JPH0224534U - - Google Patents
Info
- Publication number
- JPH0224534U JPH0224534U JP10241788U JP10241788U JPH0224534U JP H0224534 U JPH0224534 U JP H0224534U JP 10241788 U JP10241788 U JP 10241788U JP 10241788 U JP10241788 U JP 10241788U JP H0224534 U JPH0224534 U JP H0224534U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- fixing device
- dry etching
- lower electrode
- guide hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001312 dry etching Methods 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 2
- 230000005540 biological transmission Effects 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Description
第1図は本考案の実施例を示すドライエツチン
グ装置におけるウエハ固定装置の平面図、第2図
は第1図のA−A線断面図、第3図は本考案の実
施例を示すウエハ固定装置のウエハ押さえ機構の
側面図、第4図は従来のドライエツチング装置の
ウエハ固定装置の平面図である。
11……ウエハ、12,12′,15,15′
……ウエハ押さえ、13……ウエハ押さえガイド
穴、14……ウエハエツチンク性が悪い部分、1
6……下部電極、21,22……パルスモータ、
23,24……伝動部材、25……支持軸。
Fig. 1 is a plan view of a wafer fixing device in a dry etching apparatus showing an embodiment of the present invention, Fig. 2 is a sectional view taken along line A-A in Fig. 1, and Fig. 3 is a wafer fixing device showing an embodiment of the present invention. FIG. 4 is a side view of the wafer holding mechanism of the apparatus, and a plan view of the wafer holding device of the conventional dry etching apparatus. 11...Wafer, 12, 12', 15, 15'
...Wafer holding, 13... Wafer holding guide hole, 14... Portion with poor wafer etching properties, 1
6... Lower electrode, 21, 22... Pulse motor,
23, 24... Transmission member, 25... Support shaft.
Claims (1)
るドライエツチング装置におけるウエハ固定装置
において、 (a) 前記ウエハを載置する下部電極と、 (b) 該下部電極の円周方向に形成されるガイド
穴と、 (c) 該ガイド穴に挿通され、前記ウエハの円周
方向に移動可能なウエハ押さえを具備することを
特徴とするドライエツチング装置のウエハ固定装
置。[Scope of Claim for Utility Model Registration] A wafer fixing device in a dry etching apparatus that fixes a wafer in an etching chamber, comprising: (a) a lower electrode on which the wafer is placed; (b) a circumferential direction of the lower electrode; A wafer fixing device for a dry etching apparatus, comprising: a guide hole formed therein; and (c) a wafer holder inserted through the guide hole and movable in the circumferential direction of the wafer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10241788U JPH0224534U (en) | 1988-08-03 | 1988-08-03 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10241788U JPH0224534U (en) | 1988-08-03 | 1988-08-03 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0224534U true JPH0224534U (en) | 1990-02-19 |
Family
ID=31332310
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10241788U Pending JPH0224534U (en) | 1988-08-03 | 1988-08-03 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0224534U (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05140771A (en) * | 1991-11-15 | 1993-06-08 | Nissin Electric Co Ltd | Etching apparatus |
JP2018121091A (en) * | 2018-05-15 | 2018-08-02 | パナソニックIpマネジメント株式会社 | Plasma processing device and plasma processing method |
US10744693B2 (en) | 2017-10-23 | 2020-08-18 | Fanuc Corporation | Control device for injection molding machine and control method for injection molding machine |
-
1988
- 1988-08-03 JP JP10241788U patent/JPH0224534U/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05140771A (en) * | 1991-11-15 | 1993-06-08 | Nissin Electric Co Ltd | Etching apparatus |
US10744693B2 (en) | 2017-10-23 | 2020-08-18 | Fanuc Corporation | Control device for injection molding machine and control method for injection molding machine |
JP2018121091A (en) * | 2018-05-15 | 2018-08-02 | パナソニックIpマネジメント株式会社 | Plasma processing device and plasma processing method |