JPH02118751U - - Google Patents
Info
- Publication number
- JPH02118751U JPH02118751U JP2701789U JP2701789U JPH02118751U JP H02118751 U JPH02118751 U JP H02118751U JP 2701789 U JP2701789 U JP 2701789U JP 2701789 U JP2701789 U JP 2701789U JP H02118751 U JPH02118751 U JP H02118751U
- Authority
- JP
- Japan
- Prior art keywords
- target
- yoke
- face
- contact
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001755 magnetron sputter deposition Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
第１図は本考案の一実施例の装置の陰極部の約
半分の断面図、第２図は従来装置の陰極部の約半
分の断面図、第３図は補助ヨークの平面図、第４
図は第２図の装置における磁場強度の位置との関
係を示す線図、第５図は第１図の本考案の一実施
例の装置における磁場強度の位置との関係を示す
線図である。
１……ターゲツト、２……バツキングプレート
、３……電磁石、４……陰極ケース、６１，６２
……ヨーク、７……補助ヨーク。
FIG. 1 is a sectional view of about half of the cathode section of a device according to an embodiment of the present invention, FIG. 2 is a sectional view of about half of the cathode section of a conventional device, FIG. 3 is a plan view of the auxiliary yoke, and FIG.
The figure is a diagram showing the relationship between the magnetic field strength and the position in the device shown in FIG. 2, and FIG. 5 is a diagram showing the relationship between the magnetic field strength and the position in the device of the embodiment of the present invention shown in FIG. . 1... Target, 2... Bucking plate, 3... Electromagnet, 4... Cathode case, 61, 62
...Yoke, 7...Auxiliary yoke.
Claims (1)
裏面にバツキングプレートを介して中心に一つの
磁極を有する円環状磁石を備え、その磁石の両極
の端面にバツキングプレートを貫通するその表面
と同一平面に達するヨークが接触し、さらに円環
磁極の端面に接するヨークの端面にターゲツトを
囲む補助ヨークが接触するものにおいて、補助ヨ
ークの端面がターゲツトの陽極に対向する面と同
一平面上にあることを特徴とするマグネトロンス
パツタ装置。 A circular magnet with one magnetic pole in the center is provided on the back side of the flat target serving as the cathode facing the anode through a backing plate, and the end faces of both poles of the magnet are flush with the surface passing through the backing plate. The target yoke is in contact with the target, and the auxiliary yoke surrounding the target is in contact with the end face of the yoke that is in contact with the end face of the annular magnetic pole, and the end face of the auxiliary yoke is on the same plane as the surface facing the anode of the target. Magnetron sputtering device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989027017U JPH0734923Y2 (en) | 1989-03-09 | 1989-03-09 | Magnetron sputtering equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989027017U JPH0734923Y2 (en) | 1989-03-09 | 1989-03-09 | Magnetron sputtering equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02118751U true JPH02118751U (en) | 1990-09-25 |
| JPH0734923Y2 JPH0734923Y2 (en) | 1995-08-09 |
Family
ID=31249160
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989027017U Expired - Lifetime JPH0734923Y2 (en) | 1989-03-09 | 1989-03-09 | Magnetron sputtering equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0734923Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112739848A (en) * | 2018-09-27 | 2021-04-30 | 株式会社爱发科 | Magnet unit for magnetron sputtering device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5917896U (en) * | 1982-07-27 | 1984-02-03 | 三菱重工業株式会社 | Fast breeder reactor core components |
| JPS6338576A (en) * | 1986-08-01 | 1988-02-19 | Anelva Corp | Sputtering device |
-
1989
- 1989-03-09 JP JP1989027017U patent/JPH0734923Y2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5917896U (en) * | 1982-07-27 | 1984-02-03 | 三菱重工業株式会社 | Fast breeder reactor core components |
| JPS6338576A (en) * | 1986-08-01 | 1988-02-19 | Anelva Corp | Sputtering device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112739848A (en) * | 2018-09-27 | 2021-04-30 | 株式会社爱发科 | Magnet unit for magnetron sputtering device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0734923Y2 (en) | 1995-08-09 |