JPH0238729U - - Google Patents

Info

Publication number
JPH0238729U
JPH0238729U JP11811288U JP11811288U JPH0238729U JP H0238729 U JPH0238729 U JP H0238729U JP 11811288 U JP11811288 U JP 11811288U JP 11811288 U JP11811288 U JP 11811288U JP H0238729 U JPH0238729 U JP H0238729U
Authority
JP
Japan
Prior art keywords
film
cvd apparatus
semiconductor wafer
pressure cvd
film formation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11811288U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11811288U priority Critical patent/JPH0238729U/ja
Publication of JPH0238729U publication Critical patent/JPH0238729U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP11811288U 1988-09-07 1988-09-07 Pending JPH0238729U (hu)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11811288U JPH0238729U (hu) 1988-09-07 1988-09-07

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11811288U JPH0238729U (hu) 1988-09-07 1988-09-07

Publications (1)

Publication Number Publication Date
JPH0238729U true JPH0238729U (hu) 1990-03-15

Family

ID=31362181

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11811288U Pending JPH0238729U (hu) 1988-09-07 1988-09-07

Country Status (1)

Country Link
JP (1) JPH0238729U (hu)

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