JPH02131341U - - Google Patents

Info

Publication number
JPH02131341U
JPH02131341U JP3990689U JP3990689U JPH02131341U JP H02131341 U JPH02131341 U JP H02131341U JP 3990689 U JP3990689 U JP 3990689U JP 3990689 U JP3990689 U JP 3990689U JP H02131341 U JPH02131341 U JP H02131341U
Authority
JP
Japan
Prior art keywords
wafer
cavity
holding
gas
gas inlet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3990689U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3990689U priority Critical patent/JPH02131341U/ja
Publication of JPH02131341U publication Critical patent/JPH02131341U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案に係るウエハ保持装置の模式的
縦断面図、第2図は第1図の−線による横断
面図、第3図は従来のウエハ保持装置の縦断面図
である。 1……保持板、10……囲繞部、11……ガス
導入口、12……ガス導出口、13……給気管、
14……排気管。
FIG. 1 is a schematic vertical cross-sectional view of a wafer holding device according to the present invention, FIG. 2 is a cross-sectional view taken along the - line in FIG. 1, and FIG. 3 is a vertical cross-sectional view of a conventional wafer holding device. DESCRIPTION OF SYMBOLS 1... Holding plate, 10... Surrounding part, 11... Gas inlet, 12... Gas outlet, 13... Air supply pipe,
14...Exhaust pipe.

Claims (1)

【実用新案登録請求の範囲】 保持されるべきウエハとこれに近接対向する保
持板との間にガスを通流させ、前記ウエハの表裏
面間に生じる圧力差により該ウエハを保持する装
置において、 前記保持板の前記ウエハとの対向面側に周設さ
れ、前記近接対向時にウエハの周縁に当接して両
者間に空洞を形成する囲繞部と、 該囲繞部に共に形成され、前記保持板の中央に
向けて前記空洞内に開口するガス導入口と、 該ガス導入口と略対向して前記空洞内に開口す
るガス導出口と を具備することを特徴とするウエハ保持装置。
[Claims for Utility Model Registration] In an apparatus for holding a wafer by causing gas to flow between a wafer to be held and a holding plate closely opposing the wafer, and using a pressure difference generated between the front and back surfaces of the wafer, an enclosing portion provided around the side of the holding plate facing the wafer and abutting against the periphery of the wafer to form a cavity between the two when the wafer is closely opposed; A wafer holding device comprising: a gas inlet opening into the cavity toward the center; and a gas outlet opening into the cavity substantially opposite the gas inlet.
JP3990689U 1989-04-03 1989-04-03 Pending JPH02131341U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3990689U JPH02131341U (en) 1989-04-03 1989-04-03

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3990689U JPH02131341U (en) 1989-04-03 1989-04-03

Publications (1)

Publication Number Publication Date
JPH02131341U true JPH02131341U (en) 1990-10-31

Family

ID=31549225

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3990689U Pending JPH02131341U (en) 1989-04-03 1989-04-03

Country Status (1)

Country Link
JP (1) JPH02131341U (en)

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