JPH02125236U - - Google Patents
Info
- Publication number
- JPH02125236U JPH02125236U JP3506589U JP3506589U JPH02125236U JP H02125236 U JPH02125236 U JP H02125236U JP 3506589 U JP3506589 U JP 3506589U JP 3506589 U JP3506589 U JP 3506589U JP H02125236 U JPH02125236 U JP H02125236U
- Authority
- JP
- Japan
- Prior art keywords
- gear
- clutch plate
- drive gear
- engages
- cam portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Retarders (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3506589U JPH0620931Y2 (ja) | 1989-03-28 | 1989-03-28 | 滑り制限差動装置 |
DE69013037T DE69013037T2 (de) | 1989-03-28 | 1990-03-26 | Schlupfbegrenztes Differential. |
US07/498,844 US5037362A (en) | 1989-03-28 | 1990-03-26 | Limited slip differential |
EP90303197A EP0390466B1 (en) | 1989-03-28 | 1990-03-26 | Limited slip deferential |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3506589U JPH0620931Y2 (ja) | 1989-03-28 | 1989-03-28 | 滑り制限差動装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02125236U true JPH02125236U (et) | 1990-10-16 |
JPH0620931Y2 JPH0620931Y2 (ja) | 1994-06-01 |
Family
ID=31540099
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3506589U Expired - Lifetime JPH0620931Y2 (ja) | 1989-03-28 | 1989-03-28 | 滑り制限差動装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0620931Y2 (et) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9341936B2 (en) | 2008-09-01 | 2016-05-17 | D2S, Inc. | Method and system for forming a pattern on a reticle using charged particle beam lithography |
US9323140B2 (en) | 2008-09-01 | 2016-04-26 | D2S, Inc. | Method and system for forming a pattern on a reticle using charged particle beam lithography |
US8039176B2 (en) | 2009-08-26 | 2011-10-18 | D2S, Inc. | Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography |
US20120219886A1 (en) | 2011-02-28 | 2012-08-30 | D2S, Inc. | Method and system for forming patterns using charged particle beam lithography with variable pattern dosage |
US8057970B2 (en) | 2008-09-01 | 2011-11-15 | D2S, Inc. | Method and system for forming circular patterns on a surface |
US7901850B2 (en) | 2008-09-01 | 2011-03-08 | D2S, Inc. | Method and system for design of a reticle to be manufactured using variable shaped beam lithography |
US9164372B2 (en) | 2009-08-26 | 2015-10-20 | D2S, Inc. | Method and system for forming non-manhattan patterns using variable shaped beam lithography |
US9448473B2 (en) | 2009-08-26 | 2016-09-20 | D2S, Inc. | Method for fracturing and forming a pattern using shaped beam charged particle beam lithography |
US9034542B2 (en) | 2011-06-25 | 2015-05-19 | D2S, Inc. | Method and system for forming patterns with charged particle beam lithography |
WO2013158573A1 (en) | 2012-04-18 | 2013-10-24 | D2S, Inc. | Method and system for forming patterns using charged particle beam lithograph |
-
1989
- 1989-03-28 JP JP3506589U patent/JPH0620931Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0620931Y2 (ja) | 1994-06-01 |
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