JPH02170471A - High-speed diode - Google Patents

High-speed diode

Info

Publication number
JPH02170471A
JPH02170471A JP32433588A JP32433588A JPH02170471A JP H02170471 A JPH02170471 A JP H02170471A JP 32433588 A JP32433588 A JP 32433588A JP 32433588 A JP32433588 A JP 32433588A JP H02170471 A JPH02170471 A JP H02170471A
Authority
JP
Japan
Prior art keywords
layer
diode
regions
diodes
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP32433588A
Other languages
Japanese (ja)
Other versions
JPH0752777B2 (en
Inventor
Yoshitomo Ogimura
好友 荻村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP32433588A priority Critical patent/JPH0752777B2/en
Publication of JPH02170471A publication Critical patent/JPH02170471A/en
Publication of JPH0752777B2 publication Critical patent/JPH0752777B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Element Separation (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE:To obtain a high-speed diode of desired characteristics by a combination of liketime killers by a method wherein electrodes installed respectively in a plurality of regions into which different lifetime killers have been introduced are used and connected in parallel. CONSTITUTION:A P-N junction face 3 by a P-layer adjacent to an N-layer 1 exists in a silicon substrate; a groove 4 exceeding a depth of the face 3 from the surface of the substrate is formed; the groove 4 is filled with an insulator 5. As a result, the Player is divided into two regions 21, 22. Au is diffused and introduced into the region 21; Pt is diffused and introduced into the region 22. In addition, a cathode electrode 6 is applied to the N-layer 1 ; anode electrodes 71, 72 are applied respectively to the regions 21, 22; after that, the electrodes 71, 72 are connected. Thereby, it is possible to obtain a constitution where diodes 11, 12 composed of the N-layer 1 and the P-layer 21 as well as the N-layer 1 and the P-layer 22 are connected in parallel. In this manner, a high-speed diode which can relax a detect of any diodes can be formed on a single semiconductor substrate; the obtained diode always reduces an overall loss.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、高周波整流等に用いるために半導体素体内に
ライフタイムキラーを導入して逆回復時間を短くした高
速ダイオードに関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a high-speed diode in which a lifetime killer is introduced into a semiconductor body to shorten reverse recovery time for use in high-frequency rectification and the like.

〔従来の技術〕[Conventional technology]

半導体素体内でのキャリアの消滅が急速に行われるよう
に素体内に導入されるライフタイムキラーとしては金あ
るいは白金などが用いられていた。
Gold, platinum, or the like was used as a lifetime killer introduced into the semiconductor element so that carriers within the semiconductor element disappeared rapidly.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

従来の高速ダイオードにおいて、ライフタイムキラーと
して^Uを用いた素子は、高周波で使用した場合、過渡
順電圧によるスイッチング損失が増大し、かつ高温の逆
電流が大きいため、過大な損失をまねく問題があった。
In conventional high-speed diodes, when used at high frequencies, switching loss due to transient forward voltage increases, and high-temperature reverse current is large, resulting in excessive loss. there were.

一方、ライフタイムキラーとしてptを用いた素子は、
定常順電圧が大きいため、損失が大きいという問題があ
った。
On the other hand, elements using pt as a lifetime killer are
Since the steady-state forward voltage is large, there is a problem in that the loss is large.

本発明の課題は、上述の問題を解決してライフタイムキ
ラーの導入によって生ずる欠点の緩和された高速ダイオ
ードを提供することにある。
The object of the present invention is to solve the above-mentioned problems and to provide a high-speed diode in which the drawbacks caused by the introduction of a lifetime killer are alleviated.

〔課題を解決するための手段〕[Means to solve the problem]

上記の課題の解決のために、本発明の高速ダイオードは
、少なくともPN接合に接する一方の層が、互いに絶縁
され、それぞれ異なるライフタイムキラーの導入された
複数の領域に分割され、各領域に電極が設けられたもの
とする。
In order to solve the above problems, the high speed diode of the present invention has at least one layer in contact with the PN junction that is insulated from each other and divided into a plurality of regions in which different lifetime killers are introduced, and an electrode in each region. shall be provided.

〔作用〕[Effect]

それぞれ異なるライフタイムキラーの導入された複数の
領域を、それぞれに設けられた電極を用いて並列接続す
ることにより、ライフタイムキラーの導入によって生ず
る欠点が相殺され、その悪影響が緩和される。
By connecting a plurality of regions in which different lifetime killers have been introduced in parallel using electrodes provided in each region, the drawbacks caused by the introduction of the lifetime killer can be offset and its adverse effects can be alleviated.

〔実施例〕〔Example〕

第1図(71)、rb)は本発明の一実施例の高速ダイ
オードを縦断面図、平面図で示す、0.5〜4錦角ある
いは1〜7a直径のシリコン基板にはN層1と隣接する
P層によりPN接合面3が存在するが、基板の表面より
PN接合面3を超える深さの溝4がエツチングあるいは
サンドカットで形成され、その溝4にはガラス等の絶縁
物5が充填されている。なおメサエンチング番よそのあ
とで行う、この結果、P層は二つの領域21.22に分
割される。そして、領域21にはAuが、領域22には
Ptが拡散導入されている。NJllにはカソード電極
6が、2層領域21には第一7ノード電極71が、P 
18N域22には第ニアノード電極72がそれぞれ表面
に被着している。二つのアノード電極71.72を接続
すれば、NJWIと1層21からなるダイオードと、N
11lと2層22からなるダイオードが並列接続される
。前者のダイオードを11.後者のダイオードを12と
すると、過渡順電圧の時間特性は、第2図18+に$い
て前者は実線で示した特性、後者は点線で示した特性と
なる。二つのダイオードを並列接続して高周波で使用す
ると、第2図世)に示すように順電流の約2μ以下の過
渡時間を過渡順電圧の低いpt導入ダイオード12で対
処し、約21m以上の定常時間を定常順電圧の低いAu
導入ダイオード11で対処する。第3図+Il+は逆回
復電流時間特性を示し、実線はダイオード11の特性を
、点線はダイオード12の2種類の特性を示す、二つの
ダイオードを並列接続した場合、ダイオード11の逆回
復時間t□がダイオード12のtrr以上のときには第
3図世)に示すように逆回復動作特性はダイオード11
に支配され、ダイオード11のt□がダイオード12の
t、より小さいときは第3図telに示すように両者の
合成特性となる。なお、用いるシリコン単結晶は共通な
ので同じ比抵抗を有し、両ダイオードの逆耐圧特性は同
様になって、不平衡は生じない6以上のように、この素
子を、例えば逆電圧のかからない回路で高周波で使用し
た場合、順電流の過渡時間では過渡順電圧の低いpt導
入ダイオードで対処し、定常時間に入ると順電圧の低い
^ua1人ダイオードで対処するので、主に順方向損失
が減少し、さらに逆方向特性は高温逆電流の低いpt導
入ダイオードで対処するので綜合的損失が低減する。
FIG. 1 (71), rb) shows a high-speed diode according to an embodiment of the present invention in a vertical cross-sectional view and a plan view. A PN junction surface 3 exists due to the adjacent P layer, but a groove 4 with a depth exceeding the PN junction surface 3 is formed from the surface of the substrate by etching or sand cutting, and an insulating material 5 such as glass is formed in the groove 4. Filled. Note that this is performed after the mesa enching step, and as a result, the P layer is divided into two regions 21 and 22. Then, Au is diffused into the region 21 and Pt is diffused into the region 22. The cathode electrode 6 is in the NJll, the first seventh node electrode 71 is in the two-layer region 21, and the
A near-node electrode 72 is attached to the surface of each of the 18N regions 22 . If two anode electrodes 71 and 72 are connected, a diode consisting of NJWI and one layer 21 and N
11l and a diode consisting of two layers 22 are connected in parallel. The former diode is 11. Assuming that the latter diode is 12, the time characteristics of the transient forward voltage will be as shown in FIG. 2 by the solid line and the dotted line in the latter case. When two diodes are connected in parallel and used at high frequencies, as shown in Figure 2), the transient current of about 2 μ or less can be handled by the PT introduction diode 12 with a low transient forward voltage, and the steady state of about 21 m or more can be handled. Au with low steady-state forward voltage
The introduction diode 11 takes care of this. Figure 3 +Il+ shows the reverse recovery current time characteristics, the solid line shows the characteristics of diode 11, and the dotted line shows two types of characteristics of diode 12. When the two diodes are connected in parallel, the reverse recovery time t□ of diode 11 When is greater than trr of diode 12, the reverse recovery operation characteristic is that of diode 11, as shown in Figure 3).
When t□ of the diode 11 is smaller than t of the diode 12, the characteristic becomes a composite of both as shown in FIG. Note that since the silicon single crystals used are common, they have the same specific resistance, and the reverse breakdown voltage characteristics of both diodes are the same, so no unbalance occurs.6. When used at high frequencies, the transient time of the forward current is handled by a PT-introduced diode with a low transient forward voltage, and the steady-state time is handled by a ^ua single diode with a low forward voltage, which mainly reduces forward loss. Furthermore, since the reverse characteristics are handled by a PT-introduced diode with low high temperature reverse current, the overall loss is reduced.

第4図は本発明の別の実施例を平面図で示し、二つのp
111領域21.22を絶縁物5で充填された環状の溝
によって分割したものである。なお、この図では電極の
図示は省いた。
FIG. 4 shows another embodiment of the invention in plan view, with two p
111 regions 21 and 22 are divided by annular grooves filled with an insulator 5. Note that electrodes are not shown in this figure.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、一つの半導体内にそれぞれ異なるライ
フタイムキラーを導入した高速ダイオードを互いに絶縁
して複数形成し、並列接続できるようにすることにより
、例えば^Uとptのように導入がダイオードに及ぼす
特性の異なるライフタイムキラーをそれぞれに用いれば
、いずれかのダイオードでの特性の欠点が緩和された高
速ダイオードが一つの半導体基板内に形成される。さら
に他のライフタイムキラーの組合わせにより新規な特性
の高速ダイオードを得ることも期待できる。
According to the present invention, by forming a plurality of high-speed diodes in which different lifetime killers are introduced in one semiconductor and insulating them from each other so that they can be connected in parallel, it is possible to By using different lifetime killers with different characteristics, a high-speed diode in which the shortcomings in the characteristics of either diode are alleviated can be formed within a single semiconductor substrate. Furthermore, it is also possible to obtain high-speed diodes with novel characteristics by combining other lifetime killers.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a)、(b)は本発明の一実施例を示し、(a
lが縦断面図1伽)が平面図、第2図18+、(blは
Au導入高連ダイオードとpt導入高速ダイオードの順
方向動作特性を示す線図で、(4)は個々の場合、−)
は本発明の実施例の場合、第3図は同じく両ダイオード
の逆回復動作特性を示す線図で、(a)は個々の場合。 (bl、 (C1は本発明の実施例の場合、第4図は本
発明の別の実施例を示す平面図である。
FIGS. 1(a) and 1(b) show an embodiment of the present invention, and (a)
(1) is a vertical cross-sectional view, (1) is a plan view, (bl is a diagram showing the forward operating characteristics of an Au-introduced high-speed diode and a PT-introduced high-speed diode, and (4) is a diagram in each case, - )
is the case of the embodiment of the present invention, and FIG. 3 is a diagram showing the reverse recovery operation characteristics of both diodes, and (a) is for each case. (bl, (C1 is an embodiment of the present invention; FIG. 4 is a plan view showing another embodiment of the present invention.

Claims (1)

【特許請求の範囲】[Claims] (1)少なくともPN接合に接する一方の層が、互いに
絶縁され、それぞれ異なるライフタイムキラーの導入さ
れた複数の領域に分割され、各領域に電極が設けられた
ことを特徴とする高速ダイオード。
(1) A high-speed diode characterized in that at least one layer in contact with the PN junction is insulated from each other and divided into a plurality of regions into which different lifetime killers are introduced, and each region is provided with an electrode.
JP32433588A 1988-12-22 1988-12-22 Fast diode Expired - Lifetime JPH0752777B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32433588A JPH0752777B2 (en) 1988-12-22 1988-12-22 Fast diode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32433588A JPH0752777B2 (en) 1988-12-22 1988-12-22 Fast diode

Publications (2)

Publication Number Publication Date
JPH02170471A true JPH02170471A (en) 1990-07-02
JPH0752777B2 JPH0752777B2 (en) 1995-06-05

Family

ID=18164632

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32433588A Expired - Lifetime JPH0752777B2 (en) 1988-12-22 1988-12-22 Fast diode

Country Status (1)

Country Link
JP (1) JPH0752777B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0654538A (en) * 1991-10-25 1994-02-25 Semikron Elektron Gmbh Free-wheeling diode device for rectification passage
FR2864344A1 (en) * 2003-12-18 2005-06-24 St Microelectronics Sa Semiconductor component incorporating some zones of high concentration of atoms of a metal such as platinum or gold, notably to produce a rapid diode

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0654538A (en) * 1991-10-25 1994-02-25 Semikron Elektron Gmbh Free-wheeling diode device for rectification passage
FR2864344A1 (en) * 2003-12-18 2005-06-24 St Microelectronics Sa Semiconductor component incorporating some zones of high concentration of atoms of a metal such as platinum or gold, notably to produce a rapid diode
US7282750B2 (en) 2003-12-18 2007-10-16 Stmicroelectronics S.A. Semiconductor component comprising areas with a high platinum concentration

Also Published As

Publication number Publication date
JPH0752777B2 (en) 1995-06-05

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