JPH0223852B2 - - Google Patents

Info

Publication number
JPH0223852B2
JPH0223852B2 JP14779481A JP14779481A JPH0223852B2 JP H0223852 B2 JPH0223852 B2 JP H0223852B2 JP 14779481 A JP14779481 A JP 14779481A JP 14779481 A JP14779481 A JP 14779481A JP H0223852 B2 JPH0223852 B2 JP H0223852B2
Authority
JP
Japan
Prior art keywords
light
slit member
illuminance distribution
length direction
width
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14779481A
Other languages
Japanese (ja)
Other versions
JPS5849932A (en
Inventor
Takeshi Sugihara
Akira Satomi
Kenji Imamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Priority to JP14779481A priority Critical patent/JPS5849932A/en
Publication of JPS5849932A publication Critical patent/JPS5849932A/en
Publication of JPH0223852B2 publication Critical patent/JPH0223852B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00Photographic printing apparatus
    • G03B27/32Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52Details
    • G03B27/54Lamp housings; Illuminating means
    • G03B27/542Lamp housings; Illuminating means for copying cameras, reflex exposure lighting

Description

【発明の詳細な説明】 本発明は、例えば複写装置における照明用光源
と感光体との間の光路中に配置され、光の照度分
布パターンを調整する照度分布パターンの調整器
に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an illuminance distribution pattern adjuster that is disposed in an optical path between an illumination light source and a photoreceptor in a copying machine, for example, and adjusts the illuminance distribution pattern of light.

一般に複写装置においては、原稿に対して再現
性の高い複写画像を得るために、感光体上におけ
る光の照度分布を均一化することが必要であり、
この要請を達成するためには、原稿台上の細長い
帯状の照明領域の長さ方向における照度分布パタ
ーンを、第1図の特性曲線Iに示すように、当該
照明領域における両端部分の照度が中央部の照度
に比して大きい、全体としてうねりをもつた波状
とすることが必要とされる。このため例えば光源
電球として第2図に示すように複数の発光部Fを
非発光部Nを介して接続して成る部分発光型の棒
状電球Bを用いて端部側発光部Fの長さが中央側
発光部Fの長さより大きくなるものとし、両端に
おける照度が中央より大きい照度分布パターンを
得るようにしているが、棒状電球Bの長さ方向に
おける発光特性、或いは反射鏡の反射特性が、実
際上厳密には単品毎に異なることからこれら単品
を組合せたときには同一の構成であつても装置毎
に原稿台上の照度分布パターンが微妙に異なつた
ものとなり、このため上述の棒状電球Bを用いて
も原稿台上に理想的な照度分布パターンを得るこ
とは極めて困難であり、照度分布パターンの調整
が必要となる。
In general, in copying devices, in order to obtain highly reproducible copied images of originals, it is necessary to make the illuminance distribution of light on the photoreceptor uniform.
In order to achieve this requirement, the illuminance distribution pattern in the length direction of the elongated strip-shaped illumination area on the document table must be changed so that the illuminance at both ends of the illumination area is at the center, as shown in characteristic curve I in Figure 1. It is required that the overall illuminance is large compared to the illuminance of the area and has a wavy shape. For this reason, for example, as shown in FIG. 2, a partially emitting type rod-shaped light bulb B consisting of a plurality of light emitting parts F connected via a non-emitting part N is used as a light source light bulb. It is assumed that the length of the central light emitting part F is larger than the length of the central light emitting part F, so as to obtain an illuminance distribution pattern in which the illuminance at both ends is greater than that at the center. Strictly speaking, each individual item is different, so when these individual items are combined, the illuminance distribution pattern on the document table will be slightly different depending on the device even if they have the same configuration. Even if used, it is extremely difficult to obtain an ideal illuminance distribution pattern on the document table, and the illuminance distribution pattern must be adjusted.

このような事情から、例えば第3図に示すよう
に、棒状電球B及び反射鏡Mより成る照明用光源
と原稿台Tとの間に、第4図に示す複数の遮光板
10を照明領域の長さ方向に沿つて並べ、その
各々の光路内への突入深さSを調整してその各々
による透光量を規制することにより、或いは開口
幅が長さ方向全体に亘つて規制された透光用スリ
ツトを有する透光量分布規制部材を用いて電球B
の長さ方向における発光特性を補償することによ
つて、原稿台T上の照明領域における照度分布パ
ターンを理想的なもの又はこれに近似したものと
するようにしている。
Under these circumstances, for example, as shown in FIG. 3, a plurality of light shielding plates 10 shown in FIG. By arranging them along the length direction and regulating the amount of light transmitted by each by adjusting the penetration depth S into the optical path of each, or by regulating the amount of light transmitted by each of them, or by regulating the amount of light transmitted by each of them, Light bulb B using a light transmission amount distribution regulating member having a light slit
By compensating for the light emitting characteristics in the longitudinal direction, the illuminance distribution pattern in the illumination area on the document table T is made ideal or approximated thereto.

しかしながら複数の遮光板10を並設する手段
においては、すべての遮光板10についてその
各々の突入深さSを調整しなければならないた
め、照度分布パターンの調整に長い時間を必要と
するし、また透光用スリツトを有する透光量分布
規制部材を利用する手段においては、そのスリツ
トの形状により一義的に照度分布パターンの調整
の態様が定まつてしまうので、スリツトの形状が
若干異なる規制部材を何枚も準備しなければなら
ない上これらの中から適合するものを選定すると
いう面倒な手間を必要とし、結局装置を組立てる
とき、更にはその後棒状電球を交換する度毎に照
度分布パターンの調整に係る煩瑣な作業を行なわ
なければならないこととなる。
However, in the method of arranging a plurality of light shielding plates 10 in parallel, it is necessary to adjust the penetration depth S of each of the light shielding plates 10, which requires a long time to adjust the illumination distribution pattern. In the case of using a light transmission amount distribution regulating member having a light transmitting slit, the mode of adjustment of the illuminance distribution pattern is uniquely determined by the shape of the slit. In addition to having to prepare a number of lamps, it is tedious to select a suitable one from among them, and in the end, when assembling the device, and furthermore, each time the bar-shaped light bulb is replaced, the illuminance distribution pattern must be adjusted. Such complicated work will have to be carried out.

本発明はこのような事情に基づいてなされたも
のであつて、細長い帯状の照明領域の照度分布パ
ターンの調整を簡単に遂行することができ、従つ
て例えば複写装置に用いた場合に、短時間で感光
体上に均一な照度分布を得ることのできる照度分
布パターンの調整器を提供することを目的とし、
その特徴とするところは、透光部と遮光部とが長
さ方向に沿つて交互に形成された第1のスリツト
部材と、この第1のスリツト部材に長さ方向に移
動自在に重ね合わせた、透光部と遮光部とが長さ
方向に沿つて交互に形成された第2のスリツト部
材とより成り、前記第1のスリツト部材に係る透
光部と遮光部との長さ方向における配列パターン
と、前記第2のスリツト部材に係る透光部と遮光
部との長さ方向における配列パターンとが互に異
なる点にある。
The present invention has been made based on the above circumstances, and it is possible to easily adjust the illuminance distribution pattern of an elongated strip-shaped illumination area, and therefore, when used in a copying machine, for example, The purpose is to provide an illuminance distribution pattern adjuster that can obtain a uniform illuminance distribution on a photoreceptor.
Its features include a first slit member in which light-transmitting parts and light-blocking parts are formed alternately along the length direction; , a second slit member in which light-transmitting parts and light-blocking parts are alternately formed along the length direction, and the light-transmitting parts and light-blocking parts related to the first slit member are arranged in the length direction. The difference is that the pattern and the arrangement pattern in the length direction of the light-transmitting portion and the light-blocking portion of the second slit member are different from each other.

以下図面によつて本発明の実施例について説明
すると、第5図は複写装置における照明用光源と
原稿台との間に配置される照度分布パターンの調
整器を示し、この照度分布パターンの調整器は、
一縁が矩形波状に成形された第1のスリツト部材
1と、一縁が矩形波状に成形された第2のスリツ
ト部材2とを、矩形波状の縁が互い重なり合うよ
うに、長さ方向に移動自在、例えば摺動自在に重
ね、第1のスリツト部材1に対する第2のスリツ
ト部材2の摺動を阻止する固定機構を設けて成る
ものである。前記第1のスリツト部材1は、第6
図イに示すように長さ方向に沿つて並び切欠部と
非切欠部とを夫々透光部11と遮光部12として
利用し、スリツト部材1の長さ方向における透光
部11の幅L1及び遮光部12の幅l1が一様に
例えば5mmとされ、前記第2のスリツト部材2
は、第6図ロに示すように長さ方向に沿つて並ぶ
切欠部と非切欠部とを夫々透光部21と遮光部2
2として利用し、スリツト部材2の長さ方向にお
ける透光部21の幅L2及び遮光部22の幅l2
が一様に例えば5.5mmとされる。そして前記第1
のスリツト部材1には、長さ方向に延びる長孔1
3を形成すると共に、複数個の小孔14を長さ方
向に等間隔に並ぶよう形成し、前記第2のスリツ
ト部材2には、長さ方向に延びる長孔23を形成
すると共に、複数個の小孔24を、前記第1のス
リツト部材1における小孔14の間隔よりも若干
小さな間隔をもつて長さ方向に等間隔に並ぶよう
形成し、前記第1のスリツト部材1の長孔13と
前記第2のスリツト部材2の長孔23との重なり
部、及び前記第1のスリツト部材1の小孔14と
前記第2のスリツト部材2の小孔24との重なり
部において夫々ネジ止めすることにより前記第1
のスリツト部材1及び第2のスリツト部材2を互
に固定し得るようにし(第5図では、小孔14,
24を重ねていない状態であつていまだ互に固定
されていない状態を示す。)、こうして2枚のスリ
ツト部材1,2の摺動を阻止する固定機構を構成
する。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 5 shows an illuminance distribution pattern adjuster disposed between an illumination light source and a document table in a copying machine. teeth,
A first slit member 1 having one edge formed in a rectangular wave shape and a second slit member 2 having one edge formed in a rectangular wave shape are moved in the length direction so that the rectangular wave shaped edges overlap each other. The second slit member 2 is stacked so as to be freely, for example, slidably, and is provided with a fixing mechanism that prevents the second slit member 2 from sliding with respect to the first slit member 1. The first slit member 1 has a sixth slit member 1.
As shown in FIG. The width l1 of the light shielding part 12 is uniformly set to, for example, 5 mm, and the second slit member 2
As shown in FIG.
2, the width L2 of the light-transmitting part 21 and the width l2 of the light-shielding part 22 in the length direction of the slit member 2.
is uniformly set to, for example, 5.5 mm. and the first
The slit member 1 has a long hole 1 extending in the length direction.
3, and a plurality of small holes 14 are formed at equal intervals in the length direction, and the second slit member 2 is formed with long holes 23 extending in the length direction, and a plurality of small holes 14 are formed in the second slit member 2. The small holes 24 of the first slit member 1 are formed so as to be arranged at equal intervals in the length direction with slightly smaller intervals than the small holes 14 of the first slit member 1. and the long hole 23 of the second slit member 2, and the small hole 14 of the first slit member 1 and the small hole 24 of the second slit member 2 are screwed together. Possibly the first
The slit member 1 and the second slit member 2 can be fixed to each other (in FIG. 5, the small holes 14,
24 are not overlapped and are not yet fixed to each other. ), thus forming a fixing mechanism that prevents the two slit members 1 and 2 from sliding.

以上のような構成の照度分布パターンの調整器
においては、固定機構に係る前記ネジを緩めて第
1のスリツト部材1に対して第2のスリツト部材
2を摺動せしめると、これら2枚のスリツト部材
1,2により形成される各透光領域31の幅L3
と各遮光領域32の幅l3が変化し、例えばスリ
ツト部材1,2の重なり具合いを、第7図イに示
すように双方のスリツト部材1,2(第7図イ及
び第8図イにおいて、第2のスリツト部材2を斜
線で表わす。)の最も左側に位置する透光部11,
21の左縁が揃うようにすると、前記透光領域3
1と遮光領域32の配列パターンは、第7図ロに
P7として示すように、透光領域31の幅L3が
中央部に近づく程小さくなるようになり、調整器
の前面側(第7図イにおける紙面の表面側)に光
源を置くことにより調整器の後面側(第7図イに
おける紙面の裏面側)における照度分布パターン
は第7図ハにI7として示すように、中央部の光
透過率が低下した状態となる。そしてスリツト部
材1,2の重なり具合いを第8図イに示すよう
に、第2のスリツト部材2を第7図イに示した位
置から第1のスリツト部材1に対して図中右方向
に若干変位せしめると、前記透光領域31と遮光
領域32の配列パターンは、第8図ロにP8とし
て示すように、透光領域31の幅が中央部に近づ
く程大きくなるようになり、前記照度分布パター
ンは、第8図ハにI8として示すように、中央部
の光透過率が高くなつた状態となる。即ち、第1
のスリツト部材1における透光部11の幅L1及
び遮光部12の幅l1と、第2のスリツト部材2
における透光部21の幅L2及び遮光部22の幅
l2とが若干異なるため、2枚のスリツト部材
1,2を重ね合わせたときに形成される透光領域
31の幅L3、換言すると透光領域31の面積が
長さ方向に沿つて順次に大きくなつて再び小さく
なるという状態を繰返すこととなるため、調整器
の後面側に形成される照度分布パターンは、透光
領域31の幅L3の大きさの変化に対応した、う
ねりをもつた状態となり、第2のスリツト部材2
を第1のスリツト部材1に対して摺動せしめる
と、その波形を維持したまま摺動距離に応じて前
記うねりが移動するようになる。この照度分布パ
ターンに係るうねりは、振動数の若干異なる2つ
の波を重ね合わせたときに起こるうなり現象によ
るものであり、今この現象を模式的に説明する
と、第1のスリツト部材1の一縁の形状を(1)式で
表わされる正弦波y1、第2のスリツト部材2の
一縁の形状を(2)式で表わされる正弦波y2と仮定
すると、両者の合成波y3は(3)式で表わされる。
In the illuminance distribution pattern adjuster configured as described above, when the screw related to the fixing mechanism is loosened and the second slit member 2 is slid with respect to the first slit member 1, these two slits Width L3 of each transparent region 31 formed by members 1 and 2
The width l3 of each light shielding area 32 changes, for example, the degree of overlapping of the slit members 1 and 2 is changed as shown in FIG. The transparent part 11 located on the leftmost side of the second slit member 2 (the second slit member 2 is indicated by diagonal lines),
When the left edges of 21 are aligned, the transparent area 3
1 and the light shielding area 32, the width L3 of the light transmitting area 31 becomes smaller as it approaches the center, as shown as P7 in FIG. By placing the light source on the front side of the paper in Fig. 7A), the illuminance distribution pattern on the rear side of the adjuster (the back side of the paper in Fig. 7A) is determined by the light transmittance of the central part, as shown as I7 in Fig. 7C. is in a state where it has decreased. Then, as shown in FIG. 8A, the degree of overlapping of the slit members 1 and 2 is as shown in FIG. When displaced, the arrangement pattern of the light-transmitting region 31 and the light-blocking region 32 becomes larger as the width of the light-transmitting region 31 approaches the center, as shown as P8 in FIG. The pattern is in a state where the light transmittance in the central portion is high, as shown as I8 in FIG. 8C. That is, the first
The width L1 of the light-transmitting part 11 and the width l1 of the light-shielding part 12 in the slit member 1 and the second slit member 2
Since the width L2 of the light-transmitting part 21 and the width l2 of the light-shielding part 22 are slightly different, the width L3 of the light-transmitting region 31 formed when the two slit members 1 and 2 are overlapped, in other words, the width L2 of the light-transmitting part 21 and the width l2 of the light-shielding part 22 are Since the area of the region 31 increases sequentially along the length direction and then decreases again, the illuminance distribution pattern formed on the rear side of the adjuster is determined by the width L3 of the transparent region 31. The second slit member 2 becomes undulating in response to the change in size.
When the slit member 1 is slid against the first slit member 1, the undulations move according to the sliding distance while maintaining the waveform. The undulation related to this illuminance distribution pattern is due to the undulation phenomenon that occurs when two waves with slightly different frequencies are superimposed. To explain this phenomenon schematically, one edge of the first slit member 1 Assuming that the shape of is a sine wave y1 expressed by equation (1), and the shape of one edge of the second slit member 2 is a sine wave y2 expressed by equation (2), the composite wave y3 of both is expressed by equation (3). It is expressed as

y1=Acos(ωx) (1) y2=Acos{(ω+δ)x−φ} …(2) y3=2Acos(δ/2x−φ/2) ・cos{(ω+δ/2)x−φ/2} …(3) 但しL1+l1=2π/ω L2+l2=2π/ω+δ であり、スリツト部材の幅方向に延びる軸をy
軸、スリツト部材の長さ方向に延びる軸をx軸と
した。尚Aは定数、δは2つの正弦波y1,y2
の角速度の差、φは2つの正弦波y1,y2の位
相の変位の大きさを示す。
y1=Acos(ωx) (1) y2=Acos{(ω+δ)x−φ} …(2) y3=2Acos(δ/2x−φ/2) ・cos{(ω+δ/2)x−φ/2} …(3) However, L1+l1=2π/ω L2+l2=2π/ω+δ, and the axis extending in the width direction of the slit member is y
The axis extending in the length direction of the slit member was defined as the x-axis. Note that A is a constant and δ is two sine waves y1, y2
The difference in angular velocity, φ, indicates the magnitude of the phase displacement of the two sine waves y1 and y2.

この合成波y3は、上記2つの波y1,y2の
周期の差{(L2+l2)−(L1+l1)}が小さいときに
は、うなり現象が生じて緩かな波になり、このモ
デルにおいては、2枚のスリツト部材1,2を重
ね合わせることにより透光領域31の幅L3、即
ち透光領域31の面積が長さ方向に沿つて順次に
変化すると共に、面積の最も大きい透光領域同士
の間隔(上記の式ではうなりの周期に相当する。)
が4π/δとなり、2つの波の重なり具合いを変える ことによつてその波形を変えることなく位相が変
移していくこととなる。
When the difference between the periods of the above two waves y1 and y2 {(L2+l2)-(L1+l1)} is small, this composite wave y3 becomes a gentle wave due to a beat phenomenon. By overlapping the members 1 and 2, the width L3 of the light-transmitting region 31, that is, the area of the light-transmitting region 31, changes sequentially along the length direction, and the interval between the light-transmitting regions with the largest area (as described above) changes sequentially along the length direction. In the formula, it corresponds to the beat period.)
becomes 4π/δ, and by changing the degree of overlap between the two waves, the phase shifts without changing the waveform.

而して上述の実施例に係る照度分布パターンの
調整器においては、透光領域31が長さ方向に沿
つてその幅L3が順次に変化した状態で配列され
るものであるため、細長い帯状の光路中に配置す
ることにより、照明領域において緩かなうねりを
もつた波状の照度分布パターンを得ることができ
ると共に、第2のスリツト部材2を第1のスリツ
ト部材1に対して摺動させることによつて、当該
照度分布パターンを、うねりをもつた波状のまま
微小に変化させることができ、従つて、例えば第
9図に示すように、複写装置における棒状電球B
及び反射鏡Mより成る照明用光源と原稿台Tとの
間に上記の調整器100を配置してスリツト部材
1,2を長さ方向に相対的に移動せしめて両者の
重なり具合を調整することにより原稿台T上の照
明領域に理想状態又はこれに近似した照度分布パ
ターンを得ることができる。即ち前述したように
光源電球として棒状電球を用いた場合には、原稿
台上の照明領域における照度分布パターンは両端
部が中央部よりも高くなつた形状となるがこのパ
ターンを理想状態またはこれに近似したものとす
るためには、中央部の谷を若干高くして両端部の
山を若干低くしたり、或いは中央部の谷を更に若
干低くして両端部の山を更に若干高くする等パタ
ーンを微小に調整する必要があり、上記構成の調
整器によれば、このようなパターンの微小調整を
容易に行なうことができ、結局原稿台上の照明領
域の照度分布パターンの調整を簡単に行なうこと
ができて短時間で感光体上に均一な照度分布を得
ることができる。そして上述のように第1のスリ
ツト部材1に対する第2のスリツト部材2の摺動
を阻止する固定機構を設けているため、第1のス
リツト部材1と第2のスリツト部材2とを調整後
の位置(この例では長孔13,23或いは小孔1
4,24が重なり合う位置)において互に固定す
ることができる。しかも第1のスリツト部材1に
係る小孔14の間隔と第2のスリツト部材2に係
る小孔24の間隔とを互に若干異なるようにして
いるため、各スリツト部材1,2を重ね合わせて
微小に摺動させることにより、各スリツト部材
1,2の長さ方向に配列された小孔14,24が
順次に重なり合うこととなるから(各スリツト部
材1,2の左縁を揃えた状態から第2のスリツト
部材2を右方向に移動させると、先づ左側から1
番目の小孔14,24が重なり合い、さらに右方
向に移動させると左側から2番目の小孔14,2
4が重なり合い、このようにして小孔14,24
が順次に重なり合つてゆく)、2枚のスリツト部
材1,2の位置関係を微小に変えながら、調整後
に重なり合つた小孔14,24にネジを挿入する
ことにより2枚のスリツト部材1,2を互に確実
に固定することができる。
In the illuminance distribution pattern adjuster according to the above-described embodiment, the light-transmitting regions 31 are arranged in such a manner that the width L3 thereof varies sequentially along the length direction, so that the light-transmitting regions 31 are arranged in the form of a long and narrow strip. By placing it in the optical path, it is possible to obtain a wavy illuminance distribution pattern with gentle undulations in the illumination area, and also to allow the second slit member 2 to slide with respect to the first slit member 1. Therefore, the illuminance distribution pattern can be slightly changed while remaining in a wavy shape, and therefore, for example, as shown in FIG.
The above-mentioned adjuster 100 is disposed between the illumination light source consisting of the reflecting mirror M and the document table T, and the slit members 1 and 2 are moved relative to each other in the length direction to adjust the degree of overlap between the two. Accordingly, it is possible to obtain an ideal state or an illuminance distribution pattern approximating the ideal state in the illumination area on the document table T. In other words, when a rod-shaped light bulb is used as a light source bulb as described above, the illuminance distribution pattern in the illumination area on the document table has a shape in which both ends are higher than the center. In order to approximate the pattern, the valley in the center may be made slightly higher and the peaks at both ends may be made slightly lower, or the valley in the center may be made slightly lower and the peaks at both ends may be made slightly higher. It is necessary to make minute adjustments to the illuminance distribution pattern of the illumination area on the document table, and the adjuster with the above configuration can easily make such minute adjustments to the pattern. This makes it possible to obtain a uniform illuminance distribution on the photoreceptor in a short time. As described above, since the fixing mechanism is provided to prevent the second slit member 2 from sliding with respect to the first slit member 1, the first slit member 1 and the second slit member 2 can be position (in this example, long holes 13, 23 or small hole 1)
4 and 24) can be fixed to each other at the position where they overlap. Moreover, since the spacing between the small holes 14 in the first slit member 1 and the spacing between the small holes 24 in the second slit member 2 are made to be slightly different from each other, the slit members 1 and 2 can be overlapped. By minutely sliding, the small holes 14 and 24 arranged in the length direction of each slit member 1 and 2 will overlap one after another (from the state where the left edges of each slit member 1 and 2 are aligned). When the second slit member 2 is moved to the right, the first slit member 2 is moved from the left side.
The second small holes 14 and 24 overlap, and when moved further to the right, the second small holes 14 and 2 from the left side overlap.
4 overlap, and in this way the small holes 14, 24
The two slit members 1, 2 are successively overlapped), and by slightly changing the positional relationship of the two slit members 1, 2, and inserting screws into the overlapping small holes 14, 24 after adjustment, the two slit members 1, 2 can be securely fixed to each other.

ここで上述の構成の照度分布パターンの調整器
を複写装置における照明用光源の光路中に配置す
る場合において、照明用光源と原稿台との間に設
ける場合の具体例における好適な数値例を挙げる
と、第1のスリツト部材1に係る透光部11の幅
L1と遮光部12の幅l1を各々5mm、第2のス
リツト部材2に係る透光部21の幅L2と遮光部
22の幅l2を各々5.5mmとし、セルフオツクレ
ンズ等の投影光学器と感光体上との間に設ける場
合の具体例における好適な数値例を挙げると、第
1のスリツト部材1に係る透光部11の幅L1と
遮光部12の幅l1を各々3mmとし、第2のスリ
ツト部材2に係る透光部21の幅L2と遮光部2
2の幅l2を各々3.1mmとする。
Here, a preferred numerical example will be given in a specific example where the illuminance distribution pattern adjuster having the above-mentioned configuration is placed in the optical path of the illumination light source in a copying machine and is installed between the illumination light source and the document table. The width L1 of the light-transmitting part 11 and the width l1 of the light-shielding part 12 of the first slit member 1 are each 5 mm, and the width L2 of the light-transmitting part 21 and the width l2 of the light-shielding part 22 of the second slit member 2 are 5 mm. are each 5.5 mm, and to give a preferable numerical example in a specific example where it is provided between a projection optical device such as a self-occurring lens and the photoreceptor, the width of the transparent part 11 related to the first slit member 1 is L1 and the width l1 of the light shielding part 12 are each 3 mm, and the width L2 of the light transmitting part 21 related to the second slit member 2 and the width l1 of the light shielding part 2 are 3 mm.
Assume that the width l2 of 2 is 3.1 mm.

以上本発明の一実施例及び具体的構成例につい
て述べたが、前記第1のスリツト部材1及び第2
のスリツト部材2については、 (イ) スリツト部材の一縁を矩形波状に成形する代
りに、三角波状、或いは正弦波状に成形して透
光部と遮光部を形成する構成、 (ロ) スリツト部材の各透光部の幅を一定としない
構成、或いはスリツト部材の各遮光部の幅を一
定としない構成、 (ハ) スリツト部材の一縁を切欠する代りに中央部
を長さ方向に沿つて間隔を置いて透設すること
により透光部と遮光部を形成する構成、として
もよいがいずれの場合においても第1のスリツ
ト部材1における透光部11と遮光部12との
長さ方向に沿つた配列パターンと、第2のスリ
ツト部材2における透光部21と遮光部22と
の長さ方向に沿つた配列パターンとが互に若干
異なることが必要であり、これによつてこれら
スリツト部材1,2を重ね合わせたときに調整
器における透光領域31の面積が長さ方向に沿
つて順次に変化した状態となる。
Although one embodiment and a specific configuration example of the present invention have been described above, the first slit member 1 and the second slit member
Regarding the slit member 2, (a) instead of forming one edge of the slit member into a rectangular wave shape, it is formed into a triangular wave shape or a sinusoidal wave shape to form a light transmitting part and a light shielding part, (b) a structure in which a light transmitting part and a light blocking part are formed. (c) A configuration in which the width of each light-transmitting part of the slit member is not constant, or a configuration in which the width of each light-shielding part of the slit member is not constant; It is also possible to form a light-transmitting part and a light-blocking part by providing the light-transmitting part 11 and the light-blocking part 12 in the first slit member 1 at intervals. It is necessary that the arrangement pattern along the length of the second slit member 2 and the arrangement pattern of the light-transmitting portion 21 and the light-shielding portion 22 along the length direction of the second slit member 2 are slightly different from each other. When 1 and 2 are overlapped, the area of the light transmitting region 31 in the adjuster changes sequentially along the length direction.

(ニ) 前記第1のスリツト部材1と第2のスリツト
部材2とは摺動自在に重なり合う代わりに、互
に空間を介して移動自在に重なり合う構成であ
つてもよい。
(d) Instead of the first slit member 1 and the second slit member 2 slidingly overlapping each other, the first slit member 1 and the second slit member 2 may be configured to overlap each other so as to be movable through a space.

(ホ) 第1のスリツト部材1に対する第2のスリツ
ト部材2の移動を阻止する固定機構において
は、第1のスリツト部材1に、第2のスリツト
部材2の縁を挾止する挾止部材を設ける構成等
多種多様の構成とすることができる。
(e) In the fixing mechanism that prevents movement of the second slit member 2 with respect to the first slit member 1, a locking member that clamps the edge of the second slit member 2 is provided on the first slit member 1. A wide variety of configurations can be used, such as the configuration in which it is provided.

以上のように本発明は、透光部と遮光部とが長
さ方向に沿つて交互に形成された第1のスリツト
部材と、この第1のスリツト部材に長さ方向に移
動自在に重ね合わせた、透光部と遮光部とが長さ
方向に沿つて交互に形成された第2のスリツト部
材とより成り、前記第1のスリツト部材に係る透
光部と遮光部との長さ方向における配列パターン
と、前記第2のスリツト部材に係る透光部と遮光
部との長さ方向における配列パターンとが互に異
なるものであるから、細長い帯状の照明領域の照
度分布パターンの調整を簡単に遂行することがで
き、従つて例えば複写装置に用いた場合に、短時
間で感光体上に均一な照度分布を得ることのでき
る照度分布パターンの調整器を提供することがで
きる。
As described above, the present invention includes a first slit member in which light-transmitting parts and light-blocking parts are formed alternately along the length direction, and a first slit member that is movably superimposed on the first slit member in the length direction. In addition, the second slit member includes a second slit member in which light-transmitting parts and light-blocking parts are formed alternately along the length direction, and the light-transmitting part and the light-blocking part related to the first slit member are formed in the length direction. Since the arrangement pattern and the arrangement pattern in the length direction of the light-transmitting parts and the light-blocking parts related to the second slit member are different from each other, the illuminance distribution pattern of the elongated strip-shaped illumination area can be easily adjusted. Therefore, it is possible to provide an illuminance distribution pattern adjuster that can obtain a uniform illuminance distribution on a photoreceptor in a short time when used in a copying machine, for example.

尚本発明に係る照度分布パターンの調整器は、
複写装置に用いることに限定されるものではな
く、フアクシミリにおける照明系に組込む等種々
の用途に供することができる。
The illuminance distribution pattern adjuster according to the present invention includes:
The present invention is not limited to use in copying machines, and can be used for various purposes, such as being incorporated into the illumination system of facsimile machines.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は複写装置の原稿台上における照度分布
パターンの理想状態の一例を示す特性曲線図、第
2図は複写装置に使用される棒状電球の一例を示
す説明図、第3図は複写装置における照度分布パ
ターンの従来調整方法を説明する説明図、第4図
は第3図において用いられた遮光板を示す平面
図、第5図は本発明に係る照度分布パターンの調
整器の一実施例を示す平面図、第6図イ及びロ
は、夫々第5図に示した調整器における第1のス
リツト部材及び第2のスリツト部材を示す平面
図、第7図イ及びロ並びにハは、夫々第1のスリ
ツト部材を第2のスリツト部材の重なり具合いの
一例を示す説明図及び透光領域と遮光領域の配列
パターンを示す説明図並びに照度分布パターンを
示す特性曲線図、第8図イ及びロ並びにハは、
夫々第1のスリツト部材と第2のスリツト部材の
重なり具合いの他の例を示す説明図及び透光領域
と遮光領域の配列パターンを示す説明図並びに照
度分布パターンを示す特性曲線図、第9図は本発
明に係る照度分布パターンの調整器を複写装置に
用いた場合の一例を示す説明図である。 1……第1のスリツト部材、2……第2のスリ
ツト部材、11,21……透光部、12,22…
…遮光部、13,23……長孔、14,24……
小孔、31……透光領域、32……遮光領域、1
00……照度分布パターンの調整器、B……棒状
電球、M……反射鏡、T……原稿台。
Fig. 1 is a characteristic curve diagram showing an example of an ideal illuminance distribution pattern on the document table of a copying machine, Fig. 2 is an explanatory diagram showing an example of a rod-shaped light bulb used in a copying machine, and Fig. 3 is a diagram showing an example of a rod-shaped light bulb used in a copying machine. 4 is a plan view showing the light shielding plate used in FIG. 3, and FIG. 5 is an embodiment of the illuminance distribution pattern adjuster according to the present invention. FIGS. 6A and 6B are plan views showing the first slit member and second slit member in the regulator shown in FIG. An explanatory diagram showing an example of how the first slit member overlaps with the second slit member, an explanatory diagram showing the arrangement pattern of the light-transmitting area and the light-blocking area, and a characteristic curve diagram showing the illuminance distribution pattern, Figures 8A and 8B. Also, Ha is
FIG. 9 is an explanatory diagram showing another example of the overlapping condition of the first slit member and the second slit member, an explanatory diagram showing the arrangement pattern of the light-transmitting area and the light-blocking area, and a characteristic curve diagram showing the illuminance distribution pattern, respectively. FIG. 2 is an explanatory diagram showing an example of a case where the illuminance distribution pattern adjuster according to the present invention is used in a copying apparatus. DESCRIPTION OF SYMBOLS 1...First slit member, 2...Second slit member, 11, 21...Transparent part, 12, 22...
...Light shielding part, 13, 23... Long hole, 14, 24...
Small hole, 31... Light-transmitting area, 32... Light-blocking area, 1
00...Illuminance distribution pattern adjuster, B...Stand-shaped light bulb, M...Reflector, T...Original table.

Claims (1)

【特許請求の範囲】 1 透光部と遮光部とが長さ方向に沿つて交互に
形成された第1のスリツト部材と、この第1のス
リツト部材に長さ方向に移動自在に重ね合わせ
た、透光部と遮光部とが長さ方向に沿つて交互に
形成された第2のスリツト部材とより成り、前記
第1のスリツト部材に係る透光部と遮光部との長
さ方向における配列パターンと、前記第2のスリ
ツト部材に係る透光部と遮光部との長さ方向にお
ける配列パターンとが互に異なることを特徴とす
る照度分布パターンの調整器。 2 前記第1のスリツト部材は、透光部の幅L1
及び遮光部の幅l1が夫々一定であり、前記第2
のスリツト部材は、透光部の幅L2及び遮光部の
幅l2が夫々一定であり、透光部の幅L1とL2
とが互に異なるか若しくは遮光部の幅l1とl2
とが互に異なることを特徴とする特許請求の範囲
第1項記載の照度分布パターンの調整器。
[Claims] 1. A first slit member in which light-transmitting parts and light-blocking parts are formed alternately along the length direction, and a first slit member superimposed on the first slit member so as to be movable in the length direction. , a second slit member in which light-transmitting parts and light-blocking parts are alternately formed along the length direction, and the light-transmitting parts and light-blocking parts related to the first slit member are arranged in the length direction. An illuminance distribution pattern adjuster, characterized in that the pattern and the arrangement pattern in the length direction of the light-transmitting parts and the light-blocking parts of the second slit member are different from each other. 2 The first slit member has a width L1 of the transparent part.
and the width l1 of the light shielding portion are each constant, and the second
In the slit member, the width L2 of the transparent part and the width l2 of the light shielding part are constant, and the widths L1 and L2 of the transparent part are constant.
are different from each other or the widths l1 and l2 of the light shielding part
2. The illuminance distribution pattern adjuster according to claim 1, wherein the illuminance distribution pattern is different from each other.
JP14779481A 1981-09-21 1981-09-21 Adjuster for illuminance distribution pattern Granted JPS5849932A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14779481A JPS5849932A (en) 1981-09-21 1981-09-21 Adjuster for illuminance distribution pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14779481A JPS5849932A (en) 1981-09-21 1981-09-21 Adjuster for illuminance distribution pattern

Publications (2)

Publication Number Publication Date
JPS5849932A JPS5849932A (en) 1983-03-24
JPH0223852B2 true JPH0223852B2 (en) 1990-05-25

Family

ID=15438352

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14779481A Granted JPS5849932A (en) 1981-09-21 1981-09-21 Adjuster for illuminance distribution pattern

Country Status (1)

Country Link
JP (1) JPS5849932A (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2270597B1 (en) 2003-04-09 2017-11-01 Nikon Corporation Exposure method and apparatus and device manufacturing method
TWI569308B (en) 2003-10-28 2017-02-01 尼康股份有限公司 Optical illumination device, exposure device, exposure method and device manufacturing method
TWI385414B (en) 2003-11-20 2013-02-11 尼康股份有限公司 Optical illuminating apparatus, illuminating method, exposure apparatus, exposure method and device fabricating method
TWI609410B (en) 2004-02-06 2017-12-21 尼康股份有限公司 Optical illumination apparatus, light-exposure apparatus ,light-exposure method and device manufacturing method
KR101524964B1 (en) 2005-05-12 2015-06-01 가부시키가이샤 니콘 Projection optical system, exposure apparatus and exposure method
JPWO2008053881A1 (en) * 2006-11-01 2010-02-25 株式会社ニコン Dimming plate, exposure apparatus, exposure method, and device manufacturing method
JP2008282689A (en) * 2007-05-11 2008-11-20 Iwasaki Electric Co Ltd Luminaire
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
CN103097810B (en) * 2010-07-08 2015-09-16 兆光科技有限公司 For the variable space shutter of light-emitting diode display

Also Published As

Publication number Publication date
JPS5849932A (en) 1983-03-24

Similar Documents

Publication Publication Date Title
JPH0223852B2 (en)
US3544190A (en) Lens strip optical scanning system
KR950033690A (en) Projection exposure equipment
KR970003556A (en) Scanning type exposure apparatus
JP2002543375A (en) Optical position measuring device
US4090788A (en) Optical copying machine
US4213690A (en) Copying apparatus having a high-speed copying optical system
KR19980702257A (en) Arbitrary optical lens arrays with image areas up to the width of the substrate
JPS5922932B2 (en) Illuminance unevenness correction device for variable magnification copying machines
JP2000501517A (en) Ring interferometer arrangement for writing grating
US4728995A (en) Device for adjusting exposure amount
US4719492A (en) Scan type anamorphic magnifying apparatus
US4003649A (en) Electrophotographic halftone printing machine employing a phase screen
JP2001100135A (en) Optical scanner
JP2002139845A (en) Exposing and recording device
JPH05297256A (en) Optical member holding device
JP2887820B2 (en) Light intensity adjustment device for variable magnification slit scanner
SU615356A1 (en) Optical device for marking-out article surface
US4280752A (en) Solid-medium coherent optical processor
JPS60123832A (en) Correcting device for quantity of light of variable power copying machine
JP2859629B2 (en) 1x imaging element
JPH11109268A (en) Light beam scanning device
JPH0443863Y2 (en)
JPH03160411A (en) Laser light scanner
JPH07333750A (en) Lighting system of image forming device