JPH02292362A - Resin composition and electronic component - Google Patents
Resin composition and electronic componentInfo
- Publication number
- JPH02292362A JPH02292362A JP1112187A JP11218789A JPH02292362A JP H02292362 A JPH02292362 A JP H02292362A JP 1112187 A JP1112187 A JP 1112187A JP 11218789 A JP11218789 A JP 11218789A JP H02292362 A JPH02292362 A JP H02292362A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- resin composition
- silica
- substance
- length
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011342 resin composition Substances 0.000 title claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000011521 glass Substances 0.000 claims abstract description 21
- 239000000126 substance Substances 0.000 claims abstract description 15
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 14
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims abstract description 7
- RJDOZRNNYVAULJ-UHFFFAOYSA-L [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] Chemical compound [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] RJDOZRNNYVAULJ-UHFFFAOYSA-L 0.000 claims abstract description 6
- 239000003365 glass fiber Substances 0.000 claims abstract description 6
- 239000000463 material Substances 0.000 claims abstract description 5
- 239000000155 melt Substances 0.000 claims abstract description 5
- 239000005022 packaging material Substances 0.000 claims abstract description 5
- 229920000412 polyarylene Polymers 0.000 claims abstract description 5
- 239000000843 powder Substances 0.000 claims abstract description 4
- 239000000203 mixture Substances 0.000 claims description 24
- 239000012779 reinforcing material Substances 0.000 claims description 8
- 239000011256 inorganic filler Substances 0.000 claims description 6
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 5
- 239000011324 bead Substances 0.000 claims description 5
- 229910000077 silane Inorganic materials 0.000 claims description 5
- 239000010456 wollastonite Substances 0.000 claims description 4
- 229910052882 wollastonite Inorganic materials 0.000 claims description 4
- 239000004734 Polyphenylene sulfide Substances 0.000 abstract description 7
- 229910052751 metal Inorganic materials 0.000 abstract description 7
- 239000002184 metal Substances 0.000 abstract description 7
- 229920000069 polyphenylene sulfide Polymers 0.000 abstract description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 4
- 229920005989 resin Polymers 0.000 abstract description 4
- 239000011347 resin Substances 0.000 abstract description 4
- 239000000945 filler Substances 0.000 abstract description 2
- XWUCFAJNVTZRLE-UHFFFAOYSA-N 7-thiabicyclo[2.2.1]hepta-1,3,5-triene Chemical group C1=C(S2)C=CC2=C1 XWUCFAJNVTZRLE-UHFFFAOYSA-N 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 239000000835 fiber Substances 0.000 description 19
- 239000002245 particle Substances 0.000 description 10
- -1 alkali metal salt Chemical class 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 238000007334 copolymerization reaction Methods 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- 239000010459 dolomite Substances 0.000 description 3
- 229910000514 dolomite Inorganic materials 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- 150000004665 fatty acids Chemical class 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 239000003566 sealing material Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 150000001491 aromatic compounds Chemical class 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 150000001993 dienes Chemical class 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 150000004679 hydroxides Chemical class 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 229910000464 lead oxide Inorganic materials 0.000 description 2
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 2
- 239000001095 magnesium carbonate Substances 0.000 description 2
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 2
- 239000010445 mica Substances 0.000 description 2
- 229910052618 mica group Inorganic materials 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 239000008262 pumice Substances 0.000 description 2
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 229910052979 sodium sulfide Inorganic materials 0.000 description 2
- GRVFOGOEDUUMBP-UHFFFAOYSA-N sodium sulfide (anhydrous) Chemical compound [Na+].[Na+].[S-2] GRVFOGOEDUUMBP-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 description 1
- VZXOZSQDJJNBRC-UHFFFAOYSA-N 4-chlorobenzenethiol Chemical compound SC1=CC=C(Cl)C=C1 VZXOZSQDJJNBRC-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- VCNTUJWBXWAWEJ-UHFFFAOYSA-J aluminum;sodium;dicarbonate Chemical compound [Na+].[Al+3].[O-]C([O-])=O.[O-]C([O-])=O VCNTUJWBXWAWEJ-UHFFFAOYSA-J 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- AQTIRDJOWSATJB-UHFFFAOYSA-K antimonic acid Chemical compound O[Sb](O)(O)=O AQTIRDJOWSATJB-UHFFFAOYSA-K 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 229920006231 aramid fiber Polymers 0.000 description 1
- 150000008430 aromatic amides Chemical class 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- QBLDFAIABQKINO-UHFFFAOYSA-N barium borate Chemical compound [Ba+2].[O-]B=O.[O-]B=O QBLDFAIABQKINO-UHFFFAOYSA-N 0.000 description 1
- CJDPJFRMHVXWPT-UHFFFAOYSA-N barium sulfide Chemical compound [S-2].[Ba+2] CJDPJFRMHVXWPT-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- JGIATAMCQXIDNZ-UHFFFAOYSA-N calcium sulfide Chemical compound [Ca]=S JGIATAMCQXIDNZ-UHFFFAOYSA-N 0.000 description 1
- GBAOBIBJACZTNA-UHFFFAOYSA-L calcium sulfite Chemical compound [Ca+2].[O-]S([O-])=O GBAOBIBJACZTNA-UHFFFAOYSA-L 0.000 description 1
- 235000010261 calcium sulphite Nutrition 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910001647 dawsonite Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- PXJJSXABGXMUSU-UHFFFAOYSA-N disulfur dichloride Chemical compound ClSSCl PXJJSXABGXMUSU-UHFFFAOYSA-N 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229920001973 fluoroelastomer Polymers 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- YOBAEOGBNPPUQV-UHFFFAOYSA-N iron;trihydrate Chemical compound O.O.O.[Fe].[Fe] YOBAEOGBNPPUQV-UHFFFAOYSA-N 0.000 description 1
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 1
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 1
- 239000011968 lewis acid catalyst Substances 0.000 description 1
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- CPTNXTSDQJQEFA-ZKOWQLKRSA-N mastoparan-A Chemical compound C1=CC=C2C(C[C@H](NC(=O)[C@H](CCCCN)NC(=O)[C@@H](N)[C@@H](C)CC)C(=O)N[C@@H](CCCCN)C(=O)N[C@@H](C)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CC(C)C)C(=O)N[C@@H](CC(O)=O)C(=O)N[C@@H](C)C(=O)N[C@@H](C(C)C)C(=O)N[C@@H](CCCCN)C(=O)N[C@@H](CCCCN)C(=O)N[C@@H](C(C)C)C(=O)N[C@@H]([C@@H](C)CC)C(N)=O)=CNC2=C1 CPTNXTSDQJQEFA-ZKOWQLKRSA-N 0.000 description 1
- NSFBOCKFBVQQKB-CQWNSWRRSA-N mastoparan-B Chemical compound C1=CC=C2C(C[C@H](NC(=O)[C@H](CO)NC(=O)[C@H](C(C)C)NC(=O)[C@@H](NC(=O)[C@H](CO)NC(=O)[C@H](CCCCN)NC(=O)[C@H](CC(C)C)NC(=O)[C@H](CCCCN)NC(=O)[C@@H](N)CC(C)C)[C@@H](C)CC)C(=O)N[C@@H](C)C(=O)N[C@@H](CCCCN)C(=O)N[C@@H](CCCCN)C(=O)N[C@@H](C(C)C)C(=O)N[C@@H](CC(C)C)C(N)=O)=CNC2=C1 NSFBOCKFBVQQKB-CQWNSWRRSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000002557 mineral fiber Substances 0.000 description 1
- 239000012764 mineral filler Substances 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- IHYNKGRWCDKNEG-UHFFFAOYSA-N n-(4-bromophenyl)-2,6-dihydroxybenzamide Chemical compound OC1=CC=CC(O)=C1C(=O)NC1=CC=C(Br)C=C1 IHYNKGRWCDKNEG-UHFFFAOYSA-N 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- AJCDFVKYMIUXCR-UHFFFAOYSA-N oxobarium;oxo(oxoferriooxy)iron Chemical compound [Ba]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O AJCDFVKYMIUXCR-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 238000005453 pelletization Methods 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- CTYRPMDGLDAWRQ-UHFFFAOYSA-N phenyl hydrogen sulfate Chemical compound OS(=O)(=O)OC1=CC=CC=C1 CTYRPMDGLDAWRQ-UHFFFAOYSA-N 0.000 description 1
- 229910052628 phlogopite Inorganic materials 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- BPILDHPJSYVNAF-UHFFFAOYSA-M sodium;diiodomethanesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C(I)I BPILDHPJSYVNAF-UHFFFAOYSA-M 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- ZEGFMFQPWDMMEP-UHFFFAOYSA-N strontium;sulfide Chemical compound [S-2].[Sr+2] ZEGFMFQPWDMMEP-UHFFFAOYSA-N 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- 150000004763 sulfides Chemical class 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- VLCLHFYFMCKBRP-UHFFFAOYSA-N tricalcium;diborate Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]B([O-])[O-].[O-]B([O-])[O-] VLCLHFYFMCKBRP-UHFFFAOYSA-N 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Insulating Of Coils (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Details Of Resistors (AREA)
- Connector Housings Or Holding Contact Members (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、ポリアリーレンスルフィドとフレーク状物質
とからなり、成形品中のボイドが極めて少なく金属やシ
リコンチップ等との密着性や耐湿性に優れた樹脂組成物
に関するものであり、また該組成物をパッケージ材料と
した優れた信軌性を有する電子部品に関する。Detailed Description of the Invention (Field of Industrial Application) The present invention is made of polyarylene sulfide and a flake-like substance, and has extremely low voids in the molded product, which has excellent adhesion to metals, silicon chips, etc., and moisture resistance. The present invention relates to an excellent resin composition, and also to an electronic component having excellent reliability using the composition as a packaging material.
(従来の技術)
ポリアリーレンスルフィド樹胎(以後PASと記す)は
、耐薬品性、耐熱性、難燃性、電気的特性に優れるエン
ジニアリングプラスチックスとして知られ、各分野で広
く利用されている。一般にPASで成形された厚肉成形
品ではボイドが発生しやすく、しかも特に近年、精密部
品や電子部品の封止材への適用に際し樹脂材料の低粘度
化への要求が高まり、ますますボイドが発生しやすい状
況となってきている。更に、電子部品の封止材として使
用する場合、通常、低圧で成形されるため、ボイドはさ
らに発生しやすい状況にあり、発生したボイドは強度の
低下、リードや封止素子との密着性が悪化することによ
る耐湿性の低下、収縮が不均一に生じることによる封止
素子へのダメージの増加等を引き起し、電子部品の信顛
性を著し《低下させる原因となっていた。(Prior Art) Polyarylene sulfide resin (hereinafter referred to as PAS) is known as an engineering plastic with excellent chemical resistance, heat resistance, flame retardance, and electrical properties, and is widely used in various fields. In general, thick-walled molded products made from PAS are prone to voids, and in recent years, there has been an increasing demand for lower viscosity resin materials when applied to sealing materials for precision parts and electronic parts. This situation is becoming more likely to occur. Furthermore, when used as a encapsulating material for electronic components, voids are more likely to occur because they are usually molded at low pressure, and the voids that occur can cause a decrease in strength and poor adhesion with leads and encapsulation elements. As a result, moisture resistance deteriorates, and shrinkage occurs unevenly, causing increased damage to the sealing element, resulting in a significant decrease in the reliability of electronic components.
一般に、PASは延性に乏しく脆弱であるため、ガラス
繊維等の繊維状強化材を配合することにより、強度、剛
性、靭性等の物性改善を図っている。In general, PAS has poor ductility and is brittle, so improvements in physical properties such as strength, rigidity, and toughness are attempted by incorporating fibrous reinforcing materials such as glass fiber.
しかし、PASに繊維長が比較的長い繊維状強化材を多
量に配合した場合これらの物性改善が図れるだけでなく
、ボイドが減少することを認められるが、このような組
成物は粘度が著しく増加したり成形品の表面平滑性が損
われたりして、封止材として要求される低粘度、リード
や素子との密着性が良好であること等の性能を持ちえな
いことが判明した。However, when a large amount of fibrous reinforcing material with a relatively long fiber length is blended into PAS, these physical properties can be improved and voids can be reduced, but the viscosity of such a composition increases significantly. It was found that the molded product's surface smoothness was impaired, and it could not have the properties required for a sealing material, such as low viscosity and good adhesion to leads and elements.
(発明が解決しようとする課題)
本発明は、成形品中のボイドが極めて少なく、金属やシ
リコーンチップ等との密着性や耐湿性に優れ、かつ溶融
粘度が低いPASの成形用材料およびそれでパッケージ
された高品質の電子部品を捷供する。(Problems to be Solved by the Invention) The present invention provides a PAS molding material that has extremely few voids in molded products, excellent adhesion to metals, silicone chips, etc. and moisture resistance, and low melt viscosity, and a package using the same. We provide high quality electronic components.
(課題を解決するための手段)
本発明者らはPASと特定のフレーク状物質とを必須成
分とし、必要に応じて無機質充てん材や、限定された長
さの繊維状強化材を配合した組成物が低粘度であるにも
かかわらず成形品中のボイドが極めて少なく、かつ金属
やシリコンチップ等との密着性や耐湿性に優れ、該組成
物で封止された電子部品の信頼性も優れることを見出し
本発明に至った。(Means for Solving the Problems) The present inventors have developed a composition in which PAS and a specific flake-like substance are essential components, and if necessary, an inorganic filler and a fibrous reinforcing material of a limited length are blended. Despite the low viscosity of the composition, there are very few voids in the molded product, and it has excellent adhesion to metals, silicon chips, etc. and moisture resistance, and the reliability of electronic parts sealed with this composition is also excellent. This discovery led to the present invention.
すなわち、本発明は(A) P A Sおよび/又は(
B)ガラスフレーク、シリカフレーク、合成マイ力とか
ら選ばれる1種又は2種以上のフレーク状物質とを含有
し、該フレーク状物質が長さ/厚さの比(以下、アスペ
クト比と称す)3以上のものを5重量%以上(組成物中
)、及び長さ300μm以上のものを20重量%以下(
&fl成物中)含むものであり、かつ350゜C(剪断
速度1 0 ’see−’)における組成物中の溶融粘
度が3000ポイズ以下である樹脂組成物に関する。That is, the present invention provides (A) P A S and/or (
B) Contains one or more flake-like substances selected from glass flakes, silica flakes, and synthetic fibers, and the flake-like substances have a length/thickness ratio (hereinafter referred to as aspect ratio). 5% by weight or more (in the composition) of 3 or more, and 20% by weight or less of length 300 μm or more (in the composition)
&fl composition) and has a melt viscosity of 3000 poise or less at 350°C (shear rate 10'see-').
本発明で用いるPASとしては、未架橋又は1部架橋し
たPAS及びその混合物又は変性品であってBg p
A SのメルトフローレートはASTMD1238−7
4 (360゜C、5 kg荷重)で2〜60000
g / 1 0分を有しており、特に一般式XφΣS−
で示される構成単位を70モル%以上含むポリフエニレ
ンサルファイド(以下PPSと記す)がすぐれた特性の
組成物をもたらすので好ましい。PPSの重合方法とし
ては、P−ジクロルベンゼンを硫黄と炭酸ソーダの存在
下で重合させる方法、極性溶媒中で硫化ナトリウムある
いは水硫化ナトリウムと水酸化ナトリウム又は硫化水素
と水酸化ナトリウムの存在下で重合させる方法、p−ク
ロルチオフェノールの自己縮合などがあげられるが、N
−メチルピロリドン、ジメチルアセトアミドなどのアミ
ド系溶媒やスルホラン等のスルホン系溶媒中で硫化ナト
リウムとp−ジクロルベンゼンを反応させる方法が適当
である。この際に重合度を調節するためにカルボン酸や
スルホン酸のアルカリ金属塩を添加したり、水酸化アル
カリを添加することは好ましい方法である。共重合成分
として30モル%未満であればメタ結合K
フェニル、アルコキシ、カルボン酸またはカルボン酸の
金属塩基を示す)、3官能フエニルスルフ上を、ポリマ
ーの結晶性に大きく影響しない範囲でブロック共重合体
又はランダム共重合体として含有していてもかまわない
が、好ましくは共重合成分は10モル%以下がよい。特
に3官能性以上のフェニル、ビフェニル、ナフチルスル
フイド結合などを共重合に選ぶ場合は3モル%以下、さ
らに好ましくは1モル%以下がよい。The PAS used in the present invention includes uncrosslinked or partially crosslinked PAS, mixtures or modified products thereof, and Bg p
The melt flow rate of AS is ASTM D1238-7
4 (360°C, 5 kg load) 2 to 60,000
g/10 min, especially the general formula XφΣS-
Polyphenylene sulfide (hereinafter referred to as PPS) containing 70 mol % or more of the structural unit represented by is preferable because it provides a composition with excellent properties. PPS polymerization methods include polymerizing P-dichlorobenzene in the presence of sulfur and sodium carbonate, and polymerizing PPS in the presence of sodium sulfide, sodium bisulfide and sodium hydroxide, or hydrogen sulfide and sodium hydroxide in a polar solvent. Polymerization methods include self-condensation of p-chlorothiophenol, but N
- A method in which sodium sulfide and p-dichlorobenzene are reacted in an amide solvent such as methylpyrrolidone or dimethylacetamide or a sulfone solvent such as sulfolane is suitable. At this time, in order to adjust the degree of polymerization, it is a preferable method to add an alkali metal salt of carboxylic acid or sulfonic acid, or to add alkali hydroxide. If it is less than 30 mol% as a copolymerization component, the meta bond K (indicates phenyl, alkoxy, carboxylic acid, or a metal base of carboxylic acid), trifunctional phenyl sulfate is used as a block copolymer within a range that does not significantly affect the crystallinity of the polymer. Alternatively, it may be contained as a random copolymer, but preferably the copolymerization component is 10 mol% or less. In particular, when trifunctional or higher functional phenyl, biphenyl, naphthyl sulfide bonds, etc. are selected for copolymerization, the amount is preferably 3 mol% or less, more preferably 1 mol% or less.
かかるPPSは一般的な製造法、例えば(1)ハロゲン
置換芳香族化合物と硫化アルカリとの反応(米国特許第
2513188号明細書、特公昭44−27671号お
よび特公昭45 − 3368号参照)(2)チオフェ
ノール類のアルカリ触媒又は銅塩等の共存下における縮
合反応(米国特許第3274165号、英国特許第11
60660号参照)(3)芳香族化合物を塩化硫黄との
ルイス酸触媒共存下に於ける縮合反応(特公昭46−
27255号、ベルギー特許第29437号参照)等に
より合成されるものであり、目的に応じ任意に選択し得
る。Such PPS can be produced by common manufacturing methods, such as (1) reaction of a halogen-substituted aromatic compound with an alkali sulfide (see U.S. Pat. No. 2,513,188, Japanese Patent Publication No. 44-27671 and Japanese Patent Publication No. 45-3368) (2) ) Condensation reaction of thiophenols in the presence of an alkali catalyst or copper salt (US Patent No. 3,274,165, British Patent No. 11)
60660) (3) Condensation reaction of aromatic compounds with sulfur chloride in the presence of a Lewis acid catalyst
No. 27255, Belgian Patent No. 29437), etc., and can be arbitrarily selected depending on the purpose.
本発明で用いるガラスフレーク及びシリカフレークはそ
れぞれ鱗片状のガラス及び溶融シリカであって、ガラス
は特にEガラス製であることが好ましい。The glass flakes and silica flakes used in the present invention are scaly glass and fused silica, respectively, and the glass is particularly preferably made of E glass.
本発明で用いる合成マイ力は、天然マイ力の結晶水(O
H)をフッ素(F)で置き換えた構造のもので、所定の
配合原料を溶融して合成することが出来、具体的には一
般式×。.5〜,.。■2〜3Z401。F2で表わさ
れるものであり、例えば、次ものに限定されるもノテは
ないが、KMgi(A f SizO+o)Ft+KM
g,.%(Si.0,。)h, KMgzLi(Sin
O+。)F8,KMg3(Aj2GeiO+o)Fz+
KMgz.s(Ge401o)Fz+KシJgzシ:
+Li”z3(S1401。)F2などの「非膨潤性合
成マイカ」が利用される。しかし、水分を吸収して膨れ
あがる、いわゆる「永和膨潤性合成マイカ」は好ましく
ない。また、天然マイ力を使用すると、耐湿性が低下し
電子部品の信幀性がおちるので好ましくない。The synthetic Mairikyo used in the present invention is crystallized water (O
It has a structure in which H) is replaced with fluorine (F), and can be synthesized by melting predetermined blended raw materials, and specifically has the general formula ×. .. 5~,. . ■2~3Z401. For example, although not limited to the following, KMgi(A f SizO+o)Ft+KM
g,. %(Si.0,.)h, KMgzLi(Sin
O+. )F8,KMg3(Aj2GeiO+o)Fz+
KMgz. s(Ge401o)Fz+KshiJgzshi:
“Non-swellable synthetic mica” such as +Li”z3 (S1401.)F2 is used. However, so-called "Eiwa swelling synthetic mica", which swells by absorbing water, is not preferred. Furthermore, the use of natural minerals is not preferable because it reduces moisture resistance and reduces the reliability of electronic components.
本発明で用いられるフレーク状物質は長さ/厚さ(アス
ペクト比)3以上のものが5重量%以上、かつ長さ30
0μm以上のものが20重量%以下含有するものである
ことが望ましい。アスペクト比3以上のものが5重量%
以上でないとボイド減少の効果が少なく、又、長さ30
0μm以上の大きなものが多いと、ボイド減少には効果
があるが、粒度が高くなったり、リード等との界面との
平滑性が失われ密着性が悪くなったりして、好ましくな
い。尚、かかるフレーク状物質は厚さ30μm以下、の
ものがより好ましい。又、アスペクト比の長さはより長
い方で、そのものが楕円状であれば長径に相当する。The flaky substance used in the present invention has a length/thickness (aspect ratio) of 3 or more in an amount of 5% by weight or more, and a length of 30% by weight.
It is desirable that the content of particles with a diameter of 0 μm or more is 20% by weight or less. 5% by weight of items with an aspect ratio of 3 or more
Otherwise, the effect of reducing voids will be small, and the length is 30 mm.
If there are many particles larger than 0 μm, this is effective in reducing voids, but it is not preferable because the particle size becomes high and the smoothness with the interface with the lead etc. is lost, resulting in poor adhesion. In addition, it is more preferable that the flaky substance has a thickness of 30 μm or less. Further, the length of the aspect ratio is the longer one, and if it is elliptical, it corresponds to the major axis.
本発明の組成物は無機質充てん材を含むことが出来る。Compositions of the invention can include mineral fillers.
ここでいう無機質充てん材は好ましくはパウダー状(粉
砕物)、ビーズ状、バルーン状の形状を有し、該充填材
の具体例としては以下のものが挙げられ、単独又は複合
して用いられるが必ずしもこれらに制限されるものでは
ない。The inorganic filler mentioned here preferably has a powder-like (pulverized material), bead-like, or balloon-like shape, and specific examples of the filler include the following, which may be used alone or in combination. It is not necessarily limited to these.
例えばシリカ、ケイ藻土、アルミナ、酸化チタン、酸化
鉄、酸化亜鉛、酸化マグネシウム、アンチモン酸、酸化
アンチモン、バリウムフェライト、ストロンチウムフエ
ライト、酸化ベリリウム、軽石、軽石バルーン、酸化鉛
、酸化ビスマス、酸化ジルコニウム、二酸化マンガン、
二酸化スズ、酸化バリウム、三二酸化鉄などの酸化物、
水酸化アルミニウム、水酸化マグネシウム、塩基性炭酸
マグネシウムなどの水酸化物、炭素カルシウム、炭酸マ
グネシウム、ドロマイト、ドーソナイトなどの炭酸塩、
硫酸カルシウム、硫酸バリウム、硫酸アンモニウム、亜
硫酸カルシウムなどの硫酸又は亜硫酸塩、硫化亜鉛、硫
化カルシウム、硫化ストロンチウム、硫化力ドミニウム
、硫化バリウム等の硫化物、タルク、クレー、マイ力、
ガラスバルーン、ガラスビーズ、ケイ酸カルシウム、モ
ンモリロナイト、ベントナイトなどのケイ酸塩、その他
、カーボンブラック、グラフ7イト、硫化モリブデン、
ボロン、炭化ケイ素、チタン酸ジルコン酸鉛、ホウ酸亜
鉛、メタホウ酸バリウム、ホウ酸カルシウム、ホウ酸ナ
トリウムなどをあげることができるが、好ましくは非品
質又は結晶質のシリ力製又はガラス製のパウダー(粉砕
品)、ビーズ、バルーンであり、特に好ましくは非晶質
シリカ製又はEガラス製、高ケイ酸塩ガラス製である。For example, silica, diatomaceous earth, alumina, titanium oxide, iron oxide, zinc oxide, magnesium oxide, antimonic acid, antimony oxide, barium ferrite, strontium ferrite, beryllium oxide, pumice, pumice balloon, lead oxide, bismuth oxide, zirconium oxide, manganese dioxide,
Oxides such as tin dioxide, barium oxide, iron sesquioxide,
Hydroxides such as aluminum hydroxide, magnesium hydroxide, and basic magnesium carbonate; carbonates such as calcium carbonate, magnesium carbonate, dolomite, and dawsonite;
Sulfuric acid or sulfites such as calcium sulfate, barium sulfate, ammonium sulfate, calcium sulfite, sulfides such as zinc sulfide, calcium sulfide, strontium sulfide, dominium sulfide, barium sulfide, talc, clay, sulfur,
Glass balloons, glass beads, calcium silicate, montmorillonite, bentonite and other silicates, carbon black, graphite, molybdenum sulfide,
Examples include boron, silicon carbide, lead zirconate titanate, zinc borate, barium metaborate, calcium borate, sodium borate, etc., but preferably non-quality or crystalline silicate or glass powder. (pulverized products), beads, and balloons, particularly preferably those made of amorphous silica, E glass, or high silicate glass.
本発明の組成物にはさらに繊維状強化材を含むことがで
きるが、組成物中にアスペクト比50以上のものは20
重量%以下、好ましくは15重量%以下であることが要
求される。繊維長の長いものが多量に存在すれば、ボイ
ドは減少するのであるが、粘度の増加やリードとの密着
性の低下がおこり好ましくない。繊維強化材を例示すれ
ば、ガラス繊維、ウォラストナイト、チタン酸カリウム
繊維、アラミド繊維、シリカ繊維、アルミナ繊維、シリ
カ・アルミナ繊維、ジルコニア繊維、窒化ホウ素繊維、
窒化ケイ素繊維、ホウ素繊維、石コウ繊維、ポリエステ
ル繊維、ポリエチレン繊維、ポリアクリル繊維、フッ素
繊維、フェノール繊維、加工鉱物繊維等をあげられるが
、特にガラス繊維、ウォラストナイト、シリカ・アルミ
ナ繊維が好ましい。The composition of the present invention may further contain a fibrous reinforcing material, but if the composition has an aspect ratio of 50 or more,
It is required that the amount is not more than 15% by weight, preferably not more than 15% by weight. If a large amount of long fibers are present, the number of voids will be reduced, but this is not preferable because it will increase the viscosity and reduce the adhesion to the lead. Examples of fiber reinforcing materials include glass fiber, wollastonite, potassium titanate fiber, aramid fiber, silica fiber, alumina fiber, silica/alumina fiber, zirconia fiber, boron nitride fiber,
Examples include silicon nitride fibers, boron fibers, gypsum fibers, polyester fibers, polyethylene fibers, polyacrylic fibers, fluorine fibers, phenol fibers, processed mineral fibers, and glass fibers, wollastonite, and silica/alumina fibers are particularly preferred. .
本発明では、耐湿性の向上や強度物性の向上を目的とし
て有機シラン、通常シランカップリング剤と称されるも
のを添加することが好ましく、ビニルシラン、アクリル
シラン、アミノシラン、エポキシシラン、メルカプトシ
ラン、ハロシランなどが挙げられる。該シランカップリ
ング剤の添加量は組成物中0.01〜5重量%が適当で
ある。さらに必要に応じて、チタネート系、ジルコネー
ト系、ジルコアルミネート系、アルミニウムキレート化
合物系のカップリング剤も加えることが出来る。In the present invention, it is preferable to add an organic silane, usually called a silane coupling agent, for the purpose of improving moisture resistance and strength properties, such as vinyl silane, acrylic silane, amino silane, epoxy silane, mercapto silane, and halo silane. Examples include. The appropriate amount of the silane coupling agent added is 0.01 to 5% by weight in the composition. Furthermore, titanate-based, zirconate-based, zircoaluminate-based, and aluminum chelate compound-based coupling agents can also be added as required.
本発明では密着性をさらに高めるため必要に応じて未変
性および/又は変性シリコンオイル、共重合ボリアミド
、共役ジエンの水添重合体および/又は共役ジエンと芳
香族ビニル炭化水素の水素添加重合体および/又は該水
素添加重合体に不飽和カルボン酸又はその誘導体がグラ
フトされた変性物、ビス脂肪酸アンド・ビス芳香族アミ
ド等のアミド化合物、脂肪酸低級アルコールエステル・
脂肪酸多価アルコールエステル、エステル、ワックス等
のエステル等を添加することが出来る。In the present invention, in order to further improve adhesion, unmodified and/or modified silicone oil, copolyamide, hydrogenated polymer of conjugated diene, and/or hydrogenated polymer of conjugated diene and aromatic vinyl hydrocarbon, / Or modified products in which unsaturated carboxylic acids or derivatives thereof are grafted onto the hydrogenated polymer, amide compounds such as bis fatty acids and bis aromatic amides, fatty acid lower alcohol esters, etc.
Esters such as fatty acid polyhydric alcohol esters, esters, and waxes can be added.
又、本発明組成物には、本発明の目的を損わぬ範囲で他
の重合体例えば、ポリサルホン、ポリアリルサルホン、
ポリエーテルサルホン、ポリエステル、ポリオレフィン
、ポリスチレン、ポリメチルベンテン、ポリカーポネー
ト、ポリフェニレンオキサイド、ポリアリレート、フェ
ノキシ樹脂、ポリテトラフルオ口エチレン、シリコンゴ
ム、シリコンレジン、フッ素ゴム、ニトリルゴム、ポリ
メチルベンテン、エポキシ樹脂、液晶ボリマーなどを加
えてもよい。更に、公知の添加剤例えば、熱安定剤、酸
化防止剤、腐食防止剤、流動性向上剤、滑剤、離型剤、
着色剤、エボキシ化合物などを適当量加えることができ
る。腐食防止剤としてアルカリ金属炭酸塩、水酸化物、
例えば炭酸ナトリウム、炭酸リチウム、水酸化リチウム
や酸化亜鉛、酸化鉛、酸化マグネシウム、酸化バリウム
、ドロマイト、T−アルミナ、ハイドロタルサイト類な
どを0.1〜10重量%添加することが好ましい。特に
酸化亜鉛、γ−アルミナ、ドロマイトはパッケージ材料
の信頬性を高める上で好ましい。The composition of the present invention may also contain other polymers such as polysulfone, polyallylsulfone,
Polyether sulfone, polyester, polyolefin, polystyrene, polymethylbentene, polycarbonate, polyphenylene oxide, polyarylate, phenoxy resin, polytetrafluoroethylene, silicone rubber, silicone resin, fluororubber, nitrile rubber, polymethylbentene, Epoxy resin, liquid crystal polymer, etc. may also be added. Furthermore, known additives such as heat stabilizers, antioxidants, corrosion inhibitors, fluidity improvers, lubricants, mold release agents,
Appropriate amounts of colorants, epoxy compounds, etc. can be added. Alkali metal carbonates, hydroxides, as corrosion inhibitors
For example, it is preferable to add 0.1 to 10% by weight of sodium carbonate, lithium carbonate, lithium hydroxide, zinc oxide, lead oxide, magnesium oxide, barium oxide, dolomite, T-alumina, hydrotalcites, and the like. In particular, zinc oxide, γ-alumina, and dolomite are preferable in terms of increasing the credibility of the packaging material.
本発明の組成物は、350゜C(剪断速度103sec
”)における溶融粘度が3000ポイズ以下と低粘度で
あることが電子部品の封止材として使用する上で好まし
い。The composition of the present invention is heated at 350°C (shear rate 103 sec).
It is preferable that the melt viscosity at 3,000 poise or less is low for use as a sealing material for electronic components.
本発明のPAS組成物は主として射出成形、トランスフ
ァー成形、圧縮成形、ディッピングなどの方法で各種の
成形品に成形でき、特に電子部品のパッケージ材料とし
て好ましい。該電子部品の例としては例えばIC、ハイ
ブリッドIC、トランジスター、ダイオード、キャパシ
ター、レジスター、サイリスター、コイル、バリスター
、コネクター トランスデューサー、水晶発振器、ヒュ
ーズ、整流器、電源、スイッチ、各種センサーリレー、
サージアブソーバー、ピングリッドアレイ、リードレス
チップキャリャ、リード付きチップキャリャ、およびこ
れらの複合部品などである。The PAS composition of the present invention can be molded into various molded products mainly by methods such as injection molding, transfer molding, compression molding, and dipping, and is particularly preferred as a packaging material for electronic parts. Examples of such electronic components include ICs, hybrid ICs, transistors, diodes, capacitors, resistors, thyristors, coils, varistors, connectors, transducers, crystal oscillators, fuses, rectifiers, power supplies, switches, various sensor relays,
These include surge absorbers, pin grid arrays, leadless chip carriers, leaded chip carriers, and composite parts thereof.
本発明組成物で封止されたこれらの電子部品は金属、シ
リコンチップとの密着性に優れ、リードと樹脂との界面
からの水の侵入が低減されるため高められた信顛性を有
する。ボイドは厚肉部で発生しやすいため、0. 3
rtm以上の肉厚部を有する部品の場合、特に好適に用
いることが出来る。These electronic components encapsulated with the composition of the present invention have excellent adhesion to metal and silicon chips, and have increased reliability because the intrusion of water from the interface between the leads and the resin is reduced. Since voids tend to occur in thick parts, 0. 3
In the case of a part having a wall thickness greater than or equal to RTM, it can be particularly suitably used.
(実施例) 以下、実施例により、本発明を詳細に説明する。(Example) Hereinafter, the present invention will be explained in detail with reference to Examples.
〈実施例1〜9、比較例1〜6〉
ASTM D123B−74 (360゜C、5k
g荷重)で測定したメルトフローレイトで4000g/
10分を有するPPSに対しフレーク状物質、無機充て
ん材、繊維状物質を第1表に示す割合で配合し混合した
後、50mm押出機を用い、320゜C(実施例1〜6
、比較例1〜6)又は355゜C(その他の例)で溶融
混練し、ペレット化した後、1オンス射出成形機を用い
て押出ベレット化と同じシリンダー温度で、又、金型温
度で1 8 0 ’Cで16ピンICを封止した。封止
されたtCはSOFTHX社製TYPE−CMBでX線
写真を撮影し、金線切断の有無、ボイドの発生状況を観
察し、さらに信軌性試験として121゜C、2気圧下で
500時間のプレッシャークッカー試験(PCT)を行
いリークやオープンの状況を調べ、不良率として評価し
た。<Examples 1 to 9, Comparative Examples 1 to 6> ASTM D123B-74 (360°C, 5k
Melt flow rate measured at 4000g/g load)
After blending and mixing flaky substances, inorganic fillers, and fibrous substances in the proportions shown in Table 1, PPS having a 10-minute heating time was heated at 320°C (Examples 1 to 6) using a 50 mm extruder.
, Comparative Examples 1 to 6) or 355°C (other examples), and then pelletized using a 1-ounce injection molding machine at the same cylinder temperature as extrusion pelletizing, and at the mold temperature of 1. The 16-pin IC was sealed at 80'C. The sealed tC was photographed using a TYPE-CMB manufactured by SOFTHX, and the presence or absence of gold wire breakage and the occurrence of voids were observed. Furthermore, as a reliability test, it was kept at 121°C and 2 atm for 500 hours. A pressure cooker test (PCT) was conducted to check for leaks and open conditions, and the defect rate was evaluated.
不良率を出すにあたり、金線が切断したものは試験個数
から除外した。In calculating the defective rate, those with broken gold wire were excluded from the number of samples tested.
また、溶融混練したペレットを800゜Cで2時間焼き
、得られた残滓を顕微鏡で観察し、繊維状物質の繊維長
分布を求めた。Further, the melt-kneaded pellets were baked at 800° C. for 2 hours, and the resulting residue was observed under a microscope to determine the fiber length distribution of the fibrous material.
以上の結果を表−1に示す。尚、本発明の組成物により
封止されたICは、ボイドも、金線の切断もなく、PC
Tにおいても良好な信頼性を示すが、その他のものでは
、ボイドが発生したり、金線が切断したり、PCTにお
いても不良率が多いことが明らかであった。The above results are shown in Table-1. It should be noted that the IC sealed with the composition of the present invention has no voids or broken gold wires, and the PC
Good reliability was also shown in T, but it was clear that voids occurred and the gold wires were cut in other cases, and the defective rate was high even in PCT.
表一1中の記号を付したものは次の如くである。The symbols in Table 11 are as follows.
1)ガラスフレーク:
CEF−325 、日本板ガラス社製、厚さ2〜3μm
、粒径300μm以上約60%
2)合成マイカ;
PDM−7−325、トピーエ業社製、合成金雲母KM
g3(A I Si301o)Fz 、厚さ3〜4μm
,粒径6〜100μm約70%、6μm以下約30%
3)ガラスフレーク:
CEF−48、日本板ガラス社製、厚さ2〜3μm、粒
径6〜90μm約65%、粒径6μm以下約35%
4)?容融シリカ:
グラスグレインGR−80、東芝セラミックス社製、長
さ44μm以下70重景%以下5)ガラスビーズ:
EGB−731 、東芝バロティー二社製、平均粒径3
0μm
6)シリカフレーク:厚さ3〜4μm、粒径6〜100
μm約70%、粒径6um以下約30重量%
7)ミルドガラス:
MP−B、旭ファイバーグラス社製、直径10μm,長
さ210±35μm
8)ガラス繊維:
グラスロン03JA−404、旭ファイバーグラス、長
さ3ramのチョップドガラス、直径10μm
9)ミルドガラス:
NYADG , NYCO社製、MP−A、旭77イバ
ーグラス、直径10μm、長さ60±15μm10)ウ
ォラストナイト:
平均アスベクト比14、200メッシュふるい残留率3
0%以下
11)天然マイカ:
スゾライトマイカ325H、MI?1社製12)有機シ
ラン:
アミノシラン、KBE903、信越化学社製(発明の効
果)
本発明は、成形品中のボイドが極めて少なく、耐湿性や
金属との密着性に優れ、且つ溶融粘度が低い組成物及び
それでパッケージされた高品質の電子部品をもたらすこ
とができる。1) Glass flakes: CEF-325, manufactured by Nippon Sheet Glass Co., Ltd., thickness 2-3 μm
, particle size of 300 μm or more, approximately 60% 2) Synthetic mica; PDM-7-325, manufactured by Topie Industries, synthetic phlogopite KM
g3(AISi301o)Fz, thickness 3-4 μm
, about 70% particle size 6 to 100 μm, about 30% below 6 μm 3) Glass flakes: CEF-48, manufactured by Nippon Sheet Glass Co., Ltd., thickness 2 to 3 μm, about 65% particle size 6 to 90 μm, about 35% particle size below 6 μm %4)? Fused silica: Glass grain GR-80, manufactured by Toshiba Ceramics Co., Ltd., length 44 μm or less, 70% or less 5) Glass beads: EGB-731, manufactured by Toshiba Barotii Co., Ltd., average particle size 3
0 μm 6) Silica flakes: thickness 3-4 μm, particle size 6-100
μm approximately 70%, particle size 6 μm or less approximately 30% by weight 7) Milled glass: MP-B, manufactured by Asahi Fiberglass Co., Ltd., diameter 10 μm, length 210 ± 35 μm 8) Glass fiber: Glasslon 03JA-404, Asahi Fiberglass, Chopped glass with a length of 3 ram, diameter 10 μm 9) Milled glass: NYADG, manufactured by NYCO, MP-A, Asahi 77 Everglass, diameter 10 μm, length 60 ± 15 μm 10) Wollastonite: Average aspect ratio 14, 200 mesh sieve Residue rate 3
0% or less 11) Natural mica: Susolite Mica 325H, MI? 12) Organosilane made by one company: Aminosilane, KBE903, made by Shin-Etsu Chemical Co., Ltd. (Effects of the invention) The present invention has extremely few voids in the molded product, excellent moisture resistance and adhesion to metals, and low melt viscosity. The composition and high quality electronic components packaged therewith can be produced.
代 理 人teenager Reason Man
Claims (7)
レーク、シリカフレーク、合成マイカから選ばれる1種
又は2種以上のフレーク状物質とを含有し、該フレーク
状物質が長さ/厚さの比3以上のものを5重量%以上(
組成物中)、及び長さ300μm以上のものを20重量
%以下(組成物中)含むものであり、かつ350℃(剪
断速度10^3sec^−^1)における組成物の溶融
粘度が3000ポイズ以下であることを特徴とする樹脂
組成物。1. Contains (A) polyarylene sulfide and (B) one or more flake-like substances selected from galac flakes, silica flakes, and synthetic mica, and the flake-like substance has a length/thickness ratio of 3 or more. 5% or more by weight (
(in the composition) and 20% by weight or less (in the composition) of 300 μm or more in length, and the melt viscosity of the composition at 350°C (shear rate 10^3sec^-^1) is 3000 poise A resin composition characterized by:
外の無機質充てん材を含む請求項第1項の樹脂組成物。2. The resin composition according to claim 1, which contains an inorganic filler other than glass flakes, silica flakes, and synthetic mica.
、シリカビーズ、ガラスビーズ、シリカバルーン、ガラ
スバルーンから選ばれる1種又は2種以上である請求項
第2項の樹脂組成物。3. 3. The resin composition according to claim 2, wherein the inorganic filler is one or more selected from silica powder, glass powder, silica beads, glass beads, silica balloons, and glass balloons.
強化材がアスペクト比50以上のものを20重量%以下
(組成物中)含有する請求項第2項の樹脂組成物。4. 3. The resin composition according to claim 2, wherein the inorganic filler is a fibrous reinforcing material, and the fibrous reinforcing material contains 20% by weight or less (in the composition) of a material having an aspect ratio of 50 or more.
ナイトである請求項第4項の樹脂組成物。5. 5. The resin composition according to claim 4, wherein the fibrous reinforcing material is glass fiber and/or wollastonite.
成物。6. The resin composition according to any one of claims 1 to 5, which contains an organic silane.
材料としてなる電子部品。7. An electronic component comprising the resin composition according to any one of claims 1 to 6 as a packaging material.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1112187A JPH02292362A (en) | 1989-05-02 | 1989-05-02 | Resin composition and electronic component |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1112187A JPH02292362A (en) | 1989-05-02 | 1989-05-02 | Resin composition and electronic component |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02292362A true JPH02292362A (en) | 1990-12-03 |
Family
ID=14580437
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1112187A Pending JPH02292362A (en) | 1989-05-02 | 1989-05-02 | Resin composition and electronic component |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02292362A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002256147A (en) * | 2001-03-05 | 2002-09-11 | Toray Ind Inc | Highly heat conductive resin composition |
JP2008031190A (en) * | 2006-07-26 | 2008-02-14 | Shin Etsu Chem Co Ltd | Curable silicone composition containing phosphor for led, and led light-emitting device using the composition |
JP2008127532A (en) * | 2006-11-24 | 2008-06-05 | Dic Corp | Polyarylene sulfide resin composition |
JP2010217683A (en) * | 2009-03-18 | 2010-09-30 | Jsr Corp | Aluminum-containing photosensitive resin composition and pattern forming method |
JP2013188888A (en) * | 2012-03-12 | 2013-09-26 | Omron Corp | Metal insert molding having sealability, electronic component having metal insert molding and sealability, and method for manufacturing metal insert molding having sealability |
JP2014027261A (en) * | 2012-07-25 | 2014-02-06 | Samsung Electro-Mechanics Co Ltd | Laminate type inductor, and composition of protection layer of laminate type inductor |
JP2019182967A (en) * | 2018-04-06 | 2019-10-24 | ポリプラスチックス株式会社 | Corona resistant polyarylene sulfide resin composition, corona resistant member, and method for developing corona resistant and insulation property of polyarylene sulfide resin composition |
-
1989
- 1989-05-02 JP JP1112187A patent/JPH02292362A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002256147A (en) * | 2001-03-05 | 2002-09-11 | Toray Ind Inc | Highly heat conductive resin composition |
JP2008031190A (en) * | 2006-07-26 | 2008-02-14 | Shin Etsu Chem Co Ltd | Curable silicone composition containing phosphor for led, and led light-emitting device using the composition |
JP4520437B2 (en) * | 2006-07-26 | 2010-08-04 | 信越化学工業株式会社 | A curable silicone composition containing a fluorescent material for LED and an LED light emitting device using the composition. |
JP2008127532A (en) * | 2006-11-24 | 2008-06-05 | Dic Corp | Polyarylene sulfide resin composition |
JP2010217683A (en) * | 2009-03-18 | 2010-09-30 | Jsr Corp | Aluminum-containing photosensitive resin composition and pattern forming method |
JP2013188888A (en) * | 2012-03-12 | 2013-09-26 | Omron Corp | Metal insert molding having sealability, electronic component having metal insert molding and sealability, and method for manufacturing metal insert molding having sealability |
JP2014027261A (en) * | 2012-07-25 | 2014-02-06 | Samsung Electro-Mechanics Co Ltd | Laminate type inductor, and composition of protection layer of laminate type inductor |
JP2018019109A (en) * | 2012-07-25 | 2018-02-01 | サムソン エレクトロ−メカニックス カンパニーリミテッド. | Laminate type inductor |
JP2019182967A (en) * | 2018-04-06 | 2019-10-24 | ポリプラスチックス株式会社 | Corona resistant polyarylene sulfide resin composition, corona resistant member, and method for developing corona resistant and insulation property of polyarylene sulfide resin composition |
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