JPH02296752A - Production of anti-clouding glass - Google Patents
Production of anti-clouding glassInfo
- Publication number
- JPH02296752A JPH02296752A JP11947889A JP11947889A JPH02296752A JP H02296752 A JPH02296752 A JP H02296752A JP 11947889 A JP11947889 A JP 11947889A JP 11947889 A JP11947889 A JP 11947889A JP H02296752 A JPH02296752 A JP H02296752A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- film
- oxide layer
- fog
- silicon oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 44
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 20
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 9
- 238000010304 firing Methods 0.000 claims description 4
- 239000010410 layer Substances 0.000 abstract description 17
- 239000000843 powder Substances 0.000 abstract description 7
- 239000012298 atmosphere Substances 0.000 abstract description 6
- 239000005357 flat glass Substances 0.000 abstract description 6
- 229910052788 barium Inorganic materials 0.000 abstract description 5
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 5
- 239000011248 coating agent Substances 0.000 abstract description 4
- 229910052746 lanthanum Inorganic materials 0.000 abstract description 4
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 abstract description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052593 corundum Inorganic materials 0.000 abstract description 3
- 239000005304 optical glass Substances 0.000 abstract description 3
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract description 3
- 229910052786 argon Inorganic materials 0.000 abstract description 2
- 238000000576 coating method Methods 0.000 abstract description 2
- 239000011261 inert gas Substances 0.000 abstract description 2
- 239000002356 single layer Substances 0.000 abstract description 2
- 239000005331 crown glasses (windows) Substances 0.000 abstract 2
- 238000001354 calcination Methods 0.000 abstract 1
- 239000005308 flint glass Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 15
- 238000000034 method Methods 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 239000010409 thin film Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- BYFGZMCJNACEKR-UHFFFAOYSA-N aluminium(i) oxide Chemical compound [Al]O[Al] BYFGZMCJNACEKR-UHFFFAOYSA-N 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910001392 phosphorus oxide Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 241001441724 Tetraodontidae Species 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- LFGREXWGYUGZLY-UHFFFAOYSA-N phosphoryl Chemical class [P]=O LFGREXWGYUGZLY-UHFFFAOYSA-N 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- VSAISIQCTGDGPU-UHFFFAOYSA-N tetraphosphorus hexaoxide Chemical compound O1P(O2)OP3OP1OP2O3 VSAISIQCTGDGPU-UHFFFAOYSA-N 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、長期間に亘って優れた防曇性を有する防曇ガ
ラスの製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a method for manufacturing anti-fog glass having excellent anti-fog properties over a long period of time.
(従来の技術)
一般に、ガラスの表面温度が露点以下になった場合には
、ガラス表面に微小な水滴が付着して曇りを生じる。例
えば、眼鏡レンズ、ゴーグル、車の窓ガラスなどでは、
その周囲の温度が急激に低下した場合に曇りを生じるこ
とは良く知られているところである。ガラスに曇りを生
じた場合には先を見通すことができないので、不快に感
じるだけでなく、時には大事故につながる危険性もある
。(Prior Art) Generally, when the surface temperature of glass falls below the dew point, minute water droplets adhere to the glass surface, causing fogging. For example, in eyeglass lenses, goggles, car window glass, etc.
It is well known that cloudiness occurs when the surrounding temperature suddenly drops. If the glass fogs up, you won't be able to see what's ahead, which will not only make you feel uncomfortable, but may even lead to a serious accident.
このため、従来からガラスの曇り防止、すなわち防曇の
ために以下に示す種々の技術が提案されている。For this reason, the following various techniques have been proposed for preventing glass from fogging, that is, for anti-fogging.
■特開昭55−154351号公報には、ガラス基材表
面に、モリブデン酸化物とタングステン酸化物のうちい
ずれか一種以上とリン酸化物とを含む薄膜を物理蒸着、
化学蒸着等で形成することにより、防曇性に優れた親水
性薄膜を得る方法が提案され、■特開昭54−1051
20号公報には、P2Oを含むガラスに、P2O6の液
体または蒸気を接触させることにより防曇性を付与する
方法が提案され、■特開昭53−58492号公報には
、スルホン酸型両性界面活性剤及び無機塩あるいは酢酸
塩を含む組成物を低級アルコール溶媒を用いて基材に塗
布することにより密着性に優れた防曇膜を形成する方法
が提案されている。■Unexamined Japanese Patent Publication No. 55-154351 discloses that a thin film containing at least one of molybdenum oxide and tungsten oxide and phosphorus oxide is deposited on the surface of a glass substrate by physical vapor deposition.
A method of obtaining a hydrophilic thin film with excellent antifogging properties by forming it by chemical vapor deposition was proposed, and Japanese Patent Laid-Open No. 54-1051
No. 20 proposes a method of imparting antifogging properties to glass containing P2O by contacting it with liquid or vapor of P2O6; A method has been proposed in which an antifogging film with excellent adhesion is formed by applying a composition containing an activator and an inorganic salt or an acetate to a substrate using a lower alcohol solvent.
(発明が解決しようとする課題)
上記■の方法では、薄膜がリン酸化物を含むため、耐久
性に劣る問題があり、膜の表面硬度も低い。(Problems to be Solved by the Invention) In the method (2) above, since the thin film contains phosphorous oxide, there is a problem that the durability is poor, and the surface hardness of the film is also low.
上記■の方法では、P2O5は水に容易に溶出するため
耐水性に劣る。In the method (2) above, P2O5 is easily eluted into water, resulting in poor water resistance.
上記■の方法では、膜硬度が低く長期持続性に欠ける。The above method (2) has low film hardness and lacks long-term sustainability.
このように、従来では防曇性と耐久性が共に優れた防曇
ガラスは提案されていなかった。As described above, no anti-fog glass with excellent anti-fog properties and durability has been proposed so far.
本発明は、かかる実状に着目して成されたものであり、
耐久性と防曇性が共に優れている防曇ガラスの製造方法
を提供することを目的とする。The present invention has been made by focusing on such actual situation,
An object of the present invention is to provide a method for manufacturing anti-fog glass having excellent durability and anti-fog properties.
(課題を解決するための手段)
本発明の防曇ガラスの製造方法は、ガラス基材表面に、
シリコン酸化物層を形成した後、シリコン酸化物層を不
活性状態下で焼成することを特徴としており、そのこと
により上記目的が達成される。(Means for Solving the Problems) The method for producing an anti-fog glass of the present invention includes:
The method is characterized in that after forming the silicon oxide layer, the silicon oxide layer is fired under inert conditions, thereby achieving the above object.
本発明で使用されるガラス基材としては、例えば、はう
硅クラウン、クラウン、フリント、重フリント、バリウ
ムクラン、重バリウムクラウン、バリウムフリント、重
バリウムフリント、ランタンフリント、ランタンクラウ
ン、重ランタンフリント等の光学ガラス及び板ガラス等
の無機ガラスがあげられる。これらの光学ガラスや板ガ
ラスは、レンズ、プリズム等の光学材料として、また窓
ガラスとして広く使用されているものである。Examples of the glass substrate used in the present invention include silicon crown, crown, flint, heavy flint, barium clan, heavy barium crown, barium flint, heavy barium flint, lanthanum flint, lanthanum crown, heavy lanthanum flint, etc. Examples include inorganic glasses such as optical glass and sheet glass. These optical glasses and sheet glasses are widely used as optical materials for lenses, prisms, etc., and as window glasses.
上記ガラス基材表面に、シリコン酸化物層を形成する手
段としては、ゾル−ゲル法、真空蒸着法、スパッ9’)
フグ法、CVl法、メツキ法などがあげられ、特に、親
水性基である水酸基を多量に生成可能なツルーゲル法が
好ましい。シリコン酸化物層の厚さは、用途によって適
宜法めればよい。Methods for forming the silicon oxide layer on the surface of the glass substrate include a sol-gel method, a vacuum evaporation method, and a sputtering method.
Examples include the blowfish method, the CVl method, and the Metsuki method, and the true gel method, which can produce a large amount of hydroxyl groups, which are hydrophilic groups, is particularly preferred. The thickness of the silicon oxide layer may be determined as appropriate depending on the application.
ガラス基材表面に形成されたシリコン酸化物層は、種々
の材料の積層膜であってもよいし、単層膜でもよいが、
少なくとも最上層がシリコン酸化物を含むことが必須で
ある。The silicon oxide layer formed on the surface of the glass substrate may be a laminated film of various materials or a single layer film, but
It is essential that at least the top layer contains silicon oxide.
このようにして表面がシリコン酸化物層で被覆されたガ
ラス基材の少なくともシリコン酸化物層を不活性状態下
で焼成する。不活性状態下とは、窒素、アルゴン等の不
活性ガス雰囲気中、あるいは無機粉末中に埋めた状態等
を意味する。無機粉末としては、例えば、Al2O,、
ZrO2などの150μm以下に増粒・分級した粉末が
あげられる。焼成条件は、ガラス基材の種類や大きさ等
によって異なるが450°C以上が好ましく、より好ま
しくは500°C〜t o o o ’cである。焼成
時間は、一般に1分以上が好ましく、より好ましくは3
0分〜3時間である。At least the silicon oxide layer of the glass substrate whose surface is thus coated with the silicon oxide layer is fired under an inert condition. Under an inert state means an atmosphere of an inert gas such as nitrogen or argon, or a state buried in inorganic powder. Examples of inorganic powder include Al2O,
Examples include powders such as ZrO2 that have been enlarged and classified to 150 μm or less. The firing conditions vary depending on the type and size of the glass substrate, but are preferably 450°C or higher, more preferably 500°C to 200°C. The firing time is generally preferably 1 minute or more, more preferably 3 minutes.
It is 0 minutes to 3 hours.
焼成が不十分であると、防曇性が低下する。If the firing is insufficient, the antifogging property will be reduced.
このようにして得られた防曇ガラスの表面は優れた防曇
性を発現する。この理由は未だ解明されていないが、薄
膜表面でシロキサン結合及びシラノール結合を構成して
いる酸素原子の一部が破裂、還元され、酸素欠陥状態(
シリコンが電子供与性を示す)により表面がより活性に
なったためと考えられる。The surface of the anti-fog glass thus obtained exhibits excellent anti-fog properties. The reason for this has not yet been elucidated, but some of the oxygen atoms that make up the siloxane bonds and silanol bonds on the thin film surface are ruptured and reduced, resulting in an oxygen-deficient state (
This is thought to be because the surface became more active due to silicon's electron-donating properties.
本発明の防曇ガラスは、従来のように薄膜がリン酸化物
を含んでいないため、耐久性及び耐水性に優れ、しかも
高い膜硬度を有するものである。The anti-fog glass of the present invention has excellent durability and water resistance, as well as high film hardness, since the thin film does not contain phosphorus oxides as in the conventional glass.
(実施例) 以下に本発明を実施例に基づいて具体的に説明する。(Example) The present invention will be specifically described below based on Examples.
実淘Ll−
テトラエチルシリケート(コルコート社製)エタノール
溶液と、水と、触媒として塩酸とを混合して加水分解溶
液を調製した。この溶液をガラス基材としてホウケイ酸
ガラス(マツナミ社製)の表面にコーティングした後1
日乾燥した。得られたシリコン酸化物層被覆ガラスを、
窒素ガス雰囲気下で500°Cで1時間熱処理すること
によりシリコン酸化物(SiO□)の皮膜を形成して防
曇ガラスを得た。皮膜の厚さは約0.2μmであった。A hydrolysis solution was prepared by mixing an ethanol solution of Tetraethylsilicate (manufactured by Colcourt), water, and hydrochloric acid as a catalyst. After coating the surface of borosilicate glass (manufactured by Matsunami) with this solution as a glass base material, 1
Dry in the sun. The obtained silicon oxide layer coated glass is
A film of silicon oxide (SiO□) was formed by heat treatment at 500° C. for 1 hour in a nitrogen gas atmosphere to obtain antifogging glass. The thickness of the film was approximately 0.2 μm.
又、皮膜の鉛筆硬度をJIS K 5400に準じて測
定したところ、8+1であった。Further, the pencil hardness of the film was measured according to JIS K 5400 and was found to be 8+1.
次に、この防曇ガラスの防曇性を評価した。防曇性の評
価は、防曇ガラスの液滴接触角、JISS4030に準
じた高温部曇り止め性、低温部曇り止め性について行っ
た。また、耐久性は蒸留水中に1ケ月浸漬した後の防曇
性(耐水性)、及び60°C・90%R1+中に1ケ月
放置後の防曇性(耐湿性)を評価した。その結果を表1
に示した。Next, the anti-fog properties of this anti-fog glass were evaluated. Anti-fog properties were evaluated on the droplet contact angle of anti-fog glass, anti-fogging properties at high temperatures and anti-fogging properties at low temperatures according to JISS4030. In addition, durability was evaluated by anti-fogging properties (water resistance) after being immersed in distilled water for one month, and anti-fogging properties (moisture resistance) after being left in 60°C and 90% R1+ for one month. Table 1 shows the results.
It was shown to.
支I匠主
実施例1之同、様にして得られた被覆ガラスを、iso
μm以下に増粒・分級したAl2O3粉末中に埋めて大
気中550°Cで30分間熱処理することによりシリコ
ン酸化物(5f02)の皮膜を形成して防曇ガラスを得
た。皮膜の厚さは約0.2μmであった。又、実施例1
と同様にして鉛筆硬度を測定したところ、8Hであった
。The coated glass obtained in the same manner as in Example 1 was
It was buried in Al2O3 powder which had been enlarged and classified to micrometers or less, and heat treated in the atmosphere at 550°C for 30 minutes to form a film of silicon oxide (5f02) to obtain antifogging glass. The thickness of the film was approximately 0.2 μm. Also, Example 1
When the pencil hardness was measured in the same manner as above, it was 8H.
得られた防曇ガラスの防曇性及び耐久性を実施例1と同
様に評価した。結果を表1に示した。The anti-fog properties and durability of the obtained anti-fog glass were evaluated in the same manner as in Example 1. The results are shown in Table 1.
ル五」ロー
実施例1と同様にして得られた被覆ガラスを、大気中5
00°Cで1時間熱処理することによりシリコン酸化物
(Si02)の皮膜を形成して防曇ガラスを得た。皮膜
の厚さは約0.2μmであった。The coated glass obtained in the same manner as in Example 1 was placed in the atmosphere for 5 minutes.
A film of silicon oxide (Si02) was formed by heat treatment at 00°C for 1 hour to obtain antifogging glass. The thickness of the film was approximately 0.2 μm.
得られた防暑ガラスの防曇性及び耐久性を実施例1と同
様に評価した。結果を表1に示した。The antifogging properties and durability of the obtained heatproof glass were evaluated in the same manner as in Example 1. The results are shown in Table 1.
止葺且主
実施例1と同様にして得られた被覆ガラスを、実施例2
と同様に150μm以下に増粒・分級したAl2O3粉
末中に埋めて大気中400°Cで30分間熱処理するこ
とによりシリコン酸化物(5i02)の皮膜を形成して
防曇ガラスを得た。皮膜の厚さは約0.2μmであった
。The coated glass obtained in the same manner as in Example 1 was used in Example 2.
Similarly, it was buried in Al2O3 powder which had been enlarged and classified to 150 μm or less and heat treated at 400°C for 30 minutes in the atmosphere to form a film of silicon oxide (5i02) to obtain anti-fog glass. The thickness of the film was approximately 0.2 μm.
得られた防曇ガラスの防曇性及び耐久性を実施例1と同
様に評価した。結果を表1に示した。The anti-fog properties and durability of the obtained anti-fog glass were evaluated in the same manner as in Example 1. The results are shown in Table 1.
匿蝮丘主
市販品の防曇用コーティング剤(松本油脂社製)をホウ
ケイ酸ガラス表面に塗布・乾燥し、このガラスについて
、防曇性を実施例1と同様に評価した。結果を表1に示
した。尚、実施例1で行ったと同様にして鉛筆硬度を測
定したところ、2Bであった0
表1の結果から、市販品の防曇用コーティング剤(比較
例3)は、初期の防曇性はよいが、耐久性に欠けている
ことがわかる。これに対し、実施例1及び2の防曇ガラ
スは、初期及び1ケ月後の防曇性がともに優れている。A commercially available anti-fog coating agent (manufactured by Matsumoto Yushi Co., Ltd.) was applied to the surface of borosilicate glass and dried, and the anti-fog properties of this glass were evaluated in the same manner as in Example 1. The results are shown in Table 1. In addition, when the pencil hardness was measured in the same manner as in Example 1, it was 2B.0 From the results in Table 1, the commercially available anti-fog coating agent (Comparative Example 3) had an initial anti-fog property. It's good, but I can see that it lacks durability. On the other hand, the anti-fog glasses of Examples 1 and 2 have excellent anti-fog properties both at the initial stage and after one month.
比較例2の防曇ガラスは、シリコン酸化物の焼成が不十
分であったために、防曇性が同上しなかったものと思わ
れる。It is thought that the antifogging glass of Comparative Example 2 did not have the same antifogging properties as above because the silicon oxide was insufficiently fired.
(発明の効果)
本発明は、ガラス基材表面に、シリコン酸化物層を形成
した後、シリコン酸化物層を不活性状態下で焼成してい
るので、長期に亘って優れた防曇性を発揮することがで
きる。従って、この防曇ガラスを、例えば、眼鏡レンズ
、ゴーグル、車の窓ガラスなどに適用すれば、周囲の急
激な温度変化によっても曇りが生じ難く快適に使用でき
ると共に、安全性を高めることができる。(Effects of the Invention) In the present invention, after forming a silicon oxide layer on the surface of a glass substrate, the silicon oxide layer is fired under an inert state, so that excellent antifogging properties can be maintained for a long period of time. able to demonstrate. Therefore, if this anti-fog glass is applied to, for example, eyeglass lenses, goggles, car window glasses, etc., fogging will not easily occur even when the surrounding temperature changes, making it comfortable to use and increasing safety. .
以上 出願人 積水化学工業株式会社 代表者 廣1) 馨that's all Applicant: Sekisui Chemical Co., Ltd. Representative Hiroshi 1) Kaoru
Claims (1)
、シリコン酸化物層を不活性状態下で焼成することを特
徴とする防曇ガラスの製造方法。1. A method for producing antifogging glass, which comprises forming a silicon oxide layer on the surface of a glass substrate and then firing the silicon oxide layer under an inert condition.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11947889A JPH02296752A (en) | 1989-05-12 | 1989-05-12 | Production of anti-clouding glass |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11947889A JPH02296752A (en) | 1989-05-12 | 1989-05-12 | Production of anti-clouding glass |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02296752A true JPH02296752A (en) | 1990-12-07 |
Family
ID=14762293
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11947889A Pending JPH02296752A (en) | 1989-05-12 | 1989-05-12 | Production of anti-clouding glass |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02296752A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001032578A1 (en) * | 1999-11-05 | 2001-05-10 | Saint-Gobain Glass France | Transparent substrate provided with a silicon derivative layer |
WO2001087789A1 (en) * | 2000-05-16 | 2001-11-22 | Nippon Sheet Glass Co., Ltd. | Method for imparting hydrophilicity to substrate |
-
1989
- 1989-05-12 JP JP11947889A patent/JPH02296752A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001032578A1 (en) * | 1999-11-05 | 2001-05-10 | Saint-Gobain Glass France | Transparent substrate provided with a silicon derivative layer |
FR2800731A1 (en) * | 1999-11-05 | 2001-05-11 | Saint Gobain Vitrage | TRANSPARENT SUBSTRATE WITH SILICON DERIVED LAYER |
JP2003512997A (en) * | 1999-11-05 | 2003-04-08 | サン−ゴバン グラス フランス | Transparent substrate with layer made from silicon derivative |
AU776987B2 (en) * | 1999-11-05 | 2004-09-30 | Saint-Gobain Glass France | Transparent substrate provided with a silicon derivative layer |
US6818309B1 (en) | 1999-11-05 | 2004-11-16 | Saint-Gobian Glass France | Transparent substrate provided with a silicon derivative layer |
KR100735763B1 (en) * | 1999-11-05 | 2007-07-06 | 쌩-고벵 글래스 프랑스 | Transparent substrate provided with a silicon derivative layer and method of using the substrate |
WO2001087789A1 (en) * | 2000-05-16 | 2001-11-22 | Nippon Sheet Glass Co., Ltd. | Method for imparting hydrophilicity to substrate |
US6667075B2 (en) | 2000-05-16 | 2003-12-23 | Nippon Sheet Glass Co., Ltd. | Method for imparting hydrophilicity to substrate |
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