JPH02198128A - Method of recording and reading identification information of semiconductor wafer - Google Patents

Method of recording and reading identification information of semiconductor wafer

Info

Publication number
JPH02198128A
JPH02198128A JP1017858A JP1785889A JPH02198128A JP H02198128 A JPH02198128 A JP H02198128A JP 1017858 A JP1017858 A JP 1017858A JP 1785889 A JP1785889 A JP 1785889A JP H02198128 A JPH02198128 A JP H02198128A
Authority
JP
Japan
Prior art keywords
wafer
bar code
slit
projection exposure
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1017858A
Other languages
Japanese (ja)
Inventor
Masafumi Otani
大谷 雅史
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi Electronics Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Electronics Engineering Co Ltd filed Critical Hitachi Electronics Engineering Co Ltd
Priority to JP1017858A priority Critical patent/JPH02198128A/en
Publication of JPH02198128A publication Critical patent/JPH02198128A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54493Peripheral marks on wafers, e.g. orientation flats, notches, lot number

Abstract

PURPOSE:To enable recording and reading with a simple optical apparatus by using a one-dimensional bar code as identification information to record into wafers of the raw material of a semiconductor integrated circuit. CONSTITUTION:A wafer 1 is mounted on a mount 1a, the image of a slit 4b is projected to positions corresponding to each of the bars of a bar code 3 in a region near the OF of the wafer 1 and exposed to a light one after another with a projection aligner 4 comprising a light source 4a, the slit 4b, and an image formation lens 4c, and development and processing with an etching apparatus are performed to record the bar code 3. In reading, the bar code 3 is illuminated with an illuminator 7 and the image is formed on a line sensor 8b through an objective lens 8a. The line sensor 8b is formed from a one-dimensional CCD and the output signal thereof is decoded by the use of a binary-coding circuit 9 and a signal processing circuit 10. The bit configuration of the bar code 3 includes manufacture lot numbers and numbers of each wafer only, therefore, a simple apparatus can be used. Thereby the identification information of the semiconductor wafers can be recorded and read at a low cost and control of the wafers in an IC plant can be rationalized.

Description

【発明の詳細な説明】 [産業上の利用分野コ この発明は、半導体ICの素材のウェハに対してID情
報を記録し、これを読み取る方式に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for recording and reading ID information on a wafer of semiconductor IC material.

[従来の技術] 電子機器に多用されるICはシリコンなどのウェハより
製造される。ICの製造においては、ウェハは素材とし
ての表面検査、およびウェノλに対して投影露光を経て
エツチングされたICパターン検査が各段階において行
われる。ウェハの製造工場においては、個々のウェハに
対する製造番号などの識別(ID)情報はなんら記入さ
れていないが、これを受は入れるIC製造工場において
は、個々のウェハに対するID情報が予め記入されてお
れば、製品の管理に好都合である。最近においては、I
Cの生産量、従ってウェハの使用量が増大しており、ウ
ェハの番号管理の必要性も高まっている。
[Prior Art] ICs often used in electronic devices are manufactured from wafers of silicon or the like. In the manufacture of ICs, the surface of the wafer as a raw material is inspected, and the IC pattern, which is etched through projection exposure on the wafer λ, is inspected at each stage. At wafer manufacturing factories, no identification (ID) information such as serial numbers is recorded for individual wafers, but at IC manufacturing factories that receive wafers, ID information for each wafer is recorded in advance. If there is, it will be convenient for product management. Recently, I
As the amount of C produced and, therefore, the amount of wafers used is increasing, the need for wafer number management is also increasing.

第3図はウェハに対する従来のID情報の形式とその記
録方法を説明するもので、ウェハlのOFの近傍にはI
Cに使用されない領域があるので、この領域に英数字の
文字パターン2を記録する。
Figure 3 explains the format of conventional ID information for wafers and its recording method.
Since there is an unused area in C, alphanumeric character pattern 2 is recorded in this area.

記録方法にはレーザビームを投射して熱作用によりウェ
ハ而に文字パターンを直接描く方法があり、または文字
パターンのマスクを投影法により露光し、現像、エツチ
ングしてIDVt報として記録する方法などが行われて
いる。その読み取りには、これをCODカメラなどの2
次元センサにより撮像し、画像処理により文字パターン
を認識する方法が行われている。
Recording methods include a method of directly drawing a character pattern on the wafer by projecting a laser beam and thermal action, or a method of exposing a mask of the character pattern using a projection method, developing and etching it, and recording it as IDVt information. It is being done. To read it, use two devices such as a COD camera.
A method is being used in which a dimensional sensor takes an image and character patterns are recognized through image processing.

[解決しようとする課題] 上記した従来のID情報の記録方法は文字パターンを描
くためにはかなり複雑な装置を必要とし、また読み取り
方法は、2次元の画像処理であるために、ハードウェア
、ソフトウェアがともに複雑で規模が大きく、これをI
C製造の各装置に設ける場合の経費は小さくない。そこ
で、より簡易で経済的な記録/読み取り方式が望まれて
いる。
[Problems to be solved] The conventional ID information recording method described above requires a fairly complicated device to draw the character pattern, and the reading method is two-dimensional image processing, so it requires hardware, Both software are complex and large in scale, and this
The cost of providing each C manufacturing device is not small. Therefore, a simpler and more economical recording/reading method is desired.

この発明は以上に鑑みてなされたもので、ID情報とし
て、簡単な一次元のバーコードを使用し、簡易な光学装
置で記録/読み取る方式を提供することを目的とするも
のである。
This invention was made in view of the above, and aims to provide a system that uses a simple one-dimensional barcode as ID information and records/reads it with a simple optical device.

[課題を解決するための手段コ この発明は、半導体ICの素材のウェハにおいて、OF
に接近した領域に、記録装置に設けられた投影露光手段
により、ウェハの管理に使用するID情報を表すバーコ
ードを記録し、記録されたバーコードをICの製造また
は検査装置にそれぞれ設けられた光学式読み取り手段に
より読み取るものである。
[Means for Solving the Problems] This invention provides an OF
A bar code representing ID information used for wafer management is recorded by a projection exposure means provided in the recording device in an area close to the IC manufacturing or testing device. It is read by an optical reading means.

上記の投影露光手段の投影露光器は、ウェハに対して光
源よりの光ビームをスリットを透過して結像レンズによ
りスリットの像をウェハに結像し、バーコードのバーの
配列位置にスリットの像を逐次ステップ移動して停止す
るとともに、光源の発光を制御して投影露光する。
The projection exposure device of the projection exposure means described above transmits a light beam from a light source through a slit onto the wafer, forms an image of the slit on the wafer using an imaging lens, and places the slit at the array position of the bar code. The image is moved step by step and stopped, and the light emission of the light source is controlled to perform projection exposure.

上記の光学式読み取り手段は、適当に照明されたバーコ
ードを、対物レンズによりラインセンサに結像し、ライ
ンセンサの出力信号を2値化して信号処理によりID情
報を検出する。
The above-mentioned optical reading means images a suitably illuminated barcode onto a line sensor using an objective lens, binarizes the output signal of the line sensor, and detects ID information by signal processing.

[作用コ 上記の構成によるID情報の記録/読み取り方式におい
ては、記録装置の投影露光手段に、より発光が制御され
たスリットの像がバーコードに従って逐次移動して停止
し、ICに使用されないOFに接近した領域にバーコー
ドが記録される。記録されたバーコードは、ICの製造
または検査の各装置に設けられた光学式読み取り手段の
対物レンズによりラインセンサに結像され、ラインセン
サの出力信号の処理によりID情報が検出される。
[Function] In the ID information recording/reading method with the above configuration, the image of the slit whose light emission is controlled is sequentially moved and stopped in accordance with the bar code on the projection exposure means of the recording device, and the image of the OF which is not used for the IC is A barcode is recorded in the area close to. The recorded barcode is imaged on a line sensor by an objective lens of an optical reading means provided in each IC manufacturing or testing device, and ID information is detected by processing the output signal of the line sensor.

[実施例] 第1図(a)、(b)は、この発明による半導体ウェハ
のID情報記録/読み取り方式における、記録装置に設
けられた投影露光手段の実施例を示すもので、図(a)
において、ウェハ1を適当な載置台1aに載置し、これ
に対して光源4a、スリット4bおよび結像レンズ4C
よりなる投影露光器4を設け、ウェハ1のOFに接近し
た領域においてOFに平行に移動し、バーコード3の各
バーに対応する位置にスリット4bの像を逐次投影露光
する。
[Embodiment] FIGS. 1(a) and 1(b) show an embodiment of the projection exposure means provided in the recording apparatus in the semiconductor wafer ID information recording/reading method according to the present invention. )
, the wafer 1 is placed on a suitable mounting table 1a, and a light source 4a, a slit 4b, and an imaging lens 4C are placed on the wafer 1.
A projection exposure device 4 is provided, which moves parallel to the OF in a region close to the OF of the wafer 1, and sequentially projects and exposes images of the slits 4b at positions corresponding to each bar of the barcode 3.

投影露光は、ICパターンの場合と同様にウェハ1に適
当なホトレジスト剤を塗布して行い、露光後現像、エツ
チング装置で処理してバーコード3が記録される。現像
、エツチング装置は図示しないが、IC製造装置のそれ
を利用する。図(b)は、投影露光器4に対するステッ
プ移動制御と、光源4aの発光制御に対する回路構成図
で、マイクロプロセッサ6の指令を受けて、移動制御回
路5cと移動機構53により投影露光器4がバーコード
の各バーに対応する位置にステップ移動して停止し、こ
こで発光制御回路5bにより光源4aが発光してスリブ
)4bの像が投影露光される゛。第2図は、[―記によ
り記録されたID情報に対する光学式読み取り手段の実
施例を示すもので、適当な照明47によりバーコード3
を!(6明し、その映像を対物レンズ8aによりライン
センサ8bに結像する。ラインセンサ8bは1次元のC
CI)により構成する。ラインセンサ8bの出力信号は
2値化回路9により2値化されて、バーコード3の各バ
ーがそれぞれ検出され、信号処理回路IOにおいてID
情報がデコードされる。バーコード3のビット構成は、
製造のロフト番号と個々のウェハ番号のみであるので、
一般の方法に比較して簡易なもので充分であり、これに
対するデコード方法または回路は通常の技術により容易
に構成することができ説明を省略する。
Projection exposure is carried out by coating the wafer 1 with a suitable photoresist agent in the same way as in the case of IC patterns, and after exposure, processing is performed using a developing and etching device to record the barcode 3. Although developing and etching equipment are not shown, those of the IC manufacturing equipment are used. Figure (b) is a circuit configuration diagram for step movement control of the projection exposure device 4 and light emission control of the light source 4a. In response to instructions from the microprocessor 6, the projection exposure device 4 is moved by the movement control circuit 5c and the movement mechanism 53. It moves stepwise to a position corresponding to each bar of the bar code and stops, and here the light source 4a emits light by the light emission control circuit 5b to project and expose the image of the sleeve 4b. FIG. 2 shows an embodiment of an optical reading means for ID information recorded by [-], in which a bar code 3 is scanned by an appropriate illumination 47.
of! (6 mornings, the image is focused on the line sensor 8b by the objective lens 8a. The line sensor 8b is a one-dimensional C
CI). The output signal of the line sensor 8b is binarized by the binarization circuit 9, each bar of the barcode 3 is detected, and the ID is
Information is decoded. The bit configuration of barcode 3 is:
Since it is only the manufacturing loft number and the individual wafer number,
A simple method is sufficient compared to a general method, and a decoding method or circuit for this can be easily constructed using a conventional technique, and therefore a description thereof will be omitted.

以−1−の光学式読み取り装置は、ICの製造または検
査装置のそれぞれに設けられてID情報が読み取られ、
各段階におけるウェハの管理に適用される。
The optical reading device described in -1- below is installed in each IC manufacturing or testing device to read ID information.
Applies to wafer management at each stage.

[発明の効果コ 以上の説明により明らかなように、この発明による゛b
導体ウェハのID情報記録/読み取り方式においては、
ICに使用されないウェハの領域にバーコードを記録す
るのでICの製造に支障ないしは損失を与えることがな
い。記録装置とバーコードはともに簡易であり、また光
学式読み取り手段は−・次元のラインセンサによる簡易
なもので、ICの製造または検査装置のそれぞれに少な
い経費で設備することができ、IC製造工場におけるウ
ェハの管理が合理化される効果には大きいものがある。
[Effects of the invention] As is clear from the above explanation, the effects of this invention
In the ID information recording/reading method for conductor wafers,
Since the barcode is recorded in an area of the wafer that is not used for ICs, there is no problem or loss in the manufacture of ICs. Both the recording device and the barcode are simple, and the optical reading means is a simple one using a -dimensional line sensor, so it can be installed at a low cost in each IC manufacturing or inspection device, and can be installed in an IC manufacturing factory. The effect of streamlining the management of wafers is significant.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a)および(b)は、この発明による半導体ウ
ェハのID情報記録/読み取り方式の投影露光手段の実
施例の構成図、第2図は第1図に対応する光学式読み取
り手段の実施例の構成図、第3図は、ウェハに対する従
来のID情報の説明図である。 1・・・ウェハ、la・・・載置台、2・・・文字パタ
ーン、3・・・バーコード、    4・・・投影露光
器、4a・・・光源、       4b・・・スリッ
ト、4c・・・結像レンズ、 5b・・・発光制御回路、 6・・・マイクロプロセラ 8a・・・対物レンズ、 9・・・2値化回路、 5a・・・移動機構、 5c・・・移動I制御回路、 す、7・・・照明器、 8b・・・ラインセンサ、 IO・・・信号処理部。 第1図 (a)
1(a) and (b) are block diagrams of an embodiment of a projection exposure means for recording/reading semiconductor wafer ID information according to the present invention, and FIG. 2 is a diagram of an optical reading means corresponding to FIG. FIG. 3, a configuration diagram of the embodiment, is an explanatory diagram of conventional ID information for a wafer. DESCRIPTION OF SYMBOLS 1... Wafer, la... Mounting table, 2... Character pattern, 3... Barcode, 4... Projection exposure device, 4a... Light source, 4b... Slit, 4c... - Imaging lens, 5b... Light emission control circuit, 6... Micro processor 8a... Objective lens, 9... Binarization circuit, 5a... Movement mechanism, 5c... Movement I control circuit , 7... Illuminator, 8b... Line sensor, IO... Signal processing section. Figure 1(a)

Claims (3)

【特許請求の範囲】[Claims] (1)半導体ICの素材のウェハにおいて、該ウェハの
オリエンティション・フラット(以下OFと略記)に接
近した領域に、記録装置に設けられた投影露光手段によ
り、該ウェハの管理に使用するID情報を表すバーコー
ドを記録し、該記録されたバーコードを上記ICの製造
または検査装置にそれぞれ設けられた光学式読み取り手
段により読み取ることを特徴とする、半導体ウェハのI
D情報記録/読み取り方式。
(1) On a wafer made of semiconductor IC material, ID information used to manage the wafer is recorded in an area close to the orientation flat (hereinafter abbreviated as OF) of the wafer using a projection exposure means installed in a recording device. A semiconductor wafer I, characterized in that a bar code representing the above is recorded, and the recorded bar code is read by an optical reading means provided in each of the above-mentioned IC manufacturing or inspection equipment.
D Information recording/reading method.
(2)上記投影露光手段の投影露光器は、上記ウェハに
対して、光源よりの光ビームをスリットを透過して結像
レンズにより該スリットの像を上記ウェハに結像し、上
記スリットの像を上記バーコードのバーの配列位置に逐
次ステップ移動して停止するとともに、上記光源の発光
を制御して投影露光する、請求項1記載の半導体ウェハ
のID情報記録/読み取り方式。
(2) The projection exposure device of the projection exposure means transmits a light beam from a light source through a slit to the wafer, forms an image of the slit on the wafer using an imaging lens, and forms an image of the slit on the wafer. 2. The ID information recording/reading method for a semiconductor wafer according to claim 1, wherein the ID information recording/reading method for a semiconductor wafer is performed by sequentially stepping and stopping the bar code at an array position of the bar code, and controlling light emission of the light source to perform projection exposure.
(3)上記光学式読み取り手段は、適当に照明された上
記バーコードを、対物レンズによりラインセンサに結像
し、該ラインセンサの出力を2値化して信号処理により
ID情報を検出する、請求項1記載の半導体ウェハのI
D情報記録/読み取り方式。
(3) The optical reading means images the suitably illuminated barcode onto a line sensor using an objective lens, binarizes the output of the line sensor, and detects ID information by signal processing. I of the semiconductor wafer according to item 1
D Information recording/reading method.
JP1017858A 1989-01-27 1989-01-27 Method of recording and reading identification information of semiconductor wafer Pending JPH02198128A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1017858A JPH02198128A (en) 1989-01-27 1989-01-27 Method of recording and reading identification information of semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1017858A JPH02198128A (en) 1989-01-27 1989-01-27 Method of recording and reading identification information of semiconductor wafer

Publications (1)

Publication Number Publication Date
JPH02198128A true JPH02198128A (en) 1990-08-06

Family

ID=11955357

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1017858A Pending JPH02198128A (en) 1989-01-27 1989-01-27 Method of recording and reading identification information of semiconductor wafer

Country Status (1)

Country Link
JP (1) JPH02198128A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5481095A (en) * 1992-02-17 1996-01-02 Mitsubishi Denki Kabushiki Kaisha Code reading pattern and an image pickup apparatus for reading the pattern
KR100269601B1 (en) * 1997-11-14 2000-12-01 김영환 Pattern disk and marking station
WO2003052395A1 (en) * 2001-12-18 2003-06-26 Cognex Technology And Investment Corporation Apparatus and method for slide illumination

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60173825A (en) * 1984-02-14 1985-09-07 Nippon Telegr & Teleph Corp <Ntt> Semiconductor substrate having discriminating code

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60173825A (en) * 1984-02-14 1985-09-07 Nippon Telegr & Teleph Corp <Ntt> Semiconductor substrate having discriminating code

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5481095A (en) * 1992-02-17 1996-01-02 Mitsubishi Denki Kabushiki Kaisha Code reading pattern and an image pickup apparatus for reading the pattern
KR100269601B1 (en) * 1997-11-14 2000-12-01 김영환 Pattern disk and marking station
WO2003052395A1 (en) * 2001-12-18 2003-06-26 Cognex Technology And Investment Corporation Apparatus and method for slide illumination
US6914679B2 (en) 2001-12-18 2005-07-05 Cognex Technology And Investment Corporation Side light apparatus and method

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