JPH02157261A - Production of sulfonium compound - Google Patents
Production of sulfonium compoundInfo
- Publication number
- JPH02157261A JPH02157261A JP63311993A JP31199388A JPH02157261A JP H02157261 A JPH02157261 A JP H02157261A JP 63311993 A JP63311993 A JP 63311993A JP 31199388 A JP31199388 A JP 31199388A JP H02157261 A JPH02157261 A JP H02157261A
- Authority
- JP
- Japan
- Prior art keywords
- general formula
- carbonate
- alkali metal
- sulfonium compound
- metal carbonate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 sulfonium compound Chemical class 0.000 title claims abstract description 33
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 229910000288 alkali metal carbonate Inorganic materials 0.000 claims abstract description 14
- 150000008041 alkali metal carbonates Chemical class 0.000 claims abstract description 14
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 9
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims abstract description 8
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 abstract description 10
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 abstract description 10
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 abstract description 6
- 239000002585 base Substances 0.000 abstract description 5
- 229910000027 potassium carbonate Inorganic materials 0.000 abstract description 5
- 239000003153 chemical reaction reagent Substances 0.000 abstract description 4
- 229910052736 halogen Inorganic materials 0.000 abstract description 4
- 238000002955 isolation Methods 0.000 abstract description 4
- 229910000029 sodium carbonate Inorganic materials 0.000 abstract description 3
- FJDQFPXHSGXQBY-UHFFFAOYSA-L caesium carbonate Chemical compound [Cs+].[Cs+].[O-]C([O-])=O FJDQFPXHSGXQBY-UHFFFAOYSA-L 0.000 abstract description 2
- 229910000024 caesium carbonate Inorganic materials 0.000 abstract description 2
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 abstract description 2
- 229910052808 lithium carbonate Inorganic materials 0.000 abstract description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical group OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 abstract description 2
- WPFGFHJALYCVMO-UHFFFAOYSA-L rubidium carbonate Chemical compound [Rb+].[Rb+].[O-]C([O-])=O WPFGFHJALYCVMO-UHFFFAOYSA-L 0.000 abstract description 2
- 229910000026 rubidium carbonate Inorganic materials 0.000 abstract description 2
- 150000002367 halogens Chemical class 0.000 abstract 2
- 150000008064 anhydrides Chemical class 0.000 abstract 1
- 235000015320 potassium carbonate Nutrition 0.000 abstract 1
- 235000017550 sodium carbonate Nutrition 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 19
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 7
- 150000001413 amino acids Chemical class 0.000 description 6
- VMKYTRPNOVFCGZ-UHFFFAOYSA-N 2-sulfanylphenol Chemical class OC1=CC=CC=C1S VMKYTRPNOVFCGZ-UHFFFAOYSA-N 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000005526 alkyl sulfate group Chemical group 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 125000006239 protecting group Chemical group 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- UJJDEOLXODWCGK-UHFFFAOYSA-N tert-butyl carbonochloridate Chemical compound CC(C)(C)OC(Cl)=O UJJDEOLXODWCGK-UHFFFAOYSA-N 0.000 description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical group OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 230000010933 acylation Effects 0.000 description 2
- 238000005917 acylation reaction Methods 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 229910001514 alkali metal chloride Inorganic materials 0.000 description 2
- 150000001540 azides Chemical class 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- IZUPBVBPLAPZRR-UHFFFAOYSA-N pentachlorophenol Chemical compound OC1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1Cl IZUPBVBPLAPZRR-UHFFFAOYSA-N 0.000 description 2
- 238000010647 peptide synthesis reaction Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- PKQZVASULXKBJV-UHFFFAOYSA-N (4-hydroxyphenyl)-dimethylsulfanium;methyl sulfate Chemical compound COS([O-])(=O)=O.C[S+](C)C1=CC=C(O)C=C1 PKQZVASULXKBJV-UHFFFAOYSA-N 0.000 description 1
- HSQFVBWFPBKHEB-UHFFFAOYSA-N 2,3,4-trichlorophenol Chemical compound OC1=CC=C(Cl)C(Cl)=C1Cl HSQFVBWFPBKHEB-UHFFFAOYSA-N 0.000 description 1
- BTJIUGUIPKRLHP-UHFFFAOYSA-N 4-nitrophenol Chemical compound OC1=CC=C([N+]([O-])=O)C=C1 BTJIUGUIPKRLHP-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
【発明の詳細な説明】 [産業上の利用分野コ 本発明はスルホニウム化合物の製法に関する。[Detailed description of the invention] [Industrial application fields] The present invention relates to a method for producing sulfonium compounds.
さらに詳細には、本発明は下記一般式(I)で示される
スルホニウム化合物の製造法に関する。More specifically, the present invention relates to a method for producing a sulfonium compound represented by the following general formula (I).
本発明のスルホニウム化合物は、水溶液中でアシル化作
用を示すので、ペプチド合成などの有機合成化学分野に
おいて保護基としてのt−ブチルオキシカルボニル(t
−BuO(:O−1以下Bocと略記する)基を導入す
るための試薬として有用である。The sulfonium compound of the present invention exhibits an acylation effect in an aqueous solution, so it is used as a protecting group in the field of organic synthetic chemistry such as peptide synthesis.
It is useful as a reagent for introducing a -BuO (:O-1 hereinafter abbreviated as Boc) group.
従来、Boc基はペプチド合成の際のアミノ末端保護基
として広く用いられている。これらの保護基を導入する
ための試薬としては、たとえば、t−ブチルオキシカル
ボニルクロリド(Boc−CA )などのハロゲン化物
または対応するアジドを挙げることができるが、ハロゲ
ン化物は不安定で保存が困難であり、またアジドは爆発
の危険がある。Conventionally, the Boc group has been widely used as an amino-terminal protecting group during peptide synthesis. Reagents for introducing these protecting groups include, for example, halides such as t-butyloxycarbonyl chloride (Boc-CA) or corresponding azides, but halides are unstable and difficult to store. Also, azide is an explosive hazard.
このような問題を解決するために、Boc化においては
、たとえば、p−ニトロフェノール、2.4.5トリク
ロロフエノール、ペンタクロロフェノール等との混合カ
ルボナートが用いられている。しかし、これらの混合カ
ルボナート型アシル化剤においては、試薬自体に水溶性
あるいは親水性がないため、水溶液中で反応を行う場合
、水と相溶性のある有機溶剤に溶解させた後、水溶液中
の基質と反応を行わねばならない。また、これらの試薬
を用いてアミノ酸へBoc基を導入した場合は、導入後
に遊離するフェノール類が水溶性ではないために目的の
アシル化されたアミノ酸との分離が困難である。In order to solve such problems, in Boc formation, for example, a mixed carbonate with p-nitrophenol, 2.4.5 trichlorophenol, pentachlorophenol, etc. is used. However, these mixed carbonate-type acylating agents do not have water solubility or hydrophilicity in themselves, so when performing a reaction in an aqueous solution, they are dissolved in an organic solvent that is compatible with water, and then dissolved in an aqueous solution. A reaction must be carried out with the substrate. Furthermore, when a Boc group is introduced into an amino acid using these reagents, the phenols liberated after introduction are not water-soluble, making it difficult to separate them from the desired acylated amino acid.
本発明者らは、前述のような問題点を解決するために鋭
意検討を行った結果、一般式(I)で表されるスルホニ
ウム化合物が有効なりoc化剤として作用し、かつ水溶
性であることを見い出すと共に、本発明のスルホニウム
化合物の有利な合成法を併せて見い出し、本発明を完成
させるに至った。The present inventors conducted intensive studies to solve the above-mentioned problems, and found that the sulfonium compound represented by the general formula (I) effectively acts as an oxidizing agent and is water-soluble. In addition to discovering this, they also discovered an advantageous method for synthesizing the sulfonium compound of the present invention, leading to the completion of the present invention.
すなわち、本発明は下記一般式(I)で示されるスルホ
ニウム化合物の製造法に関する。That is, the present invention relates to a method for producing a sulfonium compound represented by the following general formula (I).
(上記一般式においてt−Buはt−ブチル基である。(In the above general formula, t-Bu is a t-butyl group.
R’およびR2は互いに同一または互いに異なるアルキ
ル基である。Xは水素原子、ハロゲン原子またはアルキ
ル基のいずれかである。Y−はハロゲン陰イオン、過塩
素酸根、アルキル硫酸根、硫酸水素根またはp−)ルエ
ンスルホン酸根のいずれかである。)
上記一般式(I)で表される本発明のスルホニウム化合
物は、下記の一般式(n)で表される1−ブチルオキシ
カルボニルハロゲン化物と、一般式(IIr)で表され
るp−ジアルキルスルホニオフェノール類とをアルカリ
金属炭酸塩の存在下に反応させることによって得られる
。R' and R2 are the same or different alkyl groups. X is a hydrogen atom, a halogen atom or an alkyl group. Y- is either a halogen anion, a perchlorate group, an alkyl sulfate group, a hydrogen sulfate group, or a p-)luenesulfonate group. ) The sulfonium compound of the present invention represented by the above general formula (I) comprises a 1-butyloxycarbonyl halide represented by the following general formula (n) and p-dialkyl represented by the general formula (IIr). It is obtained by reacting sulfoniophenols with an alkali metal carbonate.
一般式(n ) : t−BuOCO−Ha I(
一般式(II)および(III)において、t−Buは
tブチル基を、また、一般式(II)においてHalは
ハロゲン原子を示し、R’、 R2,およびX、 Y−
は一般式(I)における原子または原子団と同一のもの
を示す。)
一般式(I)および(III)におけるアルキル基R’
およびR2は炭素数1〜4の低級アルキル基が好ましく
、メチル基が特に好ましい。General formula (n): t-BuOCO-Ha I (
In general formulas (II) and (III), t-Bu represents a t-butyl group, and in general formula (II), Hal represents a halogen atom, R', R2, and X, Y-
represents the same atom or atomic group as in general formula (I). ) Alkyl group R' in general formulas (I) and (III)
and R2 is preferably a lower alkyl group having 1 to 4 carbon atoms, particularly preferably a methyl group.
上記一般式(I)および(III)における置換基Xは
水素原子が好ましいが、一般式(I)で表される目的化
合物の溶解性およびアシル化反応性などにより適宜選択
される。Xがアルキル基である場合には炭素数1〜4の
低級アルキル基が好ましG)。また一般式(I)および
(III)における陰イオンY−は一般式(I)で表わ
される目的化合物の水溶性の面からはアルキル硫酸根ま
たは硫酸水素根が好ましく、アルキル硫酸根の中ではメ
チル硫酸根が特に好ましい。The substituent X in the above general formulas (I) and (III) is preferably a hydrogen atom, but is appropriately selected depending on the solubility and acylation reactivity of the target compound represented by the general formula (I). When X is an alkyl group, a lower alkyl group having 1 to 4 carbon atoms is preferable (G). Further, the anion Y- in general formulas (I) and (III) is preferably an alkyl sulfate group or a hydrogen sulfate group from the viewpoint of water solubility of the target compound represented by general formula (I), and among the alkyl sulfate groups, methyl Sulfate radicals are particularly preferred.
また、一般式(n)のハロゲン原子はt−ブチルオキシ
カルボニルハロゲン化物の安定性により適宜選択される
が、塩素、フッ素が好ましい。Further, the halogen atom in general formula (n) is appropriately selected depending on the stability of the t-butyloxycarbonyl halide, but chlorine and fluorine are preferable.
本発明の製造法の特徴は、塩基としてアルカリ金属炭酸
塩を用いることである。本発明に用いられるBoc−)
1a 1は不安定で、目的物(I)の収率が比較的低い
ことが多いが、そのような低収率の場合でも、塩基とし
てアルカリ金属炭酸塩を用いる本発明の場合は、反応終
了後に生成した塩の分離が完全に行われるので、目的物
(I)の単離が極めて容易であり、純度の高いものが得
られる。A feature of the production method of the present invention is that an alkali metal carbonate is used as the base. Boc-) used in the present invention
1a 1 is unstable and the yield of the target compound (I) is often relatively low, but even in such a low yield case, in the case of the present invention using an alkali metal carbonate as a base, the reaction is completed. Since the salt produced later is completely separated, the isolation of the target compound (I) is extremely easy, and a product of high purity can be obtained.
一方、本発明と同様な反応に従来塩基として用いられて
いるトリエチルアミンのような第三級アミンでは、その
ハロゲン化水素酸塩の溶解性が高いので反応混合物から
の分離が容易でなく、目的物(I)の単離が極めて困難
である。On the other hand, in the case of tertiary amines such as triethylamine, which have conventionally been used as bases in reactions similar to those of the present invention, their hydrohalide salts have high solubility, making it difficult to separate them from the reaction mixture. Isolation of (I) is extremely difficult.
本発明に用いるBoc−Ha 1の使用量は、一般式(
■)で表されるp−ジアルキルスルホニオフエノルに対
して1.0〜2.0倍モルが用いられる。The amount of Boc-Ha 1 used in the present invention is determined by the general formula (
1.0 to 2.0 times the molar amount of p-dialkylsulfoniophenol represented by (2) is used.
アルカリ金属炭酸塩としては、炭酸リチウム、炭酸ナト
リウム、炭酸カリウム、炭酸ルビジウムおよび炭酸セシ
ウムなどが用いられる。As the alkali metal carbonate, lithium carbonate, sodium carbonate, potassium carbonate, rubidium carbonate, cesium carbonate, etc. are used.
これらのアルカリ金属炭酸塩は無水物であることが好ま
しく、微粉末状のものが好適である。These alkali metal carbonates are preferably anhydrous, and preferably in the form of fine powder.
無水炭酸カリウムは好ましいアルカリ金属炭酸塩の一つ
である。使用される炭酸塩の量は、一般式(III)で
表されるp−ジアルキルスルホニオフェノールに対して
0.5〜50倍モルであり、好ましくは2〜20倍モル
である。Anhydrous potassium carbonate is one of the preferred alkali metal carbonates. The amount of carbonate used is 0.5 to 50 times, preferably 2 to 20 times, by mole relative to p-dialkylsulfoniophenol represented by general formula (III).
本発明のスルホニウム化合物の製造法においては、上記
したように一般式(III)で表されるスルホニオフェ
ノール類と、一般式(II)で表されるt−ブチルオキ
シカルボニルハロゲン化物を反応させる。反応は、溶媒
に溶かしたスルホニオフェノール類にアルカリ金属炭酸
塩を加え、この混合物に[−ブチルオキシカルボニルハ
ロゲン化物を添加することによるのが一般的である。In the method for producing a sulfonium compound of the present invention, as described above, a sulfoniophenol represented by the general formula (III) and a t-butyloxycarbonyl halide represented by the general formula (II) are reacted. The reaction is generally carried out by adding an alkali metal carbonate to a sulfoniophenol dissolved in a solvent, and adding [-butyloxycarbonyl halide] to this mixture.
この反応に用いる溶媒としては、原料であるスルホニオ
フェノール類をある程度溶解させるものが好ましい。こ
のような溶媒としては、たとえばアセトニトリル、N、
N−ジメチルホルムアミドなどの非プロトン性極性溶媒
、エーテル、テトラヒドロフラン等のエーテル類、ジク
ロロメタンなどのハロゲン化炭化水素などが挙げられる
。これらの溶媒のうち、アセトニトリル、N、N−ジメ
チルホルムアミドは特に好適な溶媒の一つである。溶媒
の債は少な過ぎると攪拌が困難になり好ましくないが、
多過ぎると反応速度が遅くなる。好ましい溶媒量として
は一般式(I)で表されるスルホニオフェノール類1モ
ルに対して0.5〜101、特に好ましくは3〜81で
ある。 反応温度はあまり低温であると反応が遅く、ま
たあまり高温であると反応する前にt−ブチルオキシカ
ルボニルクロリドが分解してしまう危険性があるので、
通常−80℃〜+10℃が好ましく、−30〜+5℃が
特に好ましい。The solvent used in this reaction is preferably one that can dissolve the raw material sulfoniophenols to some extent. Examples of such solvents include acetonitrile, N,
Examples include aprotic polar solvents such as N-dimethylformamide, ethers, ethers such as tetrahydrofuran, and halogenated hydrocarbons such as dichloromethane. Among these solvents, acetonitrile and N,N-dimethylformamide are particularly suitable solvents. If the amount of solvent is too small, stirring becomes difficult, which is undesirable.
If it is too large, the reaction rate will be slow. The preferred amount of solvent is 0.5 to 101, particularly preferably 3 to 81, per mole of the sulfoniophenol represented by general formula (I). If the reaction temperature is too low, the reaction will be slow, and if it is too high, there is a risk that t-butyloxycarbonyl chloride will decompose before the reaction.
Usually -80°C to +10°C is preferred, and -30°C to +5°C is particularly preferred.
反応時間は反応温度に依存するが、通常1〜20時間が
適当である。Although the reaction time depends on the reaction temperature, 1 to 20 hours is usually appropriate.
反応終了後、反応液から過剰のアルカリ金属炭酸塩なら
びに生成したアルカリ金属炭酸水素塩およびアルカリ金
属塩化物を濾別した後、濃縮し、クロロホルムを加え析
出する不純物を除いた後、ジエチルエーテル等の貧溶媒
を加えることによって本発明の目的化合物であるスルホ
ニウム化合物が結晶として得られる。After the reaction is completed, excess alkali metal carbonate, alkali metal hydrogen carbonate, and alkali metal chloride are filtered from the reaction solution, concentrated, and chloroform is added to remove precipitated impurities. Diethyl ether, etc. By adding a poor solvent, the sulfonium compound, which is the target compound of the present invention, is obtained as a crystal.
[実施例] 以下、実施例にて本発明を具体的に説明する。[Example] Hereinafter, the present invention will be specifically explained with reference to Examples.
実施例 1
反応容器として、底部に吸引濾過ができるようにグラス
フィルターと活栓を付け、冷却ができるようにジャケッ
トを付けたセパラブルフラスコを用いた。このフラスコ
にt−ブチルアルコール7.41g (0,1mol>
、乾爆エーテル200m1.を入れ一15℃に冷却し
た後、ホスゲン12.4 ml、(−70℃で剣客、0
、2mol)を導入した。その後ピリジン7.91g
(0,1mol)を501nlのエーテルで希釈した溶
液を攪拌しながら一15℃で30分かけて滴下した。?
a下が終了した後、反応温度を一10℃に上げて2時間
攪拌した。(この反応液をAとする)
これとは別に、p−ジメチルスルホニオフェノル・メチ
ル硫酸塩10.64g (0,04mol)を乾繰アセ
トニl−IJル200m1に懸濁させ、これに無水炭酸
カリウム粉末55.28g (0,4mol)を加え、
室温で2時間攪拌した後水冷した。(この反応液をBと
する)Aの溶液から過剰のホスゲンとエーテルとを、混
合物として計100rrL1.を一15℃以下で減圧留
去してt−ブチルオキシカルボニルクロリドを含む溶液
を得、この温度のままグラスフィルターで濾過しつつ、
Bの混合物に滴下した。滴下に要した時間は30分であ
った。Example 1 A separable flask equipped with a glass filter and a stopcock at the bottom to enable suction filtration and a jacket to enable cooling was used as a reaction vessel. 7.41 g (0.1 mol) of t-butyl alcohol was added to this flask.
, dry blast ether 200ml1. After cooling to -15℃, add 12.4 ml of phosgene, (swordsman at -70℃, 0
, 2 mol) was introduced. Then 7.91g of pyridine
A solution prepared by diluting (0.1 mol) with 501 nl of ether was added dropwise at -15° C. over 30 minutes with stirring. ?
After completion of step A, the reaction temperature was raised to -10°C and stirred for 2 hours. (This reaction solution is referred to as A.) Separately, 10.64 g (0.04 mol) of p-dimethylsulfoniophenol methyl sulfate was suspended in 200 ml of dry acetonyl-IJ, and anhydrous Add 55.28g (0.4mol) of potassium carbonate powder,
After stirring at room temperature for 2 hours, the mixture was cooled with water. (This reaction solution is referred to as B) From the solution of A, excess phosgene and ether were added as a mixture to a total of 100rrL1. was distilled off under reduced pressure at -15°C or lower to obtain a solution containing t-butyloxycarbonyl chloride, and while maintaining this temperature, filtering through a glass filter,
B was added dropwise to the mixture. The time required for dropping was 30 minutes.
この反応液を0℃で、2時間攪拌した後、−夜放置し、
反応液から析出した白色固体を濾別した後、エバポレー
ターで濾液を濃縮し、クロロホルム100rnlを加え
3時間放置し、この溶液にジエチルエーテル2QOdを
加え生成物である目的のスルホニウム化合物、t−ブチ
ル(p−ジメチルスルホニオフェノール)カルボナート
・メチル硫酸塩を結晶化させた。This reaction solution was stirred at 0°C for 2 hours, and then left overnight.
After filtering out the white solid precipitated from the reaction solution, the filtrate was concentrated using an evaporator, 100 rnl of chloroform was added and left to stand for 3 hours, and 2QOd of diethyl ether was added to the solution to obtain the desired sulfonium compound, t-butyl ( p-Dimethylsulfoniophenol) carbonate methyl sulfate was crystallized.
牧童5.75g (15,68mmol、 39.2%
)m、P、 : 118〜121t (dec、)’
H−NMRδ=1.54 (9H,s、 t−Bu)(
CDCj73) 3.43 (6H,s、 ”SM
e)3.66 (3tl、 s、 MeSO4−)7.
39 (2tl、 d、 J=10Hz、 Ph)8.
17 (2H,d、 J=10Hz、 Ph)IR(K
Br) 1760cm−’ (υc=0)。Makidou 5.75g (15.68mmol, 39.2%
)m, P, : 118~121t (dec,)'
H-NMRδ=1.54 (9H,s, t-Bu)(
CDCj73) 3.43 (6H,s, ”SM
e) 3.66 (3tl, s, MeSO4-)7.
39 (2tl, d, J=10Hz, Ph)8.
17 (2H, d, J=10Hz, Ph)IR(K
Br) 1760 cm-' (υc=0).
1245cm−’ 1230c+n−’1160cm
−’ 101101O’実施例 2
実施例1において、炭酸カリウムの代わりに炭酸ナトリ
ウムを42.40g (0,4mol)を用いた以外は
実施例1と同様な操作を行い、目的とするスルホニウム
化合物、t−ブチル(p−ジメチルスルホニオフェノー
ル)カルボナート・メチル硫酸塩を得た。収率: 1.
85g (5,05mmol、 12.6%)実施例
3
実施例1における溶媒アセトニトリルの代わりにN、N
−ジメチルホルムアミド200dを用いた以外は実施例
1と同様に操作を行い、目的のスルホニウム化合物、t
−ブチル(p−ジメチルスルホニオフェノール)カルボ
ナート・メチル硫酸塩を得た。収率: 6.81g (
18,58mmol、 46.5%)[発明の効果]
本発明の方法によれば、アルカリ金属炭酸塩を塩基とし
て用いることにより殆ど副反応を起こさせることなく目
的物とするスルホニウム化合物を得ることができる。そ
の上未反応のアルカリ金属炭酸塩ならびに生成するアル
カリ金属炭酸水素塩およびアルカリ金属塩化物は容易に
除去することができ、目的物のスルホニウム化合物の単
離、精製が容易であり、高純度のスルホニウム化合物を
得ることができる。従って本発明の方法は一般式(I)
で表されるスルホニウム化合物の製造方法として極めて
有用な方法である。1245cm-'1230c+n-'1160cm
-'101101O' Example 2 The same operation as in Example 1 was performed except that 42.40 g (0.4 mol) of sodium carbonate was used instead of potassium carbonate in Example 1, and the target sulfonium compound, t -Butyl (p-dimethylsulfoniophenol) carbonate methyl sulfate was obtained. Yield: 1.
85g (5.05mmol, 12.6%) Example
3 Instead of the solvent acetonitrile in Example 1, N, N
-Operating in the same manner as in Example 1 except for using 200d of dimethylformamide, the desired sulfonium compound, t
-Butyl (p-dimethylsulfoniophenol) carbonate methyl sulfate was obtained. Yield: 6.81g (
18.58 mmol, 46.5%) [Effects of the Invention] According to the method of the present invention, it is possible to obtain the target sulfonium compound with almost no side reactions by using an alkali metal carbonate as a base. can. Moreover, unreacted alkali metal carbonate and generated alkali metal hydrogen carbonate and alkali metal chloride can be easily removed, making it easy to isolate and purify the target sulfonium compound. compound can be obtained. Therefore, the method of the present invention is based on the general formula (I)
This is an extremely useful method for producing the sulfonium compound represented by
また、本発明のスルホニウム化合物はアミノ酸をアシル
化する際、有機溶媒を必須とせず、極めて温和な条件で
アシル化されたアミノ酸を与えることができ、かつ副生
成物はすべて水溶性であるため生成したアシル化アミノ
酸の単離、生成が容易であり、純度の高いものが得られ
る等優れた利点がある。In addition, when acylating amino acids, the sulfonium compounds of the present invention do not require an organic solvent and can provide acylated amino acids under extremely mild conditions, and all by-products are water-soluble. It has excellent advantages such as easy isolation and production of acylated amino acids and the ability to obtain highly pure acylated amino acids.
特許出願人 三菱瓦斯化学株式会社 代理人 弁理士 手掘 貞文Patent applicant: Mitsubishi Gas Chemical Co., Ltd. Agent: Patent attorney: Sadafumi Tebori
Claims (1)
ルハロゲン化物、下記一般式(III)で表されるp−ジ
アルキルスルホニオフェノール類とをアルカリ金属炭酸
塩の存在下に反応させることを特徴とする、一般式(
I )で表されるスルホニウム化合物の製造法。 一般式( I ):▲数式、化学式、表等があります▼ 一般式(II):t−BuOCO−Hal 一般式(III):▲数式、化学式、表等があります▼ (上記一般式( I )および(II)においてt−Buは
t−ブチル基であり、一般式(II)においてHalはハ
ロゲン原子を示す。一般式( I )および(III)におい
て、R^1およびR^2は互いに同一または互いに異な
るアルキル基である。Xは水素原子、ハロゲン原子また
はアルキル基のいずれかである。Y^−はハロゲン陰イ
オン、過塩素酸根、アルキル硫酸根、硫酸水素根または
p−トルエンスルホン酸根のいずれかである。)[Scope of Claims] A t-butyloxycarbonyl halide represented by the following general formula (II) and a p-dialkylsulfoniophenol represented by the following general formula (III) in the presence of an alkali metal carbonate. The general formula (
A method for producing a sulfonium compound represented by I). General formula (I): ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ General formula (II): t-BuOCO-Hal General formula (III): ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (General formula (I) and (II), t-Bu is a t-butyl group, and in general formula (II), Hal represents a halogen atom. In general formulas (I) and (III), R^1 and R^2 are the same as each other. or alkyl groups different from each other. Either.)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63311993A JPH02157261A (en) | 1988-12-12 | 1988-12-12 | Production of sulfonium compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63311993A JPH02157261A (en) | 1988-12-12 | 1988-12-12 | Production of sulfonium compound |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02157261A true JPH02157261A (en) | 1990-06-18 |
Family
ID=18023913
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63311993A Pending JPH02157261A (en) | 1988-12-12 | 1988-12-12 | Production of sulfonium compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02157261A (en) |
-
1988
- 1988-12-12 JP JP63311993A patent/JPH02157261A/en active Pending
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