JPH02248417A - Production of high-molecular weight phenol resin - Google Patents
Production of high-molecular weight phenol resinInfo
- Publication number
- JPH02248417A JPH02248417A JP7016189A JP7016189A JPH02248417A JP H02248417 A JPH02248417 A JP H02248417A JP 7016189 A JP7016189 A JP 7016189A JP 7016189 A JP7016189 A JP 7016189A JP H02248417 A JPH02248417 A JP H02248417A
- Authority
- JP
- Japan
- Prior art keywords
- group
- reaction
- molecular weight
- phenol
- substituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000005011 phenolic resin Substances 0.000 title claims abstract description 4
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 238000006243 chemical reaction Methods 0.000 claims abstract description 40
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 21
- 239000003377 acid catalyst Substances 0.000 claims abstract description 9
- 239000003960 organic solvent Substances 0.000 claims abstract description 7
- 150000001299 aldehydes Chemical class 0.000 claims description 24
- 150000002989 phenols Chemical class 0.000 claims description 18
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims 1
- 229920001568 phenolic resin Polymers 0.000 claims 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract description 50
- 239000002904 solvent Substances 0.000 abstract description 19
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical group C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 abstract description 12
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract description 12
- 125000000547 substituted alkyl group Chemical group 0.000 abstract description 4
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 abstract description 3
- 125000001424 substituent group Chemical group 0.000 abstract description 3
- 238000010533 azeotropic distillation Methods 0.000 abstract 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 abstract 2
- 229920005989 resin Polymers 0.000 description 23
- 239000011347 resin Substances 0.000 description 23
- 229920003986 novolac Polymers 0.000 description 22
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 18
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 15
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- 125000000217 alkyl group Chemical group 0.000 description 12
- 239000003054 catalyst Substances 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 10
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical class O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 8
- 238000010992 reflux Methods 0.000 description 8
- 239000002253 acid Substances 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 5
- 238000006482 condensation reaction Methods 0.000 description 5
- HFJRKMMYBMWEAD-UHFFFAOYSA-N dodecanal Chemical compound CCCCCCCCCCCC=O HFJRKMMYBMWEAD-UHFFFAOYSA-N 0.000 description 5
- 125000005647 linker group Chemical group 0.000 description 5
- 230000009257 reactivity Effects 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 4
- -1 butoxyshetanol Chemical compound 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000006297 dehydration reaction Methods 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- JARKCYVAAOWBJS-UHFFFAOYSA-N hexanal Chemical compound CCCCCC=O JARKCYVAAOWBJS-UHFFFAOYSA-N 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 229910015900 BF3 Inorganic materials 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 125000004442 acylamino group Chemical group 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 230000018044 dehydration Effects 0.000 description 3
- 235000019256 formaldehyde Nutrition 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- SYBYTAAJFKOIEJ-UHFFFAOYSA-N 3-Methylbutan-2-one Chemical compound CC(C)C(C)=O SYBYTAAJFKOIEJ-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 2
- 235000019341 magnesium sulphate Nutrition 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- NUJGJRNETVAIRJ-UHFFFAOYSA-N octanal Chemical compound CCCCCCCC=O NUJGJRNETVAIRJ-UHFFFAOYSA-N 0.000 description 2
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- GDXHBFHOEYVPED-UHFFFAOYSA-N 1-(2-butoxyethoxy)butane Chemical compound CCCCOCCOCCCC GDXHBFHOEYVPED-UHFFFAOYSA-N 0.000 description 1
- SXYRTDICSOVQNZ-UHFFFAOYSA-N 1-(2-methoxyethoxy)ethanol Chemical compound COCCOC(C)O SXYRTDICSOVQNZ-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- NGZUCVGMNQGGNA-UHFFFAOYSA-N 7-[5-(2-acetamidoethyl)-2-hydroxyphenyl]-3,5,6,8-tetrahydroxy-9,10-dioxoanthracene-1,2-dicarboxylic acid 7-[5-(2-amino-2-carboxyethyl)-2-hydroxyphenyl]-3,5,6,8-tetrahydroxy-9,10-dioxoanthracene-1,2-dicarboxylic acid 3,5,6,8-tetrahydroxy-7-[2-hydroxy-5-(2-hydroxyethyl)phenyl]-9,10-dioxoanthracene-1,2-dicarboxylic acid 3,6,8-trihydroxy-1-methyl-9,10-dioxoanthracene-2-carboxylic acid Chemical compound Cc1c(C(O)=O)c(O)cc2C(=O)c3cc(O)cc(O)c3C(=O)c12.OCCc1ccc(O)c(c1)-c1c(O)c(O)c2C(=O)c3cc(O)c(C(O)=O)c(C(O)=O)c3C(=O)c2c1O.CC(=O)NCCc1ccc(O)c(c1)-c1c(O)c(O)c2C(=O)c3cc(O)c(C(O)=O)c(C(O)=O)c3C(=O)c2c1O.NC(Cc1ccc(O)c(c1)-c1c(O)c(O)c2C(=O)c3cc(O)c(C(O)=O)c(C(O)=O)c3C(=O)c2c1O)C(O)=O NGZUCVGMNQGGNA-UHFFFAOYSA-N 0.000 description 1
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical group NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
- 241000190020 Zelkova serrata Species 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 125000004466 alkoxycarbonylamino group Chemical group 0.000 description 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 1
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000002635 aromatic organic solvent Substances 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000005162 aryl oxy carbonyl amino group Chemical group 0.000 description 1
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 1
- 125000005142 aryl oxy sulfonyl group Chemical group 0.000 description 1
- 125000004391 aryl sulfonyl group Chemical group 0.000 description 1
- 125000005110 aryl thio group Chemical group 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- AINBZKYUNWUTRE-UHFFFAOYSA-N ethanol;propan-2-ol Chemical compound CCO.CC(C)O AINBZKYUNWUTRE-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-M isovalerate Chemical compound CC(C)CC([O-])=O GWYFCOCPABKNJV-UHFFFAOYSA-M 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- BGEHHAVMRVXCGR-UHFFFAOYSA-N methylundecylketone Natural products CCCCCCCCCCCCC=O BGEHHAVMRVXCGR-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001256 steam distillation Methods 0.000 description 1
- 125000005415 substituted alkoxy group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 125000005420 sulfonamido group Chemical group S(=O)(=O)(N*)* 0.000 description 1
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
Landscapes
- Phenolic Resins Or Amino Resins (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明はフェノールノボラック樹脂の連結基としてホル
ムアルデヒド類以外のアルデヒド類も縮合が容易であり
、かつ高分子量フェノールノボラック樹脂が得られる改
良された製造法に関する。Detailed Description of the Invention (Industrial Field of Application) The present invention provides an improved production process in which aldehydes other than formaldehydes can be easily condensed as linking groups in phenol novolak resins, and high molecular weight phenol novolac resins can be obtained. Regarding the law.
(従来の技術)
フェノールノボラック樹脂は、一般的に、村山新−著フ
エノール樹脂(1981発行、日刊新聞社)に記載され
ている様に、フェノール類とホルマリンとを酸触媒の存
在下加熱条件で縮合反応を行い、その後100°C以上
の高温条件で減圧または水蒸気蒸留することにより残存
のフェノール類や水を除去した後、冷却して樹脂状の固
体を得ていた。しかし、この方法により得られるフェノ
ールノボラック樹脂はほとんど平均分子量が1. 00
0以下と低く、また分子量分布も広いものであた。(Prior art) Phenol novolak resin is generally produced by heating phenols and formalin in the presence of an acid catalyst, as described in Arata Murayama's book, Phenol Resin (published in 1981, Nikkan Shimbun). A condensation reaction was carried out, and then residual phenols and water were removed by vacuum or steam distillation at a high temperature of 100° C. or higher, followed by cooling to obtain a resinous solid. However, most of the phenol novolac resins obtained by this method have an average molecular weight of 1. 00
It was as low as 0 or less, and the molecular weight distribution was wide.
また最近では特開昭61−12714号や特開昭62−
230816号に報告されているように、フェノール類
とホルムアルデヒドを有機溶媒均一中、弱酸性触媒を用
いて縮合反応させ、その反応液を水中に沈澱させる事に
より高分子量のもので平均分子量が約1万のフェノール
ノボラック樹脂を得る製造法も用いられてきている。Recently, Japanese Patent Application Laid-open No. 12714/1983 and Japanese Patent Application Laid-open No. 62-
As reported in No. 230816, phenols and formaldehyde are subjected to a condensation reaction in a homogeneous organic solvent using a weakly acidic catalyst, and the reaction solution is precipitated in water to produce high molecular weight products with an average molecular weight of about 1. Processes for producing 10,000 phenolic novolak resins have also been used.
しかしながら、いずれの方法もフェノール類の連結基と
して用いるのはホルムアルデヒド、アセトアルデヒドの
様に立体障害が少なく反応性の高いアルデヒド類を使用
するときのみ有効なフェノールノボラック樹脂の製造法
であり、立体障害等で反応性の低いアルデヒド類を用い
フェノールノボラック樹脂を得ることは困難であった。However, both methods are effective for producing phenol novolak resins only when using aldehydes with little steric hindrance and high reactivity, such as formaldehyde and acetaldehyde, as the linking group for phenols, and steric hindrance, etc. It has been difficult to obtain phenolic novolac resins using aldehydes with low reactivity.
この欅に反応性の低いアルデヒド類を用い上記のように
一般的なフェノールノボラック樹脂の製造法により製造
するには強酸触媒を多量使用したり橿めて過酷な条件を
用いなければならなかった。In order to produce this keyaki using aldehydes with low reactivity and using the general method for producing phenol novolak resin as described above, it was necessary to use a large amount of a strong acid catalyst and to use harsh conditions.
またそのような条件においても樹脂収率は低かった0反
応性の低いアルデヒド類を用いフェノールノボラック樹
脂を工業的にスケールで収率よくかつ経済的に製造でき
る技術はなかった。Further, even under such conditions, the resin yield was low. There was no technology that could economically produce phenol novolac resins on an industrial scale in good yield using aldehydes with low reactivity.
(本発明が解決しようとする課題)
本発明の目的は反応性の低い置換アルデヒド類を用いて
も分子量分布が狭く、かつ高分子量が可能であるフェノ
ールノボラック樹脂の製造法を提供することである。別
の目的は、従来実現不可能であったフェノール類と置換
アルデヒド類を主成分としたフェノールノボラック樹脂
の製造法を提供することである。(Problems to be Solved by the Present Invention) An object of the present invention is to provide a method for producing a phenol novolak resin that has a narrow molecular weight distribution and can have a high molecular weight even when using substituted aldehydes with low reactivity. . Another object is to provide a method for producing a phenol novolak resin containing phenols and substituted aldehydes as main components, which has not been possible in the past.
本発明のさらに別の目的は、連結基として種々置換のア
ルデヒド類を用いることを可能とし、使用用途の拡大し
たフェノールノボラック樹脂の製造法を提供することで
ある。Still another object of the present invention is to provide a method for producing a phenol novolak resin that allows the use of variously substituted aldehydes as a linking group and has a wider range of uses.
本発明のフェノールノボラック樹脂のr高分子量」とは
重量平均分子量が1,000以上のものを示す。The term "high molecular weight" of the phenol novolak resin of the present invention refers to one having a weight average molecular weight of 1,000 or more.
(課題を解決しようとする手段)
本発明の前記諸口的は、フェノール類と2mアルデヒド
類を酸触媒の存在下、溶液状で反応させる時に、フェノ
ール類がアルデヒド類を介して縮合する際に生成する水
を、水と共沸し得る有機溶媒により反応系外に共沸によ
り除去し、平衡を樹脂生成有利な方向へずらすことを特
徴とする、反応性の低い置換アルデヒド類をフェノール
ノボラック樹脂の連結基として使用した高分子量フェノ
ールノボラック樹脂の製造法により達成された。(Means for Solving the Problems) The above-mentioned aspects of the present invention are such that when phenols and 2m aldehydes are reacted in a solution state in the presence of an acid catalyst, phenols are formed when condensed via aldehydes. The low-reactivity substituted aldehydes are removed from the reaction system using an organic solvent that can be azeotropic with water, thereby shifting the equilibrium in a direction favorable to resin formation. This was achieved by a method for producing a high molecular weight phenolic novolac resin, which was used as a linking group.
本発明の置換アルデヒド類を連結基としたフェノールノ
ボラック樹脂の製造法を詳しく述べる。The method for producing a phenol novolac resin using a substituted aldehyde as a linking group according to the present invention will be described in detail.
すなわち、フェノール類及び置換アルデヒド類とを好ま
しくは窒素等の不活性雰囲気下、水と共沸し得る有機溶
媒の単独又は混合系の溶媒中で酸触媒存在下撹拌し加熱
条件で共沸脱水反応させることにより高分子量フェノー
ルノボランク樹脂が得られる。That is, phenols and substituted aldehydes are stirred in the presence of an acid catalyst, preferably under an inert atmosphere such as nitrogen, in an organic solvent that can be azeotroped with water, alone or in a mixed system, and subjected to an azeotropic dehydration reaction under heating conditions. By doing so, a high molecular weight phenolic novolank resin is obtained.
共沸脱水方法について詳述する。The azeotropic dehydration method will be explained in detail.
本発明のフェノールノボラック樹脂の製造法はフェノー
ル類及びアルデヒド類を縮合反応する時に生成する水を
反応系内から除去することを特徴としている。その反応
系外への脱水方法として、■ 加熱リフラックス反応す
る際に、窒素、アルゴン等の不活性気流と共に溶媒と一
緒に反応容器外に蒸発させてしまう方法。The method for producing a phenol novolak resin of the present invention is characterized in that water generated during the condensation reaction of phenols and aldehydes is removed from the reaction system. As a method for dehydrating the water out of the reaction system, (1) A method in which the solvent is evaporated out of the reaction vessel along with an inert gas flow such as nitrogen or argon during the heating reflux reaction.
■ 加熱リフラックス反応する際に、ソックスレイ抽出
器を用い乾燥剤(脱水剤)を通して溶媒を還流する方法
。■ A method of refluxing the solvent through a desiccant (dehydrating agent) using a Soxhlet extractor during the heating reflux reaction.
■ 加熱リフラックス反応する際に、冷却管(還流管)
の下部にディーン・スターク・トラップ(水分定量受器
)を付け、水のみをトラップして溶媒を反応系に戻す方
法。■ During the heating reflux reaction, the cooling pipe (reflux pipe)
A method of attaching a Dean-Stark trap (moisture quantitative receiver) to the bottom of the reactor to trap only water and return the solvent to the reaction system.
等代表的な例を挙げたが、上記以外の反応系外への脱水
方法を用いてもよい。Although typical examples have been given, methods of dehydration outside the reaction system other than those described above may be used.
溶媒について詳述する。The solvent will be explained in detail.
上記の様に縮合反応する時の溶媒として、水と共沸混合
物をつくり得る溶媒が好ましいが、そのような溶媒とし
て、ベンゼン、トルエン、キシレン(o−、p−、m)
などの芳香族系の溶媒、エタノールイソプロパノール
媒、酢酸エチル、酢酸イソプロピル、酢酸ブチルなどの
エステル系溶媒、四塩化メタン、クロロホルム、トリク
ロロエタンなどのハロゲン系溶媒であるが、特に好まし
いのは水と混合したときに極小共沸点をとる芳香族系の
有機溶媒である。As the solvent for the condensation reaction as described above, it is preferable to use a solvent that can form an azeotrope with water. Examples of such a solvent include benzene, toluene, xylene (o-, p-, m), etc.
Aromatic solvents such as ethanol isopropanol, ester solvents such as ethyl acetate, isopropyl acetate, and butyl acetate, and halogen solvents such as methane tetrachloride, chloroform, and trichloroethane are particularly preferred. It is an aromatic organic solvent that sometimes has a minimal azeotropic point.
フェノール類及びアルデヒド類を縮合反応する時に溶媒
として上記共沸溶媒のみで行ってもよいが、生成するフ
ェノールノボランク樹脂の溶解性を考慮して更に反応を
均一化するために補助溶媒を用い混合溶媒で反応を行っ
てもよい.そのようなン容媒として、アルコール
ン類、エステル類、アミド類等の有機溶媒が用いられ、
特に反応により生成するノボラック樹脂が溶解可能な溶
媒を選択する必要がある。The condensation reaction of phenols and aldehydes may be carried out using only the above azeotropic solvent as a solvent, but considering the solubility of the phenol novolank resin produced, an auxiliary solvent may be used and mixed in order to further homogenize the reaction. The reaction may be carried out in a solvent. Organic solvents such as alcohols, esters, amides, etc. are used as such solvents,
In particular, it is necessary to select a solvent in which the novolak resin produced by the reaction can be dissolved.
以下にノボラック樹脂が可溶な溶媒を示す。アルコール
類として、メタノール、エタノール、プロパツール、2
−プロパツール、ブタノール、メトキシエタノール、1
−メトキシ−2−プロパツール、2−メトキシ−1−プ
ロパツール、エトキシエタノール、ブトキシェタノール
、メトキシエトキシエタノール、エーテル類として、ジ
オキサン、エチレングリコールジメチルエーテル、エチ
レングリコールジエチルエーテル、エチレングリコール
ジブチルエーテル等、ケトン類として、アセトン、メチ
ルエチルケトン、メチルイソプロピルケトン等、エステ
ル類としてはメトキシエチルアセテート、エトキシエチ
ルアセテート、ブトキシエチルアセテートなどがあり、
アミド類としてはN、N−ジメチルホルムアミド、ジメ
チルアセトアミド、ジメチルスルホオキシドなどが挙げ
られるが、むろん本発明はこれらに限定されるものでは
ない。The solvents in which the novolac resin is soluble are shown below. Alcohols include methanol, ethanol, propatool, 2
-Propertool, butanol, methoxyethanol, 1
-Methoxy-2-propertool, 2-methoxy-1-propertool, ethoxyethanol, butoxyshetanol, methoxyethoxyethanol, ethers such as dioxane, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, ketones Types include acetone, methyl ethyl ketone, methyl isopropyl ketone, etc., and esters include methoxyethyl acetate, ethoxyethyl acetate, butoxyethyl acetate, etc.
Examples of amides include N,N-dimethylformamide, dimethylacetamide, dimethylsulfoxide, but the present invention is not limited thereto.
本製造法に使用するフェノール及びアルデヒドについて
詳述する。The phenol and aldehyde used in this production method will be explained in detail.
本発明のフェノール類とは2個以上の活性水素を有する
フェノール類であり一般式(1)に示す。The phenols of the present invention are phenols having two or more active hydrogens, and are represented by the general formula (1).
(ただし、Rl 、、 R3はそれぞれ同じであっても
異なっていてもよくベンゼン環上の置換可能な通常の置
換基を表す、)
H
また、本発明の置換アルデヒド類を一般式(n)に示す
。(However, R1, R3 may be the same or different and each represents a normal substituent that can be substituted on the benzene ring.) show.
R4−CHo (II)
(ただし、R4は置換もしくは無置換のアルキル基また
はフェニル基を表す、)
−a式(1)について以下更に詳しく説明する。R4-CHO (II) (R4 represents a substituted or unsubstituted alkyl group or phenyl group) -a Formula (1) will be explained in more detail below.
R1−R3は水素原子、水酸基または置換可能の基であ
る。そのような基としては例えばハロゲン原子、シアノ
基、スルホ基、又はカルボキシル基)、それぞれ置換ま
たは無置換のアルキル基、アリール基、アシルオキシ基
、アシルアミノ基、アミノ基、スルホンアミド基、アル
コキシ基、アルキルチオ基、アリールチオ基、カルバモ
イル基、スルファモイル基、アルコキシカルホモニル基
、アリールオキシカルボニル基、アルキルスルホニル基
、アリールスルホニル基、アルコ中ジスルホニル基、ア
リールオキシスルホニル基、カルバモイルアミノ基、ス
ルファモイルアミノ基、カルバモイルオキシ基、アルコ
キシカルボニルアミノ基、アリールオキシカルボニルア
ミノ基である。またR1.R1がそれぞれベンゼン環上
で隣接するときは縮環して炭素環あるいはへテロ環を形
成してもよい。R1-R3 are a hydrogen atom, a hydroxyl group or a substitutable group. Examples of such groups include halogen atoms, cyano groups, sulfo groups, or carboxyl groups), substituted or unsubstituted alkyl groups, aryl groups, acyloxy groups, acylamino groups, amino groups, sulfonamido groups, alkoxy groups, and alkylthio groups. group, arylthio group, carbamoyl group, sulfamoyl group, alkoxycarhomonyl group, aryloxycarbonyl group, alkylsulfonyl group, arylsulfonyl group, disulfonyl group in alcohol, aryloxysulfonyl group, carbamoylamino group, sulfamoylamino group , carbamoyloxy group, alkoxycarbonylamino group, and aryloxycarbonylamino group. Also R1. When R1's are adjacent to each other on a benzene ring, they may be condensed to form a carbocycle or a heterocycle.
−M式(II)について以下更に詳しく説明する。-M formula (II) will be explained in more detail below.
R4はアルキル基、置換アルキル基、フェニル基、置換
フェニル基、アリル基、置換または無置換のアルケニル
基、水素原子を表す。R4 represents an alkyl group, a substituted alkyl group, a phenyl group, a substituted phenyl group, an allyl group, a substituted or unsubstituted alkenyl group, or a hydrogen atom.
R1−R’の置換基に許容される置換基としてはハロゲ
ン原子、ニトロ基、シアノ基、アルキル基、置換アルキ
ル基、アルコキシ基、置換アルコキシ基、−NHCOR
’で表される基(Rsはアルキル基、フェニル基、R1
に許容される基で一度以上置換されていてもよい、 )
−COO基、−N13(hR’(R5は上記と同義)
、−3OR’ (R’は上記と同義) 、−3O,R’
(R’は上記と同義) 、−COR5(R5は上記
と同義) 、−CON (−R’ ) −R’で表さ
れる基(R6、R?は同じであっても異なっていてもよ
く、水素原子、アルキル基、置換アルキル基、フェニル
基、置換フェニル基を表す)、−SO□N (−R”
)−R’ (R1、・R’は同義)、アミノ基(アル
キル基で置換されていてもよい)、水酸基や加水分解し
て水酸基を形成する基が挙げられる。Permissible substituents for R1-R' include halogen atom, nitro group, cyano group, alkyl group, substituted alkyl group, alkoxy group, substituted alkoxy group, -NHCOR
' (Rs is an alkyl group, a phenyl group, R1
may be substituted one or more times with groups permissible in )
-COO group, -N13 (hR' (R5 is the same as above)
, -3OR'(R' has the same meaning as above), -3O,R'
(R' has the same meaning as above), -COR5 (R5 has the same meaning as above), -CON (-R') Group represented by -R' (R6 and R? may be the same or different , represents a hydrogen atom, an alkyl group, a substituted alkyl group, a phenyl group, a substituted phenyl group), -SO□N (-R"
)-R' (R1 and .R' are synonymous), an amino group (which may be substituted with an alkyl group), a hydroxyl group, and a group that forms a hydroxyl group by hydrolysis.
一般式(1)において好ましくは、R1−R3はそれぞ
れ同じであっても異なっていてもよく水素原子、水酸基
、炭素数1〜18の置換もしくは無置換のアルキル基、
炭素数1〜18のW換もしくは無置換のアルコキシ基、
置換もしくは無置換のフェニル基、炭素数1〜18の置
換もしくは無置換のスルホンアミド基又はアシルアミノ
基、置toモしくは無置換のフェニルスルホンアミド基
又はアシルアミノ基、ハロゲン原子、アミノ基(アルキ
ル基で置換されていてもよい)を表す。In general formula (1), R1 to R3 may each be the same or different, and are preferably a hydrogen atom, a hydroxyl group, a substituted or unsubstituted alkyl group having 1 to 18 carbon atoms,
W-substituted or unsubstituted alkoxy group having 1 to 18 carbon atoms,
Substituted or unsubstituted phenyl group, substituted or unsubstituted sulfonamide group or acylamino group having 1 to 18 carbon atoms, substituted or unsubstituted phenylsulfonamide group or acylamino group, halogen atom, amino group (alkyl group) ).
一般式(n)において好ましくは、R4は水素原子、炭
素数1〜18の置換もしくは無置換のアルキル基、置換
もしくは無置換のフェニル基、アリル基、炭素数2〜1
8の置換もしくは無置換のアルケニル基を表す。In general formula (n), R4 is preferably a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 18 carbon atoms, a substituted or unsubstituted phenyl group, an allyl group, or a C 2 to 1
8 represents a substituted or unsubstituted alkenyl group.
前記一般式(1)のうち好ましい化合物は下記一般式(
ll’l)、(TV)、(V)で表される。Among the general formulas (1), preferred compounds are those represented by the following general formula (
ll'l), (TV), and (V).
H
一般式(III)、(IV)、(V)においてR1は上
記と同義である。さらにR1で好ましくは水素原子、炭
素数1〜1日の置換もしくは無置換のアキル基を表す。H In general formulas (III), (IV), and (V), R1 has the same meaning as above. Furthermore, R1 preferably represents a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 1 carbon atoms.
前記一般式(It)のうちさらに好ましく化合物は炭素
数1〜18の置換もしくは無置換のアルキル基、置換も
しくは無置換のフェニル基、水素原子を表す。More preferably, the compound of the general formula (It) represents a substituted or unsubstituted alkyl group having 1 to 18 carbon atoms, a substituted or unsubstituted phenyl group, or a hydrogen atom.
以下に(1)及び(II)の具体例を示すが、むろん本
発明はこれに限定されるものではない。Specific examples of (1) and (II) are shown below, but the present invention is of course not limited thereto.
しコH7 [−5 !−8 H ■ ■−10 H ■ しN5 ■−19 ■ ■−25 ■−35 ■ −37 ■−24 ■−26 ■ ■−36 ■−38 ■−27 ■−29 0■ ■−41 ■−43 ■ −28 ■−30 υ■ ■ −40 ■−44 n−3 ■−11 ■−13 C)1.CHO n−C3117CllO n−CJ. 、C)t。Shiko H7 [-5 ! -8 H ■ ■-10 H ■ ShiN5 ■-19 ■ ■-25 ■-35 ■-37 ■-24 ■-26 ■ ■-36 ■-38 ■-27 ■-29 0 ■ ■-41 ■-43 ■-28 ■-30 υ■ ■ -40 ■-44 n-3 ■-11 ■-13 C)1. CHO n-C3117CllO n-CJ. ,C)t.
n−CJ+9CHO CHJCHzCHO BrCHiCtlO CII3COCHO ■−12 ■−14 C)IsCHzCl(O ncJwcH。n-CJ+9CHO CHJCHzCHO BrCHiCtlO CII3COCHO ■-12 ■-14 C) IsCHzCl(O ncJwcH.
ncJ+scHO
n−C,+lIxsCHO
C I CHzCHO
CNCHICHO
110ccHO
■−17
■−18
■−19
■−20
■−29
■−30
■−32
■−33
■
■−35
■−36
■−21
■−37
■−40
■−22
■−24
■=26
■−38
■−43
■−44
HOC−C−C=C−CHO
■−45
■−47
■−49
CHsC−CCHxCNHCHxCH
CI!
■−46
■−48
■−50
本発明に用いられるアルデヒド類の使用割合はフェノー
ル類に対するモル比が0.5〜2.0の範囲にあること
が好ましく、更に好ましくは0゜8〜1.5の範囲にあ
ることがよい。ncJ+scHO n-C,+lIxsCHO C I CHzCHO CNCHICHO 110ccHO ■-17 ■-18 ■-19 ■-20 ■-29 ■-30 ■-32 ■-33 ■ ■-35 ■-36 ■-21 ■-37 ■- 40 ■-22 ■-24 ■=26 ■-38 ■-43 ■-44 HOC-C-C=C-CHO ■-45 ■-47 ■-49 CHsC-CCHxCNHCHxCH CI! ■-46 ■-48 ■-50 The molar ratio of the aldehydes used in the present invention to the phenols is preferably in the range of 0.5 to 2.0, more preferably 0.8 to 1. It is good that it is in the range of 5.
フェノールノボラック樹脂の分子量に対して本発明の製
造法に関してもフェノール類とアルデヒド類の使用割合
に依存するところがあり、より高分子量体を得たいとき
はアルデヒド類の使用割合が1以上であることが好まし
い。Regarding the production method of the present invention, the molecular weight of the phenol novolak resin also depends on the ratio of phenols and aldehydes used, and when it is desired to obtain a higher molecular weight product, the ratio of aldehydes used may be 1 or more. preferable.
しかし、アルデヒド類の使用割合が1.5以上になると
フェノール類の水酸基部分による置換反応が起こり易く
なり、生成する樹脂の水酸基当量が少なくなることがあ
るのであまり好ましくはない。However, if the ratio of aldehydes used is 1.5 or more, a substitution reaction with the hydroxyl group of the phenol tends to occur, and the hydroxyl equivalent of the resulting resin may decrease, which is not very preferable.
酸触媒について述べる。Let's talk about acid catalysts.
本発明において用いられる酸性触媒としては具体的に硫
酸、塩酸、過塩素酸、硝酸、リン酸、などの無機プロト
ン酸、p−)ルエンスルホン酸、メタンスルホン酸、マ
レイン酸、酢酸、ギ酸、などの有機プロトン酸、三フッ
化ホウ素、三フッ化ホウ素エーテル錯体などの三フッ化
ホウ素の各種錯体、三塩化アルミニウム、四塩化すず、
塩化亜鉛、塩化第二鉄、四塩化チタンなどのルイス酸な
どを挙げることができるが、これらの酸性触媒のうちで
はプロトン酸を使用することが好ましい。Specific examples of acidic catalysts used in the present invention include inorganic protonic acids such as sulfuric acid, hydrochloric acid, perchloric acid, nitric acid, and phosphoric acid, p-)luenesulfonic acid, methanesulfonic acid, maleic acid, acetic acid, and formic acid. organic protonic acids, boron trifluoride, various complexes of boron trifluoride such as boron trifluoride ether complexes, aluminum trichloride, tin tetrachloride,
Examples include Lewis acids such as zinc chloride, ferric chloride, and titanium tetrachloride, but among these acidic catalysts, it is preferable to use protonic acids.
なお、酸性触媒の使用量は前記フェノール類に対して0
.1ないし70モル%の範囲であるが触媒として用いる
酸の強さ、酸の種類によって使用量は異なる。The amount of acidic catalyst used is 0 relative to the phenols mentioned above.
.. The amount used varies depending on the strength and type of acid used as a catalyst, although it ranges from 1 to 70 mol%.
反応濃度について述べる。Let's talk about the reaction concentration.
反応濃度としては、フェノール類とアルデヒド類の総仕
込み重量が、用いられる溶媒量に対し10〜70重量%
であることが好ましく、又特に20〜50重量%である
ことが好ましい。The reaction concentration is such that the total charged weight of phenols and aldehydes is 10 to 70% by weight based on the amount of solvent used.
The content is preferably 20 to 50% by weight.
反応温度について述べる。Let's talk about reaction temperature.
本発明のフェノールノボラック樹脂はフェノール類とア
ルデヒド類とをチッソ等の不活性雰囲気中、前記酸触媒
存在下、前記溶媒中に加熱下によって製造される0反応
温度としては50°Cから180℃または溶媒の沸点ま
での範囲で反応することが好ましく、特に70°Cから
150°Cの範囲で反応することが好ましい。The phenol novolak resin of the present invention is produced by heating phenols and aldehydes in the solvent in the presence of the acid catalyst in an inert atmosphere such as nitrogen, at a reaction temperature of 50°C to 180°C or It is preferable to react at a temperature up to the boiling point of the solvent, particularly preferably at a temperature from 70°C to 150°C.
(本発明の効果)
本発明では置換アルデヒド類を用いても高分子量でかつ
分子量分布の狭いフェノールノボラック樹脂が得られる
。また、その低分子量成分(2〜3核量体)の残存が極
めて少なく抑えられているので写真用素材等に利用して
もその性能は高くかつ弊害をもたらさない。(Effects of the present invention) In the present invention, even when substituted aldehydes are used, a phenol novolac resin having a high molecular weight and a narrow molecular weight distribution can be obtained. Furthermore, since the remaining low molecular weight components (2-3 nuclear units) are kept to an extremely low level, even when used as a photographic material, etc., the performance is high and no harmful effects are caused.
以上の反応試薬、反応条件により本発明の高分子量フェ
ノールノボラック樹脂が得られるが以下に本発明の実施
例を更に具体的に説明する。The high molecular weight phenolic novolak resin of the present invention can be obtained using the above reaction reagents and reaction conditions, and examples of the present invention will be explained in more detail below.
〈実施例1〉
フェノール/カプロンアルデヒド樹脂の合成フェノール
39.5g (0,42モル)、カプロンアルデヒド4
2.1g (0,42モル)、及びメトキシエタノール
33gとベンゼン76gを窒素気流下中の反応容器に入
れ室温で攪拌した。<Example 1> Synthesis of phenol/capronaldehyde resin Phenol 39.5g (0.42 mol), capronaldehyde 4
2.1 g (0.42 mol), 33 g of methoxyethanol, and 76 g of benzene were placed in a reaction vessel under a nitrogen stream and stirred at room temperature.
そこへ触媒としてp−)ルエンスルホン酸3.8g(0
,02モル)を加え、オイルバスにより徐々に加熱を開
始した。リフラックス反応(オイルバスの温度130−
140’C)時に冷却管の下部に水分定量受器を装着し
水の分離を確認しながら反応を4時間行い終了した。そ
の時の水の分離量は9I!dlであった。室温まで冷却
した反応液に酢酸エチル250dを加え抽出水洗を3回
行った。その後酢酸エチル溶液を硫酸マグネシウムで乾
燥して濾過、濃縮し真空ポンプで乾燥を行った。3.8g (0) of p-)luenesulfonic acid as a catalyst
, 02 mol) was added thereto, and heating was gradually started using an oil bath. Reflux reaction (oil bath temperature 130-
At 140'C), a moisture meter was attached to the lower part of the cooling tube, and the reaction was carried out for 4 hours while confirming the separation of water, and then completed. The amount of water separated at that time is 9I! It was dl. 250 d of ethyl acetate was added to the reaction solution cooled to room temperature, and extraction and washing with water were performed three times. Thereafter, the ethyl acetate solution was dried over magnesium sulfate, filtered, concentrated, and dried using a vacuum pump.
収168g、収率91.9%、
重量平均分子量3,400
分散()IW/)IN) 2 、 8
ただし、重量平均分子量はゲルパーミエイションクロマ
トグラフ(GPC)により求めた。GPCの測定条件は
東洋曹達社製HLC8020型GPC,分離カラムとし
て東洋曹達社製TSK−GEL2本(4,0OOH12
,0OOH)、溶離液としてTHF (流速1. 0m
/win 、カラム温度40°c)、UV吸収(254
ns)の吸収波長を求めることにより測定を行った。Yield 168 g, yield 91.9%, weight average molecular weight 3,400 dispersion ()IW/)IN) 2, 8 However, the weight average molecular weight was determined by gel permeation chromatography (GPC). The GPC measurement conditions were HLC8020 model GPC manufactured by Toyo Soda Co., Ltd., and two TSK-GEL (4,0 OOH12) manufactured by Toyo Soda Co. as separation columns.
,0OOH), THF as eluent (flow rate 1.0 m
/win, column temperature 40°C), UV absorption (254
The measurement was performed by determining the absorption wavelength of ns).
標準サンプルとしてポリスチレンを使用した。Polystyrene was used as a standard sample.
〈実施例2〉
0−クレゾール/ベンズアルデヒド樹脂の合成0−クレ
ゾール60.7g (0,56モル)、ベンズアルデヒ
ド65.4g (0,62モル)、及びメトキシエタノ
ール100gとトルエン100gを窒素気流下中の反応
容器に入れ室温で攪拌した。そこへ触媒として臭化水素
酸(47%)8゜6g (0,05モル)を加え、オイ
ルバスにより徐々に加熱を開始した。リフラックス反応
(オイルバスの温度+35−145°C)で生成する水
をトルエンと共に窒素気流により反応容器から蒸発させ
ながら反応を3時間行い終了した。反応液を冷却しメト
キシタノール1.00#11+を添加溶解し、その溶液
をアジター攪拌している水2!中に再沈澱させた。沈澱
物を濾別し水洗を2〜3回繰り返したあと真空乾燥器に
より乾燥を行った。<Example 2> Synthesis of 0-cresol/benzaldehyde resin 60.7 g (0.56 mol) of 0-cresol, 65.4 g (0.62 mol) of benzaldehyde, 100 g of methoxyethanol, and 100 g of toluene were mixed in a nitrogen stream. The mixture was placed in a reaction vessel and stirred at room temperature. 8.6 g (0.05 mol) of hydrobromic acid (47%) was added thereto as a catalyst, and heating was gradually started using an oil bath. The reaction was carried out for 3 hours and completed while water produced in the reflux reaction (oil bath temperature +35-145°C) was evaporated from the reaction vessel together with toluene by a nitrogen stream. The reaction solution was cooled, methoxytanol 1.00 #11+ was added and dissolved, and the solution was stirred in an agitator with water 2! It was re-precipitated inside. The precipitate was filtered, washed with water 2 to 3 times, and then dried in a vacuum dryer.
収量105 g、収率95.5%、
重量平均分子量14,800
分散(MW/MN) 2 、 5
〈実施例3〉
カテコール/n−オクチルアルデヒド樹脂の合成カテコ
ール28.6g (0,26モル)、n−オクチルアル
デヒド33.5g (0,26モル)、及び1−メトキ
シ−2−プロパツール50gとトルエン50gを窒素気
流下中の反応容器に入れ室温で攪拌した。そこへ触媒と
して硫酸266g(0,03モル)を加え、オイルバス
により徐々に加熱を開始した。リフラックス反応(オイ
ルバスの温度130−140°C)時に冷却管の下部に
水分定量受器を装着し水の分離を確認しながら反応を5
時間行い終了した。その時の水の分離量は5.3dであ
った。室温まで冷却した反応液に酢酸エチル300mを
加え抽出水洗を3回行った。Yield 105 g, yield 95.5%, weight average molecular weight 14,800 Dispersion (MW/MN) 2, 5 <Example 3> Synthesis of catechol/n-octylaldehyde resin Catechol 28.6 g (0.26 mol) , 33.5 g (0.26 mol) of n-octylaldehyde, 50 g of 1-methoxy-2-propatol, and 50 g of toluene were placed in a reaction vessel under a nitrogen stream and stirred at room temperature. 266 g (0.03 mol) of sulfuric acid was added there as a catalyst, and heating was gradually started using an oil bath. During the reflux reaction (oil bath temperature 130-140°C), attach a water metering receiver to the bottom of the cooling pipe and continue the reaction while checking the separation of water.
The time was over. The amount of water separated at that time was 5.3 d. 300 ml of ethyl acetate was added to the reaction solution cooled to room temperature, and extraction and washing with water were performed three times.
その後酢酸エチル溶液を硫酸マグネシウムで乾燥して濾
過、i4縮し真空ポンプで乾燥を行った。Thereafter, the ethyl acetate solution was dried over magnesium sulfate, filtered, condensed, and dried using a vacuum pump.
収量52g1収率90.4%、
重量平均分子量3.100
分散(M1台N)3.9
〈実施例4〉
ハイドロキノン/n−ドデシルアルデヒド樹脂の合成
ハイドロキノン33.0g (0,3モル)、nドデシ
ルアルデヒド55.3g (0,3モル)、及び1−メ
トキシ−2−プロパツール75gとトルエン75gを窒
素気流下中の反応容器に入れ室温で攪拌した。そこへ触
媒として硫酸2.9g(0,03モル)を加え、後は実
施例3と同様に反応を行った。Yield 52 g 1 Yield 90.4% Weight average molecular weight 3.100 Dispersion (M 1 unit N) 3.9 <Example 4> Synthesis of hydroquinone/n-dodecylaldehyde resin Hydroquinone 33.0 g (0.3 mol), n 55.3 g (0.3 mol) of dodecylaldehyde, 75 g of 1-methoxy-2-propatol, and 75 g of toluene were placed in a reaction vessel under a nitrogen stream and stirred at room temperature. 2.9 g (0.03 mol) of sulfuric acid was added as a catalyst, and the rest of the reaction was carried out in the same manner as in Example 3.
また、実施例4と同様にハイドロキノンのモル比に対す
るn−ドデシルアルデヒドの使用割合だけを変更した実
施例5〜9の結果を以下の表1に示す。Further, as in Example 4, the results of Examples 5 to 9 are shown in Table 1 below, in which only the proportion of n-dodecylaldehyde used relative to the molar ratio of hydroquinone was changed.
く比較例1〉
ハイドロキノン33.0g (0,3モル)、n−ドデ
シルアルデヒド55.3g (0,3モル)、及びl−
メトキシ−2−プロパツール150gt−窒素気流下中
の反応容器に入れ室温で攪拌した。Comparative Example 1 Hydroquinone 33.0 g (0.3 mol), n-dodecylaldehyde 55.3 g (0.3 mol), and l-
150 g of methoxy-2-propatol was placed in a reaction vessel under a nitrogen stream and stirred at room temperature.
そこへ触媒として硫酸2.9g (0,03モル)を加
え、オイルバスの温度130−140°Cで共沸脱水操
作なしで加熱反応を5時間行い、実施例と同様な後処理
を行った。2.9 g (0.03 mol) of sulfuric acid was added there as a catalyst, and a heating reaction was carried out at an oil bath temperature of 130-140°C for 5 hours without azeotropic dehydration, and the same post-treatment as in the example was performed. .
収量43g、収率60゜ 重量平均分子量740 分散(MW/MN) 6 、 7 3%、Yield: 43g, Yield: 60° Weight average molecular weight 740 Dispersion (MW/MN) 6, 7 3%,
Claims (1)
機溶媒均一系で縮合反応する工程において、生成する水
を共沸させて反応系外に除去することを特徴とした高分
子量フェノール樹脂の製造法。A method for producing a high molecular weight phenolic resin, characterized in that in a step of condensing phenols and aldehydes in a homogeneous organic solvent system in the presence of an acid catalyst, water produced is azeotropically removed from the reaction system.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7016189A JPH02248417A (en) | 1989-03-22 | 1989-03-22 | Production of high-molecular weight phenol resin |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7016189A JPH02248417A (en) | 1989-03-22 | 1989-03-22 | Production of high-molecular weight phenol resin |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02248417A true JPH02248417A (en) | 1990-10-04 |
Family
ID=13423558
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7016189A Pending JPH02248417A (en) | 1989-03-22 | 1989-03-22 | Production of high-molecular weight phenol resin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02248417A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1994015259A1 (en) * | 1992-12-29 | 1994-07-07 | Hoechst Celanese Corporation | Resin compositions for photoresist applications |
JP2004292791A (en) * | 2003-03-12 | 2004-10-21 | Sumitomo Bakelite Co Ltd | Production process of triazine-modified novolak type phenolic resin |
JP2005060649A (en) * | 2003-07-31 | 2005-03-10 | Dainippon Ink & Chem Inc | Epoxy resin composition, epoxy resin cured product, and novolak resin |
JP2009120649A (en) * | 2007-11-12 | 2009-06-04 | Showa Highpolymer Co Ltd | Method for producing high-molecular weight and high-ortho novolak resin |
WO2012165507A1 (en) * | 2011-06-03 | 2012-12-06 | 三菱瓦斯化学株式会社 | Phenolic resin and material for forming underlayer film for lithography |
JP2015011169A (en) * | 2013-06-28 | 2015-01-19 | 日産化学工業株式会社 | Composition for forming resist overlay film for lithography and method for manufacturing semiconductor device using the composition |
JP2018532027A (en) * | 2015-10-29 | 2018-11-01 | ヘキシオン・インコーポレイテッド | Novel alkylphenol resin and preparation method thereof |
US10696838B2 (en) | 2017-10-06 | 2020-06-30 | Hexion Inc. | Rubber compositions containing tackifiers |
-
1989
- 1989-03-22 JP JP7016189A patent/JPH02248417A/en active Pending
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1994015259A1 (en) * | 1992-12-29 | 1994-07-07 | Hoechst Celanese Corporation | Resin compositions for photoresist applications |
JP2004292791A (en) * | 2003-03-12 | 2004-10-21 | Sumitomo Bakelite Co Ltd | Production process of triazine-modified novolak type phenolic resin |
JP2005060649A (en) * | 2003-07-31 | 2005-03-10 | Dainippon Ink & Chem Inc | Epoxy resin composition, epoxy resin cured product, and novolak resin |
JP2009120649A (en) * | 2007-11-12 | 2009-06-04 | Showa Highpolymer Co Ltd | Method for producing high-molecular weight and high-ortho novolak resin |
US9110373B2 (en) | 2011-06-03 | 2015-08-18 | Mitsubishi Gas Chemical Company, Inc. | Phenolic resin and material for forming underlayer film for lithography |
WO2012165507A1 (en) * | 2011-06-03 | 2012-12-06 | 三菱瓦斯化学株式会社 | Phenolic resin and material for forming underlayer film for lithography |
CN103619892A (en) * | 2011-06-03 | 2014-03-05 | 三菱瓦斯化学株式会社 | Phenolic resin and material for forming underlayer film for lithography |
JPWO2012165507A1 (en) * | 2011-06-03 | 2015-02-23 | 三菱瓦斯化学株式会社 | Phenol-based resin and lower film forming material for lithography |
JP2015011169A (en) * | 2013-06-28 | 2015-01-19 | 日産化学工業株式会社 | Composition for forming resist overlay film for lithography and method for manufacturing semiconductor device using the composition |
JP2018532027A (en) * | 2015-10-29 | 2018-11-01 | ヘキシオン・インコーポレイテッド | Novel alkylphenol resin and preparation method thereof |
US10982034B2 (en) | 2015-10-29 | 2021-04-20 | Hexion Inc. | Alkylphenol resins and a method of preparing thereof |
US11518839B2 (en) | 2015-10-29 | 2022-12-06 | Bakelite UK Holding Ltd. | Alkylphenol resins and a method of preparing thereof |
US10696838B2 (en) | 2017-10-06 | 2020-06-30 | Hexion Inc. | Rubber compositions containing tackifiers |
US10982087B2 (en) | 2017-10-06 | 2021-04-20 | Hexion Inc. | Rubber compositions containing tackifiers |
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