JPH0247116A - Production of polyacetylene - Google Patents
Production of polyacetyleneInfo
- Publication number
- JPH0247116A JPH0247116A JP19821388A JP19821388A JPH0247116A JP H0247116 A JPH0247116 A JP H0247116A JP 19821388 A JP19821388 A JP 19821388A JP 19821388 A JP19821388 A JP 19821388A JP H0247116 A JPH0247116 A JP H0247116A
- Authority
- JP
- Japan
- Prior art keywords
- group
- polyacetylene
- film
- main chain
- acetylene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 229920001197 polyacetylene Polymers 0.000 title claims abstract description 27
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000004215 Carbon black (E152) Substances 0.000 claims abstract description 15
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims abstract description 15
- 229930195733 hydrocarbon Natural products 0.000 claims abstract description 15
- 150000002430 hydrocarbons Chemical class 0.000 claims abstract description 15
- 230000000379 polymerizing effect Effects 0.000 claims abstract description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 6
- 150000002500 ions Chemical class 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 abstract description 8
- 239000000758 substrate Substances 0.000 abstract description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 6
- 125000004432 carbon atom Chemical group C* 0.000 abstract description 6
- 230000015572 biosynthetic process Effects 0.000 abstract description 4
- 230000000694 effects Effects 0.000 abstract description 4
- 229910052681 coesite Inorganic materials 0.000 abstract description 3
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 3
- 239000000377 silicon dioxide Substances 0.000 abstract description 3
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 3
- 229910052682 stishovite Inorganic materials 0.000 abstract description 3
- 229910052905 tridymite Inorganic materials 0.000 abstract description 3
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 125000000896 monocarboxylic acid group Chemical group 0.000 abstract 2
- 125000000524 functional group Chemical group 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 150000001721 carbon Chemical group 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229910020169 SiOa Inorganic materials 0.000 description 1
- LLCSWKVOHICRDD-UHFFFAOYSA-N buta-1,3-diyne Chemical group C#CC#C LLCSWKVOHICRDD-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 229920000015 polydiacetylene Polymers 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明はポリアセチレンの製造方法に関するものである
。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method for producing polyacetylene.
従来の技術
近年、分子デバイスとしてポリアセチレンの形成にだい
しいろいろな試みがなされている。従来の技術として、
ラングミュア−プロジェット法（ＬＢ法）を用いて機能
性単分子膜を形成する試みで、直鎖状炭化水素分子内に
機能性基としてアセチレン基を設け、エネルギービーム
を加えてポリアセチレンを形成しようとする試みがある
。BACKGROUND OF THE INVENTION In recent years, various attempts have been made to form polyacetylene as a molecular device. As conventional technology,
In an attempt to form a functional monolayer using the Langmuir-Prodgett method (LB method), an acetylene group was provided as a functional group within a linear hydrocarbon molecule, and an energy beam was applied to form polyacetylene. There is an attempt to do so.
発明が解決しようとする課題
ところが、エネルギービームを照射してポリアセチレン
形成をするにともない、直鎖状炭化水素分子の末端のカ
ルボキシル基間の距離に比べて、ポリアセチレン部位で
はその分子間距離が短くなり、一方、直鎖状炭化水素分
子の末端のカルボキシル基間の距離は変化することはな
い。そのため、単分子膜に歪が生じ、アセチレン基間の
距離が広がり過ぎると重合反応が起こらなくなる。一般
にアセチレン基同志が０．４オングストローム離れると
重合反応が起こらないといわれている。その結果、長い
共役二重結合などの機能性基を形成することができず、
導電性などの機能を持たせられない。The problem to be solved by the invention is that as polyacetylene is formed by irradiation with an energy beam, the intermolecular distance in the polyacetylene moiety becomes shorter than the distance between the terminal carboxyl groups of linear hydrocarbon molecules. , on the other hand, the distance between the terminal carboxyl groups of a linear hydrocarbon molecule does not change. Therefore, if the monomolecular film is strained and the distance between the acetylene groups becomes too large, the polymerization reaction will not occur. It is generally said that a polymerization reaction will not occur if the acetylene groups are separated by 0.4 angstroms. As a result, it is not possible to form functional groups such as long conjugated double bonds,
It cannot have functions such as conductivity.
課題を解決するための手段
本発明のポリアセチレンの製造方法は、１つ以上の側鎖
を有し、また、主鎖の一端にカルボキシル基を存し、か
つ、主鎖および側鎖の任意の炭素・炭素結合間に、光、
熱、電子イオン等のエネルギーに感応する基として１つ
以上のアセチレン基を有した直鎖状炭化水素分子を複数
個もちいて単分子膜を形成する工程と光、熱、電子イオ
ン等のエネルギービームを前記感応基に照射して前記直
鎖状炭化水素分子を重合させる工程からなることを特徴
としたポリアセチレンの製造方法である。Means for Solving the Problems The method for producing polyacetylene of the present invention has one or more side chains, a carboxyl group at one end of the main chain, and any carbon atoms in the main chain and side chains.・Light, between carbon bonds
A process of forming a monomolecular film using multiple linear hydrocarbon molecules having one or more acetylene groups as groups sensitive to energy such as heat, electron ions, etc., and energy beams such as light, heat, electron ions, etc. The method for producing polyacetylene is characterized by comprising the step of irradiating the sensitive group with the above-mentioned sensitive group to polymerize the linear hydrocarbon molecule.
作用
本発明のポリアセチレンの製造方法は、直鎖状炭化水素
分子の任意の箇所に１つ以上の側鎖を有し、その主鎖及
び側鎖に機能性を持たせる感応基を備えた直鎖状炭化水
素分子を用いて単分子膜を形成し、エネルギービームを
前記感応基に照射して重合させることにより、また、前
記重合させた膜を多層化することにより、従来、直鎖状
炭化水素分子が側鎖を持たないため機能性基同志が反応
するためには距離的に離れていた問題点が解決され、機
能性基の反応距離が短くなり反応性を高めることができ
、さらに、構造的にも歪を生じることが少なくなる。Function The method for producing polyacetylene of the present invention is a linear hydrocarbon molecule that has one or more side chains at any location and has a sensitive group that imparts functionality to the main chain and side chains. By forming a monomolecular film using a linear hydrocarbon molecule and polymerizing it by irradiating the sensitive group with an energy beam, or by forming the polymerized film into multiple layers, it is possible to Since the molecule does not have side chains, the problem of the distance between the functional groups to react with each other has been solved, and the reaction distance between the functional groups has been shortened, increasing reactivity. Also, distortion is less likely to occur.
したがって、本発明のポリアセチレンの製造方法は、理
想的な構造で形成されるため、その効果は大なるものが
ある。Therefore, the method for producing polyacetylene of the present invention has great effects because it is formed with an ideal structure.
実施例
以下に、第１の実施例としてポリアセチレンの製造方法
をを第１，２図を用いて段階的に説明する。EXAMPLE Below, as a first example, a method for producing polyacetylene will be explained step by step using FIGS. 1 and 2.
１はポリアセチレンを形成する任意の基板（たとえば、
半導体Ｓｉ基板）である。２は任意の基板１上に形成さ
れた親水性膜（たとえば、ＳｉＯ２膜）である。３は直
鎖状炭化水素分子
（ｐ＋ Ｑ＋ ｒ＋ Ｓ＋ ｔは、任意の整数
）で、Ｃ０ＯＨ基からｒ＋Ｌ番目の炭素原子に側鎖を持
ち、また、同炭素原子から主鎖のｑ＋を番目の炭素原子
の位置に、また、側鎖のｔ＋ｉ番目の炭素原子の位置に
機能性基としてアセチレン基（−ＣＨＥＥＣＨ−）４を
持つ単分子膜５である。ここで、単分子膜を形成する前
の直鎖状炭化水素分子は、前記化学式のメチル基側と反
対の末端がカルボキシル基（−ＣＯＯＨ）となっており
、ラングミュア−プロジェット法の単分子膜形成法を用
いて親水性膜たとえばＳｉＯ２膜２表面での結合を成し
、単分子膜５を形成している。このとき、直鎖状炭化水
素分子の主鎖の末端基のメチル基（ＣＨａ −）及び側
鎖のメチル基（ＣＨｓ−）は基板表面に並んで成膜され
る。 （第１図）機能性を持たせるためには前記単分子
膜５に遠紫外光を照射して主鎖及び側鎖に設けられたア
セチレン基同志を光反応させ、共役系を持つポリアセチ
レン（−（−Ｃ＝Ｃ−） ｍ−） ８を形成する。1 is any substrate forming polyacetylene (for example,
(semiconductor Si substrate). 2 is a hydrophilic film (eg, SiO2 film) formed on an arbitrary substrate 1. As shown in FIG. 3 is a linear hydrocarbon molecule (p+ Q+ r+ S+ t is an arbitrary integer), which has a side chain at the r+Lth carbon atom from the C0OH group, and also has a side chain from the same carbon atom to the main chain q+ at the carbonth This is a monomolecular film 5 having an acetylene group (-CHEECH-) 4 as a functional group at the atomic position and at the t+i-th carbon atom position of the side chain. Here, the linear hydrocarbon molecule before forming a monomolecular film has a carboxyl group (-COOH) at the end opposite to the methyl group in the chemical formula, and is formed into a monomolecular film using the Langmuir-Prodgett method. Using a formation method, bonds are formed on the surface of a hydrophilic film, such as a SiO2 film 2, to form a monomolecular film 5. At this time, the methyl group (CHa −) of the terminal group of the main chain of the linear hydrocarbon molecule and the methyl group (CHs −) of the side chain are formed into a film in line with each other on the substrate surface. (Fig. 1) In order to impart functionality, the monomolecular film 5 is irradiated with deep ultraviolet light to photoreact the acetylene groups provided in the main chain and side chains, and polyacetylene (- (-C=C-) m-) 8 is formed.
このポリアセチレンは、導電性や非線形光学効果を示し
光電子機能材料として利用され、同一面内の任意の方向
に形成できる。この時、アセチレン基の存在密度が、従
来の２倍となっているためポリアセチレンを形成する光
反応性は高く、また、主鎖及び側鎖ともにポリアセチレ
ンを形成することから構造上の歪も解消される。（第２
図）また、単分子膜５上にさらにポリアセチレンを形成
するには、同様にラングミュアーブロジェ、。This polyacetylene exhibits conductivity and nonlinear optical effects and is used as an optoelectronic functional material, and can be formed in any direction within the same plane. At this time, the density of acetylene groups is twice as high as before, so the photoreactivity to form polyacetylene is high, and since both the main chain and side chains form polyacetylene, structural distortion is eliminated. Ru. (Second
(Figure) In order to further form polyacetylene on the monomolecular film 5, Langmuir-Bloger is used in the same manner.
ト法を用いれば容易に多層膜を形成することができる。A multilayer film can be easily formed using the method.
なお、本発明の実施例では側鎖を１つだけもつ（ｐｙ
ｑ＋ ｒｚ Ｓ＋ ｊは、任意の整数）を用い
たが必要により側鎖の数を増やしてもよい。In addition, in the examples of the present invention, py
q+ rz S+ j is an arbitrary integer), but the number of side chains may be increased if necessary.
また、本発明の実施例ではエネルギービームとして遠紫
外光を用いたが、Ｘ線、電子線などの放射線を用いて重
合してもよい。Furthermore, although deep ultraviolet light was used as the energy beam in the embodiments of the present invention, polymerization may be performed using radiation such as X-rays or electron beams.
さらに、機能性基として本発明の実施例ではアセチレン
基を示したが、ジアセチレン基、ピロール基、チェニレ
ン基、フェニレン基などをはじめとする機能性基であっ
てももちろん構わない。Furthermore, although an acetylene group is shown in the examples of the present invention as a functional group, it is of course possible to use a functional group such as a diacetylene group, a pyrrole group, a chenylene group, a phenylene group, and the like.
さらになお、多層構造を形成するに際し各層にポリアセ
チレン、ポリジアセチレンなどの機能性部を組み合わせ
て形成しても良いことは自明である。Furthermore, it is obvious that when forming a multilayer structure, each layer may be formed in combination with a functional part such as polyacetylene or polydiacetylene.
発明の効果
本発明のポリアセチレンの形成方法を用いることにより
、ポリアセチレン形成時の反応性は格段に高まり、さら
に、ポリアセチレンの形成により生じる内部の歪は皆無
となり、分子デバイスなどの分野に対する効果は大なる
ものがある。Effects of the Invention By using the method for forming polyacetylene of the present invention, the reactivity during the formation of polyacetylene is significantly increased, and furthermore, there is no internal strain caused by the formation of polyacetylene, which has great effects in fields such as molecular devices. There is something.
第１図、第２図本発明の実施例であるポリアセチレンの
形成方法を説明するための断面図である。
１・・・任意の基板、２・・・親水性膜（ＳｉＯａ膜）
、３・・・・・・・・・直鎖状炭化水素分子、４・・・
・・・・・・機能性基（アセチレン基）、５・・・・・
・・・・単分子膜、６・・・・・・・・・ポリアセチレ
ン。FIGS. 1 and 2 are cross-sectional views for explaining a method of forming polyacetylene according to an embodiment of the present invention. 1... Any substrate, 2... Hydrophilic film (SiOa film)
, 3...... linear hydrocarbon molecule, 4...
...Functional group (acetylene group), 5...
...Monolayer, 6...Polyacetylene.
Claims (1)
有し、主鎖および側鎖の任意の炭素・炭素結合間に、光
、熱、電子イオン等のエネルギーの感応基として１つ以
上のアセチレン基を有した直鎖状炭化水素分子を複数個
用いて単分子膜を形成する工程と、光、熱、電子イオン
等のエネルギービームを前記感応基に照射し、前記直鎖
状炭化水素分子を重合させる工程を備えてなることを特
徴としたポリアセチレンの製造方法。It has one or more side chains, has a carboxyl group at one end of the main chain, and has 1 as a group sensitive to energy such as light, heat, and electronic ions between any carbon-carbon bonds of the main chain and side chains. A step of forming a monomolecular film using a plurality of linear hydrocarbon molecules having three or more acetylene groups, and irradiating the sensitive group with an energy beam such as light, heat, electron ions, etc. A method for producing polyacetylene, comprising a step of polymerizing hydrocarbon molecules.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19821388A JPH0247116A (en) | 1988-08-09 | 1988-08-09 | Production of polyacetylene |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19821388A JPH0247116A (en) | 1988-08-09 | 1988-08-09 | Production of polyacetylene |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0247116A true JPH0247116A (en) | 1990-02-16 |
Family
ID=16387373
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19821388A Pending JPH0247116A (en) | 1988-08-09 | 1988-08-09 | Production of polyacetylene |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0247116A (en) |
-
1988
- 1988-08-09 JP JP19821388A patent/JPH0247116A/en active Pending
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