JPH02303637A - Forming die and its manufacture - Google Patents

Abstract

PURPOSE:To obtain the forming die having high accuracy and a long service life by executing simultaneously ion implantation and vacuum deposition to the surface on which an object to be worked abuts, and forming a mixing layer provided with an amorphous metallic layer. CONSTITUTION:Ion implantation and vacuum deposition are executed simultaneously to the surface 4 on which at least an object to be worked for forming abuts of the upper and the lower dies 1, 2. As a result, a mixing layer provided with an amorphous metallic layer is formed on the forming dies 1, 2. The mixing layer is formed by implantation of an N ion and vapor deposition of Ti. In such a way, the surface layer being excellent in wear resistance can be provided on the die.

Description

[Detailed description of the invention] [Industrial application field] The present invention relates to a mold for molding and a method for manufacturing the same.

[Prior Art] In general, forming processes such as punching and drawing are methods of forming a workpiece into a desired shape by repeatedly processing the workpiece, and severe pressurized conditions are imposed on the mold used. becomes. This type of forming process is usually carried out at or near room temperature without actively heating the workpiece, so the workpiece has high deformation resistance and extremely harsh conditions are imposed on the molding die. It will be done. Furthermore, due to the demand for higher productivity, there is an increasing demand for molds with a long lifespan.

Therefore, improvements have been made in terms of materials for forming molds, such as the development of various alloy steels and the application of cemented carbide, which is a product of powder metallurgy technology, in conjunction with improvements in heat treatment technology. On the other hand, in order to develop superior tool materials with even higher productivity, techniques have been developed to coat the surfaces of materials with various intermetallic compounds. For example, tool life can be extended by coating the tool surface with an intermetallic compound such as TiN using so-called PVD methods such as vacuum evaporation, ion sputtering, and ion blating, or vapor phase plating or label CVD. This is an attempt to extend it.

[Problems to be Solved by the Invention] However, the coating layer formed by the PVD method has poor adhesion to the material surface, and cannot withstand even when applied to the surface of a molding die subjected to severe dynamic loads.

When using the latter CVD method, the adhesion of the coating layer on the material surface is somewhat improved compared to the PVD method, but
In this case as well, since a clearly identified coating layer is formed on the surface of the material, there is still a problem that the coating layer peels off under severe dynamic pressurizing conditions.

Furthermore, in the CVD method, it is necessary to heat the mold to a high temperature (for example, when coating TiN or TiC, it is heated to about 1000°C), so the quenching process of the mold is tempered and the mold substrate is heated. Is it possible that the strength of the substance has decreased? I! This is inconvenient as a mold because dimensional accuracy may be distorted due to distortion. In order to eliminate this inconvenience, it was necessary to impose significant restrictions on the material, which was impractical.

In view of the above-mentioned problems of the prior art, an object of the present invention is to provide a molding die that can withstand harsh molding processes, has high strength, has a long tool life and is excellent in productivity, and a method for manufacturing the same. .

[Means for Solving the Problems] In order to achieve the above object, the characteristic configuration of the molding die according to the present invention is such that ion implantation and vacuum deposition are simultaneously carried out at least on the surface that the workpiece comes into contact with during the molding process. By doing so, a mixing layer including an amorphous metal layer is formed.

Furthermore, the characteristic structure of the manufacturing method of the molding die according to the present invention is such that at least the surface that the workpiece comes into contact with during the molding process is
The point is that a mixing layer including an amorphous metal layer is formed by simultaneously performing ion implantation and vacuum deposition.

The ions mixed into the surface layer of the molding die by this method of forming a mixing layer are, for example, one or more of the elements belonging to Groups I to Vl and Group II in the Periodic Table of Elements. It is desirable that

Among these, the mixing layer is formed by N ion implantation and T
It is particularly preferable to perform this by vapor deposition of i.

Other mixing elements include TaC, TiC, VC
, BN, TiN, Fez N, etc. can be used.

[Functions and Effects] Next, the functions and effects of the molding die and the manufacturing method thereof according to the present invention will be explained.

The surface of the molding die has a surface layer with excellent erosion resistance by forming a mixing layer with an amorphous metal layer using a mixing device that simultaneously performs ion implantation and vacuum deposition. It happens. Furthermore, the surface layer of the mold is formed by integrally mixing intermetallic compounds with the material matrix, which is similar to metals that rise to ions. The mold substrate and coating layer are not separated into two distinct layers, and the mold substrate and coating layer are mixed together, so the surface layer does not peel off even under severe dynamic pressure conditions, and has extremely high strength. We were able to create a mold.

A typical example of the above-mentioned mixing method is a dynamic mixing method. This method uses I V D (
Ion and Vapor Deposition)
What is also called law (M, 5atou, ni, Fukui
and F, Fujimoto, Proc, 5th
syohp, 15IAT, p. 349, 1982), vacuum deposition and ion implantation are performed at the same time using lower ion acceleration energy than in normal ion implantation methods. At the initial stage of mixing layer formation, some of the deposited atoms enter the substrate due to recoil from collisions with ions, but at the same time, incident ions are also injected into the substrate, forming a mixing layer between the substrate and the substrate. becomes. Therefore, this method is different from the method of forming a coating layer on the surface of the sample in advance by vapor deposition and then implanting ions, both in principle and in terms of effectiveness.

Furthermore, the present invention utilizes an ion implantation technique that not only allows for easy selection of the elements to be implanted and allows the formation of various surface layers depending on the purpose, but also is extremely active because each element is in an ionic state. Since it is utilized, it has good integrity with the implanted substrate, and even if two or more types of ions are mixed, it is possible to reliably form a desired intermetallic compound layer on the substrate.

According to the method according to the present invention, there is no need for heating as in the CVD method, so the surface layer modification treatment can be performed after performing the necessary heat treatment. As a result, we have created molding molds that are highly accurate, strong, long-life, and highly productive for molded products without compromising the strength of the mold or causing deviations in dimensional accuracy. Obtained.

The ion-implanted and mixed surface layer has an amorphous layer with excellent mechanical properties, and unlike amorphous metals that are manufactured by rapidly cooling from a molten state, this amorphous layer is thermally stable. Therefore, the surface layer does not change in quality or deteriorate even when heated during continuous molding.

[Example] Hereinafter, an example of a molding die and a method for manufacturing the same according to the present invention will be described in detail with reference to the drawings.

The mold used is a motor core punching mold used for transformers, etc., and the material of this mold is high-speed tool*5KH9. In this case, the blank is a JIS 5PC strip with a thickness of 0.8 am and a width of 60 mm.
A CI board was used. The mold shape is shown in Figure 1 (a) and (b).
As shown in Figure 2, it consists of an upper mold (1) and a lower mold (2), and a blank, which is a workpiece, is inserted between these two molds, and a punching press is used to continuously form the shape shown in Figure 2. The product (3) is formed.

Dynamic mixing treatment was performed to form a mixing layer on the surface of the molding die around the punched portion (4) where the blank comes into contact. A method for forming this mixing layer will be explained below.

Figure 3 shows the schematic configuration of the ion implantation device used. This device uses a cold cathode ion source as the ion source (5), and the ions emitted from this ion source (5) are collected using a mass spectrometry system (
6), only the ions desired to be implanted are extracted and implanted into the sample (7) placed on the sample stage (17). Therefore, unintended impurity elements are screened out by the mass spectrometry system (6), and the sample (7) is not contaminated with impurity elements. Furthermore, by controlling the tJM density of selected ions, it is possible to control the composition ratio of the thin compound layer formed on the surface layer of the sample.

In the figure, (14) is a valve, and (8) is a repulsion electrode to accurately determine the ion current irradiated to the sample (7), and to obtain the current density and homogeneous irradiation area in the sample (A). (Q) in Figure 9, which has a lens effect for this purpose, is a current integrator for measuring the flow of ions irradiated onto the sample (7).

On the other hand, along with the ions from the ion source (5), the sample (
In order to mix another element into the surface layer of 7), an electron beam evaporator (11) is installed in the chamber (10). If a child beam evaporator (11) is used, the evaporation rate can be easily controlled by adjusting the electron beam current. 1 to measure the amount of vapor deposition
A crystal vibrating film thickness meter (12) equipped with a quartz plate is also installed. This allows the thickness of the deposited film to be accurately measured by changing the frequency of the crystal oscillator. In the figure, (13) is connected to an axial flow molecular pump (not shown) for evacuating the chamber (10). It is an exhaust port. However, the vapor deposition device for mixing different ions is not limited to the electron beam vapor deposition device as described above, but may be a normal vapor deposition device.

When inserting the sample mold (7) into the ion implanter and implanting ions, first place the sample stage (17) with the surface part of the mold that will come into contact with the workpiece facing the direction of ion implantation. to be installed. After that, injection treatment (
ion implantation and vapor deposition at the same time).

The dynamic mixing process was performed under the following conditions (the range in parentheses indicates the preferred range for implementation).

Iogari 1−++・−−−＋＋−＋＋＋ N: N2
Accelerating voltage (Key)...30 (preferably 1-100, more preferably 5-40) N2 ion current density...0.4 (0.1-0.
7 mA/am 2) N2 ion implantation amount °゛°゛°°approximately 6X1016 (5~7
6 X10I/C+112) Ultimate vacuum (Pa)...3 X 10-
5 (At the time of thin layer formation (Pa) . . . about 10 bows) Vapor deposition element . . . High purity titanium was used for TiTi.・Vapor deposition speed・・・・・・・・・・・・
- Approximately 10 (3 to 50 A/sec) Current value during vapor deposition (mA>...3 According to the above conditions, an amorphous layer will be formed on the metal surface layer. This amorphous The layer has the role of blocking the influence of the crystal orientation of the sample substrate, and is also a factor in providing the surface layer with excellent mechanical properties.

In addition, in order to obtain a good mixing layer, N ions a
Amount of people (N ion'r4 flow density: mA/c+s 2)
It is preferable that X and the amount of deposited Ti (deposition rate + A/see) Y have the following relationship.

10X≦Y≦250X More preferably, the following relationship exists.

25X≦Y≦100X Using the mold subjected to the above mixing treatment, the punched product shown in FIG. 2 was manufactured. The lifespan of this mold was then compared with that of a mold that was not subjected to mixing treatment. At this time, the lifespan may be limited to avoid damage to the product, etc.
The number of pieces manufactured until the mold becomes unusable. The results are shown in Table 1.

Table 1 (Number of punched pieces, details) As shown in Table 1, the life of the 5KH9 mold was five times longer when the mixing treatment was applied.

In addition to the TiN mentioned above, the ion species to be mixed include elements belonging to Groups 1 to 2 and Group 1 of the Periodic Table of Elements, such as TaC, TiC, VC, BN, TiN, and Fe2N, either singly or in combination. The above may be used in combination.

Various conditions can be considered for the mixing process, and the process can be performed depending on the purpose by changing the amount of ion implantation, the size of the implantation source, etc.

The objects to be mixed may be subjected to measures such as imparting electrical polarity to the objects for effective mixing.

Note that although numbers are written in the claims section for convenient comparison with the drawings, the present invention is not limited to the structure shown in the accompanying drawings.

[Brief explanation of drawings]

FIGS. 1(a) and 1(b) are plan views of an upper mold and a lower mold representing an embodiment of the molding die according to the present invention, and FIG.
FIG. 3 is a plan view of a product punched out using the die shown in FIG. 3, and FIG. (4)...The surface of the mold that the workpiece comes into contact with during processing

Claims (1)

[Claims] 1. At least the surface that the workpiece comes into contact with during molding (
4) A molding die in which a mixing layer including an amorphous metal layer is formed by simultaneously performing ion implantation and vacuum deposition. 2. At least the surface that comes into contact with the workpiece during molding (4
), a method for manufacturing a molding die in which a mixing layer with an amorphous metal layer is formed by simultaneously performing ion implantation and vacuum deposition. 3. The mixing layer is formed by N ion implantation and Ti
3. The method for manufacturing a molding die according to claim 2, which is carried out by vapor deposition.