JPH02250977A - Device for forming mixture thin film - Google Patents

Device for forming mixture thin film

Info

Publication number
JPH02250977A
JPH02250977A JP7129389A JP7129389A JPH02250977A JP H02250977 A JPH02250977 A JP H02250977A JP 7129389 A JP7129389 A JP 7129389A JP 7129389 A JP7129389 A JP 7129389A JP H02250977 A JPH02250977 A JP H02250977A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
temp
sent
sublimation
gas
bath
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7129389A
Other versions
JP2773893B2 (en )
Inventor
Susumu Hoshinouchi
Hiroshi Onishi
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E40/00Technologies for an efficient electrical power generation, transmission or distribution
    • Y02E40/60Superconducting electric elements or equipment or power systems integrating superconducting elements or equipment
    • Y02E40/64Superconducting transmission lines or power lines or cables or installations thereof
    • Y02E40/641Superconducting transmission lines or power lines or cables or installations thereof characterised by their form
    • Y02E40/642Films or wires on bases or cores

Abstract

PURPOSE: To stably supply a gas even when a raw material to be gasified at high temp. is used by independently controlling the temps. of respective sublimation baths, outlet pipes and gas mixing part and forming a temp. gradient till the gas mixing part in the first sublimation bath and outlet pipe.
CONSTITUTION: A carrier gas is introduced to the first sublimation bath 1 heated at T1 and controlled by a temp. control part 11, transferred to the first outlet pipe 3 at T3 adjusted by a temp. control part 13 accompanying the gasified component of the first raw material A, and sent to the gas mixing part 5 at T5 regulated by a temp. control part. The gasified component of the second raw material B in the second sublimation bath 2 adjusted to T2 is sent to the gas mixing part 5 through the second outlet pipe 4 controlled at T4. The gaseous mixture is sent to a reaction chamber 7 through a transportation system 6 adjusted to T6. The mixture film is formed on a substrate 7a, and the carrier gas is sent to an evacuating system 8. In this case, the temps. are controlled to fulfil T1<T2≤T4≤T5≤T6 and T1<T2<T5≤T6.
COPYRIGHT: (C)1990,JPO&Japio
JP7129389A 1989-03-22 1989-03-22 Mixture thin film forming apparatus Expired - Lifetime JP2773893B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7129389A JP2773893B2 (en) 1989-03-22 1989-03-22 Mixture thin film forming apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP7129389A JP2773893B2 (en) 1989-03-22 1989-03-22 Mixture thin film forming apparatus
US07801627 US5186120A (en) 1989-03-22 1991-12-04 Mixture thin film forming apparatus

Publications (2)

Publication Number Publication Date
JPH02250977A true true JPH02250977A (en) 1990-10-08
JP2773893B2 JP2773893B2 (en) 1998-07-09

Family

ID=13456490

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7129389A Expired - Lifetime JP2773893B2 (en) 1989-03-22 1989-03-22 Mixture thin film forming apparatus

Country Status (1)

Country Link
JP (1) JP2773893B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5480488A (en) * 1992-10-28 1996-01-02 Schott Glaswerke Apparatus for supplying CVD coating devices
DE10005820C1 (en) * 2000-02-10 2001-08-02 Schott Glas Gas Verso approximation device for precursors with a low vapor pressure
JP2008502135A (en) * 2004-06-04 2008-01-24 東京エレクトロン株式会社 Process processing system and method for treating a substrate

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5480488A (en) * 1992-10-28 1996-01-02 Schott Glaswerke Apparatus for supplying CVD coating devices
DE10005820C1 (en) * 2000-02-10 2001-08-02 Schott Glas Gas Verso approximation device for precursors with a low vapor pressure
US7413767B2 (en) 2000-02-10 2008-08-19 Schott Ag Gas supply method in a CVD coating system for precursors with a low vapor pressure
JP4772246B2 (en) * 2000-02-10 2011-09-14 ショット アクチエンゲゼルシャフトSchott AG Gas supply device for a low vapor pressure precursor
JP2008502135A (en) * 2004-06-04 2008-01-24 東京エレクトロン株式会社 Process processing system and method for treating a substrate

Also Published As

Publication number Publication date Type
JP2773893B2 (en) 1998-07-09 grant

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