JPH02293750A - Positive type photosensitive planographic printing plate - Google Patents
Positive type photosensitive planographic printing plateInfo
- Publication number
- JPH02293750A JPH02293750A JP1113178A JP11317889A JPH02293750A JP H02293750 A JPH02293750 A JP H02293750A JP 1113178 A JP1113178 A JP 1113178A JP 11317889 A JP11317889 A JP 11317889A JP H02293750 A JPH02293750 A JP H02293750A
- Authority
- JP
- Japan
- Prior art keywords
- diethylene glycol
- ether
- ester
- photosensitive layer
- photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims abstract description 33
- 150000002148 esters Chemical class 0.000 claims abstract description 21
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract description 17
- 239000002904 solvent Substances 0.000 abstract description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 abstract description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 abstract description 5
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 abstract description 5
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 abstract description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 abstract description 4
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 abstract description 2
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 abstract description 2
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 abstract description 2
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 abstract description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 abstract description 2
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 abstract 3
- HXDLWJWIAHWIKI-UHFFFAOYSA-N 2-hydroxyethyl acetate Chemical compound CC(=O)OCCO HXDLWJWIAHWIKI-UHFFFAOYSA-N 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 238000000576 coating method Methods 0.000 description 27
- 239000011248 coating agent Substances 0.000 description 25
- -1 ethylene glycol alkyl ether Chemical class 0.000 description 17
- 239000000243 solution Substances 0.000 description 16
- 229920005989 resin Polymers 0.000 description 13
- 239000011347 resin Substances 0.000 description 13
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 10
- 239000003960 organic solvent Substances 0.000 description 10
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 9
- 238000011161 development Methods 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 238000011282 treatment Methods 0.000 description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 150000002170 ethers Chemical class 0.000 description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 6
- 229920002554 vinyl polymer Polymers 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 238000009833 condensation Methods 0.000 description 5
- 230000005494 condensation Effects 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 5
- 150000002989 phenols Chemical class 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- XXXFZKQPYACQLD-UHFFFAOYSA-N 2-(2-hydroxyethoxy)ethyl acetate Chemical compound CC(=O)OCCOCCO XXXFZKQPYACQLD-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 150000001299 aldehydes Chemical class 0.000 description 3
- 150000005215 alkyl ethers Chemical class 0.000 description 3
- HRBFQSUTUDRTSV-UHFFFAOYSA-N benzene-1,2,3-triol;propan-2-one Chemical compound CC(C)=O.OC1=CC=CC(O)=C1O HRBFQSUTUDRTSV-UHFFFAOYSA-N 0.000 description 3
- 229930003836 cresol Natural products 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 150000002791 naphthoquinones Chemical class 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- GWQAFGZJIHVLGX-UHFFFAOYSA-N 2-(2-propoxyethoxy)ethyl acetate Chemical compound CCCOCCOCCOC(C)=O GWQAFGZJIHVLGX-UHFFFAOYSA-N 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- WRMNZCZEMHIOCP-UHFFFAOYSA-N 2-phenylethanol Chemical compound OCCC1=CC=CC=C1 WRMNZCZEMHIOCP-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 229930192627 Naphthoquinone Natural products 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 150000003931 anilides Chemical class 0.000 description 2
- 238000007743 anodising Methods 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000866 electrolytic etching Methods 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- VOOLKNUJNPZAHE-UHFFFAOYSA-N formaldehyde;2-methylphenol Chemical compound O=C.CC1=CC=CC=C1O VOOLKNUJNPZAHE-UHFFFAOYSA-N 0.000 description 2
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- MGSRCZKZVOBKFT-UHFFFAOYSA-N thymol Chemical compound CC(C)C1=CC=C(C)C=C1O MGSRCZKZVOBKFT-UHFFFAOYSA-N 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- YXOUPUFJBBFWNL-UHFFFAOYSA-N 1-[2-(2-pentoxyethoxy)ethoxy]pentane Chemical compound CCCCCOCCOCCOCCCCC YXOUPUFJBBFWNL-UHFFFAOYSA-N 0.000 description 1
- DNJRKFKAFWSXSE-UHFFFAOYSA-N 1-chloro-2-ethenoxyethane Chemical compound ClCCOC=C DNJRKFKAFWSXSE-UHFFFAOYSA-N 0.000 description 1
- KTZVZZJJVJQZHV-UHFFFAOYSA-N 1-chloro-4-ethenylbenzene Chemical compound ClC1=CC=C(C=C)C=C1 KTZVZZJJVJQZHV-UHFFFAOYSA-N 0.000 description 1
- OZCMOJQQLBXBKI-UHFFFAOYSA-N 1-ethenoxy-2-methylpropane Chemical compound CC(C)COC=C OZCMOJQQLBXBKI-UHFFFAOYSA-N 0.000 description 1
- RCSKFKICHQAKEZ-UHFFFAOYSA-N 1-ethenylindole Chemical compound C1=CC=C2N(C=C)C=CC2=C1 RCSKFKICHQAKEZ-UHFFFAOYSA-N 0.000 description 1
- CTXUTPWZJZHRJC-UHFFFAOYSA-N 1-ethenylpyrrole Chemical compound C=CN1C=CC=C1 CTXUTPWZJZHRJC-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- BJINVQNEBGOMCR-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl acetate Chemical compound COCCOCCOC(C)=O BJINVQNEBGOMCR-UHFFFAOYSA-N 0.000 description 1
- PWTNRNHDJZLBCD-UHFFFAOYSA-N 2-(2-pentoxyethoxy)ethanol Chemical compound CCCCCOCCOCCO PWTNRNHDJZLBCD-UHFFFAOYSA-N 0.000 description 1
- MSHVPEDOYHYTBV-UHFFFAOYSA-N 2-(2-pentoxyethoxy)ethyl acetate Chemical compound CCCCCOCCOCCOC(C)=O MSHVPEDOYHYTBV-UHFFFAOYSA-N 0.000 description 1
- ZUAURMBNZUCEAF-UHFFFAOYSA-N 2-(2-phenoxyethoxy)ethanol Chemical compound OCCOCCOC1=CC=CC=C1 ZUAURMBNZUCEAF-UHFFFAOYSA-N 0.000 description 1
- PICKZMGDVSSGSC-UHFFFAOYSA-N 2-(2-phenoxyethoxy)ethoxybenzene Chemical compound C=1C=CC=CC=1OCCOCCOC1=CC=CC=C1 PICKZMGDVSSGSC-UHFFFAOYSA-N 0.000 description 1
- FMRPQUDARIAGBM-UHFFFAOYSA-N 2-(2-phenoxyethoxy)ethyl acetate Chemical compound CC(=O)OCCOCCOC1=CC=CC=C1 FMRPQUDARIAGBM-UHFFFAOYSA-N 0.000 description 1
- DJCYDDALXPHSHR-UHFFFAOYSA-N 2-(2-propoxyethoxy)ethanol Chemical compound CCCOCCOCCO DJCYDDALXPHSHR-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical class O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- QSKPIOLLBIHNAC-UHFFFAOYSA-N 2-chloro-acetaldehyde Chemical compound ClCC=O QSKPIOLLBIHNAC-UHFFFAOYSA-N 0.000 description 1
- ZRUOTKQBVMWMDK-UHFFFAOYSA-N 2-hydroxy-6-methylbenzaldehyde Chemical compound CC1=CC=CC(O)=C1C=O ZRUOTKQBVMWMDK-UHFFFAOYSA-N 0.000 description 1
- CRWNQZTZTZWPOF-UHFFFAOYSA-N 2-methyl-4-phenylpyridine Chemical compound C1=NC(C)=CC(C=2C=CC=CC=2)=C1 CRWNQZTZTZWPOF-UHFFFAOYSA-N 0.000 description 1
- FCYVWWWTHPPJII-UHFFFAOYSA-N 2-methylidenepropanedinitrile Chemical class N#CC(=C)C#N FCYVWWWTHPPJII-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 101100309761 Aedes aegypti SDR-1 gene Proteins 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- DWBXLPVFYFOPIW-UHFFFAOYSA-N ClC(Cl)COC(=O)C=C Chemical compound ClC(Cl)COC(=O)C=C DWBXLPVFYFOPIW-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- 102100038434 Neuroplastin Human genes 0.000 description 1
- 108700038050 Neuroplastin Proteins 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000005844 Thymol Substances 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical class ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001253 acrylic acids Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229940051881 anilide analgesics and antipyretics Drugs 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- RECUKUPTGUEGMW-UHFFFAOYSA-N carvacrol Chemical compound CC(C)C1=CC=C(C)C(O)=C1 RECUKUPTGUEGMW-UHFFFAOYSA-N 0.000 description 1
- HHTWOMMSBMNRKP-UHFFFAOYSA-N carvacrol Natural products CC(=C)C1=CC=C(C)C(O)=C1 HHTWOMMSBMNRKP-UHFFFAOYSA-N 0.000 description 1
- 235000007746 carvacrol Nutrition 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910001916 chloryl Inorganic materials 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- UBPGILLNMDGSDS-UHFFFAOYSA-N diethylene glycol diacetate Chemical compound CC(=O)OCCOCCOC(C)=O UBPGILLNMDGSDS-UHFFFAOYSA-N 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- OUGJKAQEYOUGKG-UHFFFAOYSA-N ethyl 2-methylidenebutanoate Chemical compound CCOC(=O)C(=C)CC OUGJKAQEYOUGKG-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 239000013505 freshwater Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 238000000186 gas chromatography-infrared spectroscopy Methods 0.000 description 1
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- WYXXLXHHWYNKJF-UHFFFAOYSA-N isocarvacrol Natural products CC(C)C1=CC=C(O)C(C)=C1 WYXXLXHHWYNKJF-UHFFFAOYSA-N 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- AWJZTPWDQYFQPQ-UHFFFAOYSA-N methyl 2-chloroprop-2-enoate Chemical compound COC(=O)C(Cl)=C AWJZTPWDQYFQPQ-UHFFFAOYSA-N 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000010413 mother solution Substances 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- YDKJSAXEBRKYLM-UHFFFAOYSA-N n-(3-methoxyphenyl)prop-2-enamide Chemical compound COC1=CC=CC(NC(=O)C=C)=C1 YDKJSAXEBRKYLM-UHFFFAOYSA-N 0.000 description 1
- JEPAGMKWFWQECH-UHFFFAOYSA-N n-(4-chlorophenyl)prop-2-enamide Chemical compound ClC1=CC=C(NC(=O)C=C)C=C1 JEPAGMKWFWQECH-UHFFFAOYSA-N 0.000 description 1
- BPCNEKWROYSOLT-UHFFFAOYSA-N n-phenylprop-2-enamide Chemical compound C=CC(=O)NC1=CC=CC=C1 BPCNEKWROYSOLT-UHFFFAOYSA-N 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 150000002826 nitrites Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 229960001553 phloroglucinol Drugs 0.000 description 1
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229960000790 thymol Drugs 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ポジ型感光性平版印刷版に関し、詳しくは、
現像性が向上ずるとともに焼き出し画像が改善され、さ
らに改善された作業環境において製造、かつ取り扱うこ
とができるポジ型感光性平版印刷版に関するものである
。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a positive-working photosensitive lithographic printing plate, and in detail,
The present invention relates to a positive-working photosensitive lithographic printing plate which has improved developability and printout images, and which can be manufactured and handled in an improved working environment.
一般に、ポジ型感光性平版印刷版(以下、感光性印刷版
ともいう)は、感光性組成物を適当な有機溶剤に溶解す
ることによって調製したポジ型感光性塗布液(以下、単
に塗布液ともいう)を支持体に塗布した後、これを乾燥
することによって製造されており、従来、上記有機溶剤
としては、エチレングリコールアルキルエーテルおよび
エチレングリコールアルキルエーテルアセテートが用い
られ、またプロピレングリコールモノアルキルエーテル
(特開昭61−6648号公報)およびプロピレングリ
コールアルキルエーテルアセテート(特開昭61−78
37号公報)も前記有機溶剤として提案されている。In general, a positive-working photosensitive lithographic printing plate (hereinafter also referred to as a photosensitive printing plate) is a positive-working photosensitive coating liquid (hereinafter also simply referred to as a coating liquid) prepared by dissolving a photosensitive composition in a suitable organic solvent. Conventionally, ethylene glycol alkyl ether and ethylene glycol alkyl ether acetate have been used as the organic solvent, and propylene glycol monoalkyl ether ( JP-A-61-6648) and propylene glycol alkyl ether acetate (JP-A-61-78)
No. 37) has also been proposed as the organic solvent.
しかしながら、上記のような有機溶剤を感光性組成物の
溶媒とした塗布液を使用して感光層を形成させると、得
られた感光性印刷版は、いずれも鮮明な焼き出し画像を
形成し難く、また前記のエチレングリコールアルキルエ
ーテルおよびエチレングリコールアルキルエーテルアセ
テートは毒性が強いため、これらを含む塗布液を使用し
て感光性印刷版を製造する場合には、塗布工程の作業環
境に悪影響が及ぶとともに、そこで生じた廃液が公害を
起こし易いという問題があった。However, when a photosensitive layer is formed using a coating solution in which an organic solvent as described above is used as a solvent for a photosensitive composition, the resulting photosensitive printing plate is difficult to form a clear printed image. In addition, the above-mentioned ethylene glycol alkyl ether and ethylene glycol alkyl ether acetate are highly toxic, so when producing photosensitive printing plates using a coating solution containing them, the working environment of the coating process is adversely affected and However, there was a problem in that the waste liquid produced was likely to cause pollution.
そこで、本発明者等は、上述のような状況に鑑みて種々
研究を重ねた結果、
感光性印刷版の感光層中に、この感光層の重量を基にし
て、ジエチレングリコールのエーテルおよびエステルの
いずれか一方または双方を00110重量%含有させる
と、その感光性印刷版の現像性が向上ずるとともに、こ
の感光性印刷版から得られる焼き出し画像が鮮明になる
うえに、版面が汚れ難い印刷版を形成し、そしてこのよ
うな感光性印刷版は、前記塗布液を調製するだめの有機
溶剤として、毒性の低い上記ジエチレングリコールのエ
ーテルおよびエステルのいずれか一方または双方を用い
れば好都合に得られ、さらにこれらの溶剤は塗布液の塗
布性を改善すること、を見出した。Therefore, the inventors of the present invention have conducted various studies in view of the above-mentioned circumstances, and have determined whether diethylene glycol ether or ester is included in the photosensitive layer of a photosensitive printing plate, based on the weight of this photosensitive layer. When one or both of them are contained in an amount of 00110% by weight, the developability of the photosensitive printing plate improves, the printed image obtained from the photosensitive printing plate becomes clearer, and the plate surface is less stained. Such a photosensitive printing plate is conveniently obtained by using one or both of the above-mentioned low toxicity ethers and esters of diethylene glycol as the organic solvent for preparing the coating solution; It has been found that the solvent improves the coating properties of the coating solution.
本発明は、上記知見に基づいて発明されたもので、現像
性に優れるとともに、鮮明な焼き出し画像を形成するこ
とができ、さらに安全な作業環境の下で製造、かつ取り
扱うことができるポジ型感光性平版印刷版を提供するこ
とを目的とし、感光層中に、この感光層の重量を基にし
て、ジエチレングリコールのエーテルおよびエステルの
いずれか一方または双方を0.01〜10重量%含有す
るポジ型感光性平版印刷版、
に係わるものである。The present invention was invented based on the above knowledge, and is a positive type that has excellent developability, can form clear printed images, and can be manufactured and handled in a safe working environment. The purpose is to provide a photosensitive lithographic printing plate, and the photosensitive layer contains 0.01 to 10% by weight of diethylene glycol ether and/or ester, based on the weight of the photosensitive layer. This relates to a type photosensitive lithographic printing plate.
以下、本発明をさらに詳し《説明する。 The present invention will be explained in more detail below.
本発明の感光層中で用いられるジエチレングリコールの
エーテルおよびエステルとしては、ジエチレングリコー
ルモノメチルエーテル、ジエチレングリコール千ノエチ
ルエーテル、ジエチレングリコールモノプロビルエーテ
ル、ジエチレングリコールモノブチルエーテル、ジエチ
レングリコールモノペンチルエーテルおよびジエチレン
グリコールモノフェニルエーテルのようなジエチレング
リコールモノアルキルーまたは〜モノアリールエーテル
;ジエチレングリコールジメチルエーテル、ジエチレン
グリコールジエチルエーテル、ジエチレングリコールジ
プロビルエーテル、ジエチレングリコールジブチルエー
テル、ジエチレングリコ一ルジペンチルエーテルおよび
ジエチレングリコールジフエニルエーテルのようなジエ
チレングリコールジアルキルーまたはージアリールエー
テル;ジエチレングリコールモノメチルエーテルモノア
セテーl・、ジエチレングリコール千ノエチルエーテル
モノアセテート、ジエチレングリコールモノプロビルエ
ーテルモノアセテ−1・、ジエチレングリコールモノブ
チルエーテルモノアセテ−1−、ジエヂレングリコール
千ノペンチルエーテルモノアセテートおよびジエチレン
グリコールモノフェニルエーテル千ノアセテートのよう
なジエチレングリコールモノアルキルーまたはーモノア
リールエーテルモノアセテ−1〜:ジエチレングリコー
ルモノアセテートおよびジエチレングリコールジアセテ
ート等が挙げられ、これらの有機溶剤は単独で、あるい
は2種以上組の合わせて使用することができる。Ethers and esters of diethylene glycol used in the photosensitive layer of the present invention include diethylene glycol monomethyl ether, diethylene glycol 1,000 ethyl ether, diethylene glycol monopropyl ether, diethylene glycol monobutyl ether, diethylene glycol monopentyl ether and diethylene glycol monophenyl ether. Monoalkyl- or -monoaryl ethers; diethylene glycol dialkyl- or -diaryl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol diprobyl ether, diethylene glycol dibutyl ether, diethylene glycol dipentyl ether and diethylene glycol diphenyl ether; diethylene glycol monomethyl ether mono Acetyl 1, Diethylene glycol monopropyl ether monoacetate, Diethylene glycol monopropyl ether monoacetate 1, Diethylene glycol monobutyl ether monoacetate, Diethylene glycol monopentyl ether monoacetate, Diethylene glycol monophenyl ether monoacetate, Diethylene glycol monopropyl ether monoacetate Diethylene glycol monoalkyl or monoaryl ether monoacetate such as acetate 1~: Examples include diethylene glycol monoacetate and diethylene glycol diacetate, and these organic solvents may be used alone or in combination of two or more types. I can do it.
上に例示した有機溶剤のうち、ジエチレングリコール千
ノメチルエーテル、ジエチレングリコールモノエチルエ
ーテル、ジエチレングリコールジメチルエーテル、ジエ
ヂレングリコールジエチルエーテル、ジエチレングリコ
ールモノメチルエーテル千ノアセテートおよびジエチレ
ングリコールモノアセテ−1・等が好ましく、特にジエ
チレングリコール千ノメチルエーテルおよびジエチレン
グリコールジメチルエーテルが好ましい。Among the organic solvents listed above, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethyl glycol diethyl ether, diethylene glycol monomethyl ether monoacetate, diethylene glycol monoacetate, etc. are preferred, and diethylene glycol monoacetate is particularly preferred. Preference is given to dimethyl ether and diethylene glycol dimethyl ether.
本発明の感光性印刷版は、感光層中に、この感光層の重
量を基にして、0.01〜10重景%、好ましくは0.
05〜5重景%、より好ましくは0.1〜2重量%の前
記ジエチレングリコールのエーテルおよびエステルのい
ずれか1種または2種以上を含有するが、前記怒光層は
、これらのエーテルおよび/またはエステル、惑光性組
成物およびその他必要に応じて添加される添加物の他に
、適当な有機溶媒を若干量、例えば5重量%以下含むこ
とができ、このような有機溶媒としては、例えば、ジメ
チルボルムアミド、ジメチルスルホキシド、アセトン、
ジオギザン、テトラヒド口フラン、シクロへギサノン、
塩化メチレン、メチルエチルケトン、メチルプロビルケ
トン、メチルブチルケトン、ジエチルケ1・ン、シクロ
ヘキザノール、n−ブタノール、ベンジルアルコール、
フェネチルアルコールおよび水等が挙げられる。The photosensitive printing plate of the present invention contains in the photosensitive layer 0.01 to 10%, preferably 0.01%, based on the weight of the photosensitive layer.
05 to 5% by weight, more preferably 0.1 to 2% by weight of any one or more of the diethylene glycol ethers and esters; In addition to the ester, the photolactic composition, and other additives added as necessary, it may contain some amount of a suitable organic solvent, for example, 5% by weight or less; such organic solvents include, for example, dimethylborumamide, dimethyl sulfoxide, acetone,
Diogysan, tetrahydrofuran, cyclohegisanone,
Methylene chloride, methyl ethyl ketone, methyl propyl ketone, methyl butyl ketone, diethyl ketone, cyclohexanol, n-butanol, benzyl alcohol,
Examples include phenethyl alcohol and water.
なお、感光層におけるジエチレングリコールのエーテル
および/またはエステルの含有量が、その感光層の重量
を基にして、0.01重景%未満になると、前述のよう
な現像性の向上効果および焼き出し画像の鮮明化が得ら
れず、一方その含有量が10重景%を越えると、感光層
がペタついて台紙等への感光層の転写が起こる等のトラ
ブルが発生し易くなるところから、本発明では感光層に
含まれるジエチレングリコールのエーテルおよび/また
はエステルの含有量を0.01〜10重景%と定めた。Note that if the content of diethylene glycol ether and/or ester in the photosensitive layer is less than 0.01% based on the weight of the photosensitive layer, the above-mentioned developability improvement effect and printout image may be impaired. However, if the content exceeds 10%, troubles such as the photosensitive layer becoming sticky and transfer to the mount etc. are likely to occur. The content of diethylene glycol ether and/or ester contained in the photosensitive layer was determined to be 0.01 to 10% by weight.
惑光性印刷版の感光層中に、ジエチレングリコールのエ
ーテルおよび/またはエステルを含有させるには、これ
らのエーテルおよびエステルのいずれか1種または2種
以上を含有する塗布液を、常法により支持体に塗布、乾
燥して感光層を形成させればよく、これらのエーテルお
よびエステルの含有量は、一般に前記塗布液中に含まれ
る前記エーテルおよびエステルの量(濃度)を増滅する
ことによって8周整される。In order to contain diethylene glycol ether and/or ester in the photosensitive layer of a photosensitive printing plate, a coating solution containing one or more of these ethers and esters is applied to a support by a conventional method. The content of these ethers and esters can be adjusted by increasing or decreasing the amount (concentration) of the ethers and esters contained in the coating solution. be done.
感光層中に含まれるジエチレングリコールのエーテルお
よびエステルの含有量は、例えば、γブチロラクトン、
メタノールまたはベンジルアルコールのような有機溶媒
を用いて支持体から感光層を溶解剥離し、それによって
生成した溶液を濾過してから、その濾液を、例えばガス
クロマトグラフィー質量分析法(C.C/MS”)およ
びガスクロマトグラフィー・フーリエ変換赤外分光法(
GC/FT− I R法)等で解析することによって検
出、確認することができる。The content of diethylene glycol ether and ester contained in the photosensitive layer is, for example, γ-butyrolactone,
The photosensitive layer is dissolved and peeled from the support using an organic solvent such as methanol or benzyl alcohol, the resulting solution is filtered, and the filtrate is subjected to, for example, gas chromatography mass spectrometry (C.C/MS). ”) and gas chromatography/Fourier transform infrared spectroscopy (
It can be detected and confirmed by analysis using GC/FT-IR method, etc.
本発明に係わる惑光性平版印刷版を製造する場合に使用
するのに適した支持体としては、アルミニウム、亜鉛、
銅等の金属の板、亜鉛、銅、クロム等が蒸着された金属
板、クロムメッキされた鋼板、親水化処理された紙およ
びプラスチック、また、金属が蒸着された紙およびプラ
スチックフィルム等があげられ、最も好ましいものはア
ルミニウム板である。特に支持体がアルミニウム板等の
金属板からなる場合には、これらの支持体に砂目立て処
理、陽極酸化処理および必要に応じて封孔処理等の表面
処理が施されているのが好ましい。Supports suitable for use in producing the photolactic lithographic printing plates of the present invention include aluminum, zinc,
Metal plates such as copper, metal plates coated with zinc, copper, chromium, etc., chrome-plated steel plates, paper and plastics treated to make them hydrophilic, paper and plastic films coated with metals, etc. , the most preferred is an aluminum plate. Particularly when the support is made of a metal plate such as an aluminum plate, it is preferable that the support is subjected to surface treatments such as graining, anodizing, and if necessary, sealing.
上記の砂目立て処理には、アルミニウム板等の金属板の
表面を脱脂した後、ブラシ研磨法、ボール研磨法、化学
研磨法または電解エッヂング法等の粗面化法を適用する
技術を採用することができる。For the above-mentioned graining treatment, a technique that applies a roughening method such as brush polishing, ball polishing, chemical polishing, or electrolytic etching after degreasing the surface of a metal plate such as an aluminum plate should be adopted. I can do it.
上記陽極酸化処理は、例えば燐酸、クロム酸、硼酸、硫
酸等の無機酸または蓚酸、スルファミン酸等の有機酸の
1種または2種以上を含む水溶液または非水溶液中でア
ルミニウム板等の金属板を陽極としてこれに電流を通じ
ることによって遂行される。The above-mentioned anodizing treatment is performed on a metal plate such as an aluminum plate in an aqueous or non-aqueous solution containing one or more of inorganic acids such as phosphoric acid, chromic acid, boric acid, and sulfuric acid, or organic acids such as oxalic acid and sulfamic acid. This is accomplished by passing an electric current through it as an anode.
また、上記の封孔処理は珪酸ナトリウム水溶液、熱水お
よび若干の無機塩または有機塩を含む熱水溶液に金属板
を浸漬するか、あるいは金属板を水蒸気浴に曝すことに
よって遂行される。Further, the above-mentioned sealing treatment is performed by immersing the metal plate in a hot aqueous solution containing an aqueous sodium silicate solution, hot water, and some inorganic or organic salts, or by exposing the metal plate to a steam bath.
本発明の感光性印刷版における感光層中で用いられるポ
ジ型感光性組成物としては、露光の前後において、露光
部と未露光部との間で現像液に対する溶解性に差が生じ
、それによってポジ画像を形成するものならば、いずれ
も使用することができ、その代表的なものとしては次の
ようなものが包含される。As for the positive-working photosensitive composition used in the photosensitive layer of the photosensitive printing plate of the present invention, there is a difference in solubility in the developer between the exposed area and the unexposed area before and after exposure. Any material that forms a positive image can be used, and typical examples thereof include the following.
(1)0−キノンジアジド化合物を含む惑光性組成物
O−キノンジアジド化合物としては、例えば0ナフ1・
キノンジアジドスルボン酸と、フェノール類およびアル
デヒドまたはケトンの重縮合樹脂とのエステル化合物が
挙げられる。(1) Photolactic composition containing an 0-quinonediazide compound As an O-quinonediazide compound, for example, 0naf1.
Examples include ester compounds of quinonediazide sulfonic acid and polycondensation resins of phenols and aldehydes or ketones.
前記フェノール類としては、例えば、フェノール、0−
クレゾール、m−クレゾール、p−クレゾール、3,5
−キシレノール、カルバクロール、チモール等の一価フ
ェノール;カテコール、レゾルシン、ヒドロキノン等の
二価フェノール;ピロガロール、フロログルシン等の三
価フェノール等が挙げられる。Examples of the phenols include phenol, 0-
Cresol, m-cresol, p-cresol, 3,5
- Monohydric phenols such as xylenol, carvacrol, and thymol; dihydric phenols such as catechol, resorcinol, and hydroquinone; and trihydric phenols such as pyrogallol and phloroglucin.
前記アルデヒドとしてはホルムアルデヒド、べq
ンズアルデヒ1・−、アセ1−アルデヒド、クロI・ン
アルデヒドおよびフルフラール等が挙げられ、これらの
うぢ、好ましいものはホルムアルデヒドおよびヘンズア
ルデヒドである。Examples of the aldehyde include formaldehyde, benzaldehyde-1-, ace-1-aldehyde, chloro-aldehyde, and furfural, and among these, formaldehyde and henzaldehyde are preferred.
また、前記ケトンとしてはアセ1−ンおよびメチルエチ
ルケ1・ン等が挙げられる。Further, examples of the ketone include ace1-one and methylethylke1-one.
前記重縮合樹脂の具体的な例としては、フェノール・ホ
ルムアルデヒド樹脂、m−クレゾールホルムアルデヒド
樹脂、rn〜,p−混合クレゾール・ホルムアルデヒド
樹脂、レゾルシン・ヘンズアルデヒド樹脂およびピロガ
ロール・アセトン樹脂等が挙げられる。Specific examples of the polycondensation resin include phenol formaldehyde resin, m-cresol formaldehyde resin, rn~, p-mixed cresol formaldehyde resin, resorcinol henzaldehyde resin, and pyrogallol acetone resin.
前記0−ナフトキノンシアジド化合物、例えば0−ナフ
1・キノンジアジドスルボン酸のフェノール類のO H
基に対する縮合率(OH基1個に対する反応率)は15
〜80%が好ましく、より好ましくは20〜45%であ
る。The O-H
The condensation rate for groups (reaction rate for one OH group) is 15
-80% is preferable, and 20-45% is more preferable.
さらに、本発明に用いられる0−キノンジアジド化合物
としては特開昭58−43451号公報に記載された化
合物も使用できる。Furthermore, as the O-quinonediazide compound used in the present invention, compounds described in JP-A-58-43451 can also be used.
上記0−キノンジアシド化合物のうち、1.2ヘンゾギ
ノンジアジドスルホニルクロリト′または12−−1−
フ1−コ1−ノンジアジドスノレボニノレクロリドとピ
ロガロール・アセトン縮合樹脂またぱ23、4−1・リ
ヒドIZ+キシヘンゾフエノンとを反応させて得られる
0−キノンジアジドエステルが最も好ましい。Among the above 0-quinonediaside compounds, 1.2henzoginonediazide sulfonyl chloride' or 12--1-
Most preferred is 0-quinonediazide ester obtained by reacting 1-co-1-nondiazide snoreboninolechloride with a pyrogallol acetone condensation resin or 23,4-1-lihyde IZ+xyhenzophenone.
本発明に用いられる0−キノンジアジド化合物としては
上記化合物を各々単独で用いてもよいし、あるいは2種
以上組の合わせて用いてもよい。As the O-quinonediazide compound used in the present invention, each of the above compounds may be used alone, or two or more types may be used in combination.
これらの0−キノンジアジド化合物はアルカリ可溶性の
樹脂と混合して用いた方が好ましい。このアルカリ可溶
性の樹脂としてはノボラック樹脂、フェノール性水酸基
を有するビニル系重合体、特開昭55−57841号公
報に記載されている多価フェノールとアルデヒトまたは
ケトンとの縮合樹脂等が挙げられる。It is preferable to use these 0-quinonediazide compounds in combination with an alkali-soluble resin. Examples of the alkali-soluble resin include novolac resins, vinyl polymers having phenolic hydroxyl groups, and condensation resins of polyhydric phenols and aldehydes or ketones described in JP-A-55-57841.
上記ノボラック樹脂としては、例えばフェノール・ホル
ムアルデヒド樹脂、クレゾール・ホルムアルデヒド樹脂
、特開昭55−57841号公報l2
に記載されているようなフェノール・クレゾール・ホル
ムアルデヒド共重縮合体樹脂、特開昭55127553
号公報に記載されているようなp置換フェノールとフェ
ノールもしくは、クレゾールとホルムアルデヒドとの共
重縮合体樹脂等が挙げられる。Examples of the novolac resin include phenol-formaldehyde resin, cresol-formaldehyde resin, phenol-cresol-formaldehyde copolycondensate resin as described in JP-A-55-57841, JP-A-55127553.
Examples include copolycondensate resins of p-substituted phenol and phenol or cresol and formaldehyde as described in the above publication.
また、フェノール性水酸基を有するビニル系重合体とし
ては、該フェノール性水酸基を有する単位を分子構造中
に有する重合体であり、下記の一般式(I)〜(V)で
表される少なくとも1つの構造単位を含む重合体が好ま
しい。In addition, the vinyl polymer having a phenolic hydroxyl group is a polymer having a unit having a phenolic hydroxyl group in its molecular structure, and at least one of the following general formulas (I) to (V). Polymers containing structural units are preferred.
一般式CI)
一般式(II)
一般式(1)
一般式〔■]
0H
一般式(V)
B
OH
〔式中、R1およびR2ばそれぞれ水素原子、アルキル
基またはカルボキシル基、好ましくは水素原子を表し、
R,は水素原子、ハロゲン原子またはアルキル基、好ま
しくは水素原子またはメチル基、エチル基等のアルキル
基を表し、R4は水素原子、アルキル基、アリール基ま
たはアラルキル基、好ましくは水素原子を表し、Aは窒
素原子または酸素原子と芳香族炭素原子とを連結する、
置換基を有していてもよいアルキレン基を表し、mは0
〜10の整数を表し、そしてBは置換基を有していても
よいフェニレン基または置換基を有していてもよいナフ
チレン基を表す。〕
前記の重合体としては共重合体型の構造を有するものが
好まし《、前記一般式(I)〜(V)でそれぞれ示され
る構造単位と組み合わせて用いることができる単量体単
位としては、例えばエチレン、プロピレン、イソブチレ
ン、ブタジエン、イソプレン等のエチレン系不飽和オレ
フイン頻:スチレン、α−メチルスチレン、p−メチル
スチレン、P−クロロスチレン等のスチレン頻;アクリ
ル酸、メタクリル酸等のアクリル酸頻;イタコン酸、マ
レイン酸、無水マレイン酸等の不飽和脂肪族ジカルボン
酸類;アクリル酸メチル、アクリル酸エチル、アクリル
酸n−ブチル、アクリル酸イソブチル、アクリル酸ドデ
シル、アクリル酸2クロロエヂル、アクリル酸フェニル
、α−クロロアクリル酸メチル、メククリル酸メチル、
メタクリル酸エチル、エタクリル酸エチル等のα−メチ
レン脂肪族モノカルボン酸のエステル頻;アクリロニト
リル、メタクリロニトリル等のニトリル頻;アクリルア
ミド等のアミド類;アクリルアニリド、p−クロロアク
リルアニリド、m−ニトロアクリルアニリド、m−メト
キシアクリルアニリド等のアニリド頻;酢酸ビニル、プ
ロピオン酸ビニル、ベンゾエ酸ビニル、酩酸ビニル等の
ビニルエステル類;メチルビニルエーテル、エチルビニ
ルエーテル、イソブチルビニルエーテル、β−クロロエ
チルビニルエーテル等のビニルエーテル類;塩化ビニル
、塩化ビニリデン、シアン化ビニリデン、1−メチル−
1−メトキシエチレン、1.1−ジメトキシエチレン、
1.2−ジメトキシエチレン、1.1−ジメトキシ力ル
ボニルエチレン、1−メチル− 1一二トロエチレン等
のエチレン誘導体頻;N−ビニルピロール、N−ビニル
カルバゾール、N−ビニルインドール、N−ビニルピロ
リテン、N−ビニルピロドン等のN−ビニル化合物のよ
うビニル系単量体がある。これらのビニル系単量体は不
飽和二重結合が開裂した構造で高分子化合物中に存在す
る。General formula CI) General formula (II) General formula (1) General formula [■] 0H General formula (V) B OH [In the formula, R1 and R2 each represent a hydrogen atom, an alkyl group or a carboxyl group, preferably a hydrogen atom. represents,
R represents a hydrogen atom, a halogen atom or an alkyl group, preferably a hydrogen atom or an alkyl group such as a methyl group or an ethyl group; R4 represents a hydrogen atom, an alkyl group, an aryl group or an aralkyl group, preferably a hydrogen atom; A connects a nitrogen atom or an oxygen atom and an aromatic carbon atom,
Represents an alkylene group that may have a substituent, m is 0
represents an integer of ~10, and B represents a phenylene group that may have a substituent or a naphthylene group that may have a substituent. ] Preferably, the above-mentioned polymer has a copolymer-type structure.《The monomer units that can be used in combination with the structural units represented by the general formulas (I) to (V) are as follows: For example, ethylenically unsaturated olefins such as ethylene, propylene, isobutylene, butadiene, and isoprene; styrenes such as styrene, α-methylstyrene, p-methylstyrene, and p-chlorostyrene; acrylic acids such as acrylic acid and methacrylic acid; ; Unsaturated aliphatic dicarboxylic acids such as itaconic acid, maleic acid, maleic anhydride; methyl acrylate, ethyl acrylate, n-butyl acrylate, isobutyl acrylate, dodecyl acrylate, dichloroethyl acrylate, phenyl acrylate, Methyl α-chloroacrylate, Methyl meccrylate,
Esters of α-methylene aliphatic monocarboxylic acids such as ethyl methacrylate and ethyl ethacrylate; nitriles such as acrylonitrile and methacrylonitrile; amides such as acrylamide; acrylanilide, p-chloroacrylanilide, m-nitroacrylic Anilides such as anilide and m-methoxyacrylanilide; vinyl esters such as vinyl acetate, vinyl propionate, vinyl benzoate, and vinyl oxate; vinyl ethers such as methyl vinyl ether, ethyl vinyl ether, isobutyl vinyl ether, and β-chloroethyl vinyl ether. ; Vinyl chloride, vinylidene chloride, vinylidene cyanide, 1-methyl-
1-methoxyethylene, 1.1-dimethoxyethylene,
Ethylene derivatives such as 1,2-dimethoxyethylene, 1,1-dimethoxycarbonylethylene, 1-methyl-1-ditroethylene; N-vinylpyrrole, N-vinylcarbazole, N-vinylindole, N-vinylpyrroli There are vinyl monomers such as N-vinyl compounds such as ten and N-vinylpyrodone. These vinyl monomers exist in polymer compounds with a structure in which unsaturated double bonds are cleaved.
上記の単量体のうち、脂肪族モノカルボン酸のエステル
類および二トリル類が好ましい。Among the above monomers, esters of aliphatic monocarboxylic acids and nitrites are preferred.
これらの感光性組成物の中には、その他必要に応じて、
さらに染料または顔料等の色素、怒脂化剤、可塑剤、界
面活性剤、有機酸、酸無水物、露光により酸を発生し得
る化合物等を添加することができる。Some of these photosensitive compositions may contain other ingredients as necessary.
Furthermore, pigments such as dyes or pigments, fattening agents, plasticizers, surfactants, organic acids, acid anhydrides, compounds capable of generating acids upon exposure to light, etc. can be added.
前記感光性塗布液を塗布するには、一般に公知のロール
コー夕、スライドボッパ一方式コーク、グラビアコータ
、ボエラーコー夕、ワイヤーバーコータ等を用いること
ができる。In order to apply the photosensitive coating liquid, generally known roll coaters, slide bopper one-way coaters, gravure coaters, boiler coaters, wire bar coaters, etc. can be used.
乾燥条件は、初期においては比較的低温に、そして後半
では比較的高温にするのが好ましく、般に初期において
は20〜60゜C、好ましくは30〜40゜Cに約20
〜60秒保持し、後半では70〜110゜C1好ましく
は75〜90゜Cに約20〜180秒保持するのが適当
である。The drying conditions are preferably relatively low temperature in the initial stage and relatively high temperature in the latter half.
It is appropriate to hold the temperature at 70-110°C, preferably 75-90°C, for about 20-180 seconds.
感光性組成物の塗布量は用途によっても異なるが、一般
に固形分として0.5〜3.5g/m2の塗布量が適当
である。Although the coating amount of the photosensitive composition varies depending on the application, a coating amount of 0.5 to 3.5 g/m 2 as solid content is generally appropriate.
ついで、本発明を実施例によって詳し《説明するが、本
発明はこれらの実施例に限定されない。Next, the present invention will be explained in detail with reference to Examples, but the present invention is not limited to these Examples.
実施例l
5%の水酸化ナトリウム水溶液中で、厚さ0.24mm
、幅1030mmのアルミニウム板に脱脂処理を施した
後、0.5モル濃度の塩酸水溶液中で温度:25゜C、
電流密度:60A/dm”、処理時間:30秒間の条件
下で電解エッチング処理を施した。ついで、5%の水酸
化ナトリウム水溶液でデスマット処理を施した後、硫酸
溶液中で陽極酸化処理を施し、その後90゜Cの熱水溶
液に浸漬して封孔処理を施した。Example 1 0.24 mm thick in 5% aqueous sodium hydroxide solution
After degreasing an aluminum plate with a width of 1030 mm, it was heated in a 0.5 molar hydrochloric acid aqueous solution at a temperature of 25°C.
Electrolytic etching treatment was performed under the conditions of current density: 60 A/dm'' and treatment time: 30 seconds.Next, after desmutting treatment was performed with a 5% sodium hydroxide aqueous solution, anodization treatment was performed in a sulfuric acid solution. After that, it was immersed in a hot aqueous solution at 90°C for pore sealing treatment.
ついで、このように処理したアルミニウム板支持体に下
記の組成を有する感光性塗布液をロールコータを用いて
塗布スピード1 0 m /minで塗布し、初期8m
を35゜C,後半25mを85”C,風量50r+{/
minで乾燥して、本発明の惑光性平版印刷版試料1を
得た。Next, a photosensitive coating solution having the following composition was applied to the aluminum plate support treated in this way using a roll coater at a coating speed of 10 m/min.
35°C, second half 25m 85”C, air volume 50r+{/
The plate was dried at 10 min to obtain a photolactic lithographic printing plate sample 1 of the present invention.
感光性塗布液の組成
ピロガロール・アセトン樹脂とナフトキノンー(1.2
)一ジアジド−5−スルボン酸クロリl・とのエステル
化合物(OI1基の縮合率30モル%重量平均分子量2
500) 2.3重量部フェノールおよび
m−+p一混合クレゾール(モル比48:32:20)
とホルムアルデヒドとの共重縮合樹脂(重量平均分子量
10000 ) 6.7重量部バラオクチルフェノ
ールとボルマリンとから合成されたノボラソク樹脂(重
量平均分子5f2000 )とナフトキノン(L2 )
一ジアジド− 5−スルポン酸クロリドとのエステル化
合物(OH,lの縮合率50モル%)0.9重量部
2−トリクロルメヂルー5−(β−ヘンゾフリルビニル
)−1.3.4−オキザジアヅール0.05重量部
ビクトリアピュアブルーBOH 0.07重量部ジエ
チレングリコールジメチルエーテル27重量部
メチルエチルケトン iBmit部乾燥後の
塗布重量は約22mg/dm2であった。Composition of photosensitive coating liquid Pyrogallol acetone resin and naphthoquinone (1.2
) monodiazide-5-sulfonic acid chloryl ester compound (condensation rate of 1 OI group 30 mol% weight average molecular weight 2
500) 2.3 parts by weight of phenol and m-+p-mixed cresol (molar ratio 48:32:20)
and formaldehyde (weight average molecular weight 10,000) 6.7 parts by weight Novorasoc resin (weight average molecular 5f2,000) synthesized from roseoctylphenol and bomarin and naphthoquinone (L2)
Ester compound with monodiazide-5-sulfonic acid chloride (condensation rate of OH, 1: 50 mol%) 0.9 parts by weight 2-Trichloromedyru-5-(β-henzofuryl vinyl)-1.3.4- Oxadiazur: 0.05 parts by weight Victoria Pure Blue BOH: 0.07 parts by weight Diethylene glycol dimethyl ether: 27 parts by weight Methyl ethyl ketone iBmit The coating weight after drying was about 22 mg/dm2.
ついで、上記塗布液中の有m溶剤を下記の第1表に示さ
れる溶剤に替えるとともに、塗布された塗布液の前記乾
燥条件を下記の第2表に示される条件に変更した点を除
き、上記本発明試料1と同様にして惑光性印刷版の本発
明試料2〜8および比較試料1〜4を作製し、これらの
試料の感光層中に残存している溶剤の量を下記の方法で
測定して、その結果を第2表に示した。Next, the solvent in the coating solution was changed to the solvent shown in Table 1 below, and the drying conditions of the applied coating solution were changed to the conditions shown in Table 2 below. Inventive samples 2 to 8 and comparative samples 1 to 4 of photolactic printing plates were prepared in the same manner as inventive sample 1 above, and the amount of solvent remaining in the photosensitive layer of these samples was determined by the following method. The results are shown in Table 2.
試料寸法 ・・・・・・ 10cmX10cm感光層を
溶かず溶媒・・・メタノール=10mlガスクロ測定方
法
装 置・・・063型ガスクロマトグラフィー(日立製
作所)
カラム・・・PEG−20M
温 度・・・インジエクション・・・・・・200゜C
カラム ・・・・・・・・・・・・ 150゜C検出
器 ・・・・・・・・・・・・ 200 ”C検 出
・・・水素炎
キャリャーガス・・・ヘリウム
定量方法・・・別途作成した検量線より算出(ピーク面
積より)
第 1 表
なお、前記塗布液の塗膜において生ずる塗布ムラ(マラ
ンゴニー)および縦スジの状態を観察して、それらの塗
布液の塗布性を次の3段階に分けて評価し、その結果を
第3表に示した。Sample size: 10cm x 10cm without dissolving the photosensitive layer Solvent: Methanol = 10ml Gas chromatography method Equipment: 063 type gas chromatography (Hitachi) Column: PEG-20M Temperature: Injection...200°C
Column ・・・・・・・・・・・・ 150°C Detector ・・・・・・・・・・・・ 200”C detection...Hydrogen flame carrier gas...Helium quantitative method... Calculated from a separately prepared calibration curve (based on peak area) Table 1. The conditions of coating unevenness (marangoni) and vertical streaks that occur in the coating film of the above coating solution were observed, and the coating properties of those coating solutions were evaluated as follows. The evaluation was divided into three stages and the results are shown in Table 3.
A : B好(マランゴニー、縦スジなし)B:やや劣
るが、実用可
C:劣り、実用不可
つぎに、前記各試料を下記の露光条件下で露光し、生成
した焼き出し画像の鮮明さを目視で評価して、その結果
を次の4段階に分けて第3表に示した。A: B Good (Marangoni, no vertical streaks) B: Slightly inferior, but practical C: Poor, not practical Next, each of the above samples was exposed under the following exposure conditions, and the sharpness of the printed image produced was Visual evaluation was performed, and the results were divided into the following four levels and shown in Table 3.
◎:鮮明
O:やや鮮明
△:やや不鮮明
×:不鮮明
露光条件
露光機:アイドルフィン2000 (2Knメタルハラ
イドランプ)13mW/c福
露光時間:92秒
フィルム原稿:コダックステップタブレットNo.2網
点画像および絽点チャート
ついで、上記のように露光した後の各試料を第3表に示
されるステップ段数の下に下記の現像条件1で現像した
後、引き続き下記の現像条件2で現像し、それによって
得られた平版印刷版を使用して下記の印刷条件の下に印
刷して、その印刷後に生ずる各印刷版上の汚れの状態を
観察し、その結果を下記の4段階に分けて第3表に示し
た。◎: Clear O: Slightly clear △: Slightly unclear ×: Blurry Exposure conditions Exposure machine: Idolfin 2000 (2Kn metal halide lamp) 13mW/c exposure time: 92 seconds Film Original: Kodak Step Tablet No. 2 Halftone dot image and dot chart Next, each sample exposed as above was developed under the following development condition 1 under the number of steps shown in Table 3, and then developed under the following development condition 2. Using the resulting lithographic printing plates, we printed under the following printing conditions, observed the state of stains on each printing plate after printing, and divided the results into the following four stages. The results are shown in Table 3.
◎;汚れ全く無
0;汚れ殆ど無
△:汚れやや有り
×:汚れかなり有り
現像条件1
現像液:SDR−1(コニカ(株)製)の6倍希釈液
現像温度;27゜C
現像時間:20秒
自動現像機:PSQ−910(コニカ(株)製)現像条
件2
現像液:全面露光した感光性印刷版を上記現像条件1で
用いた現像液で繰り返し現像することによって疲労させ
た(母液12当たり3 n?現像させる)現像液
現像温度;27゜C
現像時間:20秒
自動現像m: PSQ−9 1 0 (コニカ(株)製
)印刷条件
印刷機;ハイデルGTO
印刷インキ:東洋インキ(株)製「マークV」印刷用紙
:コーl・紙
湿し水:真水
印刷速度:7ooo枚/時
プランケシl・:金陽ブラシ
(以 下 余 白)
第3表に示される結果から、本発明試料1〜8は、いず
れも比較試料1〜4と較べて、全般的に鮮明な焼き出し
画像を生ずるとともに、塗布性が改善された感光性被膜
(感光層)を有し、さらに版面に汚れを生じ難い印刷版
を形成できることがわかる。◎: No stains at all; Almost no stains △: Some stains ×: Considerable stains Development conditions 1 Developer: 6 times diluted solution of SDR-1 (manufactured by Konica Corporation) Development temperature: 27°C Development time: 20-second automatic developing machine: PSQ-910 (manufactured by Konica Corporation) Development conditions 2 Developer: A photosensitive printing plate exposed on the entire surface was fatigued by repeatedly developing with the developer used in development condition 1 above (mother solution Developing temperature: 27°C Development time: 20 seconds Automatic development m: PSQ-9 10 (manufactured by Konica Corporation) Printing conditions Printing machine: Heidel GTO Printing ink: Toyo Ink ( Co., Ltd. "Mark V" Printing paper: Coal, Paper Dampening water: Fresh water Printing speed: 700 sheets/hour Plankécil: Kinyo brush (hereinafter referred to as margin) From the results shown in Table 3, the present invention Samples 1 to 8 all produce clearer printed images overall than Comparative Samples 1 to 4, have photosensitive coatings (photosensitive layers) with improved coating properties, and are free from stains on the plate surface. It can be seen that it is possible to form a printing plate that is less likely to cause.
〔発明の効果]
以上述べた説明から明らかなように、本発明Gこよると
、現像性に優れるとともに鮮明な焼き出し画像を形成す
ることができ、さらに安全な作業環境の下で製造、かつ
取り扱うことができるうえに、塗布ムラや縦スジがなく
、しかも版面に汚れを生じ難い平版印刷版を形成できる
ポジ型感光性平版印刷版が提供される。[Effects of the Invention] As is clear from the above explanation, the present invention G has excellent developability and can form a clear printout image, and can be manufactured in a safe working environment. Provided is a positive photosensitive lithographic printing plate that can be handled, has no coating unevenness or vertical streaks, and can form a lithographic printing plate that does not easily stain the plate surface.
出願人 コ ニ カ 株 式 会 社 代理人 中 島 幹 雄 外1名2′2Applicant Co., Ltd. Agent: Miki Nakajima, male and 1 other person 2'2
Claims (1)
グリコールのエーテルおよびエステルのいずれか一方ま
たは双方を0.01〜10重量%含有するポジ型感光性
平版印刷版。A positive photosensitive lithographic printing plate containing 0.01 to 10% by weight of either or both of diethylene glycol ether and ester in the photosensitive layer, based on the weight of the photosensitive layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1113178A JPH02293750A (en) | 1989-05-05 | 1989-05-05 | Positive type photosensitive planographic printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1113178A JPH02293750A (en) | 1989-05-05 | 1989-05-05 | Positive type photosensitive planographic printing plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02293750A true JPH02293750A (en) | 1990-12-04 |
Family
ID=14605533
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1113178A Pending JPH02293750A (en) | 1989-05-05 | 1989-05-05 | Positive type photosensitive planographic printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02293750A (en) |
-
1989
- 1989-05-05 JP JP1113178A patent/JPH02293750A/en active Pending
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