JPH021192B2 - - Google Patents

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Publication number
JPH021192B2
JPH021192B2 JP7133382A JP7133382A JPH021192B2 JP H021192 B2 JPH021192 B2 JP H021192B2 JP 7133382 A JP7133382 A JP 7133382A JP 7133382 A JP7133382 A JP 7133382A JP H021192 B2 JPH021192 B2 JP H021192B2
Authority
JP
Japan
Prior art keywords
polyimide
varnish
powder
diamine
tetraorganic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7133382A
Other languages
Japanese (ja)
Other versions
JPS58189260A (en
Inventor
Yasuo Miura
Yoshi Hiramoto
Masuichi Eguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP7133382A priority Critical patent/JPS58189260A/en
Publication of JPS58189260A publication Critical patent/JPS58189260A/en
Publication of JPH021192B2 publication Critical patent/JPH021192B2/ja
Granted legal-status Critical Current

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  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Paints Or Removers (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は、耐熱性物質を与える新規なポリイミ
ド粉末含有ポリイミドワニスの製造方法に関する
ものである。 従来、粉末含有ポリイミドワニスの製造方法と
しては、通常のポリイミドワニスに、無機又は有
機の粉末を入れ、撹拌等の機械的方法により混合
分散させるという方法が取られていた。 しかし、この方法では、ワニス中に粉末を大
量、均一に分散させることが困難であり、このワ
ニスを顕微鏡下で観察すると多数の二次凝集体が
見られる。 このワニスをたとえばスクリーン印刷用インク
として使用した場合、インクのスクリーンからの
“抜け”が悪く、多数回印刷ができず、得られた
塗布膜も二次凝集体が散見され、均一な塗布膜が
得られない。 本発明の目的は、粉末が大量、均一にワニス中
に分散し、ポリイミドワニスの製造方法を提供す
ることにある。 本発明は、上記目的を達成するため次の構成、
すなわち、テトラ有機カルボン酸無水物とジアミ
ンを溶剤中で反応させ、得られたポリイミド前駆
体溶液をイミド閉環温度で加熱してポリイミド粉
末を析出させ、得られたポリイミド粉末の懸濁液
中で、テトラ有機カルボン酸無水物とジアミンを
反応させポリイミド前駆体を形成するポリイミド
ワニスの製造方法を特徴とするものである。 本発明に適用されるテトラ有機カルボン酸無水 物とは、一般式OCO COR1CO COO で示されるもので、同式のR1は、炭素数6以上
20以下の芳香族環又は芳香族性複素環で、カルボ
ニル基がオルソ又はペリの位置に結合されるもの
である。R1の例としてはフエニル基、ナフタレ
ン基、ペリレン基、ジフエニル基、ジフエニルエ
ーテル基、ジフエニルスルホン基、2,2′―ジフ
エニルプロパン基、ベンゾフエノン基などが典型
的な例として挙げられるが、これらに限定されな
い。特に望ましいのはフエニル基とベンゾフエノ
ン基である。 なお、粉末の原料として使用するテトラ有機カ
ルボン酸無水物とポリイミド粉末の顕濁液中でポ
リイミド前駆体を形成するために使用するテトラ
カルボン酸無水物とは同一物でも異なつた物質で
もよい。 次に本発明に適用されるジアミンとは、一般式
H2N―R2―NHで示されるもので、同式のR2
芳香族環又は芳香族性複素環から成るものであ
る。R2の例としてジフエニルエーテル基、フエ
ニル基、トルイレン基、ジフエニルメタン基、ジ
フエニルスルホン基などが典型的な例として挙げ
られる。また、これらの基に粉末形性能、耐熱性
に悪影響を与えない範囲で、これらの基がアミノ
基、アシド基、カルボキシル基、スルホン酸基な
どの置換基を有していてもよい。とくにジフエニ
ルエーテル基、フエニル基が望ましく用いられ
る。 なお、粉末の原料として使用されるジアミンと
ポリイミド粉末の懸濁液中でポリイミド前駆体を
形成するために使用されるジアミンとは同一物で
も異なつた物質であつてもよい。 テトラ有機カルボン酸無水物とジアミンを反応
させるために用いる溶剤としてはポリマの溶解性
の面から主として極性溶媒が望ましい。極性溶媒
の例として、ジメチルスルホキシド、ジメチルホ
ルムアミド、ジメチルアセトアミド、N―メチル
2―ピロリドン、ヘキサメチルホスホロアミドな
どが好ましく用いられる。 上記テトラ有機カルボン酸無水物とジアミンを
溶剤中で反応させる方法としては溶剤中に撹拌下
でジアミンを添加して溶かし、溶解後テトラ有機
カルボン酸無水物を添加して反応させる。テトラ
有機カルボン酸無水物(A)とジアミン(B)との比(A)/
(B)は、0.7〜1、好ましくは0.8〜0.95が望ましい。
この比が0.7以下では製造されたワニスの展延性
が悪く、スクリーン印刷用インクとして使用する
際連続して印刷することが困難になる。 ポリイミド前駆体溶液でのポリイミド前駆体の
濃度は20〜35%好ましくは23〜30%が望ましい。
20%未満ではワニス中における粉末の比率が低く
すぎ、スクリーン印刷用インクとして使用する際
パターンの形態保持性が悪く、35%以上ではポリ
イミド前駆体溶液の粘度が高く撹拌が困難にな
る。 ポリイミド前駆体溶液を作るため反応温度とし
ては、40〜80℃、好ましくは40〜60℃が望まし
い。40℃以下では重合速度が遅く、80℃以上では
分子量低下をもたらし好ましくない。 ポリイミド前駆体の溶液からイミド粉末を析出
させるためのイミド閉環温度は、上限は使用する
溶剤の沸点で、下限はポリマーによつて多少異な
るが100〜200℃、好ましくは110〜170℃が望まし
い。 このポリイミド粉末の懸濁液を作る工程で、次
のポリイミド前駆体の重合がより円滑に進むこと
を目的として、チツ素フロー、真空による吸引等
によりイミド閉環時発生した縮合水を除いてもよ
い。 ポリイミド粉末の懸濁液中でポリイミド前駆体
を重合する際の重合温度としては40℃〜80℃好ま
しくは40℃〜60℃が望ましい。40℃以下では重合
速度が遅く、80℃以上では分子量低下によるワニ
スの粘度低下をもたらし好ましくない。 ジアミンであるH2N―R2―NH2テトラ有機カ
ルボン酸無水物である
The present invention relates to a method for producing a novel polyimide powder-containing polyimide varnish that provides a heat-resistant material. Conventionally, the method for producing powder-containing polyimide varnish has been to add inorganic or organic powder to a normal polyimide varnish and mix and disperse it using a mechanical method such as stirring. However, with this method, it is difficult to uniformly disperse a large amount of powder in the varnish, and when this varnish is observed under a microscope, many secondary aggregates are seen. When this varnish is used as an ink for screen printing, for example, the ink does not easily "come through" the screen, making it impossible to print multiple times, and the resulting coating film also contains secondary aggregates, making it impossible to achieve a uniform coating film. I can't get it. An object of the present invention is to provide a method for producing a polyimide varnish in which a large amount of powder is uniformly dispersed in a varnish. In order to achieve the above object, the present invention has the following configuration:
That is, a tetraorganic carboxylic acid anhydride and a diamine are reacted in a solvent, the obtained polyimide precursor solution is heated at the imide ring closing temperature to precipitate polyimide powder, and in the suspension of the obtained polyimide powder, The present invention is characterized by a method for producing a polyimide varnish, in which a tetraorganic carboxylic acid anhydride and a diamine are reacted to form a polyimide precursor. The tetraorganic carboxylic acid anhydride applied to the present invention is represented by the general formula OCO COR 1 CO COO, where R 1 has a carbon number of 6 or more.
An aromatic ring or an aromatic heterocycle having 20 or less carbonyl groups bonded to the ortho or peri position. Typical examples of R 1 include phenyl group, naphthalene group, perylene group, diphenyl group, diphenyl ether group, diphenyl sulfone group, 2,2'-diphenylpropane group, and benzophenone group. , but not limited to. Particularly preferred are phenyl and benzophenone groups. The tetraorganic carboxylic anhydride used as a raw material for the powder and the tetracarboxylic anhydride used to form the polyimide precursor in the polyimide powder suspension may be the same or different substances. Next, the diamine applied to the present invention has the general formula
It is represented by H 2 N—R 2 —NH, in which R 2 consists of an aromatic ring or an aromatic heterocycle. Typical examples of R 2 include diphenyl ether group, phenyl group, tolylene group, diphenylmethane group, and diphenyl sulfone group. Further, these groups may have substituents such as amino groups, acid groups, carboxyl groups, sulfonic acid groups, etc., as long as these groups do not adversely affect powder form performance and heat resistance. In particular, diphenyl ether group and phenyl group are preferably used. Note that the diamine used as a raw material for the powder and the diamine used to form the polyimide precursor in the suspension of polyimide powder may be the same or different substances. The solvent used for reacting the tetraorganic carboxylic acid anhydride and the diamine is preferably a polar solvent from the viewpoint of polymer solubility. As examples of polar solvents, dimethyl sulfoxide, dimethylformamide, dimethylacetamide, N-methyl 2-pyrrolidone, hexamethylphosphoramide, etc. are preferably used. As a method for reacting the tetraorganic carboxylic acid anhydride and diamine in a solvent, the diamine is added and dissolved in the solvent with stirring, and after dissolving, the tetraorganic carboxylic acid anhydride is added and reacted. Ratio (A) of tetraorganic carboxylic acid anhydride (A) and diamine (B)/
(B) is preferably 0.7 to 1, preferably 0.8 to 0.95.
If this ratio is less than 0.7, the varnish produced will have poor spreadability, making it difficult to print continuously when used as a screen printing ink. The concentration of the polyimide precursor in the polyimide precursor solution is preferably 20 to 35%, preferably 23 to 30%.
If it is less than 20%, the proportion of powder in the varnish is too low and the shape retention of the pattern is poor when used as a screen printing ink, and if it is more than 35%, the viscosity of the polyimide precursor solution becomes high and stirring becomes difficult. The reaction temperature for preparing the polyimide precursor solution is preferably 40 to 80°C, preferably 40 to 60°C. If the temperature is below 40°C, the polymerization rate will be slow, and if it is above 80°C, the molecular weight will decrease, which is not preferable. The imide ring-closing temperature for precipitating imide powder from a polyimide precursor solution has an upper limit of the boiling point of the solvent used and a lower limit of 100 to 200°C, preferably 110 to 170°C, although it varies somewhat depending on the polymer. In the process of making this polyimide powder suspension, condensed water generated during imide ring closure may be removed by nitrogen flow, vacuum suction, etc. in order to make the subsequent polymerization of the polyimide precursor proceed more smoothly. . The polymerization temperature when polymerizing the polyimide precursor in a suspension of polyimide powder is preferably 40°C to 80°C, preferably 40°C to 60°C. Below 40°C, the polymerization rate is slow, and above 80°C, the viscosity of the varnish decreases due to a decrease in molecular weight, which is undesirable. H 2 N—R 2 —NH 2 is a diamine and is a tetraorganic carboxylic acid anhydride.

【式】をポリ イミド粉末懸濁液中に添加する方法としては、
H2N―R2―NH2を加え、次に
The method for adding [Formula] into a polyimide powder suspension is as follows:
Add H 2 N―R 2 -NH 2 , then

【式】を加える、又はH2N―R2― NH2Add [formula] or H 2 N―R 2 - NH 2

【式】を容器中でよく混合し た後同時に添加する等の方法が望ましい。 ポリイミド粉末/ポリイミド前駆体の重量比は
70/30〜40/60好ましくは65/35〜45/55が望ま
しい。 ポリイミド粉末が70%以上では膜強度が低下
し、塗膜にひびわれ等が入りやすくなる。40%以
下ではワニスをスクリーン印刷用インクとして使
用した場合印刷パターンの形態保持性が悪くな
り、良好な印刷物が得られない。 さらに、一般式
It is preferable to mix [formula] thoroughly in a container and then add them at the same time. The weight ratio of polyimide powder/polyimide precursor is
70/30 to 40/60, preferably 65/35 to 45/55. If the polyimide powder content exceeds 70%, the film strength will decrease and the coating film will be more likely to crack. If the content is less than 40%, when the varnish is used as a screen printing ink, the shape retention of the printed pattern will be poor and good printed matter will not be obtained. Furthermore, the general formula

【式】とH2N―R2 ―NH2から成るポリイミド粉末、ポリイミド前
駆体にはもちろん粉末形成能、膜形成能、耐熱性
を著しく損わない範囲で他のモノマーを共重合し
たり有機又は/及び無機の粉末を添加してもよ
い。 本発明で記した製造方法により製造したポリイ
ミドワニスは200℃2時間熱風オーブン中で乾燥
した後の固形分が30〜45%で東京計器(株)製BS型
粘度が700〜2000ポイズのものである。 このワニスをカバーグラスに少量滴下し150倍
の光学顕微鏡下で粒子の分散性を調べた結果、粒
子の二次凝集は見られなかつた。又、ケンブリツ
ジ、インストルメント社製“Quantinet”720画
像処理解析装置を用い約3〜5倍に希釈したサン
ブルについて顕微鏡倍率150倍で粒度分布を測定
した結果粒径30μ以上の粗大粒子はなく、粒子が
均一に分散されていることがわかつた。 このワニスをLS―150GT(ニユーロング精密工
業(株)製)スクリーン印刷機で3mm×6mmの大きさ
で膜厚が50μのパターンが約200個並んだソフト
エラー防止膜用パターンをシリコンウエハー上
に、シリコーンスキージを用い150メツシユ、エ
マルジヨン膜厚100μのスクリーン印刷周期3
分/枚、スキージー角度69度、スクリーンとシリ
コンウエハーとの間隔2.8mm、印刷スピード4.6
cm/秒、印圧1Kg/cm2で印刷した結果、ワニスの
スクリーンからの“抜け”が良好で、パターンの
一部が欠けることもなく、連続してシリコンウエ
ハー100枚に塗ることができた。さらに得られた
塗布膜を80℃30分+150℃30分+200℃30分+350
℃30分のキユアステツプでキユアしたものを、
150倍の顕微鏡下で観察した結果、粒子が均一に
分散した良好な塗布膜が形成されていることを確
認した。 以下実施例にてさらに詳しく本発明について記
す。 実施例 1 N―メチル―2―ピロリドン(以下NMPと略
す)溶媒695.6gを三ツ口2のフラスコに秤取
する。これにジアミノジフエニルエーテル(以下
DAEと略す)120.1gを50℃で溶媒を撹拌しなが
ら加え、完全に溶解する。DAEが完全に溶解し
た後無水ピロメリツト酸(以下PMDAと略す)
124.3gを溶液を撹拌しながら少しづづつ加える。
DAEとPMDAが反応し、反応熱で系内の温度が
5〜10℃上昇する。30分反応させた後80℃に系内
温度を上昇しさらに30分反応させる。この時系内
は密閉系がN2フロー下に保つ。80℃で30分反応
させた後、冷却管をつけて密閉系で系内温度を
150℃に上昇させポリイミド粉末を析出させる。
150℃で1.5〜2.0時間反応させポリイミド粉末を
析出させ、その後70℃に降温する。70℃に系内が
なつた所でDAE94.3gを入れその後すぐにベン
ゾフエノンンテトラカルボン酸無水物(以下
BTDAと略す)139.3gを入れ反応させる。約1
時間反応させた所でBC型粘度計(東京計器(株)製)
で粘度を測定し、粘度を1000ポイズ±200ポイズ
に合わす。粘度が低い場合はBTDAを少量添加
し、高い場合はNMPで希釈する。粘度が合つた
所でさらに1時間反応させ取り出す。この方法で
作成したワニスは粉末/バインダー=1/1にも
かかわらず粉末の分散性が良好であることを顕微
鏡及び画像処理解析装置を用いて確めた。このワ
ニスをスクリーン印刷機で印刷した結果、ワニス
のスクリーンからの「抜け」が良好で、多数回印
刷が可能であつた。さらに得られた塗布膜をキユ
ラした結果、良好なポリイミド膜からなるパター
ンが得られた。 実施例 2 実施例1においてNMP単独溶剤の代りに
NMP/エチルセロソルブ(以下ECSと略す)=
85/15の混合溶剤系を用いて実施例1と全く同様
な方法でワニスを作成した。 できたワニスをLS―15Gスクリーン印刷機で
印刷した結果、良好な印刷性を持ち、実施例1と
同一のキユアステツプでキユアした結果、良好な
ポリイミド膜から成るパターンが得られた。 比較例 1 NMP695.6gを三ツ口2フラスコに秤取す
る。これにDAE120.1g50℃で溶媒を撹拌しなが
ら加え、完全に溶解する。DAEが完溶したら
PMDA124.3gを少しずつ加え50℃で30分反応さ
せる。この後80℃に昇温してさらに30分反応させ
る。この後150℃に昇温し、2.0時間150℃で反応
させポリイミド粉末を析出させる。この粉末を
3Gのガラスフイルターでろ過し、150℃で1昼夜
真空乾燥し、ポリイミド粉末を作成する。 別に2の三ツ口フラスコにNMP695.6gを取
り、これに70℃で撹拌しながらDAE94.3g入れ
完溶させる。DAEが完溶した後撹拌下で
BTDA139.3gを加え2時間反応させてポリイミ
ド酸を作成する。できたポリアミド酸溶液中に先
に作成したポリイミド粉末を少しずつ加えワニス
を作成した。このワニスを顕微鏡画像処理解析装
置で観察すると多数の二次凝集体が見られ、粉末
が均一にバインダー中に分散していないことがわ
かつた。このワニスを使つてスクリーン印刷した
所、ワニスのスクリーンからの「抜け」が悪く、
多数回印刷ができず、得られた塗布膜も二次凝集
体が散見られ、均一な塗布膜が得られなかつた。
Polyimide powder and polyimide precursor consisting of [Formula] and H 2 N--R 2 --NH 2 may be copolymerized with other monomers or organic Or/and inorganic powder may be added. The polyimide varnish manufactured by the manufacturing method described in the present invention has a solid content of 30 to 45% after drying in a hot air oven at 200°C for 2 hours, and a BS type manufactured by Tokyo Keiki Co., Ltd. with a viscosity of 700 to 2000 poise. be. A small amount of this varnish was dropped onto a cover glass and the dispersibility of the particles was examined under an optical microscope with a magnification of 150 times. As a result, no secondary aggregation of the particles was observed. In addition, the particle size distribution was measured at a microscope magnification of 150 times using a sample diluted approximately 3 to 5 times using a "Quantinet" 720 image processing analyzer manufactured by Cambridge Instrument Co., Ltd. The results showed that there were no coarse particles with a particle size of 30 μ or more. was found to be evenly distributed. This varnish was printed on a silicon wafer using an LS-150GT (manufactured by New Long Precision Industry Co., Ltd.) screen printing machine to form a soft error prevention film pattern with about 200 patterns of 3 mm x 6 mm in size and 50 μm in thickness. Screen printing cycle 3 using silicone squeegee with 150 meshes and emulsion film thickness of 100μ
min/page, squeegee angle 69 degrees, distance between screen and silicon wafer 2.8 mm, printing speed 4.6
As a result of printing at a printing pressure of 1 kg/cm 2 at a printing pressure of 1 kg/cm 2 , the varnish came through the screen well, and 100 silicon wafers could be coated continuously without any part of the pattern being chipped. . Furthermore, the obtained coating film was heated at 80°C for 30 minutes + 150°C for 30 minutes + 200°C for 30 minutes + 350°C.
Cure with a 30 minute curing step,
Observation under a microscope with a magnification of 150 times confirmed that a good coating film with uniformly dispersed particles was formed. The present invention will be described in more detail in Examples below. Example 1 695.6 g of N-methyl-2-pyrrolidone (hereinafter abbreviated as NMP) solvent was weighed into a three-necked flask. This is added to diaminodiphenyl ether (hereinafter
Add 120.1 g of DAE (abbreviated as DAE) at 50°C while stirring the solvent and dissolve completely. After DAE is completely dissolved, pyromellitic anhydride (hereinafter abbreviated as PMDA)
Add 124.3g little by little while stirring the solution.
DAE and PMDA react, and the temperature in the system increases by 5 to 10 degrees Celsius due to the heat of reaction. After reacting for 30 minutes, the system temperature was raised to 80°C and the reaction was continued for an additional 30 minutes. During this time frame, a closed system is kept under N2 flow. After reacting at 80℃ for 30 minutes, the temperature inside the system was controlled in a closed system using a cooling tube.
The temperature is raised to 150°C to precipitate polyimide powder.
The reaction is carried out at 150°C for 1.5 to 2.0 hours to precipitate polyimide powder, and then the temperature is lowered to 70°C. When the temperature of the system reached 70°C, 94.3 g of DAE was added and immediately after that, benzophenone tetracarboxylic anhydride (hereinafter referred to as
Add 139.3g (abbreviated as BTDA) and react. Approximately 1
BC type viscometer (manufactured by Tokyo Keiki Co., Ltd.)
Measure the viscosity and adjust the viscosity to 1000 poise ± 200 poise. If the viscosity is low, add a small amount of BTDA, if it is high, dilute with NMP. Once the viscosity is equal, the mixture is allowed to react for another hour and taken out. It was confirmed using a microscope and an image processing analysis device that the varnish produced by this method had good powder dispersibility despite the powder/binder ratio being 1/1. As a result of printing this varnish with a screen printing machine, the varnish "released" well from the screen, and it was possible to print multiple times. Furthermore, as a result of curing the obtained coating film, a pattern consisting of a good polyimide film was obtained. Example 2 In Example 1, NMP was used instead of the sole solvent.
NMP/ethyl cellosolve (hereinafter abbreviated as ECS) =
A varnish was prepared in exactly the same manner as in Example 1 using an 85/15 mixed solvent system. The resulting varnish was printed with an LS-15G screen printer and had good printability, and when cured using the same curing step as in Example 1, a pattern consisting of a good polyimide film was obtained. Comparative Example 1 695.6 g of NMP was weighed into a three-necked two-flask. Add 120.1 g of DAE to this while stirring the solvent at 50°C to completely dissolve. Once DAE is completely dissolved
Add 124.3 g of PMDA little by little and react at 50°C for 30 minutes. After this, the temperature was raised to 80°C and the reaction was continued for an additional 30 minutes. Thereafter, the temperature was raised to 150°C, and a reaction was performed at 150°C for 2.0 hours to precipitate polyimide powder. This powder
Filter through a 3G glass filter and vacuum dry at 150°C for one day and night to create polyimide powder. Separately, 695.6 g of NMP was placed in a three-necked flask, and 94.3 g of DAE was added thereto while stirring at 70°C until completely dissolved. After DAE is completely dissolved, under stirring
Add 139.3g of BTDA and react for 2 hours to create polyimide acid. The polyimide powder prepared earlier was added little by little to the resulting polyamic acid solution to prepare a varnish. When this varnish was observed using a microscope image processing and analysis device, many secondary aggregates were observed, indicating that the powder was not uniformly dispersed in the binder. When I screen printed using this varnish, the varnish did not come through the screen very well.
Printing could not be performed multiple times, secondary aggregates were observed here and there in the obtained coating film, and a uniform coating film could not be obtained.

Claims (1)

【特許請求の範囲】[Claims] 1 テトラ有機カルボン酸無水物とジアミンを溶
剤中で反応させ、得られたポリイミド前駆体溶液
をイミド閉環温度で加熱してポリイミド粉末を析
出させ、得られたポリイミド粉末の懸濁液中で、
テトラ有機カルボン酸無水物とジアミンを反応さ
せポリイミド前駆体を形成することを特徴とする
ポリイミドワニスの製造方法。
1. React a tetraorganic carboxylic acid anhydride and a diamine in a solvent, heat the obtained polyimide precursor solution at the imide ring-closing temperature to precipitate polyimide powder, and in the suspension of the obtained polyimide powder,
A method for producing a polyimide varnish, which comprises reacting a tetraorganic carboxylic acid anhydride and a diamine to form a polyimide precursor.
JP7133382A 1982-04-30 1982-04-30 Production of polyimide varnish Granted JPS58189260A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7133382A JPS58189260A (en) 1982-04-30 1982-04-30 Production of polyimide varnish

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7133382A JPS58189260A (en) 1982-04-30 1982-04-30 Production of polyimide varnish

Publications (2)

Publication Number Publication Date
JPS58189260A JPS58189260A (en) 1983-11-04
JPH021192B2 true JPH021192B2 (en) 1990-01-10

Family

ID=13457494

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7133382A Granted JPS58189260A (en) 1982-04-30 1982-04-30 Production of polyimide varnish

Country Status (1)

Country Link
JP (1) JPS58189260A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100965441B1 (en) * 2005-04-04 2010-06-24 우베 고산 가부시키가이샤 Copper clad laminate

Also Published As

Publication number Publication date
JPS58189260A (en) 1983-11-04

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