JPH0228125A - 4-hydroxyphenyl aromatic compound and derivative thereof and production thereof - Google Patents
4-hydroxyphenyl aromatic compound and derivative thereof and production thereofInfo
- Publication number
- JPH0228125A JPH0228125A JP13028189A JP13028189A JPH0228125A JP H0228125 A JPH0228125 A JP H0228125A JP 13028189 A JP13028189 A JP 13028189A JP 13028189 A JP13028189 A JP 13028189A JP H0228125 A JPH0228125 A JP H0228125A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- alkyl
- compound
- represented
- phenylene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 4-hydroxyphenyl aromatic compound Chemical class 0.000 title claims abstract description 17
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 12
- 125000004122 cyclic group Chemical group 0.000 claims abstract description 10
- 125000001424 substituent group Chemical group 0.000 claims abstract description 5
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 claims abstract description 4
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims abstract description 4
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 4
- 150000002367 halogens Chemical class 0.000 claims abstract description 4
- 229920006395 saturated elastomer Polymers 0.000 claims abstract description 4
- 150000001875 compounds Chemical class 0.000 claims description 26
- 238000006356 dehydrogenation reaction Methods 0.000 claims description 19
- 229910052739 hydrogen Inorganic materials 0.000 claims description 13
- 239000001257 hydrogen Substances 0.000 claims description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 8
- 125000003118 aryl group Chemical group 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 4
- 238000009833 condensation Methods 0.000 claims description 4
- 230000005494 condensation Effects 0.000 claims description 4
- 125000005594 diketone group Chemical group 0.000 claims description 3
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 3
- 150000002431 hydrogen Chemical class 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- 150000001491 aromatic compounds Chemical class 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract description 10
- 238000006243 chemical reaction Methods 0.000 abstract description 3
- 229920000642 polymer Polymers 0.000 abstract description 3
- OAHMVZYHIJQTQC-UHFFFAOYSA-N 4-cyclohexylphenol Chemical compound C1=CC(O)=CC=C1C1CCCCC1 OAHMVZYHIJQTQC-UHFFFAOYSA-N 0.000 abstract 1
- 239000007859 condensation product Substances 0.000 abstract 1
- 239000002994 raw material Substances 0.000 abstract 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 18
- 239000003054 catalyst Substances 0.000 description 16
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 239000000203 mixture Substances 0.000 description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- 239000000047 product Substances 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 239000000370 acceptor Substances 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 241000551547 Dione <red algae> Species 0.000 description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 229960000583 acetic acid Drugs 0.000 description 3
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 229940125904 compound 1 Drugs 0.000 description 3
- 238000006482 condensation reaction Methods 0.000 description 3
- 239000012362 glacial acetic acid Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- QPUYECUOLPXSFR-UHFFFAOYSA-N 1-methylnaphthalene Chemical compound C1=CC=C2C(C)=CC=CC2=C1 QPUYECUOLPXSFR-UHFFFAOYSA-N 0.000 description 2
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000002841 Lewis acid Substances 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 229940125782 compound 2 Drugs 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- DCZFGQYXRKMVFG-UHFFFAOYSA-N cyclohexane-1,4-dione Chemical compound O=C1CCC(=O)CC1 DCZFGQYXRKMVFG-UHFFFAOYSA-N 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 2
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 2
- 238000002329 infrared spectrum Methods 0.000 description 2
- 150000007517 lewis acids Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 239000012265 solid product Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 150000003460 sulfonic acids Chemical class 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- ZLPBWAJPTCJOGV-HTQZYQBOSA-N (4ar,8ar)-2,3,4a,5,6,7,8,8a-octahydronaphthalene-1,4-dione Chemical compound C1CCC[C@H]2C(=O)CCC(=O)[C@@H]21 ZLPBWAJPTCJOGV-HTQZYQBOSA-N 0.000 description 1
- HJHDCWKDDNLLIS-UHFFFAOYSA-N 1,3,4,4a,5,7,8,8a-octahydronaphthalene-2,6-dione Chemical compound C1C(=O)CCC2CC(=O)CCC21 HJHDCWKDDNLLIS-UHFFFAOYSA-N 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- YZUPZGFPHUVJKC-UHFFFAOYSA-N 1-bromo-2-methoxyethane Chemical compound COCCBr YZUPZGFPHUVJKC-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- MKIFFVCLZZRCQL-UHFFFAOYSA-N 2,3,4,4a,6,7,8,8a-octahydronaphthalene-1,5-dione Chemical compound C1CCC(=O)C2C1C(=O)CCC2 MKIFFVCLZZRCQL-UHFFFAOYSA-N 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- OQIDYCVWAFZRTR-UHFFFAOYSA-N 4-(4-oxocyclohexyl)cyclohexan-1-one Chemical compound C1CC(=O)CCC1C1CCC(=O)CC1 OQIDYCVWAFZRTR-UHFFFAOYSA-N 0.000 description 1
- QDWPNFNKNZPTTC-UHFFFAOYSA-N 4-[1,4,4-tris(4-hydroxyphenyl)cyclohexyl]phenol Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)CCC(C=2C=CC(O)=CC=2)(C=2C=CC(O)=CC=2)CC1 QDWPNFNKNZPTTC-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 239000007868 Raney catalyst Substances 0.000 description 1
- 229910000564 Raney nickel Inorganic materials 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- 150000001243 acetic acids Chemical class 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 229910001860 alkaline earth metal hydroxide Inorganic materials 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000001345 alkine derivatives Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 1
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 description 1
- 229910001863 barium hydroxide Inorganic materials 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000003729 cation exchange resin Substances 0.000 description 1
- 229940023913 cation exchange resins Drugs 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- HJSLFCCWAKVHIW-UHFFFAOYSA-N cyclohexane-1,3-dione Chemical compound O=C1CCCC(=O)C1 HJSLFCCWAKVHIW-UHFFFAOYSA-N 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- WVIIMZNLDWSIRH-UHFFFAOYSA-N cyclohexylcyclohexane Chemical compound C1CCCCC1C1CCCCC1 WVIIMZNLDWSIRH-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229960002089 ferrous chloride Drugs 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 125000000468 ketone group Chemical group 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- HBEQXAKJSGXAIQ-UHFFFAOYSA-N oxopalladium Chemical compound [Pd]=O HBEQXAKJSGXAIQ-UHFFFAOYSA-N 0.000 description 1
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical compound [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 1
- 230000020477 pH reduction Effects 0.000 description 1
- 229910003445 palladium oxide Inorganic materials 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- GUVXZFRDPCKWEM-UHFFFAOYSA-N pentalene Chemical compound C1=CC2=CC=CC2=C1 GUVXZFRDPCKWEM-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-M phenolate Chemical compound [O-]C1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-M 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 229910003446 platinum oxide Inorganic materials 0.000 description 1
- 229920001643 poly(ether ketone) Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920000151 polyglycol Polymers 0.000 description 1
- 239000010695 polyglycol Substances 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- RSPCKAHMRANGJZ-UHFFFAOYSA-N thiohydroxylamine Chemical class SN RSPCKAHMRANGJZ-UHFFFAOYSA-N 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C37/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring
- C07C37/50—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring by reactions decreasing the number of carbon atoms
- C07C37/52—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring by reactions decreasing the number of carbon atoms by splitting polyaromatic compounds, e.g. polyphenolalkanes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C319/00—Preparation of thiols, sulfides, hydropolysulfides or polysulfides
- C07C319/02—Preparation of thiols, sulfides, hydropolysulfides or polysulfides of thiols
- C07C319/12—Preparation of thiols, sulfides, hydropolysulfides or polysulfides of thiols by reactions not involving the formation of mercapto groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C319/00—Preparation of thiols, sulfides, hydropolysulfides or polysulfides
- C07C319/14—Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides
- C07C319/20—Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides by reactions not involving the formation of sulfide groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
- C07C49/83—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups polycyclic
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は4−ヒドロキシフェニル芳香族化合物、特にビ
ス(4−ヒドロキシフェニル)芳香族化合物およびその
誘導体の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a process for producing 4-hydroxyphenyl aromatic compounds, particularly bis(4-hydroxyphenyl) aromatic compounds and derivatives thereof.
4.4′〜ジヒドロキシ−p−ターフェニル、および関
連する化合物はポリエーテル、ポリエーテルケトン、ポ
リエーテルスルホン、ポリエステル、ポリカーボネート
および他のポリマーの製造に用途が見い出されている。4.4'-dihydroxy-p-terphenyl, and related compounds find use in the production of polyethers, polyetherketones, polyethersulfones, polyesters, polycarbonates, and other polymers.
未置換化合物は高性能エンジニアリングポリマーの製造
に特に有効である。Unsubstituted compounds are particularly useful in making high performance engineering polymers.
本発明の第1の態様に従い、下式■
X −Ph−Ar−Ph −X (I )
〔上式中、静は1,4−フェニレン、1,3−フェニレ
ンまたは直接に結合しているあるいはC01SO□、0
.SまたはCRY(各Rは独立に水素、01〜C4アル
キルあるいはフルオロアルキルまたはフェニルを表わす
)により結合している少なくとも2個の芳香族基を含む
ポリ芳香族基より選ばれる置換あるいは未置換芳香族基
であり;Phは所望によりC2〜C4アルキル、ハロゲ
ンまたはヒドロキシより選ばれた1個あるいは2個の置
換基で置換した1、4−フェニレンであり;XはOB
、 SR。According to the first aspect of the present invention, the following formula (I)
[In the above formula, static is 1,4-phenylene, 1,3-phenylene, or directly bonded or C01SO□,0
.. Substituted or unsubstituted aromatic groups selected from polyaromatic groups containing at least two aromatic groups linked by S or CRY (each R independently represents hydrogen, 01-C4 alkyl or fluoroalkyl or phenyl) Ph is 1,4-phenylene optionally substituted with one or two substituents selected from C2-C4 alkyl, halogen or hydroxy; X is OB
, S.R.
OR”またはSR”(R”はCl−C4アルキルまたは
例えばメチルあるいはter t−ブチルまたはベンジ
ルである)である〕
で表わされるビス(4−ヒドロキシフェニル)芳香族化
合物およびその誘導体の製造方法は、下式■(上式中、
Aは水素を除去した際暴行を生ずる飽和あるいは一部飽
和環式基である)
で表わされる化合物の脱水素化工程を含んでなる。OR" or SR"(R" is Cl-C4 alkyl or e.g. methyl or tert-butyl or benzyl)] and its derivatives. The lower formula ■ (in the upper formula,
A is a saturated or partially saturated cyclic group that produces agitation when hydrogen is removed.
「直接結合」とは、芳香族基がビフェニレンおよびクー
フェニレン内として環の間の直接結合により結合してい
ることをまたはナフタレンあるいはペンタレン内として
縮合環システムで結合していることを意味する。"Direct bond" means that the aromatic groups are bonded by a direct bond between the rings, as in biphenylene and cuphenylene, or in a fused ring system, as in naphthalene or pentalene.
基Phは置換している場合、好ましくは基Xに対し2ま
たは3位で置換している。If the group Ph is substituted, it is preferably substituted in the 2 or 3 position relative to the group X.
ポリ芳香族基Ar(7)例は、Ph5OZPh、PhC
0Ph、Ph0Ph。Examples of polyaromatic groups Ar(7) are Ph5OZPh, PhC
0Ph, Ph0Ph.
Ph5Ph、PhCR”ZPh (各R1は独立ニH、
CH,、またはCbHsを表わす)、およびナフチレン
(I、4; 1゜5;2,6;2,7)を含む。Ph5Ph, PhCR”ZPh (Each R1 is an independent DH,
CH, or CbHs), and naphthylene (I, 4; 1°5; 2,6; 2,7).
脱水素化は脱水素化触媒の存在下で行なわれる。Dehydrogenation is carried out in the presence of a dehydrogenation catalyst.
これは白金触媒、例えば白金担体触媒(例えばpi−C
);金属白金;酸化白金等フパラジウム触媒、例えばパ
ラジウム担体触媒(例えばPd−C,PdBaSO4、
Pd MgO、Pd CaO、Pd AfzO3);金
属パラジウム;酸化パラジウム等;ロジウム触媒、例え
ばロジウム組体触媒(例えばRh−C);ルテニウムま
たはレニウム触媒を含む。池の触媒はラニニノケル、ラ
ニーコバルト、アルいはラニー1同;還元ニッケル、コ
バルトあるいは銅;ニッケル担体、コバルト担体あるい
は銅担体触媒を含む。基質が反応性基を含まない場合白
金群金属の使用が好ましい。This is a platinum catalyst, e.g. a platinum supported catalyst (e.g. pi-C
); metallic platinum; palladium catalysts such as platinum oxide, e.g. palladium supported catalysts (e.g. Pd-C, PdBaSO4,
Pd MgO, Pd CaO, Pd AfzO3); metallic palladium; palladium oxide, etc.; rhodium catalysts, such as rhodium composite catalysts (e.g. Rh-C); ruthenium or rhenium catalysts. Pond catalysts include Raney nickel, Raney cobalt, Al or Raney 1, reduced nickel, cobalt or copper; nickel supported, cobalt supported or copper supported catalysts. The use of platinum group metals is preferred if the substrate does not contain reactive groups.
白金群金属脱水素化触媒の量は、化合物■に対し0.0
01〜0.2モルの触媒金属であるが、他の比を用いて
もよい。The amount of platinum group metal dehydrogenation catalyst is 0.0 for compound ■
01-0.2 moles of catalyst metal, although other ratios may be used.
部分脱水素化は塩基、例えばNa0IIの存在下式■の
化合物の熱分解により行なわれる。Partial dehydrogenation is carried out by thermal decomposition of the compound of formula (1) in the presence of a base, such as Na0II.
脱水素化は酸あるいは塩基の存在下で行ってよいがいず
れも用いる必要がない。塩基、例えば水酸化アルカリ金
属、例えば水酸化すl・リウムあるいは水酸化カリウム
、水酸化アルカリ土類金属、例えば水酸化マグネシウム
あるいは水酸化バリウム、カーボネート、例えば炭酸ナ
トリウム、アセテートおよびフェノキシトの使用が好ま
しい。強塩基、例えば水酸化ナトリウムの使用が好まし
い。Dehydrogenation may be carried out in the presence of an acid or a base, but it is not necessary to use either. Preference is given to using bases such as alkali metal hydroxides such as sulfur hydroxide or potassium hydroxide, alkaline earth metal hydroxides such as magnesium hydroxide or barium hydroxide, carbonates such as sodium carbonate, acetate and phenoxide. . Preference is given to using strong bases, such as sodium hydroxide.
酸触媒はルイス酸、例えば塩化アルミニウム、塩化第一
鉄、および塩化第一錫;スルホン酸、例えば4−トルエ
ンスルホン酸およびCF35O,Hを含む。Acid catalysts include Lewis acids such as aluminum chloride, ferrous chloride, and stannous chloride; sulfonic acids such as 4-toluenesulfonic acid and CF35O,H.
水素受容体は必須ではないが用いてよい。用いてよい従
来の水素受容体は、硫黄、セレニウム、キノンおよび不
飽和化合物、例えばアルケンまたはアルキンを含む。ア
ゾ、ニトロ、カルボニルまたはフェノール化合物も用い
てよい。特に、有効な化合物を形成する場合、不飽和化
合物、例えばα−メチルスチレンまたはフェノールが好
ましい。Hydrogen acceptors are not required, but may be used. Conventional hydrogen acceptors that may be used include sulfur, selenium, quinones and unsaturated compounds such as alkenes or alkynes. Azo, nitro, carbonyl or phenolic compounds may also be used. Particularly when forming useful compounds, unsaturated compounds are preferred, such as .alpha.-methylstyrene or phenol.
α−メチルスチレンはクメンヲ生し、フェノールはシク
ロヘキサノンまたはシクロヘキサノールを生ずる。α-Methylstyrene produces cumene, and phenol produces cyclohexanone or cyclohexanol.
脱水素化は好ましくは100〜400°C1より好まし
くは150〜300’Cの温度において行なわれる。The dehydrogenation is preferably carried out at a temperature of 100 to 400°C, more preferably 150 to 300'C.
溶媒の使用が好ましい。従来の脱水素化溶媒を用いてよ
い。溶)夜中の反応は通常比較的高沸点溶媒、例えばク
メン、P−クメン、デカリン、ニトロヘンゼン、ナフタ
レン、キノリンあるいは1−メチルナフタレン中で還流
下で行なわれる。ポリグリコールエーテル、例えばトリ
グリムはその水との相溶性のため仕上げの間の除去の都
合よさおよび広範囲の沸点の利点を与える。混合物を撹
拌するためおよび′tI離したシステムからの水素を除
去するため激しく沸騰させまたは溶液に不活性ガスを通
すことがしばしば行なわれる。溶媒として水素受容体を
用いてもよい。好ましい方法において、水素受容体は下
式■、
HPhX ([)で表わさ
れ、例えばフェノールであり、式■の化合物を製造する
縮合反応に用いられる。この脱水素化工程に水が存在し
てよい。Preference is given to using a solvent. Conventional dehydrogenation solvents may be used. The overnight reaction is usually carried out under reflux in a relatively high-boiling solvent such as cumene, p-cumene, decalin, nitrohenzene, naphthalene, quinoline or 1-methylnaphthalene. Polyglycol ethers, such as triglyme, offer convenience of removal during finishing and the advantage of a wide range of boiling points due to their compatibility with water. Vigorous boiling or passing an inert gas through the solution is often used to stir the mixture and remove hydrogen from the isolated system. A hydrogen acceptor may be used as a solvent. In a preferred method, the hydrogen acceptor is represented by the following formula (2), HPhX ([), for example phenol, and is used in the condensation reaction to produce the compound of formula (2). Water may be present in this dehydrogenation step.
トリアリール化合物の形成は脱水素化が例えばシクロヘ
キサノンおよびフェノールからのビアリ、−ル化合物の
形成よりも低温で進行する点で有利である。これはテト
ラキス化合物から2分子のHP h X、例えばフェノ
ールの除去の際2fIIの二重結合の形成に帰因する。The formation of triaryl compounds is advantageous in that the dehydrogenation proceeds at lower temperatures than, for example, the formation of biaryl compounds from cyclohexanone and phenol. This is attributed to the formation of a 2fII double bond upon removal of two molecules of HP h X, eg phenol, from the tetrakis compound.
弐■の化合物は、弐■の化合物と環式ジオンとの縮合に
より製造される。米国特許第4277600号に記載さ
れた都合のよい方法は、これらの試剤の混合物への塩化
水素の通過を含む。Compound 2) is produced by condensation of compound 2) and a cyclic dione. A convenient method described in US Pat. No. 4,277,600 involves passing hydrogen chloride through a mixture of these reagents.
適当なジオンは、シクロヘキサン−1,4−ジオン、シ
クロヘキサン−1,3−ジオン、ビシクロへキシル−4
,4′−ジオン、ビシクロへキシル−3,4′−ジオン
、プロパン−2,2−ビス(シクロヘキサン−4−オン
)、ビシクロヘキサン(3,3,0)−2,5−ジオン
(ベンタランジオノ)、デカリン−1,5−ジオン、デ
カリン−1,4−ジオン、デカリン−2,6−ジオン、
ビス(シクロヘキシル)−ケトン−4,4′−ジオン、
およびビス(シクロヘキシル)スルホン−4,4′−ジ
オンを含む。保護されたあるいはマスクされたジオン、
例えばこれらのジオンのテトラアセテートあるいはビス
ケタールを用いてよい。Suitable diones include cyclohexane-1,4-dione, cyclohexane-1,3-dione, bicyclohexyl-4
, 4'-dione, bicyclohexyl-3,4'-dione, propane-2,2-bis(cyclohexane-4-one), bicyclohexane(3,3,0)-2,5-dione (bentalan) dione), decalin-1,5-dione, decalin-1,4-dione, decalin-2,6-dione,
bis(cyclohexyl)-ketone-4,4'-dione,
and bis(cyclohexyl)sulfone-4,4'-dione. protected or masked Zeon,
For example, tetraacetates or bisketals of these diones may be used.
置換ジオンを用いてもよい。適当な置換基はRおよびC
02R(RはC5〜C4アルキルを表わす)を含む。Substituted diones may also be used. Suitable substituents are R and C
02R (R represents C5-C4 alkyl).
本発明の第2の態様に従い、下式■、
(X−Ph)、、 −八r
(IV )(上式中、Ar 、 PhおよびXは
前記規定のものであり、nは1または2である)
で表わされる4−ヒドロキシフェニル芳香族化合物また
はその誘導体の製造方法は、下式Vで表わされる化合物
の形成工程を含んでなり、基Aに相当する環式モノある
いはジケトンと下式■HPhX
(I[[)で表わされる化合物の縮合および化合
物■の脱水素化により、この脱水素化は化合物Vを単離
しないで行なわれる。According to the second aspect of the present invention, the following formula (1), (X-Ph), -8r
(IV) (In the above formula, Ar, Ph and A step of forming a compound represented by a cyclic mono- or diketone corresponding to group A and the following formula HPhX
By condensation of the compound represented by (I[[) and dehydrogenation of compound 1, this dehydrogenation is carried out without isolation of compound V.
環式モノあるいはジケトンは保護されたまたはマスクさ
れた形状で導入される。これはn=2、化合物■が前記
の化合物■である場合認められる。Cyclic mono- or diketones are introduced in protected or masked form. This is observed when n=2 and compound (2) is the above-mentioned compound (2).
この方法はビフェニルおよびターフェニル化合物の工業
スケール製造に特定の用途が見い出されている。例えば
、EP240362およびEP251614に開示され
た化合物はこの方法により経済的に製造される。この方
法は1個の反応容器内での操作を可能とし、本発明の産
業上の利用を促進する。This process has found particular application in the industrial scale production of biphenyl and terphenyl compounds. For example, the compounds disclosed in EP240362 and EP251614 are economically produced by this method. This method allows operation within one reaction vessel, facilitating industrial application of the present invention.
縮合段階において、化合物■反応体はケト基の好ましく
は例えば2〜20、特に5〜10倍過剰で存在する。従
ってそれは両方の段階において溶媒としておよび脱水素
化段階において水素受容体として作用する。In the condensation step, the compound 1 reactant is preferably present in an excess of, for example 2 to 20, especially 5 to 10 times, the keto groups. It therefore acts as a solvent in both stages and as a hydrogen acceptor in the dehydrogenation stage.
縮合反応は好ましくは酸触媒化である。適当な酸触媒は
、ブロンステソF酸(所望により水の存在下)、例えば
IIX(X=F 、 C/2 、Br、 I)、)+2
sO4、H3PO4、ハロゲン化酢酸、スルホン酸、例
えばベンゼンスルホン酸、トリフル酸、高分子酸、例え
ばスルホン酸基を含む陽イオン交換樹脂(例えばAmb
erlyst 15、Nafion−H)である。ルイ
ス酸、例えば[lF3 、AlC1y 、ZnC1z
、またはアルミニウムフェネートをそれのみまたは上記
ブロンステ・7ド酸と組み合せて用いてよい。酸形状の
ゼオライトを用いてよい。例えば総反応混合物の1〜1
0%w / wで水が存在する場合、その後の脱水素化
の生成物の純度は影響されないと考えられる。特に、気
体塩化水素のかわりに濃塩酸を用いてよく、塩酸中に存
在するおよび縮合反応により形成する水は1留によりそ
の後除去される。The condensation reaction is preferably acid catalyzed. Suitable acid catalysts include Bronsteso F acids (optionally in the presence of water), such as IIX (X=F, C/2, Br, I), )+2
sO4, H3PO4, halogenated acetic acids, sulfonic acids such as benzenesulfonic acid, triflic acid, polymeric acids such as cation exchange resins containing sulfonic acid groups (such as Amb
erlyst 15, Nafion-H). Lewis acids, such as [lF3, AlC1y, ZnC1z
, or aluminum phenate may be used alone or in combination with the Bronsted heptad acids described above. Zeolites in acid form may be used. For example 1-1 of the total reaction mixture
When water is present at 0% w/w, it is believed that the purity of the product of subsequent dehydrogenation is not affected. In particular, concentrated hydrochloric acid may be used instead of gaseous hydrogen chloride, the water present in the hydrochloric acid and formed by the condensation reaction being subsequently removed in one distillation.
さらに、チオールあるいはチオエーテル基を含む促進剤
、例えば11□S、アルキルメルカプタン、メルカプト
−アミンあるいはチアゾールを上記酸と共に用いてよい
。Additionally, promoters containing thiol or thioether groups, such as 11□S, alkylmercaptans, mercapto-amines or thiazoles, may be used with the above acids.
化合物■反応体は、4位において置換していなシ)どの
ような化合物であってよい。好ましい化合物において、
XはOHである。ケトン反応体はどの上記ジオンまたは
相当するモノケトンであってよい。Compound (1) The reactant may be any compound that is not substituted at the 4-position. In preferred compounds,
X is OH. The ketone reactant can be any of the above diones or corresponding monoketones.
脱水素化段階に対し、未反応化合物■を含む化合物Vの
溶液は強塩基、例えばNaOHの添加によりアルカリ性
にされる。脱水素化触媒、例えばPdCが加えられ、温
度を160〜200”Cに上げ水を蒸留する。次いでこ
の混合物を脱水素化が完了するまで(例えば4時間)還
流上加熱し、次いで冷却し酸性化する。酸性化後、所望
により低温での濾過を促進するため溶液として未反応お
よび発生したフェノールを保つため水の添加後、得られ
る混合物より生成物化合物■を濾過する。For the dehydrogenation step, the solution of compound V containing unreacted compound 1 is made alkaline by addition of a strong base, for example NaOH. A dehydrogenation catalyst, e.g. PdC, is added and the temperature raised to 160-200"C to distill the water. The mixture is then heated at reflux until the dehydrogenation is complete (e.g. 4 hours), then cooled and acidified. After acidification, the product compound (1) is filtered from the resulting mixture, optionally after addition of water to keep unreacted and generated phenol in solution to facilitate filtration at low temperatures.
化合物■を形成するため、塩基触媒、例えばNaまたは
にフェネートを用いてよい。この際脱水素化前のアルカ
リの添加は必要ない。To form compound (1), a basic catalyst such as Na or phenate may be used. In this case, addition of alkali before dehydrogenation is not necessary.
本発明をさらに例により説明するが、限定するものでは
ない。The invention will be further illustrated by way of example without limiting it.
炎上
米国特許第4.776、004号の例1に開示された方
法に従いテトラフェノール、1,1,4.4−−j−ト
ラキス(4−ヒドロキシフェニル)シクロヘキサンを製
造した。Tetraphenol, 1,1,4.4-j-trakis(4-hydroxyphenyl)cyclohexane, was prepared according to the method disclosed in Example 1 of FLAME US Pat. No. 4,776,004.
このテトラフェノール(mp 316〜324°C)は
’Hおよび” C−NMRにより少なくとも純度95%
であることが示された。This tetraphenol (mp 316-324°C) is at least 95% pure by 'H and 'C-NMR.
It was shown that
Ho−OH凌()OH
ステンレススチールオートクレーブ内で水酸化ナトリウ
ム(0,82g)、木炭上5%パラジウム(0,12g
)、α−メチルスチレン(6,60g )および水(3
0h+4りと共に1.1,4.4−テトラキス(4−ヒ
ドロキシフェニル)シクロヘキサン(I3,58g )
を250°Cで3.5時間加熱した。さらに水酸化ナト
リウム(2,0g)を加え、この混合物を撹拌しなから
氷酢酸(50戚)に注いだ。固体生成物を集め、水洗し
、真空下50’Cで乾燥した。Sodium hydroxide (0,82 g), 5% palladium on charcoal (0,12 g) in a stainless steel autoclave.
), α-methylstyrene (6,60g) and water (3
1,1,4,4-tetrakis(4-hydroxyphenyl)cyclohexane (I3,58g) with 0h+4
was heated at 250°C for 3.5 hours. Further sodium hydroxide (2.0 g) was added and the mixture was poured into glacial acetic acid (50%) while stirring. The solid product was collected, washed with water and dried under vacuum at 50'C.
この4.4″−ジヒドロキシ−p〜ターフェニ/l/
(7,88g )は1Hおよび’ ”C−NMRニよす
純度95%であることが示された。 ’)I−NMI?
スペクトルは6.98 、7.63および7.73pP
II+において共鳴を含んでいた。’ ”C−IJMR
スペクトルは115.6.125.9127、L 13
0.3.138.0および156−9ppI11におい
て共鳴を含んでいた。実測C=81.84%、H=5.
51%、計算C−82,42%、)(=5.38%。こ
の生成物の融点は密閉チューブ内で測定し、378.6
〜380.6“Cであった。This 4.4″-dihydroxy-p~terpheni/l/
(7.88 g) was shown to be 95% pure by 1H and C-NMR.') I-NMI?
Spectra are 6.98, 7.63 and 7.73pP
It contained a resonance at II+. ' ``C-IJMR
The spectrum is 115.6.125.9127, L 13
It contained resonances at 0.3.138.0 and 156-9ppI11. Actual measurement C=81.84%, H=5.
51%, calculated C-82, 42%, ) (=5.38%. The melting point of this product was determined in a closed tube and was 378.6
~380.6"C.
窒素流入口、撹拌器、温度計および長い空気冷却器を取
り付けた11の三ロフラスコに1.4−シクロへキサジ
オン(0,40モル、44.8g)およびフェノール(
6,4モル、600g)を加えた。この混合物を50°
Cに加熱し溶液を形成し、濃塩酸(sg = 1.18
) (20tall )を加えた。次いでこの混合物を
50’Cで7,0時間撹拌した。1,4-Cyclohexadione (0.40 mol, 44.8 g) and phenol (
6.4 mol, 600 g) was added. This mixture was heated at 50°
C to form a solution and add concentrated hydrochloric acid (sg = 1.18
) (20tall) was added. The mixture was then stirred at 50'C for 7.0 hours.
水酸化ナトリウム(0,75モル、30g)および炭素
上5%パラジウム(2,0g)を加え、ボット温度が1
80°Cに達するまで低沸点物質を除去した(約50m
1)。次いでこの混合物を4時間還流しく180〜18
5°C)、50“Cに冷却し、氷酢酸(60滅)および
水(I00d)を加えた。Add sodium hydroxide (0,75 mol, 30 g) and 5% palladium on carbon (2,0 g) until the bot temperature is 1
Low-boiling substances were removed until a temperature of 80°C was reached (approximately 50 m
1). The mixture was then refluxed for 4 hours at 180-18
5°C), cooled to 50"C and added glacial acetic acid (60°C) and water (100d).
固体生成物を集め、フェノールの臭気がなくなるまで5
0°Cで水洗しく3 X 300rn1) 、真空下1
00°Cで乾燥し、36.7g得た(触媒(2,0g)
を考慮に入れ、1.4−シクロヘキサンジオンに対し収
率35.0%)。Collect the solid product and incubate until the phenol odor disappears.
Rinse with water at 0°C 3 x 300rn1), under vacuum 1
Dry at 00°C to obtain 36.7g (catalyst (2.0g)
(Yield 35.0% based on 1,4-cyclohexanedione).
生成物をN−メチルピロリドン(NMP) (I75m
l)より再結晶させ、150’Cに加熱し、濾過しPd
/C触媒を除去した。生成物を集め、1度合NMP(5
0d)で、2度メタノール(50mf)で洗い、真空下
120’Cで3時間乾燥した。The product was converted to N-methylpyrrolidone (NMP) (I75m
1), heated to 150'C, filtered and Pd
/C catalyst was removed. The product was collected and diluted once with NMP (5
0d), washed twice with methanol (50mf) and dried under vacuum at 120'C for 3 hours.
収量は24.43gであり、ipは378〜381°C
であった。赤外スペクトルにより例2の生成物が示され
た。Yield is 24.43g, ip is 378-381°C
Met. The infrared spectrum showed the product of Example 2.
14.4”−ジヒ ロキシー −−フエ窒素流入口、撹
拌器、温度計および長い空気冷却器を取り付けた500
mff1の三ロフラスコに1,4−シクロへキサジオン
ビス(エチレンケクール)([120モル、40.04
g )およびフェノール(2,13モル、200 g
)を加えた。この混合物を70 ’Cに加熱し、溶液
を形成し、50゛cに冷却し、濃塩酸(I0ml)を加
えた。次いでこの混合物を50’Cで6.0時間撹拌し
、室温で1晩放置した。14.4”-dihydroxy--500 fitted with nitrogen inlet, stirrer, thermometer and long air cooler
1,4-cyclohexadione bis(ethylenekecool) ([120 mol, 40.04
g ) and phenol (2,13 mol, 200 g
) was added. The mixture was heated to 70°C to form a solution, cooled to 50°C and concentrated hydrochloric acid (I0ml) was added. The mixture was then stirred at 50'C for 6.0 hours and left at room temperature overnight.
撹拌しながら水酸化ナトリウムペレット(0,38モル
、15g)を加え、続いて炭素上5%パラジウム(I,
0g)を加えた。装置を蒸留用に配置し、180°Cに
達するまで反応混合物を加熱した。この混合物を4時間
20分還流しく180°C)、50’Cに冷却し、氷酢
酸(30d)続いて水(50ml)を加えた。さらに室
温に冷却し、固体を集め、2度水洗し、真空下100’
Cで乾燥した。Addition of sodium hydroxide pellets (0.38 mol, 15 g) with stirring followed by 5% palladium (I,
0g) was added. The apparatus was set up for distillation and the reaction mixture was heated until it reached 180°C. The mixture was refluxed for 4 hours and 20 minutes (180°C), cooled to 50'C and glacial acetic acid (30d) followed by water (50ml) was added. After further cooling to room temperature, the solid was collected, washed twice with water, and dried for 100 minutes under vacuum.
It was dried at C.
生成物(収110 g)をN−メチルピロリドンより再
結晶させ、378°Cのmpを有する′#yJ質7.1
0gを得た。赤外スペクトルにより例2の生成物が示さ
れた。The product (yield: 110 g) was recrystallized from N-methylpyrrolidone to yield 7.1 with a mp of 378°C.
Obtained 0g. The infrared spectrum showed the product of Example 2.
Claims (1)
レンまたは直接に結合しているあるいはCO、SO_2
、O、SまたはC_R_2(各Rは独立に水素、C_1
〜C_4アルキルあるいはフルオロアルキルまたはフェ
ニルを表わす)により結合している少なくとも2個の芳
香族基を含むポリ芳香族基より選ばれる置換あるいは未
置換芳香族基であり;Phは所望によりC_1〜C_4
アルキル、ハロゲンまたはヒドロキシより選ばれた1個
あるいは2個の置換基で置換した1,4−フェニレンで
あり;XはOH、SH、OR^2またはSR^2(R^
2はC_1〜C_4アルキルまたはベンジルである)で
ある〕 で表わされるビス(4−ヒドロキシフェニル)芳香族化
合物およびその誘導体の製造方法であって、下式II ▲数式、化学式、表等があります▼(II) (上式中、Aは水素を除去した際、基Arを生ずる飽和
あるいは一部飽和環式基である)で表わされる化合物の
脱水素化工程を含んでなることを特徴とする方法。 2、下式IV、 (X−Ph)_n−Ar(IV) 〔上式中、Arは1,4−フェニレン、1,3−フェニ
レンまたは直接に結合しているあるいはCO、SO_2
、O、SまたはCR_2(各Rは独立に水素、C_1〜
C_4アルキルあるいはフルオロアルキルまたはフェニ
ルを表わす)により結合している少なくとも2個の芳香
族基を含むポリ芳香族基より選ばれる置換あるいは未置
換芳香族基であり、Phは所望によりC_1〜C_4ア
ルキル、ハロゲンまたはヒドロキシより選ばれた1個あ
るいは2個の置換基で置換した1,4−フェニレンであ
り;XはOH、SH、OR^2またはSR^2(R^2
はC_1〜C_4アルキルまたはベンジルである)であ
り;nは1または2である〕で表わされる4−ヒドロキ
シフェニル芳香族化合物またはその誘導体の製造方法で
あって、下式V、▲数式、化学式、表等があります▼(
V) (上式中、Aは水素を除去した際基Arを生ずる飽和あ
るいは一部飽和環式基である) で表わされる化合物の脱水素化および基Aに相当する環
式モノあるいはジケトンによる下式III、HPhX(II
I) で表わされる化合物の縮合による化合物Vの形成の工程
を含んでなる(前記脱水素化は化合物Vを単離しないで
行なわれる)ことを特徴とする方法。[Claims] 1. The following formula I ,SO_2
, O, S or C_R_2 (each R independently hydrogen, C_1
Ph is a substituted or unsubstituted aromatic group selected from polyaromatic groups containing at least two aromatic groups bonded by C_4 alkyl or fluoroalkyl or phenyl; Ph is optionally C_1 to C_4
1,4-phenylene substituted with one or two substituents selected from alkyl, halogen or hydroxy; X is OH, SH, OR^2 or SR^2 (R^
2 is C_1-C_4 alkyl or benzyl] A method for producing bis(4-hydroxyphenyl) aromatic compounds and their derivatives represented by the following formula II ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (II) A method characterized by comprising a step of dehydrogenating a compound represented by the above formula (wherein A is a saturated or partially saturated cyclic group that yields a group Ar when hydrogen is removed) . 2. The following formula IV, (X-Ph)_n-Ar(IV) [In the above formula, Ar is 1,4-phenylene, 1,3-phenylene, directly bonded, or CO, SO_2
, O, S or CR_2 (each R is independently hydrogen, C_1~
Ph is a substituted or unsubstituted aromatic group selected from polyaromatic groups containing at least two aromatic groups bonded by C_4 alkyl or fluoroalkyl or phenyl, and Ph is optionally C_1 to C_4 alkyl, 1,4-phenylene substituted with one or two substituents selected from halogen or hydroxy; X is OH, SH, OR^2 or SR^2 (R^2
is C_1-C_4 alkyl or benzyl; n is 1 or 2] A method for producing a 4-hydroxyphenyl aromatic compound or a derivative thereof represented by the following formula V, ▲ mathematical formula, chemical formula, There are tables etc.▼(
V) Dehydrogenation of the compound represented by (in the above formula, A is a saturated or partially saturated cyclic group which yields the group Ar when hydrogen is removed) and subsidence with a cyclic mono- or diketone corresponding to the group A. Formula III, HPhX(II
I) formation of a compound V by condensation of a compound of the formula (the dehydrogenation being carried out without isolating the compound V).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB8812539.8 | 1988-05-26 | ||
GB8812539A GB8812539D0 (en) | 1988-05-26 | 1988-05-26 | Preparation of aromatic compounds & derivatives therefor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0228125A true JPH0228125A (en) | 1990-01-30 |
Family
ID=10637609
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13028189A Pending JPH0228125A (en) | 1988-05-26 | 1989-05-25 | 4-hydroxyphenyl aromatic compound and derivative thereof and production thereof |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0343798A1 (en) |
JP (1) | JPH0228125A (en) |
GB (1) | GB8812539D0 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6373167B1 (en) | 1999-11-09 | 2002-04-16 | Nec Corporation | Surface acoustic wave filter |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5206393A (en) * | 1991-09-30 | 1993-04-27 | Union Carbide Chemicals & Plastics Technology Corporation | Oxa-bicyclic polyfunctional compounds and preparation thereof |
US5145973A (en) * | 1991-09-30 | 1992-09-08 | Union Carbide Chemicals & Plastics Technology Corporation | Oxa-Bicyclic polyfunctional compounds and preparation thereof |
CN106458811A (en) * | 2014-03-12 | 2017-02-22 | 索尔维特殊聚合物美国有限责任公司 | Process for the manufacture of terphenyl compounds |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1643554A1 (en) * | 1966-09-22 | 1971-07-01 | Union Carbide Corp | Process for the production of P-phenylphenol |
-
1988
- 1988-05-26 GB GB8812539A patent/GB8812539D0/en active Pending
-
1989
- 1989-04-28 EP EP89304359A patent/EP0343798A1/en not_active Withdrawn
- 1989-05-25 JP JP13028189A patent/JPH0228125A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6373167B1 (en) | 1999-11-09 | 2002-04-16 | Nec Corporation | Surface acoustic wave filter |
Also Published As
Publication number | Publication date |
---|---|
GB8812539D0 (en) | 1988-06-29 |
EP0343798A1 (en) | 1989-11-29 |
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