JPH02137109A - Thin film magnetic head - Google Patents

Thin film magnetic head

Info

Publication number
JPH02137109A
JPH02137109A JP29182388A JP29182388A JPH02137109A JP H02137109 A JPH02137109 A JP H02137109A JP 29182388 A JP29182388 A JP 29182388A JP 29182388 A JP29182388 A JP 29182388A JP H02137109 A JPH02137109 A JP H02137109A
Authority
JP
Japan
Prior art keywords
film
magnetic head
detection marker
flank
depth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP29182388A
Other languages
Japanese (ja)
Inventor
Naoto Matono
直人 的野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP29182388A priority Critical patent/JPH02137109A/en
Priority to KR1019890004437A priority patent/KR890016509A/en
Priority to CA000595672A priority patent/CA1317672C/en
Priority to EP89105973A priority patent/EP0336395B1/en
Priority to DE68914314T priority patent/DE68914314T2/en
Priority to US07/333,400 priority patent/US5056353A/en
Publication of JPH02137109A publication Critical patent/JPH02137109A/en
Pending legal-status Critical Current

Links

Landscapes

  • Magnetic Heads (AREA)

Abstract

PURPOSE:To work a relief plane with the small number of processes and high accuracy by defining first and second marker films as the index of working depth. CONSTITUTION:A band-shaped first detecting marker film 3 is formed with arranging one side to a relief plane 9 in an area to express the tolerance range of the working depth for the plane 9 on a lower magnetic core 1 of a thin film magnetic head. Further, with being overlapped to the first detecting marker film 3, a second detecting marker film 4 is formed and for this second detecting marker film 4, width in a track width direction is gradually increased or decreased with the prescribed rate of change in a gap depth direction. Accordingly, by executing re-working based on necessary working quantity, the end face of the first detecting marker film 3 is exposed and it can be confirmed that the working depth of the plane 9 is in the tolerance range. Thus, the relief plane 9 can be easily worked with the satisfactory accuracy.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、磁気記録再生装置に装備される磁気ヘッドに
閃し、特に高帯域信号の記録再生に好適な薄膜磁気ヘッ
ドに関する−ものである。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a magnetic head installed in a magnetic recording/reproducing device, and particularly relates to a thin film magnetic head suitable for recording/reproducing high-band signals. .

(従来の技術) 薄膜磁気ヘッドは、第3図に示す様に基板(5)上に、
下部磁性コア(1)、SiO□層(6)、コイル導体(
2><21)、絶縁層(62)及び上部磁性コア(7)
を順次積層し、更に該積層体の上面に接き層(8)を介
して保護板(51)を配備し、記録媒体との対接面(5
0)に磁気ギャップ部(60)を露出している。
(Prior art) As shown in FIG. 3, a thin film magnetic head has a substrate (5) with
Lower magnetic core (1), SiO□ layer (6), coil conductor (
2><21), insulating layer (62) and upper magnetic core (7)
are sequentially laminated, and a protective plate (51) is further provided on the upper surface of the laminate with a contact layer (8) interposed therebetween.
0), the magnetic gap portion (60) is exposed.

薄膜磁気ヘッドに於いては、記録媒体と対接面(50)
の摺接状態を適正に維持するため、第6図の如く対接面
(50)のトラック幅方向の側部に研磨等の機械加工を
施して、記録媒体と接触しない逃げ面(9)を凹設し、
これによって対接面(50)のトラック幅方向の幅(対
接幅W)を略300μ輪に規制している。又、ギャップ
デプス長D (磁気ギャップ部の対接面に直交する方向
の深さ距離)は7μ−と極めて小さく、ギャップデプス
端の近傍にコイル導体(2)(21)が広がっている。
In a thin film magnetic head, the recording medium and the opposing surface (50)
In order to properly maintain the sliding contact state, as shown in Fig. 6, the sides of the contact surface (50) in the track width direction are machined such as polishing to form a flank (9) that does not come into contact with the recording medium. Recessed,
This limits the width of the contact surface (50) in the track width direction (contact width W) to approximately 300 μm. Further, the gap depth length D (the depth distance in the direction perpendicular to the facing surfaces of the magnetic gap portion) is extremely small at 7 μ-, and the coil conductors (2) (21) are spread near the gap depth ends.

従って、逃げ面〈9)の加工時に、ギヤップデプス方向
の加工深さが所定値よりも深くなると、コイル導体(2
)(21)を切断することになる。逆に、逃げ面(9)
の加工深さが所定値よりも浅い場合は、磁気ヘッドとし
ての作動時に記録媒体が面振動によって逃げ面(9)に
摺接し、損傷を受ける虞れがある。このため、逃げ面(
9)の加工には、例えば±5μ論の高い精度が要求され
る。
Therefore, when machining the flank surface (9), if the machining depth in the gap depth direction becomes deeper than a predetermined value, the coil conductor (2
)(21) will be cut. On the contrary, flank (9)
If the machining depth is shallower than a predetermined value, there is a risk that the recording medium will come into sliding contact with the flank surface (9) due to surface vibration during operation as a magnetic head, and be damaged. For this reason, the escape surface (
Processing 9) requires high accuracy of, for example, ±5μ theory.

そこで第6図の如く、下部磁性コア(1)の上面に、逃
げ面(9)の加工深さの許容範囲の上限から下限までの
領域に対して帯状のマーカー膜(40)を。
Therefore, as shown in FIG. 6, a band-shaped marker film (40) is provided on the upper surface of the lower magnetic core (1) in the region from the upper limit to the lower limit of the allowable machining depth range of the flank (9).

設けた薄膜磁気ヘッドが提案されている(特開昭82−
26818[G11BS/311)。
A thin film magnetic head with a
26818 [G11BS/311).

該磁気ヘッドに於いては、逃げ面(9)の加工時に、加
工面にマーカーIN!(40)の端面が現れる深さ位置
まで工具(90)を切込むことにより、マーカー膜(4
0)のギャップデプス方向の幅に応じた許容誤差で逃げ
面(9)を形成することが出来る。
In this magnetic head, when machining the flank (9), a marker is placed on the machined surface! By cutting the tool (90) to the depth position where the end face of the marker film (40) appears,
The flank surface (9) can be formed with a tolerance according to the width in the gap depth direction of 0).

(解決しようとする課題) ところが、従来のマーカー膜(40)は、逃げ面加工精
度の許容範囲の上限と下限の差に一致する狭い幅(10
μ輪程度)に形成されているから、逃げ面(9)の加工
中にマーカー膜(40)の有無を頻繁に確認する必要が
あり、工程が煩雑となる問題があった。又、逃げ面(9
)の加工後に、工具の切込み量が許容範囲内にあること
は判明するが、その切込み量の目標値(許容範囲の中央
値)からのズレが不明であるなめ、次の磁気ヘッドに対
する切込み量を補正することが出来ない問題があった。
(Problem to be Solved) However, the conventional marker film (40) has a narrow width (10
Since the marker film (40) is formed in the shape of a μ ring, it is necessary to frequently check the presence or absence of the marker film (40) during processing of the flank surface (9), which poses a problem of complicating the process. Also, the flank (9
), it is found that the depth of cut of the tool is within the allowable range, but the deviation of the depth of cut from the target value (median value of the allowable range) is unknown, so the depth of cut for the next magnetic head is changed. There was a problem that it could not be corrected.

本発明の目的は、逃げ面(9)を精度良く、然も容易に
加工出来る構造の薄膜磁気ヘッドを提供することである
An object of the present invention is to provide a thin-film magnetic head having a structure in which the flank surface (9) can be precisely and easily processed.

(課題を解決する為の手段) 本発明に係る薄膜磁気ヘッドの下部磁性コア<1)上に
は、逃げ面(9)の加工深さの許容範囲を表わす領域に
帯状の第1検知マーカー膜〈3)が、逃げ面(9)に1
辺を揃えて形成されると共に、該第1検知マーカー膜(
3)に重ねて、トラック幅方向の幅がギャップデプス方
向に所定の変化率で暫増或は1滅する第2検知マーカー
rtA(4)が形成されている。
(Means for Solving the Problems) On the lower magnetic core <1) of the thin film magnetic head according to the present invention, a strip-shaped first detection marker film is formed in an area representing the permissible range of processing depth of the flank (9). <3) is 1 on the flank (9)
The first detection marker film (
3), a second detection marker rtA (4) whose width in the track width direction gradually increases or disappears at a predetermined rate of change in the gap depth direction is formed.

(作 用) 逃げ面(9)の加工工程にて、第2検知マーカー1IA
(4)の端面が露出する深さまで加工を施す際、該第2
検知マーカー膜く4)のトラック幅方向の幅は加工深さ
に応じて変化するから、該幅の測定値から、目標とする
加工深さまでの必要加工量を知ることが出来る。
(Function) In the processing process of the flank (9), the second detection marker 1IA
(4) When processing to a depth where the end face is exposed, the second
Since the width of the detection marker film 4) in the track width direction changes depending on the machining depth, the amount of machining required to reach the target machining depth can be known from the measured value of the width.

該必要加工量に基づいて再加工を施すことにより、第1
検知マーカー膜(3)の端面が露出し、これによって逃
げ面(9)の加工深さが許容範囲内にあることが確認さ
れる。
By performing reprocessing based on the required processing amount, the first
The end face of the detection marker film (3) is exposed, thereby confirming that the machining depth of the flank (9) is within the permissible range.

(発明の効果〉 本発明に俤る薄膜磁気ヘッドによれば、上述の如く第1
及び第2マーカー膜を加工深さの指標として、従来より
も少ない工数にて、然も高精度で逃げ面を加工すること
が出来る。
(Effects of the Invention) According to the thin film magnetic head of the present invention, the first
By using the second marker film as an indicator of the machining depth, the flank surface can be machined with high precision and with fewer man-hours than in the past.

又、逃げ面の加工後に、第2検知マーカー膜の端面の幅
を測定することにより、目標加工深さとの誤差を知るこ
とが出来るから、該誤差を次のへラドチップの加工工程
にフィードバックして、工具の切込み量を補正すること
が可能である。
In addition, by measuring the width of the end face of the second detection marker film after machining the flank surface, it is possible to know the error from the target machining depth, so this error can be fed back to the next Herad tip machining process. , it is possible to correct the depth of cut of the tool.

(実施例) 実施例は本発明を説明するためのものであって、特許請
求の範囲に記載の発明を隔定し、或は範囲を減縮する様
に解すべきではない。
(Examples) Examples are provided to explain the present invention, and should not be interpreted to limit or reduce the scope of the invention described in the claims.

第1図乃至第5図に基づいて本発明に係る薄膜磁気ヘッ
ドの構成例を説明する。尚、第1図及び第4図は、第3
図に示す磁気ヘッドの保護板(51)、接き層(8)、
第1絶縁層(61)、及び5i02層(6)の図示を省
略して描いた平面図である。又、第1図及び第4図中の
ハツチングは断面を示すものではなく、第2検知マーカ
ー膜(4)及び第1コイル導体(2)の形状を明確にす
る為に施したものである。
An example of the configuration of a thin film magnetic head according to the present invention will be explained based on FIGS. 1 to 5. In addition, Fig. 1 and Fig. 4 are
A protective plate (51), a contact layer (8) of the magnetic head shown in the figure,
FIG. 6 is a plan view in which illustration of the first insulating layer (61) and the 5i02 layer (6) is omitted. Further, the hatching in FIGS. 1 and 4 does not indicate a cross section, but is added to clarify the shapes of the second detection marker film (4) and the first coil conductor (2).

第3図の如く、チタン酸バリウム等の非磁性セラミック
からなる基板(5)上に、センダスト製の下部磁性コア
(1)、ギャップスペーサとなる810□層(6)、C
u製の第1コイル導体(2)、第1絶縁層(61)、C
u製の第2コイル導体(21)、第2絶縁層(62〉、
及びセンダスト製の上部磁性コア(7)が順次積層され
、該積層体の上面には、ガラス或は合成樹脂からなる接
合層(8)を介して、非磁性セラミック製の保護板(5
1)を配備している。
As shown in Fig. 3, on a substrate (5) made of non-magnetic ceramic such as barium titanate, a lower magnetic core (1) made of Sendust, an 810□ layer (6) which will become a gap spacer, and a C
First coil conductor (2) made of u, first insulating layer (61), C
A second coil conductor (21) made of u, a second insulating layer (62),
and an upper magnetic core (7) made of Sendust are sequentially laminated, and a protective plate (5) made of non-magnetic ceramic is placed on the upper surface of the laminated body via a bonding layer (8) made of glass or synthetic resin.
1) is in place.

第1図及び第2図の如く下部磁性コア(1)の5i02
層(6)上面には、帯状を呈する一対の第1検知マーカ
ー膜(3)が、夫々長辺を逃げ面(9)に揃えて形成さ
れている。又、該第1検知マーカー膜(3)とSiO□
層(6)との間には、三角形を呈する一対の第2検知マ
ーカー膜(4)が、夫々底辺を逃げ面(9)に揃え且つ
頂点を第1検知マーカーM(3)のコイル導体側の長辺
に揃えて形成されている。
5i02 of the lower magnetic core (1) as shown in Figures 1 and 2
A pair of strip-shaped first detection marker films (3) are formed on the upper surface of the layer (6) with their long sides aligned with the flanks (9). Moreover, the first detection marker film (3) and SiO□
A pair of second detection marker films (4) each having a triangular shape are arranged between the layer (6) and the bottom side thereof aligned with the flank surface (9) and the apex thereof aligned with the coil conductor side of the first detection marker M(3). It is formed to align with the long side of.

本実施例に於いては、後述の如く前記第1及び第2検知
マーカー膜(3)(4)を、第1及び第2コイル導体(
2)(21)と同時に形成することから、両マーカー膜
(3)(4)は夫々厚さ略2μ−のCu膜であって、両
膜の間には第2図の如く厚さ略1μ輪の第1絶縁層(6
1)が介装される。
In this embodiment, as described later, the first and second detection marker films (3) and (4) are connected to the first and second coil conductors (
2) Since they are formed at the same time as (21), both marker films (3) and (4) are Cu films with a thickness of about 2μ, respectively, and there is a layer between the two films with a thickness of about 1μ as shown in FIG. The first insulating layer of the ring (6
1) is interposed.

以下、第4図及び第5図に基づいて、逃げ面(9)の加
工工程について説明する。
Hereinafter, the machining process of the flank (9) will be explained based on FIGS. 4 and 5.

尚、該加工工程に至るまでの薄膜形成工程及び保護板(
51)の接合工程は、従来の磁気ヘッドと時間−である
が、第1コイル導体(2)と同時に第2検知マーカー膜
(4)を、第2コイル導体(21)と同時に第1検知マ
ーカー膜(3)を、夫々マスクスパッタリングにより後
記所定形状に形成する。この際、両膜(3)(4)の間
には、第1絶縁層(61)が介装されることになる。第
2検知マーカーJll(4)は第1検知マーカー膜(3
)上に形成することも可能である。
In addition, the thin film forming process and the protective plate (
The bonding process of 51) is similar to that of a conventional magnetic head, but the second detection marker film (4) is attached to the first coil conductor (2) at the same time, and the first detection marker is attached to the second coil conductor (21) at the same time. Each film (3) is formed into a predetermined shape described later by mask sputtering. At this time, the first insulating layer (61) is interposed between the two films (3) and (4). The second detection marker Jll (4) is connected to the first detection marker film (3
) can also be formed on the surface.

第4図に示す如く、逃げ面加工前の第2検知マーカーJ
ll(4)は、底辺の幅Yと高さ(H+T)の間にY=
 2 (H+T)の関係があり、底辺は、対接面(50
)を形成する為の加工面Aに揃うと共に、該底辺の一端
は、逃げ面(9)の対接面(50)側の側面(9a)に
一致し、且つ頂点の位置が後述の第1検知マーカー膜(
3)のコイル導体(2)側の長辺に一致している。
As shown in Figure 4, the second detection marker J before flank surface machining
ll(4) is Y= between the width Y of the base and the height (H+T)
2 There is a relationship (H+T), and the base is the opposing surface (50
), one end of the base coincides with the side surface (9a) on the contact surface (50) side of the flank (9), and the position of the apex is aligned with the first Detection marker membrane (
3) coincides with the long side of the coil conductor (2).

一方、第1検知マーカー膜(3)はトラック幅方向に長
い長方形であって、短辺の長さXは逃げ面(9)の位置
を中心として、逃げ面(9)の加工精度の許容誤差T(
5μm)の2倍(10μ−)に形成され、一方の短辺を
前記側面(9m)に揃えている。
On the other hand, the first detection marker film (3) has a rectangular shape that is long in the track width direction, and the length of the short side X is centered around the position of the flank (9), and the tolerance for machining accuracy of the flank (9) T(
5 μm), and one short side is aligned with the side surface (9 m).

第5図(a) (b) (c)は、逃げ面の加工深さに
応じて、加工面に露出する第1及び第2検知マーカー膜
(3)(4)の端面形状が変化する様子を表している。
Figures 5 (a), (b), and (c) show how the end face shapes of the first and second detection marker films (3) and (4) exposed on the machined surface change depending on the machined depth of the flank surface. represents.

第5図(a)の如く加工面に、第2検知マーカー膜(4
)のみが幅Yで露出している場合は、第4図のA面まで
加工が進んだことが検知される。従って、その後、更に
第4図に示すH(=Y/2−T)だけ工具を切り込めば
、所定深さの逃げ面(9)を形成することが出来る。
As shown in Fig. 5(a), a second detection marker film (4
) is exposed with width Y, it is detected that processing has progressed to side A in FIG. Therefore, if the tool is then further cut by H (=Y/2-T) shown in FIG. 4, the flank (9) of a predetermined depth can be formed.

第5図(b)の如く第2検知マーカーIK(4)のみが
幅Y + (Y + < Y )で露出している場合は
、更に工具をY+/2  Tだけ切り込めば良いことが
判る。
If only the second detection marker IK (4) is exposed with a width of Y + (Y + < Y) as shown in Figure 5 (b), it is clear that the tool only needs to cut further by Y +/2 T. .

又、第5図(c)の如く第2検知マーカー膜(4)が幅
Yi(Y*<Y+)で露出し、且つ第1検知マーカー膜
(3)が露出した場合は、許容誤差内(±T〉で逃げ面
(9)が形成されたことになる。尚、第1検知マーカー
膜(3)と第2検知マーカーJl[(4)はCu製であ
って、その間には5i02層が介装されているから、両
膜の識別は容易である。
Furthermore, when the second detection marker film (4) is exposed with a width Yi (Y*<Y+) and the first detection marker film (3) is exposed as shown in FIG. 5(c), within the allowable error ( ±T>, the flank (9) is formed.The first detection marker film (3) and the second detection marker Jl[(4) are made of Cu, and there is a 5i02 layer between them. Because they are interposed, it is easy to distinguish between the two membranes.

この場合、加工誤差はYs/2  Tにて算出出来るの
で、次の磁気ヘッドの加工時には、工具の切込み量を前
記誤差だけ補正することにより、歩留りを改善すること
が可能である。
In this case, since the machining error can be calculated as Ys/2T, it is possible to improve the yield by correcting the depth of cut of the tool by the error when machining the next magnetic head.

上記薄膜磁気ヘッドの製造工程によれば、コイル導体(
2)(21)と同時にマーカー膜(3)(4)を形成す
ので、従来のマーカー膜を具えない磁気ヘッドに比べて
製造工程が複雑になることはない。
According to the above manufacturing process of the thin film magnetic head, the coil conductor (
2) Since the marker films (3) and (4) are formed at the same time as (21), the manufacturing process is not complicated compared to conventional magnetic heads that do not include marker films.

又、逃げ面(9)の加工時に、加工面に露出する左右一
対のマーカー11(4)(4)の幅の差によって、ヘッ
ドチップに対する工具の刃面の傾きを検知することが出
来る。
Further, when machining the flank (9), the inclination of the blade surface of the tool with respect to the head tip can be detected by the difference in width between the left and right markers 11 (4) (4) exposed on the machining surface.

第2検知マーカー膜(4)の底辺の長さと高さとの比Y
/(H+T)を大きくすれば、これに応じて加工深さの
測定精度を上げることも可能である。
Ratio Y of the length of the bottom of the second detection marker film (4) and the height
By increasing /(H+T), it is possible to increase the accuracy of measuring the machining depth accordingly.

図面及び上記実施例の説明は、本発明を説明するための
ものであって、特許請求の範囲に記載の発明を限定し、
或は範囲を減縮する様に解すべきではない。
The drawings and the description of the above embodiments are for illustrating the present invention, and do not limit the invention described in the claims.
Nor should it be construed as limiting the scope.

又、本発明の各部構成は上記実施例に限らず、特許請求
の範囲に記載の技術的範囲内で種々の変形が可能である
。例えば、夫々左右一対に形成されている第1及び第2
検知マーカー1N!(3) (4)は、コイル導体(2
)(21)に近い片方のみによっても、本発明の効果が
得られるのは勿論である。
Further, the configuration of each part of the present invention is not limited to the above embodiments, and various modifications can be made within the technical scope of the claims. For example, the first and second
Detection marker 1N! (3) (4) is the coil conductor (2
)(21) It goes without saying that the effects of the present invention can also be obtained by using only one of the methods close to (21).

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に俤る薄膜磁気ヘッドの特徴部分を示す
平面図、第2因は第1及び第2検知マーカー膜の斜面図
、第3区は薄膜磁気ヘッドの第1図■−■線に沿う断面
図、第4図は逃げ面の加工工程を示す平面図、第5図は
該加工工程における加工面の変化を示す正面図、第6図
は従来の薄膜磁気ヘッドの第1区に対応する平面図であ
るゆ(1)・・・下部磁性コア  (2)(21)・・
・コイル導体り3)・・・第1検知マーカー膜 (4)・・・第2検知マーカー膜 (50)・・・対接面    (9)・・・逃げ面手続
補正書 (自発) 平成元年2月23日 1゜ 事件の表示 特願昭63−291823 2゜ 発明の名称 薄膜磁気ヘッド 3゜ 補正をする者 事件との関係  特許出願人 (188)三洋電機株式会社 6゜ 補正の内容 明細書第8頁第4行目乃至第5行目 「マスクスパッタリング」を 「スパッタリング及びエツチング」 に補正。 以 上
FIG. 1 is a plan view showing the characteristic parts of the thin film magnetic head according to the present invention, the second factor is an oblique view of the first and second detection marker films, and the third section is the thin film magnetic head shown in FIG. 4 is a plan view showing the flank surface machining process, FIG. 5 is a front view showing changes in the machined surface during the machining process, and FIG. 6 is the first section of a conventional thin film magnetic head. A plan view corresponding to (1)... lower magnetic core (2) (21)...
・Coil conductor 3)...First detection marker film (4)...Second detection marker film (50)...Contact surface (9)...Flank surface procedure amendment form (voluntary) Heisei 1 February 23, 2016 1° Case Patent Application No. 63-291823 2° Title of the Invention Relationship to the Thin Film Magnetic Head 3° Correction Case Patent Applicant (188) Sanyo Electric Co., Ltd. Details of the 6° Amendment "Mask sputtering" in the 4th and 5th lines of page 8 of the book was corrected to "sputtering and etching."that's all

Claims (1)

【特許請求の範囲】[Claims] 1 基板上に下部磁性コア、コイル導体及び上部磁性コ
アが絶縁層を介して積層され、記録媒体との対接面(5
0)のトラック幅方向の側部には、対接面(50)の幅
Wを規定する為の逃げ面(9)が、機械加工によって凹
設されている薄膜磁気ヘッドに於いて、下部磁性コア(
1)上には、前記逃げ面(9)の加工深さの許容範囲を
表わす領域に帯状の第1検知マーカー膜(3)が、1辺
を逃げ面(9)に揃えて形成されると共に、該第1検知
マーカー膜(3)に重ねて、トラック幅方向の幅がギャ
ップデプス方向に変化する第2検知マーカー膜(4)を
形成していることを特徴とする薄膜磁気ヘッド。
1 A lower magnetic core, a coil conductor, and an upper magnetic core are laminated on a substrate via an insulating layer, and the surface facing the recording medium (5
In a thin film magnetic head, a flank (9) for defining the width W of the contact surface (50) is provided on the side in the track width direction of 0) by machining. core(
1) A strip-shaped first detection marker film (3) is formed on the region representing the permissible machining depth range of the flank surface (9) with one side aligned with the flank surface (9). A thin film magnetic head characterized in that a second detection marker film (4) whose width in the track width direction changes in the gap depth direction is formed overlapping the first detection marker film (3).
JP29182388A 1988-04-06 1988-11-16 Thin film magnetic head Pending JPH02137109A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP29182388A JPH02137109A (en) 1988-11-16 1988-11-16 Thin film magnetic head
KR1019890004437A KR890016509A (en) 1988-04-06 1989-04-04 Marker for detecting throughput of thin film magnetic head and manufacturing method of thin film magnetic head using this marker
CA000595672A CA1317672C (en) 1988-04-06 1989-04-04 Marker for detecting amount of working and process for producing thin film magnetic head
EP89105973A EP0336395B1 (en) 1988-04-06 1989-04-05 Marker for detecting amount of working and process for producing thin film magnetic head
DE68914314T DE68914314T2 (en) 1988-04-06 1989-04-05 Marking for evaluating the processing height and manufacturing process of a thin-film magnetic head.
US07/333,400 US5056353A (en) 1988-04-06 1989-04-05 Marker for detecting amount of working and process for producing thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29182388A JPH02137109A (en) 1988-11-16 1988-11-16 Thin film magnetic head

Publications (1)

Publication Number Publication Date
JPH02137109A true JPH02137109A (en) 1990-05-25

Family

ID=17773876

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29182388A Pending JPH02137109A (en) 1988-04-06 1988-11-16 Thin film magnetic head

Country Status (1)

Country Link
JP (1) JPH02137109A (en)

Similar Documents

Publication Publication Date Title
EP0336395B1 (en) Marker for detecting amount of working and process for producing thin film magnetic head
US20090009910A1 (en) Method of aligning components for installation on a head suspension assembly
JPH02137109A (en) Thin film magnetic head
JPS6346608A (en) Manufacture of magnetic head
JPS6226618A (en) Thin film magnetic head
JPS6222219A (en) Thin film magnetic head
JPS6222220A (en) Thin film magnetic head
JPS61240417A (en) Production of magnetic head
JPH0229913A (en) Marker for worked quantity detection and manufacture of thin film magnetic head using the marker
JPS58177517A (en) Manufacture of thin-film magnetic head
JPS61182618A (en) Method for detecting gap depth of thin film magnetic head
JPS6212911A (en) Production of thin film magnetic head
KR890004228Y1 (en) Magnetic head
JPS6226616A (en) Thin film magnetic head
JPS5924419A (en) Manufacture of thin film magnetic head
JP2556478B2 (en) Magnetic head
JPS61292215A (en) Thin magnetic head and its production
JPS63253514A (en) Manufacture of thin-film magnetic head
JPS60177416A (en) Production of thin film magnetic head
JPS62256206A (en) Constituting body of thin-film magnetic head
JPS62232718A (en) Thin film magnetic head
JPH0196810A (en) Magnetic head
JPS62145525A (en) Manufacture of thin film magnetic head
JPS5877015A (en) Production of thin film magnetic head
JPS62293503A (en) Manufacture of magnetic head