JPH02174257A - Cmos integrated circuit device - Google Patents

Cmos integrated circuit device

Info

Publication number
JPH02174257A
JPH02174257A JP63329738A JP32973888A JPH02174257A JP H02174257 A JPH02174257 A JP H02174257A JP 63329738 A JP63329738 A JP 63329738A JP 32973888 A JP32973888 A JP 32973888A JP H02174257 A JPH02174257 A JP H02174257A
Authority
JP
Japan
Prior art keywords
integrated circuit
cmos integrated
resistor
output
circuit chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63329738A
Other languages
Japanese (ja)
Inventor
Toshio Sudo
須藤 俊夫
Takeshi Fujita
剛 藤田
Mitsuo Fujii
藤井 美津男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP63329738A priority Critical patent/JPH02174257A/en
Publication of JPH02174257A publication Critical patent/JPH02174257A/en
Pending legal-status Critical Current

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  • Semiconductor Integrated Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE:To enable output signal of a high-speed CMOS integrated circuit to be transmitted without any deformation of waveform by providing a resistor between the output node of the CMOS integrated circuit chip and the connection pad of an external circuit of that node. CONSTITUTION:The output buffer of a CMOS integrated circuit chip 10 consists of a p-channel MOS transistor 11 where a source is connected to a VDD wire 131 and an n-channel MOS transistor 12 where the source is connected to a VSS wire. A resistor 15 is provided between the output node of this output buffer and a connection pad 16 to the outside of the integrated circuit chip 10 corresponding to it. The resistor 15 consists of a polycrystal silicon film or a diffusion layer. The resistor 15 is set so that the sum of the resistance and the output impedance of the output buffer is equal to the characteristics impedance of signal path connected to the output terminal of this integrated circuit.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は、高速動作のCMOS集積回路装置に関する。[Detailed description of the invention] [Purpose of the invention] (Industrial application field) The present invention relates to a high-speed operating CMOS integrated circuit device.

(従来の技術) 各種情報処理システムの高速化に対する要求から、これ
に用いる半導体集積回路の高速化も求められている。高
速論理動作を行なう集積回路として代表的なものに、S
iを用いたものではECLがある。また高電子移動度特
性を利用したGaAs論理集積回路も高速論理動作可能
なものとして注目されている。最近はCMOS集積回路
の高速化も大いに進められている。
(Prior Art) Due to the demand for faster speeds of various information processing systems, there is also a demand for faster speeds of semiconductor integrated circuits used therein. S is a typical integrated circuit that performs high-speed logic operations.
There is ECL which uses i. GaAs logic integrated circuits that utilize high electron mobility characteristics are also attracting attention as capable of high-speed logic operation. Recently, much progress has been made in increasing the speed of CMOS integrated circuits.

CMOS集積回路の高速化に際しては、負荷容量を高速
に充電できるように出力バッフ7の電流駆動能力の増大
が必要である。この様な出力バッファの電流駆動能力の
増大により、これが接続される信号線路とのインピーダ
ンス不整合による反射が問題になってきている。この問
題を具体的に第4図を参照して説明する。第4図(a)
において、41.44はCMOS集積回路であり、これ
らは例えばプリント基板上に載置され、信号線路43を
介して接続されている。42は集積回路41の出力バッ
ファである。高速化のためにCMOS集積回路41の出
力バッファ42の駆動能力を十分に大きくするとその出
力インピーダンスが信号線路43の特性インピーダンス
よりも小さい状態になる。そうすると、CMOS集積回
路41から44へ信号を伝送しようとした時、0点に入
射した信号はCMOS集積回路44の入力インピーダン
スが高いために反射係数が正のほぼ完全な反射が生じ、
B点に戻った時にCMOS集積回路41の出力インピー
ダンスが小さいために反射係数が負の(即ち位相反転を
伴う)反射が生じる。これらの信号反射の結果、第4図
(b)に示すようl押CM OS集積回路41への入力
端子Aの信号(破線)に対して0点では実線のようなリ
ンギング波形が生じる。この信号波形歪みは、システム
の正常な論理動作を妨げる大きい原因となる。
In order to increase the speed of CMOS integrated circuits, it is necessary to increase the current driving capability of the output buffer 7 so that the load capacitance can be charged at high speed. With the increase in the current drive capability of such output buffers, reflections due to impedance mismatch with the signal line to which they are connected have become a problem. This problem will be specifically explained with reference to FIG. Figure 4(a)
, 41 and 44 are CMOS integrated circuits, which are mounted, for example, on a printed circuit board and connected via a signal line 43. 42 is an output buffer of the integrated circuit 41. If the driving capacity of the output buffer 42 of the CMOS integrated circuit 41 is sufficiently increased in order to increase the speed, the output impedance thereof becomes smaller than the characteristic impedance of the signal line 43. Then, when trying to transmit a signal from the CMOS integrated circuit 41 to 44, the signal incident on the 0 point is almost completely reflected with a positive reflection coefficient because the input impedance of the CMOS integrated circuit 44 is high.
When returning to point B, reflection with a negative reflection coefficient (that is, accompanied by phase inversion) occurs because the output impedance of the CMOS integrated circuit 41 is small. As a result of these signal reflections, as shown in FIG. 4(b), a ringing waveform as shown by a solid line is generated at the 0 point with respect to the signal (dashed line) at the input terminal A to the l-press CMOS integrated circuit 41. This signal waveform distortion is a major cause of hindering the normal logic operation of the system.

この問題を解決する方法として、第5図に示すように、
信号受端に整合抵抗45を設けることが考えられる。整
合抵抗45の抵抗値を、信号線路43の特性インピーダ
ンスと等しく設定すれば、二こでの信号反射は防止され
る。ところがこの様な受端終端方式を採用すると、ここ
で直流7は流が流れるため、CMOS集積回路の低消費
電力特性という優れた利点を損うことになる。またこの
方式では、次段に人力される″H°レベル信号のレベル
が制限され、ノイズマージンが大きいという利点も損わ
れる。更にこの方式では、プリント基板上に整合抵抗を
配設することになる。これは集積回路の多ビン化に伴い
、多数の整合抵抗をプリント基板上に配設しなければな
らないことを意味し、プリント基板上での実装密度向上
を難しくする。
As a way to solve this problem, as shown in Figure 5,
It is conceivable to provide a matching resistor 45 at the signal receiving end. If the resistance value of the matching resistor 45 is set equal to the characteristic impedance of the signal line 43, signal reflection at two points can be prevented. However, if such a receiving end termination method is adopted, the excellent advantage of the low power consumption characteristic of the CMOS integrated circuit is lost because the DC current 7 flows here. In addition, with this method, the level of the "H° level signal manually inputted to the next stage is limited, and the advantage of a large noise margin is lost. Furthermore, with this method, a matching resistor is placed on the printed circuit board. This means that as the number of bins in integrated circuits increases, a large number of matching resistors must be placed on the printed circuit board, making it difficult to increase the mounting density on the printed circuit board.

(発明が解決しようとする課題) 以上のように高速CMOS集積回路を実装した時の信号
伝送歪みを従来の方式で解消しようとすると、CMOS
集積回路の低消費電力特性が損われ、論理振幅の低下に
よりノイズマージンが低下し、また実装効率が低下する
といった問題があつた。
(Problems to be Solved by the Invention) As described above, when attempting to eliminate signal transmission distortion when high-speed CMOS integrated circuits are implemented using conventional methods, CMOS
There were problems in that the low power consumption characteristics of the integrated circuit were impaired, the noise margin was reduced due to a reduction in logic amplitude, and the mounting efficiency was reduced.

本発明は、このような問題を解決したCMOS集積回路
装置を提供することを目的とする。
An object of the present invention is to provide a CMOS integrated circuit device that solves these problems.

[発明の構成] (課題を解決するための手段) 本発明にかかるCMOS集積回路装置は、CMOS集積
回路チップの出力端子に直列接続される抵抗体を、チッ
プ内またはチップを搭載するパッケージ内に設けたこと
を特徴とする。
[Structure of the Invention] (Means for Solving the Problems) A CMOS integrated circuit device according to the present invention includes a resistor connected in series to an output terminal of a CMOS integrated circuit chip within the chip or within a package in which the chip is mounted. It is characterized by having been established.

(作用) 本発明によれば、集積回路チップの出力端子に直列に入
れる抵抗体の抵抗値を、これと出力バッファの出力イン
ピーダンスとの和が外部に設けられる信号線路の特性イ
ンピーダンスと等しくなるように設定することにより、
この出力端子部での信号反射が防止される。しかもこの
場合、従来例で説明した終端方式におけるような直流電
流パスは形成されないから、CMOS集積回路の低消費
電力特性は損われず、また低ノイズマージンという特性
も損われない。また上述の抵抗体を集積回路チップ内ま
たはチップを収納するパッケージ内に組込むことにより
、プリント基板上での実装効率を低下させることもない
(Function) According to the present invention, the resistance value of the resistor inserted in series with the output terminal of the integrated circuit chip is set so that the sum of this and the output impedance of the output buffer is equal to the characteristic impedance of the signal line provided externally. By setting
Signal reflection at this output terminal section is prevented. Moreover, in this case, since a direct current path is not formed as in the termination method described in the conventional example, the low power consumption characteristics of the CMOS integrated circuit are not impaired, and the characteristics of low noise margin are also not impaired. Moreover, by incorporating the above-described resistor into an integrated circuit chip or a package that houses the chip, the mounting efficiency on the printed circuit board will not be reduced.

(実施例) 以下、本発明の詳細な説明する。(Example) The present invention will be explained in detail below.

第1図(a)(b)は一実施例の要部構成を示す等両回
路とレイアウトである。1oは、CMOS集積回路チッ
プであり、図ではその出力部のみ示している。VOO配
線131にソースが接続されたpチャネルMosトラン
ジスタ11と、VSS配線配線にソースが接続されたn
チャネルMOSトランジスタ12とにより出力バッフ7
が構成されている。14は共通ゲート配線である。
FIGS. 1(a) and 1(b) are circuits and layouts showing the main structure of an embodiment. 1o is a CMOS integrated circuit chip, and only its output section is shown in the figure. A p-channel Mos transistor 11 whose source is connected to the VOO wiring 131 and an n-channel Mos transistor 11 whose source is connected to the VSS wiring.
Output buffer 7 by channel MOS transistor 12
is configured. 14 is a common gate wiring.

この出力バッファの出力ノードと、これに対応する集積
回路チップ10の外部への接続パッド16の間に抵抗体
15が設けられている。抵抗体15は、多結晶シリコン
膜により、または拡散層により形成される。
A resistor 15 is provided between the output node of this output buffer and a corresponding connection pad 16 to the outside of the integrated circuit chip 10. The resistor 15 is formed of a polycrystalline silicon film or a diffusion layer.

抵抗体15は、その抵抗値と出力バッファの出力インピ
ーダンスの和がこの集積回路の出力端子に接続される信
号線路の特性インピーダンスと等しくなるように設定さ
れる。具体例を挙げる。出カバッファを構成するMOS
)ランジスタ11゜12のゲート幅/ゲート長が512
μm/1μmであるとする。このときこの出力バッファ
の出力インピーダンスは約35Ωとなる。このCMOS
集積回路チップの出力信号を伝送する信号線路として特
性インピーダンス75Ωのものを用いたとすると、出力
端子部に設ける抵抗体15としてその抵抗値を約40Ω
に設定する。
The resistor 15 is set so that the sum of its resistance value and the output impedance of the output buffer is equal to the characteristic impedance of the signal line connected to the output terminal of this integrated circuit. Here are some specific examples. MOS that constitutes the output buffer
) Gate width/gate length of transistor 11゜12 is 512
Suppose that it is μm/1 μm. At this time, the output impedance of this output buffer is approximately 35Ω. This CMOS
If a signal line with a characteristic impedance of 75Ω is used to transmit the output signal of the integrated circuit chip, the resistance value of the resistor 15 provided at the output terminal should be approximately 40Ω.
Set to .

第3図(a)(b)は、この実施例によるCMOS集積
回路での信号伝送の様子を従来の第4図(a)(b)に
対応させて示す。31.35がCMOS集積回路チップ
であり、集積回路チップ31の出力バッファ32の出力
ノードと接続パッドの間に抵抗体33が設けられている
。この様なチップ31.35をプリント基板に搭載し、
信号線路34により両者の間を接続している。出力バッ
ファ32の出力インピーダンスと抵抗体33と信号線路
34の間に上述のような関係がある。
FIGS. 3(a) and 3(b) show how signals are transmitted in the CMOS integrated circuit according to this embodiment, corresponding to the conventional FIGS. 4(a) and 4(b). 31 and 35 are CMOS integrated circuit chips, and a resistor 33 is provided between the output node of the output buffer 32 of the integrated circuit chip 31 and the connection pad. Mounting such a chip 31.35 on a printed circuit board,
A signal line 34 connects the two. The above relationship exists between the output impedance of the output buffer 32, the resistor 33, and the signal line 34.

この時第3図(b−)に示すように、CMOS集積回路
チップ31の入力端子A点の信号(破線)は、殆ど波形
歪みを生じることなく、一定の遅延時間を持って集積回
路チップ35の入力端子C点に伝送される(実線)。
At this time, as shown in FIG. 3(b-), the signal (broken line) at the input terminal A of the CMOS integrated circuit chip 31 is transmitted to the integrated circuit chip 31 with a certain delay time without causing almost any waveform distortion. is transmitted to the input terminal C point (solid line).

この実施例の方式では、従来の受端終端方式と異なり直
流電流パスが形成されないから、CMOS集積回路の低
消費電力特性が損われず、論理振幅の低下もない。イン
ピーダンス整合用の抵抗体はチップ内に形成されている
から、プリント括板上での高密度実装も妨げられない。
In the method of this embodiment, unlike the conventional receiving end termination method, no direct current path is formed, so the low power consumption characteristics of the CMOS integrated circuit are not impaired, and the logic amplitude does not decrease. Since the resistor for impedance matching is formed within the chip, high-density mounting on a printed circuit board is not hindered.

第2図(a)〜(d)は、他の実施例の要部構成を示す
等価回路とレイアウトである。(c)(d)はそれぞれ
、(b)の領域A、Bを拡大して示している。先の実施
例と対応する部分には先の実施例と同じ符号を付して詳
細な説明は省略する。この実施例では、CMOS集積回
路チップ10をパッケージ20に搭載してそれらの端子
間をボンディング・ワイヤ17により接続している。
FIGS. 2(a) to 2(d) are equivalent circuits and layouts showing the main structure of another embodiment. (c) and (d) are enlarged views of areas A and B in (b), respectively. Portions corresponding to those in the previous embodiment are designated by the same reference numerals as in the previous embodiment, and detailed description thereof will be omitted. In this embodiment, a CMOS integrated circuit chip 10 is mounted on a package 20 and its terminals are connected by bonding wires 17.

この様な構成においてこの実施例では、出力インピーダ
ンス整合用の抵抗体15′を、パッケージ20上に形成
して、リード21とチップ10の出力端子間に直列に入
るようにしている。抵抗体15′は、パッケージ作製プ
ロセスに応じて種々の方法で形成できる。最も一般的な
方法は、厚膜印刷法である。即ち抵抗ペーストを所定の
位置に印刷し焼成することにより抵抗体15′が得られ
る。またはTaNやNiCrなどの薄膜抵抗体とするこ
ともできる。
In this embodiment with such a configuration, a resistor 15' for output impedance matching is formed on the package 20 and inserted in series between the lead 21 and the output terminal of the chip 10. The resistor 15' can be formed in various ways depending on the package manufacturing process. The most common method is thick film printing. That is, a resistor 15' is obtained by printing a resistor paste at a predetermined position and firing it. Alternatively, a thin film resistor such as TaN or NiCr may be used.

この実施例によっても、先の実施例と同様の効果が得ら
れる。
This embodiment also provides the same effects as the previous embodiment.

〔発明の効果〕〔Effect of the invention〕

以上のべたように本発明によれば、CMOS集積回路の
利点を損うことなく、また実装効率を低下させることな
く、高速CMOS集積回路の出力信号を波形歪みなく伝
送するシステムを構成することが可能となる。
As described above, according to the present invention, it is possible to configure a system that transmits output signals of high-speed CMOS integrated circuits without waveform distortion, without impairing the advantages of CMOS integrated circuits or reducing implementation efficiency. It becomes possible.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a)(b)は本発明の一実施例の要部構成を示
す等価回路とレイアウトを示す図、第2図(a)〜(d
)は他の実施例の要部構成を示す等価回路とレイアウト
を示す図、第3図(a)(b)は第1図の実施例での信
号伝送の特性を説明するための図、第4図(a)(b)
は従来のCMOS集積回路を用いた時の信号伝送の様子
を説明するための図、第5図は従来の受端整合方式を説
明するための図である。 10・・・CMOS集積回路チップ、11・・・pチャ
ネルMOS)ランジスタ、12・・・nチャネルMOS
トランジスタ、131・・・vDD配線、132・・・
VSS配線、14・・・ゲート配線、15゜15′・・
・抵抗体、16・・・接続パッド、20・・・パッケー
ジ、21・・・リード。
FIGS. 1(a) and 1(b) are diagrams showing an equivalent circuit and layout showing the main part configuration of an embodiment of the present invention, and FIGS. 2(a) to (d)
3(a) and 3(b) are diagrams for explaining the characteristics of signal transmission in the embodiment of FIG. 1, and FIG. Figure 4 (a) (b)
5 is a diagram for explaining the state of signal transmission when a conventional CMOS integrated circuit is used, and FIG. 5 is a diagram for explaining a conventional receiving end matching method. 10...CMOS integrated circuit chip, 11...p channel MOS) transistor, 12...n channel MOS
Transistor, 131...vDD wiring, 132...
VSS wiring, 14... Gate wiring, 15°15'...
-Resistor, 16... Connection pad, 20... Package, 21... Lead.

Claims (2)

【特許請求の範囲】[Claims] (1)CMOS集積回路チップの出力ノードとそのノー
ドの外部回路との接続パッドとの間に抵抗を介在させた
ことを特徴とするCMOS集積回路装置。
(1) A CMOS integrated circuit device characterized in that a resistor is interposed between an output node of a CMOS integrated circuit chip and a connection pad of that node with an external circuit.
(2)CMOS集積回路チップがパッケージに収納され
、前記CMOS集積回路チップの出力端子とこれに対応
するパッケージ上のリード端子との間に、パッケージ上
に設けられた抵抗体が接続されていることを特徴とする
CMOS集積回路装置。
(2) A CMOS integrated circuit chip is housed in a package, and a resistor provided on the package is connected between the output terminal of the CMOS integrated circuit chip and the corresponding lead terminal on the package. A CMOS integrated circuit device characterized by:
JP63329738A 1988-12-27 1988-12-27 Cmos integrated circuit device Pending JPH02174257A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63329738A JPH02174257A (en) 1988-12-27 1988-12-27 Cmos integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63329738A JPH02174257A (en) 1988-12-27 1988-12-27 Cmos integrated circuit device

Publications (1)

Publication Number Publication Date
JPH02174257A true JPH02174257A (en) 1990-07-05

Family

ID=18224724

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63329738A Pending JPH02174257A (en) 1988-12-27 1988-12-27 Cmos integrated circuit device

Country Status (1)

Country Link
JP (1) JPH02174257A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10004200B4 (en) * 1999-02-01 2007-02-01 Nec Electronics Corp., Kawasaki A transistor device having a MOS structure in which a change of the output impedance due to a manufacturing error is reduced, a method of manufacturing the same, and a CMOS circuit formed thereby

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10004200B4 (en) * 1999-02-01 2007-02-01 Nec Electronics Corp., Kawasaki A transistor device having a MOS structure in which a change of the output impedance due to a manufacturing error is reduced, a method of manufacturing the same, and a CMOS circuit formed thereby

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