JPH0246710A - Surface treatment for rare earth magnet material - Google Patents

Surface treatment for rare earth magnet material

Info

Publication number
JPH0246710A
JPH0246710A JP19769688A JP19769688A JPH0246710A JP H0246710 A JPH0246710 A JP H0246710A JP 19769688 A JP19769688 A JP 19769688A JP 19769688 A JP19769688 A JP 19769688A JP H0246710 A JPH0246710 A JP H0246710A
Authority
JP
Japan
Prior art keywords
rare earth
magnet material
earth magnet
container
vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP19769688A
Other languages
Japanese (ja)
Inventor
Hiroshi Watanabe
寛 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP19769688A priority Critical patent/JPH0246710A/en
Publication of JPH0246710A publication Critical patent/JPH0246710A/en
Withdrawn legal-status Critical Current

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Abstract

PURPOSE:To finish the grinding process and plating film formation of a magnet material by one time of operation by a method wherein rare earth magnet material and small metallic balls are mixed with one another in a vessel, the surface of the rare earth magnet material is degreased in a basic cleaning solution while the vessel is being turned to be immersed and electroplated in an acidic zinc chloride plating-bath, using the rare earth magnetic material and the small metallic balls as a cathode as well as the plating-bath as an anode. CONSTITUTION:The rare earth magnet material M is fed to a vessel 27 wherein multiple small metallic balls B are contained. The vessel 27 is immersed in a basic cleaning solution. The surface of the rare earth magnet M is degreased in degreasing vessel 2. Later, the vessel 27 is immersed in a washing vessel 3 to be washed. Next, the vessel 27 is pickled in a picking vessel 4 to be washed in another washing vessel 5. During these processes, the vessel 27 is being constantly turned at specific RPM by a moor 35 being driven. After grinding process such as chamfering corners, edges, etc., the vessel 27 is fed to a plating film formation vessel 6 to be electroplated using plating-bath as anode and the rare earth group magnet material M and the small balls B as cathode. In such a process, the plating-bath shall be the zinc chloride plating- bath.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は希土類磁石材の表面処理方法に係わり、更に詳
しくは小型モーターの極、ビデオ。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for surface treatment of rare earth magnet materials, and more particularly to poles of small motors and videos.

オーディオ装置の磁気ヘッド2等容種電気、電子部品あ
るいは他の機構部品の磁気手段となるべきNd−Fe−
B系磁石材、Sm−Co系磁石材の表面研磨及び表面皮
膜形成方法に関するものである。
Nd-Fe- to be used as magnetic means for magnetic heads of audio equipment, electrical, electronic parts, or other mechanical parts.
The present invention relates to a method for surface polishing and surface film formation of B-based magnet materials and Sm-Co-based magnet materials.

〔従来の技術〕[Conventional technology]

周知の通り、各種電気、電子装置あるいは機構部品等に
於ける磁気手段として従来から磁石材が用いられている
。この磁石材の中でも近時Nd−Fe−B系磁石材(ネ
オジウム−鉄−ポロン系磁石材)及びSm−Co系磁石
材(サリュウムーコバルト系磁石材)が用いられるよう
になってきた。これらは、通常成型母材を切出して磁石
素材と成した後、磁石素材の角、エツジ部分を面取り、
糸面取りして表面を研磨し1次いで表面に皮膜を形成し
、製品としての磁石材とするものである。
As is well known, magnetic materials have been conventionally used as magnetic means in various electrical and electronic devices, mechanical parts, and the like. Among these magnet materials, Nd-Fe-B magnet materials (neodymium-iron-poron magnet materials) and Sm-Co magnet materials (sarum-cobalt magnet materials) have recently come to be used. These are usually made by cutting out the molded base material to create the magnet material, and then chamfering the corners and edges of the magnet material.
The threads are chamfered, the surface is polished, and then a film is formed on the surface to produce a magnetic product.

即ち、表面の研磨と表面への皮膜の形成の双方が表面処
理工程に於いて要求されている。その代表的な理由を上
げると、磁石材に角、エツジがあると材質的にもろいの
で欠けを生じ、品質が不良となるので、この欠けを防止
する為に表面研磨を行うものであり、又切出した磁石素
材のままであると、空気に触れると直ちに錆を生じ、腐
蝕が進行する。すると当初定めた磁石材の磁気特性が変
化したり、寸法変化を生じたり、強度低下を招来する。
That is, both surface polishing and formation of a film on the surface are required in the surface treatment process. A typical reason for this is that if the magnet material has corners or edges, the material is brittle and will chip, resulting in poor quality, so the surface is polished to prevent this chipping. If the cut magnet material is left as it is, it will rust immediately upon exposure to air, and corrosion will progress. This may cause changes in the magnetic properties of the initially determined magnet material, dimensional changes, or a decrease in strength.

そこで表面に皮膜を形成するものである。Therefore, a film is formed on the surface.

従って従来からも母材から切出した磁石素材に対して面
取りの表面研磨と、表面皮膜形成が実施されている。即
ち、先ず種々の機械研磨手段により角、エツジの面取り
を行う、この工程の後、続いて別工程で皮膜形成を行う
、この別工程の皮膜形成方法として採られている手段は
、アルミニウム蒸着処理による蒸着皮膜の形成や、ラッ
カー等の塗装による塗膜の形成や、エポキシ系樹脂に浸
漬してコート膜を形成する等々である。
Therefore, in the past, chamfering and surface polishing and surface film formation have been carried out on magnet materials cut out from base materials. That is, first, corners and edges are chamfered by various mechanical polishing means, and after this step, a film is formed in a separate process.The method adopted for forming the film in this separate process is an aluminum vapor deposition process. Formation of a vapor-deposited film, formation of a coating film by painting with lacquer, etc., formation of a coating film by immersion in an epoxy resin, etc.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上記従来技術は長い使用実績を有し、幾つかの長所を有
するものであるが、本出願人が検討を加えた結果、次の
不具合があることが判った。即ち■研磨工程と皮膜工程
が別々であって、一つの作業で出来ない、故に表面処理
作業の能率向上に限界があり、コスト低廉化にも限界が
ある。
Although the above-mentioned conventional technology has a long track record of use and has several advantages, as a result of studies conducted by the present applicant, it has been found that it has the following disadvantages. That is, (1) the polishing process and the coating process are separate and cannot be performed in one operation; therefore, there is a limit to improving the efficiency of the surface treatment operation, and there is also a limit to reducing costs.

■研磨工程のあと、別に皮膜工程を実施するので、研磨
後、皮膜すべく磁石材を移動したすせねばらなず、作業
が繁雑であり、繁雑な為に品質管理が不十分となり勝と
なる。
■After the polishing process, a separate coating process is carried out, so after polishing, the magnet material must be moved to coat it, making the work complicated, and due to the complexity, quality control is insufficient and results are lost. Become.

■従来の皮膜形成工程は基本的に、全て乾式であって、
設備コスト、運転コストが高くつく等々である。
■The conventional film forming process is basically all dry process.
Equipment costs and operating costs are high, etc.

〔目的〕〔the purpose〕

従って本発明の目的とする所は、■磁石材の面取り等の
研磨とメッキ皮膜形成を一回の作業で実施する製法を提
供するにある。これにより作業能率を向上でき且つより
低コストにて磁石材を市場供給できる手段を提供するに
ある。
Therefore, an object of the present invention is to provide (1) a manufacturing method in which polishing such as chamfering of a magnet material and formation of a plating film are performed in one operation. This provides a means for improving work efficiency and supplying magnet materials to the market at lower costs.

■品質を可及的に均一にできる製法を提供するにある。■Providing a manufacturing method that makes quality as uniform as possible.

■設備、運転コストをより安価にできる磁石材の表面処
理方法を提供するにある。
- To provide a surface treatment method for magnet materials that can reduce equipment and operating costs.

そして、特に■上記磁石材の面取り等研磨を良好に、且
つ各磁石材の研磨精度を均一にできる表面処理方法を提
供するにある。
In particular, (1) there is provided a surface treatment method that can improve polishing such as chamfering of the magnet materials and make the polishing precision of each magnet material uniform.

加えて■上記磁石材を、電流効率良くメッキでき、而も
メッキ皮膜を良好に形成できる方法を提供するにある。
In addition, (1) the present invention provides a method for plating the above magnetic material with high current efficiency and forming a good plating film.

而も■研磨とメッキ皮膜形成の双方を一工程で実施する
にもかかわらず、研磨によるメッキ浴等の汚れが可及的
に少ない製法を提供するにある。
Another object of the present invention is to provide a manufacturing method in which the polishing causes as little contamination of the plating bath as possible, even though both polishing and plating film formation are performed in one step.

〔課題を解決する為の手段〕 〔作用〕上記目的を達成
する為に本発明は次の技術的手段を有する。
[Means for Solving the Problem] [Operation] In order to achieve the above object, the present invention has the following technical means.

即ち実施例に対応する添付図面中の符号を用いてこれを
説明すると本発明は次の通りである。
That is, the present invention will be described as follows using the reference numerals in the accompanying drawings that correspond to the embodiments.

先ず、成型母材から所定の大きさに切出した希土類磁石
材M、例えばNd−Fe−B系磁石材。
First, a rare earth magnet material M, for example, a Nd-Fe-B magnet material, is cut into a predetermined size from a molded base material.

Sm−Co系磁石材Mの多数と小球金属ボールBの多数
を収容27中に混在させる。この場合小球金属ボールB
はスチール製であることが望ましいが、他の金属でもよ
い、且つ上記容器27に混在する際、容器中に空間が残
るように収容するものであるが、容器27の全容積の1
/2〜1/3が空間として残るように収容する例を上げ
ることができ、且つ上記希土類磁石材Mと小球金属ボー
ルBの混在比も適宜選択できるけれども、容積比で希土
類磁石材lに対して小球金属ボールを0.8〜1.3の
範囲で選択して混在させる例を上げることができる。
A large number of Sm--Co magnet materials M and a large number of small metal balls B are mixed in the housing 27. In this case, small metal ball B
is preferably made of steel, but may be made of other metals, and when mixed in the container 27, it should be accommodated so that a space remains in the container, but it should be made of 1 of the total volume of the container 27.
An example can be given in which the space is accommodated so that /2 to 1/3 of the space remains, and the mixing ratio of the rare earth magnet material M and the small metal balls B can be selected as appropriate. On the other hand, an example can be given in which small metal balls are selected in the range of 0.8 to 1.3 and mixed.

このようにした後、次いでこの容器を所定の速度で回転
させながらこれを塩基性洗浄剤液中に浸漬する。これに
より希土類磁石材Mの表面の脱脂を行う0次いで水洗す
る。続いて酸洗いを実施し、水洗する。これらの工程に
より、希土類磁石材Mと小球金属ボールBが容器内で流
動せしめられ、即ち容器27内に空間が在ることにより
流動せしめられ、相互に摩擦される。これにより、希土
類磁石材Mの角、エツジが面取りされる。而も1つ1つ
の希土類磁石材Mは回転に伴なう容器27内の流動の過
程に於いて等しく小球金属ボールBと摩擦する。故に面
取りが均一に実施される。特に、小球金属ボールBはそ
の名の通り球であるから、流動している相に着目する時
、切出されて角を有する希土類磁石材Mの間に入り込み
、その球面によって希土類磁石材の角を塑性変形せしめ
るので、希土類磁石材Mの角の欠けを生起せしめること
がないのみならず、良好に面取りする。
After doing this, the container is then immersed in the basic detergent solution while rotating at a predetermined speed. Thereby, the surface of the rare earth magnet material M is degreased and then washed with water. Subsequently, pickling is performed and water washing is performed. Through these steps, the rare earth magnet material M and the small metal balls B are caused to flow within the container, that is, due to the presence of a space within the container 27, they are caused to flow and are rubbed against each other. As a result, the corners and edges of the rare earth magnet material M are chamfered. Moreover, each rare earth magnet material M rubs equally against the small metal ball B during the flow process within the container 27 as it rotates. Therefore, chamfering is performed uniformly. In particular, since the small metal ball B is a sphere as its name suggests, when focusing on the flowing phase, it enters between the rare earth magnet material M that is cut out and has corners, and its spherical surface allows the rare earth magnet material to Since the corners are plastically deformed, not only will the corners of the rare earth magnet material M not be chipped, but also be chamfered well.

而る後に、酸性塩化亜鉛メッキ浴中に浸漬し、上記希土
類磁石材及び小球金属ボールを陰極とし、上記酸性塩化
亜鉛メッキ浴を陽極として電気メッキする。この場合陰
極端子が上記混在物の中に臨んでいる。これにより希土
類磁石材Mの表面にメッキ皮膜が形成される。即ち、上
記の工程迄で面取り等表面研磨された希土類磁石材Mの
表面にこの湿式法によりメッキ皮膜が形成されるわけで
あるが、上述したように回転容器27内には小球金属ボ
ールBが収容されていて、この小球金属ボールBにも陰
極端子41.42が接触する。より具体的には、希土類
磁石材Mは切出された角状であって、この角状のものだ
けであると、容器27内に臨む陰極端子41.42の希
土類磁石材Mに対する接触効率にはその幾何学的形状上
一定のロスが存在する所であるが、小球金属ボールBが
混在していると、その名の通り球であるから、これに対
する陰極端子41.42の接触効率及び、その接触性は
格段と良好となる。そしてこの小球金属ボールBを介し
て各希土類磁石材Mに電流が流れるものであるが、ここ
でも小球金属ボールBは球であるから角状の希土類磁石
材Mに対する接触効率及びその接触性がよく、究極的に
接触効率及び接触性が良い。
Thereafter, it is immersed in an acidic zinc chloride plating bath, and electroplated using the rare earth magnet material and small metal balls as cathodes and the acidic zinc chloride plating bath as an anode. In this case, the cathode terminal faces into the above-mentioned inclusions. As a result, a plating film is formed on the surface of the rare earth magnet material M. That is, a plating film is formed by this wet method on the surface of the rare earth magnet material M whose surface has been polished such as chamfering up to the above steps, but as described above, small metal balls B are is accommodated, and the cathode terminals 41 and 42 also come into contact with this small metal ball B. More specifically, the rare earth magnet material M has a cut-out angular shape, and if only this angular shape is used, the contact efficiency with the rare earth magnet material M of the cathode terminals 41 and 42 facing inside the container 27 will be affected. There is a certain loss due to its geometrical shape, but if small metal balls B are mixed, as the name suggests, they are spheres, so the contact efficiency of the cathode terminals 41 and 42 with respect to them and , the contact properties are much better. A current flows through each rare earth magnet material M through this small metal ball B, but since the small metal ball B is a sphere here as well, the contact efficiency and the contact property with respect to the angular rare earth magnet material M are as follows. and ultimately good contact efficiency and contactability.

即ちメッキの為の電流効率が良好であり、良好にメッキ
皮膜を形成できる。而も上記の研磨と同様、希土類磁石
材Mの間に等しく小球金属ボールBが入り、混在の分布
が均一となるので各希土類磁石材に均一に電流が流れ、
均一メッキ皮膜が形成される。加えて上記の容器内に臨
む陰極端子は、その端末が自由端として形成され、容器
の回転に伴なう上記混在物の容器内の流動に応じて自由
に動き得るように成されている。
That is, the current efficiency for plating is good, and a plating film can be formed well. Similarly to the polishing described above, the small metal balls B are inserted equally between the rare earth magnet materials M, and the distribution of the mixture is uniform, so that the current flows uniformly to each rare earth magnet material.
A uniform plating film is formed. In addition, the cathode terminal facing into the container is formed as a free end so as to be able to move freely in accordance with the flow of the inclusions in the container as the container rotates.

而して、上記メッキ浴は、通常の単純Zn塩と水和Zn
イオンを主成分とする酸性塩化亜鉛メッキ浴でもよいが
、Znアンモニウム錯体を主成分とする弱酸性塩化亜鉛
メッキ浴でもよい。
Therefore, the above plating bath contains ordinary simple Zn salt and hydrated Zn.
An acidic zinc chloride plating bath containing ions as a main component may be used, but a weakly acidic zinc chloride plating bath containing a Zn ammonium complex as a main component may also be used.

このように酸化亜鉛メッキ浴であることから、廃水処理
を最小限の作業で可能にしたり、公害を生ずるシアンの
如き廃水処理装置も不要であり、液の電導性が良いので
浴電圧が低く電力節約になる。又、同じ塩化亜鉛メッキ
浴でも中性の場合には、光沢メッキが得られる条件範囲
が狭いが、酸性浴であるのでその制約が比較的少ない、
このようにしてメッキ皮膜が形成された後、水洗して、
次に希土類磁石材を小球金属ボール群の中から取出す、
これにより一作業で、希土類磁石材の研磨とノー2キ皮
膜形成の双方ができる。
Since this is a zinc oxide plating bath, wastewater treatment can be done with a minimum amount of work, and there is no need for wastewater treatment equipment such as cyanide, which causes pollution.The electroconductivity of the liquid is good, so the bath voltage is low and the power consumption is low. It will save you money. In addition, even with the same zinc chloride plating bath, if it is neutral, the range of conditions under which bright plating can be obtained is narrow, but since it is an acidic bath, there are relatively few restrictions.
After the plating film is formed in this way, it is washed with water,
Next, take out the rare earth magnet material from the group of small metal balls.
This allows both polishing of rare earth magnet material and formation of a no-burn coating in one operation.

〔実施例〕〔Example〕

次に添付図面に従い本発明の好適な実施例を詳述する。 Next, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

先ず実施例の表面処理装置Aを説明する。この表面処理
装置Aは各種を横に一連につなげた処理槽本体Cを有す
る。即ち第2図、第3図に示すように、左から順に希土
類磁石材Mの収容部lと、脱脂槽2と、水洗槽3と、酸
洗い槽4と、水洗槽5と、メッキ皮膜形成槽6と、水洗
槽7と、希土類磁石材Mの取出部8が形成されている。
First, the surface treatment apparatus A of the embodiment will be explained. This surface treatment apparatus A has a treatment tank main body C in which various types are connected in series laterally. That is, as shown in FIGS. 2 and 3, from left to right, there is a storage part l for rare earth magnet material M, a degreasing tank 2, a washing tank 3, a pickling tank 4, a washing tank 5, and a plating film formation. A tank 6, a washing tank 7, and a take-out section 8 for rare earth magnet material M are formed.

上記の内戚容部lと取出部8は、後述する容器中に希土
類磁石材Mを入れ込んだり、そこから排出する作業の為
の空間なので、単に作業者が立つ外部に向って開放され
た空間として構成されているが、他の槽は、いわゆる有
底上面開口状の形を成し。
The above-mentioned inner container part 1 and removal part 8 are spaces for putting rare earth magnet material M into the container and discharging it from there, which will be described later, so they can simply be used as spaces open to the outside where the worker stands. However, other tanks have a so-called bottomed top opening shape.

各種の底には図示せざるもドレン抜き栓が配設されてい
る。
A drain plug (not shown) is provided at the bottom of each type.

次いで、符号りは、後述する容器の搬送装置を示し、左
右側板9.10と、これら左右側板9.10間を結ぶ天
板11等より構成されていると共に、左右側板9.10
間の前後に車輪軸12.13が通され。
Next, the reference numeral indicates a container conveying device, which will be described later, and is composed of left and right side plates 9.10, a top plate 11 etc. that connects these left and right side plates 9.10, and the left and right side plates 9.10.
Wheel axles 12 and 13 are passed between the front and back.

各車輪軸12.13の両端に車輪14が取着している。A wheel 14 is attached to each end of each wheel axle 12,13.

上記4つの車輪14は上記処理槽本体Cの両サイドの縁
の上面に設けられたレール15上を走行する。
The four wheels 14 run on rails 15 provided on the upper surface of both side edges of the processing tank body C.

而して、この車輪14の駆動は、この搬送装置りに装備
されたモーター1B、チェーン17.スブロケッ)18
等の駆動及び動力伝導手段により実施される。更に、天
板11にはエアシリンダー18が取付けられ、そのピス
トン20が下方に向って進退するよう構成され、この先
端に板21が横設されている。
The wheels 14 are driven by a motor 1B, a chain 17. 18
This is carried out by drive and power transmission means such as. Further, an air cylinder 18 is attached to the top plate 11, and a piston 20 thereof is configured to move forward and backward downward, and a plate 21 is horizontally installed at the tip of the air cylinder 18.

即ち、エアーシリンダ18の駆動によりピストン20が
上下動し、これにより板21が上下動するよう構成され
ている。そして上記の上下動を円滑にする為に、上下動
ガイド22 、23が設けられていると共に、板21の
両端に後述する容器の係止ピン24が設けられている0
次に符号Eは容器セット装置を示し、左右側板25.2
8間に棒26′を配した形状を有し、上記左右側板25
.28間に容器27が回転自在に配されている。
That is, the air cylinder 18 is driven to move the piston 20 up and down, thereby causing the plate 21 to move up and down. In order to make the above vertical movement smooth, vertical movement guides 22 and 23 are provided, and container locking pins 24, which will be described later, are provided at both ends of the plate 21.
Next, symbol E indicates a container setting device, and the left and right side plates 25.2
It has a shape in which a bar 26' is arranged between the left and right side plates 25
.. A container 27 is rotatably arranged between 28.

即ち、容器2?は、この例では六角筒状を有し、周面に
通口28が形成されていると共に、一部に脱着自在な蓋
28を有する。そして容器27自体の一方の側板30と
容器セット装置Eの左側板25間に軸31が通され、容
器27自体の他方の側板32と容器セット装置Eの右側
板28間に軸34が通されている。
Namely, container 2? In this example, it has a hexagonal cylindrical shape, has an opening 28 formed in its circumferential surface, and has a removable lid 28 in part. A shaft 31 is passed between one side plate 30 of the container 27 itself and the left side plate 25 of the container setting device E, and a shaft 34 is passed between the other side plate 32 of the container 27 itself and the right side plate 28 of the container setting device E. ing.

加えて、この容器セット装置Eにはモーター35が装備
され、モーター35の出力軸に連なるギア板3Bが、ギ
ア板37を介してもう1つのギア板38に噛合い、この
ギア板3日が容器27の一方の側板32に固定されてい
る。故にモーター35の回転は、ギア板3B、 37.
38を介して容器2?に伝えられ、容器27が軸31.
34を回転中心として予め定めた回転速度でゆっくりと
回転する。勿論この回転の方法2手段は他のものでもよ
い。
In addition, this container setting device E is equipped with a motor 35, and a gear plate 3B connected to the output shaft of the motor 35 meshes with another gear plate 38 via a gear plate 37. It is fixed to one side plate 32 of the container 27. Therefore, the rotation of the motor 35 is caused by the gear plates 3B, 37.
Container 2 through 38? The container 27 is transferred to the shaft 31.
It rotates slowly at a predetermined rotational speed with 34 as the center of rotation. Of course, other methods of rotation may be used.

さて、この容器セット装置Eを構成する左右側板25.
28の上部には係止フック39.40が取着され、これ
を上記搬送装置りの係止ビン24に掛けることによって
容器セット装置、即ち容器27が各種の中に吊下げられ
、且つ吊下げられた状態で上下動するよう構成されてい
る。
Now, the left and right side plates 25 configuring this container setting device E.
A locking hook 39, 40 is attached to the upper part of the container 28, and by hooking this to the locking bin 24 of the conveying device, the container setting device, that is, the container 27 is suspended in various objects, and the container 27 is suspended in various places. It is configured to move up and down in a closed state.

更に上記容器27には、陰極端子41.42が臨んでい
る。即ち軸31.34の中心部を通って絶縁被覆された
陰極端子41.42が容器内に位置し、各陰極端子41
.42の端末は自由端として設定され、フリーになって
いるものである。このような表面処理装置を用いてこの
発明の例の表面処理方法を第1図を参照して次に述べる
。先ず、脱脂槽2中に塩基性洗浄剤を収容する。又酸洗
い槽4中に塩酸及びそれに10%のノニオン系界面活性
剤を添加したものを収容する。更に、メッキ皮膜形成槽
6には弱醜性塩化亜鉛メッキ浴を収容する。このメッキ
浴中には、必要に応じて添加剤が加えられる。例えば光
沢剤キャリヤとしての添加物、緩衝剤、活性化剤等であ
る。より具体的な浴組成と作業条件の一例を上げれば次
の表1の通りである。
Furthermore, cathode terminals 41, 42 face the container 27. That is, through the center of the shaft 31.34 an insulated cathode terminal 41.42 is located in the container, and each cathode terminal 41
.. 42 terminals are set as free ends and are free. A surface treatment method according to an example of the present invention using such a surface treatment apparatus will be described below with reference to FIG. First, a basic cleaning agent is placed in the degreasing tank 2. Further, the pickling tank 4 contains hydrochloric acid and 10% nonionic surfactant added thereto. Further, the plating film forming tank 6 contains a weakly ugly zinc chloride plating bath. Additives are added to this plating bath as necessary. For example, additives as brightener carriers, buffers, activators, etc. An example of a more specific bath composition and working conditions is shown in Table 1 below.

そして上記各水洗槽3,5.7には各々水を収容する。The washing tanks 3, 5.7 each contain water.

さて、このような状態に於いて、先ず搬送装置りを希土
類磁石材収容部l上に位置決めする。そして容器27の
蓋29を開き希土類磁石材Mの多数を容器27中に投入
する。上記容器27中には多数の小球金属ボールBが収
容されているので、これと混在する。勿論、それらを混
在してから容器27中に収容してもよい。これらの場合
、希土類磁石材は成型母材から切出した角状を呈してい
るが、その大きさは用途に応じて種々様々である。−例
を上げれば1幅10m/m、奥行き10m/m 、厚さ
5〜7ffi/11である。他方小球金属ボール例えば
スチールボールBの直径も小球であれば、様々なものを
適用できるものの、例えば6m/m程度である。加えて
、混在物を容器27中に収容する場合、容器27中に空
間が全容積の1/2〜1/3残るようにして収容する。
Now, in such a state, first, the conveying device is positioned over the rare earth magnet material storage section l. Then, the lid 29 of the container 27 is opened and a large number of rare earth magnet materials M are put into the container 27. Since a large number of small metal balls B are housed in the container 27, the metal balls B are mixed therewith. Of course, they may be mixed and then housed in the container 27. In these cases, the rare earth magnet material has an angular shape cut out from the molded base material, but its size varies depending on the application. - For example, one width is 10 m/m, the depth is 10 m/m, and the thickness is 5 to 7 ffi/11. On the other hand, the diameter of the small metal ball, for example, the steel ball B, can be of the order of 6 m/m, for example, although various diameters can be applied as long as they are small balls. In addition, when the inclusions are accommodated in the container 27, they are accommodated in such a way that a space of 1/2 to 1/3 of the total volume remains in the container 27.

これは、以後に於ける容器27の回転によってこれら混
在物を容器内に於いて流動せしめる為である。且つ、希
土類磁石材Mと小球金属ボールBの容積比は、前者1に
対して後者を1〜1.3程度とする例を上げる事ができ
る。
This is because the subsequent rotation of the container 27 causes these mixed substances to flow within the container. In addition, an example can be given in which the volume ratio of the rare earth magnet material M and the small metal ball B is about 1 to 1.3 for the former to 1 for the latter.

この後、m送装置りのシリンダー18のピストン20を
上昇させ、容器27を上昇限に位置させ、次いで搬送装
置りのモーター16を駆動させ、車輪14を走行して、
搬送装置り全体を脱脂槽2の上方に位置決めする。そし
て、ピストン20を下降させ、容器27を下動限に位置
させる。即ち容器27を塩基性洗浄材中に浸漬する。こ
れら搬送装置りの走行S、及びその停止あるいはピスト
ン20の上下動は公知の制御手段に実行される。さて、
上記脱脂槽2に於いては、希土類磁石材Mの表面の脱脂
が行なわれる0例えば5〜10分間行なわれる。以後、
搬送装置りの走行、ピストン20の動作により、容器2
7は次段の水洗槽3に浸漬され、例えば1分間程水洗さ
れる0次いで同じようにして、酸洗い槽4にて5〜10
分間酸洗いされ、次段の水洗槽5で1分間程水洗される
After this, the piston 20 of the cylinder 18 of the m-feeding device is raised to position the container 27 at its upper limit, and then the motor 16 of the conveying device is driven to drive the wheels 14.
The entire conveying device is positioned above the degreasing tank 2. Then, the piston 20 is lowered to position the container 27 at its lower limit of movement. That is, the container 27 is immersed in a basic cleaning material. The traveling S of these conveying devices, their stopping, and the vertical movement of the piston 20 are executed by known control means. Now,
In the degreasing bath 2, the surface of the rare earth magnet material M is degreased for, for example, 5 to 10 minutes. From then on,
Due to the movement of the conveying device and the operation of the piston 20, the container 2
7 is immersed in the next stage water washing tank 3 and washed with water for about 1 minute, for example.
It is pickled for a minute, and then washed with water for about 1 minute in a washing tank 5 at the next stage.

これらの過程に於いて、容器27は、モーター35の回
転により、常時ゆっくりと定速で回転している。即ちモ
ーター35の回転力がギヤ板3B、 37.38に伝達
され、容器27を軸31.34を回転中心としてゆっく
りと回転させる。この結果、希土類磁石材Mと小球金属
ボールBが容器内に於いて流動し、波動過程に於いて第
7図の概念図に示す如く相互摩擦する。そして摩擦によ
って第8図の概念図に示す如く、希土類磁石材Mの角、
エツジが塑性変形され、面取りされる。
During these processes, the container 27 is constantly rotated slowly at a constant speed by the rotation of the motor 35. That is, the rotational force of the motor 35 is transmitted to the gear plates 3B, 37.38, and the container 27 is slowly rotated about the shaft 31.34. As a result, the rare earth magnet material M and the small metal balls B flow in the container and rub against each other in the wave process as shown in the conceptual diagram of FIG. Then, due to friction, as shown in the conceptual diagram of FIG. 8, the corner of the rare earth magnet material M
The edges are plastically deformed and chamfered.

この研磨工程に於ける特徴は次の通りである。The characteristics of this polishing process are as follows.

即ち1つ1つの希土類磁石材Mは回転に伴なう容器27
内の流動の過程に於いて、等しく小球金属ボールBの中
に入り込む。何故ならば小球金属ボールBは、その名の
通り球であるから、希土類磁石材M群の中に等しく分布
して入り込む為である。故に各希土類磁石材の面取りが
均一に行なわれる。そして希土類磁石材M同志の摩擦で
あると、欠けを生ずる場合があるので、この点も防止さ
れる。加えて主として小球金属ボールBによる塑性変形
なので、液の汚れが生じないものである。
In other words, each rare earth magnet material M is attached to the container 27 as it rotates.
In the process of internal flow, the small spheres equally enter into the metal ball B. This is because the small metal balls B are spheres as the name suggests, and therefore enter the group of rare earth magnet materials M in an even distribution. Therefore, each rare earth magnet material is chamfered uniformly. Furthermore, since friction between the rare earth magnet materials M may cause chipping, this problem is also prevented. In addition, since the plastic deformation is mainly caused by the small metal balls B, no liquid stains occur.

この角、エツジの面取り等の研磨の後、この容器27は
メッキ皮膜形成槽6に送られる。ここで例えば30分分
間型気メッキされる。即ちメッキ浴を陽極とし、希土類
磁石材M及び小球金属ボールBを陰極として湿式による
電気メッキが実施される。メッキ厚さは例えば0.00
7〜0.009+s脂程度のものを一例として上げるこ
とができる。ここでの特徴は次の通りである。
After polishing such as chamfering the corners and edges, the container 27 is sent to the plating film forming tank 6. Here, the mold plating is carried out for, for example, 30 minutes. That is, wet electroplating is performed using the plating bath as an anode and the rare earth magnet material M and small metal balls B as cathodes. For example, the plating thickness is 0.00
One example is one with a fat content of about 7 to 0.009+s. The features here are as follows.

即ち、希土類磁石材Mは切出された角状であって、この
角状のものだけであると、容器27内に臨む陰極端子4
1.42の希土類磁石材Mに対する接触効率にはその幾
何学形状上一定のロスが存在する所であるが、小球金属
ボールBが混在していると、その名の通り球であるから
、これら小球金属ボールBと希土類磁石材Mに対する陰
極端子の接触効率が良くなる。
That is, the rare earth magnet material M has a cut-out angular shape, and when only this angular material is used, the cathode terminal 4 facing into the container 27
There is a certain loss in the contact efficiency with the rare earth magnet material M of 1.42 due to its geometric shape, but if small metal balls B are mixed, as the name suggests, it is a sphere, so The contact efficiency of the cathode terminal with these small metal balls B and the rare earth magnet material M is improved.

即ち電疏効率が良くなり、メッキが効率良〈実施される
。第9図の概念図は、陰極端子42から、小球金属ボー
ルBへ電気が流れ、それから希土類磁石材Mへ流れる様
子を示している。勿論流動過程の局面に於いては、陰極
端子から希土類磁石材Mに伝わり、次いで小球金属ボー
ルBを介して他の希土類磁石材Mへ伝わる場合もある。
In other words, the electrolyte efficiency is improved and plating is carried out efficiently. The conceptual diagram in FIG. 9 shows how electricity flows from the cathode terminal 42 to the small metal ball B, and then to the rare earth magnet material M. Of course, in the phase of the flow process, it may be transmitted from the cathode terminal to the rare earth magnet material M, and then transmitted to other rare earth magnet materials M via the small metal ball B.

面も、小球金属ボールBの分布が均一であるから、上記
の電気伝導も均一に実施される。加えて、小球金属ボー
ルBと希土類磁石材Mの接触状態は点接触であるから、
各部の接触点に於ける電流密度が等しく、この意味でも
メッキが均一となる。このようにして面取り等の表面研
磨と、メッキ皮膜形成が一工程で形成できる。
Since the small metal balls B are uniformly distributed on the surface, the electrical conduction described above is also carried out uniformly. In addition, since the contact state between the small metal ball B and the rare earth magnet material M is point contact,
The current density at the contact points of each part is equal, and in this sense, the plating becomes uniform. In this way, surface polishing such as chamfering and formation of a plating film can be performed in one step.

而して上記のメッキ浴は塩化亜鉛メッキ浴なので廃水処
理は中和沈澱法のみでよく、シアンを使用しないので公
害を回避する為の廃水処理装置不要であり、液の電導性
が良いので浴電圧が低く、電力の節約になる。且つメッ
キ速度が比較的早い、而も酸性浴なので、光沢メッキを
得る条件範囲に限定されない。
Since the above-mentioned plating bath is a zinc chloride plating bath, only the neutralization precipitation method is required for wastewater treatment.Since cyanide is not used, there is no need for wastewater treatment equipment to avoid pollution, and the bath has good conductivity. Low voltage saves power. In addition, since the plating speed is relatively high and it is an acidic bath, the conditions for obtaining bright plating are not limited.

尚、このようにして表面処理した希土類磁石材Mは、取
出部8に於いて小球金属ボール8群から排出される。
The rare earth magnet material M whose surface has been treated in this way is discharged from the group of 8 small metal balls in the extraction section 8.

〔効果〕〔effect〕

以上詳述した如くこの発明によれば、■希土類磁石材を
一作業で、面取り表面研磨でき且つメッキ皮膜を形成で
きる。
As detailed above, according to the present invention, (1) the chamfered surface of a rare earth magnet material can be polished and a plating film can be formed in one operation;

■そして、−作業でできる結果、表面処理が均一となる
■And, as a result of the - work, the surface treatment becomes uniform.

■この為の設備、運転コストも低廉化でさる。■Equipment and operating costs for this purpose are also low.

■面取り等の表面研磨が良好にでき、而も研磨精度を均
一にできる。
■ Surface polishing such as chamfering can be performed well, and the polishing precision can be made uniform.

■メッキ皮膜形成を電流効率良〈実施でき、而もメッキ
皮膜を均一にできる。
■The plating film can be formed with high current efficiency, and the plating film can be made uniform.

等実用上各種の利点を呈するものである。It offers various practical advantages.

【図面の簡単な説明】[Brief explanation of the drawing]

添付図面は本発明の実施例を示し、第1図は工程説明図
、第2図は表面処理装置の平面図、第3図は部分断面を
含む側面図、第4図は横断面図、第5図は容器セット装
置の正面図、第6図は容器セット装置の側面図、第7図
は希土類磁石材の研磨工程の概念図、第8図は希土類磁
石材の角、エツジが小球金属ボールBによって曹性変形
されて面取りされる所を示した概念図、第9図は希土類
磁石・材のメッキ皮膜形成工程の概念図である。 図中Mは希土類磁石材、Bは小球金属ボール。 ■は希土類磁石材収容部、2は脱脂槽、3は水洗槽、4
は酸洗い櫂、5は水洗槽、61ナメッキ皮膜形成槽、7
は水洗槽、8は希土類磁石材取出部である。
The accompanying drawings show embodiments of the present invention; FIG. 1 is a process explanatory diagram, FIG. 2 is a plan view of the surface treatment apparatus, FIG. 3 is a side view including a partial cross section, FIG. 4 is a cross sectional view, and FIG. Fig. 5 is a front view of the container setting device, Fig. 6 is a side view of the container setting device, Fig. 7 is a conceptual diagram of the polishing process of rare earth magnet material, and Fig. 8 is a corner and edge of the rare earth magnet material made of small metal balls. FIG. 9 is a conceptual diagram showing a place where the ball B is corrugated and chamfered, and FIG. 9 is a conceptual diagram of the process of forming a plating film on a rare earth magnet/material. In the figure, M is a rare earth magnet material and B is a small metal ball. ■ is a rare earth magnet material storage part, 2 is a degreasing tank, 3 is a water washing tank, 4
5 is a pickling paddle, 5 is a washing tank, 61 is a plating film forming tank, and 7 is a pickling paddle.
8 is a washing tank, and 8 is a rare earth magnet material extraction section.

Claims (6)

【特許請求の範囲】[Claims] (1)成型母材から切出した希土類磁石材Mの表面を研
磨すると共に、表面に皮膜を形成する希土類磁石材Mの
表面処理方法に於いて; 上記希土類磁石材Mの多数を容器27中に収容せしめ、
先ずそれらを塩基性洗浄剤中に浸漬して希土類磁石材M
の表面を脱脂し、次いで水洗し、続いて酸洗いを実施し
、引き続いて水洗し、而る後に、酸性塩化亜鉛メッキ浴
中に浸漬し、上記希土類磁石材を陰極とし、上記酸性塩
化亜鉛メッキ浴を陽極として電気メッキすることにより
希土類磁石材Mの表面にメッキ皮膜を形成し、この後水
洗するようにすると共に、上記希土類磁石材Mが収容さ
れた容器27中に多数の小球金属ボールBを収容し、希
土類磁石材Mの多数と小球金属ボールBの多数を混在さ
せて上記各工程を実施し、上記希土類磁石材Mの表面の
研磨は、上記各工程に於ける上記容器27の回転により
上記希土類磁石材Mと小球金属ボールBを回転容器27
内に於いて流動せしめ、希土類磁石材Mと金属ボールB
を相互に摩擦せしめて小球金属ボールBによって希土類
磁石材Mの角、エッジを塑性変形させて面取りすること
によって実施し、面も、上記希土類磁石材Mの表面への
メッキ皮膜の形成は、上記酸性塩化亜鉛メッキ浴中への
浸漬工程に於ける上記容器27の回転により、容器27
内に臨む陰極端子41,42を希土類磁石材Mのみなら
ず、小球金属ボールBにも接触せしめて実施するように
した事を特徴とする希土類磁石材の表面処理方法。
(1) In a surface treatment method for rare earth magnet material M, in which the surface of rare earth magnet material M cut out from a molded base material is polished and a film is formed on the surface; a large number of the rare earth magnet materials M are placed in a container 27; Contain,
First, they are immersed in a basic detergent to prepare the rare earth magnet material M.
The surface of the is degreased, then washed with water, then pickled, then washed with water, and then immersed in an acidic zinc chloride plating bath, using the rare earth magnet material as a cathode, and using the acidic zinc chloride plating as a cathode. A plating film is formed on the surface of the rare earth magnet material M by electroplating using the bath as an anode, which is then washed with water, and a large number of small metal balls are placed in the container 27 containing the rare earth magnet material M. The above steps are carried out with a large number of rare earth magnet materials M mixed with a large number of small metal balls B, and the polishing of the surface of the rare earth magnet material M is carried out in the container 27 in each of the above steps. The rare earth magnet material M and the small metal balls B are transferred to the rotating container 27 by the rotation of
Rare earth magnet material M and metal ball B are made to flow inside.
The formation of a plating film on the surface of the rare earth magnet material M is carried out by causing the corners and edges of the rare earth magnet material M to be plastically deformed and chamfered by making them rub against each other using small metal balls B, and forming a plating film on the surface of the rare earth magnet material M. The rotation of the container 27 during the immersion process in the acidic zinc chloride plating bath causes the container 27 to
A method for surface treatment of a rare earth magnet material, characterized in that the cathode terminals 41 and 42 facing inside are brought into contact not only with the rare earth magnet material M but also with a small metal ball B.
(2)上記希土類磁石材MはNd−Fe−B系磁石材で
あることを特徴とする請求項第1項記載の希土類磁石材
の表面処理方法。
(2) The method for surface treatment of a rare earth magnet material according to claim 1, wherein the rare earth magnet material M is a Nd-Fe-B based magnet material.
(3)上記希土類磁石材MはSm−Co系磁石材である
ことを特徴とする請求項第1項記載の希土類磁石材の表
面処理方法。
(3) The method for surface treatment of a rare earth magnet material according to claim 1, wherein the rare earth magnet material M is an Sm-Co magnet material.
(4)上記小球金属ボールBはスチール製ボールである
ことを特徴とする請求項第1項、第2項又は第3項記載
の希土類磁石材の表面処理方法。
(4) The method for surface treatment of rare earth magnet materials according to claim 1, 2 or 3, wherein the small metal balls B are steel balls.
(5)上記希土類磁石材Mと小球金属ボールBとの混在
物を回転容器27内に収容した時に、回転容器27中に
、回転容器27の全容積の1/2〜1/3が空間として
残るように上記混在物を回転容器27内に収容すると共
に、上記希土類磁石材Mと小球金属ボールBの混在容積
比は上記希土類磁石材1に対して小球金属ボールを0.
8〜1.3に選定して実施することを特徴とする請求項
第1項,第2項,第3項又は第4項記載の希土類磁石材
の表面処理方法。
(5) When the mixture of rare earth magnet material M and small metal balls B is housed in the rotating container 27, 1/2 to 1/3 of the total volume of the rotating container 27 is a space. The mixture is housed in the rotating container 27 so that the rare earth magnet material M and the small metal balls B are mixed in a volume ratio of 0.0.
The surface treatment method for rare earth magnet material according to claim 1, 2, 3, or 4, characterized in that the surface treatment method is carried out by selecting one of the following: 8 to 1.3.
(6)上記回転容器27内に臨む陰極端子41,42は
複数であって、各々回転容器27の回転に伴ない自由変
位可能に端末が自由端として構成されていることを特徴
とする請求項第1項,第2項,第3項,第4項又は第5
項記載の希土類磁石材の表面処理方法。
(6) A plurality of cathode terminals 41 and 42 facing into the rotating container 27 are provided, each of which is configured as a free end so as to be freely displaceable as the rotating container 27 rotates. Paragraph 1, Paragraph 2, Paragraph 3, Paragraph 4 or Paragraph 5
2. Surface treatment method for rare earth magnet material described in Section 1.
JP19769688A 1988-08-08 1988-08-08 Surface treatment for rare earth magnet material Withdrawn JPH0246710A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19769688A JPH0246710A (en) 1988-08-08 1988-08-08 Surface treatment for rare earth magnet material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19769688A JPH0246710A (en) 1988-08-08 1988-08-08 Surface treatment for rare earth magnet material

Publications (1)

Publication Number Publication Date
JPH0246710A true JPH0246710A (en) 1990-02-16

Family

ID=16378837

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19769688A Withdrawn JPH0246710A (en) 1988-08-08 1988-08-08 Surface treatment for rare earth magnet material

Country Status (1)

Country Link
JP (1) JPH0246710A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0311712A (en) * 1989-06-09 1991-01-21 Kanegafuchi Chem Ind Co Ltd Manufacture of plastic magnet
CN102040947A (en) * 2009-10-13 2011-05-04 北京中科三环高技术股份有限公司 Biological oil removing agent for permanent-magnet materials
WO2021130873A1 (en) * 2019-12-24 2021-07-01 Ykk株式会社 Electroplating system
WO2021130874A1 (en) * 2019-12-24 2021-07-01 Ykk株式会社 Electroplating device and method for manufacturing plated product
CN114574873A (en) * 2022-03-04 2022-06-03 江苏国源稀土新材料有限公司 Neodymium iron boron waste recovery device and method for manufacturing praseodymium neodymium oxide

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6054406A (en) * 1983-09-03 1985-03-28 Sumitomo Special Metals Co Ltd Permanent magnet having excellent oxidation resistance characteristic
JPS61185910A (en) * 1985-02-13 1986-08-19 Sumitomo Special Metals Co Ltd Manufacture of permanent magnet with excellent corrosion-resisting property
JPS62128505A (en) * 1985-11-29 1987-06-10 Seiko Instr & Electronics Ltd Magnet
JPS62206806A (en) * 1986-03-07 1987-09-11 Tohoku Metal Ind Ltd Alloy magnet with oxidation-resistant film and manufacture thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6054406A (en) * 1983-09-03 1985-03-28 Sumitomo Special Metals Co Ltd Permanent magnet having excellent oxidation resistance characteristic
JPS61185910A (en) * 1985-02-13 1986-08-19 Sumitomo Special Metals Co Ltd Manufacture of permanent magnet with excellent corrosion-resisting property
JPS62128505A (en) * 1985-11-29 1987-06-10 Seiko Instr & Electronics Ltd Magnet
JPS62206806A (en) * 1986-03-07 1987-09-11 Tohoku Metal Ind Ltd Alloy magnet with oxidation-resistant film and manufacture thereof

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0311712A (en) * 1989-06-09 1991-01-21 Kanegafuchi Chem Ind Co Ltd Manufacture of plastic magnet
CN102040947A (en) * 2009-10-13 2011-05-04 北京中科三环高技术股份有限公司 Biological oil removing agent for permanent-magnet materials
WO2021130873A1 (en) * 2019-12-24 2021-07-01 Ykk株式会社 Electroplating system
JPWO2021130873A1 (en) * 2019-12-24 2021-07-01
WO2021130874A1 (en) * 2019-12-24 2021-07-01 Ykk株式会社 Electroplating device and method for manufacturing plated product
JPWO2021130874A1 (en) * 2019-12-24 2021-07-01
CN114574873A (en) * 2022-03-04 2022-06-03 江苏国源稀土新材料有限公司 Neodymium iron boron waste recovery device and method for manufacturing praseodymium neodymium oxide
CN114574873B (en) * 2022-03-04 2022-11-25 江苏国源稀土新材料有限公司 Neodymium iron boron waste recovery device and method for manufacturing praseodymium neodymium oxide

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