JPH0239088B2 - - Google Patents

Info

Publication number
JPH0239088B2
JPH0239088B2 JP56208226A JP20822681A JPH0239088B2 JP H0239088 B2 JPH0239088 B2 JP H0239088B2 JP 56208226 A JP56208226 A JP 56208226A JP 20822681 A JP20822681 A JP 20822681A JP H0239088 B2 JPH0239088 B2 JP H0239088B2
Authority
JP
Japan
Prior art keywords
exhaust bell
exhaust
inner layer
thickness
quartz glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56208226A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57155724A (en
Inventor
Aruberuto Shuruke Karuru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HEREUSU KUARUTSUSHUMERUTSUE GmbH
Original Assignee
HEREUSU KUARUTSUSHUMERUTSUE GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by HEREUSU KUARUTSUSHUMERUTSUE GmbH filed Critical HEREUSU KUARUTSUSHUMERUTSUE GmbH
Publication of JPS57155724A publication Critical patent/JPS57155724A/ja
Publication of JPH0239088B2 publication Critical patent/JPH0239088B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4404—Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4418—Methods for making free-standing articles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
    • Y10T428/1317—Multilayer [continuous layer]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Silicon Compounds (AREA)
  • Glass Melting And Manufacturing (AREA)
JP56208226A 1981-02-27 1981-12-24 Quartz material exhaust gas bell for isolating synthetic silicon Granted JPS57155724A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3107421A DE3107421C2 (de) 1981-02-27 1981-02-27 Glocke aus Quarzgut für die Abscheidung von Poly-Silizium

Publications (2)

Publication Number Publication Date
JPS57155724A JPS57155724A (en) 1982-09-25
JPH0239088B2 true JPH0239088B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-09-04

Family

ID=6125913

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56208226A Granted JPS57155724A (en) 1981-02-27 1981-12-24 Quartz material exhaust gas bell for isolating synthetic silicon

Country Status (3)

Country Link
US (1) US4397897A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS57155724A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3107421C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4480989A (en) * 1981-04-02 1984-11-06 Motorola, Inc. Method of cooling a flange and coupling
EP0233450B1 (en) * 1986-01-17 1992-03-11 MITSUI TOATSU CHEMICALS, Inc. Linear salicylic acid copolymers and their metal salts, production process thereof, color-developing agents comprising metal-resins of the copolymers, and color-developing sheets employing the agents
US4931420A (en) * 1986-04-30 1990-06-05 Mitsui Toatsu Chemicals, Inc. Temperature history indicator and its manufacturing method
US5019243A (en) * 1987-04-03 1991-05-28 Mcewen James A Apparatus for collecting blood
US5096573A (en) * 1991-03-21 1992-03-17 Wilfred Bermudez Blood and fluid separator apparatus
FI940823A0 (fi) * 1994-02-22 1994-02-22 Orion Yhtymae Oy Analysatorkyvett foer turbidimetriska och nefelometriska bestaemningar av helblodsprov
US5545375A (en) * 1994-10-03 1996-08-13 Becton, Dickinson And Company Blood collection tube assembly
US5738920A (en) * 1996-01-30 1998-04-14 Becton, Dickinson And Company Blood collection tube assembly
US5702770A (en) * 1996-01-30 1997-12-30 Becton, Dickinson And Company Method for plasma processing
US5716683A (en) * 1996-01-30 1998-02-10 Becton, Dickinson And Company Blood collection tube assembly
US5763033A (en) * 1996-01-30 1998-06-09 Becton, Dickinson And Company Blood collection tube assembly
US5683771A (en) * 1996-01-30 1997-11-04 Becton, Dickinson And Company Blood collection tube assembly
US5686157A (en) * 1996-01-30 1997-11-11 Becton, Dickinson And Company Blood collection tube assembly
DE19706255C2 (de) * 1997-02-18 2000-11-30 Schott Glas Sterilisierbarer Glasbehälter für medizinische Zwecke, insbesondere zur Aufbewahrung pharmazeutischer oder diagnostischer Produkte

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3927697A (en) * 1968-02-22 1975-12-23 Heraeus Schott Quarzschmelze Quartz glass elements
CH566077A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1972-08-05 1975-08-29 Heraeus Schott Quarzschmelze
US3962515A (en) * 1974-07-29 1976-06-08 Corning Glass Works Strengthened composite glass article and method of production
DE2743950C2 (de) * 1977-09-29 1987-02-12 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zum Abscheiden von Halbleitermaterial
DE2908288B1 (de) * 1979-03-03 1980-01-17 Heraeus Schott Quarzschmelze Glocke aus Quarzglas fuer halbleitertechnologische Zwecke

Also Published As

Publication number Publication date
DE3107421A1 (de) 1982-09-16
DE3107421C2 (de) 1985-02-14
US4397897A (en) 1983-08-09
JPS57155724A (en) 1982-09-25

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