JPH02160240A - Photosensitive planographic printing plate of both positive and negative uses and production of planographic printing plate by using this plate - Google Patents
Photosensitive planographic printing plate of both positive and negative uses and production of planographic printing plate by using this plateInfo
- Publication number
- JPH02160240A JPH02160240A JP31563388A JP31563388A JPH02160240A JP H02160240 A JPH02160240 A JP H02160240A JP 31563388 A JP31563388 A JP 31563388A JP 31563388 A JP31563388 A JP 31563388A JP H02160240 A JPH02160240 A JP H02160240A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive
- printing plate
- lithographic printing
- positive
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007639 printing Methods 0.000 title claims abstract description 66
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 229920005989 resin Polymers 0.000 claims abstract description 28
- 239000011347 resin Substances 0.000 claims abstract description 28
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 claims abstract description 6
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 claims abstract description 6
- 150000003852 triazoles Chemical class 0.000 claims abstract description 6
- 239000000203 mixture Substances 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 19
- -1 orthoquinone diazide compound Chemical class 0.000 claims description 19
- 238000010438 heat treatment Methods 0.000 claims description 9
- CTAPFRYPJLPFDF-UHFFFAOYSA-N isoxazole Chemical compound C=1C=NOC=1 CTAPFRYPJLPFDF-UHFFFAOYSA-N 0.000 claims description 7
- 239000007787 solid Substances 0.000 abstract description 10
- 238000010186 staining Methods 0.000 abstract description 5
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 abstract description 4
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 abstract description 4
- 239000003513 alkali Substances 0.000 abstract 3
- AXLOCHLTNQDFFS-BESJYZOMSA-N azastene Chemical compound C([C@H]1[C@@H]2CC[C@@]([C@]2(CC[C@@H]1[C@@]1(C)C2)C)(O)C)C=C1C(C)(C)C1=C2C=NO1 AXLOCHLTNQDFFS-BESJYZOMSA-N 0.000 abstract 2
- 239000002585 base Substances 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 description 20
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 17
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 15
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 10
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 9
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 9
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 7
- 150000002148 esters Chemical class 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 5
- 150000002989 phenols Chemical class 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 5
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000009833 condensation Methods 0.000 description 4
- 229930003836 cresol Natural products 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 3
- 150000001340 alkali metals Chemical class 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- HRBFQSUTUDRTSV-UHFFFAOYSA-N benzene-1,2,3-triol;propan-2-one Chemical compound CC(C)=O.OC1=CC=CC(O)=C1O HRBFQSUTUDRTSV-UHFFFAOYSA-N 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- VOOLKNUJNPZAHE-UHFFFAOYSA-N formaldehyde;2-methylphenol Chemical compound O=C.CC1=CC=CC=C1O VOOLKNUJNPZAHE-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 239000000123 paper Substances 0.000 description 3
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 239000011591 potassium Substances 0.000 description 3
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- VZQBDGHUOBRFAA-UHFFFAOYSA-N 2-(2,6-dihydroxyphenyl)benzaldehyde Chemical compound C1(O)=C(C(O)=CC=C1)C1=CC=CC=C1C=O VZQBDGHUOBRFAA-UHFFFAOYSA-N 0.000 description 2
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- 229930192627 Naphthoquinone Natural products 0.000 description 2
- 239000004111 Potassium silicate Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- AOGQPLXWSUTHQB-UHFFFAOYSA-N hexyl acetate Chemical compound CCCCCCOC(C)=O AOGQPLXWSUTHQB-UHFFFAOYSA-N 0.000 description 2
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 2
- 229910052912 lithium silicate Inorganic materials 0.000 description 2
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- 150000002791 naphthoquinones Chemical class 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 2
- 229910052913 potassium silicate Inorganic materials 0.000 description 2
- 235000019353 potassium silicate Nutrition 0.000 description 2
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 2
- 235000019252 potassium sulphite Nutrition 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 229960001755 resorcinol Drugs 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- HFZLSTDPRQSZCQ-UHFFFAOYSA-N 1-pyrrolidin-3-ylpyrrolidine Chemical compound C1CCCN1C1CNCC1 HFZLSTDPRQSZCQ-UHFFFAOYSA-N 0.000 description 1
- BAXOFTOLAUCFNW-UHFFFAOYSA-N 1H-indazole Chemical compound C1=CC=C2C=NNC2=C1 BAXOFTOLAUCFNW-UHFFFAOYSA-N 0.000 description 1
- XBTOSRUBOXQWBO-UHFFFAOYSA-N 1h-indazol-5-amine Chemical compound NC1=CC=C2NN=CC2=C1 XBTOSRUBOXQWBO-UHFFFAOYSA-N 0.000 description 1
- JVVRJMXHNUAPHW-UHFFFAOYSA-N 1h-pyrazol-5-amine Chemical compound NC=1C=CNN=1 JVVRJMXHNUAPHW-UHFFFAOYSA-N 0.000 description 1
- SNTWKPAKVQFCCF-UHFFFAOYSA-N 2,3-dihydro-1h-triazole Chemical compound N1NC=CN1 SNTWKPAKVQFCCF-UHFFFAOYSA-N 0.000 description 1
- JKTCBAGSMQIFNL-UHFFFAOYSA-N 2,3-dihydrofuran Chemical compound C1CC=CO1 JKTCBAGSMQIFNL-UHFFFAOYSA-N 0.000 description 1
- CNRNYORZJGVOSY-UHFFFAOYSA-N 2,5-diphenyl-1,3-oxazole Chemical compound C=1N=C(C=2C=CC=CC=2)OC=1C1=CC=CC=C1 CNRNYORZJGVOSY-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- DKHZGIKPBFMBBY-UHFFFAOYSA-N 2-cyano-n-[4-(diethylamino)phenyl]-2-phenylacetamide Chemical compound C1=CC(N(CC)CC)=CC=C1NC(=O)C(C#N)C1=CC=CC=C1 DKHZGIKPBFMBBY-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- DQSHFKPKFISSNM-UHFFFAOYSA-N 2-methylbenzoxazole Chemical compound C1=CC=C2OC(C)=NC2=C1 DQSHFKPKFISSNM-UHFFFAOYSA-N 0.000 description 1
- BCHZICNRHXRCHY-UHFFFAOYSA-N 2h-oxazine Chemical compound N1OC=CC=C1 BCHZICNRHXRCHY-UHFFFAOYSA-N 0.000 description 1
- OLQIKGSZDTXODA-UHFFFAOYSA-N 4-[3-(4-hydroxy-2-methylphenyl)-1,1-dioxo-2,1$l^{6}-benzoxathiol-3-yl]-3-methylphenol Chemical compound CC1=CC(O)=CC=C1C1(C=2C(=CC(O)=CC=2)C)C2=CC=CC=C2S(=O)(=O)O1 OLQIKGSZDTXODA-UHFFFAOYSA-N 0.000 description 1
- PCWGTDULNUVNBN-UHFFFAOYSA-N 4-methylpentan-1-ol Chemical compound CC(C)CCCO PCWGTDULNUVNBN-UHFFFAOYSA-N 0.000 description 1
- NTDQQZYCCIDJRK-UHFFFAOYSA-N 4-octylphenol Chemical compound CCCCCCCCC1=CC=C(O)C=C1 NTDQQZYCCIDJRK-UHFFFAOYSA-N 0.000 description 1
- NSPMIYGKQJPBQR-UHFFFAOYSA-N 4H-1,2,4-triazole Chemical compound C=1N=CNN=1 NSPMIYGKQJPBQR-UHFFFAOYSA-N 0.000 description 1
- FKPXGNGUVSHWQQ-UHFFFAOYSA-N 5-methyl-1,2-oxazol-3-amine Chemical compound CC1=CC(N)=NO1 FKPXGNGUVSHWQQ-UHFFFAOYSA-N 0.000 description 1
- XKVUYEYANWFIJX-UHFFFAOYSA-N 5-methyl-1h-pyrazole Chemical compound CC1=CC=NN1 XKVUYEYANWFIJX-UHFFFAOYSA-N 0.000 description 1
- AOCDQWRMYHJTMY-UHFFFAOYSA-N 5-nitro-2h-benzotriazole Chemical compound C1=C([N+](=O)[O-])C=CC2=NNN=C21 AOCDQWRMYHJTMY-UHFFFAOYSA-N 0.000 description 1
- ORZRMRUXSPNQQL-UHFFFAOYSA-N 6-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2C=NNC2=C1 ORZRMRUXSPNQQL-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- KLSJWNVTNUYHDU-UHFFFAOYSA-N Amitrole Chemical compound NC1=NC=NN1 KLSJWNVTNUYHDU-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- VMMIYKSESJXKGM-UHFFFAOYSA-N C[C]CCC Chemical compound C[C]CCC VMMIYKSESJXKGM-UHFFFAOYSA-N 0.000 description 1
- OOZUGJIWTXDZAR-UHFFFAOYSA-N C[C]CCCC Chemical compound C[C]CCCC OOZUGJIWTXDZAR-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 229940072049 amyl acetate Drugs 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- 150000001448 anilines Chemical class 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 239000001000 anthraquinone dye Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- JPIYZTWMUGTEHX-UHFFFAOYSA-N auramine O free base Chemical compound C1=CC(N(C)C)=CC=C1C(=N)C1=CC=C(N(C)C)C=C1 JPIYZTWMUGTEHX-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 229940043232 butyl acetate Drugs 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229940013361 cresol Drugs 0.000 description 1
- 229940118056 cresol / formaldehyde Drugs 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229940111685 dibasic potassium phosphate Drugs 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- BBLSYMNDKUHQAG-UHFFFAOYSA-L dilithium;sulfite Chemical compound [Li+].[Li+].[O-]S([O-])=O BBLSYMNDKUHQAG-UHFFFAOYSA-L 0.000 description 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical compound OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 description 1
- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229940093499 ethyl acetate Drugs 0.000 description 1
- JVICFMRAVNKDOE-UHFFFAOYSA-M ethyl violet Chemical compound [Cl-].C1=CC(N(CC)CC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 JVICFMRAVNKDOE-UHFFFAOYSA-M 0.000 description 1
- RIKMMFOAQPJVMX-UHFFFAOYSA-N fomepizole Chemical compound CC=1C=NNC=1 RIKMMFOAQPJVMX-UHFFFAOYSA-N 0.000 description 1
- 229960004285 fomepizole Drugs 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- PHTQWCKDNZKARW-UHFFFAOYSA-N isoamylol Chemical compound CC(C)CCO PHTQWCKDNZKARW-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- JESHZQPNPCJVNG-UHFFFAOYSA-L magnesium;sulfite Chemical compound [Mg+2].[O-]S([O-])=O JESHZQPNPCJVNG-UHFFFAOYSA-L 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- 150000002688 maleic acid derivatives Chemical class 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- DWCZIOOZPIDHAB-UHFFFAOYSA-L methyl green Chemical compound [Cl-].[Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)[N+](C)(C)C)=C1C=CC(=[N+](C)C)C=C1 DWCZIOOZPIDHAB-UHFFFAOYSA-L 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229960003742 phenol Drugs 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 108091008695 photoreceptors Proteins 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 125000005498 phthalate group Chemical class 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920001281 polyalkylene Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003217 pyrazoles Chemical class 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 238000013441 quality evaluation Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229940083542 sodium Drugs 0.000 description 1
- 229940077386 sodium benzenesulfonate Drugs 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- MZSDGDXXBZSFTG-UHFFFAOYSA-M sodium;benzenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=CC=C1 MZSDGDXXBZSFTG-UHFFFAOYSA-M 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- UTLZBWAGLRNNAY-UHFFFAOYSA-J thorium(4+);dicarbonate Chemical compound [Th+4].[O-]C([O-])=O.[O-]C([O-])=O UTLZBWAGLRNNAY-UHFFFAOYSA-J 0.000 description 1
- 229940062627 tribasic potassium phosphate Drugs 0.000 description 1
- 229940001496 tribasic sodium phosphate Drugs 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical class C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- LLWJPGAKXJBKKA-UHFFFAOYSA-N victoria blue B Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)=C(C=C1)C2=CC=CC=C2C1=[NH+]C1=CC=CC=C1 LLWJPGAKXJBKKA-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明はポジ型・ネガ型兼用の感光性平版印刷版および
それを用いた平版印刷版の作製方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a photosensitive lithographic printing plate for both positive and negative types and a method for producing a lithographic printing plate using the same.
[従来の技術1
印刷用平版の刷版作製工程において、ポジ型とネガ型の
2種の感光性平版印刷版を併用することが広く行われて
いる。しかし、ポジ型の感光性平版印刷版とネガ型の感
光性平版印刷版とでは感光体を形成する物質が異なるた
めに、両者の現像処理においては異なる現像液を用いな
ければならない。従って、ポジ型とネガ型両者を併用し
た場合には、現像用装置における現像液の交換とそれに
伴うttIF!4の洗浄のために作業効率の著しい低下
が発生する。[Prior Art 1] In the process of producing a printing plate for printing, it is widely practiced to use two types of photosensitive planographic printing plates, positive type and negative type. However, since the materials forming the photoreceptor are different between the positive-working photosensitive lithographic printing plate and the negative-working photosensitive lithographic printing plate, different developers must be used in the development processing of the two. Therefore, when both a positive type and a negative type are used, it is necessary to replace the developer in the developing device and the associated ttIF! Due to cleaning in step 4, a significant decrease in work efficiency occurs.
上2のような問題に対して1種類の感光性平版印刷版を
ポジ型にもネガ型にも用いることを可能にする技術が知
られている。このような技術としては、例えば特公昭5
6−14970号公報に開示されるようなオルトキノン
ジアジドを含むポジ型感光性組成物を用いた感光性平版
印刷版から特定の方法により、ネガ型画像を形成す°る
方法が公知である。A technique is known that allows one type of photosensitive lithographic printing plate to be used for both positive and negative types to solve the above problem. Examples of such technology include, for example, the
A method of forming a negative image by a specific method from a photosensitive lithographic printing plate using a positive photosensitive composition containing orthoquinone diazide as disclosed in Japanese Patent No. 6-14970 is known.
すなわち、該方法は、通常画像露光した後に現像処理を
施してポジ型画像を1:lることができるような感光性
平版印刷版を用いて同様に画像露光した後、熱処理、全
面露光、更にポジ型現像液による現像を引き続き行って
ネガ型画像を得るものである。That is, in this method, a photosensitive lithographic printing plate that can be image-wise exposed and then developed to produce a 1:1 positive image is image-wise exposed in the same manner, followed by heat treatment, full-surface exposure, and further. A negative image is obtained by subsequent development with a positive developer.
しかしながら、上記ポジ型・ネガ型兼用の感光性平版印
刷版は画像露光時又は露光後における露光部と未露光部
の識別性、いわゆる露光可視画性に明瞭さを欠き、更に
このような感光性平版印刷版から得られた平版印刷版は
印刷時において版面が汚れやすく、また近年の当業界に
おける印刷部数の増大に対しても耐刷性に劣るという欠
点を有していた。However, the above-mentioned photosensitive lithographic printing plates that can be used for both positive and negative types lack clarity in distinguishing between exposed and unexposed areas during or after image exposure, so-called exposed visible image quality, and furthermore, such photosensitivity The lithographic printing plate obtained from the lithographic printing plate has the drawback that the plate surface is easily stained during printing, and the printing durability is poor even with the recent increase in the number of print runs in this industry.
[発明の目的]
本発明の目的は、ネガ型画像を得るための処理過程にお
いて改良された露光可視画性を右するポジ型・ネガ型兼
用の感光性平版印刷版を提供することである。[Object of the Invention] An object of the present invention is to provide a photosensitive lithographic printing plate that can be used for both positive and negative types and has improved exposure and visible image properties in the processing process for obtaining negative images.
また、本発明の目的は、版面が汚れにくく、耐刷性の改
良された平版印刷版を得ることのできるポジ型・ネガ型
兼用の感光性平版印刷版を提供することである。Another object of the present invention is to provide a photosensitive lithographic printing plate that can be used for both positive and negative types, making it possible to obtain a lithographic printing plate whose plate surface is resistant to staining and whose printing durability is improved.
本発明の他の目的は、通常ポジティブ作用を示す感光性
平版印刷版からネガ型の平版印刷版を作製する方法にお
いて、改良された露光可視画性が得られる、版面の汚れ
にくい改良された耐刷性を右する平版印刷版の作製方法
を提供することである。Another object of the present invention is to provide a method for producing a negative-working lithographic printing plate from a photosensitive lithographic printing plate that normally exhibits a positive action, which provides improved exposure visibility and improved resistance to staining of the plate surface. An object of the present invention is to provide a method for producing a lithographic printing plate that determines printability.
[発明の構成]
本発明の上記目的は、オルトキノンジアジド化合物、ア
ルカリ可溶性樹脂及び有機染料を含有し、かつオキサゾ
ール、イソ第4二勺ゾール、ピラゾール、トリアゾール
及びこれらの読導体からなる群から選ばれる少なくとも
1種を含有する感光性組成物で形成された感光性層を支
持体上に有することを特徴とするポジ型・ネガ型兼用感
光性平版印すリ版、及び該感光性平版印刷版を画像露光
後、熱処理を施し、次いで舶記感光性層の仝而を露光し
た後に水系アルカリ現像液で現像することを特徴とげる
平版中119版の作製方法を提供することにより達成さ
れた。[Structure of the Invention] The above-mentioned object of the present invention is to provide an orthoquinone diazide compound containing an alkali-soluble resin and an organic dye, and selected from the group consisting of oxazole, isoquaternary diazole, pyrazole, triazole, and a conductor thereof. A photosensitive lithographic printing plate for both positive and negative types, characterized in that it has a photosensitive layer formed on a support, made of a photosensitive composition containing at least one type of photosensitive composition, and the photosensitive lithographic printing plate. This has been achieved by providing a method for producing a 119th lithographic plate, which is characterized in that after image exposure, heat treatment is performed, and then the entire photosensitive layer is exposed and then developed with an aqueous alkaline developer.
以下、本発明について詳述づる。The present invention will be described in detail below.
本発明に用いられるオルトキノンジアジド化合物は、少
なくとも1つのオルトキノンジアジド基、好ましくはオ
ルトベンゾキノンジアジド基ま、たはオルトナフトキノ
ンジアジド基を有する化合物で、公知の種々の構造の化
合物、例えば、J、1<osar著[L ight −
3cnsitive systcmsJ (J ohn
Wiley & 5ons 、 Inc、196
5年発行)第339頁〜第353頁に詳細に記されてい
る化合物を含みうる。特に種々のヒドロキシル化合物ま
たはアミノ化合物と1,2−キノンジアジド−4−スル
フォン酸又は1,2−キノンジアジド−5−スルフォン
酸とのエステルまたはアミドが好適であり、1.2−キ
ノンジアジド−4−スルホン酸のニスデル化合物が特に
aYましい。好ましいヒドロキシル化合物としτは、フ
ェノール類とカルボニル基含有化合物との縮合樹脂、特
に酸性触媒存在下での縮合により得られる樹脂が挙げら
れる。該フェノール類としてはフェノール、レゾルシン
、クレゾール、ピロガロール等が挙げられ、該カルボニ
ル基含有化合物としては、ホルムアルデヒド、ベンズア
ルデヒドの如きアルデヒド類、アセトンの如きケ1−ン
類が挙げられる。The orthoquinonediazide compound used in the present invention is a compound having at least one orthoquinonediazide group, preferably an orthobenzoquinonediazide group or an orthonaphthoquinonediazide group, and is a compound having various known structures, such as J, 1< Written by osar [Light -
3cnsitive system cmsJ (J ohn
Wiley & 5ons, Inc., 196
may include compounds described in detail on pages 339 to 353 (published in 2010). Particularly suitable are esters or amides of various hydroxyl compounds or amino compounds with 1,2-quinonediazide-4-sulfonic acid or 1,2-quinonediazide-5-sulfonic acid, including 1,2-quinonediazide-4-sulfonic acid. The Nisder compound of aY is particularly preferred. Preferred hydroxyl compounds for τ include condensation resins of phenols and carbonyl group-containing compounds, particularly resins obtained by condensation in the presence of an acidic catalyst. Examples of the phenols include phenol, resorcinol, cresol, pyrogallol, etc., and examples of the carbonyl group-containing compound include aldehydes such as formaldehyde and benzaldehyde, and ketones such as acetone.
特にフェノール・ボ、ルムアルデヒド樹脂、クレゾール
・ホルムアルデヒド樹脂、ピロガロール・アセi〜ン樹
脂、レゾルシン・ベンズアルデヒド樹脂が好ましい。Particularly preferred are phenol-bon, luminaldehyde resin, cresol-formaldehyde resin, pyrogallol-acetone resin, and resorcinol-benzaldehyde resin.
本発明に用いられるオルトキノンジアジド化合物の代表
的な具体例としては、ベンゾキノン−(1,2)−ジア
ジドスルボン酸またはナフトキノン−(1,2)−ジア
ジドスルホン酸とフェノール・ホルムアルデヒド樹脂ま
たはクレゾール・ホルムアルデヒド樹脂とのエステル、
米国特許第3、635.709号明mmに記載されてい
るナフトキノンー(1,2)−ジアジドスルホン酸とピ
ロガロール・アセトン樹脂のスルホン酸エステル、ナフ
トキノン−(1,2)−ジアジド−(2)−4−スルホ
ン酸とレゾルシン・ベンズアルデヒド樹脂との縮合物、
ナフトキノン−(1,2)−ジアジド−(2)−4−ス
ルホン酸とレゾルシン・ピロガロール・アセトン共重縮
合物とのエステル化合物またはピロが1コール・アセト
ン共重縮合物、その他有用なオルトキノンジアジド化合
物としては、特1FiI昭50−117503号公報に
記載されている、末端にヒドロキシル基を有するポリエ
ステルとオルトナフトキノンジアジドスルホン酸とのエ
ステル、特開昭50−113305号公報に記載されて
いるような、p−ヒドロキシスチレンのホモポリマーま
たはこれと共重合し得る他の七ツマ−との共重合体とオ
ルトナフトキノンジアジドスルホン酸とのエステル、ト
リヒドロ4ニジベンゾフエノンとオルトキノンジアジド
スルホン酸とのエステル等が挙げられる。Typical specific examples of the orthoquinone diazide compound used in the present invention include benzoquinone-(1,2)-diazide sulfonic acid or naphthoquinone-(1,2)-diazide sulfonic acid and phenol/formaldehyde resin or cresol/formaldehyde resin. ester with,
Sulfonic acid ester of naphthoquinone-(1,2)-diazide sulfonic acid and pyrogallol acetone resin, naphthoquinone-(1,2)-diazide-(2) described in U.S. Pat. - Condensate of 4-sulfonic acid and resorcin benzaldehyde resin,
Ester compounds of naphthoquinone-(1,2)-diazide-(2)-4-sulfonic acid and resorcinol-pyrogallol-acetone copolycondensates or pyro-acetone copolycondensates, and other useful orthoquinonediazide compounds Examples include esters of a polyester having a hydroxyl group at the terminal and orthonaphthoquinonediazide sulfonic acid, as described in Toku 1FiI No. 117503/1982, and esters of orthonaphthoquinonediazide sulfonic acid as described in JP-A-50-113305. Esters of p-hydroxystyrene homopolymers or copolymers with other heptamers that can be copolymerized with p-hydroxystyrene and ortho-naphthoquinonediazide sulfonic acid, esters of trihydro-4-nidibenzophenone and orthoquinonediazide sulfonic acid, etc. Can be mentioned.
本発明においてはこれらのオルトキノンジアジド化合物
の含有爪は感光性組成物の全固形分に対し5〜60重予
%が好ましく、特に好ましくは10〜50重量%である
。In the present invention, the nail containing these orthoquinone diazide compounds preferably ranges from 5 to 60% by weight, particularly preferably from 10 to 50% by weight, based on the total solid content of the photosensitive composition.
本発明に用いられるオキサゾール、イソオキサゾール、
ピラゾール、トリアゾール及びこれらの誘導体からなる
群から選ばれる少なくとも1種の化合物(以下、「本発
明の化合物」と称す。)としては、下記−数式(1)〜
(Vl)のいずれかで表わされる化合物(異性体を有す
る場合は異性体も含む。)が好ましい。Oxazole, isoxazole used in the present invention,
At least one compound selected from the group consisting of pyrazoles, triazoles, and derivatives thereof (hereinafter referred to as "compounds of the present invention") has the following formulas (1) to
Compounds represented by any of (Vl) (including isomers if they have isomers) are preferred.
一般式(1)
一般式(II)
一般式(III)
一般式(IV)
一般式(V)
一般式(Vl)
阿
一般式(■)
(式中、R1及びR2はそれぞれ水素原子、アルキル基
、アミノ基又は二1−1]基を表わす。)R1及びR2
の各々で表わされるアルキル基としては例えばメチル基
、エチル基、プロピル基、イソプロピル基、フェニル基
等が挙げられる。General formula (1) General formula (II) General formula (III) General formula (IV) General formula (V) General formula (Vl) General formula (■) (wherein, R1 and R2 are a hydrogen atom and an alkyl group, respectively) , represents an amino group or a 21-1] group.) R1 and R2
Examples of the alkyl group represented by each of these include methyl group, ethyl group, propyl group, isopropyl group, and phenyl group.
本発明の化合物の例としては、ペンジオキナゾール、2
−メチルベンゾオキサゾール、イソメキサゾール、5−
メチルイソAキナゾール、3.5−ジメヂルイソオキサ
ゾール、3−アミノ−5メチルイソオキサゾール、2.
4−ジフェニルオキサゾール、2,5−ジフェニルオキ
サゾール、ピラゾール、3−メチルピラゾール、4−メ
チルピラゾール、3−アミノピラゾール、インダゾール
、5−アミノインダゾール、6−二トロインダゾール、
1,2.4−トリアゾール、3−ニトロ−1,2,4−
トリアゾール、3−アミノ−1゜2.4−トリアゾール
、1.2.3−ベンゾトリアゾール、5−メチル−1日
−ベンゾI・リアゾール、5−ニトロベンゾトリアゾー
ルなどが挙げられる。これらの化合物は全固形分に対し
0.2〜10重囲%、好ましくは0.5〜4mω%の範
囲で感光性組成物中に含まれる。Examples of compounds of the invention include pendioquinazole, 2
-Methylbenzoxazole, isomexazole, 5-
MethylisoAquinazole, 3.5-dimethylisoxazole, 3-amino-5methylisoxazole, 2.
4-diphenyloxazole, 2,5-diphenyloxazole, pyrazole, 3-methylpyrazole, 4-methylpyrazole, 3-aminopyrazole, indazole, 5-aminoindazole, 6-nitroindazole,
1,2,4-triazole, 3-nitro-1,2,4-
Examples thereof include triazole, 3-amino-1°2.4-triazole, 1.2.3-benzotriazole, 5-methyl-1-day-benzo I. riazole, and 5-nitrobenzotriazole. These compounds are contained in the photosensitive composition in an amount of 0.2 to 10% by weight, preferably 0.5 to 4 mω%, based on the total solid content.
本発明の感光性平版印刷版にはアルカリ可溶性樹脂が用
いられる。このような樹脂は好ましくはフェノール性水
酸基、カルボキシル基、スルホンMW、リンMM等のア
ルカリ可溶性基をもつ化合物であり、該アルカリ可溶性
樹脂としては、フェノール類とケトン類又はアルデヒド
類を酸性触媒存在下で縮合して得られるものが好ましい
。該フェノール類としては、例えばフェノール、クレゾ
ール及びp−置換フェノール等が挙げられる。該アルデ
ヒド類としては、例えばアセトアルデヒド、ホルムアル
デヒド等が挙げられ、ホルムアルデヒドが好ましい。該
ケトン類としてはアセトンが好ましい。An alkali-soluble resin is used in the photosensitive planographic printing plate of the present invention. Such a resin is preferably a compound having an alkali-soluble group such as a phenolic hydroxyl group, a carboxyl group, a sulfone MW, or a phosphorus MM. The one obtained by condensation with is preferable. Examples of the phenols include phenol, cresol, and p-substituted phenol. Examples of the aldehydes include acetaldehyde and formaldehyde, with formaldehyde being preferred. Acetone is preferred as the ketone.
好ましいアルカリ可溶性樹脂どしては例えばフェノール
−ホルムアルデヒド樹脂、クレゾール−ホルムアルデヒ
ド樹脂、特開昭55−57841@公報に記載されてい
るようなフェノール−クレゾール−ホルムアルデヒド共
重縮合体樹脂、特開昭55−127553号公報に記載
されているような、p−置換フェノールとフェノールも
しくはクレゾールとホルムアルデヒドとの共重縮合体樹
脂、レゾルシン−ベンズアルデヒド樹脂、ビロガ0−ル
ーベンズアルデヒド樹脂等の多価フェノール類とベンズ
アルデヒドとの縮合体、ビ0ガロールーレゾルシンーア
Uトン樹脂等の多価フェノールとアセトンとの共重縮合
体、キシレノール−ホルムアルデヒド樹脂が挙げられる
。これらのアルカリ可溶性樹脂の含有mは感光性組成物
の全固形分に対し30〜90重量%が好ましく、特に5
0〜85重量%が好ましい。Preferred alkali-soluble resins include, for example, phenol-formaldehyde resin, cresol-formaldehyde resin, phenol-cresol-formaldehyde copolycondensate resin as described in JP-A-55-57841@, and JP-A-55-57841@. Copolycondensate resins of p-substituted phenol and phenol or cresol and formaldehyde, as described in Japanese Patent No. 127553, resorcinol-benzaldehyde resins, biloga 0-rubenzaldehyde resins, and other polyhydric phenols and benzaldehyde. Examples thereof include condensates, copolycondensates of polyhydric phenol and acetone such as bigallol-resorcinol-Uton resin, and xylenol-formaldehyde resins. The content m of these alkali-soluble resins is preferably 30 to 90% by weight based on the total solid content of the photosensitive composition, particularly 5% by weight.
0 to 85% by weight is preferred.
また、本発明に係る感光性組成物は有機染料を含むこと
ができる。好ましい有機染料としては、例えばビクトリ
アピュアブルーBOH[保土谷化学] (CI 42
595) 、オイルブルー9603[オリエント化学工
業製1、パテントピュアブルー[住友三国化学製] (
CI 42045) 、クリスタルバイオレット(C
I 42555) 、ブリリアントグリーン(CI
42040) 、エチルバイオレット、メチルバイオ
レット(Cl 42535) 、メチルグリーン(C
,145285) 、工IJスO?/ンB (CI
45430)、ペイシックツクシン(C142510)
、マラカイトグリーン(CI 42000) 、オ
イ/LzL/7F(C160505) 、lτクレゾー
ルパープル、0−ダミンB (CI 45170)
、オーラミン(CI 41000)、4−D−ジエチ
ルアミノフェニルイミノナフトキノン、シアノ−p−ジ
エチルアミノフェニルアセトアニリド等に代表されるト
リフェニルメタン系、ジフェニルメタン系、オキサジン
系、オキサテン系、イミノデフ1〜キノン系、アゾメチ
ン系及びアントラキノン系の色素等が挙げられる。Moreover, the photosensitive composition according to the present invention can contain an organic dye. Preferred organic dyes include, for example, Victoria Pure Blue BOH [Hodogaya Chemical Co., Ltd.] (CI 42
595), Oil Blue 9603 [Orient Chemical Industry Co., Ltd. 1, Patent Pure Blue [Sumitomo Mikuni Chemical Co., Ltd.] (
CI 42045), Crystal Violet (C
I 42555), Brilliant Green (CI 42555), Brilliant Green (CI 42555)
42040), ethyl violet, methyl violet (Cl 42535), methyl green (C
, 145285), Engineering IJ SuO? /nB (CI
45430), Pesic Tsuksin (C142510)
, Malachite Green (CI 42000), Oi/LzL/7F (C160505), lτ Cresol Purple, 0-Damine B (CI 45170)
, auramine (CI 41000), 4-D-diethylaminophenylimino naphthoquinone, triphenylmethane type represented by cyano-p-diethylaminophenylacetanilide, etc., diphenylmethane type, oxazine type, oxatene type, iminodef 1-quinone type, azomethine type and anthraquinone dyes.
上記有機染料は感光性組成物全固形分に対し、好ましく
は0.01〜5重M%、より好ましくは0.1〜3mm
%のmで含まれる。The organic dye is preferably used in an amount of 0.01 to 5% by weight, more preferably 0.1 to 3 mm, based on the total solid content of the photosensitive composition.
Contained in % m.
本発明の感光性平版印刷版に用いられる感光性組成物に
は、以上説明した各素材の他に、必要に応じて下記のよ
うな添加剤も含むことができる。In addition to the materials described above, the photosensitive composition used in the photosensitive lithographic printing plate of the present invention can also contain the following additives, if necessary.
すなわち、可塑剤としての各種低分子化合物類(例えば
フタル酸エステル類、トリフェニルホスフェート類、マ
レイン酸エステル類等)、塗布性向上剤としての界面活
性剤(例えばフッ素系界面活性剤、エチルセル0−スポ
リアルキレンエーテル等に代表されるノニオン活性剤等
)、ポジ型感光性組成物の増感剤として酸無水物等が挙
げられる。更に、露光により酸もしくは遊tJIMを生
成し、前述の如き有機染料と相互作用して該染料の色調
を変化せしめる化合物を、露光により可視FM像を形成
させるためのプリントアウト月利として含むこともでき
る。露光により酸もしくは遊離基を生成する化合物とし
ては、例えば特開昭50−36209号公報に記載の0
−ナフトキノンジアジド−4−スルフォン酸ハロゲニド
、特開昭53−36223号公報に記載のトリへロメチ
ルー2−ピ0ンやトリハロメチル−トリアジン、特開昭
55−6244号公報に記載のオルトナフトキノンジア
ジド−4−スルホン酸クロライドと電子吸引性置換基を
有するフェノール類またはアニリン類とのエステル化合
物、特開昭55−77742号公報に記載のハロメチル
−ビニル−オキサジアゾール化合物及びジ7ゾニ1クム
塩類等が挙げられる。これらの化合物はその種類によっ
ても異なるが、概してその添加間は感光性組成物の全固
形分に対して0,01〜20重量%、好ましくは0.0
5〜10重量%が適当である。That is, various low-molecular compounds (e.g. phthalates, triphenyl phosphates, maleate esters, etc.) as plasticizers, surfactants (e.g. fluorosurfactants, ethyl cell 0- nonionic activators typified by polyalkylene ethers, etc.), acid anhydrides and the like as sensitizers for positive photosensitive compositions. Furthermore, a compound that generates acid or free tJIM upon exposure to light and interacts with an organic dye such as those described above to change the color tone of the dye may be included as a printout for forming a visible FM image upon exposure to light. can. Examples of compounds that generate acids or free radicals upon exposure to light include 0 described in JP-A No. 50-36209.
-Naphthoquinonediazide-4-sulfonic acid halide, trihalomethyl-2-pyone and trihalomethyl-triazine described in JP-A-53-36223, ortho-naphthoquinonediazide as described in JP-A-55-6244. Ester compounds of 4-sulfonic acid chloride and phenols or anilines having electron-withdrawing substituents, halomethyl-vinyl-oxadiazole compounds and di7zoni-1cum salts described in JP-A-55-77742, etc. can be mentioned. These compounds vary depending on their type, but generally the amount during addition is 0.01 to 20% by weight, preferably 0.0% by weight based on the total solid content of the photosensitive composition.
5 to 10% by weight is suitable.
本発明の感光性平版印刷版は前記の感光性組成物を適当
な溶媒に溶解し、支持体上に塗布することによって得ら
れる。用いられる溶媒の例としては、エチレングリコー
ル、エチレングリコールモノメチルニーデル、エチレン
グリコールモノメチルエーテルアセテート−、エチレン
グリコールイソプロピルニーデル、エチレングリコール
モノブチルエーテル、ジエチレングリコール、ジエチレ
ングリコールモノメチルニーデル、ジエチレングリコー
ルモノエチルエーテル、プロピレングリコール、プロピ
レングリコールモツプチルエーテル、ブロビレングリコ
ールモノメ、チルエーテルアセテート、プロピレングリ
コールモノエチルエーテル、プロピレングリコール七ノ
エチルエーテルアセテート、プロピレングリコールモツ
プチルエーテルなどの多価アルコールのエーテルが好ま
しく挙げられるが、この他に、ジオキサン、デ1−ラヒ
ドロフラン、テトラヒドロビランなどのエーテル類;メ
チルエチルケトン、メチルプロピルク゛トン、メチルブ
チルケ1〜ン、メチルアミルク1−ン、ジエチルケトン
、ジアセ1−ンアルコール、シクロペンタノン、シクロ
ヘキサノンなどのケトン類:メタノール、エタノール、
プロパツール、イソプロパツール、n−ブタノール、5
ec−ブタノール、tert−ブタノール、n−ペンタ
ノール、イソペンタノール、n−へキリ°ノール、イソ
ヘキサノール等のアルコール類:酢酸エチル、酢酸プロ
ピル、酢酸ブチル、酢酸アミル、酢酸ヘキシル、プロピ
オン酸エチル、プロピオン酸ブチルなどのエステル類な
ども用いることができる。The photosensitive lithographic printing plate of the present invention can be obtained by dissolving the photosensitive composition described above in a suitable solvent and coating the solution on a support. Examples of solvents used include ethylene glycol, ethylene glycol monomethyl needles, ethylene glycol monomethyl ether acetate, ethylene glycol isopropyl needles, ethylene glycol monobutyl ether, diethylene glycol, diethylene glycol monomethyl needles, diethylene glycol monoethyl ether, propylene glycol, Preferred examples include ethers of polyhydric alcohols such as propylene glycol motsubutyl ether, brobylene glycol monomer, thyl ether acetate, propylene glycol monoethyl ether, propylene glycol heptanoethyl ether acetate, and propylene glycol motsubutyl ether; In addition, ethers such as dioxane, dihydrofuran, and tetrahydrobilane; methyl ethyl ketone, methyl propyl carbon, methyl butyl carbon, methyl amyl carbon, diethyl ketone, diacetic alcohol, cyclopentanone, cyclohexanone, etc. Ketones: methanol, ethanol,
Propatool, Isopropatool, n-butanol, 5
Alcohols such as ec-butanol, tert-butanol, n-pentanol, isopentanol, n-hekylinol, isohexanol: ethyl acetate, propyl acetate, butyl acetate, amyl acetate, hexyl acetate, ethyl propionate, Esters such as butyl propionate can also be used.
本発明の感光性平版印刷版に用いられる支持体としては
アルミニウム板、唾鉛、銅、鉄などの金属板、また金属
が蒸着された紙、およびプラスデックフィルム等があげ
られるが、アルミニウム板が最も好ましい。特に好まし
くは、砂目立て処理、陽極酸化処理及び必要に応じ封孔
処理等の表面処理が施されたアルミニ1クム板である。Examples of the support used in the photosensitive lithographic printing plate of the present invention include aluminum plates, metal plates such as salivary lead, copper, and iron, paper on which metals are vapor-deposited, and Plus Deck films. Most preferred. Particularly preferred is an aluminum 1Kum board that has been subjected to surface treatments such as graining, anodizing, and, if necessary, sealing.
また、前記感光性組成物の支持体上への塗布mは用途に
よっても異なるが、−殻内に固形分として0.5〜3.
5(J/fの範囲が適当である。The coating m of the photosensitive composition on the support varies depending on the use, but is 0.5 to 3.0 m as solid content in the shell.
5 (J/f range is appropriate.
上述のように得られた感光性平版印刷版からは、画像露
光後にポジ用現像液で現像してポジ画像を得ることがで
きる。また、画像露光後に熱処理を施し、更に感光性層
全面を再露光した優に、水系アルカリ現像液で現像する
ことによりネガ型画像を得ることができる。From the photosensitive lithographic printing plate obtained as described above, a positive image can be obtained by developing with a positive developer after image exposure. Further, a negative image can be obtained by performing heat treatment after image exposure, and further exposing the entire surface of the photosensitive layer to light, and then developing with an aqueous alkaline developer.
本発明における感光性平版印刷版の画像露光は例えば、
像形成がなされた透光性フィルムを感光性平版印刷版に
原稿として密着させ、一定時間、螢光管、キセノン灯、
金属ハロゲン化物を装入した高圧水銀灯、炭素アーク灯
などの公用の光源を用いて行なう等の通常行なわれてい
る種々の方法によって行なうことができる。Image exposure of the photosensitive lithographic printing plate in the present invention includes, for example,
The image-formed translucent film is brought into close contact with a photosensitive lithographic printing plate as an original, and exposed to a fluorescent tube, xenon lamp,
This can be carried out by various commonly used methods, such as using a publicly available light source such as a high-pressure mercury lamp charged with a metal halide or a carbon arc lamp.
また、本発明においては上記画像露光につづく熱処理は
80〜200℃、好ましくは90〜160℃の範囲の温
度で1〜30分、好ましくは3〜15分の時間で行なわ
れることがりYましく、加熱温度が低すぎると現像時に
感光性層が現像液に溶解してしまう等の問題が生じ、ま
た加熱温度が高ずざると、感光性層全面が硬化してしま
う等の問題が生じる場合がある。Further, in the present invention, the heat treatment following the image exposure is preferably carried out at a temperature in the range of 80 to 200°C, preferably 90 to 160°C, for 1 to 30 minutes, preferably 3 to 15 minutes. If the heating temperature is too low, there will be problems such as the photosensitive layer dissolving in the developer during development, and if the heating temperature is not too high, problems such as the entire surface of the photosensitive layer will be cured. There is.
このような加熱処理は画像露光後の感光性平版印刷版を
加熱空気中に上記時間放置して行なうのが一般的である
が、感光性平版印刷版の支持体側に加熱した物体を接触
させて行なうことも可能である。Such heat treatment is generally carried out by leaving the photosensitive lithographic printing plate in heated air for the above-mentioned period of time after image exposure; It is also possible to do so.
上記熱処理後に行なわれる全面露光は、前記画像露光と
同様の装置を用いて行なうことができる。The entire surface exposure performed after the heat treatment can be performed using the same apparatus as the image exposure.
また、本発明の方法において、感光性平版印刷版の現像
に用いる水系アルカリ現像液としては下記の現像液が挙
げられる。。In addition, in the method of the present invention, the following developers can be mentioned as the aqueous alkaline developer used for developing the photosensitive lithographic printing plate. .
ずなわら、本発明に係わる。現像液はアルカリ性の水性
溶液であり、用いられるアルカリ剤として好ましくはケ
イ酸カリウム、ケイ酸リチウム、ケイ酸ナトリウム、水
酸化ナトリウム、水酸化カリウム、水酸化リチウム、第
三リン酸ナトリウム、第ニリン酸ナトリウム、第三リン
酸カリウム、第ニリン酸カリウム、炭酸すトリウム、炭
酸カリウム等が挙げられる。これらの中でもケイ酸カリ
ウム、ケイ酸リチウム、ケイ酸ナトリウム等のケイ酸ア
ルカリを含イテする現像液は現像階調性が良好なため好
ましく、ケイ酸アルカリの組成がモル比で[Si 02
]/ [M]= 0.5〜1.5(ここに[Si 0
2 ]、[M]はそれぞれ3i02のモル濃度と総アル
カリ金属のモル濃度を示す。)であり、かつ5102を
0.8〜8重量%含有する現像液が好ましく用いられる
。このケイ酸アルカリ組成のうち、特にモル比で[Si
02 ] / [M] =0.5〜0.75であり、
かつSiO2が0.8〜4重最%の現像液は、低fJ度
のため現像廃液の中和が容易な点で好ましく用いられ、
一方0.15を超え1.3までのモル比であり、かつS
iO2が1〜8重量%の現像液は緩衝力が高く、処理能
力が高い点で好適に用いられる。However, it is related to the present invention. The developer is an alkaline aqueous solution, and the alkaline agent used is preferably potassium silicate, lithium silicate, sodium silicate, sodium hydroxide, potassium hydroxide, lithium hydroxide, tribasic sodium phosphate, diphosphoric acid. Examples include sodium, tribasic potassium phosphate, dibasic potassium phosphate, thorium carbonate, potassium carbonate, and the like. Among these, a developer containing an alkali silicate such as potassium silicate, lithium silicate, or sodium silicate is preferable because it has good development gradation.
] / [M] = 0.5 ~ 1.5 (here [Si 0
2] and [M] indicate the molar concentration of 3i02 and the molar concentration of total alkali metals, respectively. ) and a developer containing 0.8 to 8% by weight of 5102 is preferably used. Of this alkali silicate composition, especially in molar ratio [Si
02 ] / [M] = 0.5 to 0.75,
A developer containing 0.8 to 4% SiO2 is preferably used because it has a low fJ degree and can easily neutralize the developer waste.
On the other hand, the molar ratio is more than 0.15 and up to 1.3, and S
A developer having an iO2 content of 1 to 8% by weight is preferably used because it has a high buffering power and a high throughput.
また、該ケイ酸アルカリのアルカリ金属として全アルカ
リ金属中、カリウムを20モル%以上含むことが、現象
液中での不溶物発生が少ないため好ましく、より好まし
くはカリウムを90モル%以上含むことであり、最も好
ましくはカリウムが100モル%の場合である。In addition, it is preferable that the alkali silicate contains 20 mol% or more of potassium as the alkali metal in the total alkali metals, since the generation of insoluble matter in the reaction liquid is small, and more preferably 90 mol% or more of potassium. Most preferably, the potassium content is 100 mol%.
本発明に好ましく用いられる現像液のtIH値は25℃
において12以上であり、好ましくは12.5〜14.
0である。The tIH value of the developer preferably used in the present invention is 25°C.
is 12 or more, preferably 12.5 to 14.
It is 0.
また該現flil液中には、例えば亜硫酸カリウム、亜
硫酸カリウム、亜硫酸リチウム、亜硫酸マグネシウムな
どの水溶性亜硫′M塩を添加することができる。亜硫酸
塩の現像液中における好ましい含有mは0.05〜4重
ω%で、より望ましくは0.1〜1重M%である。Furthermore, water-soluble sulfite M salts such as potassium sulfite, potassium sulfite, lithium sulfite, and magnesium sulfite can be added to the current flil solution. The preferred content m of sulfite in the developer is 0.05 to 4 wt M%, more preferably 0.1 to 1 wt M%.
また、該現像液中に、特開昭50−51324号公報に
記載されているようなアニオン性界面活性剤、両性界面
活性剤a3よび特開昭5°9−75255号公報、同6
0−111246号公報及び同60−213943号公
報等に記載されでいるような非イオン性界面活性剤のう
ち少なくとも1梗を含有させることにより、または特開
昭55−95946号公報、同56−142528号公
報等に記されるような畠分子電解質を含有させることに
J:す、感光性組成物への濡れ性を高めたり、階調性を
さらに高めることができ、好ましい。かかる界面活性剤
の添加量は特に制限はないが、0.003〜3申n%が
好ましく、特にo、 ooe〜1重量%の濃度が好まし
い、。In addition, anionic surfactants such as those described in JP-A-50-51324, amphoteric surfactants A3, and JP-A-59-75255 and JP-A-Sho 6 may be added to the developer.
By containing at least one of the nonionic surfactants as described in JP-A No. 0-111246 and JP-A No. 60-213943, or by including at least one of the nonionic surfactants described in JP-A-55-95946 and JP-A-55-95946, It is preferable to include a Hatake molecular electrolyte as described in Japanese Patent No. 142,528, etc., because it can improve wettability to the photosensitive composition and further improve gradation. The amount of such surfactant added is not particularly limited, but it is preferably 0.003 to 3% by weight, particularly preferably 0.00 to 1% by weight.
さらに、本発明に使用される現像液には消泡剤を含有さ
せることができる。好適な消泡剤には有機シラン化合物
が挙げられる。Furthermore, the developer used in the present invention can contain an antifoaming agent. Suitable antifoaming agents include organosilane compounds.
上記現像液で画像露光された本発明の感光性平版印刷版
を現像する方法としては従来公知の種々の方法が可能で
ある。具体的には例えば画像露光された該感光性平版印
刷版を現像液中に浸漬する方法、該感光性平版印刷版の
感光性層に対して多数のノズルから現像液を噴出する方
法、現像液で湿潤されたスポンジで該感光性平版印刷版
の感光性層を拭う方法、該感光性平版印刷版の感光性層
の表面に現像液をローラー塗布する方法などが挙げられ
る。またこのようにして感光性平版印刷版の感光性層に
現像液を施した後、感光性層の表面をブラシなどr:軽
く擦ることもできる。現像条件については、前記現像方
法に応じて適宜選ぶことができる。−例を示寸と、例え
ば浸漬による現像方法では約10〜40℃の現象液に約
10〜80秒間浸漬させる方法が選ばれる。Various conventionally known methods can be used to develop the photosensitive lithographic printing plate of the present invention which has been imagewise exposed with the above developer. Specifically, for example, a method of immersing the image-exposed photosensitive lithographic printing plate in a developer, a method of jetting a developer from a number of nozzles onto the photosensitive layer of the photosensitive lithographic printing plate, and a method of ejecting a developer from a number of nozzles; Examples include a method of wiping the photosensitive layer of the photosensitive lithographic printing plate with a sponge moistened with a sponge, and a method of rolling a developer onto the surface of the photosensitive layer of the photosensitive lithographic printing plate. Further, after applying the developer to the photosensitive layer of the photosensitive lithographic printing plate in this manner, the surface of the photosensitive layer may be lightly rubbed with a brush or the like. The developing conditions can be appropriately selected depending on the developing method. - For example, in the development method by immersion, a method of immersing in a developing solution at about 10 to 40° C. for about 10 to 80 seconds is selected.
[実施例]
以下に本発明を実施例により説明覆るが、本発明はこれ
らに限定されるものではない。[Examples] The present invention will be explained below with reference to Examples, but the present invention is not limited thereto.
実施例1
下記組成を有する感光液を調製し、これを砂目立てした
アルミニウム板にロールコータ−を用いて固形分1.8
(J/l’の塗布mとなるように塗布した後、乾燥し
、感光性平版印刷版試料1を得た。Example 1 A photosensitive liquid having the following composition was prepared and coated on a grained aluminum plate using a roll coater to reduce the solid content to 1.8.
(After coating to give a coating m of J/l', it was dried to obtain photosensitive lithographic printing plate sample 1.
(感光液組成)
・1〜リヒドロキシベンゾフエノンとナフトキノン(1
,2)−ジアジド−4−スルホン酸クロライドとのエス
テル化合物(QD−1)2.3重量部
・フェノール、m −、p −n合りレゾールとホルム
アルデヒドとの共m縮合樹脂(フェノール、−一、p−
混合クレゾールのモル比が48 : 32 :20)
0.7重量部・パラオ゛
クチルフェノールとホルマリンとから合成されたノボラ
ック樹脂 0,9型組部・2−トリクロル−デル−
5−(β−ベンゾフリルビニル)−1,3,4−オキサ
ジアゾール0.05 jlifl1部
・イソオキサゾール 0.07重d部・ビク
トリアピュアブルーBOH0,07m1部・エチレング
リコールモノメチルエーテル8型組部
・エチレングリコール七ノエチルエーテル37重量部
上記感光液組成において、イソオキサゾール又はQD−
1を表−1に示ずような化合物にかえる以外は試料1と
同様にして感光性平版印刷版試料2〜8を作製した。(Photosensitive liquid composition) ・1~lyhydroxybenzophenone and naphthoquinone (1
, 2) 2.3 parts by weight of ester compound (QD-1) with diazide-4-sulfonic acid chloride, phenol, m-, p-n co-condensation resin of resol and formaldehyde (phenol, -1) ,p-
Molar ratio of mixed cresol is 48:32:20)
0.7 parts by weight・Novolac resin synthesized from paraoctylphenol and formalin 0.9 type assembly・2-trichlordel-
5-(β-Benzofurylvinyl)-1,3,4-oxadiazole 0.05 jlifl 1 part, isoxazole 0.07 weight d part, Victoria Pure Blue BOH 0.07ml 1 part, ethylene glycol monomethyl ether type 8 part - Ethylene glycol heptanoethyl ether 37 parts by weight In the above photosensitive liquid composition, isoxazole or QD-
Photosensitive lithographic printing plate samples 2 to 8 were prepared in the same manner as sample 1 except that 1 was replaced with the compounds shown in Table 1.
上記得られた試料1〜8の各々を2枚に切断し、その一
方はポジ原画を露光した後、メタケイ酸ソーダ4%溶液
にベンゼンスルホン酸ソーダを0.1%添加した、有機
溶剤を含まない現像液中に27℃で20秒間浸漬し、現
像して鮮明なポジ画像を得た。露光は透明フィルム上に
形成された陽画原稿を版面に密首し、2KWメタルハラ
イドランプ(台輪電気(掬製アイドルフィン2000)
を光源として光量8.0 mW/ (、fで70秒間行
なった。以下、この方法で形成されたポジ画像をポジー
ポジ画像と称する。もう一方の試料には上記ポジ画像露
光と同一条件でネガ型画像およびステップタブレット(
イーストマンコダック社製No、2.am度差0.15
ずつで21段のグレースケールによる)を露光した後1
40℃に保った空気恒温槽中に5分間放置し、冷却後に
原画を用いずに画像露光と同一条件で露光した。次いで
、ポジーポジ画像を得たのと同一条件で現像して鮮明な
ポジ画像を得た。Each of Samples 1 to 8 obtained above was cut into two pieces, one of which was prepared by exposing the positive original image to light, and then adding 0.1% of sodium benzenesulfonate to a 4% solution of sodium metasilicate, which contained an organic solvent. The sample was immersed in a developer solution at 27° C. for 20 seconds and developed to obtain a clear positive image. For exposure, the positive original formed on a transparent film was tightly placed on the printing plate, and a 2KW metal halide lamp (Archiwa Electric (Idol Fin 2000 made by Kiki) was used.
The exposure was carried out for 70 seconds at a light intensity of 8.0 mW/(, f) using a light source of Image and step tablet (
Eastman Kodak Company No. 2. am degree difference 0.15
1 after exposure (according to 21 steps of gray scale)
The film was left in an air constant temperature bath maintained at 40° C. for 5 minutes, and after cooling, it was exposed under the same conditions as the image exposure without using the original image. Next, development was performed under the same conditions as those used to obtain the positive image to obtain a clear positive image.
以下、この方法で得られたポジ画像をネガ−ポジ画像と
称する。Hereinafter, the positive image obtained by this method will be referred to as a negative-positive image.
ネガ−ポジ画像の各々の作製時について、露光可視画性
を評価した。また、得られた平版印刷版の各々を用いて
下記印刷条件にて印刷を(テない、版面の汚れ及び耐刷
性を評価した。The exposure visibility was evaluated for each negative-positive image produced. In addition, each of the obtained lithographic printing plates was used to perform printing under the following printing conditions, and the staining of the plate surface and printing durability were evaluated.
(印刷条件)
印刷機:ハイデルG T O
印刷インキ:東洋キングニューブライト紅(東洋インキ
社製)
紙:上質紙
印刷速度: 8000枚/時
版面の汚れの評価は、上記印刷を22℃、相対湿度62
%の印刷室にて行ない、印刷中一定の時点で湿し水の供
給を20%カットして印刷を行ない、汚れのない印刷が
得られる枚数で行なった。(Printing conditions) Printing machine: Heidel GTO Printing ink: Toyo King New Bright Red (manufactured by Toyo Ink Co., Ltd.) Paper: High quality paper Printing speed: 8000 sheets/hour Evaluation of plate surface stains Humidity 62
% printing room, and the supply of dampening water was cut by 20% at a certain point during printing, and printing was carried out with the number of sheets that could produce stain-free prints.
また、耐刷性の評価はインキが画像部に着肉しなくなっ
た時点での枚数で行なった。Further, the printing durability was evaluated based on the number of sheets at the time when the ink stopped adhering to the image area.
比較例1
実施例1の感光液組成において、該感光液組成からイソ
オキサゾールを除いた以外は試料1と同様にして試料9
を、また、該感光液組成からビクトリアピュアブルーB
OHを除いた以外は試料1と同様にして試料10を、更
に該感光液組成からイソオキサールール及びビクトリア
ピュアブルーBOHを除いた以外は試別1と同様にして
試料11を作製した。これらの試料9〜11の各々につ
いて実膿例1ど同様にして処即し、また評価を行なった
。Comparative Example 1 Sample 9 was prepared in the same manner as Sample 1 except that isoxazole was removed from the photosensitive liquid composition of Example 1.
Also, from the composition of the photosensitive liquid, Victoria Pure Blue B
Sample 10 was prepared in the same manner as Sample 1 except that OH was removed, and Sample 11 was prepared in the same manner as Trial 1 except that Isoxalur and Victoria Pure Blue BOH were removed from the composition of the photosensitive liquid. Each of these samples 9 to 11 was treated and evaluated in the same manner as Example 1 of actual pus.
試別9〜10についてはいずれb鮮明なポジーポジ画像
及びネガーポジ画象を得ることができた。For trials 9 and 10, clear positive-positive images and negative-positive images could be obtained.
試料11については、ポジーポジ画像は鮮明に得られた
が、ネガ−ポジ画像についでは安定した画像が得られな
かった。評価の結果を表−1に示す。Regarding sample 11, a clear positive-positive image was obtained, but a stable negative-positive image was not obtained. The evaluation results are shown in Table-1.
比較例2
実施例1の感光液組成においてQD−1に代わりにクレ
ゾール・ホルムアルデヒド樹脂とす71−キノン−(1
,2)−ジアジド−5−スルホン酸とのエステル(QD
−3)を用い、イソオキサゾールの代わりにイミダゾー
ルを用い、更にビクトリアピュアブルーを除いた以外は
試料1と同様にして試料12を、また実施例1の感光液
組成においてQD−1の代わりにQD−3を用い、イソ
オキリシールの代わりにジェタノールアミンを用いた以
外は試料1と同様にして試料13を、また実施例1の感
光液組成においてQD−1の代わりにQD−3を用い、
イソオキ1ノ゛ゾールの代わりに1’ 3’、3’
−トリメチル−6′−二トロスピロ[2H−1−ベンゾ
ピラン−2,2′−インドリン]を用い、更にビクトリ
アピュアブルーを除いた以外は試料1と同様にして試料
14を作製した。これらの試料12〜14について実施
例1、−」1.’ : 、!′!
本I QD−2:
ピロガロール・アセトン樹脂とナフトキノン丁(1,2
)−ジアジド−4−スルホン酸りDライドとのエステル
化合物
本2 QD−3;
クレゾール・ホルムアルデヒド樹脂とナフトキノン−(
1,2)−ジアジド−5−スルホン酸とのエステル
*3露光可視画性評価
Δ:八へ≧O、17
B:0.15≦ΔQ<0.17
C:0.12≦ΔQ<0.15
[):0.09≦ΔQ<0.12
E:ΔQ<0.09
但しΔDは露光部と未露光部の濃度差を表わす。Comparative Example 2 Cresol formaldehyde resin and 71-quinone-(1
,2)-diazide-5-sulfonic acid (QD
-3), imidazole was used instead of isoxazole, and sample 12 was prepared in the same manner as sample 1 except that Victoria Pure Blue was removed. Sample 13 was prepared in the same manner as Sample 1 except that -3 was used, and jetanolamine was used instead of isookyrisyl, and QD-3 was used instead of QD-1 in the photosensitive liquid composition of Example 1.
1'3',3' instead of isoox 1 nozole
Sample 14 was prepared in the same manner as Sample 1 except that -trimethyl-6'-nitrospiro[2H-1-benzopyran-2,2'-indoline] was used and Victoria Pure Blue was removed. Example 1 for these samples 12-14, -''1. ':,! ′! Book I QD-2: Pyrogallol acetone resin and naphthoquinone (1,2
)-Ester compound with diazide-4-sulfonic acid D-ride Book 2 QD-3; Cresol formaldehyde resin and naphthoquinone-(
Ester with 1,2)-diazido-5-sulfonic acid *3 Exposure visible image quality evaluation Δ: 8≧O, 17 B: 0.15≦ΔQ<0.17 C: 0.12≦ΔQ<0. 15 [): 0.09≦ΔQ<0.12 E: ΔQ<0.09 where ΔD represents the density difference between the exposed area and the unexposed area.
表−1より明らかなように、本発明の化合物を含有する
本発明の試料N001〜8はいずれも優れた露光可視画
性を有し、かつ各々の試料より得られた平版印刷版はい
ずれも版面が汚れにくく、改良された耐刷性を有してい
る。As is clear from Table 1, samples Nos. 001 to 8 of the present invention containing the compound of the present invention all had excellent exposed visible image properties, and the lithographic printing plates obtained from each sample The plate surface is less stained and has improved printing durability.
[発明の効果]
本発明によれば、ネガ型処理で改良された露光可視画性
を有し、かつ版面が汚れにクク、改良された耐刷性を有
する平版印刷版を与えるポジ型・ネガ型兼用の感光性平
版印刷版が提供される。[Effects of the Invention] According to the present invention, a positive-working/negative printing plate which has improved exposure visibility through negative processing, has a plate surface that is resistant to stains, and has improved printing durability. A dual-purpose photosensitive lithographic printing plate is provided.
特許出願人 コニカ株式会社(他1名)代 理 人 弁
理士 市之瀬 宮人’:”:”、IL・−・yl
[、てPatent applicant: Konica Corporation (and one other person) Representative: Patent attorney Miyahito Ichinose':”:”, IL・-・yl [,te
Claims (2)
脂及び有機染料を含有し、かつオキサゾール、イソオキ
サゾール、ピラゾール、トリアゾール及びこれらの誘導
体からなる群から選ばれる少なくとも1種を含有する感
光性組成物で形成された感光性層を支持体上に有するこ
とを特徴とするポジ型・ネガ型兼用感光性平版印刷版。(1) A photosensitive composition containing an orthoquinone diazide compound, an alkali-soluble resin, and an organic dye, and containing at least one member selected from the group consisting of oxazole, isoxazole, pyrazole, triazole, and derivatives thereof. A photosensitive lithographic printing plate for both positive and negative types, characterized by having a photosensitive layer on a support.
脂及び有機染料を含有し、かつオキサゾール、イソオキ
サゾール、ピラゾール、トリアゾール及びこれらの誘導
体からなる群から選ばれる少なくとも1種を含有する感
光性組成物で形成された感光性層を支持体上に有する感
光性平版印刷版を画像露光後、熱処理を施し、次いで前
記感光性層の全面を露光した後に水系アルカリ現像液で
現像することを特徴とする平版印刷版の作製方法。(2) Formed from a photosensitive composition containing an orthoquinone diazide compound, an alkali-soluble resin, and an organic dye, and containing at least one member selected from the group consisting of oxazole, isoxazole, pyrazole, triazole, and derivatives thereof. A lithographic printing plate comprising a photosensitive lithographic printing plate having a photosensitive layer on a support, which is subjected to imagewise exposure and then subjected to heat treatment, and then the entire surface of the photosensitive layer is exposed and then developed with an aqueous alkaline developer. Fabrication method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31563388A JPH02160240A (en) | 1988-12-14 | 1988-12-14 | Photosensitive planographic printing plate of both positive and negative uses and production of planographic printing plate by using this plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31563388A JPH02160240A (en) | 1988-12-14 | 1988-12-14 | Photosensitive planographic printing plate of both positive and negative uses and production of planographic printing plate by using this plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02160240A true JPH02160240A (en) | 1990-06-20 |
Family
ID=18067711
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP31563388A Pending JPH02160240A (en) | 1988-12-14 | 1988-12-14 | Photosensitive planographic printing plate of both positive and negative uses and production of planographic printing plate by using this plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02160240A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006184660A (en) * | 2004-12-28 | 2006-07-13 | Sumitomo Bakelite Co Ltd | Positive photosensitive resin composition, and semiconductor device and display component using the same |
JP2007017959A (en) * | 2005-06-07 | 2007-01-25 | Asahi Kasei Electronics Co Ltd | Positive photosensitive resin composition |
-
1988
- 1988-12-14 JP JP31563388A patent/JPH02160240A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006184660A (en) * | 2004-12-28 | 2006-07-13 | Sumitomo Bakelite Co Ltd | Positive photosensitive resin composition, and semiconductor device and display component using the same |
JP4543923B2 (en) * | 2004-12-28 | 2010-09-15 | 住友ベークライト株式会社 | Positive photosensitive resin composition and semiconductor device and display element using the same |
JP2007017959A (en) * | 2005-06-07 | 2007-01-25 | Asahi Kasei Electronics Co Ltd | Positive photosensitive resin composition |
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