JPH022107A - Synchrotron radiation irradiating equipment - Google Patents

Synchrotron radiation irradiating equipment

Info

Publication number
JPH022107A
JPH022107A JP63145914A JP14591488A JPH022107A JP H022107 A JPH022107 A JP H022107A JP 63145914 A JP63145914 A JP 63145914A JP 14591488 A JP14591488 A JP 14591488A JP H022107 A JPH022107 A JP H022107A
Authority
JP
Japan
Prior art keywords
synchrotron radiation
outside
radiation
synchrotron
rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63145914A
Other languages
Japanese (ja)
Inventor
Koichi Okada
浩一 岡田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP63145914A priority Critical patent/JPH022107A/en
Publication of JPH022107A publication Critical patent/JPH022107A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Particle Accelerators (AREA)

Abstract

PURPOSE:To ensure 100% safety and make it possible to raise production efficiency by providing a radiation shield containing a synchrotron radiation source, beam lines and an irradiating equipment and a supply mechanism for supplying masks and wafers to the irradiating equipment from the outside of the shield. CONSTITUTION:A synchrotron radiation 2 radiated from a storage ring 1 which is a synchrotron radiation light source is introduced to an irradiating equipment 4 through many beam lines which are connected to the storage ring 1. A radiation shield 6 is disposed outside the equipment 4. In addition, a supply mechanism 7 for supplying masks and wafers from the outside of the shield 6 is disposed. As a result, the worker can work outside the radiation shield 6, and the exposure due to X rays and gamma rays is eliminated. The production efficiency can be raised to a maximum by the supply mechanism for masks and wafers.

Description

【発明の詳細な説明】 ［産業上の利用分野１ 本発明は、シンクロトロン放射光源から放射されるシン
クロトロン放射光を利用したシンクロトロン放射光露光
装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field 1] The present invention relates to a synchrotron radiation exposure apparatus that utilizes synchrotron radiation light emitted from a synchrotron radiation light source.

［従来の技術１ 近年、シンクロトロン放射光を利用した露光技術の研究
開発か急ｊ虫に広かってさている。第２図は、従来のシ
ンクロトロン放射光露光装置の構成図であり、同様の構
成図は、例えば１９８４年に発行された「ネ＾密機械」
第５０巻、１１号、５１〜５６真に示されている。同図
において、シンクロトロン放射光源であるストレイシリ
ング１から放ｔＡされるシンクロトロン放射光２は、ビ
ームライン３を通して露光装置４に導かれる。ストレイ
シリング１のすぐ外側には放射光遮蔽壁５が設けられて
いる。[Conventional technology 1] In recent years, research and development of exposure technology using synchrotron radiation has rapidly become widespread. Figure 2 is a block diagram of a conventional synchrotron radiation exposure apparatus.A similar block diagram can be found, for example, in "Ne~mi Machine" published in 1984.
Volume 50, No. 11, 51-56. In the figure, synchrotron radiation light 2 emitted from a stray ring 1, which is a synchrotron radiation light source, is guided to an exposure device 4 through a beam line 3. Immediately outside the stray ring 1, a radiation shielding wall 5 is provided.

［発明が解決しようとする課題１ 上記従来の構成においＣ１放割光改蔽壁５は、ストレイ
シリング１内を蓄積°電子流か安定に周回している場合
であっても、ストレイシリング１の外側にＸ線、γ線等
の漏洩かあり、人体にとって危険て゛あるため、これら
か漏洩するのを防ぐために設けられており、通常、数メ
ートル厚以内のコンクリート壁か用いられる。[Problem to be Solved by the Invention 1] In the above-mentioned conventional configuration, the C1 radiation blocking wall 5 prevents the accumulation of electrons in the stray ring 1 even when the electron flow is stably circulating inside the stray ring 1. Since there may be leakage of X-rays, gamma rays, etc. to the outside, which can be dangerous to the human body, they are built to prevent these from leaking, and usually concrete walls within a few meters thick are used.

しかしながら、特に、ストレイシリングに高エネルギー
の電子流を蓄積するとぎには、ストレイシリングの外に
漏洩覆るＸ線、γ線等は放射光遮蔽壁があっても、壁を
通して漏れてくる可能性かあり、人体にとって危険であ
る。このような電子流蓄積の場合は、第２図の構成全体
を含む施設外に退避することが多い。また、突然電子流
がダウン（止まる）したとぎは、遮蔽壁を通して、壁の
近傍では、Ｘ線、γ線が漏れる可能性も高い。このよう
にビームラインの近傍はＸ線、γ線漏洩の可能性があり
、危険である。However, especially when a high-energy electron flow is accumulated in the strech ring, there is a possibility that X-rays, gamma rays, etc. that leak outside the strech ring may leak through the wall even if there is a radiation shielding wall. Yes, it is dangerous to humans. In the case of such electron flow accumulation, it is often evacuated outside the facility including the entire configuration shown in FIG. Furthermore, when the electron flow suddenly stops, there is a high possibility that X-rays and γ-rays will leak through the shielding wall near the wall. As described above, the vicinity of the beam line is dangerous due to the possibility of leakage of X-rays and γ-rays.

シンクロトロン放射光露光装置をＶＬＳＩ等の生産のた
めに用いようとする場合、第２図に示したような従来の
構成の装置では上記の事項からはなはだ不都合であるこ
とか理解される。即ら、露光装置の場所においては作業
者か１００％安全な状態で常に作業できる環境でな（プ
ればならない。そのためには、２４時間態勢で敢剣線の
被爆を全く受ける心配なく動ける環境でないと、生産の
効率化は達成できず、大量生産によるコスト低減のメリ
ットを１することはできない。When a synchrotron radiation exposure apparatus is to be used for the production of VLSI, etc., it is understood that the apparatus having the conventional configuration as shown in FIG. 2 is extremely inconvenient from the above points. In other words, the location of the exposure equipment must be in an environment where workers can work in 100% safe conditions at all times. Otherwise, production efficiency cannot be achieved and the cost reduction benefits of mass production cannot be fully realized.

上記の点から、ストレイシリング近傍のＸ線。From the above point, X-rays near Strayshilling.

γ線等を強力に受ける部分に放射光遮蔽壁を配置覆る従
来の構造は、Ｘ線等の漏洩の危険・ｅ４か大きく、作業
者にとって危険であり、４！めで不都合であることか理
解される。The conventional structure in which radiation shielding walls are placed in areas that are strongly exposed to γ-rays, etc. has a high risk of leakage of X-rays, etc., and is dangerous for workers. I understand that this is an inconvenience.

本発明の目的は、このような従来の問題貞を解決して、
１′１業者に１００％の安全性を保障し、生産効率を畠
めることの可能なシンクロトロン敢ｑ−１光露光装置を
提供することｔこある。The purpose of the present invention is to solve these conventional problems and
It is an object of the present invention to provide a synchrotron Q-1 light exposure apparatus that can guarantee 100% safety and increase production efficiency for 1'1 manufacturers.

［課題を解決するための手段１ 本発明は、シンクロトロン欣銅光源からの敢ＯＪ光をビ
ームラインにより露光装置に導き、露光を（ｉうシンク
ロトロン放口］光露光装置において、シンクＩＩ　１−
　ＩＩン敢ｑ４光源、ビームラインおよび露光装置の１
へてを内包する敢ｑｌ光遮蔽壁と、該放射光遮蔽壁の外
側から露光装置ｌ＼マスクおよびウェハを供給］Ｊる供
給機構とを備えてなることを特徴とするシンクロトロン
放射光露光装置である。[Means for Solving the Problems 1] The present invention introduces OJ light from a synchrotron copper light source to an exposure device through a beam line, and performs exposure by using a synchrotron light source in the light exposure device. −
II Ingen Q4 light source, beam line and exposure equipment 1
A synchrotron radiation exposure apparatus characterized by comprising: a light shielding wall that includes a radiation shielding wall; and a supply mechanism that supplies masks and wafers to the exposure apparatus from outside the radiation shielding wall. It is.

［作用］ 本発明においては、従来ストレイシリングの外周壁のす
ぐ外側に配設されていたｆｉ１割光鴻蔽甲を、ビームラ
インおよび露光装置をも含めて囲うようにして配設する
と共に、（の放６＝１光遮蔽壁の外側から供給機構によ
りマスクおにびウェハを供給するようにして各種の漏洩
に対重る安全性を確保したちのである。[Function] In the present invention, the fi 10% optical shield, which was conventionally disposed just outside the outer peripheral wall of the straight ring, is disposed so as to enclose the beam line and the exposure device, and ( By supplying the mask and wafer from outside the light shielding wall by the supply mechanism, safety against various leakages is ensured.

即ち、放射光遮蔽壁はストレイシリングから離れて、Ｘ
線等が従来Ｊ、りも弱められた場所に配設されることと
なり、該遮蔽壁の外側は１００％に近い安全性か確保さ
れる。また、露光装置へのマスクおよびウェハの供給は
該遮蔽壁の外側から供給機構を通じて行われるので、露
光装置の作業者はＸ線、γ線等の被爆の心配かなく、常
時生産態勢を維持することかできる。That is, the radiation shielding wall is separated from the stray ring and
Wires, etc. will be placed in places where they have been weakened in the past, and close to 100% safety will be ensured on the outside of the shielding wall. In addition, since masks and wafers are supplied to the exposure equipment from outside the shielding wall through the supply mechanism, operators of the exposure equipment can maintain production mode at all times without worrying about exposure to X-rays, gamma rays, etc. I can do it.

［実施例１ 以下本発明の実施例について、図面を参照しながら説明
する。[Example 1] Examples of the present invention will be described below with reference to the drawings.

第１図は本発明の一実施例におけるシンクロトロン放射
光露光装置の構成図である。同図において、シンクロト
ロン欣射光源であるストレイシリング１から敢剣される
シンクロトロン放射光２は、ストレイシリング１に多数
接続されたビームライン３を通して露光装置４に導かれ
る。露光装置４の外側には、放射光遮蔽壁６が配設され
る。さらに、ｈ父ｑ・１光遮蔽壁６の外側から、マスク
とつＴハを供給りる供給機構７か配設される。本構成の
ようにづれば、作業者は、放射光遮蔽壁６の外側で作業
覆ることができ、Ｘ線、γ線の被爆を完全に無くし、か
つ、マスクおよσウェハの供給機構にＪ、って、生産の
効率を最大限上げることが可能となり、本発明の目的は
達成される。FIG. 1 is a block diagram of a synchrotron radiation exposure apparatus in one embodiment of the present invention. In the figure, synchrotron radiation light 2 is emitted from a stracie ring 1, which is a synchrotron radiation light source, and is guided to an exposure apparatus 4 through a number of beam lines 3 connected to the stracie ring 1. A radiation shielding wall 6 is provided outside the exposure device 4 . Further, a supply mechanism 7 for supplying the mask and the mask from the outside of the light shielding wall 6 is provided. With this configuration, workers can cover their work outside the radiation shielding wall 6, completely eliminate exposure to X-rays and γ-rays, and have J, Therefore, it becomes possible to maximize production efficiency, and the object of the present invention is achieved.

［発明の効果］ 以ト説明したとおり、本発明によれば安全かつ生産効率
の畠いシンクロトロン６１ｉ１３寸光露光装置が提供さ
れ、シンクロトロン／Ｉ々ｑ１光リソグラフィの実用化
を一層促進することができる。[Effects of the Invention] As explained above, according to the present invention, a safe and highly productive synchrotron 61i13-dimensional light exposure apparatus is provided, and the practical application of synchrotron/I2Q1 optical lithography is further promoted. I can do it.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本発明の一実施例の構成図、第２図は従来のシ
ンクロトロン放射光露光装置の構成図である。 １・・・ストレイシリング ２・・・シンクロトロン６Ｈ＝Ｉ光 ３・・・ビームライン ４・・・露光装置 ５．６・・・放射光遮蔽壁 ７・・・マスクおよびウェハ供給機構 代 理 人 弁理を 舘 野 壬 第１FIG. 1 is a block diagram of an embodiment of the present invention, and FIG. 2 is a block diagram of a conventional synchrotron radiation exposure apparatus. 1... Stray Schilling 2... Synchrotron 6H=I light 3... Beam line 4... Exposure device 5.6... Synchrotron radiation shielding wall 7... Mask and wafer supply mechanism agent patent attorney Tateno Mitsu 1st

Claims (1)

【特許請求の範囲】[Claims] （１）シンクロトロン放射光源からの放射光をビームラ
インにより露光装置に導き、露光を行うシンクロトロン
放射光露光装置において、シンクロトロン放射光源、ビ
ームラインおよび露光装置のすべてを内包する放射光遮
蔽壁と、該放射光遮蔽壁の外側から露光装置へマスクお
よびウェハを供給する供給機構とを備えてなることを特
徴とするシンクロトロン放射光露光装置。(1) In a synchrotron radiation exposure apparatus that guides synchrotron radiation light from a synchrotron radiation light source to the exposure apparatus through a beam line and performs exposure, a synchrotron radiation shielding wall that includes all of the synchrotron radiation light source, beam line, and exposure apparatus. A synchrotron radiation exposure apparatus comprising: and a supply mechanism that supplies masks and wafers to the exposure apparatus from outside the radiation shielding wall.
JP63145914A 1988-06-15 1988-06-15 Synchrotron radiation irradiating equipment Pending JPH022107A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63145914A JPH022107A (en) 1988-06-15 1988-06-15 Synchrotron radiation irradiating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63145914A JPH022107A (en) 1988-06-15 1988-06-15 Synchrotron radiation irradiating equipment

Publications (1)

Publication Number Publication Date
JPH022107A true JPH022107A (en) 1990-01-08

Family

ID=15395996

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63145914A Pending JPH022107A (en) 1988-06-15 1988-06-15 Synchrotron radiation irradiating equipment

Country Status (1)

Country Link
JP (1) JPH022107A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02247986A (en) * 1989-02-24 1990-10-03 Molex Inc Strain relief structure for connecting flat and flexible cable to circuit board

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02247986A (en) * 1989-02-24 1990-10-03 Molex Inc Strain relief structure for connecting flat and flexible cable to circuit board
JPH0626155B2 (en) * 1989-02-24 1994-04-06 モレックス インコーポレーテッド Strain relief structure for connecting flat, flexible cables to circuit boards

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