JPH02126152A - Electrostatic type solid-state surface analyzer - Google Patents

Electrostatic type solid-state surface analyzer

Info

Publication number
JPH02126152A
JPH02126152A JP27866888A JP27866888A JPH02126152A JP H02126152 A JPH02126152 A JP H02126152A JP 27866888 A JP27866888 A JP 27866888A JP 27866888 A JP27866888 A JP 27866888A JP H02126152 A JPH02126152 A JP H02126152A
Authority
JP
Japan
Prior art keywords
sample
sample plate
charge
electric charge
powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27866888A
Other languages
Japanese (ja)
Inventor
Tomio Hoshi
星 富夫
Toshihiko Oguchi
小口 寿彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Kyocera Chemical Corp
Original Assignee
Toshiba Corp
Toshiba Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Chemical Corp filed Critical Toshiba Corp
Priority to JP27866888A priority Critical patent/JPH02126152A/en
Publication of JPH02126152A publication Critical patent/JPH02126152A/en
Pending legal-status Critical Current

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  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)

Abstract

PURPOSE:To measure the quantity of charged electric charge of a sample layer with a high precision and to analyse the chemical composition of a contact face by flowing a reference powdery material to an inclined sample plate and receiving the reference powdery material dropped along the sample layer by a conductive receiver and measuring the quantity of electric charge. CONSTITUTION:A sample layer 12 is formed on a conductive substrate 11 of a sample plate 13, and this sample plate 13 is fixed at a prescribed angle to a fixing member 14. A reference powdery material 17 is stored in a reference powdery material supply device 18, and the inside of a closed vessel 32 is set to a desired atmosphere, and a shutter member 22 is operated to flow down the powdery material 17 on the sample layer 12. The powdery material 17 gets contact charged electric charge by contacting with the layer 12 and is gathered into the conductive receiver 25. The quantity of this electric charge is measured through an electric charge measuring terminal 27 by an electric charge measuring system 28. Thus, the inclining method is used to measure the quantity of charged electric charge of the sample layer with a high precision, and the chemical composition of the contact face is analyzed.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は接触帯電電荷を精度よく測定し、固体表面の成
分あるいはその変化を検知することが可能な静電式固体
表面解析装置に関する。
[Detailed Description of the Invention] [Objective of the Invention] (Industrial Application Field) The present invention provides an electrostatic solid surface that can accurately measure contact charge and detect components on the solid surface or changes thereof. Regarding analysis equipment.

(従来の技術) 一般に、2種の異なる物質を接触し、分離した時、両者
の表面に等量で逆極性の接触帯電電荷が発生することは
良く知られている。この接触帯電電荷の極性および電荷
量は、両者の接触界面を構成する化学組成を敏感に反映
し、その感度はESCA(X線光電子分光装置)並であ
ると言われている。したがって、この現象を利用すれば
物質表面化学組成の解析を行うことが可能である。
(Prior Art) It is generally well known that when two different substances are brought into contact and separated, contact charges of equal amount and opposite polarity are generated on the surfaces of the two. The polarity and charge amount of this contact charge sensitively reflect the chemical composition constituting the contact interface between the two, and its sensitivity is said to be comparable to that of ESCA (X-ray photoelectron spectroscopy). Therefore, by utilizing this phenomenon, it is possible to analyze the chemical composition of the surface of a substance.

この接触帯電現象を利用して、両者の接触界面を構成す
る化学組成を解析する方法の一つとして、傾斜保持した
試料板に基準となる粉体を流しかけて、試料板の帯電量
から試料板の化学組成を測定する方法(以下、傾斜法と
呼ぶ)が発表されている。
One way to use this contact charging phenomenon to analyze the chemical composition of the contact interface between the two is to pour a reference powder onto a sample plate held at an angle, and then calculate the amount of charge on the sample plate from the amount of charge on the sample plate. A method for measuring the chemical composition of a plate (hereinafter referred to as the gradient method) has been announced.

(7かしながら、従来の傾斜法においては、表面組成変
化を高精度で検出できるほど7I−1定積度を高めた技
術は確立されておらず、またその必要条件も明確となっ
ていないため、未だこの目的を満足するfllll定器
は発表されていないのが現状である。
(7) However, in the conventional gradient method, no technology has been established to increase the 7I-1 constant volume to the extent that changes in surface composition can be detected with high precision, and the necessary conditions are not clear. Therefore, the current situation is that no flllll device that satisfies this purpose has been announced yet.

(発明が解決しようとする課題) 本発明は、このような点に対処してなされたもので、傾
斜法により接触帯電電荷を高精度で測定することができ
、l−たがって、試料板の表面を構成する化学成分ある
いはその変化をも検知することの可能な静電式固体表面
解析装置をP2供することを目的とする。
(Problems to be Solved by the Invention) The present invention has been made in order to address the above-mentioned problems, and it is possible to measure the contact charge with high precision by the gradient method, and therefore, it is possible to measure the contact charge with high accuracy. The purpose of the present invention is to provide an electrostatic solid surface analysis device P2 that can detect chemical components constituting the surface or changes thereof.

[発明の構成] (課題を解決するための手段) 本発明の静電式固体表面解析装置は、導電性基板の上に
試料層を密接して設けてなる試料板と、この試料板を傾
斜状態で保持する試料板保持手段と、前記試料板の試料
層に基準粉体を流しかける粉体供給手段と、前記試料板
の試料層上を落下した基準粉体を受ける電気的に絶縁し
て支持された導電性受容器と、前記導電性受容器または
前記試料板の電荷量を測定する電荷itt+定装置とを
具備したことを特徴としている。
[Structure of the Invention] (Means for Solving the Problems) The electrostatic solid surface analysis device of the present invention includes a sample plate in which a sample layer is closely provided on a conductive substrate, and a sample plate that is tilted. a sample plate holding means for holding the sample plate in the same state; a powder supply means for pouring reference powder onto the sample layer of the sample plate; and an electrically insulated means for receiving the reference powder that has fallen onto the sample layer of the sample plate. It is characterized by comprising a supported conductive receptor and a charge itt+ constant device for measuring the amount of charge on the conductive receptor or the sample plate.

上記装置の導電性基板に密接して設ける試料層としては
、有機物または無機物で構成された板およびフィルムあ
るいは有機物または無機物の固体、粉体を固めた粉体層
が例示される。これらは、溶液または分散液の状態で導
電性基板上に塗布し乾燥して塗膜の状態で使用される。
Examples of the sample layer provided closely to the conductive substrate of the above device include plates and films made of organic or inorganic substances, or powder layers made of solid or powdered organic or inorganic substances. These are applied in the form of a solution or dispersion onto a conductive substrate and dried to form a coating film.

試料板の傾斜角は、45〜75″の範囲で、基準粉体の
種類、粒度あるいは試料層の種類によって適宜選択され
、再現性の良い測定値が得られる最適値に調整して固定
される。一般に、大粒径の基準粉体では低傾斜度を、ま
た小粒径で接触帯?!S 量が大きい基準粉体あるいは
粘着性のある試料板では高角度に選択される。
The inclination angle of the sample plate is selected as appropriate in the range of 45 to 75'' depending on the type and particle size of the reference powder, or the type of sample layer, and is adjusted and fixed to the optimal value that allows measurement values with good reproducibility to be obtained. In general, a low angle of inclination is selected for a reference powder with a large particle size, and a high angle is selected for a reference powder with a small particle size and a large amount of contact zone?!S or a sticky sample plate.

また、上記試料層に落下させる基準粉体としては、平均
粒径30〜1000μ腸程度の有機又は無機質の粉体が
使用され、例えば、鉄粉、ガラス粉、樹脂粉等を用いる
ことができる。これらの基準粉体はできるかぎり球状で
あることが望ましい。
Further, as the reference powder to be dropped onto the sample layer, an organic or inorganic powder having an average particle size of about 30 to 1000 μm is used, and for example, iron powder, glass powder, resin powder, etc. can be used. It is desirable that these reference powders be as spherical as possible.

なお本発明の装置は、装置全体を密閉容器中に入れ、一
定温度、一定湿度の雰囲気中で測定を行なうことが望ま
しい。
It is preferable that the entire device of the present invention is placed in a sealed container and the measurement is performed in an atmosphere of constant temperature and constant humidity.

(作用) 本発明の静電式固体表面解析装置では、試料板を傾斜配
置し、その上部から基準粉体を流しかけると、流下した
基準粉体と試料層とのJI8!擦により、基準粉体と試
料層にそれぞれ極性が逆で電荷量の絶対値の等しい電荷
が発生し、基準粉体は帯電した状態で導電性受容器中に
落下する。
(Function) In the electrostatic solid surface analysis device of the present invention, when the sample plate is arranged at an angle and the reference powder is poured from above, the falling reference powder and the sample layer are JI8! By rubbing, charges are generated in the reference powder and the sample layer with opposite polarities and equal absolute values, and the reference powder falls in a charged state into the conductive receptor.

そして試料板の導電性基板を接地させ、導電性受容器を
電荷測定装置の入力端子に接続しておくと、試料板に帯
電した電荷は導電性基板を通って放電され、導電性受容
器に落下した基準粉体の電荷Qは電荷測定装置により測
定される。
Then, if the conductive substrate of the sample plate is grounded and the conductive receptor is connected to the input terminal of the charge measuring device, the electric charge on the sample plate will be discharged through the conductive substrate and will be transferred to the conductive receptor. The charge Q of the fallen reference powder is measured by a charge measuring device.

測定電荷は、Q−CVで求められる。The measured charge is determined by Q-CV.

(ただし、Cは電荷測定装置に内蔵されている標桑コン
デンサーの静電容量、■は電荷測定装置で測定される電
位) (実施例) 次に本発明の一実施例を図面を参照して説明する。
(However, C is the capacitance of the capacitor built into the charge measuring device, and ■ is the potential measured by the charge measuring device.) (Example) Next, an example of the present invention will be described with reference to the drawings. explain.

第1図において、導電性基板1]−上に、測定すべき試
料を用いて密接した試料層]2を形成してなる試料板1
3は、固定部材14により支持台15に所定の角度で固
定されている。
In FIG. 1, a sample plate 1 comprising a conductive substrate 1 and a closely spaced sample layer 2 formed thereon with a sample to be measured.
3 is fixed to a support base 15 at a predetermined angle by a fixing member 14.

導電性基板】1の材質としては、通常、アルミ、鉄、銅
、真ちゅう、ステンレスのような金属や、ベースとなる
プラスチックに金属粉末やカーボンブラック等のような
導電性物質を配合した導電性組成物が用いられるが、絶
縁性のプラスチックにより所定の形状に成形した後、そ
の表面に金属メツキまたは導電性組成物の塗布により導
電性を伺与したものも使用できる。
[Conductive substrate] The material for 1 is usually a metal such as aluminum, iron, copper, brass, or stainless steel, or a conductive composition made of a base plastic mixed with a conductive substance such as metal powder or carbon black. However, it is also possible to use an insulating plastic that is molded into a predetermined shape and then made conductive by metal plating or coating the surface with a conductive composition.

測定対象の試料は、無機物、有機物のいずれの固体であ
ってもよく、導電性基板11上に、膜状、板状、微粉体
状で密接して形成される。試料が溶剤に溶解または分散
して塗料となるときは、これを導電性基板11上に塗布
し乾燥させてフィルムとし、また板状に成形できるもの
は板状に成形して導電塗料により導電性基板11上に貼
着して使用される。試料が粉体の場合には、導電性基板
11上に塗布した導電塗料の未乾燥の膜上に吹付は等に
より付着させて試料層として用いられる。
The sample to be measured may be any solid, inorganic or organic, and is formed closely on the conductive substrate 11 in the form of a film, plate, or fine powder. When the sample is dissolved or dispersed in a solvent to form a paint, it is coated on the conductive substrate 11 and dried to form a film, or if it can be formed into a plate, it is formed into a plate and made conductive with a conductive paint. It is used by being attached onto the substrate 11. When the sample is a powder, it is applied as a sample layer by spraying or the like onto an undried film of conductive paint applied on the conductive substrate 11.

固定部材14は、一般に絶縁性材料で形成されるが、支
持台15が、例えば、ポリスチレン樹脂、ポリ四フッ化
エチレン樹脂、ポリアクリル樹脂、その他のプラスチッ
クのような絶縁材料で形成されている場合には、金属材
料のような導電材料を用いることができる。要するに、
固定部材14および支持台15の一方により、導電性基
板11が、大地から電気的に絶縁されていればよい。
The fixing member 14 is generally made of an insulating material, but when the support base 15 is made of an insulating material such as polystyrene resin, polytetrafluoroethylene resin, polyacrylic resin, or other plastics. A conductive material such as a metal material can be used. in short,
It is only necessary that the conductive substrate 11 be electrically insulated from the ground by one of the fixing member 14 and the support base 15.

そしてこの実施例の装置には、固定部材14に長溝16
aが形成され、この長溝に16aに係合する導電性基板
11を支持するビン16bとで調節機構16が構成され
ている。この調節機構16でビン16bの係止位置を変
えることにより、傾斜角を水平面から45〜75″の範
囲の任意の角度に調節することができる。
The device of this embodiment has a long groove 16 in the fixing member 14.
The adjusting mechanism 16 includes a pin 16b that supports the conductive substrate 11 and is engaged with the long groove 16a. By changing the locking position of the bin 16b using this adjustment mechanism 16, the inclination angle can be adjusted to any angle in the range of 45 to 75'' from the horizontal plane.

試料板13上には、試料層12表面へ基準粉体17を一
定の供給速度で落下させる基準粉体供給装置18が配置
されている。この基準粉体供給装置18は、基準粉体1
7の貯蔵部1つと供給管20とから成っており、供給管
20の供給孔21には供給の開始および停止を制御する
シャッタ一部材22が挿入されている。シャッタ一部材
22は電磁力あるいは空気圧を利用した作動装置23に
より上下に動いて基準粉体の供給速度を調節するように
なっており、予め設定したタイマー24の設定時間に従
って供給管先端の供給孔21を開閉する。この作動装置
23およびシャッタ一部材22は供給管20の中央部で
制御できるようにするか、あるいは偏平状のシャッター
として供給管の先端で前後、左右に動かすことにより供
給孔2]が開閉されるようになっている。
A reference powder supply device 18 is arranged on the sample plate 13 to drop the reference powder 17 onto the surface of the sample layer 12 at a constant supply speed. This reference powder supply device 18 supplies the reference powder 1
7 and a supply pipe 20, and a shutter member 22 for controlling the start and stop of supply is inserted into the supply hole 21 of the supply pipe 20. The shutter member 22 is moved up and down by an actuating device 23 using electromagnetic force or air pressure to adjust the supply speed of the reference powder, and the supply hole at the tip of the supply pipe is moved according to a preset time of a timer 24. 21 is opened and closed. The actuating device 23 and the shutter member 22 can be controlled from the center of the supply pipe 20, or the supply hole 2 can be opened and closed by moving them back and forth or from side to side as a flat shutter at the tip of the supply pipe. It looks like this.

基準粉体供給装置18は、試料層12との距離を一定に
保ちつつ、第2図に示すように矢印方向に移動して、試
14板コ3の表面上の任意の位置から基準粉体17を流
しかけることができる移動装置(図示していない)に固
定されている。
The reference powder supply device 18 moves in the direction of the arrow as shown in FIG. 2 while maintaining a constant distance from the sample layer 12, and feeds the reference powder from any position on the surface of the 14 test plates 3. 17 is fixed on a moving device (not shown) through which it can be poured.

また試料板13の末端下方には、流しかけた基準粉体1
7を補集するための導電性受容器25が配置されている
。導電性受容器25は絶縁性支持台26によって大地か
ら絶縁して支持されており、電荷測定端子27より電荷
測定系28に接続されている。
In addition, a reference powder 1 is poured onto the lower end of the sample plate 13.
A conductive receptor 25 for collecting 7 is arranged. The conductive receptor 25 is supported by an insulating support base 26 while being insulated from the ground, and is connected to a charge measurement system 28 through a charge measurement terminal 27 .

電荷測定系28はコンデレサ(静電容ユC)2つとエレ
クトロメータ30とからなっており、その測定端子31
を導電性受容器25の端子27と接続することにより、
試料層と接触して導電性受容器25に流れ込んだ基準粉
体の電荷を、Q−CVの関係式から求める構成となって
いる。この電荷量を記録部(図示せず)で表示すること
ができる。記録部は、通常の記録計の他、コンピュータ
に制御され、FDで管理されたものでもよい。
The charge measurement system 28 consists of two capacitors (electrostatic capacitors C) and an electrometer 30, and its measurement terminal 31
By connecting with the terminal 27 of the conductive receptor 25,
The structure is such that the electric charge of the reference powder that has come into contact with the sample layer and flowed into the conductive receptor 25 is determined from the Q-CV relational expression. This amount of charge can be displayed on a recording unit (not shown). The recording unit may be a normal recorder or may be one controlled by a computer and managed by an FD.

これら測定系28は密閉容器32に納められ、容器中は
加圧、真空および空気、窒素ガス、炭酸ガス等任意の雰
囲気に設定することができ、試料111!213に対す
る基準粉体17の流しかけ位置の設定、タイマによる粉
体の流しかけ時間(量)の設定等はすべて容器32の外
部で行えるようになっている。
These measurement systems 28 are housed in a sealed container 32, and the inside of the container can be set to any desired atmosphere such as pressurized, vacuum, air, nitrogen gas, carbon dioxide gas, etc., and the reference powder 17 is poured onto the samples 111 and 213. Setting the position, setting the powder pouring time (amount) using a timer, etc. can all be performed outside the container 32.

この実施例の装置は次のように使用される。The device of this embodiment is used as follows.

まず、試料板13の導電性基板11上に試料層12を形
成し、この試料板13を固定部材14に所定の角度に傾
斜させて固定する。次に基準粉体供給装置18に基準粉
体17を収容し、さらに密閉容器32中を所望の雰囲気
とし、シャッタ一部材22を操作17て基準粉体]7を
試料板13の試料層12上に流下させる。基準粉体17
は試料層12を流下しながら、試料層12との接触によ
り接触帯電電荷を獲得した後、導電性受容器25に補集
される。
First, the sample layer 12 is formed on the conductive substrate 11 of the sample plate 13, and the sample plate 13 is fixed to the fixing member 14 at a predetermined angle. Next, the reference powder 17 is stored in the reference powder supply device 18 , the airtight container 32 is made into a desired atmosphere, and the shutter member 22 is operated 17 to transfer the reference powder] 7 onto the sample layer 12 of the sample plate 13 . flow down to. Standard powder 17
While flowing down the sample layer 12, it acquires a contact charge due to contact with the sample layer 12, and is then collected on the conductive receptor 25.

そしてこの導電性受容器25に補集された基準粉体17
の電荷が、電荷測定端子27を介して電荷’API定系
28によりnl定される。このとき試料板13は端子3
3により接地されている。
The reference powder 17 collected in this conductive receptor 25
The charge nl is determined by the charge 'API constant system 28 via the charge measurement terminal 27. At this time, the sample plate 13 is
It is grounded by 3.

第3図は、導電性基板であるアルミニウム板上に試料層
として塩化ビニル膜を塗布形成し、この上に基準粉体で
ある平均粒径100μlの鉄粉を繰返(2流した時電荷
測定系28により測定された電荷量の変化を示す測定曲
線である。同図(a)から明らかなように、流しかける
時間(流下量一定)に伴う帯電量増加の直線性は極めて
優れており、また、一定量の鉄粉を繰返し流しかけた時
の発生帯電量も等しくなっている。
In Figure 3, a vinyl chloride film was coated as a sample layer on an aluminum plate, which is a conductive substrate, and a reference powder, iron powder with an average particle size of 100 μl, was repeatedly flowed (two times) on top of this, and the charge was measured. This is a measurement curve showing the change in the amount of charge measured by System 28. As is clear from FIG. Furthermore, the amount of charge generated when a certain amount of iron powder is repeatedly poured is also the same.

なお以上の実施例では、電荷測定系28を導電性受容器
25に測定した例について説明したが、本発明はかかる
実施例に限定されるものではなく、電荷測定系28を導
電性基板11に取付けた端子33に接続し、端子27を
接地させて導電性基板11の電荷を測定するようにして
もよい。この場合、一定量の粉体が試料層12表面を流
れ落ちたのちAPI定される電荷量は、前述した実施例
と粉体の電荷量と等量で逆の極性である。
In the above embodiment, an example was explained in which the charge measurement system 28 was used to measure the conductive receptor 25, but the present invention is not limited to such an embodiment, and the charge measurement system 28 was mounted on the conductive substrate 11. The charge on the conductive substrate 11 may be measured by connecting it to the attached terminal 33 and grounding the terminal 27. In this case, the amount of charge determined by API after a certain amount of powder flows down the surface of the sample layer 12 is the same amount and opposite polarity to the amount of charge of the powder as in the above-described embodiment.

更に、電流計35を有する電流A11l定系34の端子
36を電荷測定端子27や導電性基板11に取(1けた
端子33に接続し、基準粉体の電荷量及び導電性基板1
1の電荷量を第3図(b)に示すように放電電流として
測定することもできる。
Furthermore, the terminal 36 of the current A11l constant system 34 having the ammeter 35 is connected to the charge measurement terminal 27 and the conductive substrate 11 (connected to the 1-digit terminal 33), and the charge amount of the reference powder and the conductive substrate 1
The amount of charge of 1 can also be measured as a discharge current as shown in FIG. 3(b).

(発明の効果] 以上の実施例からも明らかなように、本発明の装置によ
れば、傾斜法により試料層の帯電電荷量を高精度で測定
することがせてき、接触面の化学組成の解析を行うこと
が可能である。
(Effects of the Invention) As is clear from the above examples, according to the apparatus of the present invention, the amount of charge on the sample layer can be measured with high precision by the gradient method, and the chemical composition of the contact surface can be measured with high accuracy. It is possible to perform analysis.

したがって、本発明の装置は、次のような多くの分野に
おいて特性評価に使用することができる。
Therefore, the device of the present invention can be used for characterization in many fields, such as:

■酸化による負帯電量の増加を高精度で検知して塗膜酸
化反応の追跡をすることができる。
■It is possible to trace the coating film oxidation reaction by detecting the increase in the amount of negative charge due to oxidation with high precision.

■硬化反応による帯電量の変化を測定して塗膜硬化反応
の追跡をすることができる。
■It is possible to track the coating film curing reaction by measuring the change in the amount of charge caused by the curing reaction.

■潤滑剤、分散剤なとの滲み出しを帯電量で検知する添
加物の滲み出しくブリーディング)特性評価をすること
ができる。
■The oozing of lubricants and dispersants can be detected by the amount of charge, and the oozing (bleeding) characteristics of additives can be evaluated.

■顔料、染料の分散状態、異種ポリマーの混合状態等の
各種の混合状態の評価をすることができる。
- It is possible to evaluate various mixing states, such as the dispersion state of pigments and dyes, and the mixing state of different types of polymers.

■材料の帯電制御のためのデータを収集し塗膜帯電特性
の評価をすることができる。
■It is possible to collect data for charge control of materials and evaluate coating film charge characteristics.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の構成を概略的に示す側面図、第2図は
その試料板部分の上面図、第3図は本発明の効果を示す
グラフである。 11・・・・・・・・・導電性基板 12・・・・・・・・試料層 14・・・・・・・・・固定部材 16・・・・・・・・・調節機構 18・・・・・・・・・基準粉体供給装置17・・・・
・・・・・基準粉体 19・・・・・・・・・貯蔵部 20・・・・・・・・供給管 21・・・・・・・・・供給孔 22・・・・・・・・・シャッタ一部材23・・・・・
・・・・作動装置 24・・・・・・・・・タイマー 25・・・・・・・・・導電性受容器 28・・・・・・・・・電荷測定系 32・・・・・・・・・密閉容器
FIG. 1 is a side view schematically showing the structure of the present invention, FIG. 2 is a top view of the sample plate portion thereof, and FIG. 3 is a graph showing the effects of the present invention. 11... Conductive substrate 12... Sample layer 14... Fixed member 16... Adjustment mechanism 18. ......Reference powder supply device 17...
...Reference powder 19...Storage section 20...Feed pipe 21...Feed hole 22... ...Shutter part 23...
...Actuation device 24... Timer 25... Conductive receptor 28... Charge measuring system 32...・・・Airtight container

Claims (3)

【特許請求の範囲】[Claims] (1)導電性基板の上に試料層を密接して設けてなる試
料板と、この試料板を傾斜状態で保持する試料板保持手
段と、前記試料板の試料層に基準粉体を流しかける粉体
供給手段と、前記試料板の試料層上を落下した基準粉体
を受ける電気的に絶縁して支持された導電性受容器と、
前記導電性受容器または前記試料板の電荷量を測定する
電荷測定装置とを具備したことを特徴とする静電式固体
表面解析装置。
(1) A sample plate having a sample layer closely spaced on a conductive substrate, a sample plate holding means for holding the sample plate in an inclined state, and a reference powder being poured onto the sample layer of the sample plate. a powder supply means; a conductive receptor supported in an electrically insulated manner for receiving the reference powder that has fallen on the sample layer of the sample plate;
An electrostatic solid surface analysis device comprising: a charge measuring device for measuring the amount of charge of the conductive receptor or the sample plate.
(2)試料板の傾斜角が、水平面に対して45〜75°
に設定されている請求項1記載の静電式固体表面解析装
置。
(2) The inclination angle of the sample plate is 45 to 75 degrees with respect to the horizontal plane.
The electrostatic solid surface analysis device according to claim 1, wherein the electrostatic solid surface analysis device is set to.
(3)試料板、試料板保持手段、粉体供給手段および導
電性受容器が密閉容器中に納められており、基準粉体の
試料層への流しかけ位置、基準粉体の流しかけ量が外部
より制御できるようにされている請求項1または2記載
の静電式固体表面解析装置。
(3) The sample plate, sample plate holding means, powder supply means, and conductive receptor are housed in a sealed container, and the position at which the reference powder is poured onto the sample layer and the amount of the reference powder poured are controlled. 3. The electrostatic solid surface analysis device according to claim 1, wherein the electrostatic solid surface analysis device is capable of being controlled from the outside.
JP27866888A 1988-11-04 1988-11-04 Electrostatic type solid-state surface analyzer Pending JPH02126152A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27866888A JPH02126152A (en) 1988-11-04 1988-11-04 Electrostatic type solid-state surface analyzer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27866888A JPH02126152A (en) 1988-11-04 1988-11-04 Electrostatic type solid-state surface analyzer

Publications (1)

Publication Number Publication Date
JPH02126152A true JPH02126152A (en) 1990-05-15

Family

ID=17600497

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27866888A Pending JPH02126152A (en) 1988-11-04 1988-11-04 Electrostatic type solid-state surface analyzer

Country Status (1)

Country Link
JP (1) JPH02126152A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013080035A (en) * 2011-10-03 2013-05-02 Hoya Corp Charging state inspection tool for spectacle lens and charging state inspection method for spectacle lens

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5520536A (en) * 1978-07-28 1980-02-14 Fujitsu Ltd Coordinate position detector
JPS59217157A (en) * 1983-05-26 1984-12-07 Sankyo Dengiyou Kk Surface reform meter
JPS62228946A (en) * 1986-03-31 1987-10-07 Toray Ind Inc Method and instrument for measuring surface characteristic of film

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5520536A (en) * 1978-07-28 1980-02-14 Fujitsu Ltd Coordinate position detector
JPS59217157A (en) * 1983-05-26 1984-12-07 Sankyo Dengiyou Kk Surface reform meter
JPS62228946A (en) * 1986-03-31 1987-10-07 Toray Ind Inc Method and instrument for measuring surface characteristic of film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013080035A (en) * 2011-10-03 2013-05-02 Hoya Corp Charging state inspection tool for spectacle lens and charging state inspection method for spectacle lens

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