JPH02135456A - Electrophotographic sensitive body - Google Patents
Electrophotographic sensitive bodyInfo
- Publication number
- JPH02135456A JPH02135456A JP28897288A JP28897288A JPH02135456A JP H02135456 A JPH02135456 A JP H02135456A JP 28897288 A JP28897288 A JP 28897288A JP 28897288 A JP28897288 A JP 28897288A JP H02135456 A JPH02135456 A JP H02135456A
- Authority
- JP
- Japan
- Prior art keywords
- group
- resin
- formula
- acid
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920005989 resin Polymers 0.000 claims abstract description 168
- 239000011347 resin Substances 0.000 claims abstract description 168
- 229920000642 polymer Polymers 0.000 claims abstract description 49
- 239000000463 material Substances 0.000 claims abstract description 40
- 239000011230 binding agent Substances 0.000 claims abstract description 24
- 125000001424 substituent group Chemical group 0.000 claims abstract description 13
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 4
- -1 cyclic acid anhydride Chemical class 0.000 claims description 71
- 125000004432 carbon atom Chemical group C* 0.000 claims description 31
- 108091008695 photoreceptors Proteins 0.000 claims description 28
- 230000002378 acidificating effect Effects 0.000 claims description 24
- 150000002430 hydrocarbons Chemical group 0.000 claims description 21
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 19
- 238000006116 polymerization reaction Methods 0.000 claims description 12
- 239000000126 substance Substances 0.000 claims description 11
- 229910052799 carbon Inorganic materials 0.000 claims description 10
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 9
- 229910052801 chlorine Inorganic materials 0.000 claims description 7
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 7
- 125000005843 halogen group Chemical group 0.000 claims description 7
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 6
- 239000004215 Carbon black (E152) Substances 0.000 claims description 6
- 229930195733 hydrocarbon Natural products 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 125000004429 atom Chemical group 0.000 claims description 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 7
- 230000007613 environmental effect Effects 0.000 abstract description 7
- 230000000306 recurrent effect Effects 0.000 abstract 2
- 229910018828 PO3H2 Inorganic materials 0.000 abstract 1
- 229910006069 SO3H Inorganic materials 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 52
- 238000000034 method Methods 0.000 description 45
- 239000000975 dye Substances 0.000 description 31
- 239000000178 monomer Substances 0.000 description 31
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 25
- 125000000524 functional group Chemical group 0.000 description 24
- 229920001577 copolymer Polymers 0.000 description 21
- 125000000217 alkyl group Chemical group 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 15
- 239000002253 acid Substances 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 14
- 150000001875 compounds Chemical class 0.000 description 14
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 13
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 12
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 11
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- 239000000123 paper Substances 0.000 description 10
- 238000007639 printing Methods 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000012986 chain transfer agent Substances 0.000 description 9
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 9
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- 239000003505 polymerization initiator Substances 0.000 description 9
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 8
- 239000002245 particle Substances 0.000 description 8
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 8
- 238000004132 cross linking Methods 0.000 description 7
- 238000003384 imaging method Methods 0.000 description 7
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 6
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 6
- 239000011259 mixed solution Substances 0.000 description 6
- 238000012552 review Methods 0.000 description 6
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 6
- 125000003944 tolyl group Chemical group 0.000 description 6
- 229920000178 Acrylic resin Polymers 0.000 description 5
- 239000004925 Acrylic resin Substances 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- 125000001931 aliphatic group Chemical group 0.000 description 5
- 125000000068 chlorophenyl group Chemical group 0.000 description 5
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 5
- 230000009477 glass transition Effects 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 230000014759 maintenance of location Effects 0.000 description 5
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 5
- 239000011976 maleic acid Substances 0.000 description 5
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 4
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 4
- LRFVTYWOQMYALW-UHFFFAOYSA-N 9H-xanthine Chemical compound O=C1NC(=O)NC2=C1NC=N2 LRFVTYWOQMYALW-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- 150000001408 amides Chemical class 0.000 description 4
- 125000004799 bromophenyl group Chemical group 0.000 description 4
- 125000004803 chlorobenzyl group Chemical group 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N chloroform Substances ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000007334 copolymerization reaction Methods 0.000 description 4
- 239000003431 cross linking reagent Substances 0.000 description 4
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 125000005647 linker group Chemical group 0.000 description 4
- 125000006178 methyl benzyl group Chemical group 0.000 description 4
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 4
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 3
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 235000010724 Wisteria floribunda Nutrition 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 150000008064 anhydrides Chemical class 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 150000001735 carboxylic acids Chemical class 0.000 description 3
- 229960001701 chloroform Drugs 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical class C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 3
- 125000004802 cyanophenyl group Chemical group 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 125000004188 dichlorophenyl group Chemical group 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- LGRFSURHDFAFJT-UHFFFAOYSA-N phthalic anhydride Chemical group C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000010526 radical polymerization reaction Methods 0.000 description 3
- 230000001235 sensitizing effect Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 3
- 125000005023 xylyl group Chemical group 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- BVLWNRIJQBINQL-UHFFFAOYSA-N 2,4-dimethyl-3-oxopent-4-enoic acid Chemical compound OC(=O)C(C)C(=O)C(C)=C BVLWNRIJQBINQL-UHFFFAOYSA-N 0.000 description 2
- PMNLUUOXGOOLSP-UHFFFAOYSA-N 2-mercaptopropanoic acid Chemical compound CC(S)C(O)=O PMNLUUOXGOOLSP-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 239000002174 Styrene-butadiene Substances 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 229920000180 alkyd Polymers 0.000 description 2
- MDPILPRLPQYEEN-UHFFFAOYSA-N aluminium arsenide Chemical compound [As]#[Al] MDPILPRLPQYEEN-UHFFFAOYSA-N 0.000 description 2
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 2
- 125000001246 bromo group Chemical group Br* 0.000 description 2
- 125000006278 bromobenzyl group Chemical group 0.000 description 2
- 229950005228 bromoform Drugs 0.000 description 2
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- 125000005626 carbonium group Chemical group 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229920006026 co-polymeric resin Polymers 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 238000000586 desensitisation Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 239000011115 styrene butadiene Substances 0.000 description 2
- 229920003048 styrene butadiene rubber Polymers 0.000 description 2
- 150000003440 styrenes Chemical class 0.000 description 2
- 125000003107 substituted aryl group Chemical group 0.000 description 2
- 238000010189 synthetic method Methods 0.000 description 2
- 229920001897 terpolymer Polymers 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
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- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 229940017219 methyl propionate Drugs 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- CNPHCSFIDKZQAK-UHFFFAOYSA-N n-prop-2-enylprop-2-enamide Chemical compound C=CCNC(=O)C=C CNPHCSFIDKZQAK-UHFFFAOYSA-N 0.000 description 1
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 150000004989 p-phenylenediamines Chemical class 0.000 description 1
- HVAMZGADVCBITI-UHFFFAOYSA-N pent-4-enoic acid Chemical compound OC(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-N 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 150000008442 polyphenolic compounds Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229930187593 rose bengal Natural products 0.000 description 1
- 229940081623 rose bengal Drugs 0.000 description 1
- STRXNPAVPKGJQR-UHFFFAOYSA-N rose bengal A Natural products O1C(=O)C(C(=CC=C2Cl)Cl)=C2C21C1=CC(I)=C(O)C(I)=C1OC1=C(I)C(O)=C(I)C=C21 STRXNPAVPKGJQR-UHFFFAOYSA-N 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 125000005017 substituted alkenyl group Chemical group 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- RINCXYDBBGOEEQ-UHFFFAOYSA-N succinic anhydride Chemical group O=C1CCC(=O)O1 RINCXYDBBGOEEQ-UHFFFAOYSA-N 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004634 thermosetting polymer Substances 0.000 description 1
- FIDKFEIEZJGDBE-UHFFFAOYSA-N thieno[2,3-c]furan-4,6-dione Chemical group S1C=CC2=C1C(=O)OC2=O FIDKFEIEZJGDBE-UHFFFAOYSA-N 0.000 description 1
- NJRXVEJTAYWCQJ-UHFFFAOYSA-N thiomalic acid Chemical compound OC(=O)CC(S)C(O)=O NJRXVEJTAYWCQJ-UHFFFAOYSA-N 0.000 description 1
- NBOMNTLFRHMDEZ-UHFFFAOYSA-N thiosalicylic acid Chemical compound OC(=O)C1=CC=CC=C1S NBOMNTLFRHMDEZ-UHFFFAOYSA-N 0.000 description 1
- 229940103494 thiosalicylic acid Drugs 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- YIYBQIKDCADOSF-ONEGZZNKSA-N trans-pent-2-enoic acid Chemical compound CC\C=C\C(O)=O YIYBQIKDCADOSF-ONEGZZNKSA-N 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0528—Macromolecular bonding materials
- G03G5/0592—Macromolecular compounds characterised by their structure or by their chemical properties, e.g. block polymers, reticulated polymers, molecular weight, acidity
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0528—Macromolecular bonding materials
- G03G5/0532—Macromolecular bonding materials obtained by reactions only involving carbon-to-carbon unsatured bonds
- G03G5/0546—Polymers comprising at least one carboxyl radical, e.g. polyacrylic acid, polycrotonic acid, polymaleic acid; Derivatives thereof, e.g. their esters, salts, anhydrides, nitriles, amides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0528—Macromolecular bonding materials
- G03G5/0589—Macromolecular compounds characterised by specific side-chain substituents or end groups
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は電子写真感光体に関し、詳しくは静電特性及び
耐湿性に優れた電子写真感光体に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an electrophotographic photoreceptor, and more particularly to an electrophotographic photoreceptor having excellent electrostatic properties and moisture resistance.
特にCPC感光体として性能の優れたものに関する。In particular, it relates to a CPC photoreceptor with excellent performance.
(従来の技術)
電子写真感光体は、所定の特性を得るため、あるいは適
用される電子写真プロセスの種類に応じて、種々の構成
をとる。(Prior Art) Electrophotographic photoreceptors have various configurations in order to obtain predetermined characteristics or depending on the type of electrophotographic process to which they are applied.
電子写真感光体の代表的なものとして、支持体上に光導
電層が形成されている感光体及び表面に絶縁層を備えた
感光体があり、広く用いられている。As representative electrophotographic photoreceptors, there are photoreceptors having a photoconductive layer formed on a support and photoreceptors having an insulating layer on the surface, which are widely used.
支持体と少なくとも1つの光導電層から構成される感光
体は、最も一般的な電子写真プロセスによる、即ち帯電
、画像露光及び現像、更に必要に応じて転写による画像
形成に用いられる。Photoreceptors, consisting of a support and at least one photoconductive layer, are used for imaging by most common electrophotographic processes, ie, charging, imagewise exposure and development, and optionally transfer.
更には、ダイレクト製版用のオフセット原版として電子
写真感光体を用いる方法が広(実用されている。特に近
年、ダイレクト電子写真平板は数百枚から数十枚程度の
印刷枚数で高画質の印刷物を印刷する方式として重要と
なってきている。Furthermore, the method of using an electrophotographic photoreceptor as an offset master plate for direct plate making is widely used (in practical use).In recent years in particular, direct electrophotographic plates have been used to produce high-quality printed matter with a print count of several hundred to several dozen sheets. This is becoming an important printing method.
電子写真感光体の光導電層を形成するために使用する結
合剤は、それ自体の成膜性および光導電性粉体の結合剤
中への分散能力が優れるとともに、形成された記録体層
の基材に対する接着性が良好であり、しかも記録体層の
光導電層は帯電能力に優れ、暗減衰が小さく、光減衰が
大きく、前露光疲労が少なく、且つ、撮像時の湿度の変
化によってこれら特性を安定に保持していることが必要
である等の各種の静電特性および優れた撮像性を具備す
る必要がある。The binder used to form the photoconductive layer of the electrophotographic photoreceptor has excellent film-forming properties and the ability to disperse photoconductive powder into the binder, and also has excellent properties in the formation of the formed recording layer. It has good adhesion to the substrate, and the photoconductive layer of the recording layer has excellent charging ability, low dark decay, large light decay, and little pre-exposure fatigue. It is necessary to have various electrostatic properties such as stable properties and excellent imaging performance.
古くから公知の樹脂として、例えばシリコーン樹脂(特
公昭34−6670号)、スチレン−ブタジェン樹脂(
特公昭35−1960号)、アルキッド樹脂、マレイン
酸樹脂、ポリアミド(特公昭35−11219号)酢酸
ビニル樹脂(特公昭41−2425号)、酢酸ビニル共
重合体(特公昭41−2426号)、アクリル樹脂(特
公昭3541216号)、アクリル酸エステル共重合体
(例えば特公昭35−11219号、特公昭36−85
10号、特公昭41−13946号等)等が知られてい
る。Examples of resins that have been known for a long time include silicone resin (Japanese Patent Publication No. 34-6670), styrene-butadiene resin (
(Japanese Patent Publication No. 35-1960), alkyd resin, maleic acid resin, polyamide (Japanese Patent Publication No. 35-11219), vinyl acetate resin (Japanese Patent Publication No. 41-2425), vinyl acetate copolymer (Japanese Patent Publication No. 41-2426), Acrylic resin (Japanese Patent Publication No. 3541216), acrylic acid ester copolymer (e.g. Japanese Patent Publication No. 35-11219, Japanese Patent Publication No. 36-85)
No. 10, Japanese Patent Publication No. 41-13946, etc.) are known.
しかし、これらの樹脂を用いた電子写真感光材料におい
ては、1)光導電性粉体との親和性が不足し、塗工液の
分散性が不良となる。2)光導電層の帯電性が低い、3
)複写画像の画像部(特に網点再現性・解像力)の品質
が悪い、4)複写画像作成時の環境(例えば高温高温、
低温低湿等)にその画質が影響されやすい、等のいずれ
かの問題があった。However, electrophotographic light-sensitive materials using these resins lack 1) affinity with photoconductive powder, resulting in poor dispersibility of the coating solution. 2) Low chargeability of the photoconductive layer, 3
) The quality of the image area of the copied image (especially halftone reproducibility and resolution) is poor; 4) The environment at which the copied image was created (e.g. high temperature,
The problem was that the image quality was easily affected by low temperatures (low temperature, low humidity, etc.).
光導電層の静電特性の改良方法として種々の方法が提案
されており、その1つの方法として、例えば、芳香族環
又はフラン環にカルボキシル基又はニトロ基を含有する
化合物、あるいはジカルボン酸の無水物を更に組合せて
、光導電層に共存させる方法が特公昭42−6878号
及び特公昭45−3073号に開示されている。しかし
、これらの方法によって改良された感光材料でもその静
電特性は充分でなく、特に光減衰特性の優れたものは得
られていない。そこでこの感光材料の感度不足を改良す
るために、光導電層中に増感色素を多量に加える方法が
従来とられてきたが、このような方法によって作製され
た感光材料は、白色度が著しく劣化し、記録体としての
品質低下を生じ、場合によっては感光材料の暗減衰の劣
化を起こし、充分な複写画像が得られな(なってしまう
という問題を有していた。Various methods have been proposed to improve the electrostatic properties of the photoconductive layer, and one such method is to use a compound containing a carboxyl group or a nitro group in an aromatic ring or a furan ring, or a dicarboxylic acid anhydride. Japanese Patent Publication No. 42-6878 and Japanese Patent Publication No. 45-3073 disclose a method of further combining materials to coexist in a photoconductive layer. However, even the photosensitive materials improved by these methods do not have sufficient electrostatic properties, and none particularly have excellent light attenuation properties. Therefore, in order to improve the lack of sensitivity of this photosensitive material, a method of adding a large amount of sensitizing dye to the photoconductive layer has been conventionally used, but the photosensitive materials produced by this method have a remarkable whiteness. This causes deterioration in the quality of the recording medium, and in some cases causes deterioration in the dark decay of the photosensitive material, resulting in the problem that a sufficient copy image cannot be obtained.
一方、光導電層に用いる結着樹脂として樹脂の平均分子
量を調節して用いる方法が特開昭6010254号に開
示されている。即ち、酸価4〜50のアクリル樹脂で平
均分子量が103〜104の分布の成分のものと104
〜2X105の分布の成分のものを併用することにより
、静電特性(特にrpc 5元体としての繰り返し再現
性)、耐湿性等を改良する技術が記載されている。On the other hand, Japanese Patent Laid-Open No. 6010254 discloses a method of adjusting the average molecular weight of a resin used as a binder resin for a photoconductive layer. That is, acrylic resin with an acid value of 4 to 50 and an average molecular weight distribution of 103 to 104;
A technique has been described for improving electrostatic properties (particularly repeatability as an RPC pentamer), moisture resistance, etc. by using together components having a distribution of ~2X105.
更に、電子写真感光体を用いた平版印刷用原版の研究が
鋭意行なわれており、電子写真感光体としての静電特性
と印刷原版としての印刷特性を両立させた光導電層用の
結着樹脂として、例えば、特公昭50−31011号で
は、フマル酸存在下で(メタ)アクリレート系モノマー
と他のモノマーと共重合させた、Mwl、8〜10 X
10’でTglO〜80°Cの樹脂と、(メタ)アク
リレート系モノマーとフマル酸以外の他のモノマーとか
ら成る共重合体とを併用したもの、又特開昭53−54
027号では、カルボン酸基をエステル結合から少なく
とも原子数7個離れて有する置換基をもつ(メタ)アク
リル酸エステルを含む三元共重合体を用いるもの、又特
開昭5420735号・特開昭57−202544号で
は、アクリル酸及びヒドロキシエチル(メタ)アクリレ
ートを含む4元又は5元共重合体を用いるもの、又特開
昭58−68046号では、炭素数6〜12のアルキル
基を置換基とする(メタ)アクリル酸エステル及びカル
ボン酸含有のビニルモノマーを含む3元共重合体を用い
るもの等が光導電層の不惑脂化性の向上に効果があると
記載されている。Furthermore, research is being carried out on lithographic printing original plates using electrophotographic photoreceptors, and a binder resin for the photoconductive layer that has both the electrostatic properties of an electrophotographic photoreceptor and the printing properties of a printing original plate has been developed. For example, in Japanese Patent Publication No. 50-31011, a (meth)acrylate monomer and other monomers are copolymerized in the presence of fumaric acid, Mwl, 8 to 10
10' and a TglO~80°C resin and a copolymer consisting of a (meth)acrylate monomer and a monomer other than fumaric acid, and JP-A-53-54
In No. 027, a terpolymer containing a (meth)acrylic acid ester having a substituent having a carboxylic acid group separated from an ester bond by at least 7 atoms is used; No. 57-202544 uses a quaternary or quinary copolymer containing acrylic acid and hydroxyethyl (meth)acrylate, and JP-A-58-68046 uses an alkyl group having 6 to 12 carbon atoms as a substituent. It is described that a terpolymer containing a (meth)acrylic acid ester and a carboxylic acid-containing vinyl monomer is effective in improving the fat resistance of the photoconductive layer.
しかし、上記した静電特性・耐湿特性に効果があるとさ
れる樹脂であっても、現実に評価してみると特に帯電性
、暗電荷保持性、光感度の如き静電特性、光導電層の平
滑性等に問題があり、実用上満足できるものではなく、
又、電子写真式平版印刷用原版として開発されたとする
結着樹脂においても、現実に評価してみると前記の静電
特性、印刷物の地汚れ、更には耐湿特性等に問題があっ
た。However, even if the resin is said to be effective in the above-mentioned electrostatic properties and moisture resistance properties, when actually evaluated, it is found that the electrostatic properties such as chargeability, dark charge retention, photosensitivity, photoconductive layer, etc. There are problems with the smoothness, etc., and it is not practically satisfactory.
Furthermore, even in the case of a binder resin which is said to have been developed as an original plate for electrophotographic planographic printing, when actually evaluated, there were problems with the above-mentioned electrostatic properties, scumming of printed matter, moisture resistance properties, etc.
更に、これらの問題点を解決するために、結着樹脂とし
て酸性基を含有する共重合成分を0.05〜10重量%
含有する低分子量の樹脂(MwlO’〜104)を用い
ることにより、光導電層の平滑性及び静電特性を良好に
し、しかも地汚れのない両賞を得ることが特開昭63−
217354号に、更にかかる低分子量樹脂を高分子量
の樹脂(MwlO’以上)と組合せて用いることにより
、上記特性を阻害せずに光導電層の膜強度を充分ならし
め耐刷性を向上させることが特願昭63−49817号
、特開昭63220148号及び同63−220149
号に記載されている。Furthermore, in order to solve these problems, 0.05 to 10% by weight of a copolymer component containing acidic groups was added as a binder resin.
By using a low molecular weight resin (MwlO'~104), the smoothness and electrostatic properties of the photoconductive layer can be improved, and in addition, it is possible to obtain both awards without background smearing.
No. 217354 further discloses that by using such a low molecular weight resin in combination with a high molecular weight resin (MwlO' or higher), the film strength of the photoconductive layer can be made sufficient without impeding the above characteristics, and the printing durability can be improved. Japanese Patent Application No. 63-49817, JP-A No. 63220148 and 63-220149
listed in the number.
(発明が解決しようとする課題)
しかしながら、これらの樹脂を用いても、環境が高温・
高温から低温・低湿まで著しく変動した場合における安
定した性能の維持においてはいまだ不充分であることが
判った。特に半導体レーザー光を用いたスキャニング露
光方式では、従来の可視光による全面同時露光方式に比
べ、露光時間が長くなり、また露光強度にも制約がある
ことから、静電特性、特に暗電荷保持性、光感度に対し
て、より高い性能が要求される。(Problem to be solved by the invention) However, even when these resins are used, the environment is high temperature and
It has been found that it is still insufficient to maintain stable performance when the temperature fluctuates significantly from high temperature to low temperature and low humidity. In particular, scanning exposure methods using semiconductor laser light require longer exposure times than conventional simultaneous exposure methods using visible light across the entire surface, and there are restrictions on exposure intensity. , higher performance is required in terms of photosensitivity.
本発明は、以上の様な従来の電子写真感光体の有する課
題を改良するものである。The present invention is intended to improve the problems of conventional electrophotographic photoreceptors as described above.
本発明の目的は、複写画像形成時の環境が低温低湿ある
いは高温高湿の如く変動した場合でも、安定して良好な
静電特性を維持し、鮮明で良質な画像を有する電子写真
感光体を提供することである。An object of the present invention is to provide an electrophotographic photoreceptor that stably maintains good electrostatic properties and produces clear, high-quality images even when the environment during copy image formation changes such as low temperature and low humidity or high temperature and high humidity. It is to provide.
本発明の他の目的は、静電特性に優れ且つ環境依存性の
小さいcpc電子写真感光体を提供することである。Another object of the present invention is to provide a CPC electrophotographic photoreceptor with excellent electrostatic properties and low environmental dependence.
本発明の他の目的は、半導体レーザー光を用いたスキャ
ニング露光方式に有効な電子写真感光体を提供すること
である。Another object of the present invention is to provide an electrophotographic photoreceptor that is effective in a scanning exposure method using semiconductor laser light.
(課題を解決するための手段)
前記の課題は、無機光導電材料及び結着樹脂を少なくと
も含有する光導電層を有する電子写真感光体において、
該結着樹脂が下記樹脂〔A〕の少なくとも1種及び下記
樹脂〔B〕の少なくとも1種を含有することを特徴とす
る電子写真感光体により解決されることが見出された。(Means for Solving the Problems) The above-mentioned problems provide an electrophotographic photoreceptor having a photoconductive layer containing at least an inorganic photoconductive material and a binder resin.
It has been found that the problem can be solved by an electrophotographic photoreceptor characterized in that the binder resin contains at least one of the following resins [A] and at least one of the following resins [B].
樹脂〔A〕
1×103〜2×104の重量平均分子量を有し、下記
式(1)又は式(II)で示される少なくとも1つの繰
り返し単位を30重量%以上重合成分として含有する重
合体であり、且つ重合体主鎖の片末端ニ(7)ミーPO
,82基、−3O3H基、−Coo)I基、P−OH基
、(Rは炭素数1〜10の炭化水素基又は−OR’
(R’は炭素数1−10の炭化水素基を示す)を示す)
、−SO基及びフェノール性oH基の酸性基並びに環状
酸無水物含有基のうちの少なくとも1つの置換基を結合
して成る樹脂。Resin [A] A polymer having a weight average molecular weight of 1 x 103 to 2 x 104 and containing at least 30% by weight of at least one repeating unit represented by the following formula (1) or formula (II) as a polymerization component. Yes, and one terminal of the polymer main chain has 2 (7) Mi PO
, 82 groups, -3O3H groups, -Coo) I groups, P-OH groups, (R is a hydrocarbon group having 1 to 10 carbon atoms or -OR'
(R' represents a hydrocarbon group having 1 to 10 carbon atoms)
, a -SO group, an acidic group of a phenolic oH group, and a cyclic acid anhydride-containing group.
〔式中、Xl及びx2は互いに独立に、それぞれ水素原
子、炭素数1〜10の炭化水素基、塩素原子、臭素原子
、〜coy、又は−COOY2 (Yl及びY2は各
々炭素数1〜IOの炭化水素基を示す)を表わす。但し
、Xlとx2がともに水素原子を表わすことはない。[In the formula, Xl and x2 are each independently a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, a chlorine atom, a bromine atom, ~coy, or -COOY2 (Yl and Y2 are each independently a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, (represents a hydrocarbon group). However, both Xl and x2 do not represent hydrogen atoms.
−及びW2はそれぞれ−COO−とベンゼン環を結合す
る、直接結合又は連結原子数1〜4個の連結基を表わす
。〕
樹脂〔B]
5X10’以上の重量平均分子量を有し、下記−数式(
III)で示される繰り返し単位を重合体成分として少
なくとも含有し、且つ架橋構造を有する樹脂。- and W2 each represent a direct bond or a linking group having 1 to 4 linked atoms that connects -COO- to the benzene ring. ] Resin [B] has a weight average molecular weight of 5X10' or more, and has the following formula (
A resin containing at least a repeating unit represented by III) as a polymer component and having a crosslinked structure.
一般式(II[) a、 a。General formula (II[) a, a.
〔式中、Tは CH2COO ■は炭素数1 al及びa2は、 各々水素原子、 COOOCOCHzOco− 〇−又は−3O□−を表わす。[In the formula, T is CH2COO ■ is carbon number 1 al and a2 are each hydrogen atom, COOOOCOCHzOco- Represents 〇- or -3O□-.
〜22の炭化水素基を表わす。~22 hydrocarbon groups.
互いに同じでも異なってもよく、
ハロゲン原子、シアノ基、炭素数
1〜8の炭化水素基、−coo−z又は炭素数1〜8の
炭化水素基を介した一COO−Z (Zは炭素数1〜1
8の炭化水素基を表わす)を表わす。〕
更に、樹脂〔B〕が、更に、少なくとも1つの重合体主
鎖の片末端のみに−P(ht(z 、5O311、−C
OOII、−0R1−S)l。-COO-Z (Z is the number of carbon atoms 1-1
8) represents a hydrocarbon group. ] Furthermore, the resin [B] further contains -P(ht(z, 5O311, -C
OOII, -0R1-S)l.
(b+、b2は同じでも異なってもよく、水素原子又は
炭化水素基を表わす)から選択されろ少なくとも1つの
極性基を結合して成る樹脂であることが好ましく、更に
は樹脂〔B〕は、樹脂〔A〕で示される酸性基又は環状
酸無水物含有基を含有する繰り返し単位を重合体成分と
して含有しない樹脂であることがより好ましい。(b+, b2 may be the same or different and represent a hydrogen atom or a hydrocarbon group) It is preferable that the resin is formed by bonding at least one polar group, and furthermore, the resin [B] is It is more preferable that the resin does not contain a repeating unit containing an acidic group or a cyclic acid anhydride-containing group represented by resin [A] as a polymer component.
即ち、本発明に供される結着樹脂は、特定の置換基をも
つメタクリレート重合成分を含有し、更に重合体主鎖の
末端に酸性基及び/又は環状酸無水物含有基(以下本明
細書中では特にことわらない限り酸性基の語の中に環状
酸無水物含有基も含むものとする)を結合して成る低分
子量の樹脂〔A〕と、少なくとも一部が架橋された高分
子量の樹脂〔B〕とから少なくとも構成される。樹脂〔
B〕は好ましくは特定の極性基を重合体主鎖の少なくと
も1つの片末端にのみ結合した樹脂(以下樹脂〔B′〕
と称することもある)であり、更に好ましくは樹脂〔A
〕にて示される酸性基を重合体の側鎖には含有しない。That is, the binder resin used in the present invention contains a methacrylate polymerization component having a specific substituent, and further contains an acidic group and/or a cyclic acid anhydride-containing group (hereinafter referred to herein as a cyclic acid anhydride-containing group) at the end of the main chain of the polymer. Among them, unless otherwise specified, the term acidic group includes a cyclic acid anhydride-containing group) [A], a low molecular weight resin [A], and a high molecular weight resin [A], which is at least partially crosslinked. B]. resin〔
B] is preferably a resin in which a specific polar group is bonded only to at least one end of the polymer main chain (hereinafter referred to as resin [B']).
), more preferably resin [A
The side chain of the polymer does not contain the acidic group shown in ].
本発明において、特定の置換基をもつメタクリレート共
重合成分を含有する酸性基末端結合樹脂〔A〕は、樹脂
中の重合体主鎖の末端に結合する酸性基が無機光導電体
の化学量論的な欠陥に吸着し、且つ低分子量体であるこ
とから、光導電体の表面の被覆性を向上させることで光
導電体のトラップを補償すると共に湿度特性を飛躍的に
向上させる一方、光導電体の分散が充分に行なわれ、凝
集を抑制するとともに、高温・高温から低温・低湿まで
環境変化が著しく変動しても安定した高性能の電子写真
特性を維持することが判った。そして樹脂〔B〕は、樹
脂〔A〕を用いたことによる上記の電子写真特性の高性
能を全く阻害せずに、樹脂[A]のみでは不充分な光導
電層の機械的強度を充分ならしめるものである。In the present invention, the acidic group-terminated resin [A] containing a methacrylate copolymerization component having a specific substituent has an acidic group bonded to the end of the polymer main chain in the resin that has a stoichiometry of the inorganic photoconductor. Because it adsorbs to the defects of the photoconductor and has a low molecular weight, it improves the coverage of the surface of the photoconductor, compensating for the trap of the photoconductor and dramatically improving the humidity characteristics. It was found that the particles were sufficiently dispersed, agglomeration was suppressed, and stable, high-performance electrophotographic properties were maintained even when the environment varied significantly from high temperature and high temperature to low temperature and low humidity. Resin [B] does not impede the above-mentioned high performance electrophotographic properties due to the use of resin [A], and has sufficient mechanical strength of the photoconductive layer, which is insufficient with resin [A] alone. It is something to tighten.
本発明の樹脂〔B〕は、適度に架橋され、更に、樹脂〔
B′〕は主鎖の片末端にのみ極性基を結合した共重合体
であることから、高分子鎖間の相互作用更には極性基と
光導電性粒子との弱い相互作用等が相乗作用して、電子
写真特性及び膜強度において著しく優れた性能を両立し
ているものと考えられる。特に、半導体レーザーを用い
たスキャニング露光方式を用いる場合に有効である。The resin [B] of the present invention is appropriately crosslinked, and furthermore, the resin [B]
B'] is a copolymer with a polar group bonded only to one end of the main chain, so interactions between polymer chains and weak interactions between polar groups and photoconductive particles act synergistically. Therefore, it is considered that the film achieves both extremely excellent performance in terms of electrophotographic properties and film strength. This is particularly effective when using a scanning exposure method using a semiconductor laser.
一方、樹脂〔B〕中に樹脂〔A〕に示されると同様の酸
性基が含有されると光導電体の分散が破壊され、凝集物
あるいは沈澱物が生成するかあるいはたとえ塗膜ができ
たとしても、得られた光導電体の静電特性は著しく低下
してしまったり、感光体表面の平滑度が粗くなり機械的
摩耗に対する強度等が悪化してしまうため好ましくない
。On the other hand, if resin [B] contains acidic groups similar to those shown in resin [A], the dispersion of the photoconductor is destroyed, and aggregates or precipitates are formed, or even a coating film is formed. However, it is not preferable because the electrostatic properties of the obtained photoconductor are significantly deteriorated, the smoothness of the surface of the photoconductor becomes rough, and the strength against mechanical abrasion is deteriorated.
更に、本発明における低分子量体の樹脂〔A〕のみを結
着樹脂として用いる場合にも、光導電体と結着樹脂が充
分に吸着し、粒子表面を被覆し得るため、光導電層の平
滑性及び静電特性において良好で、地汚れのない、しか
も環境依存性の少ない画質が得られ得るが、その膜強度
がいまだ充分ではなく、耐久性において満足すべき結果
が得られない。Furthermore, even when only the low molecular weight resin [A] in the present invention is used as the binder resin, the photoconductor and the binder resin can sufficiently adsorb and coat the particle surface, resulting in a smooth photoconductive layer. Although it is possible to obtain image quality that is good in terms of electrostatic properties and electrostatic properties, is free from background smearing, and is less dependent on the environment, the film strength is still insufficient and satisfactory results cannot be obtained in terms of durability.
本発明の樹脂を用いた場合に無機光導電体と結着樹脂の
吸着・被覆の相互作用が適切に行なわれ、環境依存性が
少なく、且つ光導電層の膜強度が保持されるものである
。When the resin of the present invention is used, the adsorption and coating interaction between the inorganic photoconductor and the binder resin is properly performed, there is little environmental dependence, and the film strength of the photoconductive layer is maintained. .
樹脂〔A〕において、重量平均分子量はlXl0”〜2
×104、好ましくは3X10’〜1×104、式(I
)又は式(n)の繰り返し単位に相当する重合成分又は
共重合成分(以下(i)と称することもある)の存在割
合は30重量%以上、好ましくは50〜97重景%、重
合体主鎖の末端に結合する酸性基の樹脂〔A〕中におけ
る存在割合は0.5〜15重量%、好ましくは1〜10
重量%である。また、樹脂〔A)のガラス転移点は好ま
しくは一10°C〜100°C1より好ましくは一5°
C〜80°Cである。In the resin [A], the weight average molecular weight is lXl0''~2
×104, preferably 3X10′ to 1×104, formula (I
) or the repeating unit of formula (n) (hereinafter sometimes referred to as (i)), the proportion of the polymer component or copolymer component (hereinafter sometimes referred to as (i)) is 30% by weight or more, preferably 50 to 97% by weight, and the polymer is mainly The proportion of the acidic group bonded to the end of the chain in the resin [A] is 0.5 to 15% by weight, preferably 1 to 10% by weight.
Weight%. Further, the glass transition point of the resin [A) is preferably -10°C to 100°C, more preferably -15°C.
C to 80°C.
樹脂〔A〕の分子量がlXl0’より小さくなると、皮
膜形成能が低下し十分な膜強度が保てない。When the molecular weight of the resin [A] is smaller than 1X10', the film forming ability decreases and sufficient film strength cannot be maintained.
一方分子量が2×104より大きくなると電子写真特性
(特に初期電位、暗減衰保持率)が劣化するため好まし
くない。特にかかる高分子量体の場合に酸性基含有量が
3%を越えるとかかる電子写真特性の劣化が著しく、オ
フセットマスターとして用いたときに地汚れが顕著とな
る。On the other hand, if the molecular weight is greater than 2×10 4 , electrophotographic properties (especially initial potential and dark decay retention) deteriorate, which is not preferable. Particularly in the case of such a high molecular weight material, if the content of acidic groups exceeds 3%, the electrophotographic properties deteriorate significantly, and when used as an offset master, background smudge becomes noticeable.
樹脂[A)における酸性基含有量が0.5重量%より少
ないと、初期電位が低くて充分な画像濃度を得ることが
できない。一方該酸性基含有量が15重量%より多いと
、分散性が低下し、膜平滑度及び電子写真特性の高温特
性が低下し、更にオフセ、7トマスターとして用いると
きに地汚れが増大する。If the acidic group content in the resin [A) is less than 0.5% by weight, the initial potential will be low and sufficient image density will not be obtained. On the other hand, if the content of acidic groups is more than 15% by weight, the dispersibility decreases, the film smoothness and the high-temperature electrophotographic properties decrease, and furthermore, background smearing increases when used as an offset or 7-tooth master.
本発明の樹脂〔A〕は、式(1)又は式(II)で示さ
れる繰り返し単位を重合成分(又は共重合成分)として
含有し、更に酸性基を重合体主鎖の末端に結合して成る
。式(1)又は式(II)で示される各繰り返し単位は
、樹脂〔A〕中に2種以上含有されていてもよい。The resin [A] of the present invention contains a repeating unit represented by formula (1) or formula (II) as a polymerization component (or copolymerization component), and further has an acidic group bonded to the terminal of the polymer main chain. Become. Two or more types of each repeating unit represented by formula (1) or formula (II) may be contained in resin [A].
弐N)において、好ましいX、及び×2として、それぞ
れ、水素原子、塩素原子及び臭素原子のほかに、好まし
い炭化水素基として、炭素数1〜4のアルキル基(例え
ばメチル基、エチル基、プロピル基、ブチル基等)、炭
素数7〜9のアラルキル基(例えばベンジル基、フェネ
チル基、3−フェニルプロピル基、クロロベンジル基、
ジクロロベンジル基、ブロモベンジル基、メチルベンジ
ル基、メトキシベンジル基、クロロ−メチル−ベンジル
基等)及びアリール基(例えばフェニル基、トリル基、
シリル基、ブロモフェニル基、メトキシフェニル基、ク
ロロフェニル基、ジクロロフェニル基等)、並びに−C
OY 、及び−COOYz (好ましいYl及びv2
としては上記好ましい炭化水素基として記載したものを
挙げることができる)を挙げることができる。但し、×
1とX2がともに水素原子を表わすことはない。2N), preferable X and x2 include hydrogen, chlorine, and bromine atoms, respectively, and preferable hydrocarbon groups include alkyl groups having 1 to 4 carbon atoms (e.g., methyl group, ethyl group, propyl group). group, butyl group, etc.), aralkyl group having 7 to 9 carbon atoms (e.g., benzyl group, phenethyl group, 3-phenylpropyl group, chlorobenzyl group,
dichlorobenzyl group, bromobenzyl group, methylbenzyl group, methoxybenzyl group, chloro-methyl-benzyl group, etc.) and aryl groups (e.g. phenyl group, tolyl group,
silyl group, bromophenyl group, methoxyphenyl group, chlorophenyl group, dichlorophenyl group, etc.), and -C
OY, and -COOYz (preferred Yl and v2
Examples of the hydrocarbon group include those described above as the preferred hydrocarbon group. However, ×
Both 1 and X2 do not represent hydrogen atoms.
式(1)において、凱は、−COO−とベンゼン環を結
合する、直接結合又は−←CH2−h−(nは1〜3の
整数を表わす) 、CIIzCIIzOCO責−CII
zO廿(mは1又は2の整数を表わす)、CIl□CH
20−等の如き連結原子数1〜4個の連結基を表わす。In formula (1), Kai is a direct bond connecting -COO- and a benzene ring, or -←CH2-h- (n represents an integer of 1 to 3), CIIzCIIzOCO-CII
zO廿(m represents an integer of 1 or 2), CIl□CH
Represents a linking group having 1 to 4 linking atoms, such as 20-.
式(II)におけるWzは讐、と同一の内容を表わす。Wz in formula (II) represents the same content as .
本発明の樹脂〔A〕で用いられる、式(1)又は(II
)で示される繰り返し単位(i)の具体例を以下に挙げ
る。しかし、本発明の範囲は、これらに限定されるもの
ではない。Formula (1) or (II) used in the resin [A] of the present invention
) Specific examples of the repeating unit (i) are listed below. However, the scope of the present invention is not limited thereto.
し205 し! C1l。205 death! C1l.
し■3 しりし+13 P−OH基、環状酸無水物含有基を挙げることがOR’ できる。■3 Shirishi+13 OR' includes P-OH group and cyclic acid anhydride-containing group. can.
また、本発明の樹脂〔A〕における重合体主鎖の末端に
結合する酸性基において、好ましい酸性基としては、−
P03H2基、−5(hl+基、−COOI+基、I<
(R’は炭化水素基を表わす)を表わし、R及びR′は
好ましくは炭素数1〜22の脂肪族基(例えば、メチル
基、エチル基、プロピル基、ブチル基、ヘキシル基、オ
クチル基、デシル基、ドデシル基、オクタデシル基、2
−クロロエチル基、2−メトキシエチル基、3−エトキ
シプロピル基、アリル基、クロトニル基、フチニル基、
シクロヘキシル基、ベンジル基、フェネチル基、3−フ
ェニルプロピル基、メチルベンジル基、クロロベンジル
基、フロロベンジル基、メトキシベンジル基等)、又は
置換されてもよいアリール基(例えば、フェニル基、ト
リル基、エチルフェニル基、プロピルフェニル基、クロ
ロフェニル基、フロロフェニル基、ブロモフェニル基、
クロロ−メチル−フェニル基、ジクロロフェニル基、メ
トキシフェニル基、シアノフェニル基、アセトアミドフ
ェニル基、アセチルフェニル基、ブトキシフェニル基等
)等を表わす。Further, among the acidic groups bonded to the terminals of the polymer main chain in the resin [A] of the present invention, preferred acidic groups include -
P03H2 group, -5 (hl+ group, -COOI+ group, I<(R' represents a hydrocarbon group), and R and R' are preferably an aliphatic group having 1 to 22 carbon atoms (for example, a methyl group, Ethyl group, propyl group, butyl group, hexyl group, octyl group, decyl group, dodecyl group, octadecyl group, 2
-chloroethyl group, 2-methoxyethyl group, 3-ethoxypropyl group, allyl group, crotonyl group, futhynyl group,
cyclohexyl group, benzyl group, phenethyl group, 3-phenylpropyl group, methylbenzyl group, chlorobenzyl group, fluorobenzyl group, methoxybenzyl group, etc.), or an optionally substituted aryl group (for example, phenyl group, tolyl group, Ethylphenyl group, propylphenyl group, chlorophenyl group, fluorophenyl group, bromophenyl group,
chloro-methyl-phenyl group, dichlorophenyl group, methoxyphenyl group, cyanophenyl group, acetamidophenyl group, acetylphenyl group, butoxyphenyl group, etc.).
また、環状酸無水物含有基とは、少なくとも1つの環状
酸無水物を含有する基であり、含有される環状酸無水物
としては、脂肪族ジカルボン酸無水物、芳香族ジカルボ
ン酸無水物が挙げられる。In addition, the cyclic acid anhydride-containing group is a group containing at least one cyclic acid anhydride, and examples of the cyclic acid anhydride include aliphatic dicarboxylic acid anhydride and aromatic dicarboxylic acid anhydride. It will be done.
脂肪族ジカルボン酸無水物の例としては、コハク酸無水
物環、グルタコン酸無水物環、マレイン酸無水物環、シ
クロペンクン−1,2−ジカルボン酸無水物環、シクロ
ヘキサン−1,2−ジカルボン酸無水物環、シクロヘキ
セン−1,2−ジカルボン酸無水物環、2.3−ビシク
ロ(2,2,2)オクタンジカルボン酸無水物環等が挙
げられ、これらの環は、例えば塩素原子、臭素原子等の
ハロゲン原子、メチル基、エチル基、ブチル基、ヘキシ
ル基等のアルキル基等が置換されていてもよい。Examples of aliphatic dicarboxylic anhydrides include succinic anhydride ring, glutaconic anhydride ring, maleic anhydride ring, cyclopencune-1,2-dicarboxylic anhydride ring, and cyclohexane-1,2-dicarboxylic anhydride ring. These rings include, for example, chlorine atom, bromine atom, etc. may be substituted with a halogen atom, an alkyl group such as a methyl group, an ethyl group, a butyl group, or a hexyl group.
又、芳香族ジカルボン酸無水物の例としては、フタル酸
無水物環、ナフタレン−ジカルボン酸無水物環、ピリジ
ン−ジカルボン酸無水物環、チオフェン−ジカルボン酸
無水物環等が挙げられ、これらの環は、例えば、塩素原
子、臭素原子等のハロゲン原子、メチル基、エチル基、
プロピル基、ブチル基等のアルキル基、ヒドロキシル基
、シアノ基、ニトロ基、アルコキシカルボニル基(アル
コキシ基としては、例えば、メトキシ基、エトキシ基等
)等が置換されていてもよい。Examples of aromatic dicarboxylic anhydrides include phthalic anhydride rings, naphthalene-dicarboxylic anhydride rings, pyridine-dicarboxylic anhydride rings, thiophene-dicarboxylic anhydride rings, etc. For example, halogen atoms such as chlorine atom and bromine atom, methyl group, ethyl group,
It may be substituted with an alkyl group such as a propyl group or a butyl group, a hydroxyl group, a cyano group, a nitro group, an alkoxycarbonyl group (for example, a methoxy group, an ethoxy group, etc.).
本発明の重合体は、少なくとも上記式(1)又は(n)
の重合成分からなる重合体の主鎖の末端に上記酸性基を
結合させるように合成すればよい。The polymer of the present invention has at least the above formula (1) or (n)
The acidic group may be synthesized by bonding the acidic group to the end of the main chain of the polymer consisting of the polymerization component.
具体的には、該酸性基又は後に変換して該酸性基に変え
ることのできる官能基を含有する重合開始剤を用いる方
法、あるいは該酸性基又は後に該酸性基に変換できる官
能基を含有する連鎖移動剤を用いる方法、前記両者を併
用する方法、更には、アニオン重合法において停止反応
を利用し、該官能基を導入する方法等を用いて製造する
ことができる。Specifically, a method using a polymerization initiator containing the acidic group or a functional group that can be converted later into the acidic group, or a method using a polymerization initiator containing the acidic group or a functional group that can be converted later into the acidic group. It can be produced by a method using a chain transfer agent, a method using a combination of the above two, and a method in which the functional group is introduced by utilizing a termination reaction in an anionic polymerization method.
例えば、P、 Dreyfu3s、 R,P、 Gui
rk、 Encycl。For example, P, Dreyfu3s, R,P, Gui
rk, Encycle.
Polym、 Sci、 Eng、 7. 55
H1987) 、V、 Percec。Polym, Sci, Eng, 7. 55
H1987), V. Percec.
Appl、 Polym、 Sci、 285
95(1985) 、P、 F、 Rempp。Appl, Polym, Sci, 285
95 (1985), P. F. Rempp.
E、 Franta、 Adv、 Polym、
Sci、 58. H1984) 、Y。E, Franta, Adv, Polym,
Sci, 58. H1984), Y.
Yamashita、 J、 Appl、 Po
lym、 Sci、 Appl、 Polym。Yamashita, J., Appl, Po.
lym, Sci, Appl, Polym.
Symp、 36. 193(1981) 、R,A
sami、 M、 Takaki。Symp, 36. 193 (1981), R.A.
sami, M., and Takaki.
Makromol、 5upp1.12 163(19
85)等の創設引例の合成方法によって製造することが
できる。Makromol, 5upp1.12 163 (19
It can be produced by the synthetic method of the founding citation such as 85).
更に、本発明の樹脂〔A〕は、前記した一般式(I)又
は(If)の繰り返し単位に相当する単量体とともに、
これら以外の他の単量体を共重合成分として含有しても
よい。Furthermore, the resin [A] of the present invention contains a monomer corresponding to the repeating unit of general formula (I) or (If) described above,
Other monomers other than these may be contained as copolymerization components.
例えば、α−オレフィン類、アルカン酸ビニル又はアリ
ルエステル類、アクリロニトリル、メタクリロニトリル
、ビニルエーテル類、アクリル酸エステル類、メタクリ
ル酸エステル類、アクリルアミド類、メタクリルアミド
類、スチレン類、複素環ビニル類(例えばビニルピロリ
ドン、ビニルピリジン、ビニルイミダゾール、ビニルチ
オフェン、ビニルイミダシリン、ビニルピラゾール、ビ
ニルジオキサン、ビニルキノリン、ビニルチアゾール、
ビニルオキサジン等)等が挙げられる。For example, α-olefins, vinyl alkanoates or allyl esters, acrylonitrile, methacrylonitrile, vinyl ethers, acrylic esters, methacrylic esters, acrylamides, methacrylamides, styrenes, heterocyclic vinyls (e.g. Vinylpyrrolidone, vinylpyridine, vinylimidazole, vinylthiophene, vinylimidacillin, vinylpyrazole, vinyldioxane, vinylquinoline, vinylthiazole,
vinyloxazine, etc.).
一方、樹脂〔B〕は−数式(III)で示される繰り返
し単位を少なくとも1種含有する重合体で、かつ重合体
の一部が架橋された重量平均分子量が5X10’以上の
樹脂であり、より好ましくは重量平均分子量8 XIO
’〜6X10’である。On the other hand, the resin [B] is a polymer containing at least one type of repeating unit represented by the formula (III), and a resin having a weight average molecular weight of 5×10' or more with a part of the polymer crosslinked, and more Preferably weight average molecular weight 8XIO
'~6X10'.
樹脂(B〕のガラス転移点は好ましくは0°C〜120
°Cの範囲、より好ましくは10°C〜95°Cである
。The glass transition point of the resin (B) is preferably 0°C to 120°C.
℃ range, more preferably 10°C to 95°C.
樹脂〔B〕の重量平均分子量が5X10’未満となると
、膜強度が不充分となってくる。又、樹脂〔B〕の重量
平均分子量が上記の好ましい上限値を超えると、有機溶
媒の溶解性が殆んどなくなり、実際上使用できなくなる
ため、好ましくない。When the weight average molecular weight of the resin [B] is less than 5×10′, the film strength becomes insufficient. Furthermore, if the weight average molecular weight of the resin [B] exceeds the above-mentioned preferred upper limit, it is not preferable because it has almost no solubility in organic solvents and becomes practically unusable.
本発明の樹脂〔B〕は、前記した物性を満たし、重合体
の一部分が架橋され、更に、−e式(II[)で示され
る繰返、し単位の中から選ばれた重合体成分を、ホモ重
合体成分としてまたは一般式(III)で示される繰返
し単位に相当する単量体と共重合し得る他の単量体との
共重合体成分として、含有する重合体又は共重合体であ
る。The resin [B] of the present invention satisfies the physical properties described above, has a part of the polymer crosslinked, and further contains a polymer component selected from repeating units represented by the -e formula (II [)]. , as a homopolymer component or as a copolymer component with another monomer that can be copolymerized with the monomer corresponding to the repeating unit represented by general formula (III). be.
一般式(I[[)で示される繰返し単位において、炭化
水素基は置換されていてもよい。In the repeating unit represented by the general formula (I[[), the hydrocarbon group may be substituted.
−数式(I[[)において、Tは好ましくは−COOO
COCHzOCO−−C02COO−又は−〇−を表わ
し、より好ましくは−COOCH2C00−又は0−を
表わす。- In the formula (I[[), T is preferably -COOO
COCHZOCO--C02COO- or -0-, more preferably -COOCH2C00- or 0-.
■は好ましくは炭素数1〜18の置換されていてもよい
炭化水素基を表わす。置換基としては上記重合体主鎖の
片末端に結合する極性基以外の置換基であればいずれで
もよく、例えば、ハロゲン原子(例えば、フッ素原子、
塩素原子、臭素原子等)、0−■3、 Coo−Vz、
−oco−v3、(v、 〜v:lは、炭素数6〜22
のアルキル基を表わし、例えばヘキシル基、オクチル基
、デシル基、ドデシル基、ヘキサデシル基、オクタデシ
ル基等である)等の置換基が挙げられる。好ましい炭化
水素基としては、炭素数1〜18の置換されてもよいア
ルキル基(例えば、メチル基、エチル基、プロピル基、
ブチル基、へ7”lL4、ヘキシル基、オクチル基、デ
シル基、ドデシル基、ヘキサデシル基、オクタデシル基
、2−クロロエチル基、2−ブロモエチル基、2−シア
ンエチル基、2−メトキシカルボニルエチル基、2−メ
トキシエチル基、3−ブロモプロピル基等)、炭素数4
〜18の置換されてもよいアルケニル75 C例えば、
2−メチル−1−プロペニル基、2−ブテニル基、2−
ペンテニル基、3−メチル−2−ペンテニル!、1−ペ
ンテニルL 1−へキセニル基、2−へキセニル基、
4−メチル−2へキセニル基等)、炭素数7〜12の置
換されてもよいアラルキル基(例えば、ベンジル基、フ
ェネチル基、3−フェニルプロピル基、ナフチルメチル
基、2−ナフチルエチル基、クロロベンジル基、ブロモ
ベンジル基、メチルベンジル基、エチルベンジル基、メ
トキシベンジル基、ジメチルベンジル基、ジメトキシベ
ンジル基等)、炭素数5〜8の置換されてもよい脂環式
基(例えば、シクロヘキシル基、2−シクロヘキシルエ
チル基、2シクロペンチルエチル基等)又は炭素数6〜
12の置換されてもよい芳香族基(例えば、フェニル基
、ナフチル基、トリル基、キシリル基、プロピルフェニ
ル基、ブチルフェニル基、オクチルフェニル基、ドデシ
ルフェニル基、メトキシフェニル基、エトキシフェニル
基、ブトキシフェニル基、デシルオキシフェニル基、ク
ロロフェニル基、ジクロロフェニル基、ブロモフェニル
基、シアノフェニル基、アセチルフェニル基、メトキシ
カルボニルフェニル基、エトキシカルボニルフェニル基
、ブトキシカルボニルフェニル基、アセトアミドフェニ
ル基、プロピオアミドフェニル基、ドブシロイルアミド
フェニル基等)があげられる。(2) preferably represents an optionally substituted hydrocarbon group having 1 to 18 carbon atoms. The substituent may be any substituent other than the polar group bonded to one end of the main chain of the polymer, such as a halogen atom (e.g., a fluorine atom,
chlorine atom, bromine atom, etc.), 0-■3, Coo-Vz,
-oco-v3, (v, ~v:l has 6 to 22 carbon atoms
represents an alkyl group such as a hexyl group, an octyl group, a decyl group, a dodecyl group, a hexadecyl group, an octadecyl group, and the like. Preferred hydrocarbon groups include optionally substituted alkyl groups having 1 to 18 carbon atoms (for example, methyl group, ethyl group, propyl group,
Butyl group, hexyl group, octyl group, decyl group, dodecyl group, hexadecyl group, octadecyl group, 2-chloroethyl group, 2-bromoethyl group, 2-cyanethyl group, 2-methoxycarbonylethyl group, 2 -methoxyethyl group, 3-bromopropyl group, etc.), carbon number 4
-18 optionally substituted alkenyl 75C e.g.
2-methyl-1-propenyl group, 2-butenyl group, 2-
Pentenyl group, 3-methyl-2-pentenyl! , 1-pentenyl L 1-hexenyl group, 2-hexenyl group,
4-methyl-2hexenyl group, etc.), optionally substituted aralkyl groups having 7 to 12 carbon atoms (e.g., benzyl group, phenethyl group, 3-phenylpropyl group, naphthylmethyl group, 2-naphthylethyl group, chloro benzyl group, bromobenzyl group, methylbenzyl group, ethylbenzyl group, methoxybenzyl group, dimethylbenzyl group, dimethoxybenzyl group, etc.), optionally substituted alicyclic groups having 5 to 8 carbon atoms (for example, cyclohexyl group, 2-cyclohexylethyl group, 2cyclopentylethyl group, etc.) or carbon number 6-
12 optionally substituted aromatic groups (e.g., phenyl group, naphthyl group, tolyl group, xylyl group, propylphenyl group, butylphenyl group, octylphenyl group, dodecylphenyl group, methoxyphenyl group, ethoxyphenyl group, butoxy Phenyl group, decyloxyphenyl group, chlorophenyl group, dichlorophenyl group, bromophenyl group, cyanophenyl group, acetylphenyl group, methoxycarbonylphenyl group, ethoxycarbonylphenyl group, butoxycarbonylphenyl group, acetamidophenyl group, propioamidophenyl group , dobcyroylamidophenyl group, etc.).
al、a2は、互いに同じでも異なってもよく、好まし
くは水素原子、ハロゲン原子(例えば、フッ素原子、塩
素原子、臭素原子等)、シアノ基、炭素数1〜3のアル
キル基、−coo−z又は−C112COO−Z(Zは
好ましくは炭素数1〜22の脂肪族基を表わす)を表わ
す。より好ましくは、all、azは、互いに同じでも
異なってもよく、水素原子、炭素数1〜3のアルキル基
(例えば、メチル基、エチル基、プロピル基等) 、−
coo−z又は−C02COO−Z (Zはより好まし
くは炭素数1〜18のアルキル基又はアルケニル基を表
わし、例えば、メチル基、エチル基、プロピル基、ブチ
ル基、ヘキシル基、オクチル基、デシル基、ドデシル基
、トリデシル基、テトラデシル基、ヘキサデシル基、オ
クタデシル基、ペンテニル基、ヘキセニル基、オクテニ
ル基、デセニル基等が挙げられ、これらアルキル基、ア
ルケニル基は前記■で示したと同様の置換基を有してい
てもよい)を表わす。al and a2 may be the same or different, and are preferably a hydrogen atom, a halogen atom (e.g., a fluorine atom, a chlorine atom, a bromine atom, etc.), a cyano group, an alkyl group having 1 to 3 carbon atoms, -coo-z or -C112COO-Z (Z preferably represents an aliphatic group having 1 to 22 carbon atoms). More preferably, all and az may be the same or different, and are a hydrogen atom, an alkyl group having 1 to 3 carbon atoms (for example, a methyl group, an ethyl group, a propyl group, etc.), -
coo-z or -C02COO-Z (Z more preferably represents an alkyl group or alkenyl group having 1 to 18 carbon atoms, such as a methyl group, ethyl group, propyl group, butyl group, hexyl group, octyl group, decyl group) , dodecyl group, tridecyl group, tetradecyl group, hexadecyl group, octadecyl group, pentenyl group, hexenyl group, octenyl group, decenyl group, etc., and these alkyl groups and alkenyl groups have the same substituents as shown in (1) above. ).
樹脂〔B〕において、重合体中に架橋構造を導入する方
法としては通常知られている方法を利用することができ
る。即ち、単量体の重合反応において多官能性単量体を
共存させて重合する方法及び重合体中に架橋反応を進行
する官能基を含有させ高分子反応で架橋する方法である
。In resin [B], a commonly known method can be used to introduce a crosslinked structure into the polymer. That is, there are two methods: a method in which a polyfunctional monomer is coexisting in the polymerization reaction of monomers, and a method in which a functional group that promotes a crosslinking reaction is contained in the polymer and crosslinked by a polymer reaction.
本発明の樹脂〔B〕は、製造方法が簡便なこと(例えば
、長時間の反応を要する、反応が定量的でない、反応促
進助剤を用いる等で不純物が混入する等の問題が少ない
)等から、自己橋かけ反応をする官能基: C0NH
CH20R+1 (ROは水素原子又はアルキル基を表
わす)による、あるいは、重合による橋かけ反応が有効
である。The resin [B] of the present invention has a simple manufacturing method (for example, it requires a long reaction time, the reaction is not quantitative, and there are few problems such as contamination of impurities due to the use of reaction accelerators, etc.). , a functional group that undergoes a self-crosslinking reaction: C0NH
Cross-linking reactions using CH20R+1 (RO represents a hydrogen atom or an alkyl group) or polymerization are effective.
重合反応性基の場合には、好ましくは重合性官能基を2
個以上有する単量体を上記した式(I)の単量体ととに
重合することでポリマー鎖間を橋架けする方法が好まし
い。In the case of a polymerization-reactive group, the polymerizable functional group is preferably 2
Preferred is a method in which polymer chains are bridged by polymerizing a monomer having 1 or more monomers with the monomer of formula (I) described above.
集合性官能基として具体的に、CI(2=C11I
C1h=CH−Ctl□−0−C−1CH□=CH−N
lIC0−CI□=CII−CHz−NHCO−1C1
h−CH−3O□−1CIl□=Cl−COCl1□=
Cll−0−1CH2=CH−3−等を挙げることがで
きるが、上記の重合性官能基を2個以上有する単量体は
、これらの重合性官能基を同一のものあるいは異なった
ものを2個以上有する単量体であればよい。Specifically, as the aggregating functional group, CI (2=C11I C1h=CH-Ctl□-0-C-1CH□=CH-N
lIC0-CI□=CII-CHz-NHCO-1C1
h-CH-3O□-1CIl□=Cl-COCl1□=
Cll-0-1CH2=CH-3-, etc., but monomers having two or more of the above polymerizable functional groups may contain two or more of the same or different polymerizable functional groups. It is sufficient if the monomer has at least one of these.
重合性官能基を2個以上有した単量体の具体例は、例え
ば同一の重合性官能基を有する単量体として、ジビニル
ベンゼン、トリビニルベンゼン等のスチレン誘導体:多
価アルコール(例えば、エチレングリコール、ジエチレ
ングリコール、トリエチレングリコール、ポリエチレン
グリコール#200 、#400、田600.1.3−
プチレンゲリコ〜ル、ネオペンチルグリコール、ジプロ
ピレングリコール、ポリプロピレングリコール、トリメ
チロールプロパン、トリメチロールエタン、ペンタエリ
スリ1−−ルなど)又はポリヒドロキシフェノール(例
えばヒドロキノン、レゾルシン、カテコールおよびそれ
らの誘導体)のメタクリル酸、アクリル酸又はクロトン
酸のエステル類、ビニルエーテル類又はアリルエーテル
類:二塩基酸(例えばマロン酸、コハク酸、グルタル酸
、アジピン酸、ピメリン酸、マレイン酸、フタル酸、イ
タコン酸等)のビニルエステル類、アリルエステル類、
ビニルアミド類又はアリルアミド類:ポリアミン(例え
ばエチレンジアミン、1,3−プロピレンジアミン、■
、4−ブチレンジアミン等)とビニル基を含有するカル
ボン酸(例えば、メタクリル酸、アクリル酸、クロトン
酸、アリル酢酸等)との縮合体などが挙げられる。Specific examples of monomers having two or more polymerizable functional groups include styrene derivatives such as divinylbenzene and trivinylbenzene; polyhydric alcohols (e.g. ethylene Glycol, diethylene glycol, triethylene glycol, polyethylene glycol #200, #400, 600.1.3-
methacrylic acid of polyhydroxyphenols (e.g. hydroquinone, resorcinol, catechol and their derivatives); Acrylic acid or crotonic acid esters, vinyl ethers or allyl ethers: vinyl esters of dibasic acids (e.g. malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, maleic acid, phthalic acid, itaconic acid, etc.) , allyl esters,
Vinylamides or allylamides: polyamines (e.g. ethylenediamine, 1,3-propylenediamine,
, 4-butylene diamine, etc.) and a vinyl group-containing carboxylic acid (for example, methacrylic acid, acrylic acid, crotonic acid, allyl acetic acid, etc.).
又、異なる重合性官能基を有する単量体として、例えば
、ビニル基を含有するカルボン酸〔例えば、メタクリル
酸、アクリル酸、メタクリロイル酢酸、アクリロイル酢
酸、メタクリロイルプロピオン酸、アクリロイルプロピ
オン酸、イタコニロイル酢酸、イタコニロイルプロピオ
ン酸、カルボン酸無水物とアルコール又はアミンの反応
体(例えばアリルオキシカルボニルプロピオン酸、アリ
ルオキシカルボニル酢酸、2−アリルオキシカルボニル
安息香酸、アリルアミノカルボニルプロピオン酸等)等
〕のビニル基を含有するエステル誘導体又はアミド誘導
体(例えば、メタクリル酸ビニル、アクリル酸ビニル、
イタコン酸ビニル、メタクリル酸アリル、アクリル酸ア
リル、イタコン酸アリル、メタクリロイル酢酸ビニル、
メタクリロイルプロピオン酸ビニル、メタクリロイルプ
ロピオン酸アリル、メタクリル酸ビニルオキシカルボニ
ルメチルエステル、アクリル酸ビニルオキシカルボニル
メチルオキシカルボニルエチレンエステル、N−アリル
アクリルアミド、N−アリルメタクリルアミド、N−ア
リルイタコン酸アミド、メタクリロイルプロピオン酸ア
リルアミド等)又はアミノアルコール類(例えばアミノ
エタノール、1−アミノプロパツール、1−アミノブタ
ノール、1−アミノヘキサノール、2−アミノブタノー
ル等)と、ビニル基を含有したカルボン酸の縮合体など
が挙げられる。In addition, monomers having different polymerizable functional groups include, for example, carboxylic acids containing vinyl groups [e.g., methacrylic acid, acrylic acid, methacryloyl acetic acid, acryloyl acetic acid, methacryloylpropionic acid, acryloylpropionic acid, itaconyloyl acetic acid, itaco Niloylpropionic acid, reactants of carboxylic acid anhydride and alcohol or amine (e.g. allyloxycarbonylpropionic acid, allyloxycarbonylacetic acid, 2-allyloxycarbonylbenzoic acid, allylaminocarbonylpropionic acid, etc.)) Containing ester derivatives or amide derivatives (e.g. vinyl methacrylate, vinyl acrylate,
Vinyl itaconate, allyl methacrylate, allyl acrylate, allyl itaconate, vinyl methacryloyl acetate,
Vinyl methacryloylpropionate, allyl methacryloylpropionate, vinyloxycarbonylmethyl methacrylate, vinyloxycarbonylmethyloxycarbonyl ethylene ester acrylate, N-allylacrylamide, N-allylmethacrylamide, N-allylitaconamide, methacryloylpropionic acid allylamide, etc.) or amino alcohols (e.g., aminoethanol, 1-aminopropanol, 1-aminobutanol, 1-aminohexanol, 2-aminobutanol, etc.) and a condensate of a vinyl group-containing carboxylic acid. .
本発明では、これらの2個以上の重合性官能基を有する
単量体を、全単量体の20重世%以下用いて重合するこ
とにより本発明の部分的に架橋された樹脂(BEを形成
することができる。更に好ましくは該単量体を、後述の
連鎖移動剤で末端に極性基を導入する方法で合成する樹
脂の場合には15重量%以下、それ以外の場合には5重
量%以下とすることが好ましい。In the present invention, the partially crosslinked resin of the present invention (BE More preferably, the monomer is 15% by weight or less in the case of a resin synthesized by a method of introducing a polar group at the terminal with a chain transfer agent described below, and 5% by weight in other cases. % or less.
一方、樹脂〔B〕が末端極性基を含有しない場合(後述
の樹脂〔B′〕でない場合)には、熱及び/又は光で硬
化反応を起こす架橋性官能基を含有する樹脂を用いて樹
脂〔B〕に架橋構造を形成させてもよい。On the other hand, if the resin [B] does not contain a terminal polar group (not the resin [B'] described below), a resin containing a crosslinkable functional group that causes a curing reaction with heat and/or light may be used. A crosslinked structure may be formed in [B].
該官能基は、分子間で化学反応を生じ化学結合を形成し
得るものであればいずれでもよい。即ち、縮合反応、付
加反応等による分子間の結合あるいは重合反応による架
橋等を熱及び/又は光によって生じさせる反応様式を利
用することができる。The functional group may be any functional group as long as it can cause a chemical reaction between molecules and form a chemical bond. That is, it is possible to use a reaction mode in which bonding between molecules by condensation reaction, addition reaction, etc. or crosslinking by polymerization reaction is caused by heat and/or light.
具体的には、解離性の水素原子を有する官能基H
(R1は炭素数1〜18のアルキル基、好ましくは炭素
数1〜6のアルキル基(例えば、メチル基、エチル基、
プロピル基、ブチル基、ヘキシル基等)、炭素数7〜1
1のアラルキル基(例えばベンジル基、フェネチル基、
メチルベンジル基、クロロベンジル基、メトキシベンジ
ル基等)もしくは炭素数6〜12のアリール基(例えば
フェニル基、トリル基、キシリル基、メシチレン基、ク
ロロフェニル基、エチルフェニル基、メトキシフェニル
基、ナフチル基等)又は−OR,基(R2はR,で示し
た上記炭化水素基と同一の内容を表わす)を表わす)
、−O1+基、−SR基、−NHR,基(R1は、水素
原子又はメチル基、エチル基、プロピル基、ブチル基等
の如き炭素数1〜4のアルキル基を表わす)〕とから各
々選ばれた官能基の組合せを少なくとも1組含有する場
合あるいは、−CONHCH20R,(R4は水素原子
又はメチル基、エチル基、プロピル基、ブチル基、ヘキ
シル基等の如き炭素数1〜6のアルキル基を表わす)又
は重合性二重結合基等を含有する場合が挙げられる。Specifically, a functional group H having a dissociable hydrogen atom (R1 is an alkyl group having 1 to 18 carbon atoms, preferably an alkyl group having 1 to 6 carbon atoms (for example, a methyl group, an ethyl group,
propyl group, butyl group, hexyl group, etc.), carbon number 7-1
1 aralkyl group (e.g. benzyl group, phenethyl group,
methylbenzyl group, chlorobenzyl group, methoxybenzyl group, etc.) or an aryl group having 6 to 12 carbon atoms (e.g., phenyl group, tolyl group, xylyl group, mesitylene group, chlorophenyl group, ethylphenyl group, methoxyphenyl group, naphthyl group, etc.) ) or -OR, a group (R2 represents the same content as the above hydrocarbon group indicated by R))
, -O1+ group, -SR group, -NHR, group (R1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms such as methyl group, ethyl group, propyl group, butyl group)] or -CONHCH20R, (R4 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms such as a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, etc.) ) or a polymerizable double bond group.
該重合性二重結合基として具体的には、前記の重合性官
能基の具体例として挙げたものを挙げることができる。Specific examples of the polymerizable double bond group include those mentioned above as specific examples of the polymerizable functional group.
更には、例えば、遠藤剛、「熱硬化性高分子の精密化J
(C,M、C味、1986年刊)、原崎勇次、「最
新バインダー技術便覧」第1I−1章(総合技術センタ
ー、1985年刊)、大津随行「アクリル樹脂の合成・
設計と新用途開発」 (中部経営開発センター出版部、
1985年刊)、大森英三「機能性アクリル系樹脂」
(テクノシステム1985年刊)乾英夫、永松元太部、
「感光性高分子」 (講談社、1977年刊)、角田隆
弘、「新・感光性樹脂」 (印刷学会出版部、1981
年刊) 、G、E、Green and、 B、 P。Furthermore, for example, Tsuyoshi Endo, “Refinement of Thermosetting Polymers J.
(C, M, C Aji, 1986), Yuji Harasaki, “Latest Binder Technology Handbook” Chapter 1I-1 (General Technology Center, 1985), Otsu Accompanying “Synthesis of Acrylic Resin.
"Design and New Application Development" (Chubu Business Development Center Publishing Department,
(published in 1985), Eizo Omori “Functional Acrylic Resin”
(Technosystem, published in 1985) Hideo Inui, Gentabe Nagamatsu,
"Photosensitive Polymer" (Kodansha, 1977), Takahiro Tsunoda, "New Photosensitive Resin" (Printing Society Publishing Department, 1981)
Annual), G, E, Green and, B, P.
5tar R,J、Macro、Sci Revs M
acro、Chem、、 C21(2)+187〜27
3(1981〜82)、 C,G、Roffey、 r
Photopolymerization of 5u
rface Coatings」(A、 WileyT
nters−cience Pub、 1982年刊)
等の総説に引例された官能基・化合物等を用いることが
できる。5tar R, J, Macro, Sci Revs M
acro, Chem,, C21(2)+187~27
3 (1981-82), C.G., Roffey, r.
Photopolymerization of 5u
rface Coatings” (A, WileyT
(Published in 1982)
Functional groups, compounds, etc. cited in the reviews of et al. can be used.
これらの架橋性官能基は、一つの共重合体成分中に含有
されていてもよいし、別個の共重合体成分中に含有させ
て架橋反応を行なってもよい。These crosslinkable functional groups may be contained in one copolymer component, or may be contained in separate copolymer components to carry out the crosslinking reaction.
これらの架橋性官能基を含有する共重合体成分に相当す
る単量体の具体的なものとしては、例えば、−a式(I
[[)の単量体と共重合し得る該官能基を含有するビニ
ル系化合物を挙げることができる。Specific monomers corresponding to the copolymer component containing these crosslinkable functional groups include, for example, -a formula (I
Examples include vinyl compounds containing the functional group that can be copolymerized with the monomer [[).
例えば、高分子学会績「高分子データ・ハンドブック〔
基礎編〕」培風館(1986刊)等に記載さている。具
体的には、アクリル酸、α及び/又はβ置換アクリル酸
(例えばα−アセトキシ体、αアセトキシメチル体、α
−(2−アミノメチル体、α−クロロ体、α−ブロモ体
、α−フロロ体、α−トリブチルシリル体、α−シアノ
体、β−クロロ体、β−ブロモ体、α−クロロ−β−メ
トキシ体、α、β−ジクロロ体等)、メタクリル酸、イ
タコン酸、イタコン酸半エステル類、イタコン酸半アミ
ド類、クロトン酸、2−アルケニルカルボン酸類(例え
ば2−ペンテン酸、2−メチル2−ヘキセン酸、2−オ
クテン酸、4−メチル2−ヘキセン酸、4−エチル−2
−オクテン酸等)、マレイン酸、マレイン酸半エステル
類、マレイン酸半アミド類、ビニルベンゼンカルボン酸
、ビニルベンゼンスルホン酸、ビニルスルポン酸、ビニ
ルホスホ酸、ジカルボン酸類のビニル基又はアリル基の
半エステル誘導体、及びこれらのカルボン酸又はスルホ
ン酸のエステル誘導体、アミド誘導体の置換基中に該架
橋性官能基を含有する化合物等が挙げられる。For example, see the Polymer Data Handbook published by the Polymer Science Society of Japan.
Basic Edition] Baifukan (published in 1986), etc. Specifically, acrylic acid, α- and/or β-substituted acrylic acid (e.g. α-acetoxy form, α-acetoxymethyl form, α
-(2-aminomethyl form, α-chloro form, α-bromo form, α-fluoro form, α-tributylsilyl form, α-cyano form, β-chloro form, β-bromo form, α-chloro-β- methoxy, α, β-dichloro, etc.), methacrylic acid, itaconic acid, itaconic acid half esters, itaconic acid half amides, crotonic acid, 2-alkenylcarboxylic acids (e.g. 2-pentenoic acid, 2-methyl 2- Hexenoic acid, 2-octenoic acid, 4-methyl-2-hexenoic acid, 4-ethyl-2
- octenoic acid, etc.), maleic acid, maleic acid half esters, maleic acid half amides, vinyl benzene carboxylic acid, vinyl benzene sulfonic acid, vinyl sulfonic acid, vinyl phosphoric acid, half ester derivatives of vinyl or allyl groups of dicarboxylic acids, and ester derivatives of these carboxylic acids or sulfonic acids, compounds containing the crosslinkable functional group in the substituent of amide derivatives, and the like.
本発明の樹脂〔B〕における上記「架橋性官能基を含有
する共重合体成分」の割合は、該樹脂中好ましくは1〜
80重量%、より好ましくは5〜50重量%である。The proportion of the above-mentioned "copolymer component containing a crosslinkable functional group" in the resin [B] of the present invention is preferably 1 to 1.
It is 80% by weight, more preferably 5 to 50% by weight.
かかる樹脂を製造する際には、架橋反応を促進させるた
めに、必要に応じて、反応促進剤を添加してもよい。例
えば、酸(酢酸、プロピオン酸、酪酸、ベンゼンスルホ
ン酸、p−トルエンスルホン酸等)、過酸化物、アゾビ
ス系化合物、架橋剤、増感剤、光重合性単量体等が挙げ
られる。具体的には、架橋剤としては、具体的には、山
下晋三、金子東助編「架橋剤ハンドブック」大成社刊(
1981年)等に記載されている化合物等を用いること
ができる。例えば、通常用いられる、有機シラン、ポリ
ウレタン、ポリイソシアナートの如き架橋剤、エポキシ
樹脂、メラミン樹脂の如き硬化剤等を用いることができ
る。When producing such a resin, a reaction accelerator may be added as necessary to promote the crosslinking reaction. Examples include acids (acetic acid, propionic acid, butyric acid, benzenesulfonic acid, p-toluenesulfonic acid, etc.), peroxides, azobis compounds, crosslinking agents, sensitizers, photopolymerizable monomers, and the like. Specifically, the crosslinking agent is described in "Crosslinking Agent Handbook" edited by Shinzo Yamashita and Tosuke Kaneko, published by Taiseisha (
(1981) etc. can be used. For example, commonly used crosslinking agents such as organic silanes, polyurethanes, and polyisocyanates, and curing agents such as epoxy resins and melamine resins can be used.
光架橋反応性の官能基を含有する場合には、前記した感
光性樹脂に関する総説に引例された化合物等を用いるこ
とができる。When containing a photocrosslinking-reactive functional group, the compounds cited in the above-mentioned review of photosensitive resins can be used.
また、樹脂〔B〕は、前記した一般式(III)で示さ
れる繰返し単位に相当する単量体及び前記した多官能性
単量体とともに、これら以外の他の単量体(例えば樹脂
〔A〕にて含有され得る他の単量体として前記したもの
)を共重合成分として含有してもよい。In addition, the resin [B] includes a monomer corresponding to the repeating unit represented by the general formula (III) described above and the polyfunctional monomer described above, as well as other monomers other than these (for example, the resin [A ) may be contained as a copolymerization component.
以上の如く、本発明の樹脂〔B〕は、架橋構造を重合体
の少なくとも1部に有することを特徴とするが、更に無
機光導電体及び該結着樹脂を少なくとも含有する光導電
層形成用分散物調整時の有機溶媒に可溶性であることを
必要とする。具体的には、例えばトルエン溶媒100重
量部に対して、温度25°Cにおいて、樹脂〔B〕が少
なくとも5重量部以上溶解するものであればよい。これ
ら塗布用の溶媒としては、ジクロロメタン、ジクロロエ
タン、クロロホルム、メチルクロロホルム、トリクレン
等のハロゲン化炭化水素類、メタノール、エタノール、
プロパツール、ブタノール等のアルコール類、アセトン
、メチルエチルケトン、シクロヘキサノン等のケトン類
、テトラヒドロフラン、ジオキサン等のエーテル類、酢
酸メチル、酢酸エチル、酢酸プロピル、酢酸ブチル、プ
ロピオン酸メチル等のエステル類、エチレングリコール
モノメチルエーテル、2−メトキシエチルアセテート等
のグリコールエーテル類、ベンゼン、トルエン、キシレ
ン、り四ロベンゼン等の芳香族炭化水素類等が挙げられ
、これらは単独で又は混合して使用することができる。As described above, the resin [B] of the present invention is characterized by having a crosslinked structure in at least a part of the polymer, and further contains an inorganic photoconductor and the binder resin for forming a photoconductive layer. It needs to be soluble in the organic solvent used to prepare the dispersion. Specifically, it is sufficient that at least 5 parts by weight of the resin [B] can be dissolved in, for example, 100 parts by weight of the toluene solvent at a temperature of 25°C. Solvents for these applications include halogenated hydrocarbons such as dichloromethane, dichloroethane, chloroform, methylchloroform, trichlene, methanol, ethanol,
Alcohols such as propatool and butanol, ketones such as acetone, methyl ethyl ketone, and cyclohexanone, ethers such as tetrahydrofuran and dioxane, esters such as methyl acetate, ethyl acetate, propyl acetate, butyl acetate, and methyl propionate, ethylene glycol monomethyl Examples include ether, glycol ethers such as 2-methoxyethyl acetate, aromatic hydrocarbons such as benzene, toluene, xylene, and tetralobenzene, and these may be used alone or in combination.
更に、樹脂〔B)の好ましい態様として、一般弐([[
)で示される繰返し単位を少な(とも1種含有する重合
体で、一部が架橋されており、且つ、少なくとも1つの
主鎖の片末端にのみ、 PO31(Z基、−503H基
、−COOI+基、−01l基、−311基、的には前
記Rと同一のものを示す)、環状酸無水物含有基(具体
的には樹脂〔A〕にて記載したと同様の内容を示す)、
基(b、、 b2は同じでも異なっていてもよく、水
素原子又は炭化水素基を示す)から選ばれる少なくとも
一つの極性基を結合して成る重量平均分子15X10’
以上の、好ましくは重量平均分子景8×104〜6X1
05の重合体(以下樹脂〔B′〕とする)を挙げること
ができる。Furthermore, as a preferable embodiment of the resin [B), general 2 ([[
) is a polymer containing a small number of repeating units (both of which are one type), is partially crosslinked, and has PO31 (Z group, -503H group, -COOI+) only at one end of at least one main chain. group, -01l group, -311 group, which is the same as the above R), a cyclic acid anhydride-containing group (specifically, the same content as described in resin [A]), A weight average molecule of 15X10' formed by bonding at least one polar group selected from groups (b, b2 may be the same or different and represent a hydrogen atom or a hydrocarbon group)
or more, preferably a weight average molecular size of 8×104 to 6×1
Polymer No. 05 (hereinafter referred to as resin [B']) can be mentioned.
樹脂〔B′〕のガラス転移点は好ましくはO″C〜12
0°Cの範囲、より好ましくは10°C〜95°Cであ
る。b、及びb2の具体例としては、水素原子のほか炭
素数1〜10の置換されてもよい脂肪族(例えばメチル
基、エチル基、プロピル基、ブチル基、ヘキシル基、オ
クチル基、2−シアノエチル基、2クロロエチル基、2
−エトキシカルボニルエチル基、ベンジル基、フェネチ
ル基、クロロヘンシル基、等)、置換されてもよいアリ
ール基(例えば、フェニル基、トリル基、キシリル基、
クロロフェニル基、ブロモフェニル基、メトキシカルボ
ニルフェニル基、シアノフェニル基等)、等が挙げられ
る。The glass transition point of the resin [B'] is preferably O''C~12
The range is 0°C, more preferably 10°C to 95°C. Specific examples of b and b2 include hydrogen atoms as well as optionally substituted aliphatic groups having 1 to 10 carbon atoms (e.g., methyl group, ethyl group, propyl group, butyl group, hexyl group, octyl group, 2-cyanoethyl group). group, 2 chloroethyl group, 2
-ethoxycarbonylethyl group, benzyl group, phenethyl group, chlorohensyl group, etc.), optionally substituted aryl group (e.g. phenyl group, tolyl group, xylyl group,
chlorophenyl group, bromophenyl group, methoxycarbonylphenyl group, cyanophenyl group, etc.).
また、好ましい末端極性基は、−PO,H□基、C00
11基、−5031+基、−〇11基、−311基、−
P−0110R“
基、−CONl!2基及び−SO□Nl+□基である。Further, preferable terminal polar groups are -PO, H□ group, C00
11 groups, -5031+ groups, -〇11 groups, -311 groups, -
P-0110R" group, -CONl!2 group and -SO□Nl+□ group.
重合体主鎖の片末端のみに結合する前記特定の極性基は
重合体主鎖の一方の末端に直接結合するか、あるいは任
意の連結基を介して結合した化学構造を有する。The specific polar group bonded to only one end of the polymer main chain has a chemical structure in which it is bonded directly to one end of the polymer main chain or via an arbitrary linking group.
結合基としては炭素−炭素結合(−重結合あるいは二重
結合)、炭素−へテロ原子結合(ヘテロ原子としては例
えば、酸素原子、イオウ原子、窒素原子、ケイ素原子等
)、ヘテロ原子−ヘテロ原子結合の原子団の任意の組合
わせで構成されるも素原子、ハロゲン原子(例えば、フ
ッ素原子、塩素原子、臭素原子等)、シアノ基、ヒドロ
キシル基、アルキル基(例えば、メチル基、エチル基、
プロピル基等)等を示す〕、−+Cll=C11+−1
−C−1−N−1−COO−1−SO2−1−CONR
11R13
〔ここでRI3は水素原子、炭素数1〜8の炭化水素基
(例えばメチル基、エチル基、プロピル基、ブチル基、
ペンチル基、ヘキシル基、ベンジル基、フェネチル基、
フェニル基、トリル基等)又はOR+4 (R14は、
RI3の炭化水素基と同一の内容を表す)を表わす〕等
が挙げられる。Bonding groups include carbon-carbon bonds (-double bonds or double bonds), carbon-heteroatom bonds (heteroatoms include, for example, oxygen atoms, sulfur atoms, nitrogen atoms, silicon atoms, etc.), and heteroatoms-heteroatoms. Atom atoms, halogen atoms (e.g., fluorine atoms, chlorine atoms, bromine atoms, etc.), cyano groups, hydroxyl groups, alkyl groups (e.g., methyl groups, ethyl groups,
propyl group, etc.], -+Cll=C11+-1
-C-1-N-1-COO-1-SO2-1-CONR
11R13 [Here, RI3 is a hydrogen atom, a hydrocarbon group having 1 to 8 carbon atoms (for example, a methyl group, an ethyl group, a propyl group, a butyl group,
pentyl group, hexyl group, benzyl group, phenethyl group,
phenyl group, tolyl group, etc.) or OR+4 (R14 is
(represents the same content as the hydrocarbon group of RI3)], etc.
重合体主鎖の少なくとも1つの片末端にのみ特定の極性
基を結合して成る本発明の樹脂〔B〕は、従来公知のア
ニオン重合あるいはカチオン重合によって得られるリビ
ングポリマーの末端に種々の試薬を反応させる方法(イ
オン重合法による方法)、分子中に特定の極性基を含有
する重合開始剤及び/又は連鎖移動剤を用いてラジカル
重合させる方法(ラジカル重合法による方法)、あるい
は以上の如きイオン重合法もしくはラジカル重合法によ
って得られた末端に反応性基含有の重合体を高分子反応
によって本発明の特定の極性基に変換する方法等の合成
法によって容易に製造することができる。The resin [B] of the present invention, in which a specific polar group is bonded to at least one end of the polymer main chain, can be obtained by attaching various reagents to the ends of living polymers obtained by conventionally known anionic or cationic polymerization. A method of reacting (a method using an ionic polymerization method), a method of radical polymerization using a polymerization initiator and/or a chain transfer agent containing a specific polar group in the molecule (a method using a radical polymerization method), or an ion method as described above. It can be easily produced by a synthetic method such as a method in which a polymer containing a reactive group at the end obtained by a polymerization method or a radical polymerization method is converted into the specific polar group of the present invention by a polymer reaction.
具体的には、r’、Dreyfuss、 R,P、Qu
irk、 Encycl。Specifically, r', Dreyfuss, R, P, Qu
irk, Encycl.
Polym、Sci、Eng、−ヱ: 551(198
7) 、中條善樹、山下雄也「染料と薬品」、刈、23
2(1985) 、上田明、永井進「科学と工業」靭、
57 (1986)等の総説及びそれに引用の文献等に
記載の方法によって製造することができる。Polym, Sci, Eng, -e: 551 (198
7) Yoshiki Nakajo, Yuya Yamashita “Dye and Medicine”, Kari, 23
2 (1985), Akira Ueda, Susumu Nagai, “Science and Industry”, Utsubo,
57 (1986) and the literature cited therein.
本発明に用いられる樹脂〔B′]の重合体は、具体的に
は、−数式(IIりで示される繰返し単位に相当する単
量体、前記した架橋構造を形成させるための多官能性単
量体及び片末端に結合させるべき極性基を含有する連鎖
移動剤の混合物を重合開始剤(例えばアゾビス系化合物
、過酸化物等)により重合する方法、あるいは上記連鎖
移動剤を用いずに、該極性基を含有する重合開始剤を用
いて重合する方法、あるいは連鎖移動剤及び重合開始剤
のいずれにも該極性基を含有する化合物を用いる方法、
更には、前記3つの方法において、連鎖移動剤あるいは
重合開始剤の置換基として、アミノ基、ハロゲン原子、
エポキシ基、酸ハライド基等を含有する化合物を用いて
重合反応後、更に高分子反応でこれらの官能基と反応さ
せることで該極性基を導入する方法、等を用いて製造す
ることができる。用いる連鎖移動剤としては、例えば該
極性基あるいは該極性基に誘導しうる置換基を含有する
メルカプト化合物(例えばチオグリコル酸、チオリンゴ
酸、チオサリチル酸、2−メルカプトプロピオン酸、3
−メルカプトプロピオン酸、3−メルカプト酪酸、N−
(2−メルカプトプロピオニル)グリシン、2−メルカ
プトニコチン酸、3− [N (2−メルカプトエチル
)カルバモイル〕プロピオン酸、3− (N−(2−メ
ルカプトエチル)アミノコプロピオン酸、N−(3メル
カプトプロピオニル)アラニン、2−メルカプトエタン
スルホン酸、3−メルカプトプロパンスルホン酸、4−
メルカプトブタンスルホン酸、2−メルカプトエタノー
ル、3−メルカプト−1゜2−プロパンジオール、■−
メルカプトー2−プロパツール、3−メルカプト−2−
ブタノール、メルカプ トラエノール2−メルカプトエ
チルアミン、2−メルカプトイミダゾール、2−メルカ
プト−3ビリジノール等)、あるいは上記極性基又は置
換基を含有するヨード化アルキル化合物(例えばヨード
酢酸、ヨードプロピオン酸、2ヨードエタノール、2−
ヨードエタンスルホン酸、3−ヨード プロパンスルホ
ン酸等)が挙げられる。好ましくはメルカプト化合物が
挙げられる。Specifically, the polymer of the resin [B'] used in the present invention includes - a monomer corresponding to the repeating unit represented by the formula (II), a polyfunctional monomer for forming the above-mentioned crosslinked structure, A method in which a mixture of a chain transfer agent containing a polymer and a polar group to be bonded to one end is polymerized using a polymerization initiator (for example, an azobis compound, a peroxide, etc.), or a method in which the chain transfer agent is polymerized without using the above-mentioned chain transfer agent. A method of polymerization using a polymerization initiator containing a polar group, or a method of using a compound containing the polar group as both a chain transfer agent and a polymerization initiator,
Furthermore, in the above three methods, as a substituent of the chain transfer agent or polymerization initiator, an amino group, a halogen atom,
It can be produced using a method in which a polar group is introduced by performing a polymerization reaction using a compound containing an epoxy group, an acid halide group, etc., and then reacting with these functional groups in a polymer reaction. Examples of the chain transfer agent used include mercapto compounds containing the polar group or a substituent that can be derived from the polar group (e.g., thioglycolic acid, thiomalic acid, thiosalicylic acid, 2-mercaptopropionic acid, 3-mercaptopropionic acid,
-Mercaptopropionic acid, 3-mercaptobutyric acid, N-
(2-mercaptopropionyl)glycine, 2-mercaptonicotinic acid, 3-[N(2-mercaptoethyl)carbamoyl]propionic acid, 3-(N-(2-mercaptoethyl)aminocopropionic acid, N-(3mercaptoethyl)aminocopropionic acid, propionyl)alanine, 2-mercaptoethanesulfonic acid, 3-mercaptopropanesulfonic acid, 4-
Mercaptobutanesulfonic acid, 2-mercaptoethanol, 3-mercapto-1゜2-propanediol, ■-
Mercapto 2-propertool, 3-mercapto-2-
butanol, mercaptotraenol (2-mercaptoethylamine, 2-mercaptoimidazole, 2-mercapto-3-viridinol, etc.), or iodized alkyl compounds containing the above polar groups or substituents (for example, iodoacetic acid, iodopropionic acid, diiodoethanol, 2-
iodoethanesulfonic acid, 3-iodopropanesulfonic acid, etc.). Preferred are mercapto compounds.
これらの連鎖移動剤あるいは重合開始剤は、各々全単量
体100重量部に対して、0.5〜15重量部であり、
好ましくは1〜10重量部である。These chain transfer agents or polymerization initiators are each used in an amount of 0.5 to 15 parts by weight based on 100 parts by weight of the total monomers,
Preferably it is 1 to 10 parts by weight.
本発明では、本発明に従う樹脂〔A〕及び樹脂〔B〕M
B’)も含む)の他に他の樹脂を併用させることもでき
る。それらの樹脂としては、例えば、アルキッド樹脂、
ポリブチラール樹脂、ポリオレフィン類、エチレン−酢
ビ共重合体、スチレン樹脂、スチレン−ブタジェン樹脂
、アクリレートブタジェン樹脂、アルカン酸ビニル樹脂
等が挙げられる。In the present invention, resin [A] and resin [B] M according to the present invention
In addition to B'), other resins can also be used in combination. Examples of such resins include alkyd resins,
Examples include polybutyral resin, polyolefins, ethylene-vinyl acetate copolymer, styrene resin, styrene-butadiene resin, acrylate butadiene resin, vinyl alkanoate resin, and the like.
上記他の樹脂は、本発明の樹脂を用いた全結着樹脂量の
30%(重量比)を越えると本発明の効果(特に静電特
性の向上)が失われる。If the above-mentioned other resin exceeds 30% (weight ratio) of the total binder resin amount using the resin of the present invention, the effects of the present invention (especially improvement in electrostatic properties) will be lost.
本発明に用いる樹脂〔A〕と樹脂〔B〕の使用量の割合
は、使用する無機光導電材料の種類、粒径、表面状態に
よって異なるが一般に樹脂[、A)と樹脂〔B〕の用い
る割合は5〜80対95〜20(重量比)であり、好ま
しくは15〜60対85〜40(重量比)である。The ratio of the amounts of resin [A] and resin [B] used in the present invention varies depending on the type, particle size, and surface condition of the inorganic photoconductive material used, but in general, the ratio of resin [A] and resin [B] used is The ratio is 5-80:95-20 (weight ratio), preferably 15-60:85-40 (weight ratio).
本発明に使用する無機光導電材料としては、酸化亜鉛、
酸化チタン、硫化亜鉛、硫化カドミウム、炭酸カドミウ
ム、セレン化亜鉛、セレン化カドミウム、セレン化テル
ル、硫化鉛等が挙げられる。Inorganic photoconductive materials used in the present invention include zinc oxide,
Examples include titanium oxide, zinc sulfide, cadmium sulfide, cadmium carbonate, zinc selenide, cadmium selenide, tellurium selenide, lead sulfide, and the like.
無機光導電材料に対して用いる結着樹脂の総量は、光導
電対100重量部に対して、結着樹脂を10〜100重
量部なる割合、好ましくは15〜50重量部なる割合で
使用する。The total amount of binder resin used for the inorganic photoconductive material is 10 to 100 parts by weight, preferably 15 to 50 parts by weight, per 100 parts by weight of the photoconductive couple.
本発明では、必要に応じて各種の色素を分光増感剤とし
て併用することができる。例えば、宮本晴視、武井秀彦
、イメージング1973 (No、 8)第12頁、C
,J、Young等、RCA Review 15 4
69(1954)、′清田航平等、電気通信学会論文誌
J 63−C(No、2)、 97(1980)、原崎
勇次等、工業科学雑誌6678及び188(1963)
、谷忠昭、日本写真学会誌剥、208(1972)、等
の総説引例のカーポニウム系色素、ジフェニルメタン色
素、トリフェニルメタン色素、キサンチン系色素、フタ
レイン系色素、ポリメチン色素(例えば、オキソノール
色素、メロシアニン色素、シアニン色素、ログシアニン
色素、スチリル色素等)、フタロシアニン色素(金属含
有してもよい)等が挙げられる。In the present invention, various dyes can be used in combination as spectral sensitizers, if necessary. For example, Harumi Miyamoto, Hidehiko Takei, Imaging 1973 (No. 8) p. 12, C
, J. Young et al., RCA Review 15 4
69 (1954), 'Wataru Kiyota, Journal of the Institute of Electrical Communication J 63-C (No, 2), 97 (1980), Yuji Harasaki et al., Journal of Industrial Science 6678 and 188 (1963)
, Tadaaki Tani, Journal of the Photographic Society of Japan, 208 (1972), etc., carbonium dyes, diphenylmethane dyes, triphenylmethane dyes, xanthine dyes, phthalein dyes, polymethine dyes (e.g., oxonol dyes, merocyanine dyes) , cyanine dye, logocyanine dye, styryl dye, etc.), phthalocyanine dye (which may contain metal), and the like.
更に具体的には、カーボニウム系色素、トリフェニルメ
タン色素、キサンチン系色素、フタレイン系色素を中心
に用いたものとしては、特公昭51452号、特開昭5
0−90334号、特開昭50−114227号、特開
昭53−39130号、特開昭53−82353号、米
国特許筒3,052,540号、米国特許筒4.054
,450号、特開昭57−16456号等に記載のもの
が挙げられる。More specifically, examples using mainly carbonium dyes, triphenylmethane dyes, xanthine dyes, and phthalein dyes include Japanese Patent Publication No. 51452 and Japanese Patent Publication No. 5
0-90334, JP 50-114227, JP 53-39130, JP 53-82353, U.S. Patent No. 3,052,540, U.S. Patent No. 4.054
, No. 450, and JP-A-57-16456.
オキソノール色素、メロシアニン色素、シアニン色素、
ログシアニン色素等のポリメチン色素としては、F、M
、Harmmer rThe Cyanine Dy
es andRelated Compounds 」
等に記載の色素類が使用可能であり、更に具体的には、
米国特許筒3,047,384号、米国特許筒3,11
0,591号、米国特許筒3,121,008号、米国
特許筒3.125.447号、米国特許筒3.128.
179号、米国特許筒3.132,942号、米国特許
筒3,622,317号、英国特許筒1.226.89
2号、英国特許筒1,309,274号、英国特許筒1
.405.898号、特公昭48−7814号、特公昭
55−18892号等に記載の色素が挙げられる。oxonol dye, merocyanine dye, cyanine dye,
Polymethine dyes such as logcyanine dyes include F, M
, Hammer rThe Cyanine Dy
es and Related Compounds”
It is possible to use the pigments described in et al., and more specifically,
U.S. Patent No. 3,047,384, U.S. Patent No. 3,11
No. 0,591, U.S. Patent No. 3,121,008, U.S. Patent No. 3.125.447, U.S. Patent No. 3.128.
No. 179, U.S. Patent No. 3,132,942, U.S. Patent No. 3,622,317, British Patent No. 1.226.89
No. 2, British Patent Tube No. 1,309,274, British Patent Tube No. 1
.. Examples include dyes described in Japanese Patent Publication No. 405.898, Japanese Patent Publication No. 48-7814, Japanese Patent Publication No. 55-18892, and the like.
更に700nm以上の長波長の近赤外〜赤外光域を分光
増感するポリメチン色素として、特開昭47840号、
特開昭47〜44180号、特公昭51−41061号
、特開昭49−5034号、特開昭49−45122号
、特開昭5746245号、特開昭56−35141号
、特開昭57−157254号、特開昭61−2604
4号、特開昭61−27551号、米国特許筒3.61
9.154号、米国特許筒4,175,956号、rR
esearch Disclosure J 1982
年、216、第117〜118頁等に記載のものが挙げ
られる。本発明の感光体は種りの増感色素を併用させて
も、その性能が増感色素により変動しにくい点において
優れている。更には、必要に応じて、化学増感剤等の従
来知られている電子写真感光層用各種添加剤を併用する
こともできる。例えば、前記した総説:イメージング1
973(No、8)第12頁等の総説引例の電子受容性
化合物(例えば、ハロゲン、ペンヅキノン、クロラニル
、酸無水物、有機カルボン酸等)、小門宏等、「最近の
光導電材料と感光体の開発・実用化」第4章〜第6章二
日本科学情報(I未出版部(1986年)の総説引例の
ボリアリールアルカン化合物、ヒンダードフェノール化
合物、P−フェニレンジアミン化合物等が挙げられる。Furthermore, as a polymethine dye that spectrally sensitizes the near-infrared to infrared light region with a long wavelength of 700 nm or more, JP-A No. 47840,
JP 47-44180, JP 51-41061, JP 49-5034, JP 49-45122, JP 5746245, JP 56-35141, JP 57- No. 157254, JP-A-61-2604
No. 4, Japanese Patent Application Publication No. 61-27551, U.S. Patent No. 3.61
No. 9.154, U.S. Pat. No. 4,175,956, rR
search Disclosure J 1982
216, pp. 117-118. The photoreceptor of the present invention is excellent in that its performance does not easily vary depending on the sensitizing dye, even when various sensitizing dyes are used together. Furthermore, if necessary, various conventionally known additives for electrophotographic photosensitive layers such as chemical sensitizers can be used in combination. For example, the above review: Imaging 1
973 (No. 8), p. 12 of the review, etc., cite electron-accepting compounds (e.g., halogens, penduquinone, chloranil, acid anhydrides, organic carboxylic acids, etc.), Hiroshi Komon et al., "Recent photoconductive materials and photosensitive materials. Examples include polyarylalkane compounds, hindered phenol compounds, and P-phenylenediamine compounds cited in the review of Nihon Kagaku Information (I Unpublished Division (1986)) .
これら各種添加剤の添加量は、特に限定的ではないが、
通常光導電体100重量部に対して0.0001〜2.
0重量部である。The amount of these various additives added is not particularly limited, but
Usually 0.0001 to 2.0 parts per 100 parts by weight of photoconductor.
It is 0 parts by weight.
光導電層の厚さは1〜100μ、特に10〜50μが好
適である。The thickness of the photoconductive layer is preferably 1 to 100 microns, particularly 10 to 50 microns.
また、電荷発生層と電荷輸送層の積層型感光体の電荷発
生層として光導電層を使用する場合は電荷発生層の厚さ
は0.01〜1μ、特に0.05〜0.5 μが好適で
ある。In addition, when a photoconductive layer is used as a charge generation layer of a laminated type photoreceptor consisting of a charge generation layer and a charge transport layer, the thickness of the charge generation layer is 0.01 to 1μ, particularly 0.05 to 0.5μ. suitable.
感光体の保護および耐久性、暗減衰特性の改善等を主目
的として絶縁層を付設させる場合もある。In some cases, an insulating layer is added mainly for the purpose of protecting the photoreceptor, improving its durability, dark decay characteristics, etc.
この時は絶縁層は比較的薄く設定され、感光体を特定の
電子写真プロセスに用いる場合に設けられる絶縁層は比
較的厚く設定される。At this time, the insulating layer is set to be relatively thin, and when the photoreceptor is used for a specific electrophotographic process, the insulating layer provided is set to be relatively thick.
後者の場合、絶縁層の厚さは、5〜70μ、特には、1
0〜50μに設定される。In the latter case, the thickness of the insulating layer is between 5 and 70μ, in particular 1
It is set to 0 to 50μ.
積層型感光体の電荷輸送材料としてはポリビニルカルバ
ゾール、オキサゾール系色素、ピラゾリン系色素、トリ
フェニルメタン系色素などがある。Charge transport materials for the laminated photoreceptor include polyvinylcarbazole, oxazole dyes, pyrazoline dyes, triphenylmethane dyes, and the like.
電荷輸送層の厚さとしては5〜40μ、特には10〜3
0μが好適である。The thickness of the charge transport layer is 5 to 40 μm, particularly 10 to 3 μm.
0μ is suitable.
絶縁層あるいは電荷輸送層の形成に用いる樹脂としては
、代表的なものは、ポリスチレン樹脂、ポリエステル樹
脂、セルロース樹脂、ポリエーテル樹脂、塩化ビニル樹
脂、酢酸ビニル樹脂、塩ビ酸ビ共重合体樹脂、ポリアク
リル樹脂、ポリオレフィン樹脂、ウレタン樹脂、エポキ
シ樹脂、メラミン樹脂、シリコン樹脂の熱可塑性樹脂及
び硬化性樹脂が適宜用いられる。Typical resins used to form the insulating layer or charge transport layer include polystyrene resin, polyester resin, cellulose resin, polyether resin, vinyl chloride resin, vinyl acetate resin, vinyl chloride copolymer resin, and polyvinyl chloride copolymer resin. Thermoplastic resins and curable resins such as acrylic resins, polyolefin resins, urethane resins, epoxy resins, melamine resins, and silicone resins are used as appropriate.
本発明による光導電層は、従来公知の支持体上に設ける
ことができる。一般に云って電子写真感光層の支持体は
、導電性であることが好ましく、導電性支持体としては
、従来と全く同様、例えば、金属、紙、プラスチックシ
ート等の基体に低抵抗性物質を含浸させるなどして導電
処理したもの、基体の裏面(感光層を設ける面と反対面
)に導電性を付与し、更にはカール防止を図る等の目的
で少なくとも1層以上をコートしたもの、前記支持体の
表面に耐水性接着層を設けたもの、前記支持体の表面層
に必要に応じて少なくとも1層以上のプレコート層が設
けられたもの、へ!等を蒸着した基体導電化プラスチッ
クを紙にラミネートしたもの等が使用できる。The photoconductive layer according to the invention can be provided on a conventionally known support. Generally speaking, the support for the electrophotographic photosensitive layer is preferably electrically conductive.As the electrically conductive support, for example, a base material such as metal, paper, or plastic sheet impregnated with a low-resistance substance is used in the same manner as in the past. those that have been subjected to conductive treatment, such as those that have been coated with at least one layer for the purpose of imparting conductivity to the back surface of the substrate (the surface opposite to the surface on which the photosensitive layer is provided) and also to prevent curling, and those that have been coated with at least one layer for the purpose of preventing curling, etc. A water-resistant adhesive layer is provided on the surface of the body, and at least one precoat layer is provided on the surface layer of the support as required! A material made by laminating electrically conductive plastic onto paper or the like can be used.
具体的に、導電性基体あるいは導電化材料の例として、
坂本幸男、電子写真、14(No、1)、P2〜11(
1975)、森賀弘之、「入門特殊紙の化学」高分子刊
行会(1975)、M、F、Hoover、 J、Ma
cromol、Sci、Chem。Specifically, examples of conductive substrates or conductive materials include:
Yukio Sakamoto, electronic photography, 14 (No, 1), P2-11 (
1975), Hiroyuki Moriga, “Introductory Chemistry of Special Papers” Kobunshi Publishing (1975), M.F., Hoover, J.Ma.
cromol, Sci, Chem.
A−4(6)、第1327〜第1417頁(1970)
等に記載されているもの等を用いる。A-4(6), pp. 1327-1417 (1970)
Use those listed in etc.
(実施例)
以下に本発明の実施例を例示するが、本発明の内容がこ
れらに限定されるものではない。(Example) Examples of the present invention are illustrated below, but the content of the present invention is not limited thereto.
A の l: A−12−クロロ
−6−メチルフェニルメタクリレート95g、)ルエン
150g及びイソプロパツール50 gの混合溶液を窒
素気流下80°Cの温度に加温した後、4.4′−アゾ
ビス(4−シアノ吉草酸)(以下略号A、B、C,V、
とする)5gを加え、10時間反応させた。A: After heating a mixed solution of 95 g of A-12-chloro-6-methylphenyl methacrylate, 150 g of toluene, and 50 g of isopropanol to a temperature of 80°C under a nitrogen stream, 4.4'-azobis (4-cyanovaleric acid) (hereinafter abbreviated as A, B, C, V,
5 g of the solution was added and reacted for 10 hours.
得られた共重合体(A−1)の重量平均分子量は6,5
00 、ガラス転移点は40″Cであった。The weight average molecular weight of the obtained copolymer (A-1) was 6.5
00, the glass transition temperature was 40″C.
樹脂(A−1)の構造 表 CH,CH。Structure of resin (A-1) table CH, CH.
HOO(、−CH2CH,−C−+CH!−C−±−C
N Coo−R
表−1に示す共重合体を樹脂〔A〕の製造例Iの製造条
件と同様に操作して製造した。HOO(,-CH2CH,-C-+CH!-C-±-C
N Coo-R The copolymers shown in Table 1 were produced under the same conditions as in Production Example I of Resin [A].
得られた樹脂(A−2)〜(A−23)の各樹脂の重量
平均分子量は6,000〜8,000であった。The weight average molecular weight of each of the obtained resins (A-2) to (A-23) was 6,000 to 8,000.
2.6−ジクロロフェニルメタクリレート9フプロパツ
ール50gの混合溶液を窒素気流下65°Cの温度に加
温した後、アゾビスイソブチロニトリル0、8gを加え
8時間反応させた.得られた共重合体(A−24)の重
量平均分子量は7800、ガラス転移点は36°Cであ
った。A mixed solution of 50 g of 2.6-dichlorophenyl methacrylate 9-propatur was heated to a temperature of 65°C under a nitrogen stream, and then 0.8 g of azobisisobutyronitrile was added and reacted for 8 hours. The weight average molecular weight of the obtained copolymer (A-24) was 7800, and the glass transition point was 36°C.
樹脂
(A−24)
の構造
ut
樹脂〔A〕の製造例24において用いたチオグリコール
酸を表−2の化合物に代えた他は、前記製造例24と同
様の条件にして各共重合体を合成した。Structure of Resin (A-24) Each copolymer was produced under the same conditions as in Production Example 24, except that the thioglycolic acid used in Production Example 24 of Resin [A] was replaced with the compound shown in Table 2. Synthesized.
表−2 C11。Table-2 C11.
B の l: B−1工チルメ
タクリレート100g、エチレングリコルジメタクリレ
ート1.0g及びトルエン200gの混合溶液を窒素気
流下75°Cの温度に加温した後、アブビスイソブチロ
ニトリル1.0gを加え、10時間反応させた。得られ
た共重合体CB−1)の重量平均分子量は4.2×10
4であった。B-1: After heating a mixed solution of 100 g of B-1 ethyl methacrylate, 1.0 g of ethylene glycol dimethacrylate and 200 g of toluene to a temperature of 75°C under a nitrogen stream, 1.0 g of abbisisobutyronitrile was added. The mixture was added and reacted for 10 hours. The weight average molecular weight of the obtained copolymer CB-1) was 4.2×10
It was 4.
樹脂〔B〕の製造例1と同様の重合条件でモノマーと、
架橋上ツマ−を下表−3の化合物を用いて、樹脂〔B〕
を製造した。With the monomer under the same polymerization conditions as in Production Example 1 of Resin [B],
Resin [B] was crosslinked using the compounds shown in Table 3 below.
was manufactured.
B の ”’ tq: B−19工
チルメタクリレート99g1エチレングリコルジメタク
リレートIg、トルエン150g及びメタノール50g
の混合溶液を窒素気流下70″Cの温度に加温した後、
4,4゛−アゾビス(4−シアノペンクン酸)1.0g
を加え、8時間反応した。B's tq: B-19 methyl methacrylate 99g 1 ethylene glycol dimethacrylate Ig, toluene 150g and methanol 50g
After heating the mixed solution to a temperature of 70''C under a nitrogen stream,
4,4゛-azobis(4-cyanopencunic acid) 1.0g
was added and reacted for 8 hours.
得られた共重合体のhは1.0X105であった。h of the obtained copolymer was 1.0×105.
上記樹脂〔B〕の製造例19において、重合開始剤:
4,4’−アゾビス(4−シアノペンクン酸)の代わり
に下記表−4の化合物を用いて、製造例19と同様の条
件で樹脂〔B〕を各々製造した。各樹脂のhは1.0X
105〜3X10’であった。In Production Example 19 of the above resin [B], the polymerization initiator:
Resin [B] was produced under the same conditions as in Production Example 19 using the compounds shown in Table 4 below in place of 4,4'-azobis(4-cyanopenconic acid). h of each resin is 1.0X
It was 105-3X10'.
B の 24 : B −24エ
チルメタクリレ−)99g、チオグリコール酸1.0g
、ジビニルベンゼン2.0g及びトルエン200gの混
合溶液を窒素気流下攪拌しながら温度80°Cに加温し
た。2.2゛−アゾビス(シクロヘキサン−1カルボニ
トリル)(略称A、C,H,N、) 0.8gを加え4
時間反応し、更に、A、C,H,N、を0.4g加えて
2時間、その後A、C,H,N、を0.2g加えて、2
時間反応した。B-24: B-24 ethyl methacrylate) 99g, thioglycolic acid 1.0g
A mixed solution of 2.0 g of divinylbenzene and 200 g of toluene was heated to a temperature of 80° C. with stirring under a nitrogen stream. 2. Add 0.8 g of 2゛-azobis(cyclohexane-1 carbonitrile) (abbreviation A, C, H, N,) and add 4
React for 2 hours, then add 0.4g of A, C, H, N for 2 hours, then add 0.2g of A, C, H, N,
Time reacted.
得られた重合体のhは1.2X105であった。h of the obtained polymer was 1.2×105.
樹脂〔B〕の製造例24において、架橋用多官能性単量
体であるジビニルベンゼン2.0gの代わりに、下記表
−5の多官能性単量体又はオリゴマーを用いる他は、製
造例24と同様に操作して、樹脂〔B〕を製造した。Production Example 24 of Resin [B] except that the polyfunctional monomer or oligomer shown in Table 5 below was used instead of 2.0 g of divinylbenzene, which is a crosslinking polyfunctional monomer. Resin [B] was produced in the same manner as above.
B の 138〜45: B−38)メ
チルメタクリレート39g、エチルメタクリレート60
g、下記表−6のメルカプト化合物1.0g、エチレン
グリコールジメタクリレート2g、トルエン150g及
びメタノール50gの混合溶液を窒素気流下70°Cの
温度に加温した後、2,2゛−アゾビス(イソブチロニ
トリル) 0.8gを加え4時間反応し、更に、2,2
゛−アゾビス(イソブチロニトリル)0゜4gを加えて
4時間反応した。B 138-45: B-38) Methyl methacrylate 39g, ethyl methacrylate 60
After heating a mixed solution of 1.0 g of the mercapto compound shown in Table 6 below, 2 g of ethylene glycol dimethacrylate, 150 g of toluene, and 50 g of methanol to a temperature of 70°C under a nitrogen stream, 2,2'-azobis(iso Butyronitrile) 0.8g was added and reacted for 4 hours, and then 2,2
0.4 g of ゛-azobis(isobutyronitrile) was added and reacted for 4 hours.
得られた各重合体のhは9.5 X 10’〜2X10
5であった。h of each obtained polymer is 9.5 x 10' to 2 x 10
It was 5.
表−6
実施例1〜2及び比較例A−E
実施例1
樹脂〔A〕の製造例1で製造した樹脂(A−1)6g(
固形分量として)、樹脂〔B〕の製造例1で製造した樹
脂CB−1)34g(固形分量として)、酸化亜鉛20
0g、下記構造のへブタメチンシアニン色素〔A〕0.
02g、フタル酸無水物0.05g及びトルエン300
gの混合物をボールミル中で2時間分散して、感光層形
成物を調製し、これを導電処理した紙に、乾燥付着量が
18g/rrfとなる様に、ワイヤーバーで塗布し、1
10°Cで1分間乾燥し、ついで暗所で20°C65%
RHの条件下で24時間放置することにより、電子写真
感光材料を作製した。Table 6 Examples 1 to 2 and Comparative Examples A to E Example 1 6 g of the resin (A-1) manufactured in Production Example 1 of Resin [A] (
Resin CB-1) produced in Production Example 1 of Resin [B] 34 g (as solid content), Zinc oxide 20
0g, hebutamethine cyanine dye [A] with the following structure: 0.
02g, phthalic anhydride 0.05g and toluene 300g
g of the mixture was dispersed in a ball mill for 2 hours to prepare a photosensitive layer-forming product, which was coated on electrically conductive treated paper with a wire bar so that the dry adhesion amount was 18 g/rrf.
Dry at 10°C for 1 minute, then dry at 20°C 65% in the dark.
An electrophotographic light-sensitive material was produced by leaving it for 24 hours under RH conditions.
色素〔A〕
実施例2
実施例1において、樹脂(B−1)34gの代わりに、
樹脂(B −24) 34g (固形分量として)を用
いた他は、実施例1と同様に操作して、電子写真感光材
料を作製した。Dye [A] Example 2 In Example 1, instead of 34 g of resin (B-1),
An electrophotographic light-sensitive material was prepared in the same manner as in Example 1, except that 34 g (solid content) of resin (B-24) was used.
比較例A
実施例1において、樹脂(A−1)6gと樹脂CB−1
:134 gに代えて樹脂1’A−1)のみ40gとし
た他は、実施例1と同様に操作して電子写真感光材料を
作製した。Comparative Example A In Example 1, 6 g of resin (A-1) and resin CB-1
An electrophotographic material was prepared in the same manner as in Example 1, except that 40 g of resin 1'A-1) was used instead of 134 g.
比較例B
比較例Aにおいて、樹脂(A−1)40gの代ねわりに
、〔エチルメタクリレート/アクリル酸(9515)重
量比〕共重合体(Mw : 7.500) (R−1)
、40gを用いた他は、比較例Aと同様に操作して、電
子写真感光材料を作製した。Comparative Example B In Comparative Example A, instead of 40 g of resin (A-1), [ethyl methacrylate/acrylic acid (9515) weight ratio] copolymer (Mw: 7.500) (R-1)
An electrophotographic light-sensitive material was prepared in the same manner as in Comparative Example A, except that 40 g of the sample was used.
比較例C
比較例Aにおいて、樹脂(A−1340gの代わりに、
〔エチルメタクリレート/アクリル酸(98゜5/1.
5)重量比)共重合体(Mw 45,000) : (
R−2)40gを用いた他は、比較例Aと同様にして電
子写真感光材料を作製した。Comparative Example C In Comparative Example A, resin (instead of A-1340g,
[Ethyl methacrylate/acrylic acid (98°5/1.
5) Weight ratio) Copolymer (Mw 45,000): (
R-2) An electrophotographic light-sensitive material was produced in the same manner as Comparative Example A except that 40 g was used.
比較例り
実施例1において、樹脂(A−1)6gの代わりに、樹
脂(R−116gに代えた他は、実施例1と同様に操作
して、電子写真感光材料を作製した。Comparative Example An electrophotographic light-sensitive material was prepared in the same manner as in Example 1, except that 6 g of resin (A-1) was replaced with 116 g of resin (R-1).
比較例E
実施例2において、樹脂(A−136gの代わりに、樹
脂(R−136gに代えた他は、実施例1と同様に操作
して、電子写真感光材料を作製した。Comparative Example E An electrophotographic light-sensitive material was prepared in the same manner as in Example 1 except that resin (R-136g was used instead of resin (A-136g) in Example 2.
これらの感光材料の皮膜性(表面の平滑度)、静電特性
、撮像性及び環境条件を30’C180%R11とした
時の撮像性を調べた。更に、これらの感光材料をオフセ
ットマスター用原版として用いた時の光導電性の不感脂
化性(不惑脂化処理後の光導電層の水との接触角で表わ
す)及び印刷性(地汚れ、耐剛性等)を調べた。The film properties (surface smoothness), electrostatic properties, imaging performance, and imaging performance of these photosensitive materials under environmental conditions of 30'C180%R11 were investigated. Furthermore, when these photosensitive materials are used as original plates for offset masters, the desensitization of photoconductivity (represented by the contact angle with water of the photoconductive layer after desensitization treatment) and printability (background smudge, Rigidity resistance, etc.) were investigated.
以上の結果をまとめて、表−7に示す。The above results are summarized in Table 7.
表−7に記した評価項目の実施の態様は以下の通りであ
る。The implementation aspects of the evaluation items listed in Table-7 are as follows.
注1)光導電層の平滑性:
得られた感光材料は、ベック平滑度試験機(熊谷理工■
製)を用い、空気容ffi I CCの条件にて、その
平滑度(sec/cc)を測定した。Note 1) Smoothness of photoconductive layer: The obtained photosensitive material was tested using a Beck smoothness tester (Kumagai Riko ■
The smoothness (sec/cc) was measured under the condition of air volume ffi I CC.
注2)光導電層の機械的強度:
得られた感光材料表面をヘイトン−14型表面性試験材
(新来化学■製)を用いて荷重50g/cfflのもの
でエメリー紙(!11000)で1000回繰り返し探
り摩耗粉を取り除き感光層の重M?JIi少から残膜率
(χ)を求め機械的強度とした。Note 2) Mechanical strength of photoconductive layer: The surface of the obtained photosensitive material was measured with emery paper (!11000) using a Hayton-14 type surface test material (manufactured by Shinrai Kagaku ■) at a load of 50 g/cffl. Repeatedly probe 1000 times to remove wear particles from the photosensitive layer. The remaining film rate (χ) was determined from JIi and was taken as the mechanical strength.
注3)静電特性:
温度20°C165%l?I+の暗室中で、各感光材料
にペーパーアナライザー(川口電機■製ペーパーアナラ
イザー5P−428型)を用イ”i’ −6kV”i’
20秒間コロナ放電をさせた後、10秒間放置し、この
時の表面電位LOを測定した。次いでそのまま暗中で9
0秒間静置した後の電位V、。。を測定し、90秒間暗
減衰させた後の電位の保持性、即ち、暗減衰保持率(D
RR(χ)〕を、(V+oo/Lo) xlOO(χ
)で求めた。Note 3) Electrostatic characteristics: Temperature 20°C 165%l? In a dark room at I+, each photosensitive material was analyzed using a paper analyzer (Paper Analyzer 5P-428 model manufactured by Kawaguchi Electric).
After causing corona discharge for 20 seconds, it was left to stand for 10 seconds, and the surface potential LO at this time was measured. Then 9 in the dark
Potential V after standing still for 0 seconds. . is measured, and the retention of the potential after dark decaying for 90 seconds, that is, the dark decay retention rate (D
RR(χ)], (V+oo/Lo) xlOO(χ
).
又、コロナ放電により光導電層表面を一400vに帯電
させた後、該光導電層表面をガリウム−°アルミニウム
ーヒ素半導体レーザー(発振波長830nm)光で照射
し、表面電位(V+。)が1/10に減衰するまでの時
間を求め、これから露光IE+/+o(erg/c+f
l)を算出する。Further, after the surface of the photoconductive layer was charged to -400 V by corona discharge, the surface of the photoconductive layer was irradiated with gallium-°aluminum-arsenide semiconductor laser (oscillation wavelength: 830 nm) light, so that the surface potential (V+) became 1. Find the time it takes to attenuate to /10, and from this calculate the exposure IE+/+o(erg/c+f
Calculate l).
測定時の環境条件は、20°C165%RH(1)と3
0°C180%RH(II)で行なった。The environmental conditions at the time of measurement were 20°C, 165%RH (1) and 3.
The test was carried out at 0°C and 180% RH (II).
注4)描像性:
各感光材料を以下の環境条件で1昼夜放置した後、各感
光材料を一6KVで帯電し、光源として2.81出力の
ガリウムーアルミニウムーヒ素半導体レーザー(発振波
長830nm)を用いて、感光材料表面上で、64er
g /ctAの照射量下、ピッチ25μm及びスキャニ
ング速度300m/secのスピードで露光後、液体現
像剤として、ELP−T(富士写真フィルム■製)を用
いて、現像し、定着することで得られた複写画像(カブ
リ、画像の画質)を目視評価した。撮像時の環境条件は
、20°C65%RH(1)と30°C80%RH(I
I)で実施した。Note 4) Image quality: After leaving each photosensitive material for one day and night under the following environmental conditions, each photosensitive material was charged at -6 KV, and a gallium-aluminum-arsenide semiconductor laser (oscillation wavelength 830 nm) with an output of 2.81 was used as a light source. 64er on the surface of the photosensitive material using
After exposure under an irradiation dose of g/ctA at a pitch of 25 μm and a scanning speed of 300 m/sec, the image was developed and fixed using ELP-T (manufactured by Fuji Photo Film ■) as a liquid developer. The copied images (fogging, image quality) were visually evaluated. The environmental conditions during imaging were 20°C, 65% RH (1) and 30°C, 80% RH (I
I).
注5) 水との接触角;
各感光材料を不感脂化処理液ELP−E(富士写真フィ
ルム■製)を用いて、エツチングプロセッサーに1回通
して光導電層面を不感脂化処理した後、これに蒸留水2
μlの水滴を乗せ、形成された水との接触角をゴニオメ
ータ−で測定する。Note 5) Contact angle with water; After passing each photosensitive material once through an etching processor using a desensitizing liquid ELP-E (manufactured by Fuji Photo Film) to desensitize the photoconductive layer surface, Distilled water 2
A μl water droplet is placed on it, and the contact angle with the water formed is measured using a goniometer.
注6) 耐刷性
上記注3)の撮像性と同様にして製版した後、上記注4
)と同条件で不惑脂化処理し、これをオフセットマスタ
ーとしてオフセット印刷機(桜井製作所■製オリバー5
2型)にかけ上質紙を印刷用紙として用いて、印刷物の
非画像部の地汚れ及び画像部の画質に問題が生じないで
印刷できる枚数を示す(印刷枚数が多い程、耐剛性が良
好なことを表わす)。Note 6) Printing durability After making the plate in the same manner as for imageability in Note 3) above,
) under the same conditions as the offset printing machine (Oliver 5 manufactured by Sakurai Seisakusho) and used as an offset master.
This indicates the number of sheets that can be printed using high-quality paper (type 2) as printing paper without causing background stains in the non-image areas of printed matter or problems with image quality in the image areas (the higher the number of sheets printed, the better the rigidity resistance). ).
表−7に示す様に、本発明の各感光材料は、光導電層の
平滑性膜の強度及び静電特性が良好で、実際の複写画像
も地力ブリがなく複写画質も鮮明であった。このことは
光導電体と結着樹脂が充分に吸着し、且つ、粒子表面を
被覆していることによるものと推定される。同様の理由
で、オフセットマスター原版として用いた場合でも不感
脂化処理液による不感脂化処理が充分に進行し、非画像
部の水との接触角が20度以下と小さく、充分に親水化
されていることが判る。実際に印刷して印刷物の地汚れ
を観察しても地汚れは全く認められなかった。As shown in Table 7, in each of the photosensitive materials of the present invention, the strength and electrostatic properties of the smooth film of the photoconductive layer were good, and the actual copied images had no ground blur and the quality of the copied images was clear. This is presumed to be due to the photoconductor and the binder resin being sufficiently adsorbed and covering the particle surface. For the same reason, even when used as an offset master original, the desensitizing treatment with the desensitizing treatment liquid progresses sufficiently, and the contact angle with water in the non-image area is as small as 20 degrees or less, making it sufficiently hydrophilic. It can be seen that When actually printing and observing the background smear on the printed matter, no background smudge was observed.
本発明の樹脂〔A〕のみを用いた比較例Aは、静電特性
は極めて良好であったが、オフセットマスター原版とし
て用いて印刷した所、3000枚で印刷物の画質が劣化
した。Comparative Example A using only the resin [A] of the present invention had extremely good electrostatic properties, but when printed using it as an offset master original, the image quality of the printed matter deteriorated after 3000 sheets.
又比較例Bは、90秒間のり、 R,Rが低下し又El
/l。In addition, in Comparative Example B, R and R decreased after 90 seconds of adhesion, and El
/l.
も大きくなってしまった。has also grown larger.
更に、比較例Bの樹脂の化学構造と同様の共重合体で重
量平均分子量を大きくした場合の比較例Cでは、静電特
性が著しく悪化した。このことは、結着樹脂の分子量が
大きくなることによって、光導電体粒子への吸着ととも
に粒子間の凝集が引き起こされ、悪影響をもたらすもの
と推定される。Furthermore, in Comparative Example C, in which the weight average molecular weight was increased using a copolymer having the same chemical structure as the resin of Comparative Example B, the electrostatic properties were significantly deteriorated. This is presumed to be due to an increase in the molecular weight of the binder resin, which causes adsorption to the photoconductor particles and aggregation between the particles, resulting in an adverse effect.
以上のことより、本発明の樹脂を用いた場合にのみ静電
特性及び印刷適性を満足する電子写真感光体が得られる
。From the above, an electrophotographic photoreceptor that satisfies electrostatic properties and printability can be obtained only when the resin of the present invention is used.
実施例3〜26
実施例1において、樹脂(A−1)及び樹脂(B−1)
に代えて、下記表−8の各樹脂(A〕、各樹脂〔B〕に
代えた他は、実施例1と同様に操作して、各電子写真感
光材料を作製した。Examples 3 to 26 In Example 1, resin (A-1) and resin (B-1)
Each electrophotographic light-sensitive material was produced in the same manner as in Example 1, except that each resin (A) and each resin [B] shown in Table 8 below were used instead.
実施例27〜45
結着樹脂として、下記表−9に記した樹脂〔A〕6.5
g及び樹脂〔B〕33.5g、酸化亜鉛200g、ロー
ズベンガル0.05 g、テトラブロムフェノールブル
ー0.03g、ウラニン0.02 g 、無水フタール
酸0.01g及びトルエン240gの混合物をボールミ
ル中で2時間分散した。これを導電処理した紙に、乾燥
付着118g/n(となる様にワイヤーバーで塗布し1
10°Cで30秒間加熱した。次いで20°C165%
RHの条件下で24時間放置することにより電子写真感
光材料を作製した。Examples 27 to 45 As a binder resin, resin [A] 6.5 shown in Table 9 below
g and resin [B] 33.5 g, zinc oxide 200 g, rose bengal 0.05 g, tetrabromophenol blue 0.03 g, uranine 0.02 g, phthalic anhydride 0.01 g and toluene 240 g in a ball mill. Dispersed for 2 hours. Apply this to conductive treated paper with a wire bar so that the dry adhesion is 118 g/n (1
Heated at 10°C for 30 seconds. Then 20°C 165%
An electrophotographic light-sensitive material was prepared by leaving it for 24 hours under RH conditions.
本発明の感光材料は、いずれも帯電性、暗電荷保持率、
光感度に優れ、実際の複写画像も高温・高湿の(30°
C−80%R1()の過酷な条件においても、地力ブリ
の発生のない、鮮明な画像を与えた。The photosensitive material of the present invention has chargeability, dark charge retention,
It has excellent light sensitivity, and the actual copied images can be used even under high temperature and high humidity conditions (30°).
Even under the harsh conditions of C-80%R1 (), clear images were provided with no soil blurring.
更に、これをオフセットマスターの原版として用いて印
刷した所、表−9の耐刷枚数の所でも鮮明な画質の印刷
物を得た。Further, when this was printed using as an original plate for an offset master, prints with clear image quality were obtained even at the number of prints shown in Table 9.
但し、静電特性における、El/10は、コロナ放電に
より光導電層表面を一400vに帯電させた後、該光導
電層表面を照度2.0ルツクスの可視光で照射し、表面
電位(V+O)が1710に減衰するまでの時間を求め
、これから露光It E + y +。(ルックス・秒
)を算出した。However, El/10 in electrostatic properties is determined by charging the surface of the photoconductive layer to -400V by corona discharge, then irradiating the surface of the photoconductive layer with visible light at an illuminance of 2.0 lux, and increasing the surface potential (V+O ) attenuates to 1710, and from this the exposure It E + y +. (looks/seconds) was calculated.
又、感光材料の製版は、全自動製版1ELP404V(
富士写真フィルム■製)でELP−Tをトナーとして用
いて、トナー画像を形成した。In addition, for plate making of photosensitive materials, fully automatic plate making 1ELP404V (
A toner image was formed using ELP-T (manufactured by Fuji Photo Film ■) as a toner.
(ほか3名)(3 others)
Claims (3)
る光導電層を有する電子写真感光体において、該結着樹
脂が下記樹脂〔A〕の少なくとも1種及び下記樹脂〔B
〕の少なくとも1種を含有することを特徴とする電子写
真感光体。 樹脂〔A〕 1×10^3〜2×10^4の重量平均分子量を有し、
下記式( I )又は式(II)で示される少なくとも1つ
の繰り返し単位を30重量%以上重合成分として含有す
る重合体であり、且つ重合体主鎖の片末端にのみ−PO
_3H_2基、−SO_3H基、−COOH基、▲数式
、化学式、表等があります▼基、{Rは炭素数1〜10
の炭化水素基又は−OR′(R′は炭素数1〜10の炭
化水素基を示す)を示す}、−SH基及びフェノール性
OH基の酸性基並びに環状酸無水物含有基のうちの少な
くとも1つの置換基を結合して成る樹脂。 式( I ) ▲数式、化学式、表等があります▼ 式(II) ▲数式、化学式、表等があります▼ 〔式中、X_1及びX_2は互いに独立に、それぞれ水
素原子、炭素数1〜10の炭化水素基、塩素原子、臭素
原子、−COY_1又は−COOY_2(Y_1及びY
_2は各々炭素数1〜10の炭化水素基を示す)を表わ
す。但し、X_1とX_2がともに水素原子を表わすこ
とはない。 W_1及びW_2はそれぞれ−COO−とベンゼン環を
結合する、直接結合又は連結原子数1〜4個の連結基を
表わす。〕 樹脂〔B〕 5×10^4以上の重量平均分子量を有し、下記一般式
〔III〕で示される繰り返し単位を重合体成分として少
なくとも含有し、且つ架橋構造を有する樹脂。 一般式〔III〕 ▲数式、化学式、表等があります▼ 〔式中、Tは−COO−、−OCO−、−CH_2OC
O−、−CH_2COO−、−O−又は−SO_2−を
表わす。 Vは炭素数1〜22の炭化水素基を表わす。 a_1及びa_2は、互いに同じでも異なってもよく、
各々水素原子、ハロゲン原子、シアノ基、炭素数1〜8
の炭化水素基、−COO−Z又は炭素数1〜8の炭化水
素基を介した−COO−Z(Zは炭素数1〜18の炭化
水素基を表わす)を表わす。〕(1) In an electrophotographic photoreceptor having a photoconductive layer containing at least an inorganic photoconductive material and a binder resin, the binder resin includes at least one of the following resins [A] and the following resin [B].
An electrophotographic photoreceptor comprising at least one of the following. Resin [A] has a weight average molecular weight of 1 x 10^3 to 2 x 10^4,
A polymer containing 30% by weight or more of at least one repeating unit represented by the following formula (I) or formula (II) as a polymerization component, and containing -PO only at one end of the polymer main chain.
_3H_2 group, -SO_3H group, -COOH group, ▲Mathematical formula, chemical formula, table, etc.▼ group, {R has 1 to 10 carbon atoms
or -OR'(R' represents a hydrocarbon group having 1 to 10 carbon atoms)}, -SH group, acidic group of phenolic OH group, and cyclic acid anhydride-containing group. A resin formed by bonding one substituent. Formula (I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼ Formula (II) ▲There are mathematical formulas, chemical formulas, tables, etc.▼ [In the formula, X_1 and Hydrocarbon group, chlorine atom, bromine atom, -COY_1 or -COOY_2 (Y_1 and Y
_2 each represents a hydrocarbon group having 1 to 10 carbon atoms. However, both X_1 and X_2 do not represent hydrogen atoms. W_1 and W_2 each represent a direct bond or a connecting group having 1 to 4 connected atoms that connects -COO- and the benzene ring. ] Resin [B] A resin having a weight average molecular weight of 5×10^4 or more, containing at least a repeating unit represented by the following general formula [III] as a polymer component, and having a crosslinked structure. General formula [III] ▲There are mathematical formulas, chemical formulas, tables, etc.▼ [In the formula, T is -COO-, -OCO-, -CH_2OC
Represents O-, -CH_2COO-, -O- or -SO_2-. V represents a hydrocarbon group having 1 to 22 carbon atoms. a_1 and a_2 may be the same or different from each other,
Each hydrogen atom, halogen atom, cyano group, carbon number 1-8
represents a hydrocarbon group, -COO-Z, or -COO-Z via a hydrocarbon group having 1 to 8 carbon atoms (Z represents a hydrocarbon group having 1 to 18 carbon atoms). ]
鎖の片末端のみに−PO_3H_2、−SO_3H、−
COOH、−OH、−SH、 ▲数式、化学式、表等があります▼(R″は炭化水素基
を示す)、環状酸無水物、−CHO、−CONH_2、
−SO_2NH_2及び▲数式、化学式、表等がありま
す▼(b_1、b_2は同じでも異なってもよく、各々
水素原子又は炭化水素基を表わす)から選択される少な
くとも1つの極性基を結合して成る樹脂である請求項(
1)記載の電子写真感光体。(2) Resin [B] is further provided with -PO_3H_2, -SO_3H, - only at one end of at least one polymer main chain.
COOH, -OH, -SH, ▲Mathematical formulas, chemical formulas, tables, etc.▼ (R'' indicates a hydrocarbon group), cyclic acid anhydride, -CHO, -CONH_2,
A resin formed by bonding at least one polar group selected from -SO_2NH_2 and ▲Mathematical formulas, chemical formulas, tables, etc.▼ (b_1 and b_2 may be the same or different and each represents a hydrogen atom or a hydrocarbon group) A claim that is (
1) The electrophotographic photoreceptor described above.
環状酸無水物含有基を含有する繰り返し単位を重合体成
分として含有しない樹脂である請求項(1)又は(2)
記載の電子写真感光体。(3) Claim (1) or (2) wherein the resin [B] is a resin that does not contain, as a polymer component, a repeating unit containing an acidic group or a cyclic acid anhydride-containing group as shown in the resin [A].
The electrophotographic photoreceptor described above.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28897288A JP2584302B2 (en) | 1988-11-17 | 1988-11-17 | Electrophotographic photoreceptor |
DE68925330T DE68925330T2 (en) | 1988-10-04 | 1989-10-03 | Electrophotographic photoreceptor |
EP89118354A EP0362804B1 (en) | 1988-10-04 | 1989-10-03 | Electrophotographic photoreceptor |
US07/417,105 US5009975A (en) | 1988-10-04 | 1989-10-04 | Electrophotographic photoreceptor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28897288A JP2584302B2 (en) | 1988-11-17 | 1988-11-17 | Electrophotographic photoreceptor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02135456A true JPH02135456A (en) | 1990-05-24 |
JP2584302B2 JP2584302B2 (en) | 1997-02-26 |
Family
ID=17737183
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28897288A Expired - Fee Related JP2584302B2 (en) | 1988-10-04 | 1988-11-17 | Electrophotographic photoreceptor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2584302B2 (en) |
-
1988
- 1988-11-17 JP JP28897288A patent/JP2584302B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2584302B2 (en) | 1997-02-26 |
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