JPH0226535Y2 - - Google Patents

Description

[Detailed Description of the Invention] The present invention relates to a pachinko ball polishing device that expands the polishing area to an endless state even though the polishing chamber has a limited space.

Conventionally, pachinko balls are fed into the interior of a rotating cylinder for polishing whose inner peripheral surface is lined with an abrasive cloth, polished while being rotated within the rotating cylinder, and then ejected from the rotating cylinder and polished again. A pachinko ball polishing device for use in pachinko games has been proposed and put into practical use, but this device has a small polishing area compared to the number of pachinko balls to be polished, and therefore does not polish sufficiently. Not only that, but the polishing process generates noise, which is unpleasant not only for the polisher but also for people playing pachinko.

In view of the above-mentioned circumstances, the present invention was devised to eliminate the drawbacks, and its purpose is to attach a polishing cloth to the inner wall of a rotatably supported cylindrical main polishing chamber. In addition to the lining, a sub-polishing body consisting of a hollow cylindrical body with both ends open and entirely covered with a polishing cloth is freely placed in the polishing chamber to expand the polishing area of the pachinko balls to an endless state, and , the synergistic polishing action in different directions between the main polishing chamber and the sub-polishing body imparts a positive rotational force to the pachinko balls themselves, and the polishing effect of the pachinko balls can be significantly enhanced. The generated noise is absorbed by the polishing cloth lined on the inner wall of the polishing room and the polishing cloth coated on the hollow cylindrical body, thereby preventing the noise from causing discomfort not only to the polishing worker but also to people playing pachinko. The purpose of the present invention is to provide a polishing device for pachinko balls.

The structure of the present invention will be described with reference to an embodiment shown in the drawings. Reference numeral 1 is a cylindrical main polishing chamber, and the polishing chamber 1 is installed in sliding contact with the lower side of the outer peripheral surface of the main polishing chamber 1. It is rotatably supported via rotary rollers 2, 2 which are interlocked and connected to an appropriate drive source such as a motor (not shown). Reference numeral 3 denotes a cylindrical body constituting the polishing chamber 1, and the inner peripheral surface of the cylindrical body 3 and the entire inner wall including both side walls 4 and 5 are lined with polishing cloths 3a, 4a, and 5a. Further, a pachinko ball intake port 4b is provided at the upper end of one side wall 4 of the cylindrical body 3, and a pachinko ball outlet 5b is provided at the lower end of the other side wall 5. Reference numeral 6 denotes a sub-polishing body, and the sub-polishing body 6 is formed into a hollow cylindrical body with both ends open, and its outer peripheral surface, inner peripheral surface, and both ends are entirely covered with polishing cloths 6a and 6b. ing. The sub-polishing body 6 is used by being freely placed in the main polishing chamber 1 when polishing pachinko balls.

Next, the operation of the present invention constructed as described above will be explained. Now, in order to polish pachinko balls using the pachinko ball polishing device of the present invention, first, a sub-polishing body 6 consisting of a hollow cylinder with both ends open is placed freely in the cylindrical main polishing chamber 1. When the rotating rollers 2, 2 are rotated by driving a drive source such as a motor (not shown), the rotating rollers 2, 2 are rotated.
The cylindrical body 3 constituting the cylindrical main polishing chamber 1, which is in sliding contact with the outer circumferential surface of the main polishing chamber 1, rotates. At this time, the sub-polishing body 6 is rotated by the rotational force of the cylindrical body 3 in the main polishing chamber 1.
It rotates in the same direction as the rotational direction of the cylindrical body 3, and in this state, when pachinko balls to be polished are sent into the cylindrical body 3 from the pachinko ball intake port 4b, the pachinko balls are centrifuged by the rotational movement of the cylindrical body 3. It is repelled by the inner circumferential surface of the cylindrical body 3 due to the force, and contacts the abrasive cloth 3a lined on the inner circumferential surface, or coats the abrasive cloth 3a and the outer circumferential surface of the sub-abrasive body 6. It is polished by contacting the polishing cloth 6a. Thereafter, the pachinko balls are gradually fed in, and when an appropriate amount of pachinko balls has been introduced as shown in FIGS. 1 to 3, the pachinko balls loaded in the lower part of the main polishing chamber 1 are The pachinko balls are biased in the rotational direction and try to move along the inner wall surface of the main polishing chamber 1, but the weight of the pachinko balls themselves push them back in the opposite direction to the rotational direction of the cylindrical body 3, and as a result, the pachinko balls The auxiliary polishing body 6 that is in sliding contact with the cylindrical body 3 is also subjected to an acting force that tends to rotate in the opposite direction to that of the cylindrical body 3. Due to this rotation operation of the cylindrical body 3 and the sub-polishing body 6 in opposite directions, a positive rotational force is applied to the pachinko balls themselves within the cylindrical body 3, and the pachinko balls are subjected to mutual rubbing action during the polishing process. The polishing cloths 4a, 5 lined with the inner walls of the both side walls 4, 5 will contact the both side walls 4, 5 due to collision.
Polished by a. Furthermore, even if a pachinko ball that collides with the side walls 4, 5 flies into the hollow part of the sub-polishing chamber 6 due to its repulsion, since the hollow part is covered with the polishing cloth 6b, The part is polished in the process of exiting from one end to the other. Therefore, although the polishing chamber has a limited space, the polishing area can be expanded to an endless state, and the sub-polishing body 6 can apply a positive rotational force to the pachinko balls themselves. Together, the polishing efficiency can be further improved. Moreover, the main polishing chamber and the sub-polishing cloths 3a, 4a, 5a,
6a and 6b, the noise generated during the polishing process is absorbed and alleviated, so the noise is suppressed as much as possible, and no unpleasant noise is transmitted to the outside of the polishing chamber 1. Therefore, not only the person engaged in polishing the pachinko balls but also the people playing the game can fully enjoy the game without causing any discomfort. Note that the polished pachinko balls are discharged from the discharge port 5b to the outside of the polishing chamber,
It is transported to a predetermined position and used for playing pachinko again. Further, in the above embodiment, the cylindrical body 3 and the sub-polishing body 6 constituting the main polishing chamber 1 are shown to be cylindrical bodies, but are not limited to this shape and may be polygonal cylindrical bodies. It's okay.

In short, the inner wall of a rotatably supported cylindrical main polishing chamber is lined with a polishing cloth, the inner wall of the main polishing chamber is lined with a polishing cloth, and the polishing chamber is lined with a polishing cloth. Since the sub-polishing body consisting of a hollow cylindrical body that is entirely covered and has both ends open is mounted so as to be freely movable so as to maintain an asynchronous rotation state with respect to the rotational operation of the main polishing chamber, polishing that requires a limited space. Although it is a chamber, it is possible to expand the polishing area of pachinko balls to an endless state, and the main polishing chamber and the sub-polishing body synergistic polishing action in different directions gives positive rotational force to the pachinko balls themselves. Not only can this significantly improve the polishing effect of pachinko balls, but also the noise generated during the polishing process can be absorbed by a polishing cloth lined with the inner wall of the polishing chamber and a polishing cloth coated on the hollow cylindrical body. Therefore, it is absorbed and produces an extremely useful practical effect that does not cause discomfort not only to polishers but also to people playing pachinko.

[Brief explanation of the drawing]

The drawings show an embodiment of the pachinko ball polishing device according to the present invention, in which Fig. 1 is an overall sectional view, Fig. 2 is a sectional view taken along the line X-X, and Fig. 3 is a partially cutaway view. It is an overall perspective view. In the figure, 1 is a cylindrical main polishing chamber, 3 is a cylindrical body constituting the main polishing chamber 1, 3a is a polishing cloth lined on the inner peripheral surface of the cylindrical body 3, and 4 and 5 are the main polishing chamber 1. Constituting both side walls, 4a and 5a are polishing cloths lined with the inner walls of both side walls 4 and 5, 6 is a sub-polishing body, 6a is a polishing cloth coated on the outer peripheral surface of the sub-polishing body 6, and 6b is a sub-polishing This is a polishing cloth coated on the inner peripheral surface of the body 6.

Claims (1)

[Scope of utility model registration request] A polishing cloth is lined on the inner wall of a rotatably supported cylindrical main polishing chamber, and a sub-polishing body consisting of a hollow cylinder with both ends open and entirely covered with polishing cloth is provided in the main polishing chamber. A pachinko ball polishing device characterized in that the pachinko ball polishing device is mounted so as to be freely movable so as to maintain an asynchronous rotation state with respect to the rotational operation of a main polishing chamber.