JPH0211794A - Platinum plating method - Google Patents
Platinum plating methodInfo
- Publication number
- JPH0211794A JPH0211794A JP16116588A JP16116588A JPH0211794A JP H0211794 A JPH0211794 A JP H0211794A JP 16116588 A JP16116588 A JP 16116588A JP 16116588 A JP16116588 A JP 16116588A JP H0211794 A JPH0211794 A JP H0211794A
- Authority
- JP
- Japan
- Prior art keywords
- platinum
- base material
- plating
- minutes
- tantalum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 title claims abstract description 147
- 229910052697 platinum Inorganic materials 0.000 title claims abstract description 74
- 238000007747 plating Methods 0.000 title claims abstract description 50
- 238000000034 method Methods 0.000 title claims description 23
- 239000000463 material Substances 0.000 claims abstract description 39
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 37
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 29
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 41
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 30
- 239000010955 niobium Substances 0.000 claims description 28
- 230000004913 activation Effects 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 34
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 abstract description 15
- 238000005498 polishing Methods 0.000 abstract description 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract description 12
- 238000005488 sandblasting Methods 0.000 abstract description 7
- 230000003213 activating effect Effects 0.000 abstract description 3
- 239000007788 liquid Substances 0.000 abstract description 3
- 238000009713 electroplating Methods 0.000 abstract description 2
- 230000001070 adhesive effect Effects 0.000 abstract 2
- 238000003754 machining Methods 0.000 abstract 1
- 238000007788 roughening Methods 0.000 abstract 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 abstract 1
- XJKVPKYVPCWHFO-UHFFFAOYSA-N silicon;hydrate Chemical compound O.[Si] XJKVPKYVPCWHFO-UHFFFAOYSA-N 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 32
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 30
- 239000002585 base Substances 0.000 description 27
- 238000000576 coating method Methods 0.000 description 26
- 238000005406 washing Methods 0.000 description 26
- 239000011248 coating agent Substances 0.000 description 25
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 21
- 239000002390 adhesive tape Substances 0.000 description 8
- 239000002131 composite material Substances 0.000 description 8
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- FCUFAHVIZMPWGD-UHFFFAOYSA-N [O-][N+](=O)[Pt](N)(N)[N+]([O-])=O Chemical compound [O-][N+](=O)[Pt](N)(N)[N+]([O-])=O FCUFAHVIZMPWGD-UHFFFAOYSA-N 0.000 description 6
- 235000013405 beer Nutrition 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 239000004094 surface-active agent Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 238000005868 electrolysis reaction Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 238000002203 pretreatment Methods 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical group 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- 239000002075 main ingredient Substances 0.000 description 2
- 150000007522 mineralic acids Chemical group 0.000 description 2
- 150000003057 platinum Chemical class 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001447 alkali salts Chemical class 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000501 effect on contamination Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 150000004673 fluoride salts Chemical class 0.000 description 1
- -1 fluorides Chemical class 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は白金のメッキ方法に係わり、詳しくは、ニオブ
やタンタルなどの基材上に白金を被覆するための前処理
方法に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a platinum plating method, and more particularly to a pretreatment method for coating platinum on a substrate such as niobium or tantalum.
(従来技術とその問題点)
白金は優れた電気的特性や耐腐蝕性を有しており、種々
の製品や部品に使用されている。そのひとつとして、セ
ンサーや電解、防蝕などの電極としての用途がある。し
かしながら白金は高価な材料であるので、電極を無垢の
白金とすると非常に高価になる。そこでチタンなどの合
材上に白金を被覆した電極を用いる場合がある。(Prior art and its problems) Platinum has excellent electrical properties and corrosion resistance, and is used in various products and parts. One of these uses is as an electrode for sensors, electrolysis, and corrosion protection. However, since platinum is an expensive material, using pure platinum for the electrode would be extremely expensive. Therefore, electrodes in which platinum is coated on a composite material such as titanium are sometimes used.
白金メッキ電極は、その使用とともに白金を僅かずつ消
耗するので、電極活性物質(白金)のりコーティングを
行う必要がある。しかし合材であるチタンまで腐蝕が進
行し、合材の再使用ができなくなっている場合も多々あ
り、合材を従来のチタンからより耐蝕性の高いニオブや
タンタルに替えて、合材の再利用の問題を解決する試み
がなされている。Platinum-plated electrodes gradually consume platinum as they are used, so they must be coated with electrode active material (platinum) glue. However, there are many cases in which corrosion has progressed to the titanium used in the composite material, making it impossible to reuse the composite material. Attempts are being made to solve usage problems.
しかしながら、白金メッキは析出物の内部応力が大きく
クラックや割れを生じやすく、また前記ニオブやタンタ
ルが強固な酸化被膜を形成しているために、合材である
ニオブやタンタルとの密着性が悪く、通常の前処理では
白金が剥がれやすいといった問題点があり、良いメッキ
方法が望まれていた。However, platinum plating has a high internal stress in the precipitates and is prone to cracks and cracks, and since the niobium and tantalum form a strong oxide film, it has poor adhesion with the composite material niobium and tantalum. However, there was a problem that platinum easily peeled off during conventional pretreatment, and a better plating method was desired.
(発明の目的)
本発明は、こうした問題点に鑑みてなされたもので、白
金メッキ前の合材の前処理方法を改良して、ニオブまた
はタンタル台材上に密着性の良い白金被覆を形成するこ
とができる方法を提供することを目的とする。(Objective of the Invention) The present invention was made in view of these problems, and improves the pretreatment method of composite material before platinum plating to form a platinum coating with good adhesion on a niobium or tantalum base material. The purpose is to provide a method that can be used.
(問題点を解決するための手段)
本発明は、ニオブまたはタンタル基村上に白金メッキす
る方法において、第一にニオブまたはタンタル基材表面
を機械的加工をして粗面とし、第二に電解研磨処理をし
て前記基材を腐蝕させ、第三に活性化処理を行い、次い
で白金メッキすることを特徴とする白金メッキ方法であ
る。(Means for Solving the Problems) The present invention is a method of platinum plating on a niobium or tantalum substrate, firstly, the surface of the niobium or tantalum substrate is mechanically processed to make it rough, and secondly, the surface of the niobium or tantalum substrate is made rough. This platinum plating method is characterized in that the base material is etched by polishing, thirdly activated, and then plated with platinum.
(作用)
本発明方法は、(I)ニオブまたはタンタル基材を機械
的に加工して粗面を得る工程、(n)粗面とした前記ニ
オブまたはタンタル基材をさらに電解研磨により腐蝕す
る工程、及び(I)前記化学エツチングしたニオブまた
はタンタル基材表面を活性化したのち白金メッキを析出
させる各工程からなり、以下各工程について説明する。(Function) The method of the present invention includes (I) a step of mechanically processing a niobium or tantalum base material to obtain a rough surface, and (n) a step of further corroding the roughened niobium or tantalum base material by electropolishing. , and (I) activating the surface of the chemically etched niobium or tantalum base material and then depositing platinum plating. Each step will be explained below.
本工程では、ニオブやタンタルの合材をサンドブラスト
処理などの機械的加工によって粗面とし、凹凸のある表
面とする。In this process, the composite material of niobium and tantalum is roughened by mechanical processing such as sandblasting to create an uneven surface.
ニオブやタンタルの合材は、必ずしも純金属である必要
はなく、ニオブやタンタルを主成分とするものであるな
らばよい。The composite material of niobium and tantalum does not necessarily have to be a pure metal, as long as it has niobium or tantalum as its main component.
機械的加工により粗面を得るには、サンドブラスト処理
が容易に−様な梨地の粗面を得ることが出来るので好ま
しい。この他にもグラインダーやサンダーなどで粗面と
してもよい。To obtain a rough surface by mechanical processing, sandblasting is preferable because it can easily obtain a rough surface with a satin finish. Alternatively, the surface may be roughened using a grinder or sander.
本工程は、前記機械的加工で得た凹凸面に対して縦方向
に電解研磨することを目的とし、ニオブやタンタルの基
材を陽極とし、ステンレスや炭素などの適当な陰極を用
いて、電解研磨液中で通電して電解研磨することにより
、機械的加工で得た粗な凹凸面にさらに微細な凹凸を形
成させる。The purpose of this process is to electrolytically polish the uneven surface obtained by the mechanical processing in the vertical direction, using a niobium or tantalum base material as an anode and a suitable cathode such as stainless steel or carbon. By electrolytically polishing by applying electricity in a polishing liquid, finer asperities are formed on the rough uneven surface obtained by mechanical processing.
電解研磨液は、電解によりニオブやタンタルを腐蝕する
ことができるものであるならば良く、例えば次の様なも
のが良いが、これらにメタノールやエタノール、エチレ
ングリコールなどのアルコール類を加えた組成のものが
特に良く、塩化ナトリウムや塩化アンモニウム、臭化ア
ンモニウムなどの塩類を加えたものでもよい。The electrolytic polishing liquid may be anything as long as it can corrode niobium or tantalum by electrolysis. For example, the following ones are good, but those with a composition in which alcohols such as methanol, ethanol, or ethylene glycol are added to these are suitable. Salts such as sodium chloride, ammonium chloride, and ammonium bromide may also be added.
フッ化物系 フッ化水素酸やフッ化物の塩を主成分
としたもの。Fluoride-based products whose main ingredients are hydrofluoric acid or fluoride salts.
アルカリ系 水酸化アルカリを主成分としたもの。Alkaline type: The main ingredient is alkali hydroxide.
酸系 塩酸や硫酸、硝酸、リン酸などの無機
酸を主成分としたもの
で、場合によっては前記フッ化
物を加えたもの。Acid-based: Those whose main component is inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, and phosphoric acid, and in some cases, the above-mentioned fluorides are added.
電解条件は、通常0.1〜IOA/ dm’程度で行い
、電解液の組成や腐食の程度により選択する。電解電圧
は、電流密度によって異なってくる。通常は数ボルトで
よく、アルコールを多量に入れた電解研磨液では、数十
ボルトになることもある。Electrolysis conditions are usually about 0.1 to IOA/dm' and are selected depending on the composition of the electrolytic solution and the degree of corrosion. The electrolysis voltage varies depending on the current density. Normally, it is only a few volts, but with an electrolytic polishing solution containing a large amount of alcohol, it can be several tens of volts.
またこの他にも水酸化アルカリや塩類を熔融塩とし熔融
塩電解研摩処理を施しても良い。In addition, molten salt electropolishing treatment may be performed using an alkali hydroxide or salt as a molten salt.
る工程
本工程は、白金メッキの直前にニオブまたはタンタル基
材表面を活性化したのち、メッキにより白金被覆を形成
する。In this step, the surface of the niobium or tantalum base material is activated immediately before platinum plating, and then a platinum coating is formed by plating.
活性化は、適当な前処理方法で行うが、前記工程(I)
及び(n)で得られた凹凸のある粗面に対して、さらに
結晶内の粒内部分を腐蝕するとともに、僅かに残る酸化
被覆をメッキ前によく取り除き、次に形成させる白金被
覆をより強固につける為の工程である。Activation is performed by an appropriate pretreatment method, but the above step (I)
For the rough surface with unevenness obtained in (n), the intragranular parts within the crystals are further corroded, and the slight remaining oxide coating is thoroughly removed before plating, so that the platinum coating to be formed next is made stronger. This is the process for attaching it to the surface.
活性化の方法には、蓚酸や塩酸、硫酸、リン酸、フッ化
水素酸などの無機酸やフッ化物などの塩類を含む溶液な
どで処理する方法があるが、アルカリ系溶液もしくはア
ルカリ系溶融塩で処理する方法が基材上の酸化被覆を取
り除く効果が大きいことと、組成が単純であり後述する
白金メッキ液等への汚染に対して悪影響を与えにくいの
でより好ましい。Activation methods include treatment with solutions containing inorganic acids such as oxalic acid, hydrochloric acid, sulfuric acid, phosphoric acid, and hydrofluoric acid, and salts such as fluorides, but alkaline solutions or alkaline molten salts The method of treatment is more preferable because it is highly effective in removing the oxidized coating on the substrate, has a simple composition, and is less likely to have an adverse effect on contamination of a platinum plating solution, etc., which will be described later.
また、前記活性化処理に続いて白金塩を含む溶液による
活性化処理を行うと、前記活性化処理で得た清浄な粗面
上に、白金の極薄被覆が形成されるのでさらに良い。Furthermore, it is even better if the activation treatment is followed by an activation treatment using a solution containing a platinum salt, since an extremely thin coating of platinum is formed on the clean rough surface obtained by the activation treatment.
白金被覆は湿式メッキにより形成するが、無電解メッキ
よりも電気メッキの方が強固な被覆を形成できるのでよ
り好ましく、好ましくは白金ストライクメッキ工程など
を経て白金メッキ被覆を施すとさらに良い。The platinum coating is formed by wet plating, but electroplating is more preferable than electroless plating because it can form a stronger coating, and it is even better to apply the platinum coating through a platinum strike plating process.
本発明方法によれば、ニオブまたはタンタル基材を機械
的に加工して凹凸のある表面とすることが、後の工程に
て析出させる白金の内部応力を分散させることになる。According to the method of the present invention, mechanically processing the niobium or tantalum base material to form an uneven surface disperses the internal stress of the platinum deposited in a later step.
また前記機械的加工で得た凹凸面にさらに微細な凹凸を
電解研磨で形成させさらに活性化させることにより、白
金が前記微細な凹凸部にも析出するので、白金被覆と基
材との密着性をより向上することができる。In addition, by forming finer irregularities on the irregular surface obtained by the mechanical processing and further activating the surface, platinum is deposited on the fine irregularities, thereby improving the adhesion between the platinum coating and the base material. can be further improved.
しかしこれらを組み合わせないと、析出した白金の内部
応力や密着性の問題がおこり白金の剥離を起こしやすい
。また前記機械的加工をサンドブラストでおこなった場
合には、次工程である電解研磨工程において、前記サン
ドブラストした際の食い込んだ砂を除くことができ、メ
ッキ前に電極上の異物等を除いておくといった効果もあ
る。However, if these are not combined, internal stress and adhesion problems will occur in the precipitated platinum, making it easy for the platinum to peel off. In addition, when the mechanical processing is performed by sandblasting, the sand that has penetrated during the sandblasting can be removed in the next electrolytic polishing process, and foreign matter on the electrodes can be removed before plating. It's also effective.
活性化処理は、基材上の酸化被膜を除き、結晶内の粒内
部分の腐蝕をする目的で行う。前記電解研磨に比較して
弱い腐食程度になるが、本工程を行わないと基材上に僅
かに残る酸化被覆が密着強度の低下を招くことになる。The activation treatment is performed for the purpose of removing the oxide film on the base material and corroding the intragranular portion within the crystal. Although the degree of corrosion is weaker than that of the electrolytic polishing, if this step is not performed, the slight oxidized coating remaining on the base material will cause a decrease in adhesion strength.
以下、本発明の実施の一例についてのべる。An example of implementing the present invention will be described below.
(実施例 1)
巾100mm、長さ 150mm、厚さ 1.5mmの
タンタルの板の上部に、直径2mm、長さ100mmの
タンタル棒を取付しろ5mmで溶接したタンタル基材に
白金被覆を本発明方法により実施した。(Example 1) A tantalum rod with a diameter of 2 mm and a length of 100 mm was attached to the top of a tantalum plate with a width of 100 mm, a length of 150 mm, and a thickness of 1.5 mm, and a platinum coating was applied to the tantalum base material, which was welded with a width of 5 mm. It was carried out by the method.
前記タンタル基材を、まずサンドブラスト処理して表面
を粗面として細かな梨地とした。The tantalum base material was first sandblasted to roughen the surface and give it a fine satin finish.
次いで電解研磨処理を、エタノール:エチレングリコー
ル:フッ化ケイ素酸:水−25:40:530からなる
液で25℃中において、電流密度3.0△/ dm’で
10分間行い、よく水洗した。Next, an electrolytic polishing treatment was performed with a solution consisting of ethanol: ethylene glycol: fluorosilicic acid: water - 25:40:530 at a current density of 3.0 Δ/dm' for 10 minutes at 25°C, followed by thorough washing with water.
さらに、活性化処理として110℃の水酸化ナトリウム
80%を含む濃厚溶液中で30分間加熱処理し、次いで
0.05%界面活性剤を含む20%水酸化ナトリウAm
液に5分間浸漬し、さらにジニトロジアミノ白金0.5
%を含む5%水酸化カリウム溶液に浸漬した。Furthermore, as an activation treatment, heat treatment was performed for 30 minutes in a concentrated solution containing 80% sodium hydroxide at 110°C, followed by 20% sodium hydroxide Am containing 0.05% surfactant.
Immerse it in the solution for 5 minutes, and then add 0.5 dinitrodiaminoplatinum.
% in a 5% potassium hydroxide solution.
該溶液中で、白金ストライクメッキを電圧5Vで20秒
問おこなった後に、流水洗浄2分間、5%硫酸溶液に3
0秒間、流水洗浄2分間、純水洗浄1分間の各工程を経
たのちに、硫酸系の白金メッキ浴にて電流密度0.5A
/ dm’で2Jsの白金被覆を施した。Platinum strike plating was performed in this solution at a voltage of 5 V for 20 seconds, followed by washing with running water for 2 minutes, and plating in 5% sulfuric acid solution for 3 minutes.
After 0 seconds of washing with running water, 2 minutes of washing with pure water, and 1 minute of pure water washing, a current density of 0.5A was applied in a sulfuric acid-based platinum plating bath.
A platinum coating of 2 Js was applied at /dm'.
メッキ終了後、粘着テープによるビールテストをしたと
ころ、白金の剥離もなく良好な密着性を示した。After plating was completed, a beer test using adhesive tape was performed, and the platinum did not peel off and showed good adhesion.
(実施例 2)
巾100+nm、長さ 150mm、厚さ 1.5mm
のニオブの板の上部に、直径2mm、長さ100mmの
ニオブ棒を取付しろ5+nmで溶接したニオブ基材に白
金被覆を本発明方法により実施した。(Example 2) Width 100+nm, length 150mm, thickness 1.5mm
A niobium rod having a diameter of 2 mm and a length of 100 mm was attached to the top of a niobium plate and welded with a thickness of 5+ nm.A platinum coating was carried out by the method of the present invention on a niobium base material.
前記タンタル基材を、まずサンドブラスト処理して表面
を粗面として細かな梨地とした。The tantalum base material was first sandblasted to roughen the surface and give it a fine satin finish.
次いで電解研磨処理を、エタノール:エチレングリコー
ル:フッ化ケイ素酸:水−25:40: 5:30か
らなる液で25℃中において、電流密度3.OA/ d
m’で10分間行い、よく水洗した。Next, an electrolytic polishing treatment was carried out at 25°C with a solution consisting of ethanol: ethylene glycol: fluorosilicic acid: water - 25:40:5:30 at a current density of 3. OA/d
m' for 10 minutes and thoroughly washed with water.
さらに、活性化処理として110℃の水酸化ナトリウム
80%を含む濃厚溶液中で30分間加熱処理し、次いで
0.05%界面活性剤を含む20%水酸化す) IJウ
ム溶液に5分間浸漬し、さらにジニトロジアミノ白金0
.5%を含む5%水酸化カリウム溶液に浸漬した。Furthermore, as an activation treatment, it was heated for 30 minutes in a concentrated solution containing 80% sodium hydroxide at 110°C, and then immersed in a 20% hydroxide solution containing 0.05% surfactant for 5 minutes. , and further dinitrodiaminoplatinum 0
.. 5% potassium hydroxide solution.
該溶液中で、白金ストライクメッキを電圧5Vで20秒
問おこなった後に、流水洗浄2分間、5%硫酸溶液に3
0秒間、流水洗浄2分間、純水洗浄1分間の各工程を経
たのちに、硫酸系の白金メッキ浴にて電流密度0.5A
/ dm’で2雌の白金被覆を施した。Platinum strike plating was performed in this solution at a voltage of 5 V for 20 seconds, followed by washing with running water for 2 minutes, and plating in 5% sulfuric acid solution for 3 minutes.
After 0 seconds of washing with running water, 2 minutes of washing with pure water, and 1 minute of pure water washing, a current density of 0.5A was applied in a sulfuric acid-based platinum plating bath.
Two females were platinized at /dm'.
メッキ終了後、粘着テープによるビールテストをしたと
ころ、白金の剥離もなく良好な密着性を示した。After plating was completed, a beer test using adhesive tape was performed, and the platinum did not peel off and showed good adhesion.
(実施例 3)
巾100+n+n、長さ 150 mm、厚さ 1.5
mmのタンタルの板の上部に、直径2mm、長さ100
mmのタンタル棒を取付しろ5mrrlで溶接したタン
タル基材に白金被覆を本発明方法により実施した。(Example 3) Width 100+n+n, length 150 mm, thickness 1.5
2 mm in diameter and 100 mm in length on the top of the tantalum plate.
Platinum coating was carried out by the method of the present invention on a tantalum base material to which a tantalum rod of 5 mm was attached and welded with a clearance of 5 mrrl.
前記タンタル基材を、まずサンドブラスト処理して表面
を粗面として細かな梨地とした。The tantalum base material was first sandblasted to roughen the surface and give it a fine satin finish.
次いで電解研磨処理を、硫酸:フッ化水素酸:水−50
:5:45からなる液で40℃中において、電流密度0
.5A/ dm’で20分間行い、よく水洗した。Next, electrolytic polishing treatment was performed using sulfuric acid:hydrofluoric acid:water-50
:5:45 at 40℃, current density is 0.
.. It was carried out for 20 minutes at 5A/dm' and thoroughly washed with water.
さらに、活性化処理として110℃の水酸化ナトリウム
80%を含む濃厚溶液中で30分間加熱処理し、次いで
0.05%界面活性剤を含む20%水酸化す) IJウ
ム溶液に5分間浸漬し、さらにジニトロジアミノ白金0
,5%を含む5%水酸化カリウム溶液に浸漬した。Furthermore, as an activation treatment, it was heated for 30 minutes in a concentrated solution containing 80% sodium hydroxide at 110°C, and then immersed in a 20% hydroxide solution containing 0.05% surfactant for 5 minutes. , and further dinitrodiaminoplatinum 0
, 5% in a 5% potassium hydroxide solution.
該溶液中で、白金ストライクメッキを電圧5Vで20秒
問おこなった後に、流水洗浄2分間、5%硫酸溶液に3
0秒間、流水洗浄2分間、純水洗浄1分間の各工程を経
たのちに、硫酸系の白金メッキ浴にて電流密度0.5A
/ dm’で2虜の白金被覆を施した。Platinum strike plating was performed in this solution at a voltage of 5 V for 20 seconds, followed by washing with running water for 2 minutes, and plating in 5% sulfuric acid solution for 3 minutes.
After 0 seconds of washing with running water, 2 minutes of washing with pure water, and 1 minute of pure water washing, a current density of 0.5A was applied in a sulfuric acid-based platinum plating bath.
Two coats of platinum were applied at /dm'.
メッキ終了後、粘着テープによるビールテストをしたと
ころ、白金の剥離もなく良好な密着性を示した。After plating was completed, a beer test using adhesive tape was performed, and the platinum did not peel off and showed good adhesion.
(実施例 4)
巾100mm、長さ 150mm、厚さ 1.5mrI
lのニオブの板の」二部に、直径2mm、長さ100m
mのニオブ棒を取付しろ5mmで溶接したニオブ基材に
白金被覆を本発明方法により実施した。(Example 4) Width 100mm, length 150mm, thickness 1.5mrI
Two parts of a niobium plate with a diameter of 2 mm and a length of 100 m.
Platinum coating was carried out by the method of the present invention on a niobium base material to which a niobium rod of 5 mm was attached and welded with a clearance of 5 mm.
前記ニオブ基材を、まずサンドブラスト処理して表面を
粗面として細かな梨地とした。The niobium base material was first subjected to sandblasting treatment to roughen the surface and give it a fine satin finish.
次いで電解研磨処理を、臭化アンモニウム:メタノール
:水−5:90° 5からなる液で25℃中において、
極間距離50mmで電圧が10ボルトを下回らないよう
にして20分間行い、よく水洗した。Next, electropolishing treatment was performed at 25°C with a solution consisting of ammonium bromide: methanol: water - 5:90°.
The test was carried out for 20 minutes with a distance between the electrodes of 50 mm and a voltage not lower than 10 volts, followed by thorough washing with water.
さらに、活性化処理として110℃の水酸化ナトリウム
80%を含む濃厚溶液中で30分間加熱処理し、次いで
0.05%界面活性剤を含む20%水酸化す) IJウ
ム溶液に5分間浸漬し、さらにジニトロジアミノ白金0
.5%を含む5%水酸化カリウム溶液に浸漬した。Furthermore, as an activation treatment, it was heated for 30 minutes in a concentrated solution containing 80% sodium hydroxide at 110°C, and then immersed in a 20% hydroxide solution containing 0.05% surfactant for 5 minutes. , and further dinitrodiaminoplatinum 0
.. 5% potassium hydroxide solution.
該溶液中で、白金ストライクメッキを電圧5Vで20秒
問おこなった後に、流水洗浄2分間、5%硫酸溶液に3
0秒間、流水洗浄2分間、純水洗浄1分間の各工程を経
たのちに、硫酸系の白金メッキ浴にて電流密度0.5A
/ dm’で2燗の白金被覆を施した。Platinum strike plating was performed in this solution at a voltage of 5 V for 20 seconds, followed by washing with running water for 2 minutes, and plating in 5% sulfuric acid solution for 3 minutes.
After 0 seconds of washing with running water, 2 minutes of washing with pure water, and 1 minute of pure water washing, a current density of 0.5A was applied in a sulfuric acid-based platinum plating bath.
/ dm' for 2 hours of platinum coating.
メッキ終了後、粘着テープによるビールテストをしたと
ころ、白金の剥離もなく良好な密着性を示した。After plating was completed, a beer test using adhesive tape was performed, and the platinum did not peel off and showed good adhesion.
(比較例 1)
巾100mm、長さ 150+n+n、厚さ 1.5m
rrlのタンタルの板の上部に、直径2mm、長さ10
0mmのタンタル棒を取付しろ5mn+で溶接したタン
タル基材(こ白金被覆する方法を本発明と比較する例と
して示す。(Comparative example 1) Width 100mm, length 150+n+n, thickness 1.5m
On the top of the tantalum plate of rrl, diameter 2 mm, length 10
A tantalum base material (platinum coating method) in which a 0 mm tantalum rod is attached and welded with a clearance of 5 mm+ is shown as an example for comparison with the present invention.
前記タンタル基材を、まずサンドブラスト処理して表面
を粗面として細かな梨地とした。The tantalum base material was first sandblasted to roughen the surface and give it a fine satin finish.
さらに、活性化処理として110℃の水酸化ナトリウム
80%を含む濃厚溶液中で30分間加熱処理し、次いで
0.05%界面活性剤を含む20%水酸化す) IJウ
ム溶液に5分間浸漬し、さらにジニトロジアミノ白金0
.5%を含む5%水酸化カリウム溶液に浸漬した。Furthermore, as an activation treatment, it was heated for 30 minutes in a concentrated solution containing 80% sodium hydroxide at 110°C, and then immersed in a 20% hydroxide solution containing 0.05% surfactant for 5 minutes. , and further dinitrodiaminoplatinum 0
.. 5% potassium hydroxide solution.
該溶液中で、白金ストライクメッキを電圧5Vで20秒
問おこなった後に、流水洗浄2分間、5%硫酸溶液に3
0秒間、流水洗浄2分間、純水洗浄1分間の各工程を経
たのちに、硫酸系の白金メッキ浴にて電流密度0.5A
/ dm’で2虜の白金被覆を施した。Platinum strike plating was performed in this solution at a voltage of 5 V for 20 seconds, followed by washing with running water for 2 minutes, and plating in 5% sulfuric acid solution for 3 minutes.
After 0 seconds of washing with running water, 2 minutes of washing with pure water, and 1 minute of pure water washing, a current density of 0.5A was applied in a sulfuric acid-based platinum plating bath.
Two coats of platinum were applied at /dm'.
メッキ終了後、粘着テープによるビールテストをしたと
ころ、白金被覆の全面が粘着テープ側についてしまい、
タンタル基材に対する白金の密着性は極めて悪いもので
あった。After plating was completed, when we conducted a beer test using adhesive tape, the entire surface of the platinum coating was attached to the adhesive tape.
The adhesion of platinum to the tantalum base material was extremely poor.
(比較例 2)
巾 100mm、長さ 150mm、厚さ 1.5mm
のタンタルの板の上部に、直径2mm、長さ100+n
mのタンタル棒を取付しろ5++++++で溶接したタ
ンタル基材に白金被覆を機械的加工をして粗面にする工
程を除いた以外本発明と同じ方法により実施した。(Comparative example 2) Width 100mm, length 150mm, thickness 1.5mm
2mm in diameter and 100+n in length on the top of the tantalum plate.
The test was carried out in the same manner as in the present invention except that the step of mechanically processing the platinum coating to roughen the tantalum base material to which a tantalum rod of 5 mm was attached and welded with a clearance of 5++ was carried out.
電解研磨処理を、エタノール:エチレンクリコール:硼
フッ化水素酸:水−25:40: 5:30からなる
液で25℃中において、電流密度3.OA/ dm’で
10分間行い、よく水洗した。The electrolytic polishing treatment was carried out at 25°C with a solution consisting of ethanol: ethylene glycol: borofluoric acid: water - 25:40:5:30 at a current density of 3. The mixture was washed with OA/dm' for 10 minutes and thoroughly washed with water.
次いで、活性化処理として110℃の水酸化ナトリウム
80%を含む濃厚溶液中で30分間加熱処理し、次いで
0.05%界面活性剤を含む20%水酸化す) IJウ
ム溶液に5分間浸漬し、さらにジニトロジアミノ白金0
.5%を含む5%水酸化カリウム溶液に浸漬した。Next, as an activation treatment, it was heated for 30 minutes in a concentrated solution containing 80% sodium hydroxide at 110°C, and then immersed in a 20% hydroxide solution containing 0.05% surfactant for 5 minutes. , and further dinitrodiaminoplatinum 0
.. 5% potassium hydroxide solution.
該溶液中で、白金ストライクメッキを電圧5Vで20秒
問おこなった後に、流水洗浄2分間、5%硫酸溶液に3
0秒間、流水洗浄2分間、純水洗浄1分間の各工程を経
たのちに、硫酸系の白金メッキ浴にて電流密度0.5A
/ dm’で2A1mの白金被覆を施した。Platinum strike plating was performed in this solution at a voltage of 5 V for 20 seconds, followed by washing with running water for 2 minutes, and plating in 5% sulfuric acid solution for 3 minutes.
After 0 seconds of washing with running water, 2 minutes of washing with pure water, and 1 minute of pure water washing, a current density of 0.5A was applied in a sulfuric acid-based platinum plating bath.
A platinum coating of 2A1m was applied at /dm'.
メッキ終了後、粘着テープによるビールテストをしたと
ころ、白金被覆の一部が粘着テープ側についてしまい、
タンタル基材に対する白金の密着性は悪いものであった
。After plating was completed, when we conducted a beer test using adhesive tape, some of the platinum coating stuck to the adhesive tape.
The adhesion of platinum to the tantalum base material was poor.
(発明の効果)
本発明は、ニオブまたはタンタル基材上に白金メッキす
る方法において、第一にニオブまたはタンタル基材表面
を機械的加工をして粗面とし、第二に電解研磨処理をし
て前記基材を腐蝕させ、第三に活性化処理を行い、次い
で白金メッキすることを特徴としている。サンドブラス
ト処理などの機械的加工によって粗面とし、凹凸のある
表面とし、機械的加工で得た粗な凹凸面にさらに微細な
凹凸を形成させ、活性化により結晶の粒内腐蝕をおこな
うとともに、僅かに残る酸化被膜を除去したのち、メッ
キにより白金被覆を形成する様にするようにしているの
で、白金の内部応力を分散させるとともに白金被覆と基
材との密着性をより向上することができる。(Effects of the Invention) The present invention provides a method of platinum plating on a niobium or tantalum base material, in which the surface of the niobium or tantalum base material is firstly processed mechanically to make it rough, and secondly, the surface of the niobium or tantalum base material is subjected to electrolytic polishing treatment. The method is characterized in that the base material is corroded, thirdly, an activation treatment is performed, and then platinum plating is performed. A rough surface is created by mechanical processing such as sandblasting, resulting in an uneven surface, and finer unevenness is formed on the rough uneven surface obtained by mechanical processing. After removing the remaining oxide film, the platinum coating is formed by plating, so that the internal stress of platinum can be dispersed and the adhesion between the platinum coating and the base material can be further improved.
1に
の他にも、本発明を電解電極用などに使用した場合、メ
ッキ前に電極上の異物等を除くことにより電極寿命がの
びたり、電極表面の凹凸により結果として表面積が大き
くなり電流効率が向上するなどの別の効果もある。In addition to 1, when the present invention is used for electrolytic electrodes, etc., the life of the electrode can be extended by removing foreign matter on the electrode before plating, and the surface area can be increased due to the unevenness of the electrode surface, which can improve the current efficiency. There are other effects as well, such as improved performance.
本発明は、ニオブやタンタルに白金被覆を施すうえで、
また電解用電極の合材の再利用のうえで、さらには高耐
蝕性材料を使用する部品などへの適用などを考慮すると
産業への貢献大なるものといえる。The present invention provides the following advantages when applying platinum coating to niobium or tantalum.
In addition, considering the reuse of the composite material of electrolytic electrodes and its application to parts that use highly corrosion-resistant materials, it can be said that it will make a great contribution to industry.
(実施態様)
本発明は、特許請求の範囲に記載した特徴を有するもの
であるが、その実施態様を例示すると次のとおりである
。(Embodiments) The present invention has the features described in the claims, and examples of embodiments thereof are as follows.
(1)活性化処理を、アルカリ溶融塩及び/またはアル
カリ系溶液で行うことを特徴とする請求項1に記載の方
法
出願人 田中貴金属工業株式会社(1) The method according to claim 1, characterized in that the activation treatment is performed with a molten alkali salt and/or an alkaline solution Applicant: Tanaka Kikinzoku Kogyo Co., Ltd.
Claims (1)
において、 a)ニオブまたはタンタル基材表面を機械的加工をして
粗面とし、 b)次いで電解研磨処理をして前記基材を腐蝕させ、 c)さらに活性化処理を施したのちに白金メッキするこ
とを特徴とする白金メッキ方法。[Claims] 1. A method of platinum plating on a niobium or tantalum base material, which comprises: a) mechanically processing the surface of the niobium or tantalum base material to make it a rough surface; A platinum plating method characterized by corroding a base material, c) further performing an activation treatment, and then plating with platinum.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16116588A JPH0211794A (en) | 1988-06-29 | 1988-06-29 | Platinum plating method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16116588A JPH0211794A (en) | 1988-06-29 | 1988-06-29 | Platinum plating method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0211794A true JPH0211794A (en) | 1990-01-16 |
Family
ID=15729835
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16116588A Pending JPH0211794A (en) | 1988-06-29 | 1988-06-29 | Platinum plating method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0211794A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014210218A (en) * | 2013-04-17 | 2014-11-13 | 三菱マテリアルテクノ株式会社 | Vibration processing apparatus |
-
1988
- 1988-06-29 JP JP16116588A patent/JPH0211794A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014210218A (en) * | 2013-04-17 | 2014-11-13 | 三菱マテリアルテクノ株式会社 | Vibration processing apparatus |
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