JPH0235344A - Surface analyzing apparatus - Google Patents

Abstract

PURPOSE:To facilitate the preparation of a specimen and to observe the surface efficiently by providing an etching device for a scanning type electronic microscope as a unitary body. CONSTITUTION:A specimen 1 is mounted on a specimen stage 10. An electron beam A from an electron gun is focused through an objective lens and projected on the surface of the specimen 1. Secondary electrons generated from the surface of the specimen 1 are detected with a detector 3. An image is formed on a CRT based on the secondary electrons. Thus, the surface of the specimen is observed. When the surface of the specimen is etched, a gate valve 6 is opened, and the specimen 1 is moved into an etching chamber 5 wherein a vacuum state is maintained beforehand. Then, the gate valve 6 is closed, and Freon gas is made to flow into the etching chamber 3. At the same time, high frequency power is applied, and the surface of the specimen 1 is etched. When the etching is finished, the flow of the Freon gas is stopped, and remaining gas is exhausted through an exhaust port 9. The gate valve 6 is opened, and the specimen 1 is returned into a specimen chamber 4. Then the surface is observed.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a surface analysis device that analyzes the surface of a sample by irradiating the surface of a sample with electron beams or X-rays and detecting signals generated from the surface of the sample. Regarding.

[Prior Art] In surface observation of a sample in this type of surface analysis apparatus, for example, a scanning electron microscope, as shown in FIG. Sample 1
An electron beam from an electron gun (not shown) is aimed at the surface of the sample 1 using an objective lens 2, and a detector 3 detects secondary electrons generated from the surface of the sample 1. Based on this detection signal, a cathode ray tube is detected. An image is created to observe the surface.

``Problems to be Solved by the Invention'' In such a conventional scanning electron microscope, when ethosing the sample surface in order to observe a deeper layer on the sample surface, the sample 1 is removed from the sample chamber 4 of the scanning electron microscope. was removed using an appropriate jig and etched using an etching device separate from the scanning electron microscope.
The observation must be carried out again by setting it in the sample chamber 4 of the scanning electron +lA microscope, which is troublesome.

The present invention has been made in view of two points,
It is an object of the present invention to provide a surface analysis device that enables efficient sample preparation and surface observation.

In order to achieve two objects, the present invention irradiates the sample surface with electron beams or X-rays, detects the signal generated from the sample surface, and performs the test. In a surface analysis apparatus for analyzing different surfaces, an etching chamber of an etching apparatus is installed in a separation chamber of the surface analysis apparatus, and a gate valve is interposed between the two chambers.

According to the configuration described in item 1 and 2, the etching chamber of the etching device is installed in the test chamber of the surface analysis device, so when etching a sample, open the gate valve and insert the sample. This means that the sample can be easily transferred between the sample chamber and the etching chamber, and sample preparation and surface observation can be performed more efficiently than in the conventional case where the etching device is installed separately from the surface analysis device. .

[Examples] Examples of the present invention will be described in detail below with reference to the drawings.

FIG. 1 is a schematic configuration diagram of one embodiment of the present invention.
Portions corresponding to the conventional example in the figures are given the same reference numerals.

The surface analysis device of this embodiment will be explained by applying it to a scanning electron microscope.

In this Figure 1, 1 is a sample placed on the sample stage 10, 2 is an objective lens that focuses the electron beam Δ from an electron gun (not shown) onto the sample I surface, and 3 is from the sample *'l 1 surface. This is a detector for detecting generated secondary electrons, and the above configuration is basically the same as the conventional example shown in FIG.

In order to be able to perform the etching and surface observation of specimen 1 well with this scanning electron microscope ('', when performing etching on sample 1 and observing its surface, An etching chamber 5 of a dry etching device is installed in the cylindrical separation chamber 4 of the cylindrical electron microscope. It has been intervened.

The etching chamber 5 includes a gas passage 7 for introducing a gas such as freon, and an electrode 8 to which high-frequency power is applied, similar to the upper chamber of a conventional dry etching apparatus.
An exhaust port 9 is provided for exhausting gas.

Next, the operating procedure for surface observation using the scanning electron microscope having the above configuration will be explained.

First, as in a conventional scanning electron microscope, sample 1 is placed on sample stage 10 using an appropriate jig, and an electron beam from an electron gun is directed onto the surface of sample 1 using objective lens 2. The secondary electrons generated from the surface of sample #41 are detected by the detector 3.
Based on this, an image is created on a cathode ray tube (not shown), and the sample surface is observed.

Next, when etching the surface of the sample (j), open the gate hull pro, transfer the sample 1 using an appropriate jig, and close the gate valve 6 into the etching chamber 5, which is previously kept in a vacuum. The etching chamber 5 is closed and Freon gas is allowed to flow into the etching chamber 5, and high frequency power is applied to perform etching on the surface of Test II 1.

After etching is completed, the Freon gas is stopped, the residual gas is exhausted through the exhaust n9, the gate valve is opened, and the sample 1 is returned to the sample chamber 4 using a jig, and the surface is observed.

Since the etching device is now integrated into the scanning electron microscope, preparation of the sample becomes easier than in the prior art, and surface observation can be carried out more efficiently.

Although the two series of embodiments describe a scanning electron microscope, the present invention is not limited to scanning electron microscopes, but is equally applicable to EPMA and other surface analysis instruments.

Further, although the two embodiments are configured to perform only etching, other embodiments of the present invention may be configured to provide a metal target and perform vapor deposition.

Furthermore, in the above-described embodiment, the sample was manually transferred between the sample chamber 4 and the etching chamber 5 using a jig. Appropriate conveying means such as rollers may be provided to automatically convey.

[Effects of the Invention] As described above, according to the present invention, an etching chamber is provided in the sample chamber of a surface analysis device, and a gate valve is interposed between the two chambers. When etching, the gate valve can be opened and the sample can be easily transferred between the sample chamber and the etching chamber. and surface observation can be performed efficiently.

[Brief explanation of the drawing]

FIG. 1 is a schematic diagram of the main parts of an embodiment of the present invention, and FIG. 2 is a schematic diagram of a conventional example. ■・Sample, 4・Sample chamber, 5・Etching chamber, 6 Gate valve.

Claims (1)

[Claims] (1) In a surface analyzer that analyzes the sample surface by irradiating the sample surface with electron beams or X-rays and detecting signals generated from the sample surface, the etching chamber of the etching apparatus A surface analysis device characterized in that the device is attached to a chamber and a gate valve is interposed between the two chambers.