孔を有する
中間仕切り保温板7が複数、軸方向に間隔をおいて配さ
れ、中間仕切り保温板相互間およびトップ保温板6と次
段の中間仕切り保温板との間に容積の大きい複数のリン
公民空間BおよびCを形成している。
The upper end surface of the conventional heat insulating cylinder 5, which has a length that sufficiently covers the pulling area of the single crystal, is
A top heat insulating plate 6 having holes with a lot diameter larger is fixedly installed, and inside the heat insulating cylinder 5 there is also an intermediate partition heat insulating plate 7 having holes with a diameter 6 to 10 times larger than the diameter of the single crystal l to be pulled. are arranged at intervals in the axial direction, forming a plurality of large-volume phosphor spaces B and C between the intermediate heat-insulating plates and between the top heat-insulating plate 6 and the next intermediate partition heat-insulating plate. ing.

単結晶引上げ時に、高温のルツボ8側から上方へ向かう
不活性の雰囲気ガスは、ギャップ幅3〜5mのリング状
小ギャップAを通って大容積のリング状空間Bに入る。
When pulling a single crystal, inert atmospheric gas flowing upward from the high-temperature crucible 8 side passes through a small ring-shaped gap A with a gap width of 3 to 5 m and enters a large-volume ring-shaped space B.

これによりリング状空間B内に渦流が発生し、上方へ向
かうガス流のエネルギの一部が渦流のエネルギとして消
費され、このようにしてリング状小ギャップを通って次
のリング状空間に入る度ごとにガスは上方へ向かうエネ
ルギを失いながら上昇し、最後に引上げ軸12まわりの
1通過面積のより小さいリング状小ギャップDを通って
外部へ出る。
As a result, a vortex is generated in the ring-shaped space B, and a part of the energy of the upward gas flow is consumed as vortex energy, and in this way, each time it passes through the small ring-shaped gap and enters the next ring-shaped space. Each time, the gas rises while losing upward energy, and finally exits through the ring-shaped small gap D around the pulling shaft 12, which has a smaller one-passage area.

なお、本実施例では、複数の中間仕切り保温板7の孔を
すべて単結晶lの直径より6〜Lotm大きい同一寸法
の孔としているが、この孔は中間仕切り保温板の上段に
行くに従って小さくすることも可能であり、この場合に
は保温効果、従って温度勾配緩和効果はさらに大きくな
る。
In this embodiment, all the holes in the plurality of intermediate heat-insulating plates 7 are holes with the same size, which is 6 to Lotm larger than the diameter of the single crystal l, but these holes become smaller toward the top of the intermediate heat-insulating plates. It is also possible to do this, and in this case, the heat retention effect and therefore the temperature gradient relaxation effect will be even greater.

(発明の効果〕 以上に述べたように、本発明によれば、ルツボ上方の単
結晶引上げ領域を包囲して単結晶内熱応力による歪の発
生を抑制する保温筒の構成を、引上げ軸との間にリング
状小ギャップを形成する大きさの孔を有するトップ保温
板を上端に備えるとともに、引き上げられる単結晶外周
面との間にリング状小ギャップを形成する大きさの孔を
有する中間仕切り保温板を保温筒内側に軸方向に間隔を
おいて備えている構成としたので、ルツボ側から上昇す
る不活性の雰囲気ガスが、単結晶の周面と中間仕切り保
温板との間に形成されたリング状小ギャップを通過して
仕切り板相互間に形成されている大きいリング状空間へ
放出されるたびに渦流を形成し、そのつど上昇のエネル
ギの一部が渦流のエネルギとして消費されて行き、この
ためガスの上昇速度が著しく減殺され対流が抑制される
ため、単結晶の軸方向温度勾配が従来の保温筒の場合に
比べ著しく小さくなる。また、本発明の保温筒構成では
、従来のマルチホットゾーン方式の場合のように多段ヒ
ータや電源を必要とせず、構成が著しく単純であり、経
済的にも安価となりかつ保守9点検も容易に可能である
というメリットが得られる。
(Effects of the Invention) As described above, according to the present invention, the structure of the heat insulating cylinder that surrounds the single crystal pulling region above the crucible and suppresses the generation of strain due to thermal stress within the single crystal is combined with the pulling shaft. A top heat insulating plate having a hole sized to form a small ring-shaped gap between the two is provided at the upper end, and an intermediate partition having a hole sized to form a small ring-shaped gap between the outer circumferential surface of the single crystal to be pulled. Since the heat insulating plates are arranged at intervals in the axial direction inside the heat insulating cylinder, inert atmospheric gas rising from the crucible side is formed between the peripheral surface of the single crystal and the intermediate partition heat insulating plate. Each time the liquid passes through the small ring-shaped gap and is released into the large ring-shaped space formed between the partition plates, it forms a vortex, and each time a part of the rising energy is consumed as the energy of the vortex. As a result, the rising speed of the gas is significantly reduced and convection is suppressed, so the temperature gradient in the axial direction of the single crystal becomes significantly smaller than that of the conventional heat-insulating tube. Unlike the multi-hot zone system, multi-stage heaters and power supplies are not required, the structure is extremely simple, it is economically inexpensive, and maintenance and inspection can be easily performed.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明による単結晶引上げ装置の保温筒構成の
一実施例を示すルツボまわりの構成図、第2図は従来の
単結晶引上げ装置の保温筒の構成例を示すルツボまわり
の構成図である。 1:単結晶、5:保温筒、6:トップ保温板、7:中間
仕切り保温板、8ニルツボ、10:結晶原料溶融液、1
1:液体封止剤、12:引上げ軸。 /2プ1−L1ブ°勇右 第1図 第2図
Fig. 1 is a block diagram of the area around the crucible showing an example of the structure of the heat insulating cylinder of the single crystal pulling device according to the present invention, and Fig. 2 is a block diagram of the area around the crucible showing an example of the structure of the heat insulating cylinder of the conventional single crystal pulling device. It is. 1: Single crystal, 5: Heat insulating tube, 6: Top heat insulating plate, 7: Intermediate partition heat insulating plate, 8 Niru pot, 10: Crystal raw material melt, 1
1: Liquid sealant, 12: Pulling shaft. /2P1-L1B °Yuu Right Figure 1 Figure 2

Claims (1)

【特許請求の範囲】[Claims] 1)液体封止式引上げ法により結晶原料溶融液から単結
晶成長を行わせる単結晶引上げ装置であって、該装置に
おけるルツボ上方に引上げ領域を包囲する保温筒を備え
たものにおいて、前記保温筒が、引上げ軸との間にリン
グ状小ギャップを形成する大きさの孔を有するトップ保
温板を上端に備えるとともに、引き上げられる単結晶外
周面との間にリング状小ギャップを形成する大きさの孔
を有する中間仕切り保温板を保温筒内側に軸方向に間隔
をおいて備えていることを特徴とする単結晶引上げ装置
1) A single crystal pulling apparatus for growing a single crystal from a crystal raw material melt by a liquid-sealed pulling method, which is equipped with a heat-retaining cylinder surrounding a pulling region above a crucible, in which the heat-retaining cylinder is equipped with a top heat insulating plate at the upper end having a hole large enough to form a small ring-shaped gap between it and the pulling shaft, and a top heat-insulating plate large enough to form a small ring-shaped gap between it and the outer peripheral surface of the single crystal to be pulled. A single-crystal pulling apparatus characterized in that intermediate partition heat-insulating plates having holes are provided inside a heat-insulating cylinder at intervals in the axial direction.
JP20148288A 1988-08-12 1988-08-12 Single crystal pulling-up device Pending JPH0251492A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20148288A JPH0251492A (en) 1988-08-12 1988-08-12 Single crystal pulling-up device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20148288A JPH0251492A (en) 1988-08-12 1988-08-12 Single crystal pulling-up device

Publications (1)

Publication Number Publication Date
JPH0251492A true JPH0251492A (en) 1990-02-21

Family

ID=16441798

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20148288A Pending JPH0251492A (en) 1988-08-12 1988-08-12 Single crystal pulling-up device

Country Status (1)

Country Link
JP (1) JPH0251492A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5538135A (en) * 1993-09-14 1996-07-23 Cui, Inc. Dual-medium articles, including hinged articles

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5538135A (en) * 1993-09-14 1996-07-23 Cui, Inc. Dual-medium articles, including hinged articles

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