JPH02211216A - Wet cleaning apparatus - Google Patents
Wet cleaning apparatusInfo
- Publication number
- JPH02211216A JPH02211216A JP1032106A JP3210689A JPH02211216A JP H02211216 A JPH02211216 A JP H02211216A JP 1032106 A JP1032106 A JP 1032106A JP 3210689 A JP3210689 A JP 3210689A JP H02211216 A JPH02211216 A JP H02211216A
- Authority
- JP
- Japan
- Prior art keywords
- air
- waste gas
- exhaust gas
- gas treatment
- contaminated air
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 17
- 239000007789 gas Substances 0.000 abstract description 45
- 230000002378 acidificating effect Effects 0.000 abstract description 7
- 239000007864 aqueous solution Substances 0.000 abstract description 7
- 239000003595 mist Substances 0.000 abstract description 4
- 239000000243 solution Substances 0.000 abstract description 4
- 239000003513 alkali Substances 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 2
- 238000012856 packing Methods 0.000 abstract description 2
- 239000002912 waste gas Substances 0.000 abstract 7
- 238000011086 high cleaning Methods 0.000 abstract 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- 239000007788 liquid Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 239000002253 acid Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000003749 cleanliness Effects 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000004887 air purification Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、例えばクリーンルーム内で薬液を使用する
時に必要とされる高清浄空間を作り出すための清浄ウェ
ット処理装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a clean wet processing apparatus for creating a highly clean space required when using chemical solutions in a clean room, for example.
第３図は従来の清浄ウェット処理装置の構成図である。 FIG. 3 is a block diagram of a conventional clean wet processing apparatus.
図において、１は系外の空気、２は前段フィルタ３を介
して系外の空気１を系内に供給するための供給ファン、
４は供給された系外の空気１を高清浄する高清浄フィル
タ、５は高清浄フィルタ４を通った高清浄空気、６は作
業を行うための作業空間、７は作業空間６から排気され
る汚染空気、８は作業空間６の空気中の酸性分等を除去
するアルカリ含有水溶液の廃液である。In the figure, 1 is air outside the system, 2 is a supply fan for supplying air 1 outside the system into the system via the pre-stage filter 3,
4 is a high-purity filter that highly cleans the supplied air 1 outside the system, 5 is highly clean air that has passed through the high-purity filter 4, 6 is a work space for performing work, and 7 is exhausted from the work space 6 Contaminated air 8 is an alkali-containing aqueous waste solution for removing acidic components from the air in the work space 6.
次に動作について説明する。系外の空気ｌは、前段フィ
ルタ３を介して供給ファン２により系内に吸引され、高
清浄フィルタ４を通り、高清浄空気５として作業空間６
に供給される０作業空間６を通って汚れた空気７は系外
の図示しない動力に引かれ、系外に排出される。Next, the operation will be explained. Air l outside the system is sucked into the system by the supply fan 2 via the pre-stage filter 3, passes through the high-purity filter 4, and is delivered to the work space 6 as highly clean air 5.
The dirty air 7 that passes through the working space 6 is drawn by a power source (not shown) outside the system and is discharged outside the system.
従来の清浄ウェット処理装置は上述したようにして汚染
空気を系外に排出しているので、工場では大量の排ガス
を吸引して処理する大型排ガス処理設備が必要となり、
このため設備投資が高価になるという問題点があった。Conventional clean wet processing equipment discharges contaminated air outside the system as described above, so factories need large-scale exhaust gas treatment equipment that sucks in and processes large amounts of exhaust gas.
Therefore, there was a problem in that the equipment investment was expensive.
また、排ガス処理設備の能力により、設置できる清浄ウ
ェット処理装置の数に制限がある。また、作業空間であ
るクリーンルーム内の高価な高清浄空気を排ガスとして
クリーンルーム外に大量に出すため、新たな高清浄空気
を作るための無駄な費用がかかる等の問題点があった。Furthermore, there is a limit to the number of clean wet treatment devices that can be installed depending on the capacity of the exhaust gas treatment equipment. In addition, since a large amount of expensive highly clean air in the clean room, which is a work space, is discharged outside the clean room as exhaust gas, there are problems such as unnecessary costs for producing new highly clean air.
この発明は上記のような問題点を解決するためになされ
たもので、大型排ガス処理設備を不要とし、設備投資や
クリーンルームの清浄を行うための費用のコストダウン
を図れる清浄ウェット処理装置を提供することを目的と
する。This invention was made to solve the above-mentioned problems, and provides a clean wet treatment device that eliminates the need for large-scale exhaust gas treatment equipment and reduces equipment investment and clean room cleaning costs. The purpose is to
この発明に係る清浄ウェット処理装置は、作業空間６に
送り込む空気を清浄する清浄手段（高清浄フィルタ４）
と、作業空間６の汚染空気を排ガス処理部１５に引き込
むと共に排ガス処理部１５で処理された空気を清浄手段
（高清浄フィルタ４）に供給する供給手段（供給ファン
１４）とを備えたことを特徴とするものである。The clean wet processing device according to the present invention includes a cleaning means (high clean filter 4) that cleans the air sent into the work space 6.
and a supply means (supply fan 14) that draws contaminated air from the work space 6 into the exhaust gas treatment section 15 and supplies the air treated by the exhaust gas treatment section 15 to the cleaning means (high cleanliness filter 4). This is a characteristic feature.
清浄手段（高清浄フィルタ４）により清浄された空気は
作業空間６に送り込まれ、作業空間６で汚れた空気は供
給手段（供給ファン１４）により排ガス処理部１５に吸
い込まれて処理される。そして、排ガス処理部１５で処
理された空気は供給手段（供給ファン１４）により清浄
手段（高清浄フィルタ４）に供給される。これにより、
作業空間６で汚染された空気は再び清浄された空気とな
って作業空間６に供給される。Air purified by the cleaning means (high purity filter 4) is sent into the work space 6, and air contaminated in the work space 6 is sucked into the exhaust gas processing unit 15 by the supply means (supply fan 14) and treated. The air treated by the exhaust gas treatment section 15 is then supplied to the cleaning means (high purity filter 4) by the supply means (supply fan 14). This results in
The air contaminated in the working space 6 becomes purified air again and is supplied to the working space 6.
第１図はこの発明の一実施例に係る清浄ウェット処理装
置の構成図である。第１図において、第３図に示す構成
要素に対応ものには同一の符号を付し、その説明を省略
する。第１図において、９は気液接触面を大きくするた
めの充てん材、１０はＰＨ液を供給するためのＰＨ液供
給ノズル、１１．１２は気液接触装置であるデミスタ−
１３はＮａＯＨ水溶液を供給するためのＮａＯＨ水溶液
供給ノズル、１４は作業空間６の汚染空気を排ガス処理
部１５に引き込むと共に排ガス処理部１５で処理された
空気を高清浄フィルタ（清浄手段）４に供給する供給手
段としての供給ファンである。排ガス処理部１５は、上
述した充てん材９、ＰＨ液供給ノズル１０、デミスタ−
１１゜１２、ＮａＯＨ水溶液供給ノズル１３、および前
段フィルタ３を含み構成される。FIG. 1 is a block diagram of a clean wet processing apparatus according to an embodiment of the present invention. In FIG. 1, components corresponding to those shown in FIG. 3 are designated by the same reference numerals, and their explanations will be omitted. In FIG. 1, 9 is a filler for enlarging the gas-liquid contact surface, 10 is a PH liquid supply nozzle for supplying PH liquid, and 11.12 is a demister which is a gas-liquid contact device.
13 is a NaOH aqueous solution supply nozzle for supplying an NaOH aqueous solution; 14 is a nozzle for drawing contaminated air in the work space 6 into an exhaust gas treatment section 15 and supplies the air treated in the exhaust gas treatment section 15 to a high-purity filter (purifying means) 4; This is a supply fan as a supply means. The exhaust gas processing section 15 includes the above-mentioned filler 9, PH liquid supply nozzle 10, and demister.
11 and 12, a NaOH aqueous solution supply nozzle 13, and a pre-stage filter 3.
次に動作について説明する。高清浄フィルタ４を通った
高清浄空気５は、作業空間６で酸性のガスやミストなど
を含んだ汚染空気７となり、供給ファン１４の吸引力に
よって排ガス処理部１５に引き込まれる。そして、汚染
空気７は排ガス処理部１５の一塔目に設けられた充てん
材９を通り、この時、ＰＨ液供給ノズルＩＯから散布さ
れたＰＨ液がその汚染空気７の排ガスと効率良く接触し
、排ガス中の酸性ガスやミスト等を洗い流す。その後、
その排ガスはデミスタ−１１で水切りされ、この段階で
排ガス中の酸性分の例えば９０％は除去される。その排
ガスは、次に排ガス処理部１５の二塔目に入り、デミス
タ−１２を通る時、ＮａＯＨ水溶液供給ノズル１３から
散布された例えばＮａＯＨ１０％水溶液と接触する。こ
の時、排ガス中に残っていた酸性分の多くが除去され、
最後にその排ガスは前段フィルタ３を通り清浄処理され
る。この段階で排ガス中の酸性分の例えば９９％は除去
される。このようにして有害成分を除去された空気は、
供給ファン１４により高清浄フィルタ４に導かれ、再び
高清浄空気５として作業空間６に供給される。Next, the operation will be explained. The highly clean air 5 that has passed through the highly clean filter 4 becomes contaminated air 7 containing acidic gas, mist, etc. in the work space 6, and is drawn into the exhaust gas treatment section 15 by the suction force of the supply fan 14. Then, the contaminated air 7 passes through the packing material 9 provided in the first tower of the exhaust gas treatment section 15, and at this time, the PH liquid sprayed from the PH liquid supply nozzle IO efficiently contacts the exhaust gas of the contaminated air 7. , wash away acid gases, mist, etc. in exhaust gas. after that,
The exhaust gas is drained in a demister 11, and at this stage, for example, 90% of the acid content in the exhaust gas is removed. The exhaust gas then enters the second column of the exhaust gas treatment section 15 and, when passing through the demister 12, comes into contact with, for example, a 10% NaOH aqueous solution sprayed from the NaOH aqueous solution supply nozzle 13. At this time, most of the acid content remaining in the exhaust gas is removed,
Finally, the exhaust gas passes through a pre-stage filter 3 and is purified. At this stage, for example, 99% of the acid content in the exhaust gas is removed. The air from which harmful components have been removed in this way is
The air is guided to the highly clean filter 4 by the supply fan 14, and is again supplied to the work space 6 as highly clean air 5.
第２図は上記実施例を工場単位で説明するための構成図
である。第２図において、第１図に示す構成要素に対応
するものには同一の符号を付し、その説明を省略する。FIG. 2 is a configuration diagram for explaining the above embodiment on a factory-by-factory basis. In FIG. 2, components corresponding to those shown in FIG. 1 are designated by the same reference numerals, and their explanations will be omitted.
第２図において、１６は排ガス処理を行ったり高清浄空
気を作ったりする外調器、１７はクリーンルーム１８内
の空気を循環させるための循環空調器、工９はメンテナ
ンス時のバックアップ用排ガス処理設備である。このよ
うに工場内のクリーンルーム１８内にはこの実施例の清
浄ウェット処理装置２ｏが設けられているので、外調器
１６のランニングコスト（運転するための経費）を低減
できると共に、外調器１６等の排ガス処理能力に無関係
に清浄ウェット処理装置２０を必要台設けることが可能
となる。In Figure 2, 16 is an external air conditioner that processes exhaust gas and creates highly clean air, 17 is a circulation air conditioner that circulates the air in the clean room 18, and 9 is an exhaust gas treatment equipment for backup during maintenance. It is. As described above, since the clean wet processing device 2o of this embodiment is provided in the clean room 18 in the factory, the running cost (expenses for operating) of the external conditioner 16 can be reduced, and the external conditioner 16 It becomes possible to provide the necessary number of clean wet processing apparatuses 20 regardless of the exhaust gas processing capacity.
以上説明したように上記実施例によれば、清浄ウェット
処理装置に排ガス処理機能を持たせたので、工場単位で
見れば、大量の排ガスを吸引し処理する大型排ガス処理
設備が不要となり、設備投資や空気清浄のためのランニ
ングコストが安価になる。また、排ガス処理設備の吸引
力や処理能力に無関係に清浄ウェット処理装置を必要台
数設置できる。また、高価な高清浄空気を無駄にクリー
ンルーム外に排出しないため、クリーンルームの空気清
浄のためのランニングコストが低減する。As explained above, according to the above embodiment, the clean wet treatment equipment is equipped with an exhaust gas treatment function, so from a factory-level perspective, there is no need for large-scale exhaust gas treatment equipment that sucks and processes a large amount of exhaust gas, and capital investment is eliminated. The running costs for air purification are also cheaper. Furthermore, the required number of clean wet treatment devices can be installed regardless of the suction power and processing capacity of the exhaust gas treatment equipment. Furthermore, since expensive highly clean air is not wasted out of the clean room, running costs for cleaning the air in the clean room are reduced.
なお、上記実施例では汚染空気に含まれる酸性ガスの発
生を仮定して排ガス処理部に公知の酸性ガス処理用二段
式排ガス処理装置を用いたが、発生するガスに応じて最
も適した排ガス処理方法を用いればよい。また、清浄ウ
ェット処理装置の排ガス処理能力に不安があれば、エア
カーテンで作業空間を系外と分離してもよい。また、上
記実施例では完全なガス系クローズドシステムとしたが
、清浄ウェット処理装置をメンテナンス時のバックアッ
プ用などの補助的な目的で工場の排ガス処理設備に接続
してもよいし、同様の目的で数台の清浄ウェット処理装
置を配管で接続してもよい。Note that in the above example, a known two-stage exhaust gas treatment device for acid gas treatment was used in the exhaust gas treatment section on the assumption that acidic gas contained in contaminated air would be generated. Any processing method may be used. Furthermore, if there is any concern about the exhaust gas processing ability of the clean wet processing equipment, the work space may be separated from the outside of the system with an air curtain. In addition, although the above embodiment uses a complete gas-based closed system, the clean wet treatment equipment may be connected to the factory's exhaust gas treatment equipment for auxiliary purposes such as backup during maintenance, or for similar purposes. Several clean wet processing devices may be connected by piping.
以上のように本発明によれば、作業空間に送り込む空気
を清浄する清浄手段と、作業空間の汚染空気を排ガス処
理部に引き込むと共に排ガス処理部で処理された空気を
清浄手段に供給する供給手段とを備えて構成したので、
作業空間で汚染された空気を再び清浄された空気として
作業空間に供給でき、したがって大型排ガス処理設備が
不要となり、設備投資やクリーンルームの清浄を行うた
めの費用のコストダウンが図れるという効果が得られる
。As described above, according to the present invention, there is a cleaning means for cleaning the air sent into the work space, and a supply means for drawing contaminated air in the work space into the exhaust gas treatment section and supplying the air treated in the exhaust gas treatment section to the cleaning means. Since it was configured with
Air that has been contaminated in the work space can be supplied to the work space again as purified air, which eliminates the need for large-scale exhaust gas treatment equipment, resulting in the effect of reducing equipment investment and clean room cleaning costs. .
第１図はこの発明の一実施例に係る清浄ウェット処理装
置の構成図、第２図はこの実施例を工場単位で説明する
ための構成図、第３図は従来の清浄ウェット処理装置の
構成図である。
４・・・高清浄フィルタ（清浄手段）、６・・・作業空
間、１４・・・供給ファン（供給手段）、１５・・・排
ガス処理部、２０・・・清浄ウェット処理装置。
代理人 大 岩 増 雄（ばか２名）第１図
第２０
３； ＃Ｊｋ７ａＬｆ、 ４ ：Ｘ＋＋Ｓ１’ｙｎｂｆ
、 ５； ＆ｔ＃ｆｔ 、 ６： １’ＦＸｔｉ
＋’ｌ。
７：汚ｔビ２龜、、８；Ｊ乙イ〔，９；兄てん不ｒ、１
０； ＰＩ−１液イ大玲７ス゛ル。FIG. 1 is a configuration diagram of a clean wet processing apparatus according to an embodiment of the present invention, FIG. 2 is a configuration diagram for explaining this embodiment on a factory-by-factory basis, and FIG. 3 is a configuration diagram of a conventional clean wet processing apparatus. It is a diagram. 4... High cleanliness filter (cleaning means), 6... Work space, 14... Supply fan (supply means), 15... Exhaust gas processing section, 20... Clean wet processing device. Agent Masuo Oiwa (2 idiots) Figure 1 20 3; #Jk7aLf, 4:X++S1'ynbf
, 5; &t#ft, 6: 1'FXti
+'l. 7: dirty t bi 2 龜,, 8; J otsui [, 9; older brother tenfu r, 1
0; PI-1 liquid level 7 spools.
Claims (1)
間の汚染空気を排ガス処理部に引き込むと共に排ガス処
理部で処理された空気を上記清浄手段に供給する供給手
段とを備えたことを特徴とする清浄ウェット処理装置。The present invention is characterized by comprising a cleaning means for cleaning the air sent into the work space, and a supply means for drawing contaminated air in the work space into the exhaust gas treatment section and supplying the air treated by the exhaust gas treatment section to the cleaning means. Clean wet processing equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1032106A JPH02211216A (en) | 1989-02-10 | 1989-02-10 | Wet cleaning apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1032106A JPH02211216A (en) | 1989-02-10 | 1989-02-10 | Wet cleaning apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02211216A true JPH02211216A (en) | 1990-08-22 |
Family
ID=12349645
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1032106A Pending JPH02211216A (en) | 1989-02-10 | 1989-02-10 | Wet cleaning apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02211216A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4205347A1 (en) * | 1991-11-07 | 1993-05-13 | Mitsubishi Electric Corp | Wet nitrogen process and assembly - used to generate ultra-clean conditions within a chemical process space |
| KR20020097444A (en) * | 2001-06-21 | 2002-12-31 | 이성규 | Wet type dust collector |
| CN103418181A (en) * | 2012-05-14 | 2013-12-04 | 太仓子午电气有限公司 | Novel washing filtering device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49101429A (en) * | 1972-12-28 | 1974-09-25 |
-
1989
- 1989-02-10 JP JP1032106A patent/JPH02211216A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49101429A (en) * | 1972-12-28 | 1974-09-25 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4205347A1 (en) * | 1991-11-07 | 1993-05-13 | Mitsubishi Electric Corp | Wet nitrogen process and assembly - used to generate ultra-clean conditions within a chemical process space |
| US5344615A (en) * | 1991-11-07 | 1994-09-06 | Mitsubishi Denki Kabushiki Kaisha | Wet-process apparatus |
| KR20020097444A (en) * | 2001-06-21 | 2002-12-31 | 이성규 | Wet type dust collector |
| CN103418181A (en) * | 2012-05-14 | 2013-12-04 | 太仓子午电气有限公司 | Novel washing filtering device |
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