JPH02175659A - Production of sic heater - Google Patents

Production of sic heater

Info

Publication number
JPH02175659A
JPH02175659A JP63327846A JP32784688A JPH02175659A JP H02175659 A JPH02175659 A JP H02175659A JP 63327846 A JP63327846 A JP 63327846A JP 32784688 A JP32784688 A JP 32784688A JP H02175659 A JPH02175659 A JP H02175659A
Authority
JP
Japan
Prior art keywords
sic
heater
compact
shape
cutting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63327846A
Other languages
Japanese (ja)
Inventor
Tatsuo Nozawa
野沢 辰雄
Takahiro Tabei
貴浩 田部井
Kazunori Meguro
目黒 和教
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coorstek KK
Original Assignee
Toshiba Ceramics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Ceramics Co Ltd filed Critical Toshiba Ceramics Co Ltd
Priority to JP63327846A priority Critical patent/JPH02175659A/en
Publication of JPH02175659A publication Critical patent/JPH02175659A/en
Pending legal-status Critical Current

Links

Landscapes

  • Resistance Heating (AREA)
  • Ceramic Products (AREA)

Abstract

PURPOSE:To enable preparation of a wide area type SiC heater capable of evenly heating a planar material with a complicated shape to be heated by wholly calcining a planar compact made of SiC as a main raw material, cutting the compact into a prescribed shape and then sintering the cut compact. CONSTITUTION:An SiC heater (e.g. 10) having a heater part 12 and terminal parts 11 is produced by a method comprising the following steps (a) to (c). That is the step (a) for preparing a compact from SiC as a main raw material and calcining the resultant compact, step (b) for cutting the formed calcined SiC compact into a prescribed shape with a laser, numerical control(NC) working machine or water jets and step (c) for sintering the SiC compact cut into the prescribed shape.

Description

【発明の詳細な説明】 産業上の利用分野 この発明は焼°成、酸化等を行う熱処理炉用の熱源とし
て用いるSiCヒータの製造方法に関し、特に面状の被
加熱物を均一に加熱できるSiCヒータの製造方法に関
する。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method for manufacturing a SiC heater used as a heat source for a heat treatment furnace for firing, oxidizing, etc. The present invention relates to a method for manufacturing a heater.

従来の技術 SiC発熱体(ヒータ)は各種の工業分野で熱処理炉用
の熱源として広く用いられている。SiC発熱体の形状
は棒状、コの字型、ヘアピン型、オーム(Ω)型等各種
のものがある。従来のSiC発熱体は押し出し成形法に
より作られるのが常であった。押し出し成形法は、粒度
の異なるSiC粒子を配合し、所定量のバインダーを加
え混練後、押し出し成形機によって所定の形状に成形す
る方法である。押し出し成形法では、渦巻き型のような
複雑に曲りくねった形状の発熱体を製造できない。この
ため2つ以上のSiC発熱体を結合して複雑な形状の発
熱体を得ていた。
BACKGROUND OF THE INVENTION SiC heating elements (heaters) are widely used as heat sources for heat treatment furnaces in various industrial fields. There are various shapes of SiC heating elements, such as a rod shape, a U-shape, a hairpin shape, and an ohm (Ω) shape. Conventional SiC heating elements were typically made by extrusion. The extrusion molding method is a method in which SiC particles with different particle sizes are blended, a predetermined amount of binder is added, kneaded, and then molded into a predetermined shape using an extrusion molding machine. Extrusion molding cannot produce a heating element with a complicated twisting shape such as a spiral. For this reason, two or more SiC heating elements have been combined to obtain a heating element with a complicated shape.

発明が解決しようとする問題点 前述の方法で複雑な形状の発熱体を製造する場合には、
接着技術が重要であるが、その信頼性が不十分であった
。特に接着部の抵抗特性に問題があった。
Problems to be Solved by the Invention When manufacturing a heating element with a complicated shape using the method described above,
Adhesion technology is important, but its reliability has been insufficient. In particular, there was a problem with the resistance characteristics of the adhesive part.

また、比較的広い面積を加熱する場合には、例えば棒状
発熱体を2本以上並列に配置して使用しなければならず
、被加熱面を均一に加熱することができなかった。また
、一般に抵抗の制約から発熱部の形状はパイプ状の形状
に限定されていた。
Further, when heating a relatively large area, for example, two or more rod-shaped heating elements must be arranged in parallel, making it impossible to uniformly heat the surface to be heated. Furthermore, the shape of the heat generating portion is generally limited to a pipe-like shape due to resistance constraints.

発明の目的 この発明は前述した従来技術の問題点に鑑み、複雑な形
状を持ち、面状の被加熱物を均等に加熱できる広域型の
SiCヒータの製造方法を提供することを目的とする。
OBJECTS OF THE INVENTION In view of the problems of the prior art described above, an object of the present invention is to provide a method for manufacturing a wide-area SiC heater that has a complicated shape and can uniformly heat a planar object to be heated.

問題点を解決するための手段 この発明のSiCヒータの製造方法は、広範囲を加熱す
るヒータ部と電極を接続する端子部を備えたSiCヒー
タを製造する方法であって以下の工程を含むことを特徴
とする。
Means for Solving the Problems The method for manufacturing a SiC heater of the present invention is a method for manufacturing a SiC heater that has a heater section that heats a wide area and a terminal section that connects an electrode, and includes the following steps. Features.

a)SiCを主原料として、全体的に平板状の成形体を
作り仮焼成を行う工程と、b)  レーザまたはウォー
タージェットによって仮焼成したSiC成形体を所定形
状に切断する工程と、 C) 所定形状に切断したSiC成形体を本焼結する工
程。
a) A process of making an overall flat plate-shaped molded body using SiC as the main raw material and pre-firing it, b) A process of cutting the pre-baked SiC molded body into a predetermined shape using a laser or water jet, and C) A predetermined shape. A step of main sintering the SiC molded body cut into a shape.

ヒータ部と端子部は一体としてもよく、別体として製作
し本焼成後に接着してもよい。
The heater part and the terminal part may be integrated, or they may be manufactured separately and bonded together after the main firing.

端子部の比抵抗を0.002オ一ムセンチメートル(0
cm)以下に設定する場合には、端子部を別体とした方
が有利である。
The specific resistance of the terminal part is 0.002 ohm centimeter (0
cm) or less, it is advantageous to separate the terminal portion.

端子部の断面積はヒータ部の断面積の1゜5倍以上であ
ることが望ましい。1.5倍よりも小さい場合には端子
部が発熱する可能性がある。
It is desirable that the cross-sectional area of the terminal portion be at least 1.5 times the cross-sectional area of the heater portion. If it is smaller than 1.5 times, there is a possibility that the terminal section will generate heat.

また、ヒータ部及び端子部のエツジ部分は面取りを行う
のが望ましい。エツジ部分が鋭利であると、発熱時にエ
ツジ部分からクラックが発生し易くなる。
Further, it is desirable to chamfer the edges of the heater part and the terminal part. If the edge portion is sharp, cracks are likely to occur from the edge portion when heat is generated.

作用効果 この発明によれば、面状の被加熱物を均一に加熱できる
広域型のSiCヒータを製造することかできる。また、
この発明の方法によれば、被加熱物の形状にあわせてS
iCヒータの形状を自由に設定できる。
Effects According to the present invention, it is possible to manufacture a wide area type SiC heater that can uniformly heat a planar object to be heated. Also,
According to the method of this invention, the S
The shape of the iC heater can be freely set.

実施例 比表面積0.5rrr/gのs i C微粉40重量部
と平均粒径80ミクロンのSiC粗粉50重量部とフェ
ノール樹脂系のバインダー10重量部を混合し、平板状
に成形後、1800℃で120分間仮焼成を行った。
Example 40 parts by weight of SiC fine powder with a specific surface area of 0.5 rrr/g, 50 parts by weight of SiC coarse powder with an average particle size of 80 microns, and 10 parts by weight of a phenolic resin binder were mixed, and after molding into a flat plate, Temporary firing was performed at ℃ for 120 minutes.

得られたSiC仮焼成体をレーザ加工により第1図に示
す渦巻型形状に切断した。このとき、周囲のエツジ部分
の面取りも行った。
The obtained pre-fired SiC body was cut into a spiral shape shown in FIG. 1 by laser processing. At this time, the surrounding edges were also chamfered.

切断はウォータージェットまたはNC加工機を用いて行
ってもよい。
Cutting may be performed using a water jet or an NC processing machine.

次に、渦巻型SiC仮焼成体を、2300℃で60分間
焼結して渦巻型SiCヒーター0を得た。
Next, the spiral-shaped SiC pre-sintered body was sintered at 2300° C. for 60 minutes to obtain a spiral-shaped SiC heater 0.

ヒーター0は端子部11とヒータ部12から構成される
。ヒータ部12と端子部11の断面積の比は1:5に設
定した。
The heater 0 is composed of a terminal section 11 and a heater section 12. The ratio of the cross-sectional areas of the heater section 12 and the terminal section 11 was set to 1:5.

SiCヒータはFig、2及びFig、3のよウナ形状
にすることも可能である。このように本発明の方法によ
れば、様々な形状のSiCヒータを製造できる。ヒータ
の形状を被加熱物の形状に合せることにより、被加熱物
を均等に加熱できる。
The SiC heater can also be made into a shape as shown in FIGS. 2 and 3. As described above, according to the method of the present invention, SiC heaters of various shapes can be manufactured. By matching the shape of the heater to the shape of the object to be heated, the object to be heated can be heated evenly.

また、端子部とヒータ部を別々に製作し、焼成後に接着
してもよい。この場合、ヒーターと端子部とは必ずしも
同一平面上にある必要はなくヒーターに対して端子を垂
直に立てた構造も可能である。(図4) Fig、1に示したSiCヒータ10と従来のヒータを
用いて、200 mm X 200 mmの平板状の被
加熱物を加熱する実験を行った。実験では表面温度を最
大250℃まで加熱した。
Alternatively, the terminal portion and the heater portion may be manufactured separately and bonded together after firing. In this case, the heater and the terminal portion do not necessarily have to be on the same plane, and a structure in which the terminal is perpendicular to the heater is also possible. (FIG. 4) Using the SiC heater 10 shown in FIG. 1 and a conventional heater, an experiment was conducted to heat a flat object of 200 mm x 200 mm. In the experiment, the surface temperature was heated to a maximum of 250°C.

従来のヒータは棒状ヒータを4本並列に接続したもので
ある。
A conventional heater is one in which four rod-shaped heaters are connected in parallel.

実験の結果を第5図に示した。従来の4本並列棒状ヒー
タを用いた場合には、被加熱物の表面温度にむらがあっ
た。−力木発明の渦巻型SiCヒータを用いた場合には
、被加熱物は均等に加熱されることがわかった。
The results of the experiment are shown in Figure 5. When a conventional four-bar heater was used, the surface temperature of the object to be heated was uneven. - It was found that when the spiral SiC heater of Rikiki's invention was used, the object to be heated was heated evenly.

なお、本発明は前述の実施例に限定されない。例えば、
SiCヒータの形状は広域を加熱できる平板状ならば様
々な形状を採用できる。また、SiCヒータの厚みは任
意でよい。
Note that the present invention is not limited to the above-described embodiments. for example,
The SiC heater can have a variety of shapes as long as it is a flat plate that can heat a wide area. Further, the thickness of the SiC heater may be arbitrary.

【図面の簡単な説明】[Brief explanation of the drawing]

第1〜4a図は本発明のSiCヒータの製造方法により
製造したSiCヒータの実施例を示す平面図、第4b図
は第4a図のA−A断面図、第5図は本発明によるSi
Cヒータと従来のSiCヒータを用いて加熱実験を行っ
た時の温度分布を示すグラフである。 10.20,30.40・・・SiCヒータ11.21
,31.41・・・端子部 12.22,32.42・・・ヒータ部K〉 棒状4本並列(従来例) 争 渦巻型(本発明品) 、−−−4−一〇−+−膚 温度の測定位置(mm)
Figures 1 to 4a are plan views showing examples of SiC heaters manufactured by the method for manufacturing SiC heaters of the present invention, Figure 4b is a sectional view taken along line A-A in Figure 4a, and Figure 5 is a
It is a graph showing temperature distribution when a heating experiment was conducted using a C heater and a conventional SiC heater. 10.20, 30.40...SiC heater 11.21
, 31.41...Terminal part 12.22, 32.42...Heater part K> 4 rods in parallel (conventional example) Spiral type (product of the present invention), ---4-10-+- Skin temperature measurement position (mm)

Claims (1)

【特許請求の範囲】 ヒータ部と端子部を備えたSiCヒータを 製造する方法であって以下の工程を含むことを特徴とす
る方法。 a)SiCを主原料として成形体を作り、 仮焼成を行う工程と、 b)レーザ,NC加工機またはウォーター ジェットによって仮焼成したSiC成形体を所定形状に
切断する工程と、 c)所定形状に切断したSiC成形体を本 焼結する工程。
[Scope of Claim] A method of manufacturing a SiC heater having a heater portion and a terminal portion, the method comprising the following steps. a) A process of making a molded body using SiC as the main raw material and pre-firing it; b) A process of cutting the pre-baked SiC molded body into a predetermined shape using a laser, NC processing machine or water jet; c) A process of cutting the pre-baked SiC molded body into a predetermined shape. A process of main sintering the cut SiC molded body.
JP63327846A 1988-12-27 1988-12-27 Production of sic heater Pending JPH02175659A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63327846A JPH02175659A (en) 1988-12-27 1988-12-27 Production of sic heater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63327846A JPH02175659A (en) 1988-12-27 1988-12-27 Production of sic heater

Publications (1)

Publication Number Publication Date
JPH02175659A true JPH02175659A (en) 1990-07-06

Family

ID=18203634

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63327846A Pending JPH02175659A (en) 1988-12-27 1988-12-27 Production of sic heater

Country Status (1)

Country Link
JP (1) JPH02175659A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0484731A2 (en) * 1990-11-05 1992-05-13 Sumitomo Electric Industries, Ltd. Method of processing an AlN circuit board
JP2003007433A (en) * 2001-06-25 2003-01-10 Bridgestone Corp Ceramic heater and its manufacturing method
KR100856802B1 (en) * 2006-10-19 2008-09-05 (주) 이노쎄라 Silicon carbide heater and semiconductor diffusion device having the heater
CN114851352A (en) * 2022-05-23 2022-08-05 松山湖材料实验室 Resistance heating element and method of manufacturing the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0484731A2 (en) * 1990-11-05 1992-05-13 Sumitomo Electric Industries, Ltd. Method of processing an AlN circuit board
JP2003007433A (en) * 2001-06-25 2003-01-10 Bridgestone Corp Ceramic heater and its manufacturing method
KR100856802B1 (en) * 2006-10-19 2008-09-05 (주) 이노쎄라 Silicon carbide heater and semiconductor diffusion device having the heater
CN114851352A (en) * 2022-05-23 2022-08-05 松山湖材料实验室 Resistance heating element and method of manufacturing the same
CN114851352B (en) * 2022-05-23 2023-11-28 松山湖材料实验室 Resistance heating element and method for manufacturing same

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