JPH0224534U - - Google Patents

Info

Publication number
JPH0224534U
JPH0224534U JP10241788U JP10241788U JPH0224534U JP H0224534 U JPH0224534 U JP H0224534U JP 10241788 U JP10241788 U JP 10241788U JP 10241788 U JP10241788 U JP 10241788U JP H0224534 U JPH0224534 U JP H0224534U
Authority
JP
Japan
Prior art keywords
wafer
fixing device
dry etching
lower electrode
guide hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10241788U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10241788U priority Critical patent/JPH0224534U/ja
Publication of JPH0224534U publication Critical patent/JPH0224534U/ja
Pending legal-status Critical Current

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  • Drying Of Semiconductors (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の実施例を示すドライエツチン
グ装置におけるウエハ固定装置の平面図、第2図
は第1図のA−A線断面図、第3図は本考案の実
施例を示すウエハ固定装置のウエハ押さえ機構の
側面図、第4図は従来のドライエツチング装置の
ウエハ固定装置の平面図である。 11……ウエハ、12,12′,15,15′
……ウエハ押さえ、13……ウエハ押さえガイド
穴、14……ウエハエツチンク性が悪い部分、1
6……下部電極、21,22……パルスモータ、
23,24……伝動部材、25……支持軸。
Fig. 1 is a plan view of a wafer fixing device in a dry etching apparatus showing an embodiment of the present invention, Fig. 2 is a sectional view taken along line A-A in Fig. 1, and Fig. 3 is a wafer fixing device showing an embodiment of the present invention. FIG. 4 is a side view of the wafer holding mechanism of the apparatus, and a plan view of the wafer holding device of the conventional dry etching apparatus. 11...Wafer, 12, 12', 15, 15'
...Wafer holding, 13... Wafer holding guide hole, 14... Portion with poor wafer etching properties, 1
6... Lower electrode, 21, 22... Pulse motor,
23, 24... Transmission member, 25... Support shaft.

Claims (1)

【実用新案登録請求の範囲】 エツチングチヤンバ内においてウエハを固定す
るドライエツチング装置におけるウエハ固定装置
において、 (a) 前記ウエハを載置する下部電極と、 (b) 該下部電極の円周方向に形成されるガイド
穴と、 (c) 該ガイド穴に挿通され、前記ウエハの円周
方向に移動可能なウエハ押さえを具備することを
特徴とするドライエツチング装置のウエハ固定装
置。
[Scope of Claim for Utility Model Registration] A wafer fixing device in a dry etching apparatus that fixes a wafer in an etching chamber, comprising: (a) a lower electrode on which the wafer is placed; (b) a circumferential direction of the lower electrode; A wafer fixing device for a dry etching apparatus, comprising: a guide hole formed therein; and (c) a wafer holder inserted through the guide hole and movable in the circumferential direction of the wafer.
JP10241788U 1988-08-03 1988-08-03 Pending JPH0224534U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10241788U JPH0224534U (en) 1988-08-03 1988-08-03

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10241788U JPH0224534U (en) 1988-08-03 1988-08-03

Publications (1)

Publication Number Publication Date
JPH0224534U true JPH0224534U (en) 1990-02-19

Family

ID=31332310

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10241788U Pending JPH0224534U (en) 1988-08-03 1988-08-03

Country Status (1)

Country Link
JP (1) JPH0224534U (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05140771A (en) * 1991-11-15 1993-06-08 Nissin Electric Co Ltd Etching apparatus
JP2018121091A (en) * 2018-05-15 2018-08-02 パナソニックIpマネジメント株式会社 Plasma processing device and plasma processing method
US10744693B2 (en) 2017-10-23 2020-08-18 Fanuc Corporation Control device for injection molding machine and control method for injection molding machine

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05140771A (en) * 1991-11-15 1993-06-08 Nissin Electric Co Ltd Etching apparatus
US10744693B2 (en) 2017-10-23 2020-08-18 Fanuc Corporation Control device for injection molding machine and control method for injection molding machine
JP2018121091A (en) * 2018-05-15 2018-08-02 パナソニックIpマネジメント株式会社 Plasma processing device and plasma processing method

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