JPH02138716A - Manufacture of high saturation magnetic flux density alloy thin film - Google Patents
Manufacture of high saturation magnetic flux density alloy thin filmInfo
- Publication number
- JPH02138716A JPH02138716A JP24301688A JP24301688A JPH02138716A JP H02138716 A JPH02138716 A JP H02138716A JP 24301688 A JP24301688 A JP 24301688A JP 24301688 A JP24301688 A JP 24301688A JP H02138716 A JPH02138716 A JP H02138716A
- Authority
- JP
- Japan
- Prior art keywords
- electrodeposition
- thin film
- magnetic flux
- flux density
- high saturation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 20
- 230000004907 flux Effects 0.000 title claims abstract description 19
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 229910045601 alloy Inorganic materials 0.000 title claims description 15
- 239000000956 alloy Substances 0.000 title claims description 15
- 238000004070 electrodeposition Methods 0.000 claims abstract description 53
- 150000002500 ions Chemical class 0.000 claims abstract description 26
- 239000010408 film Substances 0.000 claims abstract description 22
- 229910002058 ternary alloy Inorganic materials 0.000 claims abstract description 16
- 229910000889 permalloy Inorganic materials 0.000 claims description 5
- 239000007772 electrode material Substances 0.000 claims description 4
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 claims description 3
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 claims description 3
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 claims description 3
- 235000019333 sodium laurylsulphate Nutrition 0.000 claims description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 2
- 239000000654 additive Substances 0.000 claims description 2
- 230000001939 inductive effect Effects 0.000 claims description 2
- 238000007740 vapor deposition Methods 0.000 claims 1
- 239000000203 mixture Substances 0.000 abstract description 19
- 238000000034 method Methods 0.000 abstract description 7
- 239000000696 magnetic material Substances 0.000 abstract description 5
- 229910002545 FeCoNi Inorganic materials 0.000 abstract description 4
- 230000000694 effects Effects 0.000 abstract description 4
- 229920006395 saturated elastomer Polymers 0.000 abstract 1
- 229910001325 element alloy Inorganic materials 0.000 description 4
- 229910002555 FeNi Inorganic materials 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910002546 FeCo Inorganic materials 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910003271 Ni-Fe Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 230000002547 anomalous effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000003840 hydrochlorides Chemical class 0.000 description 1
- YFVGRULMIQXYNE-UHFFFAOYSA-M lithium;dodecyl sulfate Chemical compound [Li+].CCCCCCCCCCCCOS([O-])(=O)=O YFVGRULMIQXYNE-UHFFFAOYSA-M 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
Landscapes
- Thin Magnetic Films (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は高密度磁気記録再生用磁気ヘッドに用いる高飽
和磁束密度軟磁性合金薄膜の製造方法に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method for manufacturing a high saturation magnetic flux density soft magnetic alloy thin film used in a magnetic head for high density magnetic recording/reproduction.
従来の技術
高密度の磁気記録に要求される大きな抗磁力（Ｈｃ ）
の記録媒体に対して磁気ヘッド用材料には高い飽和磁束
密度（Ｂｓ）が必要とされているが、従来の高Ｂｓ値を
有する薄膜磁気ヘッド用軟磁性材料として低温プロセス
において、パターニング精度良く作成できる電着法によ
る製法が可能なものは、Ｂｓ＝−約９０００Ｇａｕｓｓ
Ｎｉ −Ｆｅ ２元素合金膜（パーマロイ膜）に限
られていた。しかし、磁気ヘッドのより十分な磁気記録
再生効率の向上をはかるためには、さらに大きなりｓ値
をもち、軟磁気特性にも優れた薄膜をパーマロイ模作ｌ
と同様な利点をもった電着法によって得ることが望唸れ
ている。Conventional technology Large coercive force (Hc) required for high-density magnetic recording
High saturation magnetic flux density (Bs) is required for magnetic head materials for recording media, but conventional soft magnetic materials for thin-film magnetic heads with high Bs values are created with high patterning accuracy in a low-temperature process. Products that can be manufactured using the electrodeposition method have a Bs of approximately -9000 Gauss.
It was limited to Ni-Fe two-element alloy films (permalloy films). However, in order to further improve the magnetic recording and reproducing efficiency of magnetic heads, a thin film with a larger s value and excellent soft magnetic properties should be used as a permalloy replica.
It is hoped that electrodeposition methods with similar advantages can be obtained.
発明が解決しようとする課題
ところで、Ｆｅ−Ｇｏ−Ｎｉ３元素合金薄膜は、Ｂ５−
１００ｏｏ Ｇａｕｓｓ 〜２１ｏｏｏＧａｕｓｓ の
きわめて高いＢｓ値をもち、軟磁気特性にも優れている
が、通常、各電着合金の成分は析出に対する優先順位を
もつため、複数成分の電着（合金電着）は困難な場合が
多く、できても、組成制御に制限が多かった。特に、Ｆ
ｅ−Ｇｏ −Ｎｉ ％のように３成分をもつ合金薄膜の
電着法はこれまで知られていなかった。Problems to be Solved by the Invention By the way, the Fe-Go-Ni three-element alloy thin film has B5-
It has an extremely high Bs value of 100oo Gauss to 21ooo Gauss and has excellent soft magnetic properties, but since the components of each electrodeposited alloy usually have priorities for precipitation, electrodeposition of multiple components (alloy electrodeposition) is difficult. This is often difficult, and even when it is possible, there are many restrictions on composition control. In particular, F
A method of electrodeposition of an alloy thin film having three components such as e-Go-Ni% has not been known so far.
本来、Ｆｅ、Ｎｉ、Ｇｏの各イオンを含む電着（浴中か
らの多成分の同時電析については、電位的に最も責なイ
オンが優先的に析出されるはずであるが、従来から知ら
れているＦｅ−Ｎｉ２元素合金電着にみられる様に、Ｈ
＋イオンの放電というカソード電極での複反応が電着中
に伴うため、カソード電極近傍のＰＨ値の上昇の問題が
あった。即ち、カソード直嘆近傍の高いＰＨ（ｉｉで安
定なＦｅの水酸化物の層を通して、各イオンが放電し電
析するため、電着中の各成分イオンの共析が可能となる
と考えられている（異常共析）。このため、実際には７
Ｌ着浴中の各イオン濃度の比率によって、（美様な組成
の合金電着が起こり得る。Originally, in electrodeposition containing Fe, Ni, and Go ions (simultaneous electrodeposition of multiple components from a bath, the most responsible ions in terms of potential should be preferentially deposited, but As seen in the Fe-Ni two-element alloy electrodeposited, H
Since a double reaction at the cathode electrode, ie, discharge of positive ions, occurs during electrodeposition, there is a problem of an increase in the pH value near the cathode electrode. In other words, each ion is discharged and electrodeposited through a stable Fe hydroxide layer at a high pH (ii) near the cathode, so it is thought that codeposition of each component ion during electrodeposition is possible. (anomalous eutectoid). Therefore, in reality, 7
Depending on the ratio of each ion concentration in the L deposition bath, alloy electrodeposition with a beautiful composition can occur.
これ等の合金電着膜の元素比率は、当然、上記に示した
ことから、電着浴全体のＰＨ値や陰極（カソード）での
混流密度等の様々の電着条件によって影響を受は得るが
、とりわけ、各成分イオン濃度比に大きく左右される（
それぞれの成分のイオン濃度絶対値は本質的でない）。Naturally, the element ratio of these alloy electrodeposited films is influenced by various electrodeposition conditions such as the pH value of the entire electrodeposition bath and the mixed flow density at the cathode, as shown above. However, it is greatly influenced by the concentration ratio of each component ion (
The absolute value of the ion concentration of each component is not essential).
２０２価イオン（Ｆｅ２＋）の他イオンに対する比率が
犬きくなりすぎれば、上記のようにＦｅイオン放電の際
のカソード電甑における主としてＦｅの水酸化物層の影
響が問題となり、酸化されたＦｅの電着膜中への混入に
よる表面アレや、他イオン（Ｃｏ２＋ 、 Ｎｉ２＋
）の安定した放電に対する悪影響の発生から、模組成の
不安定化、又は３元合金型着化ができなくなるという問
題がある。If the ratio of 202-valent ions (Fe2+) to other ions becomes too large, the influence of the Fe hydroxide layer in the cathode electrode during Fe ion discharge becomes a problem as described above, and the oxidized Fe Surface roughness and other ions (Co2+, Ni2+
), there is a problem that the simulated composition becomes unstable or ternary alloy type deposition becomes impossible due to the occurrence of an adverse effect on stable discharge.
課題を解決するための手段
本発明による高磁束密度合金薄膜の製造方法はＦｅＣｏ
Ｎｉからなる３元合金を、硫酸塩及び塩酸塩によって、
Ｆｅ、Ｇｏ、Ｎｉの各イオンを供給させた電着用の浴を
用いて、浴中のイオン０度の比率が ｏ、 ｏｔｓ
＜ （Ｃｏ２”）／（Ｎｉ２＋ ） （ｏ、６ 且
つｏ、ｏｔｓ二。〔Ｆｅ２＋）］ ／ （Ｎｉ２＋）
＜、 ２．０の浴組成のものを用いて、電着電流密度Ｊ
［ｍ４４Ｊ：］を １〈Ｊ〈６ｏ において電着す
ることを特徴とする。Means for Solving the Problems The method of manufacturing a high magnetic flux density alloy thin film according to the present invention is based on FeCo
A ternary alloy consisting of Ni is treated with sulfate and hydrochloride,
Using a bath for electrodeposition to which Fe, Go, and Ni ions are supplied, the ratio of 0 degrees of ions in the bath is o, ots.
<(Co2") / (Ni2+) (o, 6 and o, ots2. [Fe2+)] / (Ni2+)
<, Using a bath composition of 2.0, the electrodeposition current density J
[m44J:] is electrodeposited at 1<J<6o.
作用
０．０５く〔Ｃ０２す／（Ｎｉ２＋）、ｏ、Ｃ５＜［、
Ｆｅ２＋）／（Ｎｉ２＋］の範囲において、浴中のＦｅ
、Ｎｉ、Ｇｏの各イオンをカソード電極に安定供給でき
、〔ＣＯ２→〕／ ［’Ｎｉ２＋） ＜ ０．６、〔Ｆ
ｅ２＋〕／〔Ｎ１２＋〕＜２．０の範囲にお・いて安定
なＦｅＣｏＮ１３元合金電着膜が得られる。また、同一
浴組成の゛電着では、１〈Ｊ〈６０（ｍＡ／ｃｎ）の７
Ｅ流密度の範囲において、膜組体の連続的な変化が可能
で表面性についても優れたものが得られる。Effect 0.05 [C02su/(Ni2+), o, C5<[,
Fe2+)/(Ni2+] in the bath
, Ni, and Go ions can be stably supplied to the cathode electrode, [CO2→]/['Ni2+) < 0.6, [F
A stable electrodeposited FeCoN 13-element alloy film can be obtained in the range of e2+]/[N12+]<2.0. In addition, in electrodeposition with the same bath composition, 7 of 1 J
Within the E flow density range, the membrane assembly can be continuously changed and excellent surface properties can be obtained.
また、電着浴のカソード付近に固定された磁界中で磁性
膜中に一軸磁気異方性を誘導させて電着を行うことによ
り、軟磁気特性を効果的に改善することができる。浴の
ＰＨ値については、１．５＜：ＰＨ＜：５．５の比較的
広い範囲にお・いて３元合金型着膜が得られる。電着温
度は、適切な電着条件下で１５〜６０°Ｃの範囲におい
てＦｅＣｏＮｉ３元合金の高飽和磁束密度の軟磁性膜が
得られる。Further, by performing electrodeposition by inducing uniaxial magnetic anisotropy in the magnetic film in a magnetic field fixed near the cathode of the electrodeposition bath, the soft magnetic properties can be effectively improved. Regarding the pH value of the bath, a ternary alloy type film can be obtained in a relatively wide range of 1.5<:PH<:5.5. A soft magnetic film of a FeCoNi ternary alloy with a high saturation magnetic flux density can be obtained at an electrodeposition temperature in the range of 15 to 60°C under appropriate electrodeposition conditions.
カソード電極材は、電着膜と同じＦｅＣｏＮｉ膜、又は
ＦｅＮｉ膜（パーマロイ）の各々蒸着膜でも両者の間に
大きな差はみられない。さらに、電着浴中に、サッカリ
ン酸ナトリウム及びラウリル硫酸すｌ・リウムを各々最
大ｓ！／ｅ 、 １ｆ／ｅ添加するか、あるいはホウ酸
を１ｍ０ｅ／ｅ添加することにより、３元合金電着にお
ける応力における応ノＪの除去、膜の表面性の改善、浴
のＰＨ値の安定化等をはかることができる。Although the cathode electrode material is a FeCoNi film, which is the same as the electrodeposited film, or a vapor-deposited FeNi film (permalloy), there is no significant difference between the two. Furthermore, in the electrodeposition bath, sodium saccharinate and sodium lauryl sulfate and lithium lauryl sulfate were added to a maximum of s! /e, 1f/e or by adding 1m0e/e of boric acid, it is possible to remove the stress stress in ternary alloy electrodeposition, improve the surface properties of the film, and stabilize the pH value of the bath. etc. can be measured.
実施例
本発明の実施例として行った電着浴組成のイオン濃度比
、及びＰＨ，温度、電極材料、添加剤等のＦａＮｉＣｏ
３元合金電着に関する条件、及び膜組成を表１にまと
める。Example Ion concentration ratio of electrodeposition bath composition carried out as an example of the present invention, PH, temperature, electrode material, additives, etc. of FaNiCo
Table 1 summarizes the conditions for ternary alloy electrodeposition and the film composition.
いずれも、３元合金化したもの全てについてＢＳ〈１０
０００ Ｇａｕｓｓの高飽和磁束密度が確認された。All ternary alloys have a BS〈10
A high saturation magnetic flux density of 000 Gauss was confirmed.
一方、同じ浴組成で、電着電流密度を変化させた場合の
３元合金の組成変化、及び抗研力Ｈｃ飽和磁束密度値Ｂ
ｓを表２にまとめる。（浴組成及び電着条件は、表１の
／１６６のものを用いた。）Ｆｅ、Ｇｏ、Ｎｉ各ビイオ
ン硫酸塩、及び、塩酸塩として供給させた表１の各浴に
よる３元合金化の検討によれば、もっともイオン濃度の
高い（Ｎ１２＋）イオン濃度を基準として、
〔Ｆ” Ｊ ／ （Ｎ１２＋、］ く ２．０（Ｃｏ
２＋ Ｊ ／ （Ｎｉ２＋） くｏ、ａの場合につい
て、安定な３元合金軍着模が得られた（表１の浴中のイ
オン濃度比の検討にお・いては、電着時の電流密度Ｊは
一定値Ｊ＝＝１０ｍＡ／ｃ４とした。他の電着条件は同
表中に記す。）。On the other hand, the composition change of the ternary alloy when the electrodeposition current density is changed with the same bath composition, and the anti-abrasive Hc saturation magnetic flux density value B
s is summarized in Table 2. (The bath composition and electrodeposition conditions were those of /166 in Table 1.) Three-component alloying was performed using each bath in Table 1 supplied as Fe, Go, and Ni biion sulfates and hydrochlorides. According to the study, [F” J / (N12+,] × 2.0 (Co
In the case of 2+ J / (Ni2+) Kuo, a, a stable ternary alloy uniform model was obtained (in the examination of the ion concentration ratio in the bath in Table 1, J was a constant value J==10 mA/c4.Other electrodeposition conditions are shown in the same table.)
才た、例えば表１の痛６の浴を用いて、表２に兄られる
ように、同一浴組成の電着で、１ ＜Ｊ＜６０ （ｍ
Ａ／ｃｎ）
の′［Ｅ流密度の範囲について、膜組成の連続的な変化
が可能であることがわがシ、表面性についても、優れた
ものが得られた。第１図に表２を電着電流密度に対する
、膜中の各成分元素組成の関係として示した。For example, using bath number 6 in Table 1, as shown in Table 2, by electrodeposition with the same bath composition, 1 < J < 60 (m
It was found that the film composition could be continuously changed within the range of A/cn)'[E current density, and excellent surface properties were also obtained. Table 2 is shown in FIG. 1 as the relationship between the elemental composition of each component in the film and the electrodeposition current density.
１だ第２図には、各電流密度で得られた３元合金電着嘆
の抗磁力Ｈｃ、及び飽和磁束密度の値を示した。いずれ
も高飽和磁束密度が確認された。Figure 1 shows the values of the coercive force Hc and the saturation magnetic flux density of the ternary alloy electrodeposited at each current density. High saturation magnetic flux density was confirmed in both cases.
表１により、浴のＰＨ値も
１．５＜；：ＰＨ＜：５．５
の比較的広い範囲にお・いて、３元合金電着、１漢が得
られることがわかった。From Table 1, it was found that the ternary alloy electrodeposition and the 1-value were obtained in a relatively wide range of bath pH values of 1.5<:PH<:5.5.
カソードｌへの浴中のイオンの安定な供給を行うために
は、各イオン比率についても極端に低い場合も安定した
組成での３元合金としての電着は期待できない。上記と
同様に（Ｎ１２＋）イオン濃度を基準として、表１に示
されるように、０．０５ ＜： （ＣＯ２＋）／ （Ｎ
ｉ２＋〕０．０５＜： （Ｆｅ２”）／ （Ｎｉ２”）
においで、適当な結果が得られた。In order to stably supply ions in the bath to the cathode 1, electrodeposition as a ternary alloy with a stable composition cannot be expected even if the ratio of each ion is extremely low. Similarly to the above, based on the (N12+) ion concentration, as shown in Table 1, 0.05 <: (CO2+)/(N
i2+]0.05<: (Fe2”)/ (Ni2”)
Appropriate results were obtained for the smell.
これ等の３元合金電着にお・いて、応力の除去。Removal of stress in the electrodeposition of these ternary alloys.
膜の表面性の改善、さらにまた浴のＰＨ値の安定等をは
かるため、従来から電着法について用いられてきた、サ
ッカリン酸ナトリウム、ラウリル硫酸ナトリウム、及び
ホウ酸等が有効であることも、表１の結果によシ確めら
れた（表１では添加量は各々、３９／（１、１！／ｅ
、 １モル／ｅであった。）。It is also known that sodium saccharinate, sodium lauryl sulfate, boric acid, etc., which have been conventionally used in electrodeposition methods, are effective in improving the surface properties of the film and stabilizing the pH value of the bath. This was confirmed by the results in Table 1 (in Table 1, the amounts added were 39/(1, 1!/e
, 1 mol/e. ).
また、カソードにおける電極材料としては、電着膜と同
じＦｅＣｏＮｉ膜、又はＦｅＮｉ！ｉ％（パーマロイ）
の各々装着膜について両方を用いたが、いずれも大きな
差は表１にお・いてみられなかった。The electrode material for the cathode is FeCoNi film, which is the same as the electrodeposited film, or FeNi! i% (permalloy)
Both were used for each mounting membrane, but no significant difference was observed in either case as shown in Table 1.
さらに１だ、表１１表２とも電着温度は１５〜６０°Ｃ
の範囲のものについて検討され、この温度範囲において
、適当な電着条件下でＦｅＣｏＮｉ Ｓ元合金の高飽和
磁束密度の軟磁性膜が得られることがわか−た。また軟
磁気特性の改善としては、カソード付近に固定させた磁
界中で電着し、磁性摸に一軸の磁気異方性を誘導する製
法が効果的である。Furthermore, the electrodeposition temperature is 15 to 60°C in Table 11 and Table 2.
It was found that a soft magnetic film of a FeCoNiS base alloy with a high saturation magnetic flux density could be obtained in this temperature range under appropriate electrodeposition conditions. Furthermore, in order to improve the soft magnetic properties, a manufacturing method in which electrodeposition is performed in a fixed magnetic field near the cathode to induce uniaxial magnetic anisotropy in the magnetic material is effective.
（以 下 余 白）
（表−２）
（浴組成及び電着条件は表１７；５６のもαつハて作成
したもの）Ｆ・、Ｃｏ、！（ｉ各元素成分組成（ａｔ％
〕の変動を示すグラフ、第２図は第１図で得られたＩ値
を変えて作成した膜の磁気特性（抗磁力Ｈａ（Ｏｓ）、
及び飽和磁束密度（Ｂｆｉ［）を示すグラフである。(Margins below) (Table 2) (Bath composition and electrodeposition conditions were created based on Table 17; 56) F., Co,! (iEach elemental composition (at%
] Figure 2 shows the magnetic properties (coercive force Ha (Os),
and a graph showing saturation magnetic flux density (Bfi[).
代理人の氏名 弁理士 粟 野 重 孝 ほか１名発明
の効果
本発明によって極めて高いＢｓ値を有するＦｅ−ｃｏ−
Ｎｉ３元合金の電着が可能となり、該電着によって、よ
り十分な磁気記録再生効率を有する薄膜磁気ヘッド用軟
磁性材料の作成が可能となった。Name of agent: Patent attorney Shigetaka Awano and one other person Effects of the invention Fe-co- which has an extremely high Bs value due to the present invention
Electrodeposition of a ternary Ni alloy has become possible, and this electrodeposition has made it possible to create a soft magnetic material for a thin film magnetic head that has more sufficient magnetic recording and reproducing efficiency.
第１図は本発明の実施例において表１ノに６の浴組成に
ついて電着電流密度を１〈Ｊ〈６０２〔ｍ／ｃ！〕の範
囲で変化させた場合のＪ値に対する［間中の第
図
同−夕存中で電−粂Ｅ Ｎヱ変λることによ）で得られ
る震組成のｌ動例（賽旋例表１沿粗底ＮＯ，６にＸる〕
第
図
一電ｉ富度Ｊ
ｔｒｎＡ／ｃｍ’Ｊ
ＩＰ変えで作成した腹の磁気特性の例Figure 1 shows the electrodeposition current density of 1〈J〈602 [m/c! An example of the seismic composition obtained by changing the J value in the range of Table 1 Rough bottom No. 6
Figure 1. Example of magnetic properties of the antinode created by changing the Ideni richness J trnA/cm'J IP.
Claims (7)
び塩酸塩の一方又は両方によってＮｉ，Ｆｅ，Ｃｏの各
イオンを供給させた電着用の電解浴であって、浴中の各
２価イオン濃度の比率が ０．０５≦〔Ｃｏ＾２＾＋〕／〔Ｎｉ＾２＾＋〕＜０．
６且つ、０．０５≦〔Ｆｅ＾２＾＋〕／〔Ｎｉ＾２＾＋
〕＜２．０である浴組成を用い、カソードにおける電着
電流密度Ｊが １＜Ｊ＜６０〔ｍＡ／ｃｍ＾２〕 である範囲でカソードにＦｅＣｏＮｉ＿３元合金電着膜
を作製することを特徴とする高飽和磁束密度合金薄膜の
製造方法。(1) An electrolytic bath for electrodeposition in which Ni, Fe, and Co ions are supplied by one or both of sulfate and hydrochloride containing divalent ions of Ni, Fe, and Co, in which each The ratio of divalent ion concentration is 0.05≦[Co^2^+]/[Ni^2^+]<0.
6 and 0.05≦[Fe^2^+]/[Ni^2^+
]<2.0, and the FeCoNi_ternary alloy electrodeposited film is produced on the cathode in a range where the electrodeposition current density J at the cathode is 1<J<60 [mA/cm^2]. A method for producing a high saturation magnetic flux density alloy thin film.
中へ一軸磁気異方性を誘導させて電着を行うことを特徴
とする請求項１記載の高飽和磁束密度合金薄膜の製造方
法。(2) The method for producing a high saturation magnetic flux density alloy thin film according to claim 1, characterized in that the electrodeposition is performed by inducing uniaxial magnetic anisotropy into the film using a magnetic field fixed near the cathode of the electrodeposition bath. .
とを特徴とする請求項１記載の高飽和磁束密度合金薄膜
の製造方法。(3) The method for producing a high saturation magnetic flux density alloy thin film according to claim 1, wherein the PH value of the electrodeposition bath is 1.6≦PH≦5.5.
であることを特徴とする請求項１記載の高飽和磁束密度
合金薄膜の製造方法。(4) The method for producing a high saturation magnetic flux density alloy thin film according to claim 1, wherein the temperature of the electrodeposition bath during electrodeposition is 15°C or more and 60°C or less.
ＣｏＮｉ＿３元素薄膜又はパーマロイ薄膜を用いること
を特徴とする請求項１記載の高飽和磁束密度合金薄膜の
製造方法。(5) Fe by vapor deposition as cathode electrode material for electrodeposition
2. The method for producing a high saturation magnetic flux density alloy thin film according to claim 1, characterized in that a CoNi_3 element thin film or a permalloy thin film is used.
添加させた電着浴を用いることを特徴とする請求項１記
載の高飽和磁束密度合金薄膜の製造方法。(6) The method for producing a high saturation magnetic flux density alloy thin film according to claim 1, characterized in that an electrodeposition bath to which H_3BO_3 is added within 1 mol/l is used.
及びラウリル硫酸ナトリウムを各々最大３〔ｇ／ｌ〕及
び１〔ｇ／ｌ〕以下に添加することを特徴とする請求項
１記載の高飽和磁束密度合金薄膜の製造方法。(7) High saturation according to claim 1, characterized in that sodium saccharinate and sodium lauryl sulfate are added as additives in the electrodeposition bath at a maximum of 3 [g/l] and 1 [g/l] or less, respectively. Method for producing magnetic flux density alloy thin film.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63243016A JP2633326B2 (en) | 1988-08-03 | 1988-09-28 | Manufacturing method of high saturation magnetic flux density alloy thin film |
| US07/412,221 US5011581A (en) | 1988-09-28 | 1989-09-25 | Process for producing a thin alloy film having high saturation magnetic flux density |
| DE89117884T DE68907681T2 (en) | 1988-09-28 | 1989-09-27 | Process for producing a thin alloy film with high saturation of magnetic flux density. |
| EP89117884A EP0361451B1 (en) | 1988-09-28 | 1989-09-27 | Process for producing a thin alloy film having high saturation magnetic flux density |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19409688 | 1988-08-03 | ||
| JP63-194096 | 1988-08-03 | ||
| JP63243016A JP2633326B2 (en) | 1988-08-03 | 1988-09-28 | Manufacturing method of high saturation magnetic flux density alloy thin film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02138716A true JPH02138716A (en) | 1990-05-28 |
| JP2633326B2 JP2633326B2 (en) | 1997-07-23 |
Family
ID=26508302
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63243016A Expired - Fee Related JP2633326B2 (en) | 1988-08-03 | 1988-09-28 | Manufacturing method of high saturation magnetic flux density alloy thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2633326B2 (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6176642A (en) * | 1984-09-25 | 1986-04-19 | Hitachi Ltd | Thin film of ternary co-ni-fe alloy and its manufacture |
-
1988
- 1988-09-28 JP JP63243016A patent/JP2633326B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6176642A (en) * | 1984-09-25 | 1986-04-19 | Hitachi Ltd | Thin film of ternary co-ni-fe alloy and its manufacture |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2633326B2 (en) | 1997-07-23 |
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