JPH02285A - Piperidyl-triazine derivative - Google Patents
Piperidyl-triazine derivativeInfo
- Publication number
- JPH02285A JPH02285A JP63270242A JP27024288A JPH02285A JP H02285 A JPH02285 A JP H02285A JP 63270242 A JP63270242 A JP 63270242A JP 27024288 A JP27024288 A JP 27024288A JP H02285 A JPH02285 A JP H02285A
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- carbon atoms
- compound
- melting point
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- WUCDQLRTWMSFBP-UHFFFAOYSA-N 4-piperidin-1-yltriazine Chemical class C1CCCCN1C1=CC=NN=N1 WUCDQLRTWMSFBP-UHFFFAOYSA-N 0.000 title claims description 3
- 150000001875 compounds Chemical class 0.000 claims abstract description 80
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 28
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 14
- 125000002252 acyl group Chemical group 0.000 claims abstract description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 58
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 20
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 14
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 13
- 239000002253 acid Substances 0.000 claims description 12
- 150000003839 salts Chemical class 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 8
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 6
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims description 4
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 claims description 4
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 125000004434 sulfur atom Chemical group 0.000 claims description 3
- 239000003381 stabilizer Substances 0.000 abstract description 15
- 239000000463 material Substances 0.000 abstract description 5
- 125000005843 halogen group Chemical group 0.000 abstract description 3
- 229920001059 synthetic polymer Polymers 0.000 abstract description 3
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 239000002861 polymer material Substances 0.000 abstract 1
- 238000002844 melting Methods 0.000 description 62
- 230000008018 melting Effects 0.000 description 62
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 57
- -1 impropyl Chemical group 0.000 description 52
- 238000006243 chemical reaction Methods 0.000 description 30
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 21
- 229920000642 polymer Polymers 0.000 description 20
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 19
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- 238000000034 method Methods 0.000 description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 15
- 239000000203 mixture Substances 0.000 description 15
- 239000012046 mixed solvent Substances 0.000 description 14
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 12
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 229920001577 copolymer Polymers 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 10
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 10
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 10
- 239000008096 xylene Substances 0.000 description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- 239000012442 inert solvent Substances 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 8
- 238000010992 reflux Methods 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 6
- 238000004440 column chromatography Methods 0.000 description 6
- IIEWJVIFRVWJOD-UHFFFAOYSA-N ethylcyclohexane Chemical compound CCC1CCCCC1 IIEWJVIFRVWJOD-UHFFFAOYSA-N 0.000 description 6
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 6
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 6
- 235000017557 sodium bicarbonate Nutrition 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 5
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 5
- MGNCLNQXLYJVJD-UHFFFAOYSA-N cyanuric chloride Chemical compound ClC1=NC(Cl)=NC(Cl)=N1 MGNCLNQXLYJVJD-UHFFFAOYSA-N 0.000 description 5
- 239000003480 eluent Substances 0.000 description 5
- 229910000027 potassium carbonate Inorganic materials 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 229920002554 vinyl polymer Polymers 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 4
- 239000004743 Polypropylene Substances 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- 150000001336 alkenes Chemical class 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- 150000001993 dienes Chemical class 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229920001155 polypropylene Polymers 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- RSJKGSCJYJTIGS-UHFFFAOYSA-N undecane Chemical compound CCCCCCCCCCC RSJKGSCJYJTIGS-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 3
- 229920000877 Melamine resin Polymers 0.000 description 3
- 229920002292 Nylon 6 Polymers 0.000 description 3
- 239000004952 Polyamide Substances 0.000 description 3
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 3
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- JVSWJIKNEAIKJW-UHFFFAOYSA-N dimethyl-hexane Natural products CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 3
- 229920001519 homopolymer Polymers 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 229920002647 polyamide Polymers 0.000 description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 229910000029 sodium carbonate Inorganic materials 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- 239000005711 Benzoic acid Substances 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- JWUXJYZVKZKLTJ-UHFFFAOYSA-N Triacetonamine Chemical compound CC1(C)CC(=O)CC(C)(C)N1 JWUXJYZVKZKLTJ-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 2
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 2
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 2
- 238000005917 acylation reaction Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000001361 adipic acid Substances 0.000 description 2
- 235000011037 adipic acid Nutrition 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 229910052788 barium Inorganic materials 0.000 description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 235000010233 benzoic acid Nutrition 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 238000010531 catalytic reduction reaction Methods 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229920006037 cross link polymer Polymers 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229920000578 graft copolymer Polymers 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 229940098779 methanesulfonic acid Drugs 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- QUAMTGJKVDWJEQ-UHFFFAOYSA-N octabenzone Chemical compound OC1=CC(OCCCCCCCC)=CC=C1C(=O)C1=CC=CC=C1 QUAMTGJKVDWJEQ-UHFFFAOYSA-N 0.000 description 2
- 150000007530 organic bases Chemical class 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical compound [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- ZQBAKBUEJOMQEX-UHFFFAOYSA-N phenyl salicylate Chemical compound OC1=CC=CC=C1C(=O)OC1=CC=CC=C1 ZQBAKBUEJOMQEX-UHFFFAOYSA-N 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229910003446 platinum oxide Inorganic materials 0.000 description 2
- 229920006380 polyphenylene oxide Polymers 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 2
- 230000006641 stabilisation Effects 0.000 description 2
- 238000011105 stabilization Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical class O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 2
- 229920006337 unsaturated polyester resin Polymers 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- RGASRBUYZODJTG-UHFFFAOYSA-N 1,1-bis(2,4-ditert-butylphenyl)-2,2-bis(hydroxymethyl)propane-1,3-diol dihydroxyphosphanyl dihydrogen phosphite Chemical compound OP(O)OP(O)O.C(C)(C)(C)C1=C(C=CC(=C1)C(C)(C)C)C(O)(C(CO)(CO)CO)C1=C(C=C(C=C1)C(C)(C)C)C(C)(C)C RGASRBUYZODJTG-UHFFFAOYSA-N 0.000 description 1
- RMSGQZDGSZOJMU-UHFFFAOYSA-N 1-butyl-2-phenylbenzene Chemical group CCCCC1=CC=CC=C1C1=CC=CC=C1 RMSGQZDGSZOJMU-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
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Landscapes
- Plural Heterocyclic Compounds (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
〈発明の目的〉
本発明は、合成高分子材料用安定剤として有用な新規な
ビイリジル−トリアジン誘導体及びその酸付加塩に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION OBJECTS OF THE INVENTION The present invention relates to novel biridyl-triazine derivatives and acid addition salts thereof useful as stabilizers for synthetic polymeric materials.
本願発明者等は、−(リジン系化合物の高分子材料に対
する劣化防止効果について長年に亘り鋭意検討を行なっ
た結果、下記の新規なピペリジルート・リアジン誘導体
が高分子材料の光及び熱劣化に対して、優れた防止効果
を有し、熱揮散性及び溶出の少ない安定剤であることを
見出して、本発明を完成した。The inventors of the present application have conducted extensive research over many years on the anti-deterioration effects of lysine compounds on polymeric materials, and have found that the following new piperidyl-lyazine derivatives have the ability to prevent photo- and thermal deterioration of polymeric materials. The present invention was completed based on the discovery that it is a stabilizer that has an excellent preventive effect, low heat volatility, and low elution.
〈発明の構成〉
本発明の新規なビイリジル−トリアジン誘導体は次式(
1) Kよって示される。<Structure of the invention> The novel biiridyl-triazine derivative of the present invention has the following formula (
1) Denoted by K.
式
上記式中、R1は水素原子、炭素数1乃至18個のアル
キル基、炭素数3乃至22個を有するアルコキシアルキ
ル基、炭素数2乃至18個のアシル基、置換されていて
もよいアラルキル基又は基を示す。Formula In the above formula, R1 is a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, an alkoxyalkyl group having 3 to 22 carbon atoms, an acyl group having 2 to 18 carbon atoms, or an optionally substituted aralkyl group. or indicates a group.
R2は水素原子、炭素数1乃至18個のアルキル基、炭
素数2乃至18個のアシル基又は置換され炭素数1乃至
4個のアルキル基を示す。〕を有する基を示す。R2 represents a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, an acyl group having 2 to 18 carbon atoms, or a substituted alkyl group having 1 to 4 carbon atoms. ] indicates a group having
R3は酸素原子で中断されていてもよい炭素数1乃至6
個のアルキレン基を示す。R3 has 1 to 6 carbon atoms, which may be interrupted by an oxygen atom
represents an alkylene group.
Yは式−0CO−を有する基、式−coo−t−有する
基、式−CONH−を有する基又は式−0CONH−を
有する基を示す。Y represents a group having the formula -0CO-, a group having the formula -coo-t-, a group having the formula -CONH-, or a group having the formula -0CONH-.
nは2乃至4の整数を示す。n represents an integer from 2 to 4.
nが2のとき、2は酸素原子、硫黄原子若しくを有する
基で中断されていてもよい炭素数1乃至18個のアルキ
レン基、
式
を有する基、
式
を有する基又は
式
を有する基
(上記式中、R6は水素原子又は炭素数1乃至4個のア
ルキル基を示し、pはl乃至4を示し、q及びrは同−
又は異なって0乃至3を示す。)t−示すO
nが3のとき、2は窒素原子で中断されていてもよい炭
素数3乃至8個のアルカントリイル基を示す。When n is 2, 2 is an alkylene group having 1 to 18 carbon atoms which may be interrupted by an oxygen atom, a sulfur atom, or a group having the formula, a group having the formula, a group having the formula, or a group having the formula ( In the above formula, R6 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, p represents 1 to 4, and q and r represent the same -
Or it shows 0 to 3 differently. ) When n is 3, 2 represents an alkantriyl group having 3 to 8 carbon atoms which may be interrupted by a nitrogen atom.
nが4のとき、2は酸素原子で中断されていてもよい炭
素数4乃至8個のアルカンテトライル基を示す。When n is 4, 2 represents an alkantetrayl group having 4 to 8 carbon atoms which may be interrupted by an oxygen atom.
Rが示す炭素数1乃至18個のアルキル基は、直鎖又は
分枝鎖でもよく、例えばメチル、エチル、n−プロピル
、インプロピル、n−ブチル、n−ヘキシル、n−オク
チル、2−エチルヘキシル、n−デシル、n−ドデシル
、n−オクタデシルでsb得、好適には炭素数1乃至8
個のアルキル基である。The alkyl group having 1 to 18 carbon atoms represented by R may be linear or branched, such as methyl, ethyl, n-propyl, impropyl, n-butyl, n-hexyl, n-octyl, 2-ethylhexyl. , n-decyl, n-dodecyl, n-octadecyl to obtain sb, preferably having 1 to 8 carbon atoms.
number of alkyl groups.
R1が示す炭素数3乃至22個のアルコキシアルキル基
のアルコキシ部分は炭素数1乃至18個を有し、アルキ
ル部分は炭素数2乃至4個を有する。The alkoxy portion of the alkoxyalkyl group having 3 to 22 carbon atoms represented by R1 has 1 to 18 carbon atoms, and the alkyl portion has 2 to 4 carbon atoms.
炭素数1乃至18個のアルコキシのアルキル部は上記R
に例示するアルキルであシ得、好適なアルコキシ部分は
炭素数1乃至8個のアルコキシ、例えばメトキシ、エト
キシ、n−プロポキシ、インプロポキシ、n−ブトキシ
、n−へキトキシ、n−オクトキシである。炭素数2乃
至4個のアルキル部分は、例えばエチル、n−プロピル
、インプロピル、n−ブチル、イソブチルであシ得、好
適にはエチルである。The alkyl moiety of alkoxy having 1 to 18 carbon atoms is the above R
Suitable alkoxy moieties are alkyl groups having 1 to 8 carbon atoms, such as methoxy, ethoxy, n-propoxy, inpropoxy, n-butoxy, n-hexitoxy, and n-octoxy. The alkyl moiety having 2 to 4 carbon atoms can be, for example, ethyl, n-propyl, inpropyl, n-butyl, isobutyl, preferably ethyl.
R’ 、 R2及びR4が示す炭素数2乃至18個のア
シル基は、例えばアセチル、fロピオニル、アクリロイ
ル、n−ブチリル、n−ヘキサノイル、ベンゾイル、n
−オクタノイル、ラウロイル、ノ9ルミトイル、ステア
ロイルであり得、好適には炭素数2乃至4個の脂肪族ア
シルであシ、特に好適にはアセチルである。The acyl group having 2 to 18 carbon atoms represented by R', R2 and R4 is, for example, acetyl, f-ropionyl, acryloyl, n-butyryl, n-hexanoyl, benzoyl, n-
- Octanoyl, lauroyl, 9-lumitoyl, stearoyl, preferably aliphatic acyl having 2 to 4 carbon atoms, particularly preferably acetyl.
R’、R2及びR4が示す置換されていてもよいアラル
キル基は、炭素数1乃至4個のアルキル−フェニル基で
あシ得、フェニル環上には置換基を有してもよく、その
置換基は、例えばメチル、エチル、プロピル、イソプロ
ピル、ブチルのような炭素数1乃至4個のアルキル;メ
トキシ、エトキシ、プロポキシ、イソプロプキシ、ブト
キシのような炭素数1乃至4個のアルコキシ;または弗
素、塩素、臭素のようなハロダン原子をあげることがで
きる。そして例えばベンジル、フェネチル、プロピルフ
ェニル、ブチルフェニル、p−メチルベンジル、p−ク
ロロベンジルであシ得、好適にはベンジルである。The optionally substituted aralkyl group represented by R', R2, and R4 may be an alkyl-phenyl group having 1 to 4 carbon atoms, and the phenyl ring may have a substituent, and the substituent The group is, for example, alkyl having 1 to 4 carbon atoms such as methyl, ethyl, propyl, isopropyl, butyl; alkoxy having 1 to 4 carbon atoms such as methoxy, ethoxy, propoxy, isopropoxy, butoxy; or fluorine, chlorine. , and halodane atoms such as bromine. For example, it can be benzyl, phenethyl, propylphenyl, butylphenyl, p-methylbenzyl, p-chlorobenzyl, preferably benzyl.
R2及びR4が示す炭素数1乃至18個のアルキル基は
、前述のRに例示するアルキルと同様のものであシ得、
好適には炭素数1乃至4個のアルキル、例えばメチル、
エチル、n−プロピル、イソプロピル、n−ブチルであ
シ、特に好適にはメチルである。The alkyl group having 1 to 18 carbon atoms represented by R2 and R4 may be the same as the alkyl group exemplified for R above,
Preferably alkyl having 1 to 4 carbon atoms, such as methyl,
Ethyl, n-propyl, isopropyl, n-butyl are preferred, and methyl is particularly preferred.
R3が示す酸素原子で中断されていてもよい炭素数1乃
至6個のアルキレン基は1例えばメチレン、エチレン、
エチリデン、トリメチレン、fロピレン、イングロピリ
デン、テトラメチレン、(ンタメチレン、ヘキサメチレ
ン、3−オキサペンタレンであシ得、好適にはメチレン
、エチレン、エチリデンである。The alkylene group having 1 to 6 carbon atoms which may be interrupted by an oxygen atom represented by R3 is 1, for example, methylene, ethylene,
Ethylidene, trimethylene, f-propylene, ingropylidene, tetramethylene, (tamethylene, hexamethylene, 3-oxapentalene) can be used, and methylene, ethylene, and ethylidene are preferable.
R5又はRが示す炭素数1乃至4個のアルキル基は、直
枝又は分岐鎖でもよく、例えばメチル、エチル、プロピ
ル、イソプロピル、ブチル、イソブチルであシ得、好適
にはメチル基である。The alkyl group having 1 to 4 carbon atoms represented by R5 or R may be straight-branched or branched, and may be, for example, methyl, ethyl, propyl, isopropyl, butyl, or isobutyl, and is preferably a methyl group.
2が示す酸素原子、硫黄原子又は
式
を有する基で中断されていてもよい炭素数1個乃至18
個のアルキレン基は、例えばメチレン、エチレン、トリ
メチレン、グロピレン、テトラメチレン、ペンタメチレ
ン、ヘキサメチレン、ヘプタメチレン、オクタメチレン
、デカメチレン、ドデカメチレン、ヘキサデカメチレン
、
式−(CH2)2−0−(CH2)2− 、−(CH2
)2−8−(CH2)2−−(CH2)2−0−(CH
2)2−0−(CH2)2−、−(CH2)3−0−(
CH2)、−。2 has 1 to 18 carbon atoms, which may be interrupted by an oxygen atom, a sulfur atom, or a group having the formula
Examples of alkylene groups include methylene, ethylene, trimethylene, glopylene, tetramethylene, pentamethylene, hexamethylene, heptamethylene, octamethylene, decamethylene, dodecamethylene, hexadecamethylene, formula -(CH2)2-0-(CH2 )2-,-(CH2
)2-8-(CH2)2--(CH2)2-0-(CH
2) 2-0-(CH2)2-, -(CH2)3-0-(
CH2), -.
であ)得、好適には、炭素数2個乃至8個のアルキレン
基である。and preferably an alkylene group having 2 to 8 carbon atoms.
2が示す窒素原子で中断されていてもよい炭素数3個乃
至8個のアルカントリイル基は、式
%式%
を有する基であシ得、好適には
式
%式%
を有する基である。The alkantriyl group having 3 to 8 carbon atoms and optionally interrupted by a nitrogen atom represented by 2 may be a group having the formula %, preferably a group having the formula %. .
2が示す酸素原子で中断されていてもよい炭素数4個乃
至8個のアルカンテトライル基は、−CH2−CH2−
C−CH2−CH2−−CH2−CH−CH−CH2−
−CH2−CH−CH2−0−CH2−CH−CH2−
を有する基であシ得、好適には
式
%式%
を有する基である。The alkantetrayl group having 4 to 8 carbon atoms which may be interrupted by an oxygen atom represented by 2 is -CH2-CH2-
C-CH2-CH2--CH2-CH-CH-CH2- -CH2-CH-CH2-0-CH2-CH-CH2-
It can be a group having the formula %, preferably a group having the formula %.
本発明において、好適な化合物は式(I)において、あ
る化合物。In the present invention, preferred compounds are those of formula (I).
3、R3が酸素原子で中断されていてもよい炭素数1乃
至4個のフルキレン基である化合物、4、 Xが酸素
原子、−冊一基又は−NCR,−基である化合物、
5、Yが式−0CO−−CONH−又は−COO−を有
する基である化合物、
6、 nが2であシ、2が酸素原子で中断されていて
もよい炭素数1乃至10個のアルキレン基、(式中、R
6は水素原子又はメチル基であシ、pは(式中、R4は
水素原子、メチル基又はペンノル基である。)である化
合物、
2、R2が水素原子、メチル基又はベンジル基で(式中
、Rは炭素数2乃至3のアルキレン基である。)である
化合物、
7、 Rが水素原子又は炭素原子1乃至4個のアルキ
ル基でおる化合物、
8、 Rが水素原子又はメチル基である化合物、9、
Xが一洲一又は−NCH3−である化合物、10、
R3がメチレン基、エチレン基又はエチリデン基で
ある化合物、
11、nが2であシ、2が炭素数2乃至8個のアルキレ
ン基である化合物、
12、 R’が炭素数1乃至4個のアルキル基であシ
。3. Compounds in which R3 is a fullkylene group having 1 to 4 carbon atoms which may be interrupted by an oxygen atom, 4. Compounds in which X is an oxygen atom, - group or -NCR, - group, 5, Y is a group having the formula -0CO--CONH- or -COO-, 6. an alkylene group having 1 to 10 carbon atoms, where n is 2 and 2 is optionally interrupted by an oxygen atom; In the formula, R
6 is a hydrogen atom or a methyl group, p is a compound (wherein R4 is a hydrogen atom, a methyl group, or a pennol group), 2, R2 is a hydrogen atom, a methyl group, or a benzyl group (wherein the formula 7. A compound in which R is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; 8. A compound in which R is a hydrogen atom or a methyl group. A certain compound, 9,
Compounds in which X is Ichishuichi or -NCH3-, 10,
A compound in which R3 is a methylene group, an ethylene group, or an ethylidene group; 11. A compound in which n is 2 and 2 is an alkylene group having 2 to 8 carbon atoms; 12. A compound in which R' is an alkylene group having 1 to 4 carbon atoms; Alkyl group.
R2が水素原子であシ、Xが一頭一であシ、nが2であ
り、2が炭素数2乃至8個のアルキレン基であシ、R3
がメチレン基であり、Yが式−〇〇〇−を有する基であ
る化合物、
13、 R’が炭素数1乃至4個のアルキル基であり
。R2 is a hydrogen atom, X is one, n is 2, and 2 is an alkylene group having 2 to 8 carbon atoms, R3
is a methylene group, and Y is a group having the formula -〇〇〇-; 13. R' is an alkyl group having 1 to 4 carbon atoms;
R2が水素原子であシ、Xが一皿一であシ、nが2であ
り、2が炭素数2乃至8個のフルキレン基であシ、R3
がエチレン基であシ、Yが式−OC〇−を有する基であ
る化合物、
をあげることができる。R2 is a hydrogen atom, X is a single plate, n is 2, and 2 is a fullylene group having 2 to 8 carbon atoms, R3
is an ethylene group, and Y is a group having the formula -OC〇-.
また式(I)の化合物の酸付加塩も本発明の範囲に含ま
れる。このような酸付加塩としては、高分子の安定化を
阻害しないものであれば特に限定はなく、例えば硫酸、
塩酸又は燐酸のような無機酸;ギ酸、酢酸、吉草酸、ス
テアリン酸、しゅう酸。Also included within the scope of the invention are acid addition salts of compounds of formula (I). Such acid addition salts are not particularly limited as long as they do not inhibit the stabilization of the polymer; for example, sulfuric acid,
Inorganic acids such as hydrochloric or phosphoric acid; formic, acetic, valeric, stearic, oxalic acids.
アジピン酸、セパチン酸、マレイン酸、安息香酸、p−
t−ブチル安息香酸、3,5−ジ−t−ブチル−4−ヒ
ドロキシ安息香酸、サルチル酸、テレフタル酸のような
カルボン酸;メタンスルホン酸、ベンゼンスルホン酸の
ようなスルホン酸;するいはフェニルホスホン酸のよう
なホスホン酸の塩であシ得る。Adipic acid, sepatic acid, maleic acid, benzoic acid, p-
Carboxylic acids such as t-butylbenzoic acid, 3,5-di-t-butyl-4-hydroxybenzoic acid, salicylic acid, terephthalic acid; sulfonic acids such as methanesulfonic acid, benzenesulfonic acid; or phenyl It may be a salt of a phosphonic acid such as phosphonic acid.
下記に式(1)を有する個々のピーリジル−トリアジン
誘導体を非制限的に第1表に例示する。このリスト中の
化合物に付した番号は、以後実施例中本発明に係わる式
(1) ′t−有する化合物は、以下に示す方式に従っ
て製造することができる。Individual pyridyl-triazine derivatives having the formula (1) are listed below in Table 1, without limitation. The numbers assigned to the compounds in this list refer to the numbers given to the compounds in the following Examples.Compounds having the formula (1)'t- according to the present invention can be produced according to the method shown below.
B法
(至)
[相]
(至)
(l
(財)
上記式中、R11は水素原子、炭素数1乃至18個のア
ルキル基、炭素数3乃至22個のアルコキシアルキル基
、置換されていてもよいアラルキル基基を示す。Method B (To) [Phase] (To) (l (Foundation) In the above formula, R11 is a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, an alkoxyalkyl group having 3 to 22 carbon atoms, or a substituted Indicates a good aralkyl group.
R2′は水素原子、炭素数1乃至18個のアルキル基又
は置換されていてもよいアラルキル基を示す。R2' represents a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, or an optionally substituted aralkyl group.
基を示す。)又は−〇H基を示す。Indicates the group. ) or -○H group.
数1乃至4個のアルコキシ基又はハロゲン原子を示す、
)又はイソシアナート基を示す。Showing 1 to 4 alkoxy groups or halogen atoms,
) or isocyanate group.
2は前述と同意義の基を示し、Qは塩素、臭素、沃素の
ようなハロゲン原子(好適には塩素原子)を示す。2 represents a group as defined above, and Q represents a halogen atom such as chlorine, bromine, or iodine (preferably a chlorine atom).
A法の第一工程は、一般式(至)を有する化合物を製造
する工程で、穴口を有する化合物と弐ωを有する化合物
を接触還元条件下に反応させることによって達成される
。The first step of method A is a step of producing a compound having the general formula (to), and is achieved by reacting a compound having a hole and a compound having an ω under catalytic reduction conditions.
反応に使用される触媒は、通常の接触還元反応に用いら
れるものなら特に限定されないが、好適にはノ臂ラジウ
ムー炭素、パラジウム黒、酸化白金、ラネーニッケルを
あげることができるが、特に好適には酸化白金である。The catalyst used in the reaction is not particularly limited as long as it is used in ordinary catalytic reduction reactions, but preferred examples include radium-on-carbon, palladium black, platinum oxide, and Raney nickel; particularly preferred catalysts include oxidized nickel. It is platinum.
使用される溶剤は、反応に関与しなければ特に限定され
ないが、通常水、メタノール、エタノール 、−,60
パノールのようなアルコール類カ使用される。The solvent used is not particularly limited as long as it does not participate in the reaction, but usually water, methanol, ethanol, -,60
Alcoholic beverages such as panol are used.
使用される水素圧は通常常圧乃至10気圧であシ、反応
温度は室温乃至1001:であシ、反応に要する時間は
原料化合物若しくは触媒の種類又は反応温度によって異
なるが通常30分間乃至5時間である。The hydrogen pressure used is usually from normal pressure to 10 atm, the reaction temperature is from room temperature to 1,000 yen, and the time required for the reaction varies depending on the type of raw material compound or catalyst or reaction temperature, but is usually 30 minutes to 5 hours. It is.
また、化合物■は塩の型でも使用でき、そのような塩と
しては、例えば塩酸、硝酸、硫酸のような鉱酸;酢酸、
トリフルオロ酢酸、アジピン酸、安息香酸のようなカル
ボン酸;メタンスルホン酸、P−)ルエンスルホン酸の
よウナスルホン?ffl又1dフェニルホスホン酸のよ
うなホスホン酸との塩をあげることができる。Compound ■ can also be used in the form of a salt, such as mineral acids such as hydrochloric acid, nitric acid, and sulfuric acid; acetic acid,
Carboxylic acids such as trifluoroacetic acid, adipic acid, benzoic acid; unasulfones such as methanesulfonic acid, P-)luenesulfonic acid? Salts with phosphonic acids such as ffl or 1d phenylphosphonic acid can be mentioned.
A法第二工程及び第三工程は、それぞれ一般式■及び■
を有する化合物を製造する工程で、不活性溶剤中、適切
な量の一般式(V)を有する化合物と一般式(ロ)を有
する化合物とを、または一般式(至)を有する化合物と
一般式(lを有する化合物とを、それぞれ反応させるこ
とによりて達成される。The second and third steps of method A are based on the general formulas ■ and ■, respectively.
In the step of producing a compound having general formula (V) and a compound having general formula (b) in an inert solvent, or a compound having general formula (to) and a compound having general formula (This is achieved by reacting the compounds having 1) with each other.
反応に使用される不活性溶剤は本反応に関与しないもの
なら特に限定されないが、好適には水、アセトン、メチ
ルエチルケトンのようなケトン類;エーテル、テトラヒ
ドロフラン、ジオキサンのようなエーテル類;ベンゼン
、トルエン、キシレンのような芳香族炭化水素類;n−
へブタン、n−オクタン、イソオクタン、シクロヘキサ
ン、エチルシクロヘキサンのような飽和炭化水素類:又
は上記の有機溶剤と水の混合溶剤をあげることができる
が、特に好適には含水アセトンである。The inert solvent used in the reaction is not particularly limited as long as it does not participate in this reaction, but suitably includes water, acetone, ketones such as methyl ethyl ketone; ethers such as ether, tetrahydrofuran, and dioxane; benzene, toluene, Aromatic hydrocarbons such as xylene; n-
Examples include saturated hydrocarbons such as hebutane, n-octane, isooctane, cyclohexane, and ethylcyclohexane; or mixed solvents of the above-mentioned organic solvents and water; particularly preferred is aqueous acetone.
反応温度は0℃乃至200℃であり、好適には室温乃至
150℃であシ、反応に要する時間は原料化合物の種類
又は反応温度によって異なるが、通常30分乃至30時
間である。The reaction temperature is 0°C to 200°C, preferably room temperature to 150°C, and the time required for the reaction varies depending on the type of raw material compound or reaction temperature, but is usually 30 minutes to 30 hours.
また、反応は脱酸剤の存在下に好適に行なわれ、脱酸剤
としては、例えば水酸化ナトリウム、水酸化カリウム、
炭酸ナトリウム、炭酸カリウムのような無機塩基又はト
リエチルアミン、ピリジン、N、N−ジメチルアニリン
、1.8− S7アザビシクロ[4,3,0]ウンデカ
−7−エン(DBU )のような有機塩基をあげること
ができるが、好適には水酸化ナトリウム、水酸化カリウ
ム、炭酸ナトリウム。Further, the reaction is suitably carried out in the presence of a deoxidizing agent, and examples of the deoxidizing agent include sodium hydroxide, potassium hydroxide,
Inorganic bases such as sodium carbonate, potassium carbonate or organic bases such as triethylamine, pyridine, N,N-dimethylaniline, 1.8-S7 azabicyclo[4,3,0]undec-7-ene (DBU). Preferred are sodium hydroxide, potassium hydroxide, and sodium carbonate.
炭酸カリウムである。It is potassium carbonate.
A法第四工程は一般式(Ia)を有する化合物を製造す
る工程で、不活性溶剤中、適切な量の一般式■を有する
化合物と一般弐〇〇ヲ有する化合物とを反応させること
によって達成される。The fourth step of method A is a step of producing a compound having the general formula (Ia), which is achieved by reacting an appropriate amount of the compound having the general formula (■) and the compound having the general formula (2) in an inert solvent. be done.
素数1乃至4個のアルキル基を示す。)、Y〃が一〇H
基又は−NF2基であるとき、反応は不活性溶剤中で塩
基の存在下、通常反応温度80℃乃至150℃、反応時
間30分乃至5時間で、生成する低級アルコールを留去
することによって行なわれる。Indicates an alkyl group having 1 to 4 prime numbers. ), Y〃is 10H
group or -NF2 group, the reaction is carried out in an inert solvent in the presence of a base, usually at a reaction temperature of 80°C to 150°C and a reaction time of 30 minutes to 5 hours, by distilling off the lower alcohol produced. It will be done.
塩基としては、例えばナトリウムメチラート。As a base, for example sodium methylate.
ナトリウムエチラート、カリウムt−ブチラド、水酸化
ナトリウム、水酸化カリウム、リチウムアミドのような
アルカリ金属化合物又はチタン酸テトライソゾロピル着
しくにテトラブチルのようなチタン酸化合物が使用され
るが、好適にはナトリウムエチラート、水酸化カリウム
、チタン酸化合物である。不活性溶剤としては、例えば
ベンゼン、トルエン、キシレン、n−へブタン、n−オ
クタン、イソオクタン、シクロヘキサン、エチルシクロ
ヘキサンのような炭化水素類が好適に使用され示す。)
であるとき、反応は不活性溶剤中で脱酸剤の存在下又は
不存在下、通常反応温度室温乃至130℃、反応時間3
0分乃至3時間で行なわれる。Alkali metal compounds such as sodium ethylate, potassium t-butyrad, sodium hydroxide, potassium hydroxide, lithium amide or titanic acid compounds such as tetraisozolopyl titanate and preferably tetrabutyl are used, but preferably are sodium ethylate, potassium hydroxide, and titanic acid compounds. As the inert solvent, hydrocarbons such as benzene, toluene, xylene, n-hebutane, n-octane, isooctane, cyclohexane, and ethylcyclohexane are preferably used. )
When , the reaction is carried out in an inert solvent in the presence or absence of a deoxidizer, usually at a reaction temperature of room temperature to 130°C, and a reaction time of 3.
It takes between 0 minutes and 3 hours.
脱酸剤としては、例えば水酸化ナトリウム、水酸化カリ
ウムのようなアルカリ金属の水酸化物。Examples of deoxidizers include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide.
炭酸ナトリウム、炭酸カリウムのようなアルカリ金属の
炭酸塩;トリエチルアミン、ピリジンのような有機塩基
類が好適に使用される。Alkali metal carbonates such as sodium carbonate and potassium carbonate; organic bases such as triethylamine and pyridine are preferably used.
不活性溶剤としては、例えばベンゼン、トルエン、キシ
レン のような芳香族炭化水素類;クロロホルム、トリ
クロルエタンのよウナハロタン化脂肪族炭化水素類;ジ
エチルエーテル、テトラヒドロフラン、ジオキサンのよ
うなエーテル類が好適に使用される。Preferred examples of inert solvents include aromatic hydrocarbons such as benzene, toluene, and xylene; unahalotanated aliphatic hydrocarbons such as chloroform and trichloroethane; and ethers such as diethyl ether, tetrahydrofuran, and dioxane. be done.
化合物置において、Y′が一〇H基であシ、Y〃がイソ
シアナート基であるとき、反応は不活性溶剤中、通常反
応温度室温乃至160℃、反応時間30分乃至5時間で
行なわれる。不活性溶剤として、例エバベンゼン、トル
エン、キシレン のよ’5な芳香族炭化水素類;n−へ
ブタン、n−オクタン、イソオクタン、シクロヘキサン
、エチルシクロヘキサンのような炭化水素類が好適に使
用される。In the compound, when Y' is a 10H group and Y is an isocyanate group, the reaction is usually carried out in an inert solvent at a reaction temperature of room temperature to 160°C and a reaction time of 30 minutes to 5 hours. . As inert solvents, aromatic hydrocarbons such as evabenzene, toluene, xylene; hydrocarbons such as n-hebutane, n-octane, isooctane, cyclohexane, ethylcyclohexane are preferably used.
一般式(1)においてR1及びR2の一方又は両方がア
シル基である化合物は、付加工程として、一般式(Ia
)において、R及びR2′の一方又は両方が水素原子で
ある化合物にアシル化反応を行なうことによシ得ること
ができる。A compound in which one or both of R1 and R2 in the general formula (1) is an acyl group may be prepared by the general formula (Ia
) can be obtained by performing an acylation reaction on a compound in which one or both of R and R2' is a hydrogen atom.
アシル化反応は、対応するカルがン酸活性銹導(酸ハラ
イド、酸無水物又は酸低級アルキルエステル)をアシル
化剤として、前述のA法第四工程と同様に行なうことが
できる。The acylation reaction can be carried out in the same manner as in the fourth step of method A described above, using the corresponding carboxylic acid activated ester (acid halide, acid anhydride or acid lower alkyl ester) as the acylating agent.
反応終了後、各工程の目的物は常法にしたがって反応混
合物から採取することができる。例えば所望によシ反応
混合物に不浴物が存在する場合には濾別し、又は反応混
合物が酸性又はアルカリ性の場合は中和した後、水を加
え水工混合性有機溶剤で抽出し、得られた抽出液を乾燥
し、抽出液から溶剤を留去することによって得ることが
できる。After the reaction is completed, the target product of each step can be collected from the reaction mixture according to a conventional method. For example, if necessary, if unbathable substances are present in the reaction mixture, they are filtered out, or if the reaction mixture is acidic or alkaline, they are neutralized, and then water is added and extracted with a water-miscible organic solvent. It can be obtained by drying the extracted liquid and distilling off the solvent from the extracted liquid.
さらに得られた目的化合物を必要に応じて、常法例えば
カラムクロマトグラフィー、分取薄層クロマトグラフィ
ー、蒸留法、再結晶法等により精製することもできる。Furthermore, the obtained target compound can be purified by conventional methods such as column chromatography, preparative thin layer chromatography, distillation method, recrystallization method, etc., if necessary.
B法は、一般式■を有する化合物を反応の順序を変えて
別途に製造する方法である。Method B is a method in which a compound having the general formula (1) is separately produced by changing the reaction order.
第一工程は、一般式轄を有する化合物を製造する工程で
あり、第二工程は、一般式(2)を有する化合物を製造
する工程である。これらは、それぞれ化合物(至)と化
合物(4)、又は化合物(至)と化合物(ト)とを前記
A法第二、第三工程と同様に反応させることにより達成
される。The first step is a step of producing a compound having the general formula (2), and the second step is a step of producing a compound having the general formula (2). These can be achieved by reacting the compound (to) and the compound (4), or the compound (to) and the compound (t), respectively, in the same manner as in the second and third steps of Method A.
〈発明の効果〉
本発明に係わる式(1)を有するピペリジル−トリアジ
ン誘導体及びその付加塩は、重合体との相溶性に優れ、
揮散性及び表面移行性が小さく、しかも、優れた光及び
熱安定化効果を有するため、広範囲の合成高分子の安定
化に利用できる。<Effects of the Invention> The piperidyl-triazine derivative having formula (1) and its addition salt according to the present invention have excellent compatibility with polymers,
It has low volatility and surface migration, and has excellent light and heat stabilizing effects, so it can be used to stabilize a wide range of synthetic polymers.
この方法で安定化される合成高分子には次のものが含ま
れる。Synthetic polymers stabilized in this manner include:
オレフィン及びジエンポリマー
オレフィン及びツエンのホモポリマー(例、tば、低密
度、直鎖状低密度、高密度及び架橋ポリエチレンエン)
、そのようなホモポリマーの混合物(例えば、y1?リ
プロピレンとポリエチレン、ポリプロピレンとポリプデ
ンー1.又はポリプロピレンとポリイソブチレンの混合
物)、オレフィンのコポリマー(例、tば、エチレンー
クロピレンコポリマー、クロピレン−ブテン−1コホリ
マー、エチレン−ブテン−lコポリマー)、及ヒオレフ
ィンとジエンのコポリマー(例えば、エチレン及びプロ
ピレンとブタジェン、ヘキサジエン、ジシクロペンタジ
ェン又はエチリデンノルデルネンのようなツエンとのタ
ーポリマー):
スチレンポリマー
ポリスチレン、スチレン又はα−メチルスチレンのコポ
リマー(例、tば、スチレン−無水マレイン酸コポリマ
ー、スチレンーブタジエンコ、i? リマ、スチレン−
アクリロニトリル−メチルメタクリレ−トコプリマー、
スチレン−アクリロニトリル−アクリル酸エステルコポ
リマー、衝撃強度を与えるためにアクリル酸エステルポ
リマーで変性されたスチレン−アクリロニトリルコポリ
マー及び衝撃強度を与えるためにEPDMで変性された
スチレンポリマー)及びスチレンのグラフトコポリマー
(例えば、ポリブタジェンに対するスチレンのグラフト
コポリマー、通常アクリロニトリル−ブタジェン−スチ
レン又はABS fラスチックと言われるポリブタジェ
ンに対するスチレン及びアクリロニトリルのグラフトコ
ポリマー及び上記スチレンコポリマーとこれとの混合物
):
ハロダン化ビニル及ヒピニリデンホリマーポリ塩化ビニ
ル、ポリ塩化ビニリデン。ポリフッ化ビニル、ポリクロ
ログレン、塩i化ビニルー塩化ビニリデンコポリマー、
塩化ビニル−酢酸ビニルコポリマー、塩化ビニル−エチ
レンコポリマー、塩化ビニリデン−酢酸ビニルコポリマ
ー:α、β−不飽和酸及びその酸誘導体のポリマーポリ
アクリル酸エステル及びポリメタクリル酸エステル、ポ
リアクリルアミド及びポリアクリロニトリル:
不飽和アルコールと不飽和アミン又はそのアシル誘導体
又はアセタールのポリマー
?リビニルアルコール、ポリ酢酸ビニル、ポリステアリ
ン酸ビニル、ポリ安息香酸ビニル、ポリマレイン酸ビニ
ル、ポリビニルブチラール、ポリフタル酸アリル、ポリ
メラミンアリル及び前記単量体と他種のビニル化合物と
のコポリマー(例えハ、エチレン−酢酸ビニルコポリマ
ー):エポキシポリマー
エポキシ化合物のホモポリマー及びコポリマー(例えば
、ポリエチレンオキシド)及びビスグリシジルエーテル
化合物のポリマー:
ポリアセタール、ポリアルキレンオキシド及びポリフェ
ニレンオキシド
ポリオキシメチレン、オキシメチレン−エチレンオキシ
トコポリマー ポリオキシエチレン、ポリグロピレンオ
キシド、プリイソブチレンオキシド及びポリフェニレン
オキシド:
ポリウレタン及びポリウレア
ポリカーゼネート
ポリスルホン
ポリアミド及びコポリアミド
ジアミンと脂肪酸又は芳香族ジカルボン酸から誘導され
る及び/又はアミノカルボン酸又はそれに対応するラク
タムから誘導されるポリアミド及びコポリアミド:例え
ば、ナイロン−6、ナイロン−6/6、ナイロン6/1
0.ナイロン11、ナイロン12:
ポリエステル
ジカルボン酸とジアルコールとから及び/又はオキシ酸
又はそれに対応するラクトンから誘導されるポリエステ
ル:例えば、ポリエチレンテレフタレート、ポリブチレ
ンテレフタレート、ポリシクロヘキサン−1,4−ジメ
チレンテレフタレート:架橋ポリマー
一方がアルデヒド、他方が7エノール、尿素又はメラミ
ンとから誘導される架橋ポリマー、例えば、フェノール
−ホルムアルデヒド樹脂、尿素−ホルムアルデヒド樹脂
、メラミン−ホルムアルデヒド樹脂及びジアリールフタ
レート樹脂:アルキド樹脂
例工ば、グリセロール−7タル酸樹脂及びこれとメラミ
ン−ホルムアルデヒド樹脂との混合物:不飽和ポリエス
テル樹脂
飽和及び不飽和ジカルがン酸と多価アルコールとのコー
リエステルから誘導され、架橋剤としてビニル化合物を
用いて得られた不飽和ポリエステル樹脂、及びそれを塩
素化して難燃化変性を施したもの。Olefin and diene polymers Homopolymers of olefins and dienes (e.g., tertiary, low density, linear low density, high density and crosslinked polyethylene)
, mixtures of such homopolymers (e.g. mixtures of y1?lipropylene and polyethylene, polypropylene and polypuden-1. or polypropylene and polyisobutylene), copolymers of olefins (e.g. -1 copolymers, ethylene-butene-l copolymers), and copolymers of hyolefins and dienes (e.g. terpolymers of ethylene and propylene with butadiene, hexadiene, dicyclopentadiene or tsene such as ethylidene nordernene): styrene Polymers polystyrene, copolymers of styrene or α-methylstyrene (e.g., taba, styrene-maleic anhydride copolymers, styrene-butadiene copolymers, i?lima, styrene-
acrylonitrile-methyl methacrylate coprimer,
styrene-acrylonitrile-acrylic ester copolymers, styrene-acrylonitrile copolymers modified with acrylic ester polymers to impart impact strength and styrene polymers modified with EPDM to impart impact strength) and graft copolymers of styrene (e.g. Graft copolymers of styrene and acrylonitrile to polybutadiene, commonly referred to as acrylonitrile-butadiene-styrene or ABS f-lastics, and mixtures thereof with the above-mentioned styrene copolymers): Vinyl halide and hyponylidene polymer polychlorides Vinyl, polyvinylidene chloride. Polyvinyl fluoride, polychlorogrene, vinyl chloride-vinylidene chloride copolymer,
Vinyl chloride-vinyl acetate copolymer, vinyl chloride-ethylene copolymer, vinylidene chloride-vinyl acetate copolymer: polymers of α, β-unsaturated acids and their acid derivatives polyacrylic esters and polymethacrylic esters, polyacrylamide and polyacrylonitrile: Polymer of saturated alcohol and unsaturated amine or its acyl derivative or acetal? vinyl alcohol, polyvinyl acetate, polyvinyl stearate, polyvinyl benzoate, polyvinyl maleate, polyvinyl butyral, polyallyl phthalate, polymelamine allyl, and copolymers of the above monomers with other vinyl compounds (e.g. Ethylene-vinyl acetate copolymers): epoxy polymers Homopolymers and copolymers of epoxy compounds (e.g. polyethylene oxide) and polymers of bisglycidyl ether compounds: polyacetals, polyalkylene oxides and polyphenylene oxides polyoxymethylene, oxymethylene-ethylene oxyto copolymers poly Oxyethylene, polyglopylene oxide, priisobutylene oxide and polyphenylene oxide: polyurethanes and polyureas polycarbonates polysulfones polyamides and copolyamides derived from diamines and fatty acids or aromatic dicarboxylic acids and/or from aminocarboxylic acids or the corresponding lactams Derivative polyamides and copolyamides: e.g. nylon-6, nylon-6/6, nylon 6/1
0. Nylon 11, Nylon 12: Polyesters derived from dicarboxylic acids and dialcohols and/or from oxyacids or their corresponding lactones: For example, polyethylene terephthalate, polybutylene terephthalate, polycyclohexane-1,4-dimethylene terephthalate: Crosslinked polymers Crosslinked polymers derived from aldehydes on the one hand and 7-enols, urea or melamine on the other hand, such as phenol-formaldehyde resins, urea-formaldehyde resins, melamine-formaldehyde resins and diaryl phthalate resins: alkyd resins, e.g. glycerol -7 Talic acid resin and its mixture with melamine-formaldehyde resin: an unsaturated polyester resin in which the saturated and unsaturated radicals are derived from coryesters of phosphoric acid and polyhydric alcohols, obtained using vinyl compounds as crosslinking agents. unsaturated polyester resin and its flame-retardant modified material by chlorination.
高分子の効果的安定化に必要な本発明の安定剤の量は、
種々の要因、例えば対象となるポリマーの種類及び性質
、その使用目的、及び他の安定剤の存在等に依存する。The amount of stabilizer of the present invention required for effective stabilization of the polymer is:
It depends on various factors, such as the type and nature of the polymer in question, its intended use, and the presence of other stabilizers.
通常、高分子の重量を基準にして本発明の安定剤を0.
01乃至5重量幅用いると充分であるが、最も有効な範
囲はポリマーの種類により変わる;即ち、オレフィン、
ジエン及びスチレンポリマーについては0.Ol乃至2
.0重量%、好ましくは0.02乃至1.0重量%:塩
化ビニル及び塩化ビニリデンポリマーについては0.0
1乃至1.0重量%、好ましくは0.02乃至0.5重
量俤:そして、ポリウレタン及びポリアミドについては
0.01乃至5.0重量%、好ましくは0.02乃至2
.0重量%である。所望によυ、本発明の安定剤の2種
又はそれ以上を一諸に用いることができる。例えば、該
安定剤を液状又は乾燥粉末状で高分子と混合するか、あ
るいは該安定剤の懸濁液又は乳濁液を高分子の溶液、懸
濁液又は乳濁液と混合することができる。Typically, the stabilizer of the present invention is added at 0.00% based on the weight of the polymer.
It is sufficient to use a weight range of 01 to 5, but the most effective range varies depending on the type of polymer; i.e., olefins,
0 for diene and styrene polymers. Ol~2
.. 0% by weight, preferably 0.02 to 1.0% by weight: 0.0 for vinyl chloride and vinylidene chloride polymers
1 to 1.0% by weight, preferably 0.02 to 0.5% by weight: and for polyurethanes and polyamides 0.01 to 5.0% by weight, preferably 0.02 to 2% by weight.
.. It is 0% by weight. If desired, two or more stabilizers of the present invention can be used together. For example, the stabilizer can be mixed with the polymer in liquid or dry powder form, or a suspension or emulsion of the stabilizer can be mixed with a solution, suspension or emulsion of the polymer. .
本発明の高分子用安定剤は、高分子技術の分野で種々の
慣用の添加剤を適宜含ませることができ。The stabilizer for polymers of the present invention can appropriately contain various additives commonly used in the field of polymer technology.
例えばそのような添加剤として次のものがあげられる。Examples of such additives include the following:
フェノール系抗酸化剤
2.6−ジーt−ブチル−p−クレゾール:ステアリル
−β−(4−ヒドロキシ−3,5−X)−t−ブチルフ
ェニル)プロピオネート;ソステアリル(4−ヒドロキ
シ−3−メチル−5−t−ブチル〕ヘンシルマ0ネ−)
;2,2’−メチレンビス(4−メチル−6−t−ブチ
ルフェノール) ; 4,4’−メチレンビス(2,6
−ジーt−ブチルフェノール);2.2’−メチレンビ
ス(6−(1−メチルシクロヘキシル)p−クレゾール
〕;ビス〔3,3−ビス(4−ヒドロキシ−3−t−ブ
チルフェニル〕ブチリックアシッド〕グリコールエステ
ル;4,4’−ブチリデンビス(6−t−ブチル−m−
クレゾール) ; 1,1.3− トリス(2−メチル
−4−ヒドロキシ−5−t−ブチルフェニル)ブタン;
1,3.5−トリス(3,5−ノーt−ブチル−4−
ヒドロキシベンジル) −2,4,6−)リメチルベン
ゼン;3,9−ビス〔l、1−ツメチル−2−(3,5
−ジ−t−ブチル−4−ヒドロキシフェニル)エチル]
−2,4゜8、lO−テトラオキサスピロ(5,5]
ウウンデカン;テラ2キスメチレン−3−(3,5−ノ
ーt−ブチル−4−ヒドロキシフェニル)プロピオネー
ト)メタン; 1,3.5− )リス(3,5−ノーt
−ブチル−4−ヒドロキシペンノル)インシアヌレート
及び1,3.5− )リス〔3,5−シーt−ブチル−
4−ヒドロキシフェニル)フロピオニルオキシエチルコ
インシアヌレート;ビス(3−(3,5−ジーを一’−
Iチルー4−ヒドロキシフェニル)fロビオニル〕オキ
サミド。Phenolic antioxidants 2.6-di-t-butyl-p-cresol: Stearyl-β-(4-hydroxy-3,5-X)-t-butylphenyl)propionate; sostearyl (4-hydroxy-3-methyl -5-t-butyl]Hensilma0ne-)
;2,2'-methylenebis(4-methyl-6-t-butylphenol) ;4,4'-methylenebis(2,6
-di-t-butylphenol); 2,2'-methylenebis(6-(1-methylcyclohexyl) p-cresol); bis[3,3-bis(4-hydroxy-3-t-butylphenyl]butyric acid) Glycol ester; 4,4'-butylidene bis(6-t-butyl-m-
cresol); 1,1.3-tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane;
1,3,5-tris(3,5-not-butyl-4-
hydroxybenzyl)-2,4,6-)limethylbenzene; 3,9-bis[l,1-tmethyl-2-(3,5
-di-t-butyl-4-hydroxyphenyl)ethyl]
-2,4゜8, lO-tetraoxaspiro(5,5]
undecane; tera2kismethylene-3-(3,5-not-butyl-4-hydroxyphenyl)propionate)methane;
-butyl-4-hydroxypennor)in cyanurate and 1,3.5-)lis[3,5-sheet t-butyl-
4-hydroxyphenyl) phlopionyloxyethyl coin cyanurate; bis(3-(3,5-di-1'-
I-4-hydroxyphenyl)f-robionyl]oxamide.
ホスファイト系安定剤
トリス(2,4−ジ−t−ブチルフェニル)ホスファイ
ト、トリフェニルホスファイト;トリス(ノニルフェニ
ル)ホスファイト;ジステアリルペンタエリスリトール
ジホスファイ) ; 4,4−ブナリデンビス(3−
メチル−6−t−ブチルフェニル−ツートリデシル)ホ
スファイト;ビス(2,4−ジ−t−ブチルフェニル)
ペンタエリスリトール ジホスファイト。Phosphite stabilizers tris(2,4-di-t-butylphenyl) phosphite, triphenyl phosphite; tris(nonylphenyl) phosphite; distearylpentaerythritol (diphosphite); 4,4-bunalidene bis(3-
Methyl-6-t-butylphenyl-twotridecyl) phosphite; bis(2,4-di-t-butylphenyl)
Pentaerythritol diphosphite.
紫外線吸収剤
2−ヒドロキシ−4−メトキシベンゾフェノン;2−ヒ
ドロキシ−4−n−オクトキシベンゾフェノン; 2,
4−ジヒドロキシベンゾフェノン;2−(2′−ヒドロ
キシ−3′−t−ブチル−5′−メチルフェニル)−5
10ロペンソトリアゾール;2−(2′−ヒドロキシ−
3′、5′−ジ−t−ブチルフェニルクー5−クロロペ
ンツトリアゾール;2−(2′−ヒドロキシ−5′−メ
チルフェニル)ベンゾトリアゾール; 2− (2’−
ヒドロキシ−3′、5′−ジー1−アミルフェニル)ペ
ンゾトリアゾール:フェニルサリシレート; 2,4−
ジーt−7”テルフェニル−3,5−ジ−t−ブチル−
4−ヒドロキシベンゾエート。UV absorber 2-hydroxy-4-methoxybenzophenone; 2-hydroxy-4-n-octoxybenzophenone; 2,
4-dihydroxybenzophenone; 2-(2'-hydroxy-3'-t-butyl-5'-methylphenyl)-5
10 Lopensotriazole; 2-(2'-hydroxy-
3',5'-di-t-butylphenyl-5-chloropenttriazole;2-(2'-hydroxy-5'-methylphenyl)benzotriazole; 2- (2'-
Hydroxy-3',5'-di-1-amylphenyl)penzotriazole: phenyl salicylate; 2,4-
Di-t-7”terphenyl-3,5-di-t-butyl-
4-Hydroxybenzoate.
ニッケル系安定剤
Ni−モノエチル−3,5−ジ−t−ブチル−4−ヒド
ロキシベンジルホス7オネート;ブチルアミン−Ni
−2,2’−チオビス(4−t−オクチルフェルレート
)錯体;Ni−ジブチル−ジチオカルバメート;Ni−
3,5−ジ−t−ブチル−4−ヒドロキシベンゾエート
。Nickel stabilizer Ni-monoethyl-3,5-di-t-butyl-4-hydroxybenzylphos7onate; butylamine-Ni
-2,2'-thiobis(4-t-octylferrate) complex; Ni-dibutyl-dithiocarbamate; Ni-
3,5-di-t-butyl-4-hydroxybenzoate.
腐縁脂肪酸の金属塩 カルシウム、マグネシウム、バリウム、亜鉛。Metal salts of fatty acids Calcium, magnesium, barium, zinc.
カドミウム、鉛若しくはニッケルステアレート、カルシ
ウム、マグネシウム、カドミウム、バリウム若しくは亜
鉛ラウレート。Cadmium, lead or nickel stearate, calcium, magnesium, cadmium, barium or zinc laurate.
その他必要に応じ、重金属不活性剤、造核剤、有機錫化
合物、可塑剤、エポキシ化合物、顔料、充填剤、発泡剤
、帯電防止剤、滑剤、加工助剤等と併用することができ
る。If necessary, it can be used in combination with heavy metal deactivators, nucleating agents, organic tin compounds, plasticizers, epoxy compounds, pigments, fillers, foaming agents, antistatic agents, lubricants, processing aids, and the like.
この様にして安定化されたグラスチックは、非常に広範
な形態で1例えばフィルム、繊維、テープ、圧縮成形材
料、塗料組成物又はペイントとして使用できる。Glasses stabilized in this way can be used in a wide variety of forms, for example as films, fibers, tapes, compression molding materials, coating compositions or paints.
本発明を更に次の参考例及び実施例で説明するが、これ
らの参考例及び実施例において、全ての部及びパーセン
トは重量単位である。The present invention is further illustrated in the following Reference Examples and Examples, in which all parts and percentages are by weight.
参考例1
囚 2,2,6.6−チトラメチルー4−(ブチルアミ
ノ〕ビ被リジン
2.2,6.6−テトラメチル−4−ピペリドン155
Iとn−ブチルアミンs o、 o 、yをメタノール
300−に溶解したのち、酸化白金2.Ogを添加し、
中圧水添装置によシ室温で5時間、3気圧の水素と共に
振とうした。反応終了後、白金触媒を濾別した溶液から
溶剤を減圧下で留去したのち、蒸留にょシ精製し、沸点
100−101℃15電Hgの油状物として目的の化合
物201.5gを得た。Reference Example 1 2,2,6,6-titramethyl-4-(butylamino)bilysine 2,2,6,6-tetramethyl-4-piperidone 155
After dissolving I and n-butylamine so, o, y in methanol 300-, platinum oxide 2. Add Og,
The mixture was shaken in a medium-pressure hydrogenation apparatus at room temperature for 5 hours with 3 atm of hydrogen. After the reaction, the platinum catalyst was filtered off and the solvent was distilled off under reduced pressure, followed by purification by distillation to obtain 201.5 g of the target compound as an oil with a boiling point of 100-101° C. and 15 volts of Hg.
同様にして、相当するピペリドンとアミノ化合物から下
記の化合物を得た。Similarly, the following compound was obtained from the corresponding piperidone and an amino compound.
ピーリジン
沸点 80−83℃15■Hg
ピペリシン
沸点 68−70℃/ 3.5 mug参考例2
1.3.5− )リアジン
塩化シアヌル18.49”ffニジオキサン200−に
溶解した溶液に、2,2,6.6−チトラメチルー4−
(ブチルアミノ)ピペリジン43.6.9をジオキサン
100−に溶解した溶液を20−25℃でかきまぜなが
ら滴下した。同温度で2時間かきまぜたのち、さらに6
0−70℃で2時間かきまぜた。Piridine boiling point 80-83℃ 15■Hg Piperisine boiling point 68-70℃ / 3.5 mgReference example 2 1.3.5-) Lyazine cyanuric chloride 18.49"ff In a solution dissolved in nidioxane 200-, 2, 2,6.6-thitramethyl-4-
A solution of (butylamino)piperidine 43.6.9 dissolved in dioxane 100 was added dropwise at 20-25° C. while stirring. After stirring at the same temperature for 2 hours, add 6
Stir at 0-70°C for 2 hours.
反応終了後、ジオキサンを留去して得た残渣を10%炭
酸カリウム水浴液に投入し、酢酸エチルで抽出した。炭
酸カリウムで乾燥し、酢酸エチルを留去して得た油状物
をシリカダルカラムクロマトグラフィー〔溶離剤;酢酸
エチル:エタノール:トリエチルアミン(20:1:1
)の混合溶剤〕に付し、目的物52.5.9を得た。After the reaction was completed, dioxane was distilled off, and the resulting residue was poured into a 10% potassium carbonate water bath and extracted with ethyl acetate. The oily substance obtained by drying with potassium carbonate and distilling off ethyl acetate was subjected to silica dull column chromatography [eluent: ethyl acetate:ethanol:triethylamine (20:1:1
) to obtain the desired product 52.5.9.
融点 40−42℃
同様にして。相当するピペリジンと塩化シアヌルから下
記の化合物を得た。Melting point: 40-42℃ Similarly. The following compound was obtained from the corresponding piperidine and cyanuric chloride.
融点
126−127 ℃
融点 179−188℃
参考例3
アジン
参考例2− (B)で得られた2−クロロ−4,6−ビ
ス(N −(2,2,6,6−テトラメチル−4−ピペ
リジル〕エチルアミノ:) −1,3,5−トリアジン
12.OI、エタノールアミン2.3yと炭酸カリウム
2. Oyをジオキサン5〇−中で5時間加熱還流した
。Melting point 126-127°C Melting point 179-188°C Reference example 3 Azine Reference example 2-2-chloro-4,6-bis(N-(2,2,6,6-tetramethyl-4) obtained in (B) -Piperidyl]ethylamino:) -1,3,5-triazine 12.0I, ethanolamine 2.3y and potassium carbonate 2.0y were heated under reflux in dioxane 50 for 5 hours.
反応終了後、ジオキサンを減圧で留去し、酢酸エチル−
水の混合溶媒を加え、振とうした。酢酸エチル庖を分離
、乾燥、濃縮して得た残渣を酢酸エチルから再結晶し、
結晶として目的物11.6f1を得た。After the reaction, dioxane was distilled off under reduced pressure and ethyl acetate was added.
A mixed solvent of water was added and the mixture was shaken. The residue obtained by separating, drying, and concentrating the ethyl acetate was recrystallized from ethyl acetate.
The target object 11.6f1 was obtained as crystals.
融点 184−185℃
上記方法に準じて相当するクロロトリアジン化合物と相
当するアミノ化合物若しくはアルコール化合物との反応
から下記の化合物を得た。Melting point: 184-185°C According to the above method, the following compound was obtained from the reaction of the corresponding chlorotriazine compound with the corresponding amino compound or alcohol compound.
テトラメチル−4−ピペリジル〕アミノ〕−6−アジン
融点
157−159 ℃
アジン
融点
192−193 ℃
リアジン
融点
150−152 ℃
融点
127−128 ℃
融点
75 ℃
アジン
融点
130−132 ℃
アジン
融点
参考例4
166−168 ℃
囚 エチル N −(2,4−ソクロロー1,3.5−
)塩化シアヌル36.9g、エチル グリシネート塩酸
塩27.9 Fと炭酸水素ナトリウム33.6gをジオ
キサン200−中で30分間加熱還流した。Tetramethyl-4-piperidyl]amino]-6-azine Melting point 157-159 °C Azine melting point 192-193 °C Lyazine melting point 150-152 °C Melting point 127-128 °C Melting point 75 °C Azine melting point 130-132 °C Azine melting point reference example 4 166 -168℃ Ethyl N -(2,4-Sochloro1,3.5-
) 36.9 g of cyanuric chloride, 27.9 F of ethyl glycinate hydrochloride and 33.6 g of sodium bicarbonate were heated under reflux in dioxane 200 for 30 minutes.
反応終了後、ジオキサンを減圧で留去し、酢酸エチル−
水の混合溶媒を加え、振とうした。酢酸エチル層を分離
、乾燥、濃縮して得た残渣をヘキサン−酢酸エチルの混
合溶媒から再結晶し、結晶として目的物45.(lを得
た。After the reaction, dioxane was distilled off under reduced pressure and ethyl acetate was added.
A mixed solvent of water was added and the mixture was shaken. The ethyl acetate layer was separated, dried, and concentrated, and the resulting residue was recrystallized from a mixed solvent of hexane and ethyl acetate to obtain the desired product 45. as crystals. (I got l.
融点 82−87℃ ルプロビオネート 参考例4−囚の方法に準じて目的物を得た。Melting point: 82-87℃ Luprobionate The desired product was obtained according to the method of Reference Example 4.
融点 114−119℃
参考例4囚で得たエチル N −(2,4−ジクロロ−
1,3,5−)リアジン−6−イル)−グリシネ−)2
.36g、参考例1(8)で得た2、2,6.6−チト
ラメチルー4−(ブチルアミノ)ビイリジン4.191
と炭酸水素ナトリウム2.779をキシレン20−中で
29時間加熱還流した。反応終了後、キシレンを減圧で
留去し、ジクロロメタン−水の混合溶媒を加え、振とう
した。ジクロロメタン層を分離、乾燥、濃縮して得た残
渣をシリカダル力ラムうロマトグラフィー〔溶離剤;ヘ
キサン二ノエチルエーテル:エタノール:トリエチルア
ミン(20:10:1:1)の混合溶剤〕K付し目的物
を5.461得た。Melting point 114-119℃ Ethyl N-(2,4-dichloro-
1,3,5-)riazin-6-yl)-glycine)2
.. 36g, 2,2,6.6-titramethyl-4-(butylamino)biyridine obtained in Reference Example 1 (8) 4.191
and 2.779 g of sodium bicarbonate were heated under reflux in 20 mm of xylene for 29 hours. After the reaction was completed, xylene was distilled off under reduced pressure, a mixed solvent of dichloromethane and water was added, and the mixture was shaken. The dichloromethane layer was separated, dried, and concentrated, and the resulting residue was subjected to silica column chromatography [eluent: mixed solvent of hexane dinoethyl ether: ethanol: triethylamine (20:10:1:1)] with K to obtain the desired product. 5.461 was obtained.
融点 40℃ 参考例4(C)の方法に準じて下記の化合物を得た。Melting point: 40℃ The following compound was obtained according to the method of Reference Example 4(C).
す7ネート
リシネート
融点 133−136℃
融点 125−129℃
参考例4−(B)で得たメチル 2− [N −(2,
4−フクロロー1,3.5−トリアジン−6−イル〕〕
−アミノ−2−メチルプロピオネートと参考例1−(B
)で得た2、2.6.6−チトラメチルー4−(エチル
アミノ)ピペリジンから参考例4 (C’)の方法に準
じて目的物を得た。Methyl 2-[N-(2,
4-fuchloro1,3.5-triazin-6-yl]
-Amino-2-methylpropionate and Reference Example 1-(B
The desired product was obtained from 2,2.6.6-titramethyl-4-(ethylamino)piperidine obtained in ) according to the method of Reference Example 4 (C').
融点 231−232℃
ト塩酸塩2.’79fiと炭酸水素ナトリウム3.36
gをジオキサン100−中で1時間加熱還流した。反応
終了後、ジオキサンを減圧で留去し、酢酸エチル−水の
混合溶媒を加え、振とうした。酢酸エチル層を分離、乾
燥、濃縮して得た残渣、参考例1−(C)で得た2、2
.6,6−チトラメチルー4−(メチルアミノ)ピペリ
ジン6.809と炭酸水素ナトリウム3.36gをキシ
レン100TIt中で4時間加熱還流した。反応終了後
、キシレンを減圧で留去し、ジクロロメタン−水の混合
溶媒を加え、撮とうした。ジクロロメタン層を分離、乾
燥、′a1縮して得た残渣をシリカグルカラムクロマト
グラフィー〔溶離剤;酢酸エチル:エタノール:トリエ
チルアミン(15:1:1)の混合溶剤〕に付し目的物
8.03gを得た。Melting point 231-232℃ Hydrochloride 2. '79fi and sodium bicarbonate 3.36
was heated to reflux in dioxane 100°C for 1 hour. After the reaction was completed, dioxane was distilled off under reduced pressure, a mixed solvent of ethyl acetate and water was added, and the mixture was shaken. Residue obtained by separating, drying and concentrating the ethyl acetate layer, 2 and 2 obtained in Reference Example 1-(C)
.. 6.809 g of 6,6-titramethyl-4-(methylamino)piperidine and 3.36 g of sodium bicarbonate were heated under reflux for 4 hours in 100 TIt of xylene. After the reaction was completed, xylene was distilled off under reduced pressure, a mixed solvent of dichloromethane and water was added, and the mixture was photographed. The dichloromethane layer was separated, dried, and the resulting residue was subjected to silica glu column chromatography [eluent: mixed solvent of ethyl acetate: ethanol: triethylamine (15:1:1)] to obtain 8.03 g of the desired product. I got it.
融点 140−141℃
ラネート
塩化シアヌル3.69g、メチルDL−アラネーート〕
カプロラクタム2.26.9と35%!1!2.9をメ
タノール5−中で20時間加熱還流した。反応終了後、
メタノールを減圧で留去して得た残渣1.84I、塩化
シアヌル1.84 gと炭酸水素ナトリウム1.7gを
ジオキサン5−中で1時間加熱還流した。Melting point 140-141°C Lanate cyanuric chloride 3.69g, methyl DL-alanate] Caprolactam 2.26.9 and 35%! 1!2.9 was heated under reflux in methanol 5 for 20 hours. After the reaction is complete,
1.84 I of the residue obtained by distilling off methanol under reduced pressure, 1.84 g of cyanuric chloride, and 1.7 g of sodium hydrogen carbonate were heated under reflux in dioxane for 1 hour.
反応終了後、ジオキサンを減圧で留去し、酢酸エチル−
水の混合溶媒を加え、振とうした。酢酸エチル層を分離
、乾燥、濃縮して得た残渣をヘキサンから再結晶し、結
晶として目的物1. s OI k得た。After the reaction, dioxane was distilled off under reduced pressure and ethyl acetate was added.
A mixed solvent of water was added and the mixture was shaken. The ethyl acetate layer was separated, dried, and concentrated, and the resulting residue was recrystallized from hexane to obtain the desired product 1. I got s OI k.
融点 60−61℃
7後、キシレンを減圧で留去し、酢酸エチル−水の混合
溶媒を加え、振とうした。酢酸エテルNを分離、乾燥、
濃縮して得た残渣をシリカダルカラムクロマトグラフィ
ー〔溶離剤;酢酸エチル:エタノール:トリエチルアミ
ン(28:l:1)の混合溶剤〕に付し目的物1.15
、lil’を得た。Melting point: 60-61°C After 7 days, xylene was distilled off under reduced pressure, a mixed solvent of ethyl acetate and water was added, and the mixture was shaken. Separate and dry ethyl acetate N.
The residue obtained by concentration was subjected to silica dull column chromatography [eluent: mixed solvent of ethyl acetate: ethanol: triethylamine (28:l:1)] to obtain the desired product 1.15.
, lil' was obtained.
融点 48℃
実施例1
参考例4(6)で得たメチル [: 6−N−(2,4
,−ジクロロ−1,3,5−)リアジン−6−イル)−
アミノへキサノエー)〕11.15g参考例ICA)で
得た2、2,6,6−テトラメチル−4−ブチルアミノ
ピペリジン2.21と炭酸水素ナトリウム0.91をキ
シレン1〇−中で20時間加熱還流した。反応終診考例
3(B)で得た2、4−ビス〔N−エチル−N−(2,
2,6,6−チトラメテルー4−ピペリジル〕アミノ]
−6−(2−ヒドロキシエトキシ) −1゜3.5−)
リアジン1.60 g、ジメチルサクシネート0.22
.9をトルエン20m7!に溶解し、触媒として、チタ
ン酸テトライソグロビルを添迦し、まず、Zoo−10
5℃で3時間かきまぜ、生成するメタノールを留去し、
次いで130℃に加熱し、トルエンを留去した。反応終
了後、酢酸エチル−水の混合溶媒を加え、振とうした。Melting point 48°C Example 1 Methyl obtained in Reference Example 4 (6) [: 6-N-(2,4
,-dichloro-1,3,5-)riazin-6-yl)-
Reference Example 2.21 g of the 2,2,6,6-tetramethyl-4-butylaminopiperidine obtained in ICA) and 0.91 sodium bicarbonate were mixed in xylene 10 for 20 hours. The mixture was heated to reflux. 2,4-bis[N-ethyl-N-(2,4-bis[N-ethyl-N-(2,
2,6,6-titramethel-4-piperidyl]amino]
-6-(2-hydroxyethoxy) -1゜3.5-)
1.60 g of riazine, 0.22 g of dimethyl succinate
.. 9 to toluene 20m7! First, Zoo-10
Stir at 5°C for 3 hours, distill off the methanol produced,
Then, the mixture was heated to 130° C. and toluene was distilled off. After the reaction was completed, a mixed solvent of ethyl acetate and water was added and the mixture was shaken.
酢酸エチル層を分離、乾燥、濃縮して得た残渣をシリカ
ダルカラムクロマトグラフィー〔溶離剤;ジエチルエー
テル:エタノール:トリエチルアミン(10:3:1)
の混合溶剤〕に付し、目的物920mgを得た。The ethyl acetate layer was separated, dried, and concentrated, and the resulting residue was subjected to silica dull column chromatography [eluent: diethyl ether: ethanol: triethylamine (10:3:1)]
mixed solvent] to obtain 920 mg of the desired product.
融点 85℃ 上記の方法に準じて下記化合物を得た。Melting point: 85℃ The following compound was obtained according to the above method.
実施例2
実施例4
ミノエチル〕 ・サクシネート(化合物番号27)融点
90℃
実施例5
融点
実施例3
90 ℃
融点 70−75℃
実施例6
融点
80 ℃
融点 55−60℃
実施例7
ビス
〔
〔
2,4
ビス
〔N−プチルー
N
〔
N
−ブチル−
N
2,2.6.6
一テ
トラメチルー
−ト(化合物番号54
融点
℃
融点
℃
実施例8
実施例1
融点
℃
ト(化合物番号5
実施例9
融点
7 0 ℃
実施例1
ト
(化合物番号5
融点
0 ℃
融点
℃
実施例1
実施例1
N
〔
2,4
ビス〔
N
一プチルーN
2,2.6,
ジエチレングリコール
ビス〔
N
〔
2.4
ビ
融点
l
℃
〕
実施例l
融点
℃
実施例1
合物番号8
融点
0 ℃
番号6
実施例1
融点
0 ℃
実施例1
号58
融点
℃
融点
℃
実施例l
実施例1
ビス
〔
〔
2,4
ビスー
〔
N
−ブチルーN
アミ
ノ
〕
1,3.5
ト
リ
アジン−
−イル〕−ア
融点
℃
融点
℃
実施例2
融点
℃
実施例2
融点
0 ℃
実施例2
l
融点
0 ℃
融点
℃
実施例2
実施例2
ビスー
〔
〔
2,4
ビス〔N
一メチルーN一
2,2,6.6
−テ
トラメチルー
一ピベリゾル)
一グリシイル〕
一エチレンジア
ン(化合物番号
チルー
一ビペリジル)
−アミノ
〕
1,3.5
ト
〕
融点
℃
番号l
〕
実施例2
融点
l
℃
実施例2
物番号2
融点
℃
番号3
実施例2
融点
℃
実施例3
物番号l
融点
℃
物番号1
〕
実施例2
融点
l
0 ℃
実施例3
ビス
〔
N
−エチルーN
2.2.6.6−テ
ト
ラメチ
ヘキサンー
1.6
ジオール
ピスー〔N
〔2.4
号1l
融点
℃
番号l
実施例3
融点
℃
実施例3
号20
〕
融点
℃
物番号1
実施例3
融点
℃
実施例3
物番号1
融点
7 ℃
ト〕(化合物番号1
l
〕
実施例3
融点
℃
実施例3
融点
O ℃
実施例4
ネート
〕
(化合物番号1
l
融点
℃
実施例3
融点
℃
実施例4
号15
融点
℃
実施例3
融点
℃
実施例4
番号1
番号107)
融点 232℃
実施例43
グリシルオキシ〕エチル] −4−CN −C2,4−
番号157)
融点 218−224℃
実施例44
一テト2メチルビ(リジン(化合物番号118)融点
135−145℃
実施例46
ネート〕(化合物一番号126)
融点 90℃
実施例45
ウンデカン(化合物番号108)
融点 130℃
実施例47
チル] −2,4,8,10−テトラオキサスピロ[5
,5)ウンデカン(化合物番号35)
融点 120℃
実施例48
ビオネート(化合物番号125〕
融点 264−265℃
実施例49
(化合物番号148)
融点 58℃
実施例50
未安定化ポリプロピレン粉末(MFR=10−15)1
00部、酸化防止剤としてステアリル3− (3,5−
ジ第三ブチルー4−ヒドロキシフェニル)プロピオネー
ト0.3部及び本発明の安定剤0.25部をプラベンダ
ー・グラスデコーダー中、200℃で10分間混練して
均質にした。得られた塊を実験用プレス機で2−3■厚
のシートに圧延した。このシートの一部を油圧プレス機
で260℃で6分間加圧し、次いで直ちに冷水中に投入
して0.5謹厚のシートを得た。同様の方法によシ、0
.5鴎厚のシートから0.1 m厚のフィルムを成形し
、このフィルム’k 50 X 120 wmの試験片
に切断した。Example 2 Example 4 Minoethyl Succinate (Compound No. 27) Melting point 90°C Example 5 Melting point Example 3 90°C Melting point 70-75°C Example 6 Melting point 80°C Melting point 55-60°C Example 7 Bis[ [2] , 4 Bis[N-butyl-N [N-butyl-N 7 0 ℃ Example 1 Compound No. 5 Melting point 0 ℃ Melting point ℃ Example 1 Example 1 °C ] Example l Melting point °C Example 1 Compound No. 8 Melting point 0 °C No. 6 Example 1 Melting point 0 °C Example 1 No. 58 Melting point °C Melting point °C Example l Example 1 Bis [ [ [ 2,4 Bis] [ N - Butyl-N Amino] 1,3.5 Triazin--yl]-a Melting point °C Melting point °C Example 2 Melting point °C Example 2 Melting point 0 °C Example 2 l Melting point 0 °C Melting point °C Example 2 Example 2 Bis [ [ 2 ,4 Bis[N-methyl-N-2,2,6.6-tetramethyl-1-piberisol)-glycyyl]-ethylenediane (compound number thi-biperidyl)-amino]1,3.5 t] Melting point °C No. l] Implementation Example 2 Melting point l °C Example 2 Product number 2 Melting point °C Number 3 Example 2 Melting point °C Example 3 Product number l Melting point °C Product number 1] Example 2 Melting point l 0 °C Example 3 Bis[N-ethyl-N 2. 2.6.6-Tetramethyhexane-1.6 diolpisu [N [2.4 No. 1l Melting point °C No. 1 Example 3 Melting point °C Example 3 No. 20 ] Melting point °C Product number 1 Example 3 Melting point °C Example 3 Compound No. 1 Melting point 7 °C] (Compound No. 1 l) Example 3 Melting point °C Example 3 Melting point O °C Example 4 Nate] (Compound No. 1 l Melting point °C Example 3 Melting point °C Example 4 No. 15 Melting point °C Implementation Example 3 Melting point °C Example 4 No. 1 No. 107) Melting point 232 °C Example 43 Glycyloxy]ethyl] -4-CN -C2,4-
No. 157) Melting point 218-224°C Example 44 1-Tet2-methylbi(lysine (Compound No. 118) Melting point
135-145°C Example 46 Nate] (Compound No. 126) Melting point 90°C Example 45 Undecane (Compound No. 108) Melting point 130°C Example 47 Chil] -2,4,8,10-tetraoxaspiro[5
, 5) Undecane (Compound No. 35) Melting point 120°C Example 48 Bionate (Compound No. 125) Melting point 264-265°C Example 49 (Compound No. 148) Melting point 58°C Example 50 Unstabilized polypropylene powder (MFR=10- 15)1
00 parts, stearyl 3- (3,5-
0.3 parts of di-tert-butyl-4-hydroxyphenyl)propionate and 0.25 parts of the stabilizer of the invention were homogenized in a Prabender glass decoder at 200 DEG C. for 10 minutes. The resulting mass was rolled into a 2-3 inch thick sheet in a laboratory press. A portion of this sheet was pressed with a hydraulic press at 260° C. for 6 minutes, and then immediately placed in cold water to obtain a sheet with a thickness of 0.5 mm. In the same way, 0
.. A 0.1 m thick film was formed from a 5 mm thick sheet and the film was cut into test pieces of 50 x 120 wm.
この試験片をサンシャインカーがンウエデー・メータ中
黒板n度63±3℃で光に曝した。露光された試料を周
期的に引張試験を行ない、各試料について伸びが初期の
50%に低下する時間を劣化時間とした。試験結果は本
発明の安定剤の劣化時間と本発明の安定剤を無添加の対
照試料の劣化時間との比率で示す。The specimen was exposed to light in a sunshine car at a blackboard temperature of 63±3°C. The exposed samples were periodically subjected to a tensile test, and the time for each sample's elongation to drop to 50% of its initial value was defined as the deterioration time. The test results are expressed as the ratio of the deterioration time of the stabilizer of the present invention to the deterioration time of a control sample to which the stabilizer of the present invention was not added.
これらの結果を表2に示した。なお、化合物番号は前述
の化合物例に示した化合物を表わす。These results are shown in Table 2. In addition, the compound number represents the compound shown in the above-mentioned compound example.
例示化合物番号
耐光性(比率)
実施例51
実施例50で得られたポリプロピレン0.5ms+Ji
シートから、1010X100の試験片を作成し。Exemplary compound number Light resistance (ratio) Example 51 Polypropylene obtained in Example 50 0.5ms+Ji
A 1010x100 test piece was created from the sheet.
150℃のオープン中に径時し、脆化によシ白化するま
での日数を調べた。これらの結果を表3に示した。The specimens were left open at 150° C. and the number of days until whitening due to embrittlement was determined. These results are shown in Table 3.
Claims (1)
塩。 上記式中、R^1は水素原子、炭素数1乃至18個のア
ルキル基、炭素数3乃至22個を有するアルコキシアル
キル基、炭素数2乃至18個のアシル基、置換されてい
てもよいアラルキル基又は式 ▲数式、化学式、表等があります▼ (式中、R^4は後述するR^2と同意義を有す。)を
有する基を示す。 R^2は水素原子、炭素数1乃至18個のアルキル基、
炭素数2乃至18個のアシル基又は置換されていてもよ
いアラルキル基を示す。 Xは酸素原子又は式−NR^5−(式中、R^5は水素
原子又は炭素数1乃至4個のアルキル基を示す。)を有
する基を示す。 R^3は酸素原子で中断されていてもよい炭素数1乃至
6個のアルキレン基を示す。 Yは式−OCO−を有する基、式−COO−を有する基
、式−CONH−を有する基又は式−OCONH−を有
する基を示す。 nは2乃至4の整数を示す。 nが2のとき、Zは酸素原子、硫黄原子若しくは 式 ▲数式、化学式、表等があります▼ を有する基で中断されていてもよい炭素数1乃至18個
のアルキレン基、 式 ▲数式、化学式、表等があります▼ を有する基、 式 ▲数式、化学式、表等があります▼ を有する基又は 式 ▲数式、化学式、表等があります▼ を有する基 (上記式中、R^6は水素原子又は炭素数1乃至4個の
アルキル基を示し、pは1乃至4を示し、q及びには同
一又は異なって0乃至3を示す。)を示す。 nが3のとき、Zは窒素原子で中断されていてもよい炭
素数3乃至8個のアルカントリイル基を示す。 nが4のとき、Zは酸素原子で中断されていてもよい炭
素数4乃至8個のアルカンテトライル基を示す。 2)R^1が水素原子又は炭素数1乃至4個のアルキル
基である特許請求の範囲第1項の化合物。 3)R^2が水素原子又はメチル基である特許請求の範
囲第1項の化合物。 4)Xが−NH−又は−N(CH_3)−である特許請
求の範囲第1項の化合物。 5)R^3がメチレン基又はエチレン基である特許請求
の範囲第1項の化合物。 6)Yが式−OCO−を有する基、式−COO−を有す
る基又は式−CONH−を有する基である特許請求の範
囲第1項の化合物。 7)nが2であり、Zが炭素数2乃至8個のアルキレン
基である特許請求の範囲第1項の化合物。 8)R^1が炭素数1乃至4個のアルキル基であり、R
^2が水素原子であり、Xが−NH−であり、nが2で
あり、Zが炭素数2乃至8個のアルキレン基である特許
請求の範囲第1項の化合物。 9)R^3がメチレン基であり、Yが式−COO−を有
する基である特許請求の範囲第8項の化合物。 10)R^3がエチレン基であり、Yが式−OCO−を
有する基である特許請求の範囲第8項の化合物。[Claims] 1) A piperidyl-triazine derivative or an acid addition salt thereof having the formula ▲ Numerical formula, chemical formula, table, etc. ▼. In the above formula, R^1 is a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, an alkoxyalkyl group having 3 to 22 carbon atoms, an acyl group having 2 to 18 carbon atoms, or an optionally substituted aralkyl group. Group or formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (In the formula, R^4 has the same meaning as R^2 described later.) Indicates a group having the following. R^2 is a hydrogen atom, an alkyl group having 1 to 18 carbon atoms,
It represents an acyl group having 2 to 18 carbon atoms or an optionally substituted aralkyl group. X represents an oxygen atom or a group having the formula -NR^5- (wherein R^5 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms). R^3 represents an alkylene group having 1 to 6 carbon atoms which may be interrupted by an oxygen atom. Y represents a group having the formula -OCO-, a group having the formula -COO-, a group having the formula -CONH-, or a group having the formula -OCONH-. n represents an integer from 2 to 4. When n is 2, Z is an oxygen atom, a sulfur atom, or an alkylene group having 1 to 18 carbon atoms, which may be interrupted by a group having the formula ▲ Numerical formula, chemical formula, table, etc. ▼ Formula ▲ Numerical formula, chemical formula , tables, etc. ▼ Groups having the formula ▲ Numerical formulas, chemical formulas, tables, etc. ▼ Groups or formulas ▲ Numerical formulas, chemical formulas, tables, etc. ▼ Groups having the (In the above formula, R^6 is a hydrogen atom or represents an alkyl group having 1 to 4 carbon atoms, p represents 1 to 4, and q and are the same or different and represent 0 to 3). When n is 3, Z represents an alkantriyl group having 3 to 8 carbon atoms which may be interrupted by a nitrogen atom. When n is 4, Z represents an alkantetrayl group having 4 to 8 carbon atoms which may be interrupted by an oxygen atom. 2) The compound according to claim 1, wherein R^1 is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. 3) The compound according to claim 1, wherein R^2 is a hydrogen atom or a methyl group. 4) The compound according to claim 1, wherein X is -NH- or -N(CH_3)-. 5) The compound according to claim 1, wherein R^3 is a methylene group or an ethylene group. 6) The compound according to claim 1, wherein Y is a group having the formula -OCO-, a group having the formula -COO-, or a group having the formula -CONH-. 7) The compound according to claim 1, wherein n is 2 and Z is an alkylene group having 2 to 8 carbon atoms. 8) R^1 is an alkyl group having 1 to 4 carbon atoms, and R
The compound according to claim 1, wherein ^2 is a hydrogen atom, X is -NH-, n is 2, and Z is an alkylene group having 2 to 8 carbon atoms. 9) The compound according to claim 8, wherein R^3 is a methylene group and Y is a group having the formula -COO-. 10) The compound according to claim 8, wherein R^3 is an ethylene group and Y is a group having the formula -OCO-.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63270242A JP2731185B2 (en) | 1987-10-30 | 1988-10-26 | Piperidyl-triazine derivative |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27313887 | 1987-10-30 | ||
JP62-273138 | 1987-10-30 | ||
JP63270242A JP2731185B2 (en) | 1987-10-30 | 1988-10-26 | Piperidyl-triazine derivative |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02285A true JPH02285A (en) | 1990-01-05 |
JP2731185B2 JP2731185B2 (en) | 1998-03-25 |
Family
ID=26549118
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63270242A Expired - Fee Related JP2731185B2 (en) | 1987-10-30 | 1988-10-26 | Piperidyl-triazine derivative |
Country Status (1)
Country | Link |
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JP (1) | JP2731185B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111211350A (en) * | 2020-01-11 | 2020-05-29 | 山东理工大学 | Preparation method of melamine-ring-containing flame-retardant electrolyte easily soluble in organic solvent |
CN114736430A (en) * | 2022-02-17 | 2022-07-12 | 神马实业股份有限公司 | P/N-containing multi-element reactive nylon 66 flame retardant and preparation method thereof |
CN115960545A (en) * | 2022-12-05 | 2023-04-14 | 苏州易昇光学材料股份有限公司 | High-yellowing-resistant-grade weather-resistant self-repairing GPU (graphic processing Unit) protective film |
CN114736430B (en) * | 2022-02-17 | 2024-06-04 | 神马实业股份有限公司 | P/N-containing multi-element reactive nylon 66 flame retardant and preparation method thereof |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57167316A (en) * | 1981-03-21 | 1982-10-15 | Hoechst Ag | Piperidine group-containing high molecular weight ester and urethane, manufacture and use |
-
1988
- 1988-10-26 JP JP63270242A patent/JP2731185B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57167316A (en) * | 1981-03-21 | 1982-10-15 | Hoechst Ag | Piperidine group-containing high molecular weight ester and urethane, manufacture and use |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111211350A (en) * | 2020-01-11 | 2020-05-29 | 山东理工大学 | Preparation method of melamine-ring-containing flame-retardant electrolyte easily soluble in organic solvent |
CN111211350B (en) * | 2020-01-11 | 2023-02-10 | 山东理工大学 | Preparation method of melamine-ring-containing flame-retardant electrolyte easily soluble in organic solvent |
CN114736430A (en) * | 2022-02-17 | 2022-07-12 | 神马实业股份有限公司 | P/N-containing multi-element reactive nylon 66 flame retardant and preparation method thereof |
CN114736430B (en) * | 2022-02-17 | 2024-06-04 | 神马实业股份有限公司 | P/N-containing multi-element reactive nylon 66 flame retardant and preparation method thereof |
CN115960545A (en) * | 2022-12-05 | 2023-04-14 | 苏州易昇光学材料股份有限公司 | High-yellowing-resistant-grade weather-resistant self-repairing GPU (graphic processing Unit) protective film |
CN115960545B (en) * | 2022-12-05 | 2023-09-05 | 苏州易昇光学材料股份有限公司 | High-yellowing-resistant weather-resistant self-repairing GPU protective film |
Also Published As
Publication number | Publication date |
---|---|
JP2731185B2 (en) | 1998-03-25 |
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