JPH024148B2 - - Google Patents
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- Publication number
- JPH024148B2 JPH024148B2 JP59213633A JP21363384A JPH024148B2 JP H024148 B2 JPH024148 B2 JP H024148B2 JP 59213633 A JP59213633 A JP 59213633A JP 21363384 A JP21363384 A JP 21363384A JP H024148 B2 JPH024148 B2 JP H024148B2
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- electrode
- main discharge
- dielectric
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/041—Arrangements for thermal management for gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0385—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0384—Auxiliary electrodes, e.g. for pre-ionisation or triggering, or particular adaptations therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、第３電極を有する放電励起エキシ
マレーザ装置の構成に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to the configuration of a discharge-excited excimer laser device having a third electrode.
〔従来の技術〕
第３図は例えば（アイ・イー・イー・イージヤ
ーナル オブ クオンタムエレクトロニクス・ボ
リウム17.No.１第81頁〜91頁（1981）（IEEE
Journal of Quantum Electronics.vol.17.No.
1pp81−91（1981））に示された従来の放電励起エ
キシマレーザ装置の電極系の断面図であり、１は
レーザ光軸を長手方向とする片方の主放電電極、
２はこの１と相対向するように配設されたもう一
方の主放電電極である。電極２は２ａ，２ｂ，２
ｃより成り、２ｂはこの２の中央部に設けられた
スクリーン電極、２ａと２ｃはこの２ｂの両側に
位置し、この２ｂを支持する支持電極である。３
は片方の主放電電極２の近傍に設置されたワイヤ
ー状の補助電極、４は２と３の間に挾まれた誘電
体で、この従来例においては石英管より成る。５
はレーザカス、６は主放電電極１と補助電極３に
接続された端子、７は主放電極２に接続された端
子、８は誘電体４と主放電電極２の間で生じる補
助放電、９は主放電電極１と２の間で生じる主放
電である。[Prior art] Figure 3 shows, for example,
Journal of Quantum Electronics.vol.17.No.
1pp81-91 (1981)) is a cross-sectional view of the electrode system of a conventional discharge-excited excimer laser device, in which 1 is one main discharge electrode with the laser optical axis in the longitudinal direction;
2 is the other main discharge electrode disposed opposite to 1. Electrodes 2 are 2a, 2b, 2
2b is a screen electrode provided at the center of 2b, and 2a and 2c are supporting electrodes located on both sides of 2b to support 2b. 3
4 is a wire-shaped auxiliary electrode placed near one of the main discharge electrodes 2, and 4 is a dielectric sandwiched between 2 and 3, which in this conventional example is made of a quartz tube. 5
6 is a terminal connected to the main discharge electrode 1 and the auxiliary electrode 3; 7 is a terminal connected to the main discharge electrode 2; 8 is an auxiliary discharge generated between the dielectric 4 and the main discharge electrode 2; 9 is a terminal connected to the main discharge electrode 1 and the auxiliary electrode 3; This is the main discharge that occurs between main discharge electrodes 1 and 2.
次に動作について説明する。端子６，７間にパ
ルス電圧が印加されると、そのパルス電圧の立上
り部分において主放電電極１，２間よりも電極間
隔の短い主放電電極２と補助電極３の間で、まず
補助放電８が発生する。この補助放電から発せら
れる紫外光による光電離効果と、該放電場から電
子がスクリーン電極２ｂを通りぬけて主放電電極
１，２の間の主放電空間に供給される効果により
該主放電空間には104〜106個／cm3以上の電子が均
一に供給される（予備電離）。さて端子６，７間
に印加されるパルス電圧がさらに上昇し、主放電
電極間の放電開始電圧に達すると、予め空間に供
給されていた電子が加速されて生ずる衝突電離が
急に盛んになり、空間的に拡がつた主放電９が発
生する。この主放電によりレーザガス５が励起さ
れレーザ光が紙面と垂直方向に発振する。以上の
動作を繰返すことにより、パルス性のレーザ光が
繰返し発振される。 Next, the operation will be explained. When a pulse voltage is applied between the terminals 6 and 7, an auxiliary discharge 8 is first generated between the main discharge electrode 2 and the auxiliary electrode 3, which have a shorter electrode interval than between the main discharge electrodes 1 and 2, at the rising edge of the pulse voltage. occurs. Due to the photoionization effect due to the ultraviolet light emitted from this auxiliary discharge and the effect that electrons from the discharge field pass through the screen electrode 2b and are supplied to the main discharge space between the main discharge electrodes 1 and 2, 10 4 to 10 6 electrons/cm 3 or more are uniformly supplied (pre-ionization). Now, when the pulse voltage applied between terminals 6 and 7 further increases and reaches the discharge starting voltage between the main discharge electrodes, the collision ionization caused by the acceleration of the electrons that had been previously supplied to the space suddenly becomes more active. , a spatially expanded main discharge 9 is generated. This main discharge excites the laser gas 5 and oscillates laser light in a direction perpendicular to the plane of the paper. By repeating the above operations, pulsed laser light is repeatedly oscillated.
ところで、レーザ光を効率良く発振させるため
には、相対向する主放電電極１，２の間の広い空
間にわたり、主放電９を一様に発生させる必要が
あるが、このためには、補助放電８を一様に発生
して、一様な密度の予備電離電子を主放電域に供
給する必要がある。この従来例においてはこれを
実現するために、補助電極３と主放電電極２の間
に石英管より成る誘電体４を介在させ、補助放電
が局部的に偏在するのを防止している。 By the way, in order to efficiently oscillate laser light, it is necessary to generate the main discharge 9 uniformly over a wide space between the opposing main discharge electrodes 1 and 2. 8 must be uniformly generated to supply a uniform density of pre-ionized electrons to the main discharge region. In this conventional example, in order to realize this, a dielectric body 4 made of a quartz tube is interposed between the auxiliary electrode 3 and the main discharge electrode 2 to prevent the auxiliary discharge from being locally unevenly distributed.
市販品のエキシマレーザ装置においては、レー
ザガス５はレーザ筐体（図示せず）に封入して用
いられる。XeGlエキシマレーザ装置の場合には、
レーザガスとして例えばHe，Xe，HClを混合比
He：Xe：HGl＝94.7：５：0.3で混合したものが
用いられる。またKrFエキシマレーザ装置の場合
には、例えばHe：Kr：F2＝94.96：4.8：0.24の混
合比の混合カスが用いられる。この他にArF，
XeFなどのエキシマレーザ装置が使われている。
市販品においては、封入するレーザガスの種類を
変えることによりレーザ光の発振波長を変えるこ
とができる。 In a commercially available excimer laser device, the laser gas 5 is used by being sealed in a laser housing (not shown). In the case of XeGl excimer laser equipment,
For example, the mixing ratio of He, Xe, and HCl as laser gas
A mixture of He:Xe:HGl=94.7:5:0.3 is used. Further, in the case of a KrF excimer laser device, a mixed sludge with a mixing ratio of He:Kr:F 2 =94.96:4.8:0.24 is used, for example. In addition to this, ArF,
Excimer laser devices such as XeF are used.
In commercially available products, the oscillation wavelength of laser light can be changed by changing the type of laser gas enclosed.
エキシマレーザを繰返して動作させるとレーザ
出力は漸次低下する。これは、補助放電８、およ
び主放電９により発生するハロゲンもしくはハロ
ゲン化合物の励起種あるいはイオンが電極１，
２，３およびこの周辺の構成物である誘電体４な
どと反応して、レーサ発振に有害な放電生成物を
生じるととともに、レーザガス中のHCIもしくは
F2の濃度を減少させるからである。繰返し動作
を行なつた場合のレーザ出力の減少する割合は、
レーザガスとして反応性の高いフツ素系のガスを
含む場合の方が、塩素系のガスを含む場合に比べ
て大きい。 When the excimer laser is operated repeatedly, the laser output gradually decreases. This is because excited species or ions of halogen or halogen compounds generated by the auxiliary discharge 8 and the main discharge 9 are transferred to the electrode 1,
2, 3 and the surrounding components such as dielectric 4, producing discharge products harmful to laser oscillation, as well as HCI or HCl in the laser gas.
This is because it reduces the concentration of F2 . The rate at which the laser output decreases after repeated operations is
It is larger when the laser gas contains a highly reactive fluorine-based gas than when it contains a chlorine-based gas.
従来の補助電極を有する放電励起エキシマレー
ザ装置においては、補助電極３と主放電電極２の
間に誘電体４を介在させ、かつこの誘電体として
石英を用いているので、以下のような２つの問題
点が生じる。
In a conventional discharge-excited excimer laser device having an auxiliary electrode, a dielectric 4 is interposed between the auxiliary electrode 3 and the main discharge electrode 2, and quartz is used as the dielectric. A problem arises.
まず、十分な補助放電８を得るためには、石英
４の場合比誘電率が小さいので石英の厚みを小さ
くして誘電体としての静電容量を増大させるか、
もしくは主放電電極２と補助電極３の間に印加す
る電圧を大きくする必要がある。しかしながら、
これは誘電体である石英４に印加される電界強度
の増加をもたらす。石英はその絶縁性能が低いの
で、このような状況下において長時間繰返し動作
させると絶縁性能が劣化し、ついには絶縁破壊を
起こすという問題点があつた。 First, in order to obtain a sufficient auxiliary discharge 8, in the case of quartz 4, the dielectric constant is small, so either the thickness of the quartz is reduced to increase the capacitance as a dielectric, or
Alternatively, it is necessary to increase the voltage applied between the main discharge electrode 2 and the auxiliary electrode 3. however,
This results in an increase in the electric field strength applied to the dielectric quartz 4. Since quartz has low insulation performance, there is a problem in that when it is repeatedly operated for a long time under such conditions, the insulation performance deteriorates and eventually dielectric breakdown occurs.
第二に、通常のエキシマレーザ装置において
は、同一の装置で塩素系のレーザガスとフツ素系
のレーザガスを発振波長に応じて交互に用いる
が、フツ素系のレーザガスを用いた場合には、放
電によつて生成される励起されたフツ素原子、フ
ツ素分子およフツ素化合物は石英と反応するの
で、レーザガス中のフツ素ガス濃度の低下が著し
くなる。また、反応による不純ガスの増加も相ま
つて、レーザ出力の時間とともに低下する割合が
大きくなる。よつて、レーザ出力の低下分をある
範囲内に抑えるためには、頻繁にレーザガスの交
換を行なう必要があつた。 Second, in normal excimer laser equipment, chlorine-based laser gas and fluorine-based laser gas are used alternately in the same device depending on the oscillation wavelength, but when fluorine-based laser gas is used, the discharge The excited fluorine atoms, fluorine molecules, and fluorine compounds generated by react with quartz, resulting in a significant decrease in the fluorine gas concentration in the laser gas. In addition, due to the increase in impurity gas due to the reaction, the rate at which the laser output decreases with time increases. Therefore, in order to suppress the decrease in laser output within a certain range, it is necessary to frequently replace the laser gas.
この発明は上記のような問題点を解消するため
になされたもので、十分な補助放電が得られ、か
つ絶縁劣化を抑えて長時間にわたり高信頼度で動
作できるとともに、レーザガスの長寿命化を実現
できる放電励起エキシマレーザ装置を得ることを
目的とする。 This invention was made to solve the above-mentioned problems, and it is possible to obtain sufficient auxiliary discharge, suppress insulation deterioration, and operate with high reliability for a long time, as well as extend the life of the laser gas. The purpose is to obtain a discharge-excited excimer laser device that can be realized.
〔問題点を解決するための手段〕
この発明に係る放電励起エキシマレーザ装置
は、補助電極３と主放電電極２の間に挾む誘電体
４として、アルミナを主成分とするアルミナ磁器
を用いたものである。[Means for Solving the Problems] The discharge-excited excimer laser device according to the present invention uses alumina porcelain whose main component is alumina as the dielectric material 4 sandwiched between the auxiliary electrode 3 and the main discharge electrode 2. It is something.
この発明において用いられるアルミナ磁器は、
絶縁耐力が極めて高いのでその厚みを薄くして使
用しても絶縁性能が低下することがなく、更に比
誘電率が大きいので十分な補助放電が得られ、ま
たフツ素ガスに対して不活性であるのでレーザガ
スに対して悪影響を及ぼすことがない。
The alumina porcelain used in this invention is
It has an extremely high dielectric strength, so even if the thickness is reduced, the insulation performance will not deteriorate.Furthermore, the dielectric constant is high, so a sufficient auxiliary discharge can be obtained, and it is inert to fluorine gas. Therefore, there is no adverse effect on the laser gas.
以下、この発明の一実施例を図について説明す
る。第１図において、１０は、従来例における石
英管４を肉厚の薄いアルミナ磁器から成る管で置
換したものである。
An embodiment of the present invention will be described below with reference to the drawings. In FIG. 1, the quartz tube 4 in the conventional example is replaced with a thin-walled tube made of alumina porcelain.
従来例と同じ動作については、動作の説明を省
略する。アルミナ磁器の絶縁耐圧は、アルミナ純
度が99％の場合、約200KV／mmである。これに
対して、従来例で用いられていた石英ガラスで
は、絶縁耐力は25〜40KV／mmである。よつて、
アルミナ磁器を用いれば、より高電界の条件で用
いることができる。端子６と７の間に印加される
パルス電圧が同じであれば、従来例に比べて誘電
体であるアルミナ磁器の厚みを薄くして使用する
ことができる。また、比誘電率は石英では3.8で
あるのに対して、アルミナ磁器では９と大きな値
である。一方、補助放電８に投入できる電力は厚
みに反比例し、誘電率に比例するので、上記２つ
の利点は該投入電力を大きくする効果があり、し
たがつて十分な予備電離を行なうことが可能とな
る。この結果、予備電離によつて主放電域に発生
する電子の密度が増加するため、それ自身の空間
電荷電界による拡散力で電子密度分布が均一化さ
れるので、空間的に均一な主放電９が得られ、レ
ーザ発振効率が増加する。アルミナ磁器の場合、
厚みを薄くして用いてもその絶縁耐力が高いの
で、長時間動作させても絶縁性能が劣化すること
はない。また、アルミナは塩素に対して不活性で
あるばかりでなく、フツ素に対しても不活性であ
るので、誘電体１０としてアルミナを主成分とす
るアルミナ磁器を用いればレーザ発振に悪影響を
及ぼすと考えられる放電生成物（不純ガス、微粒
子など）は誘電体１０からはほとんど発生せず、
また動作時におけるレーザ混合ガス中のハロゲン
ガス濃度の低下の割合も著しく減少する。これ
は、レーザガスの交換繁度が少なくてすむという
利点につながるとともに、レーザ出力の安定化に
もつながるという大きな効果を奏する。 Descriptions of operations that are the same as in the conventional example will be omitted. The dielectric strength of alumina porcelain is approximately 200KV/mm when the alumina purity is 99%. In contrast, the dielectric strength of the quartz glass used in the conventional example is 25 to 40 KV/mm. Then,
If alumina porcelain is used, it can be used under higher electric field conditions. If the pulse voltages applied between the terminals 6 and 7 are the same, the thickness of the alumina porcelain dielectric can be made thinner than in the conventional example. Furthermore, the dielectric constant of quartz is 3.8, while that of alumina porcelain is as large as 9. On the other hand, since the power that can be input to the auxiliary discharge 8 is inversely proportional to the thickness and proportional to the dielectric constant, the above two advantages have the effect of increasing the input power, and therefore it is possible to perform sufficient pre-ionization. Become. As a result, the density of electrons generated in the main discharge region increases due to pre-ionization, and the electron density distribution is made uniform by the diffusion force due to its own space charge electric field, resulting in a spatially uniform main discharge 9 is obtained, and the laser oscillation efficiency increases. For alumina porcelain,
Since the dielectric strength is high even when the thickness is reduced, the insulation performance will not deteriorate even if it is operated for a long time. Furthermore, since alumina is not only inert to chlorine but also inert to fluorine, using alumina porcelain whose main component is alumina as the dielectric 10 may have an adverse effect on laser oscillation. Possible discharge products (impurity gas, fine particles, etc.) are hardly generated from the dielectric 10,
Furthermore, the rate of decrease in the halogen gas concentration in the laser mixed gas during operation is also significantly reduced. This has the advantage that the frequency of exchanging the laser gas is reduced, and also has the great effect of stabilizing the laser output.
アルミナよりも比誘電率の高い絶縁材料とし
て、コンテンサーの素材として用いられているチ
タン酸磁器、チタン酸バリウム磁器などが、フツ
素により侵されてしまうので用いることばできな
い。 Titanate porcelain, barium titanate porcelain, etc., which are used as materials for capacitors as insulating materials with a dielectric constant higher than alumina, cannot be used because they are attacked by fluorine.
すなわち、本発明は、誘電体を介する放電を予
備放電として用いるエキシマレーザ装置において
該誘電体に要求される以下の性能
(1) 誘電率が高く、予備放電の投入電力を大きく
できる材料であること。 That is, the present invention provides the following performance requirements for the dielectric in an excimer laser device that uses discharge through the dielectric as a preliminary discharge: (1) The material must have a high dielectric constant and can increase the power input for the preliminary discharge. .
(2) 絶縁耐力が高く、絶縁性能の劣化をおこしに
くく、誘電体厚みを薄くして用いることが可能
で、これによつて予備放電の投入電力を大きく
できる材料であること。(2) The material has high dielectric strength, is resistant to deterioration of insulation performance, and can be used with a thin dielectric material, thereby increasing the power input for preliminary discharge.
(3) 耐ハロゲン性が高く、レーザガスの劣化を引
き起こすことのないような材料であること。(3) The material must have high halogen resistance and will not cause deterioration of the laser gas.
をすべて満足する材料がアルミナであること、加
えて、アルミナを介する放電を主放電として用い
ても投入電力が不足し、これを補うには、数百メ
ガヘルツという高周波電圧を印加せねばならず、
ビエゾ効果による伸び縮みのくり返しに耐えうる
ためにはある程度のアルミナの厚みが必要となり
上記２の利点がなくなるため、上記アルミナを介
する放電は、主放電ほど電力を必要としない予備
放電として用いることにより始めて、その利点が
生かされるということの２点に基づいて完成され
たものである。Alumina is the material that satisfies all of these requirements.In addition, even if discharge through alumina is used as the main discharge, the input power is insufficient, and to compensate for this, a high frequency voltage of several hundred megahertz must be applied.
In order to withstand the repeated expansion and contraction due to the Viezo effect, a certain level of alumina thickness is required, which eliminates the advantage of the above 2. Therefore, the discharge through the alumina is used as a preliminary discharge that does not require as much power as the main discharge. It was completed based on two points: for the first time, its advantages were put to good use.
なお、上記実施例においては、アルミナ磁器か
ら成る誘電体１０は主放電電極２からは離して配
置されていたが、接するか、もしくは例えば第２
図に示すように密着する構造としても良い。同図
において主放電電極２は多孔板から成る場合を示
した。２ｄ，２ｅ…はその電極断面である。この
場合、補助電極３と主放電電極２の間に挾まれる
誘電体１０の厚みは、石英ガラスを用いた場合に
は８mmであつたが、純度99％のアルミナ磁器を用
いると、２mmに縮めても長期間にわたり良好な絶
縁特性の得られることが確認された。また、電極
３と２の間に印加される電圧が同じである場合に
は、厚さの薄いアルミナ磁器を用いる場合の方
が、主放電電極２の多孔部で発生する補助放電の
光強度が強いのが観察された。 In the above embodiment, the dielectric body 10 made of alumina porcelain was placed apart from the main discharge electrode 2, but it may be in contact with it or, for example, in the second
It is also possible to have a structure in which they are in close contact as shown in the figure. In the figure, the main discharge electrode 2 is made of a perforated plate. 2d, 2e... are the cross sections of the electrodes. In this case, the thickness of the dielectric 10 sandwiched between the auxiliary electrode 3 and the main discharge electrode 2 was 8 mm when quartz glass was used, but it was reduced to 2 mm when 99% pure alumina porcelain was used. It was confirmed that good insulation properties could be obtained for a long period of time even when the material was shrunk. Furthermore, when the voltage applied between electrodes 3 and 2 is the same, the light intensity of the auxiliary discharge generated in the porous portion of the main discharge electrode 2 is higher when using thinner alumina porcelain. observed to be strong.
また、上記第１図の実施例においては、補助電
極３は主放電９に対して片方の主放電電極２の背
面に配置し、誘電体１０は補助放電８のみにさら
される場合を示したが、補助電極３を主放電電極
２の形状および配置が上記実施例とは異なり、例
えば補助電極３が主放電電極２に対し主放電側に
ある構成となつていても良い。 In addition, in the embodiment shown in FIG. 1, the auxiliary electrode 3 is arranged on the back side of one of the main discharge electrodes 2 with respect to the main discharge 9, and the dielectric 10 is exposed only to the auxiliary discharge 8. The shape and arrangement of the auxiliary electrode 3 and the main discharge electrode 2 may be different from those of the above embodiments, for example, the auxiliary electrode 3 may be located on the main discharge side with respect to the main discharge electrode 2.
また、上記実施例においては、補助電極３は主
放電電極１に接続することにより、端子６と７に
パルス電圧を印加すると自動的に補助電極３と主
放電電極２の間に電圧が印加される場合を示した
が、他の回路構成によつてこれを実現しても良
く、また、補助電極３と主放電電極２の間に別電
源を接続しても良い。 Furthermore, in the above embodiment, by connecting the auxiliary electrode 3 to the main discharge electrode 1, when a pulse voltage is applied to the terminals 6 and 7, a voltage is automatically applied between the auxiliary electrode 3 and the main discharge electrode 2. Although the case where this is shown is shown, this may be realized by other circuit configurations, or a separate power source may be connected between the auxiliary electrode 3 and the main discharge electrode 2.
なお、上記実施例においては、レーザガス５と
して、ある場合は塩化水素を含む混合ガスを用
い、ある場合にはフツ素を含む混合カスを用いる
ような使い方をする場合を示したが、レーザガス
５としてフツ素を含む混合カスのみを用いる場合
でも良い。 In addition, in the above embodiment, a mixed gas containing hydrogen chloride is used as the laser gas 5 in some cases, and a mixed gas containing fluorine is used in other cases. It is also possible to use only the mixed residue containing fluorine.
以上のように、この発明によれば補助電極３と
主放電電極２の間に挾む誘電体１０として、絶縁
耐力が極めて高く、しかも比誘電率も大きく、更
にはハロゲンガスに対して不活性なアルミナを主
成分とするアルミナ磁器を用いたので、主放電を
均一に発生させるための十分な補助放電を得るこ
とができるとともに、長期間にわたり絶縁劣化を
起こすことなく高信頼度で動作でき、しかもレー
ザガス寿命を伸ばすことができるという効果があ
る。
As described above, according to the present invention, the dielectric material 10 sandwiched between the auxiliary electrode 3 and the main discharge electrode 2 has an extremely high dielectric strength, a large dielectric constant, and is inert to halogen gas. Since we use alumina porcelain whose main component is alumina, it is possible to obtain sufficient auxiliary discharge to generate the main discharge uniformly, and it can operate with high reliability over a long period of time without causing insulation deterioration. Moreover, it has the effect of extending the life of the laser gas.
第１図はこの発明の一実施例による放電励起エ
キシマレーザ装置の電極部を示す断面図、第２図
はこの発明の他の実施例を示す電極部の断面図、
第３図は従来の放電励起エキシマレーザ装置の電
極部を示す断面図である。
図中、１は片方の主放電電極、２，２ａ，２
ｂ，２ｃ，２ｄ，２ｅはもう一方の主放電電極、
３は補助電極、４は誘電体、５はレーザガス、１
０はアルミナ磁器から成る誘電体。なお、図中、
同一符号は同一、又は相当部分を示す。
FIG. 1 is a sectional view showing an electrode part of a discharge excited excimer laser device according to an embodiment of the present invention, and FIG. 2 is a sectional view of an electrode part showing another embodiment of the invention.
FIG. 3 is a sectional view showing an electrode portion of a conventional discharge excited excimer laser device. In the figure, 1 is one main discharge electrode, 2, 2a, 2
b, 2c, 2d, 2e are the other main discharge electrodes,
3 is an auxiliary electrode, 4 is a dielectric, 5 is a laser gas, 1
0 is a dielectric material made of alumina porcelain. In addition, in the figure,
The same reference numerals indicate the same or equivalent parts.
Claims (1)
するように配設された２つの主放電電極および、
上記２つの主放電電極の一方の電極に対して誘電
体を挾むように設置された補助電極とを有する電
極系を備え、レーザガスとして少なくともハロゲ
ンガスを含む混合ガスを用いる放電励起エキシマ
レーザ装置において、上記誘電体がアルミナを主
成分とするアルミナ磁器から成ることを特徴とし
た放電励起エキシマレーザ装置。 ２ ハロゲンガスがフツ素ガスであることを特徴
とする特許請求の範囲第１項記載の放電励起エキ
シマレーザ装置。[Claims] 1. Two main discharge electrodes arranged so as to face each other and whose longitudinal direction is in the direction of the laser optical axis;
In the discharge-excited excimer laser device, the discharge-excited excimer laser device includes an electrode system having an auxiliary electrode installed to sandwich a dielectric material between one electrode of the two main discharge electrodes, and uses a mixed gas containing at least halogen gas as a laser gas. A discharge-excited excimer laser device characterized in that the dielectric material is made of alumina porcelain whose main component is alumina. 2. The discharge excited excimer laser device according to claim 1, wherein the halogen gas is fluorine gas.
Priority Applications (11)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21363384A JPS6191982A (en) | 1984-10-11 | 1984-10-11 | Discharge excited excimer laser device |
| US06/782,568 US4686682A (en) | 1984-10-09 | 1985-10-01 | Discharge excitation type short pulse laser device |
| EP93100578A EP0542718B1 (en) | 1984-10-09 | 1985-10-02 | Discharge excitation type short pulse laser device |
| DE3587852T DE3587852T2 (en) | 1984-10-09 | 1985-10-02 | Discharge excitation type short pulse laser device. |
| DE19853588088 DE3588088T2 (en) | 1984-10-09 | 1985-10-02 | Discharge-excited laser for generating short pulses |
| EP93100550A EP0543795B1 (en) | 1984-10-09 | 1985-10-02 | Discharge excitation type short pulse laser device |
| EP85112484A EP0177888B1 (en) | 1984-10-09 | 1985-10-02 | Discharge excitation type short pulse laser device |
| DE19853588137 DE3588137T2 (en) | 1984-10-09 | 1985-10-02 | Discharge-excited laser device |
| EP94114362A EP0637106B1 (en) | 1984-10-09 | 1985-10-02 | Discharge excitation type laser device |
| DE19853588118 DE3588118T2 (en) | 1984-10-09 | 1985-10-02 | Discharge-excited laser for generating short pulses |
| CA000492327A CA1259122A (en) | 1984-10-09 | 1985-10-04 | Discharge excitation type short pulse laser device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21363384A JPS6191982A (en) | 1984-10-11 | 1984-10-11 | Discharge excited excimer laser device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6191982A JPS6191982A (en) | 1986-05-10 |
| JPH024148B2 true JPH024148B2 (en) | 1990-01-26 |
Family
ID=16642383
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21363384A Granted JPS6191982A (en) | 1984-10-09 | 1984-10-11 | Discharge excited excimer laser device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6191982A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6965624B2 (en) | 1999-03-17 | 2005-11-15 | Lambda Physik Ag | Laser gas replenishment method |
| US6546036B1 (en) | 1999-06-08 | 2003-04-08 | Lambda Physik Ag | Roof configuration for laser discharge electrodes |
| US6785316B1 (en) | 1999-08-17 | 2004-08-31 | Lambda Physik Ag | Excimer or molecular laser with optimized spectral purity |
| US6570901B2 (en) | 2000-02-24 | 2003-05-27 | Lambda Physik Ag | Excimer or molecular fluorine laser having lengthened electrodes |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58105161A (en) * | 1981-11-26 | 1983-06-22 | Konishiroku Photo Ind Co Ltd | Magnetic toner |
-
1984
- 1984-10-11 JP JP21363384A patent/JPS6191982A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6191982A (en) | 1986-05-10 |
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