JPH02255513A - Production of nitrogen trifluoride - Google Patents
Production of nitrogen trifluorideInfo
- Publication number
- JPH02255513A JPH02255513A JP7410789A JP7410789A JPH02255513A JP H02255513 A JPH02255513 A JP H02255513A JP 7410789 A JP7410789 A JP 7410789A JP 7410789 A JP7410789 A JP 7410789A JP H02255513 A JPH02255513 A JP H02255513A
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- gas
- reactor
- gaseous
- recovered
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 title claims description 4
- 239000007789 gas Substances 0.000 claims abstract description 34
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 claims abstract description 6
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 claims abstract description 5
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000003085 diluting agent Substances 0.000 claims description 10
- 229910018503 SF6 Inorganic materials 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 5
- 229960000909 sulfur hexafluoride Drugs 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 abstract description 22
- 239000006227 byproduct Substances 0.000 abstract description 7
- 239000007788 liquid Substances 0.000 abstract description 4
- 239000003513 alkali Substances 0.000 abstract description 2
- 239000007787 solid Substances 0.000 abstract description 2
- 238000007865 diluting Methods 0.000 abstract 3
- 239000008246 gaseous mixture Substances 0.000 abstract 2
- 239000007792 gaseous phase Substances 0.000 abstract 1
- 238000005201 scrubbing Methods 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 description 11
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 238000013021 overheating Methods 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 230000005587 bubbling Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000003113 dilution method Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/083—Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
- C01B21/0832—Binary compounds of nitrogen with halogens
- C01B21/0835—Nitrogen trifluoride
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Treating Waste Gases (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、Ｆ３とＮＨ，を気相状で反応させて三フッ化
窒素（ＮＦｓ）を製造する方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a method for producing nitrogen trifluoride (NFs) by reacting F3 and NH in a gas phase.
（従来の技術）
Ｎ Ｆ ｓは、沸点が約−１２９℃、融点が約−２０８
℃の化合物であり、フッ素源または高エネルギー燃料の
酸化剤またはドライエツチング剤などに使用されている
。製造方法としては、従来以下のような気相法によるも
のが知られている。(Prior art) NFs has a boiling point of about -129°C and a melting point of about -208°C.
℃ compound and is used as a fluorine source or as an oxidizing agent or dry etching agent for high-energy fuels. As a manufacturing method, the following gas phase method is conventionally known.
Ｒｕｆｆらは、ＮＨＩとＦ、を気相状で反応させて、５
％以下の収率ではあるが化学的にＮＦＳを合成した。（
Ｚ、Ａｎｏｒｇ、Ａ１１ｇ、Ｃｈｅｍ、、１９７；３９
５゜１９３１） Ｍｏｒｒｏｗらも同様に気相法による
合成を報告しているｅ （Ｊ、Ａａ＋ｅｒ、Ｃｈｅａ
＋、Ｓｏｃ、、８２，５３０１゜（発明が解決しようと
する課題）
しかしながら、この反応は発熱が大きく、反応器内の温
度が上昇しすぎて、−旦生成したＮ Ｆ ｓが分解して
しまうという問題点がある。Ruff et al. reacted NHI and F in the gas phase to produce 5
NFS was chemically synthesized, although the yield was less than %. (
Z, Anorg, A11g, Chem, 197;39
5゜1931) Morrow et al. also reported the synthesis by the gas phase method.
+, Soc,, 82,5301° (Problem to be solved by the invention) However, this reaction generates a large amount of heat, and the temperature inside the reactor rises too much, causing the NF s produced to decompose. There is a problem.
しかも、この反応は副生成物としてＮＨ，ＦやＮ、が生
成し、特にＮＨ，Ｆは凝固して反応器および配管を閉塞
するという問題点があるため、反応器内の温度を下げる
ために冷却を行なうことが困難であった。Moreover, this reaction produces NH, F, and N as byproducts, and there is a problem that NH and F in particular solidify and block the reactor and piping, so it is necessary to lower the temperature inside the reactor. Cooling was difficult to achieve.
気相反応においでこのような過熱を押える目的で希釈ガ
スを用いることがあるが、ＮＨ，とＦ２とからＮＦ、を
合成する反応においては通常よく用いられる窒素、アル
ゴン、ヘリウムのような希釈ガスを用いた場合過熱を防
止するに充分なだけ希釈ガスを加えると、反応が充分進
まず収率が高くならない。In gas phase reactions, diluent gases are sometimes used to suppress such overheating, but diluent gases such as nitrogen, argon, and helium, which are commonly used in the reaction to synthesize NF from NH and F2, are often used. If sufficient diluent gas is added to prevent overheating, the reaction will not proceed sufficiently and the yield will not be high.
（課題を解決するための手段）
本発明者は、これら従来法が有している欠点を排除し、
気相法によりＮ Ｆ ｓを効率的に合成することを目的
として種々研究、検討した結果、特定の希釈ガスを用い
ることによりこの目的が達成されることを見出した。(Means for Solving the Problems) The present inventor eliminates the drawbacks of these conventional methods,
As a result of various studies and examinations aimed at efficiently synthesizing N F s by a gas phase method, it has been found that this purpose can be achieved by using a specific diluent gas.
かくして本発明は、Ｆ８とＮ Ｈｓを気相状で反応させ
てＮＦｓを製造する方法において、ＮＨｓ １モルに対
して六フッ化イオウ、ヘキサフルオロエタン、テトラフ
ルオロメタンからなる群より選ばれた１種以上の希釈ガ
スを５〜１００モルの比率で加えることを特徴とする三
フッ化窒素の製造方法を提供するものである。Thus, the present invention provides a method for producing NFs by reacting F8 and NHs in a gas phase, in which 1 mole of NHs is reacted with 1 sulfur hexafluoride, hexafluoroethane, and tetrafluoromethane. The present invention provides a method for producing nitrogen trifluoride, characterized in that at least one diluent gas is added at a ratio of 5 to 100 moles.
本発明の希釈ガスは、窒素のような通常よ（用いられる
ものに比べると単位体積あたりの比熱が大きく反応を太
きパ＜抑制することなく反応熱を吸収して反応器内の過
熱を防ぐことができる。このため、ＮＦ、を高い収率で
製造することができる。The diluent gas used in the present invention has a large specific heat per unit volume compared to normally used gases such as nitrogen, and is capable of absorbing reaction heat without suppressing the reaction and preventing overheating in the reactor. Therefore, NF can be produced in high yield.
希釈の方法としては、Ｆ、および／またはＮＨ，に予め
希釈ガスを加えておきこれを反応器内で混合しても良く
、反応器にＮＨｌ、Ｆ！、希釈ガスを別々に注入するこ
ともできる。特にＮＨａだけを希釈しておき、これに高
濃度のＦ２ガスを注入して反応させる場合は、さらに収
率が向上するので好ましい。この理由は、ＮＦ３の反応
機構に関係があるものと思われるが、あまり明らかでは
ない。As a dilution method, a diluent gas may be added to F and/or NH in advance and mixed in the reactor, or NHL, F! , dilution gas can also be injected separately. In particular, it is preferable to dilute only NHa and inject high-concentration F2 gas into the diluted solution to cause the reaction, since this further improves the yield. The reason for this seems to be related to the reaction mechanism of NF3, but it is not very clear.
六フッ化イオウ、ヘキサフルオロエタン、テトラフルオ
ロメタンのうち六フッ化イオウとヘキサフルオロエタン
はＮＦ、に比べて沸点が大きく異なるので１反応の後で
回収が容易であるので特に好ましい。Among sulfur hexafluoride, hexafluoroethane, and tetrafluoromethane, sulfur hexafluoride and hexafluoroethane are particularly preferred because their boiling points are significantly different from that of NF, and therefore they can be easily recovered after one reaction.
希釈ガスの注入割合はＮＨｓ １モルに対して５〜１０
０モルが適・切である。５モル未満の場合は反応熱の除
去が不充分になり反応器内の温度が上昇しＮＨｌの分解
が促進されて収率が低下するので不適当である。１００
モルを超える場合はＦ８とＮＨＩの反応が充分進行しな
いので不適当である。より好ましい範囲は１０〜３０モ
ルである。The injection ratio of diluent gas is 5 to 10 per mole of NHs.
0 mol is appropriate. If the amount is less than 5 moles, the reaction heat will not be removed sufficiently, the temperature in the reactor will rise, the decomposition of NHL will be promoted, and the yield will decrease, which is unsuitable. 100
If the amount exceeds the molar amount, the reaction between F8 and NHI will not proceed sufficiently, which is inappropriate. A more preferable range is 10 to 30 moles.
Ｆ、とＮ Ｈｓの注入比率は、ＮＨｓ １モルに対して
Ｆ３が３〜２０モルであるのが好ましい。この比率が３
未満の場合はＮＨＩが完全に反応しない場合があるので
好ましくない、Ｆ３が過剰にあるほうがＮＨ３を基準と
したＮ Ｆ ｓの収率が向上するが、上記比率が２０を
超える場合は反応に寄与しないＦ２が多（なりすぎるの
で好ましくないｅＦｔが過剰にある場合は、閉塞の原因
である副生成物をフッ素化してこれを液体あるいは気体
にして閉塞を防止する働きもあるものと考えられる。The injection ratio of F and NHs is preferably 3 to 20 moles of F3 to 1 mole of NHs. This ratio is 3
If the ratio is less than 20, it is not preferable because NHI may not react completely.If F3 is in excess, the yield of NFs based on NH3 will improve, but if the above ratio exceeds 20, it will not contribute to the reaction. If there is an excessive amount of eFt, which is undesirable because there is too much F2, it is thought that it also works to prevent blockages by fluorinating by-products that cause blockages and converting them into liquid or gas.
本発明において、反応器を８０〜２５０℃の温度に維持
された熱媒内に設置する場合は、熱媒を通して反応熱を
効率的に排出できるので反応器内の過熱がさらに起こり
にくくなり、また反応器の内壁が常に副生成物の凝固温
度より高くなるので反応器の閉塞が起こらない。熱媒の
温度はＺｏｏ−１５０℃がより好ましい。In the present invention, when the reactor is installed in a heating medium maintained at a temperature of 80 to 250°C, the heat of reaction can be efficiently discharged through the heating medium, making overheating in the reactor more difficult to occur. Since the inner wall of the reactor is always higher than the solidification temperature of the by-products, blockage of the reactor does not occur. The temperature of the heating medium is more preferably Zoo-150°C.
熱媒としては、使用温度において安定な液体であれば特
に限定されないが、万一反応器内の気体が漏洩した場合
にそなえて、Ｆ２ガスに対して不活性なものが好ましい
。熱媒は、反応器の周囲に設けられた熱媒容器に保持さ
れる。熱媒の温度を制御するために熱媒の加熱あるいは
冷却のための手段を設けることが好ましい。熱媒の撹拌
装置あるいはバブリング装置を設けることにより、熱媒
の温度を均一にし、かつ熱の伝達を良好にすることがで
きる。The heat medium is not particularly limited as long as it is a liquid that is stable at the operating temperature, but it is preferably inert to F2 gas in case the gas in the reactor leaks. The heating medium is held in a heating medium container provided around the reactor. Preferably, means for heating or cooling the heating medium is provided in order to control the temperature of the heating medium. By providing a heating medium stirring device or bubbling device, the temperature of the heating medium can be made uniform and heat transfer can be improved.
本発明の製造方法においては、内部の気体を上から下の
方向に流すのが好ましく、かつ反応器の下部に副生成物
の凝固物を捕捉するための容器を設けることにより、反
応器の閉塞をさらに発生しにく（することができる。反
応器中の気体の流速としては、反応熱の排出を良好にす
るために５ ｃｍ／ｓ以上が好ましい、流速が８００ｃ
ｍ／ｓを超えると圧力損失が増大しすぎるので好ましく
ない。In the production method of the present invention, it is preferable to flow the internal gas from top to bottom, and by providing a container at the bottom of the reactor to capture the coagulated by-products, the reactor can be blocked. The gas flow rate in the reactor is preferably 5 cm/s or more in order to effectively discharge the reaction heat, and the flow rate is 800 cm/s or more.
If it exceeds m/s, the pressure loss will increase too much, which is not preferable.
（実施例）
実施例 １
第１図に示した反応装置により、Ｆ２とＮ Ｈｓとを気
相状で反応させた。この装置は、内容積的５ｍｌの円筒
型の反応器が、内容積的５００ｍ１の熱媒容器中に設置
されている。熱媒としてはフッ素系オイルが用いられて
いる。熱媒は、電熱器により １２５℃に保持されてお
り、かつ空気のバブリングにより撹拌されている。反応
器のすぐ下部には内容積的５０ｔ）ｏｆの容器が設置さ
れており、液体あるいは固体状の副生成物が生成した場
合にはここに捕捉できる構造になっている。(Example) Example 1 Using the reaction apparatus shown in FIG. 1, F2 and NHs were reacted in a gas phase. In this device, a cylindrical reactor with an internal volume of 5 ml is installed in a heat medium container with an internal volume of 500 ml. Fluorine oil is used as a heat medium. The heating medium is maintained at 125°C by an electric heater and stirred by air bubbling. A container with an internal volume of 50 tons is installed immediately below the reactor, and the structure is such that liquid or solid by-products, if generated, can be captured there.
この装置では、ＮＨ，がＳＦ６で希釈され充分混合され
たあと反応器の最上部から注入される。Ｆ２も同様に最
上部から注入される。反応後の気体は、捕捉容器の上部
より取出しまずＳＦ、を回収し、さらにアルカリ洗浄し
た後で回収した。回収したＳＦ、は再度希釈ガスとして
用いた。In this device, NH, is diluted with SF6, thoroughly mixed, and then injected from the top of the reactor. F2 is similarly injected from the top. The gas after the reaction was taken out from the upper part of the trapping container, and SF was first collected, and then the gas was washed with alkali and then collected. The recovered SF was used again as dilution gas.
この装置を用いて、ＮＨ３６ｇ／ｈ（標準状態換算、以
下同様）にＳＦ、９０℃／ｈを加えて希釈したガスとＦ
１４６ｊ２／ｈを反応させた。このときＮＨ，を基準と
した反応率は１００％で、ＮＦ。Using this device, gas diluted by adding SF and 90°C/h to NH36g/h (converted to standard conditions, the same applies hereinafter) and F
146j2/h was reacted. At this time, the reaction rate was 100% based on NH, and NF.
の選択率は４２．７％である。即ちＮ Ｈｌを基準とし
た収率は４２．７％であった。The selectivity is 42.7%. That is, the yield based on N 2 H1 was 42.7%.
実施例 ２〜４ 実施例１の装置を用いて、ＮＨ，、Ｆ、、ＳＦ。Examples 2 to 4 Using the apparatus of Example 1, NH,,F,,SF.
の注入量を表１に示したものに変更した以外は実施例１
と同様にしてＮＦ、を合成した。Example 1 except that the injection amount was changed to that shown in Table 1.
NF was synthesized in the same manner.
ＮＦ富を基準とした反応率、Ｎ Ｆ ｓの選択率、Ｎ
Ｈｓを基準としたＮＦ、の収率を表１に示す。Reaction rate based on NF wealth, selectivity of N F s, N
Table 1 shows the yield of NF based on Hs.
比較例 １．２
実施例１の装置を用いて、ＮＨ，、Ｆ２、の注入量を表
１に示したものに変更し１．ＳＦｓに変えて表１に示し
た注入量のＮ、を用いた以外は実施例１と同様にしてＮ
Ｆ ｓを合成した一ＮＨａを基準とした反応率、ＮＦ
、の選択率、ＮＨ。Comparative Example 1.2 Using the apparatus of Example 1, the injection amounts of NH, F2 were changed to those shown in Table 1, and 1. N was prepared in the same manner as in Example 1, except that the injection amount of N shown in Table 1 was used instead of SFs.
Reaction rate based on 1NHa synthesized with Fs, NF
, selectivity of NH.
を基準としたＮＦ、の収率を表１に示す。Table 1 shows the yield of NF based on .
（効果）
本発明の製造方法により、気相法でＮ Ｆ ｓが得られ
る０本発明で用いる希釈ガスは、収率を低下させること
なく反応熱を効率的に除去できＮ Ｆ ｓが高収率で得
られる。(Effects) By the production method of the present invention, N F s can be obtained by a gas phase method. The diluent gas used in the present invention can efficiently remove the reaction heat without reducing the yield, and N F obtained at a rate.
第１図は、実施例にて用いたＮＦ、の製造装置の概略図
である。FIG. 1 is a schematic diagram of a manufacturing apparatus for NF used in Examples.
Claims (1)
製造する方法において、ＮＨ＿３１モルに対して六フッ
化イオウ、ヘキサフルオロエタ ン、テトラフルオロメタンからなる群より選ばれた１種
以上を希釈ガスとして５〜１００モルの比率で加えるこ
とを特徴とする三フッ化窒素の製造方法。 ２、希釈ガスとＮＨ＿３を混合した気体を反応器中でＦ
＿２と混合して反応させる請求項１の製造方法。[Claims] 1. In a method for producing NF_3 by reacting F_2 and NH_3 in a gas phase, a compound selected from the group consisting of sulfur hexafluoride, hexafluoroethane, and tetrafluoromethane for 1 mole of NH_3 A method for producing nitrogen trifluoride, which comprises adding one or more diluent gases at a ratio of 5 to 100 moles. 2. F
The manufacturing method according to claim 1, wherein the method is mixed with _2 and reacted.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7410789A JPH02255513A (en) | 1989-03-28 | 1989-03-28 | Production of nitrogen trifluoride |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7410789A JPH02255513A (en) | 1989-03-28 | 1989-03-28 | Production of nitrogen trifluoride |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02255513A true JPH02255513A (en) | 1990-10-16 |
Family
ID=13537638
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7410789A Pending JPH02255513A (en) | 1989-03-28 | 1989-03-28 | Production of nitrogen trifluoride |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02255513A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5637285A (en) * | 1996-01-30 | 1997-06-10 | Air Products And Chemicals, Inc. | Process for nitrogen trifluoride synthesis |
| JP2001322806A (en) * | 2000-05-12 | 2001-11-20 | Showa Denko Kk | Manufacturing method for nitrogen trifluoride and application therefor |
| WO2001085603A3 (en) * | 2000-05-12 | 2002-04-18 | Showa Denko Kk | Process for producing nitrogen trifluoride and use thereof |
| US6821496B2 (en) | 2001-05-08 | 2004-11-23 | Zakrytoe Aktsionernoe Obschestvo Nauchno Proizvodstvennoe Obiedinenie “PiM-Invest” | Process for preparing nitrogen trifluoride |
| WO2007004409A1 (en) * | 2005-07-06 | 2007-01-11 | Central Glass Company, Limited | Process for synthesis of halogenated nitrogen |
| JP2007084370A (en) * | 2005-09-21 | 2007-04-05 | Showa Denko Kk | Method for producing nitrogen trifluoride |
| US7820127B2 (en) | 2005-08-26 | 2010-10-26 | Showa Denko K.K. | Method and apparatus for producing nitrogen trifluoride |
| EP3782969A1 (en) | 2019-08-22 | 2021-02-24 | Fujian Yongjing Technology Co., Ltd. | Process of fluorinating inorganic or organic compounds by direct fluorination |
| CN114572944A (en) * | 2021-12-23 | 2022-06-03 | 西安近代化学研究所 | Preparation method of nitrogen trifluoride and nitrogen trifluoride mixed gas |
-
1989
- 1989-03-28 JP JP7410789A patent/JPH02255513A/en active Pending
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5637285A (en) * | 1996-01-30 | 1997-06-10 | Air Products And Chemicals, Inc. | Process for nitrogen trifluoride synthesis |
| JP2001322806A (en) * | 2000-05-12 | 2001-11-20 | Showa Denko Kk | Manufacturing method for nitrogen trifluoride and application therefor |
| WO2001085603A3 (en) * | 2000-05-12 | 2002-04-18 | Showa Denko Kk | Process for producing nitrogen trifluoride and use thereof |
| US7018598B2 (en) | 2000-05-12 | 2006-03-28 | Showa Denko K.K. | Process for producing nitrogen trifluoride |
| US6821496B2 (en) | 2001-05-08 | 2004-11-23 | Zakrytoe Aktsionernoe Obschestvo Nauchno Proizvodstvennoe Obiedinenie “PiM-Invest” | Process for preparing nitrogen trifluoride |
| WO2007004409A1 (en) * | 2005-07-06 | 2007-01-11 | Central Glass Company, Limited | Process for synthesis of halogenated nitrogen |
| JP2007308357A (en) * | 2005-07-06 | 2007-11-29 | Central Glass Co Ltd | Process for synthesis of halogenated nitrogen |
| US7820127B2 (en) | 2005-08-26 | 2010-10-26 | Showa Denko K.K. | Method and apparatus for producing nitrogen trifluoride |
| JP2007084370A (en) * | 2005-09-21 | 2007-04-05 | Showa Denko Kk | Method for producing nitrogen trifluoride |
| EP3782969A1 (en) | 2019-08-22 | 2021-02-24 | Fujian Yongjing Technology Co., Ltd. | Process of fluorinating inorganic or organic compounds by direct fluorination |
| CN114572944A (en) * | 2021-12-23 | 2022-06-03 | 西安近代化学研究所 | Preparation method of nitrogen trifluoride and nitrogen trifluoride mixed gas |
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