JPH02141731A - Automatic exposure controller - Google Patents

Automatic exposure controller

Info

Publication number
JPH02141731A
JPH02141731A JP63294693A JP29469388A JPH02141731A JP H02141731 A JPH02141731 A JP H02141731A JP 63294693 A JP63294693 A JP 63294693A JP 29469388 A JP29469388 A JP 29469388A JP H02141731 A JPH02141731 A JP H02141731A
Authority
JP
Japan
Prior art keywords
screen
frame
photometric
exposure
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63294693A
Other languages
Japanese (ja)
Other versions
JP2568161B2 (en
Inventor
Hideo Honma
英雄 本間
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP63294693A priority Critical patent/JP2568161B2/en
Publication of JPH02141731A publication Critical patent/JPH02141731A/en
Application granted granted Critical
Publication of JP2568161B2 publication Critical patent/JP2568161B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To perform appropriate exposure to various object patterns by deciding a luminance pattern at the time when the position of a detected area is changed on a screen, setting a photometric area at a position fitted for the luminance pattern and performing the control of exposure. CONSTITUTION:A signal level detection circuit 113 detects the mean value of signal levels on the inside and outside of detection frame 202 and the detected value is transmitted to a microcomputer 115, which detects a photometric mode and decides the position of a photometric frame based on the data. The detection frame 202 is subjected to wobbling up and down on the entire screen 201 based on a detection frame signal 110. The microcomputer 115 detects the luminance pattern and performs the decision of the photometric mode (to decide what position in the screen the photometric frame is set) and calculates appropriate exposure correction quantity from the signal levels on the inside/ outside of the detection frame. An exposure correction circuit 401 performs the control of exposure through an exposure correction signal 402 according to the calculated quantity. Thus, the appropriate control of exposure corresponding to the various object patterns is accomplished.

Description

【発明の詳細な説明】 (発明の利用分野) 本発明は、ビデオカメラ等に配置される自動露光制御装
置の改良に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Field of Application of the Invention) The present invention relates to an improvement in an automatic exposure control device disposed in a video camera or the like.

(発明の背景) ビデオカメラにおける測光方式には、主として平均測光
1画面特定部の重点測光、信号レベルのピーク値を一定
にするピーク測光及びこれらの組合せがある。それぞれ
一長一短があるが、一般的な実写においては、画面特定
部を枠で指定し、その部分を重点測光する枠重点測光方
式が、適用範囲が広い事が経験的に判っている。
(Background of the Invention) Photometry methods for video cameras mainly include weighted photometry using an average photometry one-screen specific section, peak photometry that makes the peak value of the signal level constant, and combinations thereof. Each method has its advantages and disadvantages, but experience has shown that in general live-action photography, the frame-weighted metering method, in which a specific part of the screen is designated by a frame and weighted metering is applied to that part, has a wide range of applications.

しかしながら、従来の枠重点測光方式は、枠位置が画面
内の所定位置に固定されているため、被写体或は被写体
と同程度の輝度部分がその枠内に存在する場合にしか適
正露光とならず、また、枠内に背景等の高輝度部が入っ
た場合、被写体に黒つぶれが生じやすかった。
However, in the conventional frame-weighted metering method, the frame position is fixed at a predetermined position within the screen, so proper exposure can only be achieved when the subject or a part of the same brightness as the subject exists within the frame. Furthermore, when a high-brightness area such as the background was included in the frame, the subject was likely to have blackout.

例えば、第6図(1)の例は、一般的な屋外実写におい
て、画面上部に空が入った場合をモデル化したものであ
り、301は全画面、302は重点測光を行う測光枠、
303は空(高輝度背景)。
For example, the example in FIG. 6 (1) models the case where the sky appears at the top of the screen in general outdoor live photography, where 301 is the entire screen, 302 is the metering frame for weighted metering,
303 is the sky (high brightness background).

304は被写体部である。304 is a subject portion.

このような画面を想定した場合、測光枠302を画面中
央部よりやや下位置に設定する事により、カメラを外少
チルトさせても被写体部304を測光枠302内でとら
える事ができ、適正露光が得られる。
If such a screen is assumed, by setting the metering frame 302 slightly below the center of the screen, the subject 304 can be captured within the metering frame 302 even if the camera is slightly tilted outward, and proper exposure can be achieved. is obtained.

ところが、第6図(2)に示すように、被写体部305
が画面の上側、高輝度部306が下側になるような場合
、測光枠302には高輝度部306が入りやすく、その
結果被写体部305は黒つぶれを生じやすい、このよう
な撮影シーンは、被写体部305として樹木等、高輝度
部306とじて白いタイルやコンクリート雪面を想定し
た場合である。
However, as shown in FIG. 6(2), the subject portion 305
When the brightness area 306 is at the top of the screen and the high-brightness area 306 is at the bottom of the screen, the high-brightness area 306 tends to fit into the metering frame 302, and as a result, the subject area 305 tends to suffer from blackout. In such a shooting scene, This is a case in which the subject portion 305 is assumed to be a tree, and the high-brightness portion 306 is assumed to be a white tile or concrete snow surface.

第6図(3)は、結婚式等で、暗い室内で強くライトを
当てられている黒服を着た人を想定したものであり、3
07は背景、308は体、3o9は顔である。このよう
な場合、測光枠302は、人の眼部に入るため、顔30
9は白とびを生じやすくなる。
Figure 6 (3) assumes a person wearing black clothes who is strongly illuminated in a dark room at a wedding, etc.
07 is the background, 308 is the body, and 3o9 is the face. In such a case, the photometry frame 302 enters the human eye area, so the face 30
9 tends to cause overexposure.

以上のように、一般的な実写においては、画面の上下方
向の輝度パターン変化を生じる事がよくあるが、従来の
固定枠重点測光方式では、その−部にしか適応できず、
適正な露光制御ができなかった。
As mentioned above, in general live-action photography, brightness pattern changes in the vertical direction of the screen often occur, but the conventional fixed frame weighted metering method can only adapt to the negative part of the screen.
Appropriate exposure control was not possible.

(発明の目的) 本発明の目的は、上述した問題点を解決し、背景との輝
度差が大きな被写体、画面内に占める割合が被写体とは
異なる輝度をもつ背景の方が大きくなる撮影シーン等、
様々な被写体パターンに対して適正露光を与えることの
できる自動露光制御装置を提供することである。
(Object of the Invention) The object of the present invention is to solve the above-mentioned problems, and to solve the problems described above, such as shooting scenes where a subject has a large difference in brightness from the background, and a background having a brightness different from the subject occupies a larger proportion of the screen. ,
An object of the present invention is to provide an automatic exposure control device capable of giving appropriate exposure to various subject patterns.

(発明の特徴) 上記目的を達成するために、請求項1記載の本発明は、
画面内における検出領域の位置を変化させる可変手段と
、該可変手段により変化させられた検出領域の内外で得
られる映像信号中の輝度成分の差情報を算出し、該算出
した前記検出領域の異なる位置におけるそれぞれの差情
報より画面内の輝度パターンを判定する判定手段と、該
判定手段の判定結果に応じて測光領域の画面内での位置
を設定する測光領域位置設定手段とを設け、以て、画面
内において検出領域の位置を変化させてその時の輝度パ
ターンを判定し、該輝度パターン適した位置に測光領域
を設定して露光制御を行わせるようにしたことを特徴と
する。
(Features of the invention) In order to achieve the above object, the present invention according to claim 1 includes:
A variable means for changing the position of a detection area within a screen, and calculating difference information of luminance components in a video signal obtained inside and outside the detection area changed by the variable means, A determination means for determining a brightness pattern within the screen from the respective difference information in the position, and a photometry area position setting means for setting the position of the photometry area within the screen according to the determination result of the determination means, The present invention is characterized in that the brightness pattern at that time is determined by changing the position of the detection area within the screen, and the photometry area is set at a position suitable for the brightness pattern to perform exposure control.

また、請求項2記載の本発明は、画面内に指定される測
光領域にて得られる映像信号に基づいて露光制御を行う
自動露光制御装置において、画面内における検出領域の
位置を変化させる可変手段と、該可変手段により変化さ
せられた検出領域の内外で得られる映像信号中の輝度成
分の差情報を算出し、該算出した前記検出領域の異なる
位置におけるそれぞれの差情報より画面内の輝度パター
ンを判定する判定手段と、該判定手段の判定結果に応じ
て前記測光領域にて得られる映像信号に補正を加える露
光補正手段とを設け、以て、画面内において検出領域の
位置を変化させてその時の輝度パターンを判定し、該輝
度パターンと画面内における測光領域の位置とに応じて
露光補正量を算出して露光制御を行うようにしたことを
特徴とする。
The present invention as set forth in claim 2 also provides a variable means for changing the position of a detection area within the screen in an automatic exposure control device that performs exposure control based on a video signal obtained in a photometric area designated within the screen. Then, the difference information of the luminance components in the video signal obtained inside and outside the detection area changed by the variable means is calculated, and the luminance pattern in the screen is determined from the calculated difference information at different positions of the detection area. and an exposure correction means for correcting the video signal obtained in the photometric area according to the judgment result of the judgment means, thereby changing the position of the detection area within the screen. The present invention is characterized in that the brightness pattern at that time is determined, and the exposure correction amount is calculated according to the brightness pattern and the position of the photometric area within the screen to perform exposure control.

(発明の実施例) 以下、本発明を図示の実施例に基づいて詳細に説明する
(Embodiments of the Invention) Hereinafter, the present invention will be described in detail based on illustrated embodiments.

第1図は本発明の一実施例を示すものであり、レンズ1
01.絞り102を通った光学情報はCCD103上に
結像し、ここで電気信号に変換された後、バッファ10
4を通してAGC105及び絞り測光回路107aに出
力される。絞り測光回路107aの出力は絞り駆動回路
108へ送られ、絞り102を制御する為の信号として
用いられる、一方AGC105の出力は信号処理回路1
06及びAGC測光回路107bに送られる。該出力を
受けるAGC測光回路107bは前記AGC105のゲ
インを制御する働きを持つ。又前記信号処理回路106
の出力は信号レベル検出回路113及び後段の信号処理
回路(図示せず)へ送られる。前記測光回路107a、
107bは、枠信号発生回路109(詳細は後述)で発
生する測光枠信号111を入力し、その部分を重点測光
するものである。
FIG. 1 shows an embodiment of the present invention, in which a lens 1
01. The optical information passing through the aperture 102 is imaged on the CCD 103, where it is converted into an electrical signal, and then sent to the buffer 10.
4 to the AGC 105 and the aperture photometry circuit 107a. The output of the aperture photometry circuit 107a is sent to the aperture drive circuit 108 and used as a signal to control the aperture 102, while the output of the AGC 105 is sent to the signal processing circuit 1.
06 and the AGC photometry circuit 107b. The AGC photometry circuit 107b receiving the output has the function of controlling the gain of the AGC 105. Further, the signal processing circuit 106
The output is sent to a signal level detection circuit 113 and a subsequent signal processing circuit (not shown). the photometric circuit 107a,
Reference numeral 107b inputs the photometry frame signal 111 generated by the frame signal generation circuit 109 (details will be described later), and subjects that portion to weighted photometry.

以上が映像信号レベル制御系の主要構成例である。The above is an example of the main configuration of the video signal level control system.

次に、輝度パターンの検出及び測光回路制御について述
べる。
Next, brightness pattern detection and photometry circuit control will be described.

枠信号発生回路109は同期信号112を人力し、検出
枠信号110.測光枠信号111を発生させる。信号レ
ベル検出回路113は検出枠202の内外の信号レベル
平均値を検出する。この検出値はA/Dコンバータ11
4でディジタル信号に変換され、マイコン115へ送ら
れる。マイコン115は該データを基に、測光モード、
検出及び測光枠位置を判定する。
The frame signal generation circuit 109 manually generates the synchronization signal 112 and generates the detection frame signal 110. A photometric frame signal 111 is generated. The signal level detection circuit 113 detects the average value of signal levels inside and outside the detection frame 202. This detected value is the A/D converter 11
4, it is converted into a digital signal and sent to the microcomputer 115. Based on the data, the microcomputer 115 sets the photometry mode,
Determine the detection and photometry frame position.

検出枠202は前記検出枠信号110に基づいて、第2
図(1) (2)に示すように、全画面201内を上下
にウオブリングさせられ、マイコン115は枠内外の信
号レベル差から、前述の第6図(1)〜(3)に示した
ような輝度パターン例を推定し、測光モードを判定する
。その判定結果例を第3図(1)〜(3)に示しており
、図中205は測光枠である。この測光枠205の判定
結果位置は測光枠信号111により測光回路107a、
107bに伝えられ、この枠内で重点測光が行われる。
The detection frame 202 is a second detection frame based on the detection frame signal 110.
As shown in Figures (1) and (2), the entire screen 201 is caused to wobble vertically, and the microcomputer 115 detects the signal level difference between the inside and outside of the frame as shown in Figures 6 (1) to (3) above. A brightness pattern example is estimated and the photometry mode is determined. Examples of the determination results are shown in FIGS. 3 (1) to (3), where 205 is a photometric frame. The determined position of the photometering frame 205 is determined by the photometering circuit 107a and the photometering frame signal 111.
107b, and weighted photometry is performed within this frame.

第3図(1)は第6図(1)と同様の輝度パターンであ
り、この場合測光枠205は画面下位置に設定される。
FIG. 3(1) is a brightness pattern similar to FIG. 6(1), and in this case, the photometry frame 205 is set at the bottom position of the screen.

第3図(2)は第6図(3)と、第3図(3)は第6図
(2)と同様の輝度パターンであり、これらの場合、測
光枠205は上位置に設定され、第3図(2)では頭部
分207の白とびを防止でき、第3図(3)では被写体
部209の黒つぶれを防止できる。
FIG. 3(2) is the same brightness pattern as FIG. 6(3), and FIG. 3(3) is the same brightness pattern as FIG. 6(2), and in these cases, the photometry frame 205 is set at the upper position, In FIG. 3(2), overexposure of the head portion 207 can be prevented, and in FIG. 3(3), underexposure of the subject portion 209 can be prevented.

このようなパターンの検出は、検出枠202内外の信号
レベル差を、第2図(1)の時ΔS下、第2図(2)の
時△S上とすると、第3図(1)の場合1ΔS下1〉1
ΔS上1、第3図(2)の場合1ΔS下1〈1ΔS上1
、第3図(3)の場合ΔS下1く1ΔS上1となり、差
の大きい方を主要被写体と判別して行っている。画面の
上側或は下側に設定するかは、ΔS上、ΔS下の符合を
みれば明らかである。
Detection of such a pattern can be done by setting the signal level difference between the inside and outside of the detection frame 202 to be below ΔS in FIG. 2 (1) and above ΔS in FIG. 2 (2), as shown in FIG. 3 (1). If 1ΔS lower 1>1
ΔS upper 1, in case of Fig. 3 (2) 1 ΔS lower 1 < 1 ΔS upper 1
, in the case of FIG. 3 (3), ΔS lower 1 × ΔS upper 1, and the one with the larger difference is determined to be the main subject. Whether it should be set at the top or bottom of the screen is clear by looking at the signs of ΔS above and ΔS below.

以上述べた測光枠205の位置、形状は必ずしも検出枠
202と一致する必要はない。
The position and shape of the photometry frame 205 described above do not necessarily have to match the detection frame 202.

第2図及び第3図の例は、測光枠205と検出枠202
は、別の枠信号に基づいて設定されるものであり、検出
枠202は、常時上下にウオブリングしている。しかし
、必ずしも測光枠205と検出枠202は分ける必要は
ない。その場合、測光枠信号111は、検出信号110
と同一となる。このように構成した場合の枠の動きを説
明する。
In the example of FIGS. 2 and 3, the photometric frame 205 and the detection frame 202
is set based on another frame signal, and the detection frame 202 is constantly wobbling up and down. However, the photometry frame 205 and the detection frame 202 do not necessarily need to be separated. In that case, the photometric frame signal 111 is the detection signal 110
is the same as The movement of the frame when configured in this way will be explained.

通常検出枠(=測光枠)は第2図(1) (2)に示す
ように上下にウオブリングしている。第3図(1)のパ
ターンを検出した場合、該枠を下位置に設定する。第3
図(2) (3)のパターン検出時には、該枠を上に設
定する。しかし、この位置に設定したままだと、画面が
変化して設定位置が逆となるべきパターンに変化しても
その事を判別できない。そこで、何フィールドかに1度
上記枠を設定位置とは上下逆位置に移動させ、輝度パタ
ーンの検出を行う。この周期は、輝度パターン変化に追
従する程度の周期であればよい。例えば、20〜30フ
イールド毎とする。この枠移動の瞬間、該枠は被写体部
を離れるが、この程度の周期であれば、測光回路の時定
数が極端に小さくない限り問題はない。
The normal detection frame (=photometering frame) wobbles vertically as shown in Fig. 2 (1) and (2). When the pattern shown in FIG. 3(1) is detected, the frame is set to the lower position. Third
When detecting the patterns shown in FIGS. (2) and (3), the frame is set upward. However, if it remains set at this position, even if the screen changes and the setting position changes to a pattern that should be reversed, it will not be possible to determine this. Therefore, the frame is moved upside down from the set position once every few fields, and the brightness pattern is detected. This cycle may be a cycle that follows the brightness pattern change. For example, every 20 to 30 fields. At the moment of this frame movement, the frame leaves the subject, but if the cycle is of this order, there is no problem as long as the time constant of the photometry circuit is not extremely small.

以上述べた実施例では、測光回路107a、10.7b
は枠重点測光方式であるとしたが、別の構成例を第4図
に示す。第1図と同一部分は同一符号を付しである。
In the embodiment described above, the photometric circuits 107a, 10.7b
Although the frame-weighted photometry method is used, another configuration example is shown in FIG. The same parts as in FIG. 1 are given the same reference numerals.

異なる点は、露光補正回路401を付加した事と、測光
枠信号111を、露光補正信号402としたところであ
る。測光回路107a、107bは、露光補正信号40
2に応じた分だけ、露光を補正する。これは、例えば第
5図に示すように、測光回路107a、107bを抵抗
501とキャパシタ502で平均測光回路構成にし、抵
抗503を介して露光補正信号402を入力して測光回
路出力をコントロールする事により実現できる。
The difference is that an exposure correction circuit 401 is added and the exposure correction signal 402 is used instead of the photometry frame signal 111. The photometry circuits 107a and 107b receive an exposure correction signal 40.
Correct the exposure by the amount corresponding to 2. For example, as shown in FIG. 5, the photometry circuits 107a and 107b are configured as an average photometry circuit with a resistor 501 and a capacitor 502, and the exposure correction signal 402 is input through a resistor 503 to control the output of the photometry circuit. This can be achieved by

マイコン115は、先の例で述べたように輝度パターン
を検出して測光モード判定(測光枠を画面内のどの位置
に設定するかの判定)を行うと共に、検出枠内外の信号
レベルから、適正露光補正量を計算する。露光補正回路
401は、それに応じて露光補正信号402を介して露
光制御を行う。
As described in the previous example, the microcomputer 115 detects the brightness pattern and determines the photometry mode (determines where on the screen the photometry frame should be set), and also determines the appropriate mode based on the signal levels inside and outside the detection frame. Calculate the exposure correction amount. The exposure correction circuit 401 performs exposure control via the exposure correction signal 402 accordingly.

以上により、第6図(1)〜(3)のような多様な輝度
パターン、つまりは被写体パターンに対応した適正露光
制御が可能となる。
As described above, it becomes possible to perform appropriate exposure control corresponding to various brightness patterns as shown in FIGS. 6(1) to (3), that is, subject patterns.

本実施例によれば、画面内に検出枠を設定し、該検出枠
を上下にウオブリングさせて輝度パターン検出を行い、
測光モード判定を行ってこの判定結果に基づいて比較的
大きな領域を持つ測光枠の位置設定、或は露光補正を行
って露光制御を行うようにしているので、従来の固定枠
重点測光では対応できなかった、背景との輝度差が大き
な被写体、画面内に占める割合が被写体とは異なる輝度
をもつ背景の方が大きくなる撮影シーン等、様々な被写
体パターンに対しても、適正露光制御が可能となる。
According to this embodiment, a detection frame is set within the screen, and the detection frame is wobbled up and down to detect a brightness pattern,
Since the metering mode is determined and the exposure is controlled by setting the position of a metering frame with a relatively large area based on the determination result or by performing exposure compensation, conventional fixed frame weighted metering cannot handle this. Appropriate exposure control is now possible for various subject patterns, such as subjects with a large difference in brightness from the background, and shooting scenes where the background has a brightness different from that of the subject and occupies a larger proportion of the screen. Become.

(発明と実施例の対応) 本実施例において、枠信号発生回路109が本発明の請
求項1.2記載の可変手段に、信号レンズ検出回路11
3、A/Dコンバータ114、マイコン115が請求項
1,2記載の判定手段に、又、枠信号発生回路109が
請求項1記載の測光領域位置設定手段に、露光補正回路
401が請求項2記載の露光補正手段に、それぞれ相当
する。
(Correspondence between the invention and the embodiments) In this embodiment, the frame signal generation circuit 109 is replaced by the signal lens detection circuit 11 as the variable means according to claim 1.2 of the present invention.
3. The A/D converter 114 and the microcomputer 115 are used as the determination means according to claims 1 and 2, the frame signal generation circuit 109 is used as the photometric area position setting means according to claim 1, and the exposure correction circuit 401 is used as the photometry area position setting means according to claim 2. Each corresponds to the exposure correction means described above.

(発明の効果) 以上説明したように、本発明によれば、画面内における
検出領域の位置を変化させる可変手段と、該可変手段に
より変化させられた検出領域の内外で得られる映像信号
中の輝度成分の差情報を算出し、該算出した前記検出領
域の異なる位置におけるそれぞれの差情報より画面内の
輝度パターンを判定する判定手段と、該判定手段の判定
結果に応じて測光領域の画面内での位置を設定する測光
領域位置設定手段とを設け、以て、画面内において検出
領域の位置を変化させてその時の輝度パターンを判定し
、該輝度パターン適した位置に測光領域を設定して露光
制御を行わせるようにし、また、判定手段の判定結果に
応じて前記測光領域にて得られる映像信号に補正を加え
る露光補正手段とを設け、以て、画面内において検出領
域の位置を変化させてその時の輝度パターンを判定し、
該輝度パターンと画面内における測光領域の位置とに応
じて露光補正量を算出して露光制御を行うようにしたか
ら、様々な被写体パターンに対して適正露光を与えるこ
とが可能となる。
(Effects of the Invention) As explained above, according to the present invention, there is provided a variable means for changing the position of a detection area within a screen, and a video signal obtained inside and outside the detection area changed by the variable means. a determination unit that calculates difference information of luminance components and determines a luminance pattern within the screen from the calculated difference information at different positions of the detection area; and a photometric area position setting means for setting the position of the detection area in the screen, thereby determining the brightness pattern at that time by changing the position of the detection area within the screen, and setting the photometric area at a position suitable for the brightness pattern. and an exposure correction means for correcting the video signal obtained in the photometric area according to the judgment result of the judgment means, thereby changing the position of the detection area within the screen. to determine the brightness pattern at that time,
Since the exposure control is performed by calculating the exposure correction amount according to the brightness pattern and the position of the photometric area within the screen, it is possible to provide appropriate exposure to various subject patterns.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を示すブロック図、第2図(
1) (2)は同じく輝度パターン検出用の枠の動作を
説明する図、第3図(1) (2) (3)は様々な輝
度パターンに対応して設定される測光枠位置を説明する
図、第4図は本発明の他の実施例の主要部分のブロック
図、第5図は第4図図示測光回路の内部構成例を示す回
路図、第6図(1) (2) (3)は様々な被写体パ
ターンに対する従来の測光枠位置を説明する図である。 107a、107b・・・・・・測光回路、109・・
・・・・枠信号発生回路、113・・・・・・信号レン
ズ検出回路、114・・・・・・A/Dコンバータ、1
15・・・・・・マイコン、202・・・・・・検出枠
、205・・・・・・測光枠、401・・・・・・露光
補正回路。
FIG. 1 is a block diagram showing one embodiment of the present invention, and FIG. 2 (
1) (2) are also diagrams explaining the operation of the frame for brightness pattern detection, and Figure 3 (1), (2), and (3) are diagrams explaining the photometry frame positions set corresponding to various brightness patterns. 4 is a block diagram of the main parts of another embodiment of the present invention, FIG. 5 is a circuit diagram showing an example of the internal configuration of the photometric circuit shown in FIG. 4, and FIG. 6 (1) (2) (3) ) is a diagram illustrating conventional photometry frame positions for various subject patterns. 107a, 107b...Photometering circuit, 109...
... Frame signal generation circuit, 113 ... Signal lens detection circuit, 114 ... A/D converter, 1
15... Microcomputer, 202... Detection frame, 205... Metering frame, 401... Exposure correction circuit.

Claims (2)

【特許請求の範囲】[Claims] (1)画面内に指定される測光領域にて得られる映像信
号に基づいて露光制御を行う自動露光制御装置において
、画面内における検出領域の位置を変化させる可変手段
と、該可変手段により変化させられた検出領域の内外で
得られる映像信号中の輝度成分の差情報を算出し、該算
出した前記検出領域の異なる位置におけるそれぞれの差
情報より画面内の輝度パターンを判定する判定手段と、
該判定手段の判定結果に応じて前記測光領域の画面内で
の位置を設定する測光領域位置設定手段とを設けたこと
を特徴とする自動露光制御装置。
(1) In an automatic exposure control device that performs exposure control based on a video signal obtained in a photometric area designated within a screen, a variable means for changing the position of a detection area within the screen, and a variable means for changing the position of a detection area within the screen; determining means for calculating difference information of brightness components in video signals obtained inside and outside the detected detection area, and determining a brightness pattern within the screen from the calculated difference information at different positions of the detection area;
An automatic exposure control device comprising: photometric area position setting means for setting the position of the photometric area within the screen according to the determination result of the determining means.
(2)画面内に指定される測光領域にて得られる映像信
号に基づいて露光制御を行う自動露光制御装置において
、画面内における検出領域の位置を変化させる可変手段
と、該可変手段により変化させられた検出領域の内外で
得られる映像信号中の輝度成分の差情報を算出し、該算
出した前記検出領域の異なる位置におけるそれぞれの差
情報より画面内の輝度パターンを判定する判定手段と、
該判定手段の判定結果に応じて前記測光領域にて得られ
る映像信号に補正を加える露光補正手段とを設けたこと
を特徴とする自動露光制御装置。
(2) In an automatic exposure control device that performs exposure control based on a video signal obtained in a photometric area designated within the screen, a variable means for changing the position of the detection area within the screen; determining means for calculating difference information of brightness components in video signals obtained inside and outside the detected detection area, and determining a brightness pattern within the screen from the calculated difference information at different positions of the detection area;
An automatic exposure control device comprising: exposure correction means for correcting the video signal obtained in the photometric area according to the determination result of the determination means.
JP63294693A 1988-11-24 1988-11-24 Automatic exposure control device Expired - Fee Related JP2568161B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63294693A JP2568161B2 (en) 1988-11-24 1988-11-24 Automatic exposure control device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63294693A JP2568161B2 (en) 1988-11-24 1988-11-24 Automatic exposure control device

Publications (2)

Publication Number Publication Date
JPH02141731A true JPH02141731A (en) 1990-05-31
JP2568161B2 JP2568161B2 (en) 1996-12-25

Family

ID=17811084

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63294693A Expired - Fee Related JP2568161B2 (en) 1988-11-24 1988-11-24 Automatic exposure control device

Country Status (1)

Country Link
JP (1) JP2568161B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04151130A (en) * 1990-10-15 1992-05-25 Canon Inc Electronic camera
WO2013094212A1 (en) * 2011-12-22 2013-06-27 パナソニック株式会社 Exposure control device, imaging device, image display device, and exposure control method
US8593522B2 (en) 2009-05-11 2013-11-26 Panasonic Corporation Digital camera, image processing apparatus, and image processing method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6258229A (en) * 1985-09-09 1987-03-13 Minolta Camera Co Ltd Separate photometry type camera

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6258229A (en) * 1985-09-09 1987-03-13 Minolta Camera Co Ltd Separate photometry type camera

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04151130A (en) * 1990-10-15 1992-05-25 Canon Inc Electronic camera
US8593522B2 (en) 2009-05-11 2013-11-26 Panasonic Corporation Digital camera, image processing apparatus, and image processing method
WO2013094212A1 (en) * 2011-12-22 2013-06-27 パナソニック株式会社 Exposure control device, imaging device, image display device, and exposure control method
US9456146B2 (en) 2011-12-22 2016-09-27 Panasonic Intellectual Property Management Co., Ltd. Exposure control device, imaging device, image display device, and exposure control method

Also Published As

Publication number Publication date
JP2568161B2 (en) 1996-12-25

Similar Documents

Publication Publication Date Title
US6570620B1 (en) Exposure control device
JP4040613B2 (en) Imaging device
JP3368041B2 (en) Imaging device
JP3510868B2 (en) Image synthesis device
JPH08340542A (en) Electronic still camera
JPH03204281A (en) Image pickup device
JP2009060471A (en) Imaging apparatus, imaging method and program
US6124891A (en) Exposure control device
JPH02141731A (en) Automatic exposure controller
JP3554069B2 (en) Imaging device
JP2817820B2 (en) Exposure control device for video camera
JPH06113195A (en) Video camera device
JP4789365B2 (en) Imaging apparatus and exposure control method thereof
JP2003158673A (en) Image pickup device and method
JP3700207B2 (en) Automatic exposure control device, automatic exposure control method, and imaging device
JP2580295B2 (en) Automatic exposure control device
JP2004173251A (en) Camera
JP2003259231A (en) Automatic exposure controller and program thereof
JP2588696B2 (en) Automatic exposure compensation device
JPH03106269A (en) Video signal processor for video camera
JPH04113781A (en) Automatic exposure control system for image pickup device
JP2580294B2 (en) Automatic exposure control device
KR100404088B1 (en) Auto exposure controlling method for camera
JP3732998B2 (en) Exposure control device
KR20010026698A (en) Apparatus and method for correcting a back light automatically of auto-camera system

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees